JPH073311Y2 - Semiconductor differential pressure measuring device - Google Patents

Semiconductor differential pressure measuring device

Info

Publication number
JPH073311Y2
JPH073311Y2 JP14041588U JP14041588U JPH073311Y2 JP H073311 Y2 JPH073311 Y2 JP H073311Y2 JP 14041588 U JP14041588 U JP 14041588U JP 14041588 U JP14041588 U JP 14041588U JP H073311 Y2 JPH073311 Y2 JP H073311Y2
Authority
JP
Japan
Prior art keywords
sensor chip
semiconductor
diaphragm
liquid contact
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP14041588U
Other languages
Japanese (ja)
Other versions
JPH0260838U (en
Inventor
賢一 吉岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yokogawa Electric Corp
Original Assignee
Yokogawa Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yokogawa Electric Corp filed Critical Yokogawa Electric Corp
Priority to JP14041588U priority Critical patent/JPH073311Y2/en
Publication of JPH0260838U publication Critical patent/JPH0260838U/ja
Application granted granted Critical
Publication of JPH073311Y2 publication Critical patent/JPH073311Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【考案の詳細な説明】 〈産業上の利用分野〉 本考案は、装置の小形化、構造の簡素化、信頼性の向上
し得る半導体差圧測定装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION <Industrial field of application> The present invention relates to a semiconductor differential pressure measuring device capable of downsizing the device, simplifying the structure, and improving reliability.

〈従来の技術〉 第4図は従来より一般に使用されている従来例の構成説
明図である。
<Prior Art> FIG. 4 is an explanatory view of a configuration of a conventional example which is generally used in the past.

図において、 1は半導体よりなるセンサチップである。In the figure, 1 is a sensor chip made of a semiconductor.

11は、センサチップ1に設けられ、センサチップ1に、
ダイアフラム12を形成する凹部である。
11 is provided in the sensor chip 1, and the sensor chip 1 has
It is a recess that forms the diaphragm 12.

13はダイアフラム12に設けられた半導体歪みゲージであ
る。
Reference numeral 13 is a semiconductor strain gauge provided on the diaphragm 12.

14は半導体歪みゲージ13の出力を増幅・演算する半導体
よりなる増幅回路チップである。
Reference numeral 14 is an amplifier circuit chip made of a semiconductor that amplifies and calculates the output of the semiconductor strain gauge 13.

15は増幅回路チップ14に一面が固定される絶縁性のプレ
ートである。
Reference numeral 15 is an insulating plate whose one surface is fixed to the amplifier circuit chip 14.

2はセンサチップ1と増幅回路チップ14とに一面が固定
され凹部11と第1測定室21を構成する基板である。
Reference numeral 2 denotes a substrate having one surface fixed to the sensor chip 1 and the amplifier circuit chip 14 and forming the recess 11 and the first measurement chamber 21.

22は基板2を貫通し第1測定室21に連通する貫通孔であ
る。
Reference numeral 22 is a through hole penetrating the substrate 2 and communicating with the first measurement chamber 21.

3は基板2の他面に一端が接続され、貫通孔22と連通し
他端から一方の測定圧P1が導入されるパイプである。
Reference numeral 3 is a pipe whose one end is connected to the other surface of the substrate 2 and which communicates with the through hole 22 and into which one measuring pressure P1 is introduced from the other end.

4は、パイプ3が固定されるベースである。4 is a base to which the pipe 3 is fixed.

5はベース4に一端が固定され、ベース4とセンサチッ
プ1と第2測定室51を構成するボディである。
Reference numeral 5 denotes a body having one end fixed to the base 4 and forming the base 4, the sensor chip 1 and the second measurement chamber 51.

52は、ボディ5の他端に設けられた凹部である。Reference numeral 52 is a recess provided on the other end of the body 5.

6は、ボディ5に設けられ凹部52と接液室61を構成する
接液ダイアフラムである。
Reference numeral 6 denotes a liquid contact diaphragm which is provided in the body 5 and constitutes the recess 52 and the liquid contact chamber 61.

53はボディ5に設けられ第2測定室51と接液室61とを連
通する連通孔である。
Reference numeral 53 is a communication hole provided in the body 5 for communicating the second measurement chamber 51 and the liquid contact chamber 61.

