JPH0747781Y2 - Hot cathode holding device - Google Patents

Hot cathode holding device

Info

Publication number
JPH0747781Y2
JPH0747781Y2 JP1989039654U JP3965489U JPH0747781Y2 JP H0747781 Y2 JPH0747781 Y2 JP H0747781Y2 JP 1989039654 U JP1989039654 U JP 1989039654U JP 3965489 U JP3965489 U JP 3965489U JP H0747781 Y2 JPH0747781 Y2 JP H0747781Y2
Authority
JP
Japan
Prior art keywords
heater
holding device
cathode
column
hot cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1989039654U
Other languages
Japanese (ja)
Other versions
JPH02131243U (en
Inventor
誠之助 松尾
嘉明 田中
Original Assignee
株式会社日本イーテック・システムズ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社日本イーテック・システムズ filed Critical 株式会社日本イーテック・システムズ
Priority to JP1989039654U priority Critical patent/JPH0747781Y2/en
Publication of JPH02131243U publication Critical patent/JPH02131243U/ja
Application granted granted Critical
Publication of JPH0747781Y2 publication Critical patent/JPH0747781Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Description

【考案の詳細な説明】 [産業上の利用分野] 本考案は電子銃等における熱電子放射陰極の挟圧保持装
置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial application] The present invention relates to a pinching and holding device for a thermionic emission cathode in an electron gun or the like.

[従来の技術] 従来、電子ビーム露光装置、電子顕微鏡等に使用される
電子銃の熱陰極保持装置は、第2図及び第3図に示す構
造となっている。なお、第3図は実公昭62−28041号公
報に示す構造である。
[Prior Art] Conventionally, a hot cathode holding device of an electron gun used in an electron beam exposure apparatus, an electron microscope and the like has a structure shown in FIG. 2 and FIG. Incidentally, FIG. 3 shows the structure shown in Japanese Utility Model Publication No. 62-28041.

まず、第2図の構造について説明する。絶縁基板1の上
面には、加熱電圧が印加される一対の電極2が植設され
ている。この電極2は径大部2bが絶縁基板1に植設され
ており、先端部が径小部2aとなって、例えば電源からの
導線が接続された図示しないソケットに挿入されるよう
にされる。電極2の径大部2bには、側面に相互に平行に
なるように形成された支柱取付面2cが設けられており、
この支柱取付面2cに一対の支持3の取付部がそれぞれね
じ4で固定されている。支柱3は、絶縁基板1の貫通穴
1aを通って下方に伸びており、下端側の対向面は一対の
ヒータ5を介して陰極チップ6を挟圧保持する構造とな
っている。
First, the structure of FIG. 2 will be described. A pair of electrodes 2 to which a heating voltage is applied is implanted on the upper surface of the insulating substrate 1. A large-diameter portion 2b of this electrode 2 is implanted in the insulating substrate 1, and a tip portion of the electrode 2 becomes the small-diameter portion 2a so that it can be inserted into, for example, a socket (not shown) to which a conductor from a power source is connected. . The large-diameter portion 2b of the electrode 2 is provided with a column mounting surface 2c formed so as to be parallel to the side surface,
The mounting portions of the pair of supports 3 are fixed to the column mounting surface 2c with screws 4, respectively. The pillar 3 is a through hole of the insulating substrate 1.
It extends downwardly through 1a, and the opposing surface on the lower end side has a structure in which the cathode chip 6 is sandwiched and held via a pair of heaters 5.

次に第3図の構造について説明する。絶縁基板10の下面
には一対の固定支柱11が固定されており、この固定支柱
11の内側にはそれぞれ通電支柱12が固定されている、通
電支柱12の下端側対向面は、第2図の場合と同様に一対
のヒータ5を介して陰極チップ6を挟圧保持している。
また前記固定支柱11には、前記通電支柱12の外側と一定
間隔を保って弾性板13が固定されており、この弾性板13
は固定支柱11に螺合された調整ねじ14によって前記通電
支柱12を押圧する構造となっている。
Next, the structure of FIG. 3 will be described. A pair of fixed columns 11 are fixed to the lower surface of the insulating substrate 10.
Conductive columns 12 are fixed to the insides of 11 respectively. The lower end side opposing faces of the conductive columns 12 hold the cathode chip 6 through a pair of heaters 5 as in the case of FIG. .
An elastic plate 13 is fixed to the fixed support column 11 at a constant distance from the outside of the current-carrying support column 12.
Has a structure in which the energizing column 12 is pressed by the adjusting screw 14 screwed to the fixed column 11.

