JPH0754147A - Dynamic mixing device - Google Patents

Abstract

PURPOSE:To provide the dynamic mixing device for which a metal evaporating source of an arc discharge system is used as a metal evaporating source and which easily forms films having excellent wear resistance, corrosion resistance, etc. CONSTITUTION:This dynamic mixing device has an ion source for irradiating the surface of an object to be coated with ions and the metal evaporating source 31 for producing metal vapor from a target (cathode) 36 by an arc discharge and depositing the metal vapor by evaporation on the surface of the object to be coated in a vacuum vessel. The device is provided, in an electrically floating state, with a diaphragm member 50 having an aperture 56 for partially passing the metal vapor produced from the target 36 between the target 36 and the object to be coated. As a result, increasing of an I/A value up to about 0.2-0.5 is possible.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a dynamic mixing apparatus, and more particularly to a dynamic mixing apparatus applied to a dynamic mixing process in which metal is vapor-deposited on a surface of an object to be coated and at the same time, ions are irradiated.

[0002]

2. Description of the Related Art As a dynamic mixing device,
Basically, as shown in FIG.
Source 5 for irradiating the surface of the substrate with ions (ion generation / irradiation means) 5 and metal vapor to generate an object to be coated 2
What is provided in the vacuum container 1 with a metal evaporation source (metal vapor generation / deposition means) 6 for vapor deposition on the surface of the is used.

Here, as the metal evaporation source 6, an electron beam heating evaporation source is used which applies an electron beam to the metal 10 housed in the crucible 9 connected to the electron beam generator 8 to melt and evaporate the metal 10. ing. On the other hand, as the ion source 5, a Freeman type metal ion beam source as shown in FIG. 5 is used. This is an electric furnace 15 with a heater 16.
The metal 17 disposed inside is heated to generate metal vapor, which is collected in the discharge chamber 19 and ionized, and accelerated in the discharge chamber 19 to be extracted as a high-current ion beam.

According to such an apparatus, the metal ion beam 12
And the metal vapor 11 are mixed on the surface of the object to be coated 2 and injected or vapor-deposited on the surface to form an alloy (for example, TiAl) thin film composed of the metal of the metal ion beam and the metal of the metal vapor. The thin film formed by such a dynamic mixing device has excellent adhesion to the object to be coated and is dense. In FIG. 4, 3 is a turntable, 7 is an exhaust port, 11 is a metal vapor, 13 is an electron beam, and in FIG. 5, 12 is an ion beam, 18 is a metal vapor, 21 is an anode, 22 Indicates the direction of the external magnetic field.

[0005]

However, the electron beam heating type evaporation source is inefficient because it requires a large current when evaporating a refractory metal, and the evaporation source metal 10 is in a molten state in the crucible 9 Since it is housed in the vacuum container 1, it is necessary to arrange the vacuum container 1 in the lower part.

On the other hand, the Freeman type metal ion beam source, as an ion source, inserts chloride having an evaporation temperature suitable for the characteristics of the electric furnace 15 to generate metal vapor, or
A metal plate or the like is inserted into the electric furnace 15, chlorine gas or the like is flowed in, metal vapor is generated by utilizing chemical vaporization, and the metal vapor is sent to the discharge chamber 19.
However, there is a problem that the service life is shortened by being attacked by chlorine gas or the like. In addition, since several types of ions may be mixed in the ion beam extracted from the metal ion beam source, a mass separation magnetic field for selecting the target ions is often attached. Is complicated because the device becomes large, the mounting position on the vacuum container 1 is restricted, the degree of freedom in designing the dynamic mixing device is extremely narrowed, and the arrangement position of the object to be coated is limited. There is a problem that it is difficult to perform uniform coating on an object to be coated.

