JPH07294962A - Liquid crystal display device and its production - Google Patents

Abstract

PURPOSE:To eliminate flickering and image burning by subjecting nonlinear resistance elements via apertures formed at a flack-matrix to photoirradiation. CONSTITUTION:The black matrix 7 is formed with the apertures 13 or irradiating the nonlinear resistance elements 14 with light in positions corresponding to the nonlinear resistance elements 14. Further, a second substrate 6 is provided with counter electrodes 9 consisting of ITO films so as to face the display electrodes 5 and transparent projections 15 are formed of a transparent insulating material in the positions of the apertures 13 of the black matrix on the counter electrodes 9. In such a case, the liquid crystal display device does not make self-light emission and, therefore, an illuminating part for display is needed as light from the outside. A second substrate 6 forming the black matrix 7 is consequently arranged on the illuminating part side for display consisting of, for example, a three wavelength fluorescent tube, reflection plate and diffusion plate. As a result, the nonlinear resistance elements 14 are easily irradiated with the light by using the illuminating parts for display via the transparent projections 15 from the apertures 13 of the black matrix 7.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention has a first substrate having a first electrode and a second electrode, and a first electrode and a second electrode in an overlapping region of the first electrode and the second electrode. A metal-insulating film-metal (MIM) having an anodic oxide film, a silicon oxide film, a silicon nitride film, a silicon carbide film, a tantalum oxide film, or an aluminum oxide film of the first electrode as a nonlinear resistance layer between the electrode and the electrode. The present invention relates to a structure of a liquid crystal display device having a nonlinear resistance element having a structure and a manufacturing method for forming the structure.

[0002]

2. Description of the Related Art In recent years, a display device using a liquid crystal panel has been steadily increasing in capacity. However, in a system using a multiplex drive for a display device having a simple matrix structure, the contrast is lowered as the time division is increased. Alternatively, the response speed decreases, and it becomes difficult to obtain a sufficient contrast when there are about 200 scanning lines.

Therefore, in order to eliminate such a defect, an active matrix liquid crystal display panel in which a switching element is provided in each pixel is adopted.

This active matrix liquid crystal display panel is roughly classified into a three-terminal system using a thin film transistor and a two-terminal system using a non-linear resistance element, but the two-terminal system is simple in structure and manufacturing method. Are better.

For the two-terminal system, a diode type, a varistor type, a MIM type and the like have been developed. The MIM type is characterized by its simple structure and short manufacturing process.

FIG. 6 is a plan view showing the structure of a liquid crystal display device using a non-linear resistance element. Further, FIG. 7 is a cross-sectional view showing a cross section taken along line AA in the plan view showing the liquid crystal display device of FIG. Hereinafter, description will be made by alternately using FIG. 6 and FIG. 7.

A first electrode 32 is formed on the first substrate 31, and a nonlinear resistance layer 33 is formed on the first electrode 32. Further, the second electrode 34 is formed so as to overlap the non-linear resistance layer 33 to form the non-linear resistance element 30. A part of the second electrode 34 also serves as the display electrode 35.

A black matrix 37 indicated by diagonal lines 61 is formed on the second substrate 36 in order to prevent light from leaking from the gaps between the display electrodes 35 formed on the first substrate 31. .

Further, the display electrode 3 is formed on the second substrate 36.
5, the counter electrode 39 is formed via the insulating film 38 so as not to come into contact with the black matrix 37 and short-circuit.

A first electrode 32 provided on a first substrate 31
Forms a region that is extended to form the nonlinear resistance element 30, and this extended region overlaps the second electrode 34 to form the nonlinear resistance element 30.

Further, as shown in the plan view of FIG. 6, the first electrode 32 and the display electrode 35 have a constant gap.

The display electrode 35 becomes a pixel portion of the liquid crystal display panel by arranging the display electrode 35 so as to overlap the counter electrode 39.

The black matrix 37 is a display electrode 35.
The display electrode 3 is formed so as to extend to the formation region of
It also has the role of preventing the leakage of light from the peripheral region of 5.

Black matrix 37 on display electrode 35
The liquid crystal display device performs a predetermined display according to the change in the transmittance of the liquid crystal in the region where the pixel is not formed.

Further, the first substrate 31 and the second substrate 36 are each provided with an alignment film 40 as a processing layer for regularly arranging the molecules of the liquid crystal 41.

Furthermore, by means of the spacer 42,
The first substrate 31 and the second substrate 36 are opposed to each other with a predetermined gap, and the liquid crystal 41 is sealed between the first substrate 31 and the second substrate 36.

[0017]

By the way, some non-linear resistance elements exhibit an asymmetrical change depending on the polarity of the applied voltage. A characteristic example of the non-linear resistance element having this asymmetrical characteristic will be described with reference to the drawings.

In FIG. 8, tantalum (T
a), tantalum oxide (Ta ₂ O) as a nonlinear resistance layer
₅ ) is a graph showing voltage-current characteristics of a non-linear resistance element using ITO (indium tin oxide) which is a transparent conductive film as the second electrode.

In the graph of FIG. 8, the curve L shows the initial characteristics of the nonlinear resistance element. On the other hand, the curve M shows the characteristic after driving the nonlinear resistance element.

When a positive voltage is applied to the first electrode of the non-linear resistance element, the curve M showing the characteristics after driving can flow through the non-linear resistance element at the same voltage than the curve L showing the initial characteristics. The current value that can be generated is greatly reduced.

When a negative voltage is applied to the first electrode of the non-linear resistance element, a curve M showing the characteristics after driving is applied.
Shows almost no difference between the curve L showing the initial characteristics and the current value that can be passed through the non-linear resistance element at the same voltage.

Here, the difference between the curve L showing the initial characteristics when a positive voltage is applied to the first electrode (Ta) and the curve M showing the characteristics after driving is indicated by P, and similarly. , Q indicates the difference between the curve L showing the initial characteristics when a negative voltage is applied to the first electrode (Ta) and the curve M showing the characteristics after driving. As is clear from the graph of FIG. 8, the differences P and Q are larger than the difference Q when a negative voltage is applied to the first electrode, and the difference P when a positive voltage is applied to the first electrode.
Is much larger.

Further, FIG. 9 shows changes in the differences P and Q explained with reference to the graph of FIG. 8 according to the driving time.

The curve R shows the change in the difference P with the driving time when a positive voltage is applied to the first electrode, and the amount of change in the current value sharply increases with the driving time.

On the other hand, the curve S shows the change of the difference Q with the driving time when a negative voltage is applied to the first electrode, and the current value hardly changes even if the driving time increases. It has not occurred.

This state can be shown by the difference U between the curve R and the curve S, and the difference U rapidly increases with the driving time.

This difference U changes depending on the amount of current flowing through the non-linear resistance element, the environment in which the non-linear resistance element is driven, and the history of the non-linear resistance element, in addition to the driving time.

Therefore, it is extremely difficult to compensate for the change in the difference U.

When the difference U is generated, the voltage applied to the liquid crystal pixel is different when a positive voltage is applied to the first electrode of the non-linear resistance element and when a negative voltage is applied. As a result, the image flickering phenomenon due to flicker and the image sticking phenomenon, which is the afterimage phenomenon due to the bias of the ions in the liquid crystal, occur, and the display quality of the liquid crystal display device is significantly degraded.

The object of the present invention is to suppress the asymmetrical characteristic change due to the polarity of the above-mentioned nonlinear resistance element, reduce the direct current application to the liquid crystal, eliminate the deterioration of the quality of the liquid crystal, and prevent the flicker phenomenon and the image sticking phenomenon. To provide a structure of a liquid crystal display device having good image quality and a manufacturing method for forming the structure.

[0031]

In order to achieve the above object, the structure of the liquid crystal display device of the present invention and the manufacturing method for forming this structure adopt the following means.

The liquid crystal display device of the present invention comprises a first substrate and a second substrate, and the first substrate is a non-linear resistance element including a first electrode, a non-linear resistance layer and a second electrode. The second substrate has a display electrode and a black matrix having an opening, a counter electrode on the black matrix, and a transparent protrusion provided on the counter electrode at a position facing the opening, and the second substrate has an opening. It is characterized in that it is provided at a position facing the non-linear resistance element, and the non-linear resistance element is irradiated with light.

The method of manufacturing a liquid crystal display device of the present invention is the first
Of the substrate, the step of forming the first electrode material on the entire surface and patterning by photoetching to form the first electrode, the step of forming the non-linear resistance layer on the surface of the first electrode, A step of forming a second electrode material and patterning it by photo-etching to form a second electrode, and simultaneously forming a display electrode at the same time as a non-linear resistance element composed of the first electrode, the non-linear resistance layer and the second electrode; The second substrate has a step of forming a black matrix having openings using a printing method, a step of forming a counter electrode material on the entire surface and forming the counter electrode by photoetching, and a transparent protrusion on the entire surface. A step of forming a material and forming a transparent protrusion at a position corresponding to the opening by photoetching, stacking the first substrate and the second substrate, and further forming a transparent substrate between the first substrate and the second substrate. Liquid crystal in between Characterized in that it enter.

The method of manufacturing a liquid crystal display device of the present invention is the first
A step of forming a first electrode material on the entire surface of the substrate and patterning by photoetching to form a first electrode; and a step of forming a non-linear resistance layer on the surface of the first electrode.
A step of forming a second electrode material on the entire surface and performing patterning by photoetching to form a second electrode, and forming a nonlinear resistance element composed of the first electrode, the nonlinear resistance layer and the second electrode; A step of forming a display electrode material on the second substrate and forming a display electrode by photo-etching, and a step of forming a black matrix having an opening using a printing method on the second substrate, and forming a counter electrode material on the entire surface. Forming a counter electrode by photoetching and forming a transparent protrusion material on the entire surface and forming a transparent protrusion at a position corresponding to the opening by photoetching.
The substrate and the second substrate are overlapped with each other, and liquid crystal is sealed between the first substrate and the second substrate.