501は第2測定室51と接液室61と連通孔53とを満たす封
入液である。
501 is a filled liquid that fills the second measurement chamber 51, the liquid contact chamber 61, and the communication hole 53.

以上の構成において、パイプ3に測定圧P1が加わり、接
液ダイアフラム6に測定圧P2が加わると、ダイアフラム
12に測定圧P1と測定圧P2との差圧が加わり、この差圧は
半導体歪みゲージ13により検出され、半導体歪みゲージ
13の出力は増幅回路チップで増幅・演算されて出力信号
として出力される。
In the above configuration, when the measurement pressure P1 is applied to the pipe 3 and the measurement pressure P2 is applied to the wetted diaphragm 6, the diaphragm
The differential pressure between the measured pressure P1 and the measured pressure P2 is applied to 12, and this differential pressure is detected by the semiconductor strain gauge 13,
The output of 13 is amplified and calculated by the amplifier circuit chip and output as an output signal.

〈考案が解決しようとする課題〉 しかしながら、この様な装置においては、センサチップ
1と増幅回路チップ14とを、ほぼ同一平面上に配置して
いるため、 (1)2つのチップ1,14間を電気的に接続するためのワ
イヤボンディングが必要である。
<Problems to be Solved by the Invention> However, in such a device, since the sensor chip 1 and the amplifier circuit chip 14 are arranged on substantially the same plane, (1) between the two chips 1 and 14. Wire bonding for electrically connecting the wires is required.

(2)両チップ1,14を同室に収容するために、広いスペ
ースが必要となり、そのために封入液501の量が増え、
半導体差圧測定装置の外径も大きくなる。
(2) A large space is required to accommodate both chips 1 and 14 in the same room, which increases the amount of the enclosed liquid 501,
The outer diameter of the semiconductor differential pressure measuring device also becomes large.

(3)増幅回路チップ14をベース4に取付けるのに、電
気的絶縁を必要とするので、両者の間に絶縁の為のプレ
ート15を挿入しなければならない。
(3) Since electrical insulation is required to attach the amplifier circuit chip 14 to the base 4, a plate 15 for insulation must be inserted between the two.

半導体差圧測定装置では、半導体歪みゲージ13と増幅回
路は、同一シリコンチップ上に作られるのが望ましい
が、良品率が悪いために、ほとんど実用化されていな
い。
In the semiconductor differential pressure measuring device, it is desirable that the semiconductor strain gauge 13 and the amplifier circuit are formed on the same silicon chip, but they are hardly put into practical use because of a poor yield rate.

これは、半導体歪みゲージ13と、増幅回路14とでは、半
導体プロセス上制作しやすい面方位としにくい面方向が
あり、それぞれ作りやすい面方位をもつシリコンウエハ
上に作るほうが良品率が良いためである。
This is because the semiconductor strain gauge 13 and the amplifier circuit 14 have a plane orientation that is easy to produce in the semiconductor process and a plane orientation that is difficult to produce in the semiconductor process, and the yield rate is better when produced on a silicon wafer having an easy orientation. .

半導体歪みゲージ13はピエゾ抵抗係数が大きいとの理由
で(100)面に作るのが一般的である。
The semiconductor strain gauge 13 is generally formed on the (100) plane because it has a large piezoresistance coefficient.

増幅回路チップ14は、動作の安定性が良いとの理由で
(111)面に作るのが一般的である。
The amplifier circuit chip 14 is generally formed on the (111) plane because it has good operation stability.

また、半導体歪みゲージ13と増幅回路チップ14とは、半
導体プロセスそのものが基本的に異なるので、同一ウエ
ハ上に作ることは、もともと難しい。
Further, since the semiconductor strain gauge 13 and the amplifier circuit chip 14 are basically different in the semiconductor process itself, it is originally difficult to form them on the same wafer.

そこで、従来は、面方位の異なる半導体歪みゲージ13と
増幅回路チップ14とを同一平面で、近接して配置してい
る。
Therefore, conventionally, the semiconductor strain gauges 13 having different plane orientations and the amplifier circuit chip 14 are arranged close to each other on the same plane.