第2図及び第3図に構造において、支柱3、11、12はモ
リブデン材、ヒータ5は熱分解黒鉛又は高配向性炭素材
料、陰極チップ6は希土類硼化物、特に六硼化ランタン
が一般に用いられている。
In the structure shown in FIGS. 2 and 3, the columns 3, 11 and 12 are generally made of molybdenum material, the heater 5 is made of pyrolytic graphite or highly oriented carbon material, and the cathode tip 6 is made of rare earth boride, especially lanthanum hexaboride. Has been.

ところで、かかる構造よりなる熱陰極保持装置におい
て、安定した高輝度電子ビームを得るには、陰極チップ
6の使用温度である1500〜1600℃の高温下においても該
陰極チップ6とヒータ5及び支柱3又は12との電気的機
械的接触を安定した維持しなければならない。
By the way, in the hot cathode holding device having such a structure, in order to obtain a stable high-intensity electron beam, the cathode chip 6, the heater 5, and the support column 3 are kept even at a high temperature of 1500 to 1600 ° C. which is the operating temperature of the cathode chip 6. Or 12 shall maintain stable electromechanical contact.

[考案が解決しようとする課題] 第2図の構造は、部品点数が少なく、また簡単な構造よ
りなるので、コスト的には安価であると共に、小型化が
図れるという特徴を有する。
[Problems to be Solved by the Invention] The structure shown in FIG. 2 has a feature that the number of parts is small and the structure is simple, so that the cost is low and the size can be reduced.

しかし、この構造の場合には、部品の精度だけでは充分
な精度とならないので、陰極チップ6とヒータ5及び支
柱3を精度良く組立てるために、支柱3の途中を曲げて
変形させる調整作業を行い、該支柱3の弾性でヒータ4
を押圧させて陰極チップ6を保持させている。実際の使
用時には、支柱3の曲げ部分は比較的高温(陰極チップ
6の使用温度は1500〜1600℃の高温であるので、支柱3
の中間部である曲げ部分は約700℃前後の温度となる)
にさらされるので、前記調整作業における曲げによる残
留応力が開放されることによって支柱3が変形する。従
って、高温下での使用中に左右一対の支柱3のそれぞれ
が残留応力に応じてわずかずつ変形することによって挟
持力にアンバランスが発生し、支柱3の残留応力の開放
に従って陰極チップ6は時間の経過と共に右又は左に移
動する。この結果、陰極チップ6の先端部の外側に配設
された図示しないグリッド電極と陰極チップ6との相対
的位置が変化する。また高温下での使用中に一対の支柱
3は内側と外側との温度差によって開く方向にわずかに
曲がりが発生し、支柱3の挟持力が減少する。その結
果、陰極チップ6とヒータ5との接触状態が悪化する。
However, in the case of this structure, the precision of the parts alone does not provide sufficient precision. Therefore, in order to assemble the cathode chip 6, the heater 5 and the column 3 with high precision, an adjustment work for bending and deforming the column 3 is performed. , The elasticity of the column 3 causes the heater 4
Is pressed to hold the cathode chip 6. In actual use, the bent portion of the column 3 is relatively hot (the operating temperature of the cathode chip 6 is a high temperature of 1500 to 1600 ° C., so the column 3
The temperature at the bending part, which is the middle part of the temperature, is around 700 ° C)
Since the residual stress due to the bending in the adjustment work is released, the pillar 3 is deformed. Therefore, during use at high temperature, the pair of left and right columns 3 are slightly deformed according to the residual stress, resulting in an imbalance in the clamping force. Move to the right or left with the passage of. As a result, the relative position between the grid electrode (not shown) arranged outside the tip of the cathode chip 6 and the cathode chip 6 changes. Further, during use under high temperature, the pair of columns 3 slightly bends in the opening direction due to the temperature difference between the inside and the outside, and the clamping force of the columns 3 decreases. As a result, the contact state between the cathode chip 6 and the heater 5 deteriorates.

