JPH07328652A - Reddish water preventing device - Google Patents

Abstract

PURPOSE:To effectively prevent the generation of reddish water even if a ball- shaped semiconductor catalytic material having a relatively small surface area- to-volume ratio is used in a reddish water preventing device for reducing rust with the semiconductor catalytic material by enhancing the contact degree between the semiconductor surface and water with respect to time and space. CONSTITUTION:City water is struck against the blade of a driving impeller 20 facing an inlet 13 to rotate the impeller 20, hence a shaft 19 is rotated, and agitating blades 21 and 22 are rotated. Consequently, the water passing through a chamber 17 is agitated, and the semiconductor catalytic materials 1 dipped in the water are agitated, suspended and revolved. Accordingly, city water is brought into contact with the catalytic members 1 widely for a long time while the water flows down to an outlet 14, hence the reducing action is remarkably activated, and the generation of rust is effectively suppressed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a red water preventive device using a semiconductor catalyst material suitable for preventing the generation of red water in water pipes and the like.

[0002]

2. Description of the Related Art Generally, when water is used for a long time, the iron material on the inner wall of the water pipe is oxidized by dissolved oxygen O _{2 in} water to produce red rust (Fe ₂ O ₃ .nH ₂ O), which is mixed with water. Brings out red water. Red water is one of the causes of poor water quality and is not suitable for drinking. As a method of removing red water, there is also a method of cleaning a water pipe with acid or ozone to reduce red rust to black rust (Fe ₃ O ₄ = FeO · Fe ₂ O ₃ ), but the cleaning work requires a considerable cost burden. With that,
There is an inconvenience that water supply cannot be used during the work period, and such reduction treatment does not prevent the generation of red rust.If red rust occurs again after the cleaning work, the cleaning work must be performed again. Be done.

As a method of constantly reducing red rust generated on the inner wall of a water pipe to prevent or suppress the generation of red water, for example, Japanese Patent Application Laid-Open No. 2-232385, Japanese Patent Application Laid-Open No. 3-165835,
As disclosed in Japanese Laid-Open Patent Publication No. 4-305290, fine powder titanium dioxide (titania), platinum black and fine powder silicon dioxide are molded and sintered into N-type semiconductor fired products, and ball-shaped alumina ceramics has titanium dioxide on the surface. What has been fired (semiconductor ball), cloth that has been subjected to a conductive treatment such as electroless plating, and titanium dioxide has been sprayed on it (sprayed photocatalyst functional material)? A red water prevention method using a semiconductor catalyst material that sends out tap water is known.
Good experimental data have been obtained for the red water prevention method using this semiconductor catalyst material. It is speculated that the principle of this red water prevention method is due to the following catalytic mechanism. That is,
The semiconductor catalyst material platinum black, alumina ceramics, conductive portions on the conduction electrons e such electroless plating ^- and titanium dioxide N
The type semiconductor portion has holes h ⁺ . When tap water is contacted with such a semiconductor catalyst material, dissolved oxygen O
₂ passes through the semiconductor surface layer and reaches the conductor portion, where it reacts with the conduction electrons e ⁻ to become peroxide ions O ₂ ⁻ and O ₂ ²⁻ and returns to the liquid phase. Then, these ions react with hydrogen ions H ⁺ to generate HO ₂ and H ₂ O ₂ . O ₂ ^-,
O ₂ ²⁻ , HO ₂ and H ₂ O ₂ have a reducing property and reduce red rust to black rust by discharging electrons to the red rust on the inner wall of the water pipe. Hydroxide ions OH in tap water ^- is e reacts with the holes h ⁺ semiconductor section ^- with replenishing produces dissolved oxygen. In such a red water prevention method, conduction rusts that perform a reducing action and holes that perform an oxidizing action are used to reduce red rust and oxidize hydroxide ions, and the semiconductor itself dissolves in tap water. It is not due to the interaction of redox by contact between the semiconductor catalyst material and tap water. Therefore, if the contact degree between the semiconductor catalyst material and tap water is increased, the effect of preventing the generation of red water becomes remarkable.