これは (1)両者が同一温度になるようにして、温度特性の向
上を図る。
This aims at (1) improving the temperature characteristics by keeping the same temperature.

(2)電気信号を外部へ取出すためのリード線の削減を
図るためである。
(2) This is to reduce the number of lead wires for taking out electric signals to the outside.

本考案は、この問題点を解決するものである。The present invention solves this problem.

本考案の目的は、装置の小形化、構造の簡素化、信頼性
の向上し得る半導体差圧測定装置を提供するにある。
An object of the present invention is to provide a semiconductor differential pressure measuring device capable of downsizing the device, simplifying the structure, and improving reliability.

〈課題を解決するための手段〉 この目的を達成するために、本考案は、半導体よりなる
センサチップと、該センサチップの一面に設けられた接
続パッドと、前記センサチップに設けられセンサチップ
にダイアフラムを形成する凹部と、前記ダイアフラムに
設けられた半導体歪みゲージと、前記センサチップに平
行に設けられ前記センサチップの接続パッドに一面に設
けられた接続パッドを介して接続され該半導体歪みゲー
ジの出力を増幅・演算する増幅回路チップと、前記セン
サチップに一面が固定され前記凹部と第1測定室を構成
する基板と、該基板を貫通し前記第1測定室に連通する
貫通孔と、前記基板の他面に一端が接続され前記貫通孔
と連通し他端から一方の測定圧が導入されるパイプと、
該パイプが固定されるベースと、該ベースに一端が固定
され該ベースと前記センサチップと第2測定室を構成す
るボディと、該ボディの他端に設けられた凹部と、前記
ボディに設けられ該凹部と接液室を構成し他方の測定圧
を受圧する接液ダイアフラムと、前記ボディに設けられ
前記第2測定室と前記接液室とを連通する連通孔と、該
連通孔と前記内部空所と前記第2測定室と前記接液室と
前記連通孔とを満たす封入液とを具備してなる半導体差
圧測定装置を構成したものである。
<Means for Solving the Problems> In order to achieve this object, the present invention provides a sensor chip made of a semiconductor, a connection pad provided on one surface of the sensor chip, and a sensor chip provided on the sensor chip. A recess forming a diaphragm, a semiconductor strain gauge provided on the diaphragm, and a semiconductor strain gauge connected in parallel to the sensor chip via a connection pad provided on one surface of a connection pad of the sensor chip. An amplifier circuit chip for amplifying / calculating the output; a substrate having one surface fixed to the sensor chip and forming the recess and the first measurement chamber; a through hole penetrating the substrate and communicating with the first measurement chamber; A pipe, one end of which is connected to the other surface of the substrate and which is in communication with the through hole and into which one measurement pressure is introduced from the other end,
A base to which the pipe is fixed; a body having one end fixed to the base to form the base, the sensor chip, and a second measurement chamber; a recess provided at the other end of the body; A liquid contact diaphragm that constitutes the recess and the liquid contact chamber and receives the other measurement pressure, a communication hole that is provided in the body and that communicates the second measurement chamber and the liquid contact chamber, the communication hole and the interior. A semiconductor differential pressure measuring device comprising a void, the second measuring chamber, the liquid contact chamber, and a filling liquid filling the communication hole.

〈作用〉 以上の構成において、パイプに一方の測定圧が加わり、
接液ダイアフラムに他方の測定圧が加わると、ダイアフ
ラムに一方の測定圧と他方の測定圧との差圧が加わり、
この差圧は半導体歪みゲージにより検出され、半導体歪
みゲージの出力は増幅回路チップで増幅・演算されて出
力信号として出力される。
<Operation> In the above configuration, one measuring pressure is applied to the pipe,
When the other measuring pressure is applied to the liquid contact diaphragm, the differential pressure between one measuring pressure and the other measuring pressure is applied to the diaphragm.
This differential pressure is detected by the semiconductor strain gauge, and the output of the semiconductor strain gauge is amplified and calculated by the amplifier circuit chip and output as an output signal.

以下、実施例に基づき詳細に説明する。Hereinafter, detailed description will be given based on examples.

〈実施例〉 第1図は本考案の一実施例の要部構成説明図である。<Embodiment> FIG. 1 is an explanatory view of a main part configuration of an embodiment of the present invention.

