JPH07316845A - Surface treating solution for silver plated member - Google Patents

Surface treating solution for silver plated member

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Publication number
JPH07316845A
JPH07316845A JP10528794A JP10528794A JPH07316845A JP H07316845 A JPH07316845 A JP H07316845A JP 10528794 A JP10528794 A JP 10528794A JP 10528794 A JP10528794 A JP 10528794A JP H07316845 A JPH07316845 A JP H07316845A
Authority
JP
Japan
Prior art keywords
silver
alkali
plated
area
surface treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10528794A
Other languages
Japanese (ja)
Inventor
Toshinori Ozaki
敏範 尾崎
Ryoichi Koizumi
良一 小泉
Noboru Haginome
昇 萩野目
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP10528794A priority Critical patent/JPH07316845A/en
Publication of JPH07316845A publication Critical patent/JPH07316845A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain a surface treating soln. less liable to cause the damage to a spot Ag plated part and to extremely facilitate process control. CONSTITUTION:This surface treating soln. has such a compsn. as the rate of removal of silver plating becomes low in accordance with the reduction of the ratio of the area of a silver plated part to the area of an exposed base or has such a compsn. as the rate of removal of silver plating is kept constant independently of the ratio of the area of a silver plated part to the area of an exposed base. For example, this surface treating soln. has a compsn. contg. 0.5-2mol/l alkali cyanide as a principal component, 0.1-0.2mol/l alkali ferricyanide or oxidizing agent as a substitute for the alkali ferricyanide, 0.5-20% alkali hydroxide and 0.01-1.0% org. inhibitor. The addition of the alkali ferricyanide or oxidizing agent can be made unnecessary by impressing positive voltage.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、銀(Ag)めっき部材
の表面処理液に係り、特に部分Agめっきを有する板
材、たとえはリードフレームの漏れ銀を溶解剥離除去す
るのに好適な表面処理液に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment solution for a silver (Ag) plated member, and particularly to a plate material having partial Ag plating, for example, a surface treatment suitable for dissolving and removing leakage silver of a lead frame. Regarding liquid.

【0002】[0002]

【従来の技術】リードフレーム等、部分Agめっきを有
する材料の製造プロセスでは「Agめっき剥離処理」工
程が存在する。すなわち図2に示すように、下地板1に
スポットAgめっき部分2を与えるものであるが、その
周辺にめっきマスクより漏れたAgめっき液によって極
く薄い漏れAgめっき部分3が不可避的に存在し、Ag
めっき部分3のAgを溶解剥離除去する工程である。
2. Description of the Related Art In a manufacturing process of a material having a partial Ag plating such as a lead frame, there is an "Ag plating peeling process" step. That is, as shown in FIG. 2, the spot Ag plating portion 2 is provided on the base plate 1, but an extremely thin leak Ag plating portion 3 is inevitably present around the spot Ag plating portion 2 due to the Ag plating solution leaking from the plating mask. , Ag
In this step, Ag of the plated portion 3 is removed by melting and peeling.

【0003】ここで、Agめっき部分面積(漏れAgめ
っき部分3を含む)と下地露出面積(たとえば銅(C
u))との比はAgめっき直後が10/1、Agめっき
剥離液浸漬途中が1/1、その最終段階が1/10程度
に刻々と変化するものである。従来、このAgめっき剥
離液としてシアン化アルカリ塩を主成分とした表面処理
液を用いていた(例えば、特公昭55−9463号公報
など)。これによれば、上記比の変化に対応してAgめ
っき剥離速度が小→中→大へと変化し、スポットAgめ
っき部分2が過剰に溶解損傷(厚さの減少や、表面粗さ
の増大)するケースが少なくない。また、その液調整が
難しかった。
Here, the area of the Ag-plated portion (including the leakage Ag-plated portion 3) and the exposed area of the base (for example, copper (C
The ratio with u)) is such that it is 10/1 immediately after Ag plating, 1/1 during immersion in the Ag plating stripping solution, and the final stage thereof changes about 1/10 every moment. Conventionally, a surface treatment liquid containing an alkali cyanide as a main component has been used as the Ag plating stripping liquid (for example, Japanese Patent Publication No. 55-9463). According to this, the Ag plating peeling rate changes from small → medium → large corresponding to the change of the above ratio, and the spot Ag plated portion 2 is excessively melted and damaged (the thickness is reduced and the surface roughness is increased). There are not a few cases where In addition, it was difficult to adjust the liquid.