前記したように、グリッド電極と陰極チップ6との相対
位置が変化すると、又は陰極チップ6とヒータ5との接
触状態が悪化すると、陰極チップ6先端からの電子放出
状態、特に電流値及び電流密度分布が変化する。このた
め、最終的に使用される電子ビームの電流値が一時的に
実施範囲を離れて使用不可能になる場合が生じるという
問題があった。
As described above, when the relative position between the grid electrode and the cathode chip 6 changes, or when the contact state between the cathode chip 6 and the heater 5 deteriorates, the electron emission state from the tip of the cathode chip 6, particularly the current value and the current density. The distribution changes. Therefore, there is a problem that the current value of the finally used electron beam may temporarily leave the implementation range and become unusable.

第3図の構造は、調整ねじ14で押圧された弾性板13を通
電12に押付けているので、調整作業のために通電支柱12
を変形させる必要は殆どなく、残留応力の影響を比較的
受けることがないので、前記第2図の問題点は解消され
る。
In the structure shown in FIG. 3, since the elastic plate 13 pressed by the adjusting screw 14 is pressed against the energizing member 12, the energizing strut member 12 is used for the adjustment work.
Since there is almost no need to deform and there is little influence of residual stress, the problem of FIG. 2 is solved.

しかし、この構造は、部分点数が多く、また複雑な構造
よりなるので、コスト的に割高となる。また支柱3の外
側に一定間隔を保つて弾性板13を配設し、その外側に固
定支柱11を有し、更に該固定支柱11の外側より調整ねじ
14を螺合させてなるので、必然的に大型化するという問
題がある。
However, since this structure has a large number of partial points and a complicated structure, the cost is high. An elastic plate 13 is arranged outside the support column 3 at a constant interval, a fixed support column 11 is provided on the outer side of the elastic plate 13, and an adjusting screw is provided from the outside of the fixed support column 11.
Since 14 is screwed together, there is a problem that the size is inevitably increased.

本考案の目的は、部品点数が少なく、また簡単な構造で
コスト的に安価にできると共に、残留応力や熱変形の影
響を比較的受けない支柱を有する熱陰極保持装置を提供
することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a hot cathode holding device having a column having a small number of parts, a simple structure, a low cost, and a column relatively unaffected by residual stress or thermal deformation.

[課題を解決するための手段] 上記の目的は、陰極チップを一対のヒータを介して一対
の支柱で挟圧保持してなる熱陰極保持装置において、前
記支柱の取付部が絶縁基板の上面に設けられ、前記支柱
が絶縁基板を通して下方に延びており、かつ前記支柱の
取付部に近い部分を塑性変形部に構成したことを特徴と
する熱陰極保持装置により達成される。
[Means for Solving the Problems] The above object is to provide a hot cathode holding device in which a cathode chip is held between a pair of support columns via a pair of heaters, and a mounting portion of the support columns is provided on an upper surface of an insulating substrate. The hot cathode holding device is characterized in that the support pillar is provided so as to extend downward through the insulating substrate, and a portion near the mounting portion of the support pillar is a plastically deformable portion.

[作用] 支柱の取付部が絶縁基板の上面に設けられ、その支柱の
取付部に近い部分を塑性変形部に構成したことにより、
陰極チップの挟圧保持の際における調整作業が容易であ
り、そのための変形に伴う変形応力も小さくてすむ。ま
た、支柱の塑性変形部がヒータより離れた位置にあるの
で、ヒータからの熱伝導による温度上昇が少ない。例え
ば、塑性変形部を支柱の絶縁基板への取付部近傍にする
と、使用時における該塑性変形部は約100〜200℃程度の
低温域であるので、残留応力の開放は殆ど生じなく、熱
的影響を受けないので、支柱の熱による変形が少ない。
[Operation] Since the mounting portion of the pillar is provided on the upper surface of the insulating substrate and the portion near the mounting portion of the pillar is configured as the plastic deformation portion,
Adjustment work when holding the cathode chip under clamping pressure is easy, and the deformation stress associated with the deformation for that purpose is small. Further, since the plastically deformed portion of the support column is located away from the heater, the temperature rise due to heat conduction from the heater is small. For example, when the plastically deformed part is near the mounting part of the support pillar to the insulating substrate, the plastically deformed part is in a low temperature range of about 100 to 200 ° C. during use, so that residual stress is hardly released and the thermal stress does not occur. Since it is not affected, there is little deformation of the columns due to heat.

