JPH0733232A - Device for positioning liquid crystal substrate - Google Patents

Device for positioning liquid crystal substrate

Info

Publication number
JPH0733232A
JPH0733232A JP20119293A JP20119293A JPH0733232A JP H0733232 A JPH0733232 A JP H0733232A JP 20119293 A JP20119293 A JP 20119293A JP 20119293 A JP20119293 A JP 20119293A JP H0733232 A JPH0733232 A JP H0733232A
Authority
JP
Japan
Prior art keywords
substrate
liquid crystal
crystal substrate
sensors
turntable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20119293A
Other languages
Japanese (ja)
Other versions
JP3383956B2 (en
Inventor
Yukio Moriyama
幸男 森山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daihen Corp
Original Assignee
Daihen Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daihen Corp filed Critical Daihen Corp
Priority to JP20119293A priority Critical patent/JP3383956B2/en
Publication of JPH0733232A publication Critical patent/JPH0733232A/en
Application granted granted Critical
Publication of JP3383956B2 publication Critical patent/JP3383956B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To correct the displacements at the time of carrying a substrate into the processing chamber inside a liquid crystal manufacturing processor automatically without adding external force by detecting the displacements of the center position of the substrate and the direction of rotation occurring inside a cassette, and driving a table, whereon the substrate is put, so as to connect the displacements. CONSTITUTION:This device is composed of a turn table 3, which sucks and rotates a substrate 2, a lifter 10, which floats the substrate 2 from the turn table, sensors 7a, 7b, 7c, 7d, and 7e, which detect the displacements of the direction rotation of the substrate 2 and the directions X and Y. The quantity of displacement in the direction of rotation of the substrate 2 is operated from the difference of the quantities of displacements before two pieces of sensors 7a and 7b driven in X direction detecting the edge position of the substrate 2. The displacement in the direction of rotation is corrected by rotating the turn table 3, and then the sensors 7a and 7b in X direction and the sensors 7d and 7e in Y direction detect and operate the quantity of displacement of the center position of the substrate 2, and a lifter 10 and the turn table 3 correct the center position of the substrate 2.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】液晶の製造プロセス装置の内部に
液晶用基板を搬送する際に、基板の中心位置と回転方向
にズレが生じたまま搬送すると、プロセス上の欠陥や基
板の破壊を生じることになる。本発明は、これらズレを
補正して、プロセス装置の適正な位置への基板の搬送を
実現し、プロセスの歩留まり向上に貢献するものであ
る。
[Industrial field of application] When a liquid crystal substrate is transported into a liquid crystal manufacturing process apparatus, if it is transported with a deviation from the center position of the substrate and the direction of rotation, process defects and substrate destruction may occur. It will be. The present invention corrects these deviations to realize the transfer of the substrate to an appropriate position of the process apparatus, and contributes to the improvement of the process yield.

【0002】[0002]

【従来の技術】液晶画面用のガラス基板は、一般的に長
方形をしておりその大きさは年々増大傾向にあり、現在
500mm×600mm×0.7tが主流である。液晶
用基板は、このガラス板の表面に、各種プロセス装置で
薄膜を蒸着したり、エッチングをして必要なトランジス
タを形成し、基板表面に形成されたトランジスタで、基
板裏面からのライトの光の透過率を制御して、人間の目
に認知させる構造なので、基板の透明度を限りなく向上
させる必要がありまたその努力がなされている。これら
薄膜の蒸着とか、エッチング処理をプロセスと呼び、こ
れらは各プロセス毎に装置化されている。一方これら基
板は、一般的にカセットと呼ばれる基板収納ケースに1
0数枚単位で収納され、各種プロセス装置には、このカ
セット単位で搬送される。搬送された基板は、各種プロ
セス装置のロボット等の搬送機でカセットから取り出さ
れ、装置の内部に搬送されて必要な処理をされる。また
処理終了後、再度搬送機でカセットに戻され、次の装置
にと搬送される。
2. Description of the Related Art Generally, a glass substrate for a liquid crystal screen has a rectangular shape, and its size tends to increase year by year. Currently, a size of 500 mm × 600 mm × 0.7 t is predominant. A liquid crystal substrate is a transistor formed on the front surface of the glass plate by depositing a thin film on the surface of this glass plate by various process equipment or by etching to form a required transistor. Since the structure is such that the transmittance is controlled so that it can be recognized by the human eye, it is necessary and endeavored to improve the transparency of the substrate as much as possible. The vapor deposition of these thin films and the etching process are called processes, and these are made into devices for each process. On the other hand, these boards are stored in a board storage case that is generally called a cassette.
It is accommodated in units of 0 and several sheets, and is conveyed to various process apparatuses in units of this cassette. The transferred substrate is taken out of the cassette by a transfer device such as a robot of various process devices, transferred to the inside of the device, and subjected to necessary processing. Further, after the processing is completed, it is returned to the cassette by the transport device and transported to the next device.