図において、第4図と同一記号の構成は同一機能を表わ
す。
In the figure, the same symbols as those in FIG. 4 represent the same functions.

以下、第4図と相違部分のみ説明する。Only the parts different from FIG. 4 will be described below.

7は、第2図に示すごとく、センサチップ1に平行に設
けられたセンサチップ1の接続パッド101に一面に設け
られた接続パッド71を介して接続され半導体歪みゲージ
13の出力を増幅・演算する増幅回路チップである。
As shown in FIG. 2, the semiconductor strain gauge 7 is connected to the connection pad 101 of the sensor chip 1 provided in parallel to the sensor chip 1 through the connection pad 71 provided on one surface.
It is an amplifier circuit chip that amplifies and calculates the output of 13.

以上の構成において、パイプ3に一方の測定圧P1が加わ
り、接液ダイアフラム6に他方の測定圧P2が加わると、
ダイアフラム12に一方の測定圧P1と他方の測定圧P2との
差圧が加わる。
In the above configuration, when one measuring pressure P1 is applied to the pipe 3 and the other measuring pressure P2 is applied to the liquid contact diaphragm 6,
A differential pressure between one measurement pressure P1 and the other measurement pressure P2 is applied to the diaphragm 12.

この差圧は半導体歪みゲージ13により検出され、半導体
歪みゲージ13の出力は、増幅回路チップ7で増幅・演算
されて出力信号として出力される。
This differential pressure is detected by the semiconductor strain gauge 13, and the output of the semiconductor strain gauge 13 is amplified and calculated by the amplifier circuit chip 7 and output as an output signal.

しかして、半導体歪みゲージ13と増幅回路チップ7とを
接合するには、以下の如くする。
Then, the semiconductor strain gauge 13 and the amplifier circuit chip 7 are joined together as follows.

両チップ13,7の接合面には、対向する位置に、半田付け
用のパッド101,71が用意されている。このパッド101,71
にクリームハンダを印刷した後、両チップ13,7をあわせ
て、温度槽の中でハンダを溶融させ接合する。ハンダの
厚さを利用して両チップ13,7間に隙間を維持し、測定圧
の伝導路として利用すると同時に、ダイアフラム12の圧
力変形の為の空間として使用する。
Pads 101 and 71 for soldering are prepared at the facing positions on the joint surfaces of the chips 13 and 7. This pad 101,71
After the cream solder is printed on, the chips 13 and 7 are put together, and the solder is melted and joined in a temperature bath. The thickness of the solder is used to maintain a gap between the chips 13 and 7, and it is used as a measurement pressure transmission path and at the same time used as a space for pressure deformation of the diaphragm 12.

圧力に比例する電気信号の取出しは、センサチップ1上
のパッド102からリード線へワイヤボンドする事により
行う。
The electric signal proportional to the pressure is taken out by wire bonding from the pad 102 on the sensor chip 1 to the lead wire.

この結果、 (1)半導体差圧測定装置の小形化が図れる。As a result, (1) the semiconductor differential pressure measuring device can be downsized.

(2)半導体差圧測定装置の構造の簡素化が図れる。(2) The structure of the semiconductor differential pressure measuring device can be simplified.

(3)半導体差圧測定装置の信頼性の向上が図れる。(3) The reliability of the semiconductor differential pressure measuring device can be improved.

第3図は本考案の他の実施例の要部構成説明図である。FIG. 3 is an explanatory view of a main part configuration of another embodiment of the present invention.

本実施例においては、増幅回路チップ7の中央に貫通孔
72を設けたものである。
In this embodiment, a through hole is formed in the center of the amplifier circuit chip 7.
72 is provided.

測定圧P2の伝達が早くなり、応答特性の早いものが得ら
れる。
The measured pressure P2 is transmitted faster, and the one with quick response characteristics can be obtained.

