JPH07321004A - Method and apparatus for electron beam lithography - Google Patents

Abstract

PURPOSE:To realize electron beam lithography which can draw various kinds of figures with high efficiency and draw a figure of high precision. CONSTITUTION:In a step 100, drawing figure data are turned into a polygon. In a step 101, the figure data turned into the polygon are divided into quadrangles. In a step 102, it is decided whether the figure data are a fundamental shape or a collective figures approximation shape. When the figure data are not the fundamental shape and the collective figures approximation shape, the figure data are again divided in a step 3. It is again decided in the step 102 whether the figure data are a fundamental shape or a collective figures approximation shape. When the figure data are recognized as the fundamental shape or the collective figures approximation shape in the step 102, the coordinate transforming operation is executed in a step 4, after an aperture figure having the minimum rotation angle difference from figure data of the fundamental shape or the collective figures approximation shape are selected out of a plurality of aperture figures of a first aperture 3. In a step 5, the drawing region of an electron beam writing equipment is divided, and each of the data is compressed, thereby completing data preparation.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electron beam drawing method and apparatus used for manufacturing VLSI and the like.

[0002]

2. Description of the Related Art When a figure having an arbitrary angle is drawn by an electron beam drawing apparatus, it is temporarily set by a host computer.
It has been decomposed into a figure having only an angle that is a multiple of degrees, and the decomposed figure data is further decomposed into a figure that can be drawn by the decomposition control unit of the electron beam drawing apparatus.

As described above, when the figure is decomposed into figures having only an angle that is a multiple of 45 degrees, the data conversion time and the figure data amount in the host computer become enormous. Therefore, an arbitrary-angle figure decomposition method in which these decomposition processes are decomposed by an electronic circuit to reduce the amount of data and speed up the process is disclosed in, for example, Japanese Patent Laid-Open No. 5-2671.
No. 32 publication.

As another method for drawing an arbitrary angle figure, there is a collective drawing method described in Japanese Patent Laid-Open No. 52-119185. In this method, an aperture member that has been processed into a desired shape is placed in the electron beam path, and the electron beam image that has passed through the aperture is projected onto the sample surface for drawing. By this method, for example, an electron beam image of a free shape can be drawn up to a maximum of 5 μm square.

Further, in the electron beam exposure apparatus disclosed in Japanese Patent Laid-Open No. 3-87015, a plurality of aperture members having rectangular apertures are arranged in series in the electron beam passing direction, The conjugate beam of the forming member is drawn on the sample surface. Then, at least one of the plurality of aperture members has an aperture shape 90 times larger than that of the rectangular aperture of the other forming member.
It is rotated and shifted only once. As a result, a rectangular beam or an oblique pattern beam can be formed without significantly moving the electron beam, and a reduction in drawing accuracy due to aberration is prevented.

Another example is Japanese Patent Laid-Open No. 61-12.
As described in Japanese Patent No. 0418, there is also one that makes it possible to draw an arbitrary angle graphic by rotating the drawing graphic to an arbitrary angle by using the rotation correction function of the electron lens.

An example of correction of a rotation error of a drawing figure is a variable shaping type charged particle beam drawing method disclosed in Japanese Patent Laid-Open No. 4-240718. In this variable shaping type charged particle beam drawing method, a conjugate beam of a first shaping aperture member and a second aperture member having an opening larger than that of the first shaping aperture member is formed, and the conjugate beam is formed on a sample. Scan on the formed mark. In this state, the electromagnetic deflector generates a molding signal (X ₁ ,
After supplying Y ₁ ), the shaping signal (X ₂ , Y ₁ ) is supplied. Based on the backscattered electron image obtained at this time, the rotation error of the second shaping aperture plate member is corrected.

Next, a shaping signal (X ₃ , Y ₃ ) is applied to the electromagnetic deflector.
To supply. The first shaping aperture member is rotated so that the peak value of the reflected electron signal waveform obtained at this time is constant, and the rotation error is corrected. Accordingly, the rotation error correction of the first and second shaping aperture members is performed without performing the deflection correction of the electromagnetic deflector, and the rotation error correction can be performed easily and accurately. Note that as other examples of the rotation error correction, JP-A-4-242919, JP-A-5-144715, and JP-A-5-198488.
There is a gazette.

[0009]

However, in the above-mentioned Japanese Patent Laid-Open No. 5-267132, in order to improve the accuracy of the hypotenuse part of the drawn figure, that is, in order to improve the linearity, the decomposition is performed. It is necessary to make the width extremely small. Therefore, in the above-mentioned Japanese Patent Laid-Open No. 5-267132, in order to improve the accuracy of the drawing figure, the number of decompositions must be increased, and the decrease in throughput should be avoided. I couldn't.