[0035]

The black matrix is provided with an opening, and the nonlinear resistance element is irradiated with light through this opening. This reduces the amount of change in the current value due to the driving time when applying a positive voltage to the first electrode.

Therefore, the difference from the current value due to the driving time when a negative voltage is applied to the first electrode can be made extremely small. For this reason, an asymmetric voltage is not applied to the liquid crystal, and it is possible to suppress a flicker phenomenon or a screen burn-in phenomenon which is an afterimage phenomenon.

Furthermore, in a so-called normally white mode in which the polarization axis of the polarizing plate is arranged at 90 °, a transparent protrusion is provided at a position corresponding to the opening of the black matrix.

As a result, the cell gap between the transparent protrusion and the non-linear resistance element becomes smaller than the cell gap between the counter electrode and the display electrode. Therefore, the transmittance between the transparent protrusion and the non-linear resistance element is very small.

Since there is little light leakage from the openings of the black matrix to the outside of the liquid crystal display device, display quality with high contrast can be obtained.

[0040]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The structure of a liquid crystal display device according to an embodiment of the present invention and its manufacturing method will be described below with reference to the drawings.

First, a first embodiment of the present invention will be described. FIG. 2 is a plan view showing the structure of the liquid crystal display device according to the embodiment of the present invention. FIG. 1 is a sectional view showing a section taken along line BB of the liquid crystal display device shown in the plan view of FIG. Hereinafter, the configuration of the liquid crystal display device of the present invention will be described by alternately using FIG. 1 and FIG.

A first electrode 2 made of tantalum (Ta) is provided on the first substrate 1, and the first electrode 2 is formed on the first electrode 2 by anodizing. A nonlinear resistance layer 3 made of tantalum oxide (Ta ₂ O ₅ ) is provided.

Further, a second electrode 4 made of ITO (indium tin oxide) is formed as a transparent conductive film on the nonlinear resistance layer 3.
To provide.

The first electrode 2, the non-linear resistance layer 3 and the second
And the electrode 4 of the non-linear resistance element 14 of the MIM structure.
Is formed.

As shown in the plan view of FIG. 2, a partial region of the second electrode 4 also serves as the display electrode 5.

On the second substrate 6, in order to prevent light from leaking through the gaps between the respective display electrodes 5 formed on the first substrate 1, the black matrix 7 indicated by the diagonal lines 61 is opaque. It is formed using an insulating material. Figure 2
The black matrix 7 is not formed in the region facing the display electrode 5 as shown in FIG.

In this black matrix 7, an opening 13 for irradiating the nonlinear resistance element 14 with light is formed at a position corresponding to the nonlinear resistance element 14.

Further, a counter electrode 9 made of an ITO film is provided on the second substrate 6 so as to face the display electrode 5.

A transparent protrusion 15 is formed on the counter electrode 9 at the position of the opening 13 of the black matrix using a transparent insulating material.

By making the height dimension of the transparent protrusion 15 slightly smaller than the distance dimension between the display electrode 5 and the counter electrode 9, the cell gap dimension between the transparent protrusion 15 and the non-linear resistance element 14 becomes very small. ing.

The width dimension of the transparent protrusion 15 is made slightly larger than the opening 13 of the black matrix 7 to cope with the positional accuracy of the photolithography process and the taper of the transparent protrusion in the etching process.

By disposing the display electrode 5 so as to overlap the counter electrode 9, it becomes a pixel portion of the liquid crystal display panel.

The black matrix 7 is formed so as to extend to the region where the display electrode 5 is formed.
It has a role of preventing leakage of light from the peripheral region of the display electrode 5.

The liquid crystal display device performs a predetermined display by changing the transmittance of the liquid crystal in the region where the black matrix 7 is not formed on the display electrode 5.

Further, the first substrate 1 and the second substrate 6 are
As a treatment layer for regularly arranging the molecules of the liquid crystal 11,
The alignment film 10 is formed in each case. Furthermore, a spacer 12 makes the first substrate 1 and the second substrate 6 face each other with a predetermined gap, and a liquid crystal 11 is sealed between the first substrate 1 and the second substrate 6. .

Further, a polarizing plate 16 is arranged outside the first substrate 1 and the second substrate 6 so as to intersect the polarization axes thereof, and shows a white state when no voltage is applied. It is in white mode.

Next, the function of the light irradiation effect by the constitution of the liquid crystal display device in the embodiment of the present invention will be explained.

Since the liquid crystal display device does not emit light by itself, a display illumination unit is required as light from the outside.

Therefore, for example, the second substrate 6 forming the black matrix 7 is arranged on the side of the display illumination section composed of the three-wavelength fluorescent tube, the reflection plate and the diffusion plate.

This makes it possible to easily irradiate the nonlinear resistance element 14 with light from the opening 13 of the black matrix 7 through the transparent projection 15 and using the display illumination section.

Using the graph of FIG. 3 and the graph of FIG. 4, how the element characteristics (current-voltage characteristics) are changed by driving the non-linear resistance element when the embodiment of the present invention in which the transparent protrusion 15 is provided is used. Explain.

FIG. 3 is a curve L showing the initial characteristics when a positive voltage is applied to the first electrode (Ta) of the nonlinear resistance element shown in the graph of FIG. 8, and a curve M showing the characteristics after driving.
A curve D showing the dependence of P on the light amount, which shows the difference between
3 shows a curve E showing a difference between a curve L showing an initial characteristic when a negative voltage is applied to the first electrode (Ta) and a curve M showing a characteristic after driving, and a curve E showing a dependence of Q on the light amount. It is a graph.

As is apparent from the graph of FIG. 3, the curve D showing the state in which a positive voltage is applied to the first electrode sharply decreases as the amount of light applied to the nonlinear resistance element becomes larger than 1000 lux. There is.

On the other hand, the curve E showing the state in which a negative voltage is applied to the first electrode gradually decreases as the light quantity increases, but compared with the curve D, the light quantity up to about 5000 lux, The amount of change is extremely small.

When the difference F between the curve D and the curve E is large, an asymmetric voltage is applied to the liquid crystal due to the polarity of the voltage applied to the first electrode, which causes image sticking which is a flicker phenomenon or an afterimage phenomenon. The phenomenon occurs.

Further, as is clear from the graph of FIG.
By irradiating the nonlinear resistance element with a light amount of 5000 lux or more, the amount of asymmetric change due to the polarity of the voltage applied to the first electrode, that is, the difference F can be made extremely small.

Therefore, by driving the liquid crystal display device while irradiating the nonlinear resistance element with the light of 5000 lux, the asymmetrical characteristic change of the nonlinear resistance element can be made extremely small.

FIG. 4 shows the driving time (t) and the amount of change in current (P, Q) when the nonlinear resistance element of the embodiment of the present invention is driven while irradiating it with a light amount of 5000 lux. It is a graph which shows a relationship.

The curve W shown in the graph of FIG. 4 indicates the driving amount P of the current which indicates the difference between the initial characteristics when a positive voltage is applied to the first electrode (Ta) and the characteristics after driving. It is a curve showing time dependence. On the other hand, curve X
Is a curve showing the dependence of the amount of change in current Q on the driving time, which shows the difference between the initial characteristics when a negative voltage is applied to the first electrode (Ta) and the characteristics after driving.

As shown in the graph of FIG. 4, the curve W showing the state in which a positive voltage is applied to the first electrode only slightly increases with the driving time, and the negative voltage is further applied to the first electrode. The change amount of the curve X showing the state in which the voltage is applied is extremely small as the driving time is increased.

Furthermore, the difference T between the curve W and the curve X
However, even if the driving time is increased, it is reduced.

As a result, it is possible to reduce the direct current voltage applied to the liquid crystal, eliminate the deterioration of the quality of the liquid crystal, and prevent the flicker phenomenon and the image sticking phenomenon. Therefore, a liquid crystal display device having good image quality can be obtained.

Next, the function of suppressing light leakage from the opening 13 of the black matrix 7 by the transparent protrusion 15 will be described.

FIG. 5 shows the relationship between the cell gap and the transmittance of the liquid crystal panel used in the examples of the present invention when no voltage is applied.

Since the birefringence anisotropy of the liquid crystal is Δn = 0.125 and the cell gap d is 4 μm, Δnd = 500 nm.
It has become. The transmittance decreases as the cell gap d decreases.

As shown in the graph of FIG. 5, when the cell gap size is 0.7 μm or less, the transmittance is reduced to 10%, and when the cell gap size is 0.4 μm or less,
The transmittance drops to 3%.

In FIG. 1, since the cell gap between the display electrode 5 and the counter electrode 9 is 4 μm, the transmittance is high. On the other hand, the cell gap where the transparent protrusion 15 having a thickness of 3.6 μm is provided is 0.4 μm, and the transmittance is 3%.

Further, when the liquid crystal 11 is actually driven to display a screen, a voltage is applied to the liquid crystal 11 from the first electrode 2, so that the leakage light from the opening 13 is suppressed to 1% or less.

Therefore, by providing the transparent protrusions 15, the openings 13 of the black matrix 7 can be enlarged, and the nonlinear resistance element 14 can be efficiently illuminated with light. Moreover, since light leakage from the opening 13 is eliminated,
There is no need to worry about reducing the contrast.

Next, a method of manufacturing the liquid crystal display device according to the first embodiment of the present invention will be described with reference to FIG.

The first substrate 1 is preferably made of glass having a low alkali metal content, and in the embodiment of the present invention, the product name OA2 made by Nippon Electric Glass Co., Ltd. having a thickness of 1.1 mm is used. .