〈考案の効果〉 以上説明したように、本考案は、半導体よりなるセンサ
チップと、該センサチップの一面に設けられた接続パッ
ドと、前記センサチップに設けられセンサチップにダイ
アフラムを形成する凹部と、前記ダイアフラムに設けら
れた半導体歪みゲージと、前記センサチップに平行に設
けられ前記センサチップの接続パッドに一面に設けられ
た接続パッドを介して接続され該半導体歪みゲージの出
力を増幅・演算する増幅回路チップと、前記センサチッ
プに一面が固定され前記凹部と第1測定室を構成する基
板と、該基板を貫通し前記第1測定室に連通する貫通孔
と、前記基板の他面に一端が接続され前記貫通孔と連通
し他端から一方の測定圧が導入されるパイプと、該パイ
プが固定されるベースと、該ベースに一端が固定され該
ベースと前記センサチップと第2測定室を構成するボデ
ィと、該ボディの他端に設けられた凹部と、前記ボディ
に設けられ該凹部と接液室を構成し他方の測定圧を受圧
する接液ダイアフラムと、前記ボディに設けられ前記第
2測定室と前記接液室とを連通する連通孔と、該連通孔
と前記内部空所と前記第2測定室と前記接液室と前記連
通孔とを満たす封入液とを具備してなる半導体差圧測定
装置を構成した。
<Effects of the Invention> As described above, the present invention has a sensor chip made of a semiconductor, a connection pad provided on one surface of the sensor chip, and a concave portion provided on the sensor chip and forming a diaphragm on the sensor chip. , A semiconductor strain gauge provided on the diaphragm and connected to a connection pad of the sensor chip provided in parallel with the sensor chip through a connection pad provided on one surface to amplify / calculate the output of the semiconductor strain gauge. An amplifier circuit chip, a substrate of which one surface is fixed to the sensor chip to form the recess and the first measurement chamber, a through hole that penetrates the substrate and communicates with the first measurement chamber, and has one end on the other surface of the substrate. Is connected to the through hole and one measuring pressure is introduced from the other end, a base to which the pipe is fixed, and one end to which the pipe is fixed. Body, the sensor chip, and the body forming the second measurement chamber, the recess provided at the other end of the body, the recess provided in the body and the liquid contact chamber, and receiving the measurement pressure of the other. A liquid contact diaphragm, a communication hole provided in the body for communicating the second measurement chamber with the liquid contact chamber, the communication hole, the internal space, the second measurement chamber, the liquid contact chamber, and the communication hole. A semiconductor differential pressure measuring device comprising a filling liquid filling the holes was constructed.

この結果、 (1)半導体差圧測定装置の小形化が図れる。As a result, (1) the semiconductor differential pressure measuring device can be downsized.

(2)半導体差圧測定装置の構造の簡素化が図れる。(2) The structure of the semiconductor differential pressure measuring device can be simplified.

(3)半導体差圧測定装置の信頼性の向上が図れる。(3) The reliability of the semiconductor differential pressure measuring device can be improved.

従って、本考案によれば、装置の小形化、構造の簡素
化、信頼性の向上し得る半導体差圧測定装置を実現する
ことが出来る。
Therefore, according to the present invention, it is possible to realize a semiconductor differential pressure measuring device capable of downsizing the device, simplifying the structure, and improving reliability.

【図面の簡単な説明】[Brief description of drawings]