Further, in the above-mentioned Japanese Patent Laid-Open No. 5-267132, the partial figure forming the hypotenuse portion of the figure becomes considerably smaller than the partial figure forming the inside of the figure. Therefore, the linearity accuracy of the hypotenuse portion is deteriorated due to exposure unevenness and the like caused by the difference in size between the subfigures forming the hypotenuse portion and the subfigures forming the inside.

Further, in the collective drawing method disclosed in Japanese Patent Application Laid-Open No. 52-119185 and the electron beam exposure apparatus described in Japanese Patent Application Laid-Open No. 3-87015, this is caused by an increase in the number of decompositions and the size of the partial figure. Exposure unevenness can be avoided. However, in order to deal with many kinds of drawing shapes, it is necessary to manufacture apertures of that shape in advance, which requires many kinds of aperture members, which makes the handling complicated and also the shape of the drawing figure. The aperture member conforming to the above must be replaced for each figure to be drawn, and the efficiency of the figure drawing process will be reduced.

Further, in the method described in Japanese Patent Application Laid-Open No. 61-120418, in which a figure is rotated and an arbitrary angle figure is drawn, if the figure rotation angle is large, it takes a long time for the electron beam to stabilize. In addition to the above, there is a possibility that the accuracy of the figure may deteriorate due to the aberration.

An object of the present invention is to realize an electron beam drawing method and apparatus which can draw various kinds of figures with high efficiency and can draw highly accurate figures.

[0014]

In order to achieve the above object, the present invention is configured as follows. An electron beam is applied to the first shaping opening member having openings of a plurality of types, and the passing electron beam is applied to the second shaping opening member having openings of a predetermined shape to pass the electrons. In an electron beam drawing method of irradiating a line on a sample surface and drawing a desired figure, a figure to be drawn is divided into a plurality of drawing parts of a predetermined basic shape part and an approximate part approximate to this basic shape part. A step of selecting an opening having a minimum rotation angle difference from an approximate portion of the plurality of openings formed in the first shaping opening member; an electron beam from the electron beam source; Pass the selected aperture, rotate the passed electron beam by the minimum rotation angle difference, conjugate it with the aperture formed in the second molding aperture member, and irradiate the sample surface with this conjugated electron beam, And a step of drawing an approximate part. That.

Further, in the electron beam drawing method, a step of dividing the figure to be drawn into a plurality of drawing parts of a predetermined basic shape part and an approximate part approximating the basic shape part, and forming the first forming aperture member Out of the multiple openings
A step of selecting an opening having a minimum rotation angle difference with the approximate portion; passing an electron beam from an electron beam source through the selected opening of the first shaping opening member; and passing the passing electron beam to the second shaping opening. And conjugating with the opening formed in the member, rotating the conjugated electron beam by the minimum rotation angle difference, irradiating the sample surface, and drawing an approximate portion.

Further, an electron beam source, and a first molding opening member which is irradiated with the electron beam and in which openings of a plurality of shapes are formed,
An electron beam that has passed through the first shaping aperture member is irradiated, and a second shaping aperture member having an opening of a predetermined shape is formed, and an electron beam rotating means for rotating the electron beam. In an electron beam drawing apparatus which irradiates an upper part and draws a desired figure, a figure dividing section which divides the figure to be drawn into a plurality of drawing parts of a predetermined basic shape part and an approximate part approximate to the basic shape part. Of the plurality of openings formed in the first shaping opening member, an approximate portion, a figure selecting unit for selecting an opening having a minimum rotation angle difference, and an electron beam from an electron beam source are provided to the first shaping opening member. An electron beam that passes through the selected aperture, rotates the passed electron beam by the minimum rotation angle difference, conjugates it with the aperture formed in the second shaping aperture member, and irradiates the sample surface with this conjugated electron beam. And a control unit.

Further, in the electron beam drawing apparatus, a figure dividing section for dividing a figure to be drawn into a plurality of drawing sections of a predetermined basic shape section and an approximate section approximate to the basic shape section, and a first forming opening member. Of the multiple openings formed in
An approximate portion, a figure selection unit for selecting an opening having the smallest rotation angle difference, and an electron beam from an electron beam source are passed through the selected opening of the first shaping aperture member, and the passed electron beam is passed through the second opening. An electron beam controller that conjugates the electron beam formed in the shaping aperture member, rotates the conjugated electron beam by the minimum rotation angle difference, and irradiates the sample surface with the electron beam.