【0004】なお、従来の表面処理液の組成はおよそ次
の通りである。
The composition of the conventional surface treatment liquid is as follows.

【0005】(1)シアン化アルカリ塩は0.2〜1モ
ル/l (2)フェリシアン化アルカリ塩は0.2〜1モル/l (3)水酸化アルカリ塩10〜40%以上 (4)有機インヒビタは一般に1%以上
(1) 0.2-1 mol / l of alkali cyanide salt (2) 0.2-1 mol / l of ferricyanide salt (3) 10-40% or more of alkali hydroxide salt (4 ) Organic inhibitors are generally more than 1%

【0006】[0006]

【発明が解決しようとする課題】上述したように、従来
のシアン化アルカリ塩を主成分とした銀めっき部材の表
面処理液では、Agめっき部分面積/下地露出面積の比
が刻々と変化していくにしたがい、Agめっき剥離速度
が小→中→大へと変化し、スポットAgめっき部分2が
過剰に溶解損傷するケースが少なくなく、また液調整が
難しかった。
As described above, in the conventional surface treatment liquid for a silver-plated member containing alkali cyanide as a main component, the ratio of the Ag-plated partial area / underlying exposed area changes momentarily. As a result, the Ag plating peeling rate changed from small to medium to large, and there were many cases where the spot Ag plated portion 2 was excessively dissolved and damaged, and it was difficult to adjust the solution.

【0007】この種の溶解挙動が生じる理由は、ごく簡
単に説明される。すなわち、下地(たとえばCu)とA
gめっき部分が電気的に接続されて、溶液に浸漬された
場合、両材料の溶解速度はガルバニック腐食とよばれる
電気化学的相互作用として決定されることが知られてお
り、溶液、材料の種類、各材料の表面積比、が強
く影響する。そして、Ag(貴電位材料)とCu(卑電
位材料)との面積比が仮に10/1、1/1、1/10
と変化すれば、貴電位材料Agの溶解速度は小→中→大
へと変化するのが通常である。このことは、Agに代え
てFeを、またCuに代えてZnを準備し、腐食液とし
て例えば1%硫酸とか、海水とか、水道水とかにした場
合でも同様であることが理論的に知られている。
The reason why this type of dissolution behavior occurs is explained very simply. That is, the base (eg Cu) and A
It is known that when the g-plated part is electrically connected and immersed in a solution, the dissolution rate of both materials is determined as an electrochemical interaction called galvanic corrosion. The surface area ratio of each material has a strong influence. If the area ratio of Ag (noble potential material) and Cu (base potential material) is 10/1, 1/1, 1/10.
, The dissolution rate of the noble potential material Ag normally changes from small to medium to large. It is theoretically known that this is the same even when Fe is replaced with Ag and Zn is replaced with Cu and the corrosive liquid is, for example, 1% sulfuric acid, seawater, or tap water. ing.

【0008】従って、従来のAgめっき剥離液を用いる
限り、上述の溶解挙動はごく一般的と言え、その液を用
いる限り、最終段階でAgスポット部分が損傷しやすく
なる。
Therefore, as long as the conventional Ag plating stripping solution is used, the above-mentioned dissolution behavior can be said to be very general, and as long as that solution is used, the Ag spot portion is likely to be damaged at the final stage.

【0009】本発明の目的は、上述した従来技術の欠点
を解消して、部分損傷が基本的に生じにくく、プロセス
管理が極く容易になる銀めっき部材の表面処理液を提供
することにある。
An object of the present invention is to solve the above-mentioned drawbacks of the prior art, and to provide a surface treatment liquid for a silver-plated member, in which partial damage is basically unlikely to occur and process control is extremely easy. .

【0010】[0010]

【課題を解決するための手段】第1の発明は、銀めっき
部分面積/下地露出面積の比が小さくなるにしたがっ
て、銀めっき剥離除去速度が小さくなっていく組成をも
つ銀めっき部材の表面処理液である。
A first aspect of the present invention is a surface treatment of a silver-plated member having a composition such that the removal rate of silver-plating peeling decreases as the ratio of the silver-plated partial area / underlying exposed area decreases. It is a liquid.