[0004]

By the way, as a red water prevention device using a semiconductor catalyst material composed of a conductive material and a semiconductor, as shown in Japanese Patent Laid-Open No. 2-232385, water is passed through a large number of semiconductor catalyst materials. It is known to be loaded in a container.
Examples of the installation of the red water prevention device include a circulation method that circulates the water in the receiving tank and the elevated water tank through the red water prevention device using a circulation pump, and installs the red water prevention device in the outlet pipe of the receiving water tank and the elevated water tank. There is a law to do. Although the circulation method requires a large amount of installation work, the contact time of tap water with the semiconductor catalyst material is long, which is excellent in preventing the generation of red water. Although the one-pass method simplifies the installation work and facilitates introduction, the contact time of tap water with the semiconductor catalyst material is short, and the effect of preventing red water generation is diminished. Therefore, for example, as disclosed in Japanese Patent Laid-Open No. 4-305290, not a semiconductor ball but a cloth, a sheet,
Alternatively, a device for enhancing the degree of contact with tap water spatially by increasing the surface area / volume ratio with a porous semiconductor catalyst material by forming a conductive layer on the plate and then spraying the semiconductor layer onto the plate Has been done. However, in the red water prevention device in which the porous semiconductor catalyst material is stored in the loading cylinder, since the passage gap of tap water is porous of the semiconductor catalyst material, suspended fine particles in water adhere to the pores within a short period of time. Then, this is blocked and the flow of tap water becomes worse due to the increase in fluid resistance. For this reason, cleaning or replacement maintenance of the semiconductor catalyst material becomes frequent, which is unsuitable for a red water prevention device permanently installed in a water pipe. Also, cloth, sheet,
Alternatively, since the plate is used as a base material, it has a structure that is easily broken and is not suitable for cleaning. Therefore, replacement with a new semiconductor catalyst material is unavoidable, resulting in high running cost.

In view of the above problems, an object of the present invention is to increase the degree of contact between a semiconductor surface and water temporally and spatially, so that a semiconductor ball-shaped semiconductor catalyst material having a relatively small surface area / volume ratio. It is to realize a red water prevention device that can effectively prevent the generation of red water even by using.

[0006]

Means for Solving the Problems In order to solve the above-mentioned problems, the means taken by the present invention has an inflow port for tap water and an outflow port at a higher level, and the inflow port and the outflow port thereof are provided. In a red water prevention device in which a large number of semiconductor catalyst materials are loaded in a water passage chamber defined between the two, a stirring means for floating and swirling a large number of semiconductor catalyst materials immersed in tap water in the water passage chamber. Is provided. As the stirring means, in order to make the tap water flow in the water passage chamber a swirl flow, the positions and directions of the inlet and the outlet may be unequal, but in order to obtain a more positive swirl flow, A mechanism having a stirring blade that rotates in the water passage chamber is provided. As a specific example of the mechanism having the stirring blade, a structure having a drive impeller rotated by the inflow pressure of tap water on the inlet side and a rotating shaft transmitting the rotational force of the driving impeller to the stirring blade is adopted. it can. Further, as the motor driving method, only a rotating shaft for transmitting the rotating force of the external driving motor to the stirring blade may be provided. In such a red water prevention device, the semiconductor catalyst material is not a sheet-shaped semiconductor catalyst material, but rather a so-called semiconductor ball,
That is, it is desirable to use a spherical body.

[0007]

As described above, by providing the stirring means for floating and swirling a large number of semiconductor catalyst materials immersed in the water passage chamber between the lower inlet and the upper outlet, Since it is agitated and comes into wide contact with the dynamic semiconductor catalyst material over a long period of time and spatially, the oxidation-reduction action is remarkably activated, and the generation of red rust can be effectively suppressed. In particular, a spherical material can be used without using a sheet-shaped semiconductor catalyst material as the semiconductor catalyst material. Rather, considering the contact between the semiconductor catalyst materials due to stirring, the use of spherical semiconductor catalyst materials is less likely to cause damage or the like, and is advantageous for dynamic semiconductor catalyst materials. In the self-powered stirring mechanism in which the stirring blade is rotated by using the rotational force of the driving impeller that is rotated by the inflow pressure of tap water on the inlet side, not to mention that the driving blade is not energy-consuming. The car acts as a damper for the inflowing tap water, and disturbs the tap water as a reaction, so that the agitated tap water is sent to the water passage chamber and the staying time in the water passage chamber is lengthened. On the other hand, an agitation mechanism using an external drive motor is suitable for facilities with large water supply capacity.