Preferably, in the electron beam writing method and apparatus, the first shaping aperture member is composed of a plurality of aperture members arranged along the electron beam irradiation direction. Further, in the electron beam writing method and apparatus, preferably, the second shaping opening member is formed with openings having a plurality of types of shapes.

Preferably, in the electron beam writing method and apparatus, the plurality of types of openings formed in the first molding opening member are polygonal. Further, preferably, in the electron beam drawing method and apparatus, the polygon is a plurality of types of isosceles triangles, and the apex angles of the isosceles triangles are different from each other.

Preferably, in the electron beam drawing method and apparatus, the polygon is a plurality of rectangles, and the long sides of the plurality of rectangles have mutually different angles with respect to a predetermined reference line. Further, preferably, in the electron beam drawing method and apparatus, the polygon is a plurality of types of hexagons.

[0021]

The figure to be drawn is divided into a basic shape portion and an approximate portion that is close to the basic shape portion. The basic shape portion is a shape that can be drawn without rotating the opening formed in the first forming opening, and the approximate portion can be drawn by rotating the opening formed in the first forming opening member. It has a unique shape. With respect to the division of the drawing figure, it is not necessary to divide into the 45 ° double-angle figure as in the conventional case, so that the time required for the dividing process is shortened.

Among the openings formed in the first molding opening member, the opening having the minimum rotation angle difference from the above-mentioned approximate portion is selected. Then, the electron beam that has passed through the opening having the minimum rotation angle difference is rotated by the minimum rotation angle difference, is conjugated with the opening formed in the second molding opening member, and is irradiated onto the sample surface. Alternatively, the electron beam that has passed through the opening of the first shaping opening member is conjugated with the opening of the second shaping opening member, and then rotated by the minimum rotation angle difference. Since the rotation angle difference is the minimum, aberrations due to rotation are suppressed, and highly accurate drawing is possible.

[0023]

Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is an operation flowchart of an electronic destination drawing method which is an embodiment of the present invention, FIG. 2 is an overall schematic configuration diagram of an electron beam drawing apparatus which is an embodiment of the present invention, and FIG.
3 is a functional configuration diagram of an operation control unit in the example of FIG.

In FIG. 2, the electron beam generated by the electron gun 1 is deflected by the selective deflector 2 and is formed into an appropriate opening from a plurality of openings formed in the first aperture (forming opening member) 3. Is irradiated. Then, the electron beam that has passed through the opening of the first aperture 3 passes through the shaping deflector 5 via the first transfer lens 4 and is shaped and deflected. next,
The electron beam is finely rotation-corrected by the fine rotation-correction lens 6, passes through the second transfer lens 7, and then passes through the second aperture 8
Is irradiated. Then, the electron beam that has passed through the second aperture 8 is reduced by the reduction lens 9 and the sub-deflector 1
1 and the main deflector 12, the objective lens 10 is deflected.
Thus, a desired position on the sample 13 placed on the stage 14 is irradiated. The stage 14 can be moved by a drive motor 15.

The electron beam passes through the first aperture 3 and the second aperture 8 to form a conjugate cross section of the first and second apertures 3 and 8. And
The shape of the conjugate cross section is controlled by the shaping deflector 5 and the minute rotation correction lens 6, and an electron beam having an arbitrary cross section can be obtained.

Next, referring to FIG. 3, the graphic data processing unit 1
6 is a polygon approximation and quadrilateral division unit 161, a shape determination unit 162, a re-division unit 163, a rotation angle calculation and aperture figure selection unit 164, a region division data compression unit 165,
A memory and a drawing data output unit 167 are provided. The graphic data processing unit 161, the shape determination unit 162,
The subdivision unit 163 constitutes a graphic division unit.

Drawing graphic data is supplied to the graphic data processing section 16 and processed. Then, the processed drawing data is supplied to the graphic decompression unit 17 as compressed graphic data and decompressed.

Next, the drawing data restored by the figure restoring section 17 is decomposed into a rectangular figure which can be drawn by the figure decomposing section 18. Further, the decomposed rectangular graphic data is subjected to beam control including the above-mentioned selective deflector 2, shaping deformer 5, and minute rotation correction lens 6 via a correction unit 19, a DAC (D / A converter) 20, and an amplifier 21. It is supplied to a system (electron beam control system) 25 and a desired pattern is drawn by an electron beam.