Next, a tantalum film having a thickness of 0.1 to 0.3 μm is formed as a material of the first electrode 2 on the entire surface of the first substrate 1 by a sputtering method or a vacuum evaporation method.

After that, a photoresist is formed on the entire surface of the first electrode 2 material by a spin coating method, and an exposure process and a development process are performed using a predetermined photomask to pattern the photoresist.

Then, using the patterned photoresist as an etching mask, the first electrode 2 material is
By dry etching using sulfur hexafluoride (SF ₆₎ and helium and mixed gas of oxygen as the etching gas, a tantalum film serving as the first electrode 2 material pattern - and N'ningu, to form a first electrode 2. The line width dimension of the wiring region of the first electrode 2 is 20 μm, and the line width dimension of the nonlinear element region is 3 μm.

Next, the first substrate 1 is immersed in an anodizing bath of citric acid, ammonium borate or the like, and the voltage of 30V to 5V is applied.
Applying a DC voltage of 0V, anodizing process
Tantalum oxide (Ta ₂ O having a film thickness of 5 to 0.1 μm)
_The non-linear resistance layer 3 consisting of ₅ ) is formed.

Further, the material of the second electrode 4 and the display electrode 5
As a material for the above, ITO, which is a transparent conductive film, is formed on the entire surface by a sputtering method or a vacuum deposition method to a thickness of 0.1 to 0.3 μm.

After that, a photoresist is formed on the entire surface of the ITO film by a spin coating method, and an exposure process and a development process are performed using a predetermined photomask to pattern the photoresist.

Then, using the patterned photoresist as an etching mask, the ITO, which is the material for the second electrode 4 and the material for the display electrode 5, is etched with a mixed solution of ferric chloride and hydrochloric acid to form a second photoresist. The electrode 4 and the display electrode 5 are formed. In the embodiment of the present invention, the second electrode 4
The line width dimension of is 3 μm.

Next, a method of manufacturing the second substrate 6 will be described. The second substrate 6 also uses the same glass substrate as the first substrate 1. First, an organic resin in which a black pigment is dispersed is formed by using a printing method, and a heat treatment is performed at a temperature of 150 to 250 ° C. to cure the organic resin in which the black pigment is dispersed to obtain a thickness of 1
A black matrix 7 having an opening 13 of ˜2 μm is formed.

In the embodiment of the present invention, the size of the opening 13 is such that the size of the non-linear resistance element 14 is 3 μm square, and the overlay position accuracy of the first substrate 1 and the second substrate 6 is positive. Since it is minus 4 μm, it is 11 μm square.

Next, as the material of the counter electrode 9, ITO having a thickness of 0.2 to 0.4 μm is formed by the low temperature sputtering method.

After that, a photoresist is formed on the entire surface of the material of the counter electrode 9 by a spin coating method, an exposure process and a development process are performed using a predetermined photomask, and the photoresist is patterned.

Then, using the patterned photoresist as an etching mask, the material of the counter electrode 9 is etched using a mixed solution of ferric chloride and hydrochloric acid,
The counter electrode 9 is formed.

After that, a transparent acrylic photosensitive organic insulating film is formed as the material of the transparent protrusion 15 on the counter electrode 9 by the spin coating method. Then, the temperature is 80 to 10.
A heat treatment is performed at 0 ° C. to dry the acrylic photosensitive organic insulating film.

Next, an exposure process is performed using a photomask having a pattern corresponding to the transparent protrusions 15. Then, the organic insulating film other than the region where the transparent protrusions 15 are formed is removed by etching using a sodium hydroxide solution.

Then, heat treatment is performed at a temperature of 150 to 250 ° C. to cure the film, and the thickness dimension is 3.6 μm and the width dimension is 1.
The transparent protrusion 15 having a size of 5 μm square is formed.

After that, the alignment film 10 is formed on both the first substrate 1 and the second substrate 6 by the printing method.

After that, the alignment film 10 is rubbed. Then, the spacer 12 is formed between the first substrate 1 and the second substrate 6.

After that, a first epoxy-based adhesive is used.
Substrate 1 and second substrate 6 are attached to each other at a predetermined interval.

Further, the liquid crystal 11 is injected between the first substrate 1 and the second substrate 6, and the polarizing plate 16 is provided outside the first substrate 1 and the second substrate 6, and the polarization axis thereof. The liquid crystal display device is completed by adhering so as to intersect at 90 °.

In the embodiment of the present invention, the liquid crystal 11 is
A fluorine-based material with Δn = 0.125 is used, and the cell gap is 4 μm.

Therefore, the thickness of the liquid crystal layer at the transparent protrusion 15 is 0.4 μm, and light leakage from the opening 13 is almost eliminated.

The 5-inch MIM type black-and-white liquid crystal display device formed by the above-described manufacturing process described with reference to FIG. It is possible to obtain a liquid crystal display device having high image quality in which contrast is not deteriorated due to light leakage from the liquid crystal display device.

In the method of manufacturing the first substrate 1 according to the embodiment of the present invention described above, the second electrode 4 and the display electrode 5 are used.
In the above description, the same material is used.

However, the second electrode 4 and the display electrode 5
And may be made of different materials. The structure at this time and the manufacturing method thereof are shown in FIG.

As shown in FIG. 11, first, a chromium film having a thickness of 0.05 to 0.2 μm is formed on the entire surface as a material of the second electrode 4 by a sputtering method, and a width of 3 μm is formed by a photoetching process. A second electrode is formed.

After that, the entire surface of the display electrode 5 made of 0.
An ITO film having a film thickness of 1 to 0.3 μm is formed by a sputtering method, and then I is formed by a photoetching process.
It is also possible to form the display electrode 5 by patterning the TO film.

Furthermore, in the embodiment of the present invention, as shown in the plan view of FIG. 10 and the sectional view of FIG.
Alternatively, the counter electrode 9 in the area opposed to may be deleted.

As shown in FIGS. 10 and 11, the transparent protrusion 1
The counter electrode 9 in the peripheral region of 5 is removed. That is, the counter electrode 9 for removing a partial region is formed on the black matrix 7 having the opening 13.

By forming the counter electrode 9 in the shape shown in FIGS. 10 and 11, the transparent protrusion 15 can be formed on the opening 13 of the black matrix 7 and the second substrate 6. .

As a result, there is an effect that the adhesion of the transparent protrusion 15 to the second substrate 6 can be improved, which is preferable from the viewpoint of adhesion.

In the embodiment of the present invention, a color liquid crystal display device is provided by forming a color filter on the black matrix 7 of the second substrate 6 by a dyeing method, a pigment dispersion method or a printing method. You can also

In the embodiment of the present invention, preferably, the second electrode 4 and the display electrode 5 of the first substrate 1 are deposited on the second electrode 4 and the display electrode 5 by sputtering to have a thickness of 0.1 to 0.5 μm. A passivation film made of silicon (SiO ₂ ) may be formed.

By forming this passivation film, the interaction between the nonlinear resistance element 14 and the liquid crystal 11 can be removed, and the burn-in phenomenon can be further improved.

Further, as the material of the transparent protrusions 15, the example in which the photosensitive organic insulating film is used has been described, but a general organic insulating film or an inorganic insulating film can be used as long as it is a transparent material.

A manufacturing method using an organic insulating film or an inorganic insulating film as the material of the transparent protrusions 15 is as follows: a film forming step, a photoresist forming step, a photolithography step of exposing and developing the photoresist, and a photoresist. Is used as an etching mask.

Next, a second embodiment of the liquid crystal display device of the present invention will be described. FIG. 12 is a cross-sectional view showing the configuration of the second embodiment of the present invention, showing a cross section taken along line BB of the liquid crystal display device shown in the plan view of FIG. Below, Figure 1
The configuration of the liquid crystal display device of the present invention will be described by alternately using 2 and FIG.

A first electrode 2 made of tantalum (Ta) is provided on the first substrate 1, and the first electrode 2 is formed on the first electrode 2 by anodizing. A non-linear resistance layer 3 made of tantalum oxide (Ta ₂ O ₅ ) is provided,
Further, a second electrode 4 made of ITO (indium tin oxide) is provided as a transparent conductive film on the nonlinear resistance layer 3.

The first electrode 2, the non-linear resistance layer 3 and the second
And the electrode 4 of the non-linear resistance element 14 of the MIM structure.
Is formed. Further, the display electrode 5 is formed from the ITO film, which is the same material as the second electrode 4.

On the second substrate 6, a black matrix 7 using a chromium film is formed in order to prevent light from leaking through the gaps between the display electrodes 5 formed on the first substrate 1.
Is formed with a thickness of 0.1 to 0.2 μm.

In this black matrix 7, an opening 13 for irradiating the nonlinear resistance element 14 with light is formed.

Further, a counter electrode 9 made of an ITO film is provided on the black matrix 7 so as to face the display electrode 5 via the insulating film 8.

A transparent protrusion 15 made of a transparent insulating material is formed on the counter electrode 9 and in a region corresponding to the position of the opening 13 of the black matrix.

The height of the transparent protrusion 15 is made slightly smaller than the distance between the display electrode 5 and the counter electrode 9. As a result, the cell gap between the transparent protrusion 15 and the nonlinear resistance element 14 is extremely small.

The width of the transparent protrusion 15 is made slightly larger than the size of the opening 13 of the black matrix 7. this is,
This is to cope with the positional accuracy of the transparent protrusions 15 in the photolithography process and the taper of the transparent protrusions 15 in the etching process.

Further, the first substrate 1 and the second substrate 6 are
As a treatment layer for regularly arranging the molecules of the liquid crystal 11,
The alignment film 10 is formed in each case.