【0003】図1は一般的な液晶用基板の製造プロセス
装置の概念図を示し、1はカセット、2は基板を示し、
12はこの基板の処理室を示している。カセットに収納
された基板は、ロボットで3の処理室に搬送され、処理
完了後ロボットで再びカセット内部へと回収される。処
理室には基板と同じ形状大きさのテーブルがあり、搬送
された基板はこのテーブルからはみ出さないよう精度よ
く設置する必要がある。しかしながら図1の構成では、
搬送ロボットは、予め教示された位置間を動作するだけ
なので、カセット内部で生じた基板のズレを含んだまま
処理室のテーブルに基板が設置されてしまう。
FIG. 1 is a conceptual diagram of a general manufacturing process apparatus for liquid crystal substrates, 1 is a cassette, 2 is a substrate,
Reference numeral 12 indicates a processing chamber for this substrate. The substrate stored in the cassette is transferred to the processing chamber 3 by the robot, and after the processing is completed, the substrate is collected again inside the cassette. There is a table having the same shape and size as the substrate in the processing chamber, and it is necessary to install the transported substrate with high accuracy so as not to stick out of this table. However, in the configuration of FIG.
Since the transfer robot only moves between the positions taught in advance, the substrate is set on the table in the processing chamber while containing the displacement of the substrate generated inside the cassette.

【0004】装置は、カセットの位置決め機構を有して
いるが、カセットは基板の出入のため、基板の外形より
若干大きめに作られており、カセット内の基板はカセッ
トに対し、中心位置と回転方向のズレをもつことがある
ため、カセットの位置決め機構だけでは不十分といえ
る。また、基板そのものの外形も若干誤差を含んでい
る。
The apparatus has a cassette positioning mechanism, but the cassette is made slightly larger than the outer shape of the substrate in order to move the substrate in and out. It can be said that the cassette positioning mechanism alone is not sufficient because it may have a deviation in direction. In addition, the outer shape of the substrate itself includes some errors.

【0005】カセットが装置に搬送されたとき、内部の
基板はカセットの中心に位置せず、カセットのどちらか
のエッジに当たって止まっている場合がほとんどで、カ
セットの中心と基板の中心が合っていないかぎり、内部
の基板は位置がズレていることになり、プロセス装置の
搬送機で、そのままカセットから基板を取り出し、プロ
セス装置の処理室に搬送すると、基板の位置ズレで装置
内部の処理室にうまくセットされない場合がでてくる。
When the cassette is transferred to the apparatus, the internal substrate is not located at the center of the cassette and almost always hits either edge of the cassette and stops, so that the center of the cassette is not aligned with the center of the substrate. As long as the substrate inside is out of position, the substrate is taken out of the cassette by the carrier of the process equipment and transferred to the process chamber of the process equipment. In some cases, it will not be set.

【0006】そこで、この位置ズレを修正するための手
段として図2に示す修正機構が設けられている。図2に
おいて1はカセットで2は基板、13はプッシャーで2
の基板の左右両端を挟み付け基板の左右方向の位置合わ
せをするための機構で、たとえば左右のプッシャーはラ
ックピニオンで連結され一方はシリンダのような駆動源
につながっている。カセットの左右両端は、このプッシ
ャーが基板を挟み付けるために必要な空間が確保されて
いる。いまシリンダが働けば、左右のプッシャーは均等
に基板側に移動し、基板を押していく。プッシャーが停
止したときの間隔を基板の外径よりわずか大きめに取っ
ておけば、カセット内の全ての基板の左右方向の位置が
補正されたことになる。しかしこの機構を以てしても、
左右方向の位置補正だけなので、前後方向の位置補正の
ために、カセットを液晶製造プロセス装置に搬入すると
き、前後方向を揃えるために一旦カセットを作業者が人
力にて傾け端面の位置を揃えた後に装置のカセット台に
設置しなければならなかった。
Therefore, a correction mechanism shown in FIG. 2 is provided as a means for correcting this positional deviation. In FIG. 2, 1 is a cassette, 2 is a substrate, and 13 is a pusher.
Is a mechanism for sandwiching the left and right ends of the board to position the board in the left-right direction. For example, the left and right pushers are connected by a rack and pinion, and one is connected to a drive source such as a cylinder. At the left and right ends of the cassette, a space necessary for the pusher to sandwich the substrate is secured. If the cylinder now works, the left and right pushers will move to the substrate side evenly and push the substrate. If the spacing when the pusher stops is set to be slightly larger than the outer diameter of the substrate, the horizontal positions of all the substrates in the cassette are corrected. However, even with this mechanism,
Since only the horizontal position correction is performed, when the cassette is loaded into the liquid crystal manufacturing process device for the front-back position correction, the operator manually tilts the cassette to align the front-back direction, and the positions of the end faces are aligned manually. Later it had to be installed on the cassette stand of the device.