FIG. 4 is an example of a plurality of basic shape openings formed in the first aperture 3 (one opening is 5 μm or 1
4A is a plurality of triangular openings in which the apex angle of the isosceles triangle is oriented in the lateral direction of the paper. In the example of FIG. 4A, a half of the apex angle is increased by 5 ° from 5 ° to 10 ° and 15 ° to form a plurality of triangles up to 85 °. Then, for each angle, a pair of triangular openings having symmetrical shapes are formed.

FIG. 4B shows a plurality of rectangular openings, the long sides of which are 5 ° to 10 ° and 15 ° with respect to the horizontal line (predetermined reference line) on the paper surface. Increasing by 5 °, it becomes a plurality of rectangles up to 85 °. Then, for each angle, a pair of rectangular openings is formed that is rotated by a symmetric angle with respect to the horizontal line on the paper surface.

FIG. 4C shows a plurality of triangular openings whose apex angles are oriented in the longitudinal direction of the paper. In the example of FIG. 4C, a half angle of the apex angle is increased by 5 ° from 5 ° to 10 °, 15 °, and is a plurality of triangles up to 85 °. Then, for each angle, a pair of triangular openings having symmetrical shapes are formed.

An electron beam is deflected and selected by the selective deflector 2 on the basis of the drawing graphic data. Then, the conjugate cross-sectional shape of the selected basic shape opening of the first aperture 3 and the second aperture 8 is drawn on the sample 13.

FIG. 5 shows an example of the conjugate cross-sectional shape.
4A is an example in which the opening shape (broken line 26) in FIG. 4A is conjugated with the second aperture 8 without being rotated, and the conjugate cross section is shown by a hatched portion 27A. Then, FIG. 5B shows a conjugate cross section 27A of FIG.
However, by being slightly rotated by the minute rotation correction lens 6, the conjugate section 27 whose angle is different from the figure of the conjugate section 27A.
B is an example obtained.

Thus, 5 °, 10 °, 15 °, 20
If the aperture pattern has different opening angles by 5 °, such as °, ...
Rotational correction of only 2.5 ° enables drawing at any angle of 360 °.

Next, an electron beam drawing method using the above-described first aperture, second aperture and electron beam drawing apparatus will be described. In step 100 of FIG. 1, the polygonal approximation and quadrilateral division unit 161 performs polygonalization by linear approximation according to the drawing accuracy, because the figure indicated by the supplied drawing figure data also includes a curved figure. Then, step 1
In 01, the dividing unit 161 divides the polygonalized graphic data into squares (triangles).

Next, in step 102, the shape determination unit 162 draws the figure data divided in step 101 without changing the basic shape (rectangle or basic trapezoid, and rotating the opening formed in the first aperture). (Possible shape) or a collective figure approximate shape is determined.
Is this collective figure approximate shape figure obtained by giving a minute rotation (within ± 2.5 °) to the basic shape opening?
Alternatively, it is a figure obtained by giving a minute rotation to the basic shape aperture and conjugating it with the second aperture 8. Then, in step 102, when the graphic data is not the basic shape or the collective graphic approximate shape, the process proceeds to step 103. In step 103, the graphic data is supplied to the subdivision unit 163, and the subdivision unit 163 subdivides the graphic data. And step 1
Returning to 02, the re-divided graphic data is processed by the shape determining unit 1.
It is supplied to 62, and it is again determined whether it is the basic shape or the collective figure approximate shape.

In step 102, if the figure data is the basic shape or the collective figure approximate shape, step 104
Proceed to. In step 104, the rotation angle calculation / aperture figure selection unit 164 selects an aperture figure having a minimum rotation angle difference from the figure data of the basic shape or the collective figure approximate shape among the plurality of aperture figures formed in the first aperture 3. Select and execute coordinate conversion calculation.

Next, in step 105, the area division data compression unit 165 divides the drawing area of the electron beam drawing apparatus from the rotation angle data, the selected opening figure data, and the coordinate data, and Compress each data. Then, the compressed data, the divided data of the drawing area, and the like are stored in the memory 166.

By the above operation, the data preparation is completed. When a drawing command is supplied from the operator to the drawing data output unit 167, the drawing data output unit 167 is supplied.
Reads the drawing data stored in the memory 166,
It is supplied to the figure restoration unit 17. Then, the electron beam that has passed through the selected basic shape aperture is rotated by the minute rotation correction lens 6 by the calculated rotation angle, and a conjugate sectional shape with the second aperture 8 is formed.