[0008]

Embodiments of the present invention will now be described with reference to the accompanying drawings.

[First Embodiment] FIG. 1 is a partially cutaway perspective view showing a red water prevention apparatus according to a first embodiment of the present invention.

The red water prevention device 10 of this embodiment is a housing composed of a cylindrical body 11 and end cap plates 12a and 12b closing both ends thereof, and a lower end cap plate 12b.
Side is provided in the cylindrical body 11 to allow tap water to flow into the housing in the radial direction, and the upper end cap plate 12a side is provided in the cylindrical body 11 and is opposite to the direction of the inflow opening 13. Outlet 14 oriented in the radial direction of
And a water passage chamber 17 partitioned by a lower mesh plate 15 and an upper mesh plate 16 between the inflow port 13 and the outflow port 14, and a large number of spherical semiconductor catalyst materials loaded in the water passage chamber 17. 1
... and the bearing 18 provided on the end cap plates 12a and 12b
Rotating shaft 19 supported by a and 18b, and lower mesh plate 15
A drive impeller (turbine) 20 fixed to the rotary shaft 19 in a space between the end cap plate 12b and the end cap plate 12b, and having spiral blades rotated by the inflow pressure of tap water flowing from the inflow port 13.
It is fixed to the rotating shaft 19 in the water passage chamber 17 and has propeller-shaped stirring blades 21 and 22. Mounting legs 23 are provided on the lower end cap plate 12b. The end cap plates 12a and 12b and the cylindrical body 11 are liquid-tightly sealed by a packing and an O-ring 2. The lower mesh plate 15 is screwed to the inner peripheral flange 3 fixed to the inner wall of the cylindrical body 11. The upper mesh plate 16 is also screwed to the inner peripheral flange 3 fixed to the inner wall of the cylindrical body 11. The outer peripheral portion of the upper mesh plate 16 is a mesh portion 16a.
The inner peripheral portion is the resistance plate portion 16b as a non-mesh portion. The propeller-shaped stirring blades 21 and 22 each have two blades, and the mutual blades are offset by 90 °.

Tap water is pressure-fed to the inflow port 13 as indicated by an arrow in the figure. Therefore, tap water hits the blades of the drive impeller 20 facing the inflow port 13, and the drive impeller 20 is rotated. . As a result, the rotating shaft 19 rotates and the stirring blades 21 and 22 rotate. Therefore, the water flow in the water passage chamber 17 is stirred, and the semiconductor catalyst materials 1 ... Therefore,
During the time until the water flow down to the outlet 14 side, the contact between the tap water and the large number of semiconductor catalyst materials 1 is long in time and wide in space, so that the redox action is activated sufficiently. Therefore, the generation of red rust can be effectively suppressed. In this example, the spherical semiconductor catalyst material 1 is used as the semiconductor catalyst material without using the sheet-shaped semiconductor catalyst material. Since the semiconductor catalyst materials frequently come into contact with each other, spherical ones were used in consideration of the strength of the semiconductor catalyst material itself.

In this example, the stirring blade 2 is utilized by utilizing the rotational force of the drive impeller 20 rotated by the inflow pressure of tap water on the inlet side.
Since the stirring mechanism is a self-powered stirring mechanism in which 1 and 22 are rotated, energy is saved. Further, the drive impeller 20 also acts as a damper (buffer) for the inflowing tap water, and as a reaction to disturb the tap water, the stirred tap water is sent to the water passage chamber 17, and at the same time, the water passage chamber is passed. I'm lengthening my stay at 17. Since the upper mesh plate 16 is provided with the resistance plate portion 16b, the swirling flow rising there is once repelled, and then the outlet port 1 is passed through the mesh portion 16a.
It is going to go to 4. Therefore, the staying time of the tap water in the water passage chamber 17 can be extended and the degree of contact with the semiconductor catalyst material 1 can be increased.

