JPH0744445Y2 - Polishing waste liquid treatment device - Google Patents

Description

[Detailed description of the device]

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing waste liquid treatment device.

[0002]

2. Description of the Related Art Conventionally, the recycling of polishing waste liquid has been widely practiced. For example, as disclosed in Japanese Examined Patent Publication No. 58-30112, the polishing waste liquid is generally subjected to solid-liquid separation treatment and then The process liquid is regenerated by supplying the required amount of coolant.

[0003]

However, in the conventional regeneration treatment, since the solid-liquid separation is carried out by a screen, a centrifuge or the like, the fine metal particles are not sufficiently separated, or the treatment liquid obtained by the solid-liquid separation is used. In addition, while the coolant is replenished and mixed, the pH of the mixed solution is measured to control the replenishment amount of the coolant to a predetermined level, which causes various drawbacks such that quick adjustment is difficult.

The present invention pays attention to such a situation, and as a result of earnest studies from various directions to solve this, as a result, after the polishing waste liquid is agglomerated by a charge treatment device, the flow rate of the filtrate treated by a ceramic filter and It has been found that if the coolant replenishment amount is controlled based on the concentration, the above-mentioned drawbacks can be solved at once.

[0005]

That is, a polishing waste liquid treatment apparatus according to the present invention is supplied from a charging treatment apparatus which energizes a polishing waste fluid to perform a coagulation treatment, and the charging treatment apparatus directly or through an intermediate storage tank. A ceramic filter for filtering the charge treatment liquid, a regenerant storage tank for storing a regenerant liquid obtained by mixing a filtrate supplied from the ceramic filter and a coolant supplied from a coolant replenishing device, and a flow rate and concentration of the filtrate. And a coolant replenishment amount control device for controlling the replenishment amount of the coolant based on the above.

[0006]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment according to the present invention will be described below with reference to the drawings. In FIG. 1, this processing device includes a charging processing device 1, a ceramic filter 2, a coolant replenishing device 3 and a coolant replenishing amount. Control device 4, stock solution storage tank 5, intermediate storage tank 6, reclaimed liquid storage tank 7
And so on.

The charging apparatus 1 is equipped with electrodes (not shown) in the tank 8 to energize the polishing waste liquid supplied from the stock solution storage tank 5 into the tank 8 through the conduit 9 (for example, Aggregation is carried out by applying 50 V or less and 5 amps or less). This makes it possible to neutralize the charge of the suspension without depositing the suspension on the electrode, and thus to increase the particle size of the suspension by agglomeration.

Subsequently, the charge treatment liquid is sent to the intermediate storage tank 6 via the pipe line 10, and further supplied from this to the ceramic filter 2 via the pipe line 11 to be filtered. At the time of this filtration, since the suspension of the charge treatment liquid is agglomerated and the particle size becomes large, fatal clogging of the porous ceramic filter 2 (clogging that performance recovery is difficult due to backwashing) Therefore, the agglomerated particle layer laminated on the outer surface of the ceramic filter 2 can be easily peeled off by backwashing if necessary.

Hereinafter, the filtrate discharged from the ceramic filter 2 is sent to the regenerant storage tank 7 through the pipe 12, and at the same time, the coolant is replenished to the regenerant storage tank 7 by the coolant replenishing device 3. It This replenishing device 3 pumps the coolant stored in the tank 15 with the valve 13 closed and the valve 14 opened.
At 6, the coolant is circulated via lines 17 and 18. Further, the valves 13 and 14 can be opened in a predetermined manner, a part of the coolant extracted from the tank 15 can be circulated, and the remaining part can be replenished to the regenerant storage tank 7 through the pipe line 19.