FIG. 6 shows another example of a plurality of basic shape openings formed in the first aperture 3, which has a hexagonal shape. In the opening shown in FIG. 6A, the angles of the corners facing each other in the vertical direction of the paper surface are equal to each other, and the other four corners are equal to each other. Then, of the angles facing each other in the vertical direction of the paper surface, for example, the base angle θ of an isosceles triangle whose apex angle is the upper angle is 5 °,
The angle increases in increments of 5 ° in increments of ° and 15 °, forming multiple hexagons up to 85 °.

In the opening shown in FIG. 6B, the angles of the corners facing each other in the lateral direction of the paper surface are equal to each other, and the other four corners are equal to each other. Then, of the corners facing each other in the lateral direction of the paper surface, for example, the base angle θ of an isosceles triangle whose apex angle is the left corner is 5 °, 10 °,
It increases in increments of 15 ° and 5 °, forming multiple hexagons up to 85 °.

For example, the trapezoidal figure 30 shown in FIG.
When the opening figure shown in FIG. 4 is used to draw, triangles 30c and 30d must be drawn in addition to the squares 30a and 30b, as shown in FIG. 7B.

On the other hand, if the basic shape aperture shown in FIG. 6 is used, as shown in FIG.
Can be drawn with two trapezoidal figures 30e and 30f or one figure. That is, the conjugate cross-sectional shape of the opening 28 of the first aperture 3 and the second aperture 8 can be various shapes as shown in FIG. FIG. 8A
8 is a conjugate cross-sectional shape 31a of an example of a triangle.
(B) is a conjugate cross-sectional shape 31b which is an example of a trapezoid. Further, FIG. 8C shows a conjugate cross-sectional shape 3 of another example of a triangle.
1C, and FIG. 8D is a conjugate cross-sectional shape 31d of another example of the trapezoid. 8E shows a conjugate cross-sectional shape 31e of still another example of a triangle, and FIG.
Is a conjugate cross-sectional shape 31f of yet another example of a trapezoid.

As described above, if the hexagonal basic opening shown in FIG. 6 is used, the trapezoidal opening figure 30 shown in FIG. 7 can be drawn with one or two shots, and the number of drawing shots can be reduced. .

Even when the basic shape opening shown in FIG. 6 is used, the divided basic shape or approximate shape and the minimum rotation angle difference are to be processed according to the flow chart shown in FIG. 1, similarly to the basic shape opening shown in FIG. The opening figure of is selected.

As described above, according to the embodiment of the present invention, it is determined whether the drawing figure divided into the quadrangle or the triangle is a basic shape (rectangle, basic trapezoid) or an approximate shape of the basic shape. It is subdivided until it becomes a basic shape or an approximate shape. The first aperture 3 is formed with a plurality of basic shape openings having different angles by 5 °, and an opening having the smallest rotation angle difference from the subdivided figure is selected from the plurality of basic shape openings. Then, the electron beam that has passed through the selected aperture is rotated by the minimum rotation angle (± 2.5 °) to form a conjugate cross section with the second aperture 8 and is drawn on the sample surface.

Therefore, in the above-described embodiment, it is not necessary to divide the drawing figure divided into the quadrangle or the triangle into the 45 ° double angle figure as in the conventional case, and the dividing process can be speeded up. . The rotation angle of the figure is ±
Since the angle is a minute angle of 2.5 ° or less, deterioration of the figure due to aberration can be suppressed. Therefore, it is possible to realize an electron beam drawing method and apparatus which can draw many kinds of figures with high efficiency and can draw highly accurate figures.

By the way, in the example of the electron beam drawing apparatus shown in FIG. 2, there is a possibility that not all the basic shape openings of the example shown in FIG. 6 can be formed. Therefore, an example will be described below in which the basic shape opening shown in FIG. 6 is divided into a plurality of aperture members and formed, and the plurality of aperture members are arranged along the electron beam irradiation direction.

FIG. 9 is a schematic block diagram of an electron beam drawing apparatus which is another embodiment of the present invention. In the example of FIG. 9, the second selective deflector 22, the third aperture 23, and the third transfer lens 2 are provided between the first transfer lens 4 and the shaping deflector 5 of the example of FIG.
4 and 4 are arranged. Then, for example, the basic shape opening shown in FIG. 6 is formed by being divided into the first aperture 3 and the third aperture 23. The other configuration of the example of FIG. 9 is similar to that of the example of FIG.