【0007】[0007]

【発明が解決しようとする課題】しかしこの方法では、
ガラス基板の両端に機械的に力が加わるため、基板のエ
ッジに欠け(チッピング)が発生し、基板の割れの原因
となり、歩留まりを悪くするばかりでなく、チッピング
はプロセスを重ねる毎に成長するのでこれが最終工程で
発生すれば、その付加価値の向上に比例して損失は膨大
となる。また接触式のためゴミを発生し、このゴミが致
命的な不良品を作ることになる。さらに、カセットの重
量は十数Kgもあり、運ぶだけでも大変なものを人手で
さらに位置合わせの操作までも強要されているため、操
作ミスおよび操作忘れ等の危険性を含んでいた。
However, in this method,
Since mechanical force is applied to both ends of the glass substrate, chipping (chipping) occurs at the edge of the substrate, which causes cracking of the substrate, which not only deteriorates the yield but also chipping grows as the process is repeated. If this occurs in the final process, the loss will be enormous in proportion to the improvement in added value. Further, since it is a contact type, dust is generated, and this dust makes a fatal defective product. Further, the weight of the cassette is more than ten kilograms, and even if the cassette is carried, it is difficult to manually perform a positioning operation. Therefore, there is a risk of an operation error or a forgetting operation.

【0008】[0008]

【課題を解決するための手段】本発明は、前記従来技術
の課題を解決するために、カセット内部で生じた基板の
中心位置と回転方向のズレをセンサーで検出し、センサ
ーの検出値からズレ量を演算して、演算結果に応じて基
板を乗せたテーブルを駆動してズレを修正するものであ
る。
In order to solve the above-mentioned problems of the prior art, the present invention detects the deviation of the center position and the rotation direction of the substrate inside the cassette with a sensor and deviates from the detection value of the sensor. The amount is calculated, and the table on which the substrate is placed is driven according to the calculation result to correct the deviation.

【0009】[0009]

【実施例】図3は本発明の全体図を示すもので、1はカ
セット、2は基板を示し、ロボットで基板2を処理室1
2に搬送する前に、本発明の位置決め装置14でいった
ん位置決め後、処理室12に搬送する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 3 shows an overall view of the present invention, in which 1 is a cassette, 2 is a substrate, and a substrate 2 is a processing chamber 1 by a robot.
Before being transferred to the processing chamber 2, the positioning device 14 of the present invention positions the film and then transfers it to the processing chamber 12.

【0010】図4は本発明の液晶用基板の位置決め装置
の詳細を示す図である。同図において、3は基板2を吸
着し旋回させるターンテーブルで、4はその旋回駆動
源、5はターンテーブル3および旋回駆動源4を左右
(Y方向)に、6は前後方向(X方向)に移動する駆動
源を示し、たとえばモータのようなものが使用できる。
10はリフターであり、基板2をターンテーブル3から
浮かす機構、11はリフター10を上下方向に移動させ
る駆動源を示す。
FIG. 4 is a diagram showing details of the liquid crystal substrate positioning apparatus of the present invention. In the figure, 3 is a turntable for adsorbing and turning the substrate 2, 4 is its turning drive source, 5 is the turntable 3 and turning drive source 4 left and right (Y direction), and 6 is the front-back direction (X direction). A drive source that moves to, such as a motor can be used.
Reference numeral 10 is a lifter, a mechanism for floating the substrate 2 from the turntable 3, and 11 is a drive source for moving the lifter 10 in the vertical direction.