【0011】第2の発明は、銀めっき部分面積/下地露
出面積の比にかかわらず、銀めっき剥離除去速度がほぼ
一定となる組成をもつ銀めっき部材の表面処理液であ
る。
A second aspect of the present invention is a surface treatment liquid for a silver-plated member having a composition such that the removal rate of silver-plating peeling is substantially constant regardless of the ratio of the silver-plated partial area / underlying exposed area.

【0012】第3の発明は、銀めっき部材の表面処理液
を次のように組成したものである。 (1)シアン化アルカリ塩を0.5〜2モル/l (2)フェリシアン化アルカリ塩またはこれに代わる酸
化剤を0.1〜0.2モルl (3)水酸化アルカリ塩を0.5〜20% (4)有機インヒビタを0.01〜1.0% とする。
A third aspect of the present invention comprises a surface treatment solution for a silver-plated member, which has the following composition. (1) 0.5 to 2 mol / l alkali cyanide (2) 0.1 to 0.2 mol l ferricyanide or an alternative oxidant (3) alkali hydroxide. 5 to 20% (4) The organic inhibitor is set to 0.01 to 1.0%.

【0013】シアン化アルカリ塩の下限はAgの溶解剥
離速度を大きく与える点から0.5モル/lであり、上
限はAgとCuの溶解速度の比が必要以上に低下するこ
とを防止する点から2モル/lである。フェリシアン化
アルカリ塩またはこれに代わる酸化剤の下限はAgの溶
解剥離速度を大きくする点から0.1モル/lであり、
上限はAgとCuの溶解速度の比が必要以上に低下する
ことを防止する点から0.2モル/lである。水酸化ア
ルカリ塩の下限はCuおよびAgの溶解速度の低下防止
の点から0.5%であり、上限は材料の溶解後の変色防
止の点から20%である。そして、有機インヒビタの下
限はAgに対するCu下地の溶解速度の低下防止の点か
ら0.01%であり、上限はその効果が飽和することか
ら主に経済的意味で1.0%である。
The lower limit of the alkali cyanide salt is 0.5 mol / l from the viewpoint of giving a large dissolution and peeling rate of Ag, and the upper limit is to prevent the ratio of the dissolution rate of Ag and Cu from unnecessarily decreasing. To 2 mol / l. The lower limit of the ferricyanide alkali salt or an oxidant instead thereof is 0.1 mol / l from the viewpoint of increasing the dissolution and peeling rate of Ag,
The upper limit is 0.2 mol / l in order to prevent the ratio of the dissolution rate of Ag and Cu from unnecessarily decreasing. The lower limit of the alkali hydroxide salt is 0.5% from the viewpoint of preventing the dissolution rate of Cu and Ag from decreasing, and the upper limit is 20% from the viewpoint of preventing discoloration after the material is dissolved. The lower limit of the organic inhibitor is 0.01% from the viewpoint of preventing the lowering of the dissolution rate of the Cu underlayer with respect to Ag, and the upper limit thereof is 1.0% mainly in the economical sense because the effect is saturated.

【0014】ここで、シアン化アルカリ塩は、シアン化
ナトリウム、シアン化カリウム等である。フェリシアン
化アルカリ塩は、フェリシアン化ナトリウム、フェリシ
アン化カリウム等である。フェリシアン化アルカリ塩に
代わる酸化剤は、過酸化水素水や、過硫酸カリ等であ
る。また、水酸化アルカリ塩は、水酸化ナトリウム、水
酸化カリウム等である。
Here, the alkali cyanide salt is sodium cyanide, potassium cyanide or the like. The ferricyanide alkali salt is sodium ferricyanide, potassium ferricyanide, or the like. The oxidizing agent which replaces the ferricyanide alkali salt is hydrogen peroxide solution, potassium persulfate and the like. The alkali hydroxide salt is sodium hydroxide, potassium hydroxide or the like.

【0015】第4の発明は、第3の発明において(2)
のフェリシアン化アルカリ塩またはこれに代わる酸化剤
を0としたものである。
A fourth aspect of the invention is the same as the third aspect (2).
Of the alkali ferricyanide salt or its substitute oxidizing agent is set to 0.