Therefore, various studies have been made, and a dynamic mixing apparatus capable of solving the above problems has been developed (Japanese Patent Application No. 4-157065). As shown in FIG. 3, this device replaces the electron beam heating type evaporation source 6 in the conventional dynamic mixing device with the arc discharge between the anode 37 and the target 36 made into a cathode, and the metal is removed from the target 36. Arc discharge type metal evaporation source 31 for generating vapor and depositing it on the surface of the object to be coated 27
Further, in place of the ion source 5 (Freeman type metal ion beam source), metal ions are generated from the metal (cathode 42) by arc discharge, accelerated by the extraction electrode system 44, and high energy The ion source 33 which emits as an ion beam is used. In FIG. 3, 28 is a rotary table, 29 is a bias power source, 30 is a metal ion beam source, 32 is an exhaust port, 35 is an arc power source, 40 is an anode,
Reference numeral 41 is an arc power source, 42 is a cathode, 43 is a trigger electrode, and 44 is an extraction electrode system.

However, in the dynamic mixing apparatus using the arc discharge type metal evaporation source as the metal evaporation source as described above, the evaporation amount of the metal from the metal evaporation source (that is, the number of evaporated atoms: A) and the amount from the ion source are The ratio of the metal ion beam quantity (that is, the number of ions: I): I / A is small, and this I / A
It is difficult to change A, and therefore it is difficult to obtain a film having excellent wear resistance and corrosion resistance. That is, in the dynamic mixing process, the I / A is important because it affects the properties of the film to be formed, and in order to obtain a film with excellent abrasion resistance and corrosion resistance, the type of film that forms the I / A is important. It is necessary to be variable according to the above, and to be able to set the value to about 0.2 to 0.5. However, the arc discharge type metal evaporation source is basically characterized by a large amount of metal evaporation (that is, the number of evaporated atoms: A). Therefore, the I / A value is small and the above required value (0.2
It is difficult to change the I / A value. For example, when the conventional film forming rate is about 3.3 nm / sec and the beam current density is about 18 μA / cm ² , instead of the electron beam heating evaporation source 6 in the conventional dynamic mixing apparatus, arc discharge is performed. When the metal evaporation source of the formula is used, the I / A is about 0.003, which is extremely smaller than the above required value, and this I / A value cannot be changed. Therefore, it is difficult to obtain a film having excellent wear resistance and corrosion resistance, and its improvement is desired.

The present invention has been made in view of such circumstances, and an object thereof is a dynamic mixing device using an arc discharge type metal evaporation source as a metal evaporation source, which has a large I / A. It is an object of the present invention to provide a dynamic mixing device which can be made variable to a value of about 0.2 to 0.5 and can be made variable, and by which a film excellent in abrasion resistance, corrosion resistance and the like can be easily formed.

[0010]

In order to achieve the above object, the dynamic mixing apparatus according to the present invention has the following structure. That is, the dynamic mixing apparatus according to claim 1 is an ion source for irradiating the surface of an object to be coated with ions, and a metal evaporation source for generating metal vapor from a target by arc discharge and depositing it on the surface of the object to be coated. In the dynamic mixing device provided in a vacuum container, between the target and the object to be coated, a diaphragm member having an opening for partially passing the metal vapor generated from the target, the target and the vacuum. The dynamic mixing device is characterized by being provided so as to be electrically insulated from the container.

According to a second aspect of the present invention, there is provided the dynamic mixing device according to the first aspect, further comprising a diaphragm amount adjusting mechanism for adjusting the opening area of the diaphragm member from the outside of the vacuum container.

[0012]

【Example】

(Embodiment 1) FIG. 1 shows a main part (a portion of a metal evaporation source and a diaphragm member) of a dynamic mixing apparatus according to Embodiment 1. In this apparatus, a diaphragm member 50 having a circular opening 56 is connected and fixed to a target 36 of an arc discharge type metal evaporation source 31 by a bolt 51. Here, the bolt 51 is electrically insulated from the target 36, and the position of the diaphragm member 50 is 50 mm from the front surface of the target 36. Therefore, the diaphragm member 50 having the opening 56 for partially passing the metal vapor generated from the target 36 is provided between the target 36 and the object to be coated in an electrically floating state. Except for this point, it has the same structure as the dynamic mixing device illustrated in FIG.