Furthermore, with the spacer 12,
The first substrate 1 and the second substrate 6 are opposed to each other with a predetermined gap, and a liquid crystal 11 is sealed between the first substrate 1 and the second substrate 6.

A polarizing plate 16 is arranged outside the first substrate 1 and the second substrate 6 so that their polarization axes intersect with each other, and shows normally white when no voltage is applied. It is in white mode.

With the structure shown in FIG. 12, the nonlinear resistance element 14 can be efficiently irradiated with light from the opening 13 of the black matrix 7 through the insulating film 8 and the transparent protrusion 15. As a result, the flicker phenomenon and the burn-in phenomenon can be prevented.

Furthermore, the cell gap size between the transparent protrusion 15 and the non-linear resistance element 14 becomes very small. For this reason, light leakage from the opening 13 is eliminated, so that a liquid crystal display device having a high-quality display image with high contrast can be obtained.

Next, a method of manufacturing the liquid crystal display device according to the second embodiment of the present invention will be described with reference to FIG.

As the first substrate 1, it is preferable to use a glass material having a low content of alkali metal. In the embodiment of the present invention, a trade name OA2 manufactured by Nippon Electric Glass Co., Ltd.
Use a 1.1 mm thick one.

Next, a tantalum film having a thickness of 0.1 to 0.3 μm is formed as a material for the first electrode 2 on the entire surface of the first substrate 1 by a sputtering method or a vacuum evaporation method.

After that, a photoresist is formed on the entire surface of the first electrode 2 material by a spin coating method, an exposure process and a development process are performed using a predetermined photomask, and the photoresist is patterned.

Then, using the patterned photoresist as an etching mask, the first electrode 2 material is
By dry etching using sulfur hexafluoride (SF ₆₎ and helium and mixed gas of oxygen as the etching gas, a tantalum film serving as the first electrode 2 material pattern - and N'ningu, to form a first electrode 2. The line width of the wiring region of the first electrode 2 is 20 μm, and the line width of the nonlinear element region is 3 μm.
And

Next, the first substrate 1 is immersed in an anodic oxidation tank of citric acid, ammonium borate, or the like, and the voltage of 30V to 5V is applied.
Applying a DC voltage of 0V, anodizing process
Tantalum oxide (Ta ₂ O having a film thickness of 5 to 0.1 μm)
_The non-linear resistance layer 3 consisting of ₅ ) is formed.

Further, the material of the second electrode 4 and the display electrode 5
As a material for the above, ITO, which is a transparent conductive film, is formed on the entire surface by a sputtering method or a vacuum deposition method to a thickness of 0.1 to 0.3 μm.

After that, a photoresist is formed on the entire surface of the ITO film by a spin coating method, and an exposure process and a development process are performed using a predetermined photomask to pattern the photoresist.

Then, using the patterned photoresist as an etching mask, the ITO film, which is the material for the second electrode 4 and the material for the display electrode 5, is etched by using a mixed solution of ferric chloride and hydrochloric acid. The second electrode 4 and the display electrode 5 are formed. In the embodiment of the present invention, the second electrode 4
The line width dimension of is 3 μm.

Next, a method of manufacturing the second substrate 6 will be described. The second substrate 6 also uses the same glass substrate as the first substrate 1. Then, as a material of the black matrix 7, a thickness of 0.1 to 0.2 μm is formed on the entire surface of the second substrate 6.
A chromium film of m is formed by a sputtering method or a vacuum evaporation method.

After that, a photoresist is formed on the entire surface of the black matrix 7 material by a spin coating method, and an exposure process and a development process are performed using a predetermined photomask.
This photoresist is patterned.

Then, using the patterned photoresist as an etching mask, the black matrix 7 having the openings 13 is formed by wet etching.

In this embodiment, the chromium film is etched using a mixed solution of cerium ammonium nitrate and perchloric acid to form the black matrix 7 having the openings 13.

Opening 1 formed in the black matrix 7
The size of 3 is 11 μm square because the size of the non-linear resistance element 14 is 3 μm square and the overlay position accuracy of the first substrate 1 and the second substrate 6 is plus or minus 4 μm.

Next, an acrylic organic material is formed as a material for the insulating film 8 on the black matrix 7 by a spin coating method.

Thereafter, a heat treatment is performed at a temperature of 150 to 250 ° C. to cure the acrylic organic material to a thickness of 2 to 5
An insulating film 8 of μm is formed.

Next, as the material of the counter electrode 9, ITO having a thickness of 0.2 to 0.4 μm is formed on the entire surface by the low temperature sputtering method.

After that, a photoresist is formed on the entire surface of the material of the counter electrode 9 by a spin coating method, and an exposure process and a development process are performed using a predetermined photomask to pattern the photoresist.

Then, using the patterned photoresist as an etching mask, the material of the counter electrode 9 is wet-etched using a mixed solution of ferric chloride and hydrochloric acid to form the counter electrode 9.

Next, a transparent acrylic photosensitive organic insulating film is formed as the material of the transparent protrusion 15 on the counter electrode 9 by the spin coating method.

After the acrylic photosensitive organic insulating film is formed, it is heat-treated at a temperature of 80 to 100 ° C. and dried.

Next, an exposure process is performed using a photomask having a pattern corresponding to the transparent protrusions 15. After that, the acrylic photosensitive organic insulating film other than the region where the transparent protrusions 15 are formed is removed by etching using a sodium hydroxide solution.

Thereafter, heat treatment is performed at a temperature of 150 to 250 ° C. to cure the transparent protrusions 15, and the thickness dimension is set to 3.
Transparent protrusion 15 having a 6 μm square shape with a 15 μm square shape
To form.

After that, the alignment film 10 is formed on both the first substrate 1 and the second substrate 6 by the printing method.

After that, rubbing treatment of the alignment film 10 is performed. Then, the spacer 12 is formed between the first substrate 1 and the second substrate 6.

After that, a first epoxy-based adhesive is used.
Substrate 1 and second substrate 6 are attached to each other at a predetermined interval.

Further, the liquid crystal 11 is injected between the first substrate 1 and the second substrate 6, and the polarizing plate 16 is provided outside the first substrate 1 and the second substrate 6 and the polarization axis thereof. The liquid crystal display device is completed by sticking so as to intersect at 90 °.

In the second embodiment of the present invention, the liquid crystal 11 is
A fluorine-based material with Δn = 0.125 is used, and the cell gap size is 4 μm.

Therefore, the thickness of the liquid crystal layer at the transparent protrusion 15 is 0.4 μm, and the light leakage from the opening 13 is almost eliminated.

In the 5 type MIM type black and white liquid crystal display device formed by the manufacturing method described with reference to FIG. Thirteen
It is possible to obtain a liquid crystal display device having high image quality in which contrast is not deteriorated due to light leakage from the liquid crystal display device.

The first substrate 1 of the second embodiment of the present invention
In the manufacturing method of 1., the second electrode 4 and the display electrode 5 are described as an example of being formed of the same material, but they may be formed of different materials as described below.

First, as a material for the second electrode 4, a chromium film having a thickness of 0.05 to 0.2 μm is formed on the entire surface by a sputtering method.

After that, the width dimension is reduced to 3 by photoetching in the same processing step as the method described with reference to FIG.
A second electrode 4 of μm is formed.

After that, an ITO thin film having a thickness of 0.1 to 0.3 μm, which is a material of the display electrode 5, is formed on the entire surface by a sputtering method.

After that, a photoresist is formed on the entire surface of the material of the display electrode 5 by a spin coating method, an exposure process and a development process are performed using a predetermined photomask, and the photoresist is patterned.

Then, using the patterned photoresist as an etching mask, the display electrode 5 material is wet-etched using a mixed solution of ferric chloride and hydrochloric acid to form the display electrode 5.

Further, also in the second embodiment of the present invention, as shown in the plan view of FIG. 10, the counter electrode 9 may be formed in such a shape that the region facing the non-linear resistance element 14 is deleted. Good.

By partially removing the counter electrode 9 in the region facing the non-linear resistance element 14 in this manner, the transparent protrusion 15 can be formed on the insulating film 8 located on the opening 13 of the black matrix 7. it can. As a result, the adhesion of the transparent protrusion 15 to the second substrate 6 can be improved.

In the second embodiment of the present invention, the second substrate 6
A color liquid crystal display device can be provided by forming a color filter on the black matrix 7 using a dyeing method, a pigment dispersion method, or a printing method, and forming an insulating film 8 on the color filter.

In the second embodiment of the present invention, preferably,
A passivation film made of silicon dioxide (SiO ₂ ) having a thickness of 0.1 to 0.5 μm is formed on the second electrode 4 and the display electrode 5 of the first substrate 1 by a sputtering method. Good.

By forming this passivation film, the interaction between the non-linear resistance element 14 and the liquid crystal 11 can be removed, and the burn-in phenomenon can be further improved.

Further, as the material of the transparent protrusions 15, the example in which the photosensitive organic insulating film is used has been described, but a general organic insulating film or an inorganic insulating film can be used as long as it is a transparent material.

When an organic insulating film or an inorganic insulating film is used as a material for the transparent protrusions 15, a film forming step, a photoresist forming step, a photolithography step for exposing and developing the photoresist, and a photoresist are used. Is used as an etching mask.

Next, a third embodiment of the liquid crystal display device of the present invention will be described. FIG. 13 is a cross-sectional view showing the configuration of the third embodiment of the present invention, showing a cross section taken along line BB of the liquid crystal display device shown in the plan view of FIG. Hereinafter, the configuration of the liquid crystal display device of the present invention will be described by alternately using FIG. 13 and FIG.