【0016】第5の発明は、第3及び第4の発明におい
て、有機インヒビタとしては、エチレンジアミン、トリ
エタノールアミン、ピペラジン、ベンゾトリアゾール、
スクシンイミド、メチルアミノメルカプチン、フェニル
メルカプトアセトアミド、アミノロダニン、チオウラミ
ル、チオウラゾール、チオヘキサヒドロピリジンを一種
類又は複合して含有したものである。
In a fifth aspect of the invention, in the third and fourth aspects, the organic inhibitor is ethylenediamine, triethanolamine, piperazine, benzotriazole,
The succinimide, methylaminomercaptin, phenylmercaptoacetamide, aminorhodanine, thiouramyl, thiourazole, and thiohexahydropyridine are contained alone or in combination.

【0017】なお、本発明はシアン化アルカリ塩を主成
分とする表面処理液に限定されず、任意の成分をもつ処
理液でも上記のような溶解挙動を示すものであればよ
い。例えば、シアン化アルカリ塩を含まない処理液にも
適用できる。
The present invention is not limited to the surface treatment liquid containing an alkali cyanide as a main component, and a treatment liquid containing any component may be used as long as it exhibits the above-mentioned dissolution behavior. For example, it can be applied to a processing solution containing no alkali cyanide salt.

【0018】[0018]

【作用】好ましいAgめっき部材の表面処理液とは、当
初、Ag面積が大きい場合にAg溶解速度が大きく、徐
々に減少し、最終的にAg面積が小さくなった時点でA
g溶解がストップするか、もしくは無視しえる程度度ま
で減少することである(図2の最下欄参照)。すなわち
そのような挙動をする組成をもつ処理液であれば部分損
傷は基本的に生じにくく、プロセス管理が極く容易にな
る。
The preferred surface treatment liquid for Ag-plated members is that when the Ag area is large, the Ag dissolution rate is high, then gradually decreases, and finally when the Ag area becomes small, A
g lysis is either stopped or reduced to a negligible degree (see bottom column of Figure 2). That is, if the treatment liquid has a composition that behaves in such a manner, partial damage is basically unlikely to occur, and process control becomes extremely easy.

【0019】このことは、性能的にはやや劣るけれど
も、銀めっき部分面積/下地露出面積の比にかかわら
ず、銀めっき剥離除去速度がほぼ一定となる組成をもつ
表面処理液にも当てはまる。
Although this is a little inferior in performance, this also applies to a surface treatment solution having a composition in which the removal rate of silver plating peeling is substantially constant regardless of the ratio of the silver plating partial area / underlying exposed area.

【0020】次に、銀めっき部材の表面処理液の組成を
上述したように具体的に設定した理由を実験に基づいて
説明しよう。
Next, the reason why the composition of the surface treatment liquid for the silver-plated member is specifically set as described above will be explained based on experiments.

【0021】図1はAg板とCu板を接続し、その面積
比を10/1、1/1および1/10に変えた3つの試
料について、3種類のの表面処理液a、b、cを用いた
ときのCu板に対するAg板の溶解速度比である。ここ
で、a液、b液およびc液の各組成は次の通りである。
FIG. 1 shows three kinds of surface treatment liquids a, b and c for three samples in which an Ag plate and a Cu plate are connected and the area ratio thereof is changed to 10/1, 1/1 and 1/10. It is the dissolution rate ratio of the Ag plate to the Cu plate when is used. Here, the compositions of the liquid a, the liquid b, and the liquid c are as follows.

【0022】a液;トリエタノールアミン0.1%、フ
ェリシアン化ナトリウム0.10モル/l、水酸化ナト
リウム10%、そしてシアン化ナトリウム55g/lの
混合液。
Solution a: a mixed solution of 0.1% triethanolamine, 0.10 mol / l sodium ferricyanide, 10% sodium hydroxide, and 55 g / l sodium cyanide.

【0023】b液;トリエタノールアミン0.5%、フ
ェリシアン化ナトリウム0.2モル/l、他はa液と同
じ。
Solution b; triethanolamine 0.5%, sodium ferricyanide 0.2 mol / l, other than the same as solution a.

【0024】c液;トリエタノールアミン1%、フェリ
シアン化ナトリウム0.5モル/l、他はa液と同じ。
Solution c: triethanolamine 1%, sodium ferricyanide 0.5 mol / l, otherwise the same as solution a.