【0011】7a、7b、7c、7dおよび7eは、基
板2のエッジを検出するセンサーで各センサーはそれぞ
れを中心方向に駆動する駆動源8a、8b、9aおよび
9bによって進入、退避する。7a、7bは基板2の同
一辺に対応する位置に直線上に配置され、基板2の回転
方向のズレを計測する。7a、7cはX方向、7d、7
eはY方向の基板のズレ量の計測用で、各々の駆動源で
同時に同量ずつ基板方向に移動される。本図は各々に駆
動源を準備したが、例えば左右逆ネジのボールネジ等を
使用すれば駆動源8a、8bまたは9a、9bをそれぞ
れ1つにできることは言うまでもない。
Reference numerals 7a, 7b, 7c, 7d and 7e denote sensors for detecting the edge of the substrate 2, and each sensor is moved in and out by drive sources 8a, 8b, 9a and 9b which drive the respective elements in the central direction. 7a and 7b are arranged on a straight line at positions corresponding to the same side of the substrate 2, and the displacement in the rotation direction of the substrate 2 is measured. 7a and 7c are in the X direction, 7d and 7
e is for measuring the amount of displacement of the substrate in the Y direction, and each driving source simultaneously moves the same amount toward the substrate. Although the drive sources are prepared for each of the figures, it is needless to say that the drive sources 8a, 8b or 9a, 9b can be respectively provided by using, for example, left and right reverse screw ball screws.

【0012】図5は、基板2を本装置に置いたときの位
置関係の例を示す図である。aは本装置の中心位置を示
し、bは基板2の中心位置で一般的にはそれらは合って
おらず、XYおよびθの3方向のズレを有している。こ
れらズレの3成分をΔX、ΔY、Δθとする。ここで、
一意的にこの3成分を計測するのは困難なので、まずΔ
θを計測しこれを補正し、その後ΔXΔYを補正する。
FIG. 5 is a diagram showing an example of the positional relationship when the substrate 2 is placed in this apparatus. “A” indicates the center position of the present apparatus, and “b” indicates the center position of the substrate 2, which are generally not aligned and have deviations in three directions of XY and θ. The three components of these deviations are ΔX, ΔY, and Δθ. here,
It is difficult to uniquely measure these three components, so first of all Δ
θ is measured and corrected, and then ΔXΔY is corrected.

【0013】図6はΔθの補正の方法を示す図である。
図6(a) において、センサー7aと7bはY方向の中心
から各々Y方向に(1/2)×Lの等距離離れて配置さ
れている。またこのセンサーが同時にオンすれば、Δθ
=0となるようにY軸に平行に設けられ、かつX軸方向
の駆動軸をもった単一のテーブルに設置されている。ま
ず、センサー7aと7bが前進し、基板の1辺のエッジ
を探す。センサー7aがオン後センサー7bがオンする
までの移動量をHとする。センサー7aとセンサー7b
は、L離れて配置されているので、Δθを、 tan(Δθ)=H/L で求め、かつセンサー7aとセンサー7bの2つのセン
サーのオンの順序により回転方向を判別する。
FIG. 6 is a diagram showing a method of correcting Δθ.
In FIG. 6 (a), the sensors 7a and 7b are arranged at an equal distance of (1/2) × L in the Y direction from the center in the Y direction. If this sensor turns on at the same time, Δθ
It is installed parallel to the Y-axis so that = 0, and is installed on a single table having a drive axis in the X-axis direction. First, the sensors 7a and 7b move forward to search for one side edge of the substrate. The moving amount after the sensor 7a is turned on until the sensor 7b is turned on is H. Sensor 7a and sensor 7b
Since they are arranged apart from each other by L, Δθ is obtained by tan (Δθ) = H / L, and the rotation direction is determined by the turn-on order of the two sensors 7a and 7b.

【0014】以上で求めたΔθの1/2だけ、ターンテ
ーブルを逆方向に旋回して基板2の回転方向のズレを修
正して、図6(b) のように、基板2をXY方向と平行に
位置させる。
The turntable is swung in the opposite direction by 1/2 of Δθ obtained above to correct the deviation of the rotation direction of the substrate 2, and the substrate 2 is moved in the XY directions as shown in FIG. 6 (b). Position in parallel.