[実施例] 以下、本考案の熱陰極保持装置に用いる支柱の一実施例
を第1図により説明する。本実施例は、第2図に示す支
柱3の形状を第1図に示す支柱31の形状に改良し、第2
図に示す構造の欠点を解消したものである。
[Embodiment] An embodiment of a pillar used in the hot cathode holding device of the present invention will be described below with reference to FIG. In this embodiment, the shape of the column 3 shown in FIG. 2 is improved to the shape of the column 31 shown in FIG.
The drawbacks of the structure shown in the figure are eliminated.

支柱31は、電極2の支柱取付面2cへの取付部31aと、こ
の取付部31aより延在したヒータ挟持アーム部31bと、こ
のヒータ挟持アーム部31bの先端の内側に設けられ、ヒ
ータ5を挟持するヒータ挟持部31cとからなる点は、第
2図の支柱3と同じである。支柱31は全体が同じ材料、
例えばモリブデンでつくられている。
The pillar 31 is provided inside the tip of the heater holding arm portion 31b, the heater holding arm portion 31b extending from the mounting portion 31a of the electrode 2 on the pillar mounting surface 2c, and the heater 5 It is the same as the support column 3 in FIG. 2 in that it is composed of a heater clamping portion 31c for clamping. The pillar 31 is entirely made of the same material,
For example, it is made of molybdenum.

本実施例において、ヒータ挟持部31cより離れた取付部3
1aに近いヒータ挟持アーム部31bの一部分を薄肉にして
塑性変形部31dを設けている。従って、この支柱31を用
いて第2図のように熱陰極保持装置を組立てヒータ5を
介して陰極チップ6を挟圧保持させる場合には、弾圧量
の調整のためにヒータ挟持アーム部31bを曲げる場合、
塑性変形部31dが曲がって調整されることになる。
In this embodiment, the mounting portion 3 separated from the heater holding portion 31c
A part of the heater holding arm portion 31b near 1a is made thin to provide a plastically deformable portion 31d. Therefore, when the hot cathode holding device is assembled using the support column 31 as shown in FIG. 2 and the cathode chip 6 is held under pressure by the heater 5, the heater holding arm portion 31b is adjusted to adjust the elastic pressure. When bending
The plastically deformable portion 31d is bent and adjusted.

そこで、ヒータ5が使用温度の高温(1500〜1600℃)に
加熱されても、塑性変形部31dはヒータ5より離れた低
温域であるので、熱的影響を殆ど受けることなく、支柱
31はヒータ5及び陰極チップ6と電気的機械的接触を安
定して維持する。また支柱31の形状を変えるのみでよい
ので、第2図のものに比較して殆どコストがアップする
ことはなく、大きさにも変更はない。この場合、塑性変
形部31dは、できるだけヒータ5より離れた部分に設け
るのが好ましいが、ヒータ挟持アーム部31bの長さのヒ
ータ挟持部31c側から2/3以上の位置であれば、実用上問
題はない。
Therefore, even if the heater 5 is heated to a high operating temperature (1500 to 1600 ° C.), the plastically deformed portion 31d is in a low temperature region apart from the heater 5, so that there is almost no thermal influence,
Reference numeral 31 stably maintains the electromechanical contact with the heater 5 and the cathode chip 6. Further, since it is only necessary to change the shape of the support column 31, there is almost no increase in cost as compared with that of FIG. 2 and the size is not changed. In this case, it is preferable to provide the plastically deformable portion 31d in a portion as far as possible from the heater 5, but if the position is at least ⅔ of the length of the heater holding arm portion 31b from the heater holding portion 31c side, it is practically used. No problem.