【0025】図1より、Ag及びCuの溶解速度はNa
CNを除くa〜c液組成、NaCN濃度、試料組合せ、
などによって様々に変化していることがわかる。
From FIG. 1, the dissolution rate of Ag and Cu is Na
A-c liquid composition excluding CN, NaCN concentration, sample combination,
It can be seen that it has changed in various ways.

【0026】これより、まずc液を見るとAg溶解速度
/Cu溶解速度の比Rの変化は、Ag/Cu面積比が1
0/1(○印)、1/1(△印)、1/10(□印)と
進むにしたがい増大する傾向が見られる。すなわち、c
液は、図2で述べたように、実プロセスの最終段階にお
いて、スポットAgめっき部分が増々溶解損傷しやすく
なる傾向を有する液といえる。
From this, first, looking at the liquid c, the change in the ratio R of Ag dissolution rate / Cu dissolution rate is that the Ag / Cu area ratio is 1
There is a tendency that the number increases as it goes from 0/1 (○ mark), 1/1 (Δ mark), and 1/10 (□ mark). That is, c
As described with reference to FIG. 2, the liquid can be said to be a liquid that tends to be more likely to be melt-damaged at the spot Ag plated portion in the final stage of the actual process.

【0027】一方、b液では、上記3つの試料がほぼ同
じR値を示しており、これはc液より使いやすいプロセ
ス管理が容易な液といえる。したがって、必要条件を満
たしているが、○印と△あるいは□印が逆転していない
点で十分条件を満足していない。
On the other hand, in the liquid b, the above three samples show almost the same R value, which can be said to be a liquid which is easier to use than the liquid c and whose process control is easy. Therefore, although the necessary condition is satisfied, the condition is not sufficiently satisfied in that the mark ○ and the mark Δ or the mark □ are not reversed.

【0028】その点でa液は、c液とは逆の、より好ま
しい傾向を示している。特にNaCN濃度が20g/l
以下では、溶解速度比が比較的大きいことから、より好
ましい傾向にある。
In that respect, the liquid a shows a more preferable tendency, which is the reverse of the liquid c. Especially NaCN concentration is 20g / l
In the following, since the dissolution rate ratio is relatively large, it tends to be more preferable.

【0029】ただし、a液のただ1つの難点は、図1に
示したように、溶解速度の絶対値が小さい点である。し
かし、この点はプロセス構成として浸漬時間を長くする
とか、液温を高めにするとかの対策をとることにより容
易に解決することができる。いずれにしても、本発明の
処理液を用いる限り、各リードフレームにおいて、漏れ
Agめっき面積が多少変動した場合も、スポットAgめ
っき周辺の漏れAgめっきはすみやかに溶解消失すると
共に、Agスポット部分はほとんど溶解せず、プロセス
管理が極めて容易となる。
However, the only difficulty of the liquid a is that the absolute value of the dissolution rate is small, as shown in FIG. However, this point can be easily solved by taking measures such as prolonging the immersion time or raising the liquid temperature as a process configuration. In any case, as long as the treatment liquid of the present invention is used, even if the leak Ag plating area in each lead frame fluctuates to some extent, the leak Ag plating around the spot Ag plating is promptly dissolved and disappears, and the Ag spot portion is It hardly dissolves and the process control becomes extremely easy.

【0030】以上の溶解挙動は、第3の発明に示した液
組成範囲(図1のa液及びb液に該当)で正確に認めら
れ、各成分範囲を外れると、必ずしも好ましくなかっ
た。
The above-mentioned dissolution behavior was accurately recognized in the liquid composition range shown in the third invention (corresponding to the liquids a and b in FIG. 1), and it was not always preferable if it was out of the respective component ranges.

【0031】また、酸化剤成分として、第3の発明では
フェリシアン化アルカリ塩を用いたが、それに代わって
非処理膜材に陽電圧を付与すれば、同様な効果が期待で
きるので必ずしも必要でない。したがって、第4の発明
のように、酸化剤を含有しなくてもよい。
Although the ferricyanide alkali salt was used as the oxidizer component in the third invention, if a positive voltage is applied to the non-treated film material instead, a similar effect can be expected, so that it is not always necessary. . Therefore, it is not necessary to contain an oxidizing agent as in the fourth invention.