A first electrode 2 made of tantalum (Ta) is provided on the first substrate 1, and the first electrode 2 is formed on the first electrode 2 by anodizing. A non-linear resistance layer 3 made of tantalum oxide (Ta ₂ O ₅ ) is provided,
Further, a second electrode 4 made of ITO (indium tin oxide) is provided as a transparent conductive film on the nonlinear resistance layer 3.

The first electrode 2, the non-linear resistance layer 3 and the second
And the electrode 4 of the non-linear resistance element 14 of the MIM structure.
Is formed. Further, the display electrode 5 is formed of ITO, which is the same material as the second electrode 4.

On the second substrate 6, a black matrix 7 using a chrome film in order to prevent light leakage from the gaps between the display electrodes 5 formed on the first substrate 1.
To a thickness of 0.1 to 0.2 μm.

In this black matrix 7, an opening 13 for irradiating the nonlinear resistance element 14 with light is formed.

Further, color filters 17 and 18 are provided on the display area of the black matrix 7.

Then, the opening 1 of the black matrix 7
The transparent protrusions 15 are formed on the surface 3 using a photosensitive organic material which is the same material as the color filters 17 and 18.

Further, a counter electrode 9 made of an ITO film is provided so as to face the display electrode 5 via the insulating film 8.

As shown in FIG. 10, the area of the counter electrode 9 facing the non-linear resistance element 14 is deleted and the
To prevent

The height of the transparent protrusion 15 is made slightly smaller than the distance between the display electrode 5 and the counter electrode 9. As a result, the cell gap size between the transparent protrusion 15 and the nonlinear resistance element 14 is extremely small.

The width of the transparent protrusion 15 is made slightly larger than the size of the opening 13 of the black matrix 7 in order to cope with positional accuracy in the photolithography process and taper of the transparent protrusion in the etching process. There is.

Further, the first substrate 1 and the second substrate 6 are
As a treatment layer for regularly arranging the molecules of the liquid crystal 11,
The alignment film 10 is formed in each case.

Furthermore, with the spacer 12,
The first substrate 1 and the second substrate 6 are opposed to each other with a predetermined gap, and a liquid crystal 11 is sealed between the first substrate 1 and the second substrate 6.

Further, a polarizing plate 16 is arranged outside the first substrate 1 and the second substrate 6 so that their polarization axes intersect with each other, and normally shows white when no voltage is applied. It is in white mode.

With the structure shown in FIG. 13, the nonlinear resistance element 14 can be efficiently irradiated with light from the opening 13 of the black matrix 7 through the transparent protrusion 15 and the insulating film 8. As a result, the flicker phenomenon and the burn-in phenomenon can be prevented.

Furthermore, the cell gap size between the transparent protrusion 15 and the non-linear resistance element 14 becomes very small. For this reason, light leakage from the opening 13 is eliminated, so that it is possible to obtain a liquid crystal display device having a high-quality display image with high contrast.

Next, a method of manufacturing the liquid crystal display device according to the third embodiment of the present invention will be described with reference to FIG.

The first substrate 1 is preferably made of a glass material having a low content of alkali metal. In the third embodiment of the present invention, the trade name is OA2 made by Nippon Electric Glass and the thickness is 1.1 m.
Use m.

Next, a tantalum film having a thickness of 0.1 to 0.3 μm is formed as a material for the first electrode 2 on the entire surface of the first substrate 1 by a sputtering method or a vacuum evaporation method.

After that, a photoresist is formed on the entire surface of the tantalum film which is the first electrode 2 by a spin coating method, and an exposure process and a development process are performed using a predetermined photomask to pattern the photoresist.

Then, using the patterned photoresist as an etching mask, the first electrode 2 material is
By dry etching using sulfur hexafluoride (SF ₆₎ and helium and mixed gas of oxygen as the etching gas, a tantalum film serving as the first electrode 2 material pattern - and N'ningu, to form a first electrode 2. The line width of the wiring region of the first electrode 2 is 20 μm, and the line width of the nonlinear element region is 3 μm.
And

Next, the first substrate 1 is dipped in an anodic oxidation bath of citric acid, ammonium borate or the like to obtain a voltage of 30V to 5V.
Applying a DC voltage of 0V, anodizing process
Tantalum oxide (Ta ₂ O having a film thickness of 5 to 0.1 μm)
_The non-linear resistance layer 3 consisting of ₅ ) is formed.

Further, as a material for the second electrode 4 and a material for the display electrode, ITO, which is a transparent conductive film, is formed on the entire surface by sputtering or vacuum evaporation to a thickness of 0.1 to 0.3 μm. .

After that, a photoresist is formed on the entire surface of the second electrode 4 material by the spin coating method, and an exposure process and a development process are performed using a predetermined photomask to pattern the photoresist.

Then, using the patterned photoresist as an etching mask, the second electrode 4 material is
Etching is performed using a mixed solution of ferric chloride and hydrochloric acid to form the second electrode 4 and the display electrode 5. In the embodiment of the present invention, the line width dimension of the second electrode 4 is 3 μm.

Next, a method of manufacturing the second substrate 6 will be described. As the second substrate 6, the same glass substrate as the first substrate 1 is used, and a chromium thin film having a thickness of 0.1 to 0.2 μm is sputtered on the entire surface of the second substrate 6 as a black matrix 7 material. Method or vacuum deposition method.

After that, a photoresist is formed on the entire surface of the black matrix 7 material by spin coating, and an exposure process and a development process are performed using a predetermined photomask to pattern the photoresist.

Then, using the patterned photoresist as an etching mask, the black matrix 7 having the openings 13 is formed by wet etching.

In this example, the chromium film is etched using a mixed solution of cerium ammonium nitrate and perchloric acid to form the black matrix 7 having the openings 13.

Regarding the size of the opening 13 of the black matrix 7, the size of the non-linear resistance element 14 is 3 μm square,
Since the overlay position accuracy of the first substrate 1 and the second substrate 6 is plus or minus 4 μm, it is 11 μm square.

After that, a photosensitive organic material is formed on the entire surface by a spin coating method as a color filter material made of gelatin, casein or the like.

After that, a drying process is performed, and a photomask having a pattern corresponding to the color filter is used to perform photolithography and etching processes of an exposure process and a development process to pattern the photosensitive organic material.

Further, the second substrate 6 is impregnated in the dyeing tank to be dyed, and the second substrate 6 is impregnated in the fixing tank to fix the second substrate 6 to a thickness of 1 mm.
A green color filter 17 of μm is formed. This process is repeated three times to form a blue color filter-18 and a red color filter (not shown).

Further, a photosensitive organic material such as gelatin or casein is formed as the material of the transparent protrusion 15 in a film thickness thicker than that of the color filters 17 and 18 by spin coating on the entire surface.

Next, after the drying process, the transparent protrusion 1
Thickness 4.6 by photolithography and etching using a photomask on which a pattern corresponding to 5 is formed.
A transparent protrusion 15 of μm is formed. In addition, this transparent protrusion 1
It is not necessary to carry out the dyeing process to 5.

After that, an acrylic organic material is formed as a material of the insulating film 8 on the color filters 17 and 18 and the transparent protrusion 15 by using a spin coating method.

Thereafter, a heat treatment is performed at a temperature of 150 to 200 ° C. to cure the acrylic organic material to a thickness of 2 to 5
An insulating film 8 of μm is formed.

Next, as the material of the counter electrode 9, ITO having a thickness of 0.2 to 0.4 μm is formed by the low temperature sputtering method.

Then, the counter electrode 9 and the nonlinear resistance element 14
In order to prevent such short-circuiting, ITO is patterned by photoetching in the shape shown in FIG. 10 to form the counter electrode 9.

After that, the alignment film 10 is formed on both the first substrate 1 and the second substrate 6 by the printing method.

After that, rubbing treatment of the alignment film 10 is performed. Then, the spacer 12 is formed between the first substrate 1 and the second substrate 6.

After that, a first epoxy-based adhesive is used.
Substrate 1 and second substrate 6 are attached to each other at a predetermined interval.

Further, the liquid crystal 11 is injected between the first substrate 1 and the second substrate 6, the polarizing plate 16 is provided outside the first substrate 1 and the second substrate 6, and the polarization axis thereof is set. The liquid crystal display device is completed by sticking so as to intersect at 90 °.

In the third embodiment of the present invention, the liquid crystal 11 is
A fluorine-based material with Δn = 0.125 is used, and the cell gap is 4 μm.

Therefore, the transparent protrusion 1 having a thickness of 4.6 μm
5 and the color filter 17 having a thickness of 1.0 μm has a step difference of 3.6 μm. On the other hand, the thickness of the liquid crystal 11 is 0.4 μm, and light leakage from the opening 13 is almost eliminated.

In the 5 type MIM type black and white liquid crystal display device formed by the manufacturing method described with reference to FIG. 13, there is almost no deterioration in display quality or burn-in phenomenon due to the light irradiation effect, and there is no black matrix opening. It is possible to obtain a liquid crystal display device having high image quality in which contrast is not deteriorated due to light leakage from the liquid crystal display device.

The first substrate 1 of the third embodiment of the present invention
In the manufacturing method of 1., the second electrode 4 and the display electrode 5 have been described as an example of being formed using the same material, but they may be formed of different materials as described below.

First, as a material for the second electrode 4, a chromium film having a thickness of 0.05 to 0.2 μm is formed by sputtering on the entire surface.

Then, the width dimension is reduced to 3 by photoetching in the same processing step as the method described with reference to FIG.
A second electrode 4 of μm is formed.

After that, an ITO film having a thickness of 0.1 to 0.3 μm, which is a material of the display electrode 5, is formed on the entire surface by sputtering.

After that, a photoresist is formed on the entire surface of the material of the display electrode 5 by a spin coating method, an exposure process and a development process are performed using a predetermined photomask, and the photoresist is patterned.