【0015】次に、ΔX、ΔYのズレを修正する。図6
(c) および(d) に示されたセンサー7aと7c、および
7dと7eは,最初塗り潰した四角で示された位置にお
り、かつターンテーブルを中心に等間隔で配置され、相
対向するセンサー間の距離はMおよびNになっている。
さらにセンサー7aと7cは駆動源により同時に同量ず
つ相互に接近離反するように反対方向に動作する。ま
た、センサー7dと7eも同じ機構になっている。
Next, the deviation between ΔX and ΔY is corrected. Figure 6
The sensors 7a and 7c, and 7d and 7e shown in (c) and (d) are located at the positions indicated by the solid squares at the beginning, and are arranged at equal intervals around the turntable. The distance between them is M and N.
Further, the sensors 7a and 7c are operated in opposite directions by the driving source so that the sensors 7a and 7c simultaneously approach and separate from each other by the same amount. Further, the sensors 7d and 7e have the same mechanism.

【0016】いま、センサー7aと7cが基板のエッジ
方向に移動し、図6の(c) のように実線の四角で示され
た位置でセンサー7cがオン後さらにΔM移動して点線
の四角の位置でセンサー7aがオンしたとする。この結
果からX軸方向のズレ量ΔXは ΔX=1/2×ΔM から求め、ズレの方向は7aと7cの各センサーのオン
の順序により判別する。
Now, the sensors 7a and 7c are moved in the direction of the edge of the substrate, and the sensor 7c is further turned on at a position indicated by a solid line square as shown in FIG. It is assumed that the sensor 7a is turned on at the position. From this result, the shift amount ΔX in the X-axis direction is obtained from ΔX = 1/2 × ΔM, and the shift direction is determined by the turn-on order of the sensors 7a and 7c.

【0017】次に、図6(d) のようにセンサー7dと7
eを基板2の方向に駆動して、実線の四角の位置でセン
サー7dがオンしその後ΔN移動して点線の四角の位置
でセンサー7eがオンするまで駆動してY方向のズレ量
ΔYを、 ΔY=1/2×ΔN から求め、また方向をセンサー7dと7eのオンの順序
で判別する。
Next, as shown in FIG. 6 (d), the sensors 7d and 7
By driving e in the direction of the substrate 2, the sensor 7d is turned on at the position of the solid line square and then moved by ΔN until the sensor 7e is turned on at the position of the dotted line square, and the deviation amount ΔY in the Y direction is It is determined from ΔY = 1/2 × ΔN, and the direction is determined in the order of turning on the sensors 7d and 7e.

【0018】この後ターンテーブルを−ΔX、−ΔY移
動させた後、いったんリフター10で基板2をターンテ
ーブル3から浮かし、ターンテーブル3を元の位置に戻
したのちリフター10を下降すれば、基板2の中心位置
が本ユニットの中心位置に合い、センタリングが完了し
たことになる。上記の動作をフロー図で示すと図7のよ
うになる。
After that, after the turntable is moved by -.DELTA.X and -.DELTA.Y, the substrate 2 is once lifted from the turntable 3 by the lifter 10, the turntable 3 is returned to the original position, and then the lifter 10 is lowered. The center position of 2 matches the center position of this unit, and the centering is completed. The above operation is shown in a flowchart of FIG.

【0019】上記は、X、Y方向の2次元の駆動源を用
いたものであるが、X軸またはY軸のどちらか一方と既
にある旋回軸の2軸で、ΔX、ΔYの修正を行なうこと
も可能である。図8はこの方法を説明するための図であ
り、旋回方向の補正およびX、Y方向のズレ量ΔX、Δ
Yを求めるところまでは図6に示した方法と同じであ
る。図6の方法で求めたΔX、ΔYより、図8(a) に示
すように、 tan(Δα)=ΔX/ΔY より中心位置からの偏位角Δαを求める。次に、修正軸
X方向にベクトル(ΔX,ΔY)をあわすため、図8の
(b) のように、基板2をΔα分旋回させる。次にターン
テーブル3を、X軸方向に図8の(c) のようにベクトル
の絶対値分、 −|(ΔX,ΔY)| を移動させ、次にリフター10で基板2を浮かしてお
き、ターンテーブル3を元位置に戻したのちリフター1
0を下降して基板をターンテーブル3に乗せる。最後
に、−Δα分旋回すれば、図8の(d) のように基板は期
待された中心位置に修正されたことになる。上記の制御
をフロー図で示すと図9のようになる。
The above description uses a two-dimensional drive source in the X and Y directions, but the correction of ΔX and ΔY is performed on either the X axis or the Y axis and the existing two rotation axes. It is also possible. FIG. 8 is a diagram for explaining this method, in which the correction in the turning direction and the deviation amounts ΔX and Δ in the X and Y directions are performed.
The method until obtaining Y is the same as the method shown in FIG. From ΔX and ΔY obtained by the method of FIG. 6, as shown in FIG. 8A, the deviation angle Δα from the center position is obtained from tan (Δα) = ΔX / ΔY. Next, in order to distribute the vector (ΔX, ΔY) in the correction axis X direction,
As in (b), the substrate 2 is rotated by Δα. Next, the turntable 3 is moved in the X-axis direction by − | (ΔX, ΔY) | by the absolute value of the vector as shown in FIG. 8C, and then the substrate 2 is floated by the lifter 10. After returning the turntable 3 to the original position, the lifter 1
0 is lowered and the substrate is placed on the turntable 3. Finally, if the substrate is rotated by -Δα, the substrate is corrected to the expected center position as shown in Fig. 8D. The above control is shown in a flow chart of FIG.