【0032】次に、インヒビタとして第5の発明の各薬
品について同様に検討した結果、その効果の大小の変動
を除けば、いずれも有効であることが確認された。
Next, as a result of the same examination as the inhibitor for each of the chemicals of the fifth invention, it was confirmed that all of them were effective except for the large and small fluctuations of the effect.

【0033】したがって、本発明によれば、漏れAgめ
っき部分の溶解除去とスポットAgめっき部分の健全な
残留が図れるので、次の効果がある。
Therefore, according to the present invention, the leakage Ag plated portion can be dissolved and removed, and the spot Ag plated portion can be soundly retained.

【0034】(1)プロセス管理の平易化、プロセスの
省力化、管理の無人化。
(1) Simplification of process management, labor saving of processes, unmanned management.

【0035】(2)液更新頻度の減少による、液管理コ
ストの低減。
(2) The liquid management cost is reduced by reducing the liquid update frequency.

【0036】(3)製品品質の向上による歩留り向上、
原価低減。
(3) Improving yield by improving product quality,
Cost reduction.

【0037】(4)液組成成分量が低濃度なので、液原
価が低下。
(4) Liquid composition cost is low because of low concentration of liquid composition components.

【0038】[0038]

【実施例】【Example】

(実施例1)銀めっき部材の表面処理液に上記a液を用
いた。処理条件は、液温50℃、浸漬時間15sec で、
スポットAgめっき部分の周辺に極く薄い漏れAgめっ
き部分が存在した実際のリードフレームを処理した。
Example 1 Solution a was used as the surface treatment solution for the silver-plated member. The treatment conditions are a liquid temperature of 50 ° C and an immersion time of 15 seconds.
The actual leadframe was treated with very thin leaky Ag plated areas around the spot Ag plated areas.

【0039】その結果、従来液(c液に近似)に比べ、
スポットAgめっき部分の表面粗さは1/10に、Ag
めっき膜減りの管理値が1/3の範囲になった。
As a result, compared with the conventional liquid (close to liquid c),
The surface roughness of spot Ag plated part is 1/10, Ag
The control value for the reduction of the plating film was in the range of 1/3.

【0040】(実施例2)Ag漏れ面積が大幅に変動
(素地面積に対し1/50〜2/3倍)したリードフレ
ームについて実施例1と同一プロセス条件で流したとこ
ろ、何の障害も生じなかった。
(Embodiment 2) A lead frame whose Ag leakage area fluctuates greatly (1/50 to 2/3 times as much as the base material area) is flowed under the same process conditions as in Embodiment 1, and no trouble occurs. There wasn't.

【0041】(比較例)c液を用いた点を除き、実施例
1と同一プロセス条件でリードフレームを流したとこ
ろ、Ag漏れ面積の大小に応じ、きめ細かくリードフレ
ーム浸漬時間、液温を変動させないと、Ag漏れ部分が
残留したり、逆にAgスポット部が溶解損傷するなど問
題があった。
(Comparative Example) A lead frame was run under the same process conditions as in Example 1 except that the liquid c was used. The lead frame immersion time and the liquid temperature were not finely changed according to the size of the Ag leakage area. Then, there is a problem that the Ag leak portion remains, and conversely, the Ag spot portion is melted and damaged.

【0042】[0042]

【発明の効果】本発明によれば、表面処理液の組成を銀
めっき部分面積/下地露出面積の比が小さくなるにした
がって、銀めっき剥離除去速度が小さくなっていくよう
にするか、銀めっき部分面積/下地露出面積の比にかか
わらず、銀めっき剥離除去速度がほぼ一定となるように
したので、部分損傷が基本的に生じにくく、プロセス管
理が極く容易になる。
According to the present invention, the composition of the surface treatment solution is set so that the removal rate of the silver plating peeling becomes smaller as the ratio of the silver plating partial area / underlying exposed area becomes smaller, or Regardless of the ratio of the partial area to the exposed area of the undercoat, the removal rate of the silver plating peeling is set to be substantially constant, so that partial damage is basically unlikely to occur and the process control becomes extremely easy.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例と従来例とに係るAg板とCu
板とを接続した試料における各種溶液をパラメータとし
たNaCN濃度に関する溶解速度比を示す図であって、
横軸はNaCN(g/l)、縦軸はAg溶解速度/Cu
溶解速度の比Rである。
FIG. 1 is an Ag plate and Cu according to an example of the present invention and a conventional example.
It is a figure which shows the dissolution rate ratio regarding NaCN density | concentration which made various solutions the parameter in the sample which connected the board,
The horizontal axis is NaCN (g / l), the vertical axis is Ag dissolution rate / Cu
It is the ratio R of the dissolution rate.