After that, the display electrode 5 material is etched by using the patterned photoresist as an etching mask and a mixed solution of ferric chloride and hydrochloric acid.
The display electrode 5 is formed.

In the third embodiment of the present invention, preferably,
A passivation film made of silicon dioxide (SiO ₂ ) having a thickness of 0.1 to 0.5 μm is formed on the second electrode 4 and the display electrode 5 of the first substrate 1 by a sputtering method. Good.

By forming this passivation film, the interaction between the non-linear resistance element 14 and the liquid crystal 11 can be removed, and the burn-in phenomenon can be further improved.

Further, as the material of the transparent protrusion 15,
The example using the same photosensitive organic insulating film such as gelatin as the color filter material has been described, but if it is a transparent material,
It is also possible to use an acrylic photosensitive organic insulating film, a general organic insulating film, or an inorganic insulating film.

When the above-mentioned acrylic photosensitive organic insulating film, organic insulating film or inorganic insulating film is used as the material of the transparent protrusion 15, the transparent protrusion 15 is formed by photolithography and etching process.

Next, a fourth embodiment of the liquid crystal display device of the present invention will be described. FIG. 14 is a cross-sectional view showing the configuration of the fourth embodiment of the present invention, and shows a cross section taken along line BB of the liquid crystal display device shown in the plan view of FIG. Below, Figure 1
4 and FIG. 2 are alternately used to describe the configuration of the liquid crystal display device of the present invention.

A first electrode 2 made of tantalum (Ta) is provided on the first substrate 1, and the first electrode 2 is formed on the first electrode 2 by anodizing. A non-linear resistance layer 3 made of tantalum oxide (Ta ₂ O ₅ ) is provided,
Further, a second electrode 4 made of ITO (indium tin oxide) is provided as a transparent conductive film on the nonlinear resistance layer 3.

This first electrode 2, the non-linear resistance layer 3 and the second
And the electrode 4 of the non-linear resistance element 14 of the MIM structure.
Is formed. Furthermore, with the same material as the second electrode 4,
The display electrode 5 is formed.

In the region above the non-linear resistance element 14, the transparent protrusion 15 is formed of a transparent photosensitive organic insulating film.

The height of the transparent protrusion 15 is made slightly smaller than the distance between the display electrode 5 and the counter electrode 9. As a result, the cell gap size between the transparent protrusion 15 and the counter electrode 9 is extremely small.

The width dimension of the transparent protrusion 15 is made slightly larger than the opening 13 of the black matrix 7 to cope with the positional accuracy in the photolithography process and the overlay accuracy of the first substrate 1 and the second substrate 6. ing.

Furthermore, on the second substrate 6, the first substrate 1
In order to prevent light from leaking from the gaps between the respective display electrodes 5 formed in the above, the black matrix 7 using a chromium film is formed to a thickness of 0.1 to 0.2 μm.

In this black matrix 7, an opening 13 for irradiating the nonlinear resistance element 14 with light is formed. Further, on the display part of the black matrix 7, a color is displayed.
Filters 17 and 18 are provided.

Further, a counter electrode 9 made of an ITO film is provided so as to face the display electrode 5 via the insulating film 8.

Further, the first substrate 1 and the second substrate 6 are
As a treatment layer for regularly arranging the molecules of the liquid crystal 11,
The alignment film 10 is formed in each case.

Furthermore, the spacer 12 makes the first substrate 1 and the second substrate 6 face each other with a predetermined gap. Liquid crystal 11 is sealed between the first substrate 1 and the second substrate 6.

Furthermore, the first substrate 1 and the second substrate 6
A polarizing plate 16 is arranged outside the substrate in such a manner that the polarization axes thereof intersect with each other, and is in a normally-white mode in which white is shown when no voltage is applied.

With the structure shown in FIG. 14, the nonlinear resistance element 14 can be efficiently irradiated with light from the opening 13 of the black matrix 7 through the insulating film 8 and the transparent protrusion 15. As a result, the flicker phenomenon and the burn-in phenomenon can be prevented.

Here, the transparent protrusion 15 and the nonlinear resistance element 1
The cell gap size with 4 is very small. For this reason, light leakage from the opening 13 is eliminated, so that a liquid crystal display device having a high-quality display image with high contrast can be obtained.

Next, a method of manufacturing the liquid crystal display device according to the fourth embodiment of the present invention will be described with reference to FIG.

The first substrate 1 is preferably made of a glass material having a low alkali metal content. In the fourth embodiment of the present invention, Nippon Electric Glass's trade name is OA2 and the thickness is 1.1 m.
Use m.

Next, a tantalum film having a thickness of 0.1 to 0.3 μm is formed as a material for the first electrode 2 on the entire surface of the first substrate 1 by a sputtering method or a vacuum evaporation method.

After that, a photoresist is formed on the entire surface of the tantalum film by a spin coating method, and an exposure process and a development process are performed using a photomask having a predetermined pattern to pattern the photoresist.

Then, using the patterned photoresist as an etching mask, the first electrode 2 material is
The tantalum thin film, which is the material of the first electrode 2, is patterned by dry etching using a mixed gas of sulfur hexafluoride (SF ₆ ) and helium and oxygen as an etching gas to form the first electrode 2. The line width of the wiring region of the first electrode 2 is 20 μm, and the line width of the nonlinear element region is 3 μm.
to m.

Next, the first substrate 1 is dipped in an anodic oxidation bath of citric acid, ammonium borate or the like, and the voltage of 30 V to 5 V is applied.
Applying a DC voltage of 0V, anodizing process
Tantalum oxide (Ta ₂ O having a film thickness of 5 to 0.1 μm)
_The non-linear resistance layer 3 consisting of ₅ ) is formed.

Further, as a material for the second electrode 4 and a material for the display electrode, ITO, which is a transparent conductive film, is formed on the entire surface by a sputtering method or a vacuum evaporation method to a thickness of 0.1 to 0.3 μm. .

After that, a photoresist is formed on the entire surface of the material of the second electrode 4 by the spin coating method, an exposure process and a development process are performed using a predetermined photomask, and the photoresist is patterned.

Then, using the patterned photoresist as an etching mask, the second electrode 4 material is
Etching is performed using a mixed solution of ferric chloride and hydrochloric acid to form the second electrode 4 and the display electrode 5. In the embodiment of the present invention, the line width dimension of the second electrode 4 is 3 μm.

Then, a transparent acrylic photosensitive organic insulating film is formed as the material of the transparent protrusions 15 on the entire surface by spin coating.

Then, heat treatment is performed at a temperature of 80 to 100 ° C. to dry the photosensitive organic insulating film, and an exposure process is performed using a photomask having a pattern corresponding to the transparent protrusions 15. After that, the organic insulating film in the region other than the transparent protrusions 15 is removed by etching using a sodium hydroxide solution.

Then, the transparent protrusions 15 are thermally cured by heat treatment at a temperature of 150 to 250 ° C., and the thickness dimension is 3.6 μm.
A transparent protrusion 15 having a size of m and a width of 15 μm square is formed on the nonlinear resistance element 14.

Next, a method of manufacturing the second substrate 6 will be described. The second substrate 6 is also the same glass substrate as the first substrate 1, and a chromium film having a thickness of 0.1 to 0.2 μm as a material of the black matrix 7 is formed on the entire surface by a sputtering method or a vacuum evaporation method. Form.

After that, a photoresist is formed on the entire surface of the chromium film by a spin coating method, and an exposure process and a development process are performed using a predetermined photomask to pattern the photoresist.

Thereafter, the patterned photoresist is used as an etching mask to etch the chromium film, and the mixed solution of cerium ammonium nitrate and perchloric acid is used to etch the chromium film to form a black matrix 7 having openings 13. .

With respect to the size of the opening 13 of the black matrix 7, the size of the nonlinear resistance element 14 is 3 μm square,
Since the overlay position accuracy of the first substrate 1 and the second substrate 6 is plus or minus 4 μm, it is 11 μm square.

Next, as a color filter material, a photosensitive organic material such as gelatin or casein is formed on the entire surface by a spin coating method.

Thereafter, a drying process is performed, and a photoetching process is further performed to pattern the photosensitive organic material made of gelatin or casein.

After that, the second substrate 6 is impregnated in the dyeing tank to be dyed, and the second substrate 6 is impregnated in the fixing tank to fix the second substrate 6 to a thickness of 1 mm.
A green color filter 17 of μm is formed. This process is repeated three times to form a blue color filter 18 and a red color filter (not shown).

Furthermore, on the color filters 17 and 18,
As the material of the insulating film 8, an acrylic organic material is formed by using a spin coating method. Then, the temperature is 150 ~ 200
A heat treatment is carried out at a temperature of ℃ to cure the acrylic organic material to form the insulating film 8 having a thickness of 2 to 5 μm.

Next, as a material for the counter electrode 9, ITO having a thickness of 0.2 to 0.4 μm is formed by low temperature sputtering.

After that, a photoresist is formed on the entire surface of the material of the counter electrode 9 by a spin coating method, and an exposure process and a development process are performed using a predetermined photomask to pattern the photoresist.

Then, using the patterned photoresist as an etching mask, the material of the counter electrode 9 is etched using a mixed solution of ferric chloride and hydrochloric acid,
The counter electrode 9 is formed.

After that, the alignment film 10 is formed on both the first substrate 1 and the second substrate 6 by the printing method.

After that, rubbing treatment of the alignment film 10 is performed. Then, the spacer 12 is formed between the first substrate 1 and the second substrate 6.

After that, a first epoxy resin is used.
Substrate 1 and second substrate 6 are attached to each other at a predetermined interval.