In the coolant replenishment, the coolant replenishment amount control device 4 controls the replenishment amount to a predetermined value.
The replenishment amount control device 4 measures the flow rate of the filtrate supplied to the regenerant storage tank 7 through the conduit 12 with a flow meter 20 attached to the conduit 12 and measures the concentration thereof with an ultraviolet absorptiometer. The flow rate meter 22 and the valve 23 mounted on the conduit 19 are controlled in a predetermined manner based on these measurement signals to control the replenishment amount of the coolant. At that time, the valve 23 controls the increase / decrease of the coolant replenishment amount in accordance with the flow rate and concentration of the filtrate so that the polishing liquid of a constant composition suitable for use can be adjusted in the regenerant storage tank 7. Moreover, the flow meter 22 sends a correction signal to the valve 23 so as to control the flow rate to a predetermined value, and performs such control during the supply of the filtrate.

As described above, since the ultraviolet absorptiometer 21 is used as the concentration measuring means, the concentration can be measured quickly even while the filtrate is being supplied, and therefore the valve 23 can be controlled with high accuracy. It is possible to always prepare a polishing liquid having a constant composition. Although not shown in the figure, the regenerant storage tank 7 is equipped with a circulation line for circulating and mixing the supplied filtrate and the coolant, and the regenerant (polishing liquid) is adjusted in a predetermined manner. Are supplied to the polishing location by pumping.

In the figure, reference numeral 24 denotes a pump attached to each pipeline, and the sludge extracted from the tank 8 is sent to the tank 41 via the pipeline 25. Further, during the processing, the charged processing liquid (concentrated liquid) extracted from the intermediate storage tank 6 or the auxiliary intermediate storage tank 26 passes through the pipeline 27 and the pipeline 29 to which the ultraviolet sterilizer 28 is attached, and the intermediate storage tank 6
Is circulated to. At that time, the surplus highly-charged treatment liquid is sent to the tank 30.

The backwashing of the ceramic filter 2 is carried out by supplying pressurized air from a device 31 equipped with a compressor or the like, or by supplying cleaning water or a chemical solution to the ceramic filter 2 via the conduits 32 and 11. be able to. Nitric acid, caustic soda, or the like can be used as the chemical liquid, but each of them is stored in the chemical liquid tanks 33 and 34 and the cleaning water is stored in the tank 35. The wastewater generated during the backwash is sent to the post-treatment process via the pipelines 36 and 37. A heat exchanger 38 is attached to the pipe 36, and a pipe 39 is attached so that the chemical liquid or the cleaning water can be collected. 40 is a flow meter.

Although one embodiment according to the present invention has been described above, in the present invention, the charge processing liquid is directly supplied from the charge processing device 1 to the ceramic filter 2 without installing the intermediate storage tank 6. Good. Also, the coolant is
It may be of any composition, such as one containing a polishing powder dispersant such as a surfactant, an agglomeration inhibitor or a rust preventive agent, and other liquid additive for polishing liquid.

[0015]

As described above, according to the present invention, since the ceramic filter is used, it is possible to perform microfiltration, and at the same time, it is charged before the filtration.
The fatal clogging of the ceramic filter can be prevented, and the backwashing performed as necessary can be further facilitated.

Further, since the coolant replenishment amount control device is mounted, a replenishing liquid (polishing liquid) suitable for reuse can be replenished with a predetermined amount of coolant corresponding to the flow rate and concentration of the filtered liquid with high precision. Can be adjusted quickly.

[Brief description of drawings]

FIG. 1 is a flow sheet diagram of a polishing waste liquid processing apparatus.

[Explanation of reference symbols] 1 charge processing device 2 ceramic filter 3 coolant replenishing device 4 coolant replenishment amount control device 5 stock solution storage tank 6 intermediate storage tank 7 reclaimed liquid storage tank 20 flow meter 21 ultraviolet light absorber 22 flow meter 23 valve

Claims (1)

[Scope of utility model registration request] 1. A charging processing device for energizing a polishing waste liquid to perform coagulation processing, a ceramic filter for filtering a charging processing liquid supplied directly from the charging processing device or through an intermediate storage tank, and a ceramic filter. Replenishing liquid storage tank for storing a regenerating liquid obtained by mixing a filtered liquid and a coolant supplied from a coolant replenishing device, and a coolant replenishing amount control device for controlling the replenishing amount of the coolant based on the flow rate and concentration of the filtered liquid. And a polishing waste liquid treatment device.