[Second Embodiment] FIG. 2 is a partially cutaway perspective view showing a red water preventive apparatus according to a second embodiment of the present invention.

The red water prevention device 39 of this embodiment has substantially the same structure as that of the first embodiment except that the drive impeller 20 is a propeller impeller 31. In the spiral impeller drive impeller 20 of the first embodiment, it is difficult to change the flow of tap water flowing in the radial direction to the thrust direction, but in the propeller impeller 31 of the present example, the blade is inclined with respect to the inflow direction. Therefore, as the impeller 31 rotates, the flow of tap water can be smoothly changed in the thrust direction.

In each of the above embodiments, the drive impeller 20,
Although it is a self-powered stirring mechanism using 31, the drive impellers 20 and 31 are not limited to this, and the rotary shaft 19 is extended outside any one of the end caps and connected to an external motor. It is possible to configure a stirring mechanism using an external drive motor. Such a motor drive type is suitable for a facility with a large water supply capacity.

[0016]

As described above, the device for preventing red water according to the present invention floats and swirls a large number of semiconductor catalyst materials immersed in a water passage chamber between a lower inlet and an upper outlet. Since it is characterized by the provision of the stirring means, it has the following effects.

Since the water flow is agitated and comes into wide contact with the dynamic semiconductor catalyst material over a long period of time and spatially, the tap water flowing down is remarkably activated, the reducing action of red rust is enhanced, and the generation of red water is generated. It can be effectively prevented or suppressed. In particular, a spherical semiconductor catalyst material can be used without using a sheet-shaped semiconductor catalyst material as the semiconductor catalyst material. Rather, the use of a spherical semiconductor catalyst material is less likely to cause damage or the like, and is advantageous for a dynamic semiconductor catalyst material.

It goes without saying that the self-powered stirring mechanism in which the stirring blade is rotated by using the rotational force of the driving impeller that is rotated by the inflow pressure of the tap water on the inlet side is energy-less type. , The driving impeller also acts as a damper for the inflowing tap water, and as a reaction to disturb the tap water, it sends the agitated tap water into the water passage chamber and prolongs the stay time in the water passage chamber. ing. On the other hand, an agitation mechanism using an external drive motor is suitable for facilities with large water supply capacity.

[Brief description of drawings]

FIG. 1 is a partially cutaway perspective view showing a red water prevention device according to a first embodiment of the present invention.

FIG. 2 is a partially cutaway perspective view showing a red water prevention device according to a second embodiment of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Spherical semiconductor catalyst material 2 ... O ring 3 ... Inner peripheral flange 10 ... Red water prevention device 11 ... Cylindrical body 12a, 12b ... End cap 13 ... Inflow port 14 ... Outflow port 15 ... Lower mesh plate 16 ... Upper mesh Plate 16a ... Mesh part 16b ... Resistance plate part 17 ... Water passage chamber 18a, 18b ... Bearing 19 ... Rotating shaft 20, 31 ... Driving impeller 21, 22 ... Stirring blade.

Claims (5)

[Claims] 1. A plurality of semiconductor catalyst materials are provided in a water passage chamber defined between the inflow port and the outflow port, which has an inflow port for tap water and an outflow port at a higher level than the inflow port. A red water prevention device, comprising a stirring means for floatingly swirling a large number of semiconductor catalyst materials immersed in the tap water in the water passage chamber. 2. The red water prevention device according to claim 1, wherein the stirring means is a mechanism having a stirring blade that rotates in the water passage chamber. 3. The red water prevention device according to claim 2, wherein the mechanism having the stirring blade is a drive impeller rotated by the inflow pressure of the tap water on the inlet side, and a rotation of the drive impeller. A red water prevention device having a rotating shaft for transmitting force to the stirring blade. 4. The red water prevention device according to claim 2, wherein the mechanism having the stirring blade has a rotating shaft for transmitting a rotational force of an external drive motor to the stirring blade. 5. The red water prevention device according to claim 1, wherein the semiconductor catalyst material is a spherical body.