According to the above apparatus, part of the metal vapor (vaporized metal atoms) generated from the arc spot on the surface of the target 36 (cathode) is captured by the diaphragm member 50, and the remaining part passes through the opening 56 and is Guided to the surface of the coating. Therefore, the throttle member 50 reduces the amount of metal vapor reaching the surface of the object to be coated and reduces the number of atoms to be deposited, and thus the I / A can be increased. Under the condition that the beam current density is 20 μA / cm ² , the diameter D of the aperture 56 (circle) of the diaphragm member 50 is changed and the I / A value is measured. D: 44, 20, 14 , 10 mm, I / A value in this order:
It was 0.005, 0.029, 0.067, 0.108. Also, the diaphragm member 50
The I / A value was 0.003 when measured without the use.
Met. Therefore, by changing the diameter D of the opening 56, the area of the opening 56 changes and the I / A value can be changed. It was also confirmed that the mixing effect was changed in response to the change in the I / A value and the quality of the formed film could be changed.

(Embodiment 2) FIG. 2 shows a main part (a portion of a diaphragm member and a diaphragm amount adjusting mechanism) of a dynamic mixing apparatus according to a second embodiment. This device has, as a diaphragm member, a variable diaphragm 52 in which the opening area of the diaphragm member is variable, and a diaphragm amount adjusting mechanism for adjusting the opening area of the variable diaphragm 52 from the outside of the vacuum container 26. Except for this point, the dynamic mixing apparatus according to the first embodiment is similar to the above.

In the above-mentioned diaphragm amount adjusting mechanism, a drive screw 53 (one of which is a reverse screw) is attached to a variable diaphragm 52, and a rotation introducing terminal 55 is connected thereto via a flexible wire 54. This rotation introducing terminal 55 is a vacuum. It can be rotated from outside the container 26. When the rotation introduction terminal 55 is rotated, the variable diaphragm 52
The area of the opening changes, and the aperture amount changes. The variable diaphragm 52 is in an electrically floating state.

According to such an apparatus, the same effect as that of the apparatus according to the first embodiment can be obtained, and further, since the diaphragm amount can be changed during film formation, the number of vapor-deposited atoms on the surface of the object to be coated can be changed, It was confirmed that the I / A can be changed accordingly, and therefore there is an advantage that the film quality can be controlled continuously or intermittently.

As described above, the dynamic mixing apparatus according to the present embodiment is a dynamic mixing apparatus using an arc discharge type metal evaporation source as a metal evaporation source, which is provided between the target and the object to be coated. Since the throttling member having an opening for partially passing the generated metal vapor is provided, the amount of metal vapor reaching the surface of the object to be coated is reduced by this throttling member,
The number of vapor-deposited atoms (A ₁ ) is reduced. Although this A ₁ is different from the above A, the reduction of A ₁ has the same effect as the reduction of A without a diaphragm member, and neither reduction of A nor reduction of A ₁ can reduce the number of vapor-deposited atoms. Since there is no difference, decreasing A ₁ effectively means decreasing A. Therefore, the I / A can be substantially increased, and can be set to a value of about 0.2 to 0.5.

Further, since the aperture amount can be easily increased or decreased by increasing or decreasing the area of the opening of the aperture member, the number of atoms deposited on the surface of the object to be coated: A ₁ can be adjusted, and thus the I / A Can be variable.

In this way, I / A can be increased, and I / A can be increased.
Since A can be made variable, it is easy to form a film having excellent wear resistance and corrosion resistance.

Moreover, since the diaphragm member is electrically insulated from the target and the vacuum vessel, the diaphragm member is in an electrically floating state, and therefore electrons can be prevented from flowing from the plasma to the diaphragm member. Therefore, heat generation of the diaphragm member can be suppressed, and therefore, a means for cooling the diaphragm member is unnecessary.

A diaphragm amount adjusting mechanism for adjusting the opening area of the diaphragm member from the outside of the vacuum container can be provided.
When such a diaphragm amount adjusting mechanism is provided, the number of vapor-deposited atoms on the surface of an object to be coated is changed during film formation, and I /
Since A can be changed, there is an advantage that the film quality can be controlled continuously or intermittently.