【0020】なお、位置検出に使用するセンサはその取
り付け誤差やセンサそのものの感度誤差によって検出結
果に相当量の誤差を生ずることが考えられる。そこで本
発明の第3の発明においては、このような機構上の誤差
を、予め中心位置に設置した液晶用基板をモデルとして
用いて、このモデル基板を各センサで位置検出し、その
ときに得られる位置データをセンサの固有の誤差として
記憶しておき、実際の基板の位置を検出したときには、
この固有誤差分をオフセット量としてデータから差し引
いてセンサの取り付け位置誤差や感度誤差を自動的に補
正する。この結果センサの取付け精度や検出感度をそれ
ほど厳密に規定しなくてもよくなり、装置のメンテナン
ス時や故障発生時にこれらを取外して点検したりまたは
新品と取替える時にも作業が極めて簡単になる。
It is conceivable that the sensor used for position detection may cause a considerable amount of error in the detection result due to its mounting error and sensitivity error of the sensor itself. Therefore, in the third aspect of the present invention, such a mechanical error is detected by using the liquid crystal substrate installed in the center position in advance as a model and detecting the position of the model substrate with each sensor. The stored position data is stored as an error inherent to the sensor, and when the actual position of the board is detected,
This peculiar error is subtracted from the data as an offset amount to automatically correct the sensor mounting position error and sensitivity error. As a result, the mounting accuracy and detection sensitivity of the sensor do not have to be specified so strictly, and the work becomes extremely easy even when these are removed and inspected or replaced with a new one at the time of maintenance or failure of the device.

【0021】[0021]

【本発明の効果】本発明においては、基板を液晶製造プ
ロセス装置内の処理室に搬送する際、カセット内部で生
じた基板の中心位置と回転方向のズレを全自動で、かつ
基板に外力を加えること無く補正することができるの
で、従来問題であっった基板の割れの原因となるチッピ
ングとかゴミの発生を最小限におさえることができると
ともに、人手による位置合わせも不要となり、液晶基板
の生産の能率向上、歩留まり向上および信頼性の向上に
顕著な効果が得られるものである。
According to the present invention, when the substrate is transferred to the processing chamber in the liquid crystal manufacturing process apparatus, the deviation between the center position and the rotation direction of the substrate generated in the cassette is fully automatic and an external force is applied to the substrate. Since it can be corrected without adding, it can minimize chipping and dust generation, which are the causes of cracking of the substrate, which was a problem in the past, and it also eliminates the need for manual alignment, thus producing liquid crystal substrates. It is possible to obtain a remarkable effect in improving efficiency, yield, and reliability.

【図面の簡単な説明】[Brief description of drawings]

【図1】従来の装置の例を示す全体図である。FIG. 1 is an overall view showing an example of a conventional device.

【図2】図1の装置に使用する従来の位置決め装置の例
を示す図である。
FIG. 2 is a diagram showing an example of a conventional positioning device used in the device of FIG.

【図3】本発明の位置決め装置の実施例を示す全体図で
ある。
FIG. 3 is an overall view showing an embodiment of a positioning device of the present invention.

【図4】図3の実施例の構造を説明するための図であ
る。
FIG. 4 is a diagram for explaining the structure of the embodiment of FIG.

【図5】基板を本装置に設置されたときの位置関係を示
す図である。
FIG. 5 is a diagram showing a positional relationship when a substrate is installed in this apparatus.