第1図は本考案の一実施例の要部構成説明図、第2図は
第1図の要部構成説明図、第3図は本考案の他の実施例
の要部構成説明図、第4図は従来より一般に使用されて
いる従来例の構成説明図である。 1…センサチップ、101,102…パッド、11…凹部、12…
ダイアフラム、13…半導体歪みゲージ、2…基板、21…
第1測定室、22…貫通孔、3…パイプ、4…ベース、5
…ボディ、51…第2測定室、52…凹部、53…連通孔、6
…接液ダイアフラム、61…接液室、7…増幅回路チッ
プ、71…パッド、72…貫通孔。
FIG. 1 is an explanatory view of the essential parts of one embodiment of the present invention, FIG. 2 is an explanatory view of the essential parts of FIG. 1, and FIG. 3 is an explanatory view of the essential parts of another embodiment of the present invention. FIG. 4 is an explanatory diagram of a configuration of a conventional example which is generally used from the past. 1 ... Sensor chip, 101, 102 ... Pad, 11 ... Recess, 12 ...
Diaphragm, 13 ... Semiconductor strain gauge, 2 ... Substrate, 21 ...
First measurement chamber, 22 ... Through hole, 3 ... Pipe, 4 ... Base, 5
... Body, 51 ... Second measuring chamber, 52 ... Recessed portion, 53 ... Communication hole, 6
... liquid contact diaphragm, 61 ... liquid contact chamber, 7 ... amplification circuit chip, 71 ... pad, 72 ... through hole.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】半導体よりなるセンサチップと、該センサ
チップの一面に設けられた接続パッドと、前記センサチ
ップに設けられセンサチップにダイアフラムを形成する
凹部と、前記ダイアフラムに設けられた半導体歪みゲー
ジと、前記センサチップに平行に設けられ前記センサチ
ップの接続パッドに一面に設けられた接続バッドを介し
て接続され該半導体歪みゲージの出力を増幅・演算する
増幅回路チップと、前記センサチップに一面が固定され
前記凹部と第一測定室を構成する基板と、該基板を貫通
し前記第一測定室に連通する貫通孔と、前記基板の他面
に一端が接続され前記貫通孔と連通し他端から一方の測
定圧が導入されるパイプと、該パイプが固定されるベー
スと、該ベースに一端が固定され該ベースト前記センサ
チップと第2測定室を構成するボディと、該ボディの他
端に設けられた凹部と、前記ボディに設けられ該凹部と
接液室を構成し他方の測定圧を受圧する接液ダイアフラ
ムと、前記ボディに設けられ前記第2測定室と前記接液
室とを連通する連通孔と、該連通孔と前記内部空所と前
記第2測定室と前記接液室と前記連通孔とを満たす封入
液とを具備してなる半導体差圧測定装置。
1. A sensor chip made of a semiconductor, a connection pad provided on one surface of the sensor chip, a recess formed in the sensor chip to form a diaphragm on the sensor chip, and a semiconductor strain gauge provided on the diaphragm. And an amplifier circuit chip that is provided in parallel with the sensor chip and is connected to a connection pad of the sensor chip through a connection pad provided on one surface to amplify / calculate the output of the semiconductor strain gauge, and one surface on the sensor chip. A substrate which is fixed to form the recess and the first measurement chamber, a through hole which penetrates the substrate and communicates with the first measurement chamber, and one end of which is connected to the other surface of the substrate and which communicates with the through hole A pipe into which one measuring pressure is introduced from an end, a base to which the pipe is fixed, one end fixed to the base, the base, the sensor chip, and a second measurement A body constituting the body, a concave portion provided at the other end of the body, a liquid contact diaphragm provided in the body to form a liquid contact chamber with the concave portion and receiving a measurement pressure of the other, and a body provided in the body, A communication hole that communicates the second measurement chamber with the liquid contact chamber; and a filled liquid that fills the communication hole, the internal space, the second measurement chamber, the liquid contact chamber, and the communication hole. Semiconductor differential pressure measuring device.
JP14041588U 1988-10-27 1988-10-27 Semiconductor differential pressure measuring device Expired - Lifetime JPH073311Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14041588U JPH073311Y2 (en) 1988-10-27 1988-10-27 Semiconductor differential pressure measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14041588U JPH073311Y2 (en) 1988-10-27 1988-10-27 Semiconductor differential pressure measuring device

Publications (2)

Publication Number Publication Date
JPH0260838U JPH0260838U (en) 1990-05-07
JPH073311Y2 true JPH073311Y2 (en) 1995-01-30

Family

ID=31404562

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14041588U Expired - Lifetime JPH073311Y2 (en) 1988-10-27 1988-10-27 Semiconductor differential pressure measuring device

Country Status (1)

Country Link
JP (1) JPH073311Y2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016003994A (en) * 2014-06-18 2016-01-12 セイコーエプソン株式会社 Physical quantity sensor device, altimeter, electronic apparatus, and mobile body

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005027365A1 (en) * 2005-06-14 2006-12-21 Robert Bosch Gmbh High pressure sensor device and method for its production
DE102008021091A1 (en) * 2008-04-28 2009-10-29 Epcos Ag pressure sensor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016003994A (en) * 2014-06-18 2016-01-12 セイコーエプソン株式会社 Physical quantity sensor device, altimeter, electronic apparatus, and mobile body

Also Published As

Publication number Publication date
JPH0260838U (en) 1990-05-07

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