The shape of the aperture of the diaphragm member,
The position and the number are not particularly limited, and the number of diaphragm members is also not particularly limited. However, the position in the direction between the target and the object to be coated is preferably a position that does not block the ion beam from the ion source. Further, the amount of throttling (the amount of metal vapor generated from the target that passes through the opening) may be adjusted by the shape of one opening or the area of the opening. You may carry out using a part.

In the dynamic mixing apparatus according to this embodiment, the ion source is not particularly limited, and the above Freeman-type metal ion beam source or FIG.
An ion source of the type in which metal ions are generated by arc discharge, accelerated, and irradiated, such as the ion source 33 illustrated in FIG. Here, the former Freeman-type metal ion beam source has a smaller beam amount of metal ions (that is, the number of ions: I) from the ion source than the ion source such as the ion source 33 illustrated in FIG. 3 of the latter. , If there is no throttling member that reduces the amount of metal vapor that reaches the surface of the object to be coated from the arc discharge type metal evaporation source, the I / A value may be too small to satisfy the required value (about 0.2 to 0.5). It is large and therefore more effective when the former Freeman-type metal ion beam source is used as the ion source.
However, even when the latter ion source is used as the ion source, the I / A can be improved and the required value can be satisfied.

[0024]

The dynamic mixing apparatus according to the present invention has the above-described structure and operates.
Problems when using arc discharge type metal evaporation source (I / A
The value is small and it is difficult to change the I / A value), the I / A value can be increased, and the required value (I / A value of about 0.2 to 0.5) can be achieved and the I / A value can be reduced. The effect is that it can be made variable, and it is easy to form a film excellent in abrasion resistance, corrosion resistance, etc.

Further, the effect of the dynamic mixing device using the arc discharge type metal evaporation source as the metal evaporation source (improvement of efficiency by reduction of required energy for metal evaporation,
At the same time, the removal of restrictions on the location of metal evaporation sources).

[Brief description of drawings]

FIG. 1 is a side sectional view showing an outline of a main part of a dynamic mixing device according to a first embodiment.

FIG. 2 is a side sectional view showing an outline of a main part of a dynamic mixing device according to a second embodiment.

FIG. 3 is a side sectional view showing an outline of a developed dynamic mixing apparatus using an arc discharge type metal evaporation source as a metal evaporation source.

FIG. 4 is a side sectional view showing an outline of a conventional dynamic mixing device.

FIG. 5 is a side sectional view showing an outline of a Freeman type metal ion beam source used as an ion source 5 of a conventional dynamic mixing apparatus.

[Explanation of symbols]

1--vacuum container, 2--coated object, 5--ion source, 6--metal evaporation source, 8--electron beam generator, 9--
Crucible, 10--metal, 15--electric furnace, 16--heater, 17--metal, 19--discharge chamber, 20--filament, 26--vacuum container, 27--coated object, 30-- Ion source, 31--Metal evaporation source, 36--Target, 37--Anode, 50--Throttle member, 51--Volt, 52--Variable diaphragm, 53--Drive screw, 54--Flexible wire, 55 --Rotation lead-in terminal, 56--Opening.

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Noriyuki Inuishi 1-5-5 Takatsukadai, Nishi-ku, Kobe-shi, Hyogo Kobe Steel Works, Ltd. Kobe Research Institute

Claims (2)

[Claims] 1. A vacuum container is provided with an ion source for irradiating the surface of an object to be coated with ions and a metal evaporation source for generating metal vapor from a target by arc discharge and depositing it on the surface of the object to be coated. In the dynamic mixing device, a diaphragm member having an opening for partially passing metal vapor generated from the target between the target and the object to be coated is electrically insulated from the target and the vacuum container. A dynamic mixing device characterized by being provided. 2. The dynamic mixing apparatus according to claim 1, further comprising a diaphragm amount adjusting mechanism for adjusting an opening area of the diaphragm member from the outside of the vacuum container.