In FIG. 9, when the basic shape aperture formed on the first aperture 3 is selected, the electron beam is
Pass the route indicated by the dotted line. That is, the electron beam passes through the selected basic shape aperture of the first aperture 3 by the selective deflector 2. Subsequently, the electron beam is deflected by the first transfer lens 4 and passes through the variable shaping aperture formed in the central portion of the third aperture 23.

Further, when the basic shape aperture formed on the third aperture 23 is selected, the electron beam passes through the path indicated by the alternate long and short dash line. That is, the electron beam is
It passes through a variable shaping opening formed in the center of the aperture 3. Then, the electron beam passes through the selected basic shape aperture of the third aperture 23 by the second selective deflector 22 and is deflected by the third transfer lens 24 to the central position of the shaping deflector 5. However, the electron beam passes through all the centers of the selective deflector 2, the first aperture 3 and the first transfer lens 4, and is uncorrected.

As described above, the second selective deflector 22, the third aperture 23, and the third transfer lens 24 are arranged between the first transfer lens 4 and the shaping deflector 5, and the first aperture 3 is provided. If the basic shape openings are formed in the third aperture 23, for example, all of the basic shape openings shown in FIG. 6 can be formed. As described above, also in the electron beam drawing apparatus which is another embodiment of the present invention, the same effect as that of the example of FIG. 2 can be obtained, and many kinds of basic shape openings can be formed.

FIG. 10 shows a drawing method corresponding to the conventional example, in which the drawing data divided into squares or triangles is
9 is an operation flowchart of an example in the case of dividing into a double-width figure. In step 200 of FIG. 10, the drawn figure is polygonalized by linear approximation. Then, in step 201, the polygonalized graphic data is divided into squares (triangles).

Next, at step 202, it is judged whether or not the graphic data divided at step 201 is a 45 ° double angle graphic. Then, in step 202, when the graphic data is not a 45 ° double-angle graphic, the flow proceeds to step 203, and the graphic data is divided again. Then, returning to step 202, it is determined whether or not the re-divided graphic data is a 45 ° double angle graphic. In this way, step 202 is performed until the figure becomes a 45 ° double angle figure.
And 203 are repeatedly executed.

That is, for example, as shown in FIG. 11A, the triangular portions 32a and 32a of the graphic 32 are 45 °.
If not a double-width figure, multiple squares (45-degree double-angle figure)
Until it is split.

Next, in step 205, the drawing area of the electron beam drawing apparatus is divided from the divided figure data, and the data is compressed in step 206. Then, the data preparation is completed.

In the above-described example shown in FIG. 10, not only it takes a long time to divide the graphic data into 45 ° double angles, but also as shown in FIG. The linearity is not good. Further, the triangular portion 32
Since a and 32b are composed of a plurality of 45 ° double angle figures, the number of drawing shots is large, and a long time is required for drawing (the total of the figures 32 is 27 shots).

On the other hand, in the embodiment of the present invention, the triangular portions 33a and 33b of the graphic 32 are 45 °.
It is not necessary to divide into double-width figures, and it is possible to draw them in batches (7 shots in the whole of FIG. 32). Therefore, according to the present invention, the dividing processing time of the graphic data is short and the number of drawing shots is small. Further, the linearity is good, the rotation angle is small (maximum ± 2.5 °), and the aberration is suppressed.

In the above embodiment, the basic shape aperture is configured so that the angle increases by 5 °, but it is further configured so that the angle increases more finely, for example, by 2.5 °. You can also

Further, in addition to the first aperture and the third aperture, a fourth aperture having a basic shape opening may be arranged. Also, the first on the second aperture 8
It is also possible to form a basic shape opening similar to that of the aperture 3 and use a conjugate figure of the first aperture 3 and the second aperture 8 to draw more kinds of figures.

It is also possible to arrange a rotary lens below the second aperture 8 and rotate the electron beam from the second aperture 8 to draw a figure.

Further, although the basic shape opening in the above-mentioned example is a linear figure such as a triangle, a quadrangle or a hexagon, it is not limited to these linear figures and may be a non-linear figure such as a sector, a circle or an ellipse. .

In order to increase the basic shape opening,
The area of the first aperture 3 may be increased. This case can be dealt with by increasing the deflection width (deflection voltage) of the selective deflector 2.