Further, the liquid crystal 11 is injected between the first substrate 1 and the second substrate 6, and the polarizing plate 16 is provided outside the first substrate 1 and the second substrate 6, and the polarization axis thereof is provided. The liquid crystal display device is completed by sticking so as to intersect at 90 °.

In the fourth embodiment of the present invention, the liquid crystal 11 is
A fluorine-based material with Δn = 0.125 is used, and the cell gap is 4 μm.

Therefore, the transparent protrusion 1 having a thickness of 4.6 μm
5 and the color filter 17 having a thickness of 1.0 μm has a step difference of 3.6 μm. On the other hand, the thickness of the liquid crystal 11 is 0.4 μm, and light leakage from the opening 13 is almost eliminated.

In the 5 type MIM type black and white liquid crystal display device formed by the manufacturing method described with reference to FIG. 14, there is almost no deterioration of display quality or burn-in phenomenon due to the light irradiation effect, and the opening from the black matrix It is possible to obtain a liquid crystal display device having high image quality in which the contrast is not deteriorated due to the light leakage.

The first substrate 1 of the fourth embodiment of the present invention
In the manufacturing method of 1., the second electrode 4 and the display electrode 5 are described as an example of being formed of the same material, but they may be formed of different materials as described below.

First, as a material for the second electrode 4, a chromium film having a thickness of 0.05 to 0.2 μm is formed on the entire surface by a sputtering method.

Thereafter, the width dimension is reduced to 3 by photoetching by the same processing step as the method described with reference to FIG.
A second electrode 4 of μm is formed.

After that, an ITO film having a thickness of 0.1 to 0.3 μm, which is a material of the display electrode 5, is formed on the entire surface by a sputtering method.

After that, a photoresist is formed on the entire surface of the material of the display electrode 5 by a spin coating method, an exposure process and a development process are performed using a predetermined photomask, and the photoresist is patterned.

After that, the display electrode 5 material is wet-etched using the patterned photoresist as an etching mask and a mixed solution of ferric chloride and hydrochloric acid to form the display electrode 5.

In the fourth embodiment of the present invention, preferably,
A passivation film made of silicon dioxide (SiO ₂ ) having a thickness of 0.1 to 0.5 μm is formed on the second electrode 4 and the display electrode 5 of the first substrate 1 by a sputtering method. Good.

By forming this passivation film, the interaction between the non-linear resistance element 14 and the liquid crystal 11 can be removed, and the burn-in phenomenon can be further improved.

Furthermore, as the material of the transparent protrusion 15,
The example using the same photosensitive organic insulating film such as gelatin as the color filter material has been described, but if it is a transparent material,
It is also possible to use an acrylic photosensitive organic insulating film, a general organic insulating film, or an inorganic insulating film.

When the above-mentioned acrylic photosensitive organic insulating film, organic insulating film or inorganic insulating film is used as the material of the transparent protrusion 15, the transparent protrusion 15 is formed by photolithography and etching process.

Furthermore, in the fourth embodiment of the present invention,
As the configuration of the second substrate 6, an example in which the color filters 17 and 18 are provided on the black matrix 7 and the counter electrode 9 is formed via the insulating film 8 has been described. However, the printing method with good heat resistance is used. By using the color filter, it is possible to omit the formation of the insulating film 8 and directly form the counter electrode 9 on the color filters 17 and 18.

In the first to fourth embodiments described above, the non-linear resistance layer 3 is formed by the anodic oxidation process, but the physical vapor deposition method such as the sputtering method or the vacuum vapor deposition method or the chemical method is used. An insulating film formed by a vapor phase growth method can also be applied as the nonlinear resistance layer 3.

[0286]

As is clear from the above description, by using the structure and manufacturing method of the liquid crystal display device of the present invention,
It is possible to suppress an asymmetrical change due to the polarity of the non-linear resistance element, reduce the application of a DC voltage to the liquid crystal, eliminate the deterioration of the quality of the liquid crystal, and prevent the flicker phenomenon and the image sticking phenomenon which is an afterimage phenomenon.

Further, since light does not leak from the opening of the black matrix, a liquid crystal display device having a high contrast display quality can be obtained.

[Brief description of drawings]

FIG. 1 is a cross-sectional view showing a structure of a liquid crystal display device and a manufacturing method thereof according to a first embodiment of the present invention.

FIG. 2 is a plan view showing a configuration of a liquid crystal display device and a manufacturing method thereof according to an embodiment of the present invention.

FIG. 3 is a graph showing a relationship between a current value of an initial characteristic of a non-linear resistance element of a liquid crystal display device and a characteristic after driving and a light amount applied to the non-linear resistance element.

FIG. 4 is a graph showing a relationship between a non-linear resistance element characteristic and a driving time when light is irradiated to the non-linear resistance element of the liquid crystal display device in the example of the present invention.

FIG. 5 is a graph showing the relationship between the cell gap and the transmittance for explaining the function of the transparent protrusions in the example of the present invention.

FIG. 6 is a plan view showing a liquid crystal display device in a conventional example.

FIG. 7 is a cross-sectional view showing a liquid crystal display device in a conventional example.

FIG. 8 shows a voltage in a non-linear resistance element of a liquid crystal display device.
It is a graph which shows a current characteristic.

FIG. 9 is a graph showing a relationship between a characteristic of a non-linear resistance element and a driving time when light is not applied to the non-linear resistance element of a liquid crystal display device.

FIG. 10 is a plan view showing a configuration of a liquid crystal display device and a method of manufacturing the same according to an embodiment of the present invention.

FIG. 11 is a cross-sectional view showing the structure of the liquid crystal display device and the method for manufacturing the same according to the first embodiment of the present invention.

FIG. 12 is a cross-sectional view showing a structure of a liquid crystal display device and a manufacturing method thereof according to a second embodiment of the present invention.

FIG. 13 is a cross-sectional view showing a configuration of a liquid crystal display device and a method of manufacturing the same in a third embodiment of the present invention.

FIG. 14 is a cross-sectional view showing a structure of a liquid crystal display device and a manufacturing method thereof in a fourth embodiment of the present invention.

[Explanation of symbols]

 1 First Substrate 2 First Electrode 3 Nonlinear Resistance Layer 4 Second Electrode 5 Display Electrode 6 Second Substrate 7 Black Matrix 8 Insulating Film 13 Opening 15 Transparent Protrusion 16 Polarizing Plate

Claims (21)