また本実施例においては、取付部31aとヒータ挟持アー
ム部31bとの間にスリット31eを設けている。このよう
に、スリット31eを設けると、ヒータ挟持アーム部31bの
長さが実質的に長くなり、ヒータ挟持アーム部31bを曲
げ易くなると共に、塑性変形部31dをヒータ挟持部31cよ
り一層離れた位置に設けることができ、一層効果的であ
る。
Further, in this embodiment, a slit 31e is provided between the mounting portion 31a and the heater holding arm portion 31b. As described above, when the slit 31e is provided, the length of the heater holding arm portion 31b is substantially increased, the heater holding arm portion 31b is easily bent, and the plastically deformable portion 31d is located further away from the heater holding portion 31c. It is possible to provide it in the above and is more effective.

[考案の効果] 以上の説明から明らかなように、本考案によれば、支柱
のヒータより離れた位置に塑性変形部を設けてなるの
で、部品点数が少なく、陰極チップの挟圧保持の際にお
ける作業が容易であり、そのための変形に伴う変形応力
も小さくてすみ、しかも簡単な構造でもって塑性変形部
の熱的影響を防止することができる。
[Effects of the Invention] As is apparent from the above description, according to the present invention, since the plastic deformation portion is provided at a position distant from the heater of the support, the number of parts is small, and when the clamping force of the cathode chip is held. Work is easy, the deformation stress associated with the deformation is small, and the thermal influence of the plastically deformed portion can be prevented with a simple structure.

【図面の簡単な説明】[Brief description of drawings]

第1図は本考案の熱陰極保持装置に用いる支柱の一実施
例を示し、(a)は正面図、(b)は側面図、(c)が
底面図、第2図は従来の一例を示し、(a)は正面図、
(b)は側面図、(c)は平面図、第3図は従来の他の
例を示す正面図である。 3、31:支柱、31b:ヒータ挟持アーム部、13c:ヒータ挟
持部、31d:塑性変形部、5:ヒータ、6:陰極チップ。
FIG. 1 shows an embodiment of a pillar used in the hot cathode holding device of the present invention. (A) is a front view, (b) is a side view, (c) is a bottom view, and FIG. 2 is a conventional example. Shows (a) a front view,
(B) is a side view, (c) is a plan view, and FIG. 3 is a front view showing another conventional example. 3, 31: stanchions, 31b: heater holding arm portion, 13c: heater holding portion, 31d: plastically deformed portion, 5: heater, 6: cathode chip.

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】陰極チップを一対のヒータを介して一対の
支柱で挟圧保持してなる熱陰極保持装置において、前記
支柱の取付部が絶縁基板の上面に設けられ、前記支柱が
絶縁基板を通して下方に延びており、かつ前記支柱の取
付部に近い部分を塑性変形部に構成したことを特徴とす
る熱陰極保持装置。
1. A hot cathode holding device in which a cathode chip is sandwiched and held by a pair of supporting columns via a pair of heaters, the mounting portion of the supporting columns is provided on an upper surface of an insulating substrate, and the supporting columns pass through the insulating substrate. A hot-cathode holding device, characterized in that a portion that extends downward and is close to the mounting portion of the column is a plastically deformable portion.
【請求項2】前記塑性変形部は、薄肉部から構成されて
いることを特徴とする請求項1記載の熱陰極保持装置。
2. The hot cathode holding device according to claim 1, wherein the plastically deformable portion is composed of a thin portion.
JP1989039654U 1989-04-05 1989-04-05 Hot cathode holding device Expired - Lifetime JPH0747781Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989039654U JPH0747781Y2 (en) 1989-04-05 1989-04-05 Hot cathode holding device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989039654U JPH0747781Y2 (en) 1989-04-05 1989-04-05 Hot cathode holding device

Publications (2)

Publication Number Publication Date
JPH02131243U JPH02131243U (en) 1990-10-31
JPH0747781Y2 true JPH0747781Y2 (en) 1995-11-01

Family

ID=31548759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989039654U Expired - Lifetime JPH0747781Y2 (en) 1989-04-05 1989-04-05 Hot cathode holding device

Country Status (1)

Country Link
JP (1) JPH0747781Y2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5697936A (en) * 1980-01-09 1981-08-07 Toshiba Corp Cathode structure of electron gun

Also Published As

Publication number Publication date
JPH02131243U (en) 1990-10-31

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