[0064]

Since the present invention is constructed as described above, it has the following effects. A step of dividing the drawing figure into a plurality of drawing parts of a predetermined basic shape part and a part approximating the basic shape part; and an approximating part and a minimum rotation of the plurality of openings formed in the first forming opening member. A step of selecting an opening having an angular difference; passing an electron beam through the selected opening of the first shaping opening member, rotating the electron beam by a minimum rotation angle difference, and conjugating it with the opening of the second shaping opening member; Irradiate or electron beam
Passing through the selected opening of the forming opening member, conjugating with the opening formed in the second forming opening member, rotating by the minimum rotation angle difference, irradiating the sample surface, and drawing an approximate portion. Therefore, it is possible to realize an electron beam drawing method capable of drawing many types of figures with high efficiency and capable of drawing highly accurate figures.

Further, the drawing figure is divided into a predetermined basic shape part,
A figure dividing section that divides into a plurality of drawing sections that are similar to the basic shape section, a figure selecting section that selects an opening having a minimum rotation angle difference from the approximate section among the openings of the first forming opening member, and an electron beam. Through the selected opening of the first molding opening member,
By rotating by the minimum rotation angle difference, conjugated to the opening formed in the second molding opening member and irradiating the sample surface, or letting the electron beam pass through the selected opening of the first molding opening member,
An electron beam controller that conjugates with the opening formed in the second shaping opening member, rotates by the minimum rotation angle difference, and irradiates the sample surface. Therefore, it is possible to realize an electron beam drawing apparatus which can draw many kinds of figures with high efficiency and can draw highly accurate figures.

[Brief description of drawings]

FIG. 1 is an operation flowchart of an electron beam drawing method that is an embodiment of the present invention.

FIG. 2 is an overall schematic configuration diagram of an electron beam drawing apparatus that is an embodiment of the present invention.

FIG. 3 is a functional block diagram of an operation control unit in the electron beam drawing apparatus that is an embodiment of the present invention.

FIG. 4 is a diagram showing an example of an aperture figure in the electron beam drawing apparatus which is an embodiment of the present invention.

FIG. 5 is a diagram showing an example of creating a drawing figure in the electron beam drawing apparatus which is an embodiment of the present invention.

FIG. 6 is a diagram showing another example of an aperture figure in the electron beam drawing apparatus which is an embodiment of the present invention.

FIG. 7 is a diagram showing an example of a drawing figure in the electron beam drawing apparatus which is an embodiment of the present invention.

8 is a diagram showing an example of a drawing figure based on the opening figure shown in FIG.

FIG. 9 is a schematic configuration diagram of an electron beam drawing apparatus that is another embodiment of the present invention.

FIG. 10 is an operation flowchart of an electron beam drawing method for dividing a drawing figure into a double-angle figure of 45 degrees.

FIG. 11 is a diagram showing a comparison example of the number of drawing shots between the drawing method according to the conventional figure division method and the drawing method according to the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Electron beam source 2 Selective deflector 3 1st aperture 4 1st transfer lens 5 Forming deflector 6 Micro rotation correction lens 7 2nd transfer lens 8 2nd aperture 9 Reduction lens 10 Objective lens 11 Sub deflector 12 Main deflector 13 Sample 14 Stage 15 Stage drive motor 16 Graphic data processing unit 17 Graphic restoration unit 18 Graphic decomposition unit 19 Correction unit 20 DAC (DA converter) 21 Amplifier 22 Second selection deflector 23 Third aperture 24 Third transfer lens 25 Beam control system 161 Polygonal approximation and quadrilateral division unit 162 Shape determination unit 163 Redivision unit 164 Rotation angle calculation and aperture figure selection unit 165 Region division data compression unit 166 Memory 167 Drawing data output unit

Claims (16)