[Claims] 1. A first substrate and a second substrate, wherein the first substrate has a non-linear resistance element composed of a first electrode, a non-linear resistance layer and a second electrode, and a display electrode, The second substrate has a black matrix having an opening, a counter electrode on the black matrix, and a transparent protrusion provided on the counter electrode at a position facing the opening, and the opening and the nonlinear resistance element face each other. A liquid crystal display device, which is provided at a position to irradiate light to a non-linear resistance element. 2. A first substrate and a second substrate are provided, wherein the first substrate has a non-linear resistance element including a first electrode, a non-linear resistance layer and a second electrode, and a display electrode, The second substrate has a black matrix having an opening, a counter electrode on the black matrix, and a transparent protrusion provided on the black matrix at a position facing the opening, and the opening faces the nonlinear resistance element. A liquid crystal display device, which is provided at a position to irradiate light to a non-linear resistance element. 3. A step of forming a first electrode material on the entire surface of a first substrate and patterning it by photoetching to form a first electrode, and a nonlinear resistance layer on the surface of the first electrode. The step of forming and forming a second electrode material on the entire surface and patterning by photoetching to form a second electrode, and at the same time as the nonlinear resistance element including the first electrode, the nonlinear resistance layer and the second electrode, A step of forming a display electrode, a step of forming a black matrix having openings in the second substrate using a printing method, and forming a counter electrode material on the entire surface and forming a counter electrode by photoetching. And a step of forming a transparent protrusion material on the entire surface and forming a transparent protrusion at a position corresponding to the opening by photoetching. The first substrate and the second substrate are superposed, and the first substrate is further formed. And the second Method of manufacturing a liquid crystal display device, characterized by sealing the liquid crystal between the plates. 4. The first electrode material is formed on the entire surface of the first substrate and patterned by photoetching to form a first electrode material.
The step of forming the second electrode material, the step of forming the non-linear resistance layer on the surface of the first electrode, and the step of forming the second electrode material on the entire surface and patterning by photo-etching to form the second electrode. A second substrate including a step of forming a non-linear resistance element composed of one electrode, a non-linear resistance layer and a second electrode; and a step of forming a display electrode material on the entire surface and forming the display electrode by photoetching. Is a step of forming a black matrix having an opening by using a printing method, a step of forming a counter electrode material on the entire surface and forming a counter electrode by photoetching, and a step of forming a transparent protrusion material on the entire surface and opening by photoetching. A step of forming a transparent protrusion at a position corresponding to the portion, stacking the first substrate and the second substrate, and further enclosing the liquid crystal between the first substrate and the second substrate. Characteristic Method of manufacturing a liquid crystal display device which. 5. A first substrate and a second substrate are provided, wherein the first substrate has a non-linear resistance element including a first electrode, a non-linear resistance layer and a second electrode, and a display electrode, The second substrate has a black matrix having an opening, a counter electrode provided via an insulating film on the black matrix, and a transparent protrusion provided on the counter electrode at a position facing the opening. A liquid crystal display device, characterized in that it is provided at a position facing a resistance element and irradiates light to a non-linear resistance element. 6. A first substrate and a second substrate are provided, the first substrate having a non-linear resistance element including a first electrode, a non-linear resistance layer and a second electrode, and a display electrode, The second substrate has a black matrix having an opening, a counter electrode provided through the insulating film on the black matrix, and a transparent protrusion provided on the insulating film at a position facing the opening. A liquid crystal display device, characterized in that it is provided at a position facing a resistance element and irradiates light to a non-linear resistance element. 7. A step of forming a first electrode material on the entire surface of a first substrate and patterning by photoetching to form a first electrode, and a non-linear resistance layer on the surface of the first electrode. The step of forming and forming a second electrode material on the entire surface and patterning by photoetching to form a second electrode, and at the same time as the nonlinear resistance element including the first electrode, the nonlinear resistance layer and the second electrode, Forming a display electrode, and forming a black matrix material on the entire surface of the second substrate,
A step of forming a black matrix having openings by photoetching, a step of forming an insulating film over the entire surface, a step of forming a counter electrode material over the entire surface, and a step of forming a counter electrode by photoetching, and a transparent protrusion material over the entire surface. And forming a transparent protrusion at a position corresponding to the opening by photoetching, the first substrate and the second substrate are overlapped, and a space between the first substrate and the second substrate is further formed. A method for manufacturing a liquid crystal display device, characterized in that a liquid crystal is sealed in. 8. A step of forming a first electrode material on the entire surface of a first substrate and performing patterning by photoetching to form a first electrode, and a step of forming a nonlinear resistance layer on the surface of the first electrode. Forming step and forming a second electrode material on the entire surface and patterning by photoetching to form a second electrode, and forming a non-linear resistance element composed of the first electrode, the non-linear resistance layer and the second electrode. And a step of forming a display electrode material on the entire surface and forming a display electrode by photoetching, and forming a black matrix material on the entire surface of the second substrate,
A step of forming a black matrix having openings by photoetching, a step of forming an insulating film over the entire surface, a step of forming a counter electrode material over the entire surface, and a step of forming a counter electrode by photoetching, and a transparent protrusion material over the entire surface. And forming a transparent protrusion at a position corresponding to the opening by photoetching, the first substrate and the second substrate are overlapped, and a space between the first substrate and the second substrate is further formed. A method for manufacturing a liquid crystal display device, characterized in that a liquid crystal is sealed in. 9. A first substrate and a second substrate, wherein the first substrate has a non-linear resistance element including a first electrode, a non-linear resistance layer and a second electrode, and a display electrode, The second substrate has a black matrix having an opening, a transparent protrusion provided on the black matrix at a position facing the opening, and a counter electrode provided via an insulating film on the black matrix, A liquid crystal display device, characterized in that it is provided at a position facing a resistance element and irradiates light to a non-linear resistance element. 10. The first electrode material is formed on the entire surface of the first substrate and patterned by photoetching to form a first electrode material.
The step of forming the second electrode material, the step of forming the non-linear resistance layer on the surface of the first electrode, and the step of forming the second electrode material on the entire surface and patterning by photo-etching to form the second electrode. A step of forming a display electrode at the same time as a non-linear resistance element composed of one electrode, a non-linear resistance layer and a second electrode, and forming a black matrix material on the entire surface of the second substrate,
A step of forming a black matrix having an opening by photoetching, a step of forming a transparent protrusion material on the entire surface and forming a transparent protrusion at a position corresponding to the opening by photoetching, and a step of forming an insulating film on the entire surface. A step of forming a counter electrode material on the entire surface and forming a counter electrode by photoetching, stacking the first substrate and the second substrate, and further forming a space between the first substrate and the second substrate. A method for manufacturing a liquid crystal display device, characterized in that a liquid crystal is sealed in. 11. A first electrode material is formed on the entire surface of a first substrate and patterned by photoetching to form a first electrode material.
The step of forming the second electrode material, the step of forming the non-linear resistance layer on the surface of the first electrode, and the step of forming the second electrode material on the entire surface and patterning by photo-etching to form the second electrode. A second substrate including a step of forming a non-linear resistance element composed of one electrode, a non-linear resistance layer and a second electrode; and a step of forming a display electrode material on the entire surface and forming the display electrode by photoetching. Forms a black matrix material on the entire surface,
A step of forming a black matrix having an opening by photoetching, a step of forming a transparent protrusion material on the entire surface and forming a transparent protrusion at a position corresponding to the opening by photoetching, and a step of forming an insulating film on the entire surface. A step of forming a counter electrode material on the entire surface and forming a counter electrode by photoetching, stacking the first substrate and the second substrate, and further forming a space between the first substrate and the second substrate. A method for manufacturing a liquid crystal display device, characterized in that a liquid crystal is sealed in. 12. A nonlinear resistance element comprising a first substrate and a second substrate, the first substrate including a first electrode, a nonlinear resistance layer and a second electrode, a display electrode, and a nonlinear resistance element. The second substrate has a transparent projection provided above, the second substrate has a black matrix having an opening, and a counter electrode on the black matrix. The opening is provided at a position facing the nonlinear resistance element, A liquid crystal display device characterized in that a nonlinear resistance element is irradiated with light. 13. A first electrode material is formed on the entire surface of the first substrate and patterned by photoetching to form a first electrode material.
The step of forming the second electrode material, the step of forming the non-linear resistance layer on the surface of the first electrode, and the step of forming the second electrode material on the entire surface and patterning by photo-etching to form the second electrode. A step of forming a display electrode at the same time as a non-linear resistance element composed of one electrode, a non-linear resistance layer and a second electrode, and forming a transparent projection material on the entire surface and forming a transparent projection at a position corresponding to the non-linear element by photoetching. The second substrate includes a step of forming a black matrix having openings using a printing method, and a step of forming a counter electrode material on the entire surface and forming a counter electrode by photoetching. A method for manufacturing a liquid crystal display device, comprising: stacking a first substrate and a second substrate, and further enclosing a liquid crystal between the first substrate and the second substrate. 14. A first electrode material is formed on the entire surface of the first substrate and patterned by photoetching to form a first electrode material.
The step of forming the second electrode material, the step of forming the non-linear resistance layer on the surface of the first electrode, and the step of forming the second electrode material on the entire surface and patterning by photo-etching to form the second electrode. A step of forming a non-linear resistance element composed of one electrode, a non-linear resistance layer and a second electrode; a step of forming a display electrode material on the entire surface and forming a display electrode by photo-etching; and a transparent projection material formed on the whole surface. And forming a transparent protrusion at a position corresponding to the non-linear element by photoetching, and forming a black matrix having an opening using a printing method on the second substrate, and forming a counter electrode material on the entire surface. Forming and forming a counter electrode by photoetching, superposing the first substrate and the second substrate, and further enclosing a liquid crystal between the first substrate and the second substrate. Method of manufacturing a liquid crystal display device according to symptoms. 15. A nonlinear resistance element comprising a first substrate and a second substrate, the first substrate comprising a first electrode, a nonlinear resistance layer and a second electrode, a display electrode, and a nonlinear resistance element. The second substrate has a transparent protrusion provided thereon, and the second substrate has a black matrix having an opening, and a counter electrode provided through an insulating film on the black matrix. The opening and the nonlinear resistance element face each other. A liquid crystal display device, characterized in that it is provided at a position to irradiate light to a non-linear resistance element. 16. The first electrode material is formed on the entire surface of the first substrate and patterned by photoetching to form a first electrode material.
The step of forming the second electrode material, the step of forming the non-linear resistance layer on the surface of the first electrode, and the step of forming the second electrode material on the entire surface and patterning by photo-etching to form the second electrode. A step of forming a display electrode at the same time as a non-linear resistance element composed of one electrode, a non-linear resistance layer and a second electrode, and forming a transparent projection material on the entire surface and forming a transparent projection at a position corresponding to the non-linear element by photoetching. And forming a black matrix material on the entire surface of the second substrate,
The method includes a step of forming a black matrix having openings by photoetching, a step of forming an insulating film on the entire surface, and a step of forming a counter electrode material on the entire surface and forming a counter electrode by photoetching. 2. The method for manufacturing a liquid crystal display device, comprising: stacking the substrate and the second substrate, and further enclosing a liquid crystal between the first substrate and the second substrate. 17. A first electrode material is formed on the entire surface of the first substrate and patterned by photoetching to form a first electrode material.
The step of forming the second electrode material, the step of forming the non-linear resistance layer on the surface of the first electrode, and the step of forming the second electrode material on the entire surface and patterning by photo-etching to form the second electrode. A step of forming a non-linear resistance element composed of one electrode, a non-linear resistance layer and a second electrode; a step of forming a display electrode material on the entire surface and forming a display electrode by photo-etching; and a transparent projection material formed on the whole surface. Forming a transparent protrusion at a position corresponding to the non-linear element by photoetching, and forming a black matrix material on the entire surface of the second substrate,
The method includes a step of forming a black matrix having openings by photoetching, a step of forming an insulating film on the entire surface, and a step of forming a counter electrode material on the entire surface and forming a counter electrode by photoetching. 2. The method for manufacturing a liquid crystal display device, comprising: stacking the substrate and the second substrate, and further enclosing a liquid crystal between the first substrate and the second substrate. 18. The color filter is provided on the black matrix of the second substrate,
Claim 2, Claim 5, Claim 6, Claim 9, Claim 1
2. The liquid crystal display device according to claim 15. 19. The method according to claim 3, further comprising the step of forming a color filter on the black matrix after the step of forming the black matrix of the second substrate. A method for manufacturing a liquid crystal display device according to claim 8, claim 10, claim 11, claim 13, claim 14, claim 16, or claim 17. 20. A passivation film is provided on the non-linear resistance element of the first substrate.
Claim 2, Claim 5, Claim 6, Claim 9, Claim 1
The liquid crystal display device according to claim 2 or claim 15. 21. The method according to claim 3, further comprising the step of forming a passivation film after the step of forming the display electrode of the first substrate.
A method for manufacturing a liquid crystal display device according to claim 10, claim 11, claim 13, claim 14, claim 16, or claim 17.