【図6】基板のズレの修正方法を説明するための図であ
る。
FIG. 6 is a diagram for explaining a method of correcting the displacement of the substrate.

【図7】基板のズレの修正手順を示すフロー図である。FIG. 7 is a flowchart showing a procedure for correcting a displacement of a board.

【図8】基板のズレの修正方法の別の例を説明するため
の図である。
FIG. 8 is a diagram for explaining another example of the method for correcting the displacement of the substrate.

【図9】基板のズレの修正方法の別の例の手順を示すフ
ロー図である。
FIG. 9 is a flowchart showing the procedure of another example of the method of correcting the displacement of the substrate.

【符号の説明】[Explanation of symbols]

1 カセット 2 液晶基板 3 ターンテーブル 4 駆動源 5 駆動源 6 駆動源 7a、7b、7c、7d、7e センサー 8a、8b 駆動源 9a、9b 駆動源 10 リフター 11 駆動源 12 処理室 13 プッシャー 14 液晶位置決め装置 a 位置決め装置の中心 b 基板の中心 1 cassette 2 liquid crystal substrate 3 turntable 4 drive source 5 drive source 6 drive source 7a, 7b, 7c, 7d, 7e sensor 8a, 8b drive source 9a, 9b drive source 10 lifter 11 drive source 12 processing chamber 13 pusher 14 liquid crystal positioning Device a Center of positioning device b Center of substrate

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】旋回およびXY平面上を移動するターンテ
ーブルと、前記ターンテーブル上に液晶用基板を固定す
るための吸着機構と、前記ターンテーブルから前記液晶
用基板を浮かすためのリフターと、前記液晶用基板の4
辺のうち1辺のエッジの位置を検出する同一駆動機構上
のY方向に配置された第1および第2のX方向センサー
と、前記第1および第2のセンサーをX方向に移動する
ための第1の駆動源と、前記2個のセンサーを載置する
前記駆動機構の移動量を計測するための検出器と、前記
液晶用基板の他の辺のエッジの位置を検出するためのY
方向センサーと、前記Y方向センサーをY方向に移動す
るための第2の駆動源と、前記Y方向センサーの基準位
置から前記液晶用基板の他の辺のエッジの検出位置まで
の移動量を計測するための検出器と、前記2個のX方向
センサーのうちの一方が前記前記液晶用基板のエッジの
位置を検出してから他方のX方向センサーがエッジを検
出するまでの移動量から前記液晶用基板の旋回方向の修
正量を算出する演算手段と、前記演算手段の出力によっ
て前記ターンテーブルを旋回させた後に前記X方向セン
サーと前記Y方向センサーとによって前記液晶用基板の
X方向Y方向の各エッジ位置を検出して検出結果から前
記液晶用基板の中心位置のズレ量を演算し前記中心位置
ズレ量演算結果によって前記リフターと前記ターンテー
ブルとを駆動して前記液晶用基板を中心位置に移動させ
る制御回路とを備えた液晶用基板の位置決め装置。
1. A turntable rotating and moving on an XY plane, a suction mechanism for fixing a liquid crystal substrate on the turntable, a lifter for floating the liquid crystal substrate from the turntable, LCD substrate 4
First and second X-direction sensors arranged in the Y direction on the same drive mechanism for detecting the position of one of the sides, and for moving the first and second sensors in the X direction A first drive source, a detector for measuring the amount of movement of the drive mechanism that mounts the two sensors, and a Y for detecting the position of the edge of the other side of the liquid crystal substrate.
A direction sensor, a second drive source for moving the Y direction sensor in the Y direction, and a movement amount from a reference position of the Y direction sensor to a detection position of an edge of another side of the liquid crystal substrate. And a movement amount from one of the two X-direction sensors detecting the position of the edge of the liquid crystal substrate to the other X-direction sensor detecting the edge. Calculating means for calculating a correction amount in the turning direction of the liquid crystal substrate, and after turning the turntable by the output of the calculating means, the X direction sensor and the Y direction sensor are used to measure the X direction and the Y direction of the liquid crystal substrate. Each edge position is detected, the deviation amount of the central position of the liquid crystal substrate is calculated from the detection result, and the lifter and the turntable are driven according to the central position deviation amount calculation result. Positioning device of a liquid crystal substrate and a control circuit for moving the serial LCD substrate to the center position.
【請求項2】前記ターンテーブルの移動方向をX方向ま
たはY方向のいずれか一方とした請求項1に記載の液晶
用基板の位置決め装置。
2. The liquid crystal substrate positioning apparatus according to claim 1, wherein the turntable is moved in either the X direction or the Y direction.
【請求項3】前記各センサーの、取り付け上および部品
のバラツキ等による位置検出誤差をあらかじめ旋回方向
およびXY方向のズレのない液晶用基板の位置を検出す
ることにより得られた誤差をオフセットとして使用する
ことにより前記誤差を自動補正する請求項1に記載の液
晶用基板の位置決め装置。
3. An error obtained by previously detecting a position of a liquid crystal substrate having no deviation in the turning direction and the XY direction is used as an offset for a position detection error of each sensor due to mounting or variation of parts. The liquid crystal substrate positioning apparatus according to claim 1, wherein the error is automatically corrected by performing the above operation.
JP20119293A 1993-07-20 1993-07-20 Liquid crystal substrate positioning device Expired - Fee Related JP3383956B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20119293A JP3383956B2 (en) 1993-07-20 1993-07-20 Liquid crystal substrate positioning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20119293A JP3383956B2 (en) 1993-07-20 1993-07-20 Liquid crystal substrate positioning device