[Claims] 1. An electron beam generated from an electron beam source is applied to a first forming aperture member having openings of a plurality of types, and the passing electron beam is emitted to at least one aperture of a predetermined shape. In the electron beam drawing method of irradiating the formed second forming aperture member and irradiating the electron beam that has passed through the sample surface to draw a desired figure, the figure to be drawn is a predetermined basic shape part and this basic shape. Dividing into a plurality of drawing portions including an approximate portion that is similar to the portion, and selecting an opening having a minimum rotation angle difference from the approximate portion among the plurality of openings formed in the first molding opening member. An electron beam from an electron beam source is passed through the selected opening of the first shaping opening member, and the passing electron beam is rotated by the minimum rotation angle difference to be formed on the second shaping opening member. Conjugated to the aperture, this An electron beam drawing method comprising: irradiating a sample surface with a conjugated electron beam to draw the approximated portion. 2. The electron beam writing method according to claim 1, wherein the first shaping aperture member is composed of a plurality of aperture members arranged along the electron beam irradiation direction. Line drawing method. 3. The electron beam drawing method according to claim 1, wherein the second molding opening member is formed with openings having a plurality of types of shapes. 4. An electron beam generated from an electron beam source is applied to a first molding opening member having openings of a plurality of types, and the passing electron beam is passed through at least one opening of a predetermined shape. In the electron beam drawing method of irradiating the formed second forming aperture member and irradiating the electron beam that has passed through the sample surface to draw a desired figure, the figure to be drawn is a predetermined basic shape part and this basic shape. Dividing into a plurality of drawing portions including an approximate portion that is similar to the portion, and selecting an opening having a minimum rotation angle difference from the approximate portion among the plurality of openings formed in the first molding opening member. An electron beam from an electron beam source is passed through the selected opening of the first shaping opening member, and the passed electron beam is passed through the second opening.
A step of conjugating with the opening formed in the shaping aperture member, rotating the conjugated electron beam by the minimum rotation angle difference, irradiating the sample surface, and drawing the approximated portion. Electron beam drawing method. 5. The electron beam drawing method according to claim 1, wherein the shapes of the plurality of types of openings formed in the first shaping opening member are polygons. 6. The electron beam drawing method according to claim 5, wherein the polygon is a plurality of types of isosceles triangles, and the apex angles of these isosceles triangles are different from each other. 7. The electron beam drawing method according to claim 5, wherein the polygon is a plurality of rectangles, and the long sides of the plurality of rectangles have different angles with respect to a predetermined reference line. Electron beam drawing method. 8. The electron beam drawing method according to claim 5, wherein the polygon is a plurality of types of hexagons. 9. An electron beam source for generating an electron beam, a first molding opening member which is irradiated with an electron beam from the electron beam source, and which has openings of a plurality of types of shapes, and the first molding opening member. Is irradiated with an electron beam that has passed through the second shaping opening member having at least one opening having a predetermined shape, and an electron beam rotating means for rotating the electron beam. In an electron beam drawing apparatus that irradiates and draws a desired figure, a figure dividing unit that divides the figure to be drawn into a plurality of drawing parts of a predetermined basic shape part and an approximate part approximate to this basic shape part, Among the plurality of openings formed in the first shaping opening member, the approximate portion, a figure selecting unit for selecting an opening having a minimum rotation angle difference, and an electron beam from an electron beam source are provided in the above-mentioned first shaping opening member. Passed through the selected aperture, this passed An electron beam control unit that rotates the electron beam by the minimum rotation angle difference to conjugate it with the opening formed in the second shaping aperture member, and irradiates the conjugated electron beam onto the sample surface. Electron beam writer. 10. The electron beam writing apparatus according to claim 9, wherein the first shaping aperture member is composed of a plurality of aperture members arranged along the electron beam irradiation direction. Line drawing device. 11. The electron beam drawing apparatus according to claim 9, wherein the second molding opening member is formed with openings having a plurality of types of shapes. 12. An electron beam source for generating an electron beam, a first molding opening member which is irradiated with an electron beam from the electron beam source, and has openings of a plurality of types of shapes, and the first molding opening member. Is irradiated with an electron beam that has passed through the second shaping opening member having at least one opening having a predetermined shape, and an electron beam rotating means for rotating the electron beam. In an electron beam drawing apparatus for irradiating and drawing a desired figure, a figure dividing section for dividing the figure to be drawn into a plurality of drawing parts of a predetermined basic shape part and an approximate part approximating the basic shape part, Among the plurality of openings formed in the first shaping opening member, the approximate portion, a figure selecting unit for selecting an opening having a minimum rotation angle difference, and an electron beam from an electron beam source are provided in the above-mentioned first shaping opening member. Pass through the selected aperture, this pass through The second electron beam
An electron beam drawing apparatus comprising: an electron beam control unit which is conjugated with an opening formed in a shaping aperture member, rotates the conjugated electron beam by the minimum rotation angle difference, and irradiates the sample surface with the electron beam control unit. . 13. The electron beam drawing apparatus according to claim 9, wherein the shapes of the plurality of types of openings formed in the first shaping opening member are polygonal shapes. 14. The electron beam drawing apparatus according to claim 13, wherein the polygon is a plurality of types of isosceles triangles,
An electron beam drawing apparatus, wherein the isosceles triangles have different vertex angles. 15. The electron beam drawing apparatus according to claim 13, wherein the polygon is a plurality of rectangles, and long sides of the plurality of rectangles have different angles with respect to a predetermined reference line. Electron beam writer. 16. The electron beam drawing apparatus according to claim 13, wherein the polygon is a plurality of types of hexagons.