【図2】部分Agめっき板材におけるAgめっき部分の
溶解挙動と、従来及び本発明に関するAgめっき剥離除
去速度の説明図。
FIG. 2 is an explanatory diagram of a dissolution behavior of an Ag-plated portion in a partial Ag-plated plate material and an Ag-plating peeling removal rate related to the conventional method and the present invention.

【符号の説明】[Explanation of symbols]

1 下地板(たとえばCu) 2 スポットAgめっき部分 3 漏れAgめっき部分 1 Base plate (eg Cu) 2 Spot Ag plated part 3 Leakage Ag plated part

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】銀めっき部分面積/下地露出面積の比が小
さくなるにしたがって、銀めっき剥離除去速度が小さく
なっていく組成をもつ銀めっき部材の表面処理液。
1. A surface treatment liquid for a silver-plated member having a composition in which the rate of peeling and removing silver plating decreases as the ratio of the silver-plated partial area / underlying exposed area decreases.
【請求項2】銀めっき部分面積/下地露出面積の比にか
かわらず、銀めっき剥離除去速度がほぼ一定となる組成
をもつ銀めっき部材の表面処理液。
2. A surface treatment liquid for a silver-plated member having a composition such that the removal rate of silver-plating peeling is substantially constant regardless of the ratio of the silver-plated partial area / underlying exposed area.
【請求項3】シアン化アルカリ塩0.5〜2モル/l
と、フェリシアン化アルカリ塩またはこれに代わる酸化
剤0.1〜0.2モル/lと、水酸化アルカリ塩0.5
〜20%と、および有機インヒビター0.01〜1.0
%とを含有する銀めっき部材の表面処理液。
3. Alkali cyanide salt 0.5-2 mol / l
And 0.1 to 0.2 mol / l of an alkali ferricyanide salt or an alternative oxidant, and an alkali hydroxide of 0.5
˜20%, and organic inhibitor 0.01-1.0
%, A surface treatment liquid for a silver-plated member.
【請求項4】上記フェリシアン化アルカリ塩またはこれ
に代わる酸化剤を含有しない請求項3に記載の銀めっき
部材の表面処理液。
4. The surface treatment solution for a silver-plated member according to claim 3, which does not contain the alkali ferricyanide salt or an oxidant in place thereof.
【請求項5】上記有機インヒビタとして、エチレンジア
ミン、トリエタノールアミン、ピペラジン、ベンゾトリ
アゾール、スクシンイミド、メチルアミノメルカプチ
ン、フェニルメルカプトアセトアミド、アミノロダニ
ン、チオウラミル、チオウラゾール、チオヘキサヒドロ
ピリジンを一種類または複合して含有する請求範囲3ま
たは4に記載の銀めっき部材の表面処理液。
5. The organic inhibitor contains ethylenediamine, triethanolamine, piperazine, benzotriazole, succinimide, methylaminomercaptin, phenylmercaptoacetamide, aminorodanine, thiouramyl, thiourazole, thiohexahydropyridine, either alone or in combination. The surface treatment liquid for a silver-plated member according to claim 3 or 4.
JP10528794A 1994-05-19 1994-05-19 Surface treating solution for silver plated member Pending JPH07316845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10528794A JPH07316845A (en) 1994-05-19 1994-05-19 Surface treating solution for silver plated member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10528794A JPH07316845A (en) 1994-05-19 1994-05-19 Surface treating solution for silver plated member

Publications (1)

Publication Number Publication Date
JPH07316845A true JPH07316845A (en) 1995-12-05

Family

ID=14403472

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10528794A Pending JPH07316845A (en) 1994-05-19 1994-05-19 Surface treating solution for silver plated member

Country Status (1)

Country Link
JP (1) JPH07316845A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6783690B2 (en) * 2002-03-25 2004-08-31 Donna M. Kologe Method of stripping silver from a printed circuit board

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6783690B2 (en) * 2002-03-25 2004-08-31 Donna M. Kologe Method of stripping silver from a printed circuit board

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