Publications (2)

Publication Number Publication Date
JPH0733232A true JPH0733232A (en) 1995-02-03
JP3383956B2 JP3383956B2 (en) 2003-03-10

Family

ID=16436876

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20119293A Expired - Fee Related JP3383956B2 (en) 1993-07-20 1993-07-20 Liquid crystal substrate positioning device

Country Status (1)

Country Link
JP (1) JP3383956B2 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0871667A (en) * 1994-09-12 1996-03-19 Amada Co Ltd Work turning device with work deviation detecting function
US5740059A (en) * 1995-05-18 1998-04-14 Kabushiki Kaisha Toshiba Method of transporting substrates and apparatus for transporting substrates
KR100488928B1 (en) * 1997-12-11 2005-10-26 비오이 하이디스 테크놀로지 주식회사 Liquid Crystal Cell and Cassette Aligner
US7063541B2 (en) 1997-03-17 2006-06-20 Formfactor, Inc. Composite microelectronic spring structure and method for making same
CN103662820A (en) * 2013-12-23 2014-03-26 苏州博众精工科技有限公司 Jacking correction mechanism
CN109865953A (en) * 2019-04-23 2019-06-11 安徽速达数控设备有限责任公司 A kind of material position to be cut automatic correction device and its application method
CN111180377A (en) * 2018-11-13 2020-05-19 三星显示有限公司 Mask box aligning device and method for aligning mask box
CN112191617A (en) * 2020-09-22 2021-01-08 惠州市富丽电子有限公司 Downthehole foreign matter of polaroid cleanness verifying attachment
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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0871667A (en) * 1994-09-12 1996-03-19 Amada Co Ltd Work turning device with work deviation detecting function
US5740059A (en) * 1995-05-18 1998-04-14 Kabushiki Kaisha Toshiba Method of transporting substrates and apparatus for transporting substrates
US6327512B1 (en) 1995-05-18 2001-12-04 Kabushiki Kaisha Toshiba Method and apparatus using positional data detected in a non-contact manner to transfer a substrate from a first position to a second position
US7063541B2 (en) 1997-03-17 2006-06-20 Formfactor, Inc. Composite microelectronic spring structure and method for making same
KR100488928B1 (en) * 1997-12-11 2005-10-26 비오이 하이디스 테크놀로지 주식회사 Liquid Crystal Cell and Cassette Aligner
CN103662820A (en) * 2013-12-23 2014-03-26 苏州博众精工科技有限公司 Jacking correction mechanism
CN111180377A (en) * 2018-11-13 2020-05-19 三星显示有限公司 Mask box aligning device and method for aligning mask box
CN109865953A (en) * 2019-04-23 2019-06-11 安徽速达数控设备有限责任公司 A kind of material position to be cut automatic correction device and its application method
CN109865953B (en) * 2019-04-23 2024-01-19 安徽速达数控设备有限责任公司 Automatic correction device for position of material to be cut and use method thereof
CN112191617A (en) * 2020-09-22 2021-01-08 惠州市富丽电子有限公司 Downthehole foreign matter of polaroid cleanness verifying attachment
CN113526000A (en) * 2021-07-21 2021-10-22 迈达微(深圳)半导体技术有限公司 Circuit board correction system

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