JPH07263327A - Treatment liquid supplying device for rotary substrate treating device - Google Patents

Abstract

PURPOSE:To reduce the outside diameter of a temperature regulating pipeline incorporating a treatment liquid pipeline by providing a partition plate which divides the inside of a space formed of the external surface of the treatment liquid pipeline and internal surface of the temperature regulating pipeline into two parts along the flow passes of a treatment liquid and using one of the divided flow passage as the supplying flow passage of a constant-temperature fluid and the other as the returning flow passage of the fluid. CONSTITUTION:A pair of long and narrow partition plate 40 which are arranged along the axis of a treatment liquid supplying tube 2 is protruded from the output peripheral surface of the tube so that the plates 40 can be brought into contact with the internal surface of a first temperature regulating pipeline 3a and the inside of the space formed of the external surface of the tube 2 and internal surface of the pipeline 3a can be divided into two parts along the flow passage of a treatment liquid. One of the partitioned two parts is used as the supplying flow passage 41 of a constant-temperature fluid and the other is used as the returning flow passage 42 of the fluid.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary substrate for supplying a processing liquid such as a photoresist liquid to a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display, a glass substrate for a photomask and a substrate for an optical disk. The present invention relates to a treatment liquid supply device of a treatment device, and more particularly, to a treatment liquid supply device including a temperature control pipe that keeps the temperature of the treatment liquid in the treatment liquid pipe constant.

[0002]

2. Description of the Related Art As a conventional processing liquid supply device, for example,
There is a rotary substrate processing apparatus that supplies a photoresist solution to the substrate surface to form a thin film having a desired thickness on the substrate surface.

This apparatus comprises a nozzle for discharging a processing liquid on the upper surface of a substrate which is rotatably supported, and a bottle for storing the processing liquid, which are connected to each other through a processing liquid supply pipe. In such a device, in order to form a thin film having a uniform thickness, it is necessary to keep the temperature of the treatment liquid constant so that the viscosity of the treatment liquid does not change due to the influence of the outside air temperature.
Therefore, in order to keep the temperature of the treatment liquid constant, a constant temperature fluid is circulated outside the treatment liquid supply pipe. In such an apparatus, since it is desirable to adjust the temperature to the vicinity of the nozzle provided at the tip of the processing liquid supply pipe, a supply flow path for circulating a constant temperature fluid from the base end side of the processing liquid supply pipe to the nozzle side of the tip is provided. It is necessary to provide a return flow path for returning the constant temperature fluid reaching the nozzle side to the base end side. As a configuration for that purpose, an apparatus having a treatment liquid supply piping structure as shown in FIG. 8 is known.

In FIG. 8A, a processing liquid pipe 100 for supplying a processing liquid and a return pipe 101 for a constant temperature fluid are shown as an outer pipe 10.
It is configured as a so-called double pipe built in the 2. By supplying a constant temperature fluid to the gap between the treatment liquid pipe 100, the return pipe 101 and the outer pipe 102, the treatment liquid pipe 10
The temperature of the processing liquid within 0 is made constant. The supplied constant temperature fluid is circulated and collected in the return pipe 101 before the nozzle.

FIG. 8B shows a processing liquid pipe 103 for supplying a processing liquid, a temperature control pipe 104 provided outside the processing liquid pipe 103, and an outer pipe further provided outside the temperature control pipe 104. 105 and so-called triple piping.
By supplying a constant temperature fluid to the gap between the treatment liquid pipe 103 and the temperature control pipe 104, the temperature of the treatment liquid in the treatment liquid pipe 103 is made constant. The supplied constant temperature fluid is circulated and collected in the gap between the temperature control pipe 104 and the outer pipe 105 before the nozzle.

[0006]

However, in the above-mentioned treatment liquid supply apparatus, a pipe different from the treatment liquid pipe is provided inside the outer pipe to form a constant-temperature fluid supply flow passage and a return flow passage, respectively. Therefore, there is a problem that the outer shape of the outer tube becomes large. Further, since the processing liquid supply device is generally provided with a plurality of nozzles and is configured with a plurality of pipes corresponding to the nozzles, there is a problem that the entire device becomes bulky as the outer pipe becomes bulky. .

The present invention has been made in view of the above circumstances, and an object thereof is to provide a processing liquid supply apparatus for a rotary substrate processing apparatus which is downsized.

[0008]

The present invention has the following constitution in order to achieve the above object. That is, a processing liquid pipe for supplying the processing liquid to the rotatably supported substrate,
A temperature control pipe having the treatment liquid pipe therein, and a rotation for making the temperature of the treatment liquid in the treatment liquid pipe constant by circulating a constant temperature fluid in a gap between the treatment liquid pipe and the temperature regulation pipe. In the processing liquid supply device of the substrate processing apparatus,
The interior of the space formed by the outer wall of the treatment liquid pipe and the inner wall of the temperature control pipe is provided with a partition plate that divides into at least two along the flow path, and one partition flow path serves as a constant-temperature fluid supply flow path, The other partition channel is used as a return channel for the constant temperature fluid.

[0009]

According to the present invention, the inside of the space formed by the outer wall of the treatment liquid pipe and the inner wall of the temperature control pipe is divided by the partition plate.
Since it is divided into a constant temperature fluid supply channel and a return channel,
The outer diameter of the temperature control pipe containing the processing liquid pipe can be reduced.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described in detail below with reference to the drawings. FIG. 1 is a partially cutaway side view showing a processing liquid supply apparatus of a rotary substrate processing apparatus according to an embodiment of the present invention, and FIG. 2 is a plan view of FIG.

In the figure, reference numeral 1 is a plurality of nozzles for supplying a photoresist liquid, which is an example of a processing liquid, to a substrate W supported rotatably. These nozzles 1 are communicatively connected to a processing liquid reservoir T via a processing liquid supply tube 2 corresponding to a processing liquid pipe of the present invention described later. Among the plurality of nozzles 1, a desired nozzle 1 is selectively taken out and a nozzle moving mechanism that moves between a discharge position set above the vicinity of the rotation center of the substrate W and a standby position deviated from above the substrate W is provided. The processing liquid supply device is provided.

Each of the nozzles 1 is attached to the tip of the first temperature control pipe 3a made of metal and having high rigidity. A support block 6 is integrally attached to the base of the first temperature control pipe 3a. The first temperature control pipe 3a extends horizontally from one end of the support block 6, its tip is bent vertically downward, and the nozzle 1 is attached to its tip downward. A metal cylindrical shaft 7 is integrally connected to the other end side of the support block 6, and a rigid support arm supported by the nozzle 1 and the like by the first temperature control pipe 3a, the support block 6, and the cylindrical shaft 7. 4 are configured.

The cylinder shaft 7 of each support arm 4 is rotatably supported by the arm rotation support 9 about the axis of the cylinder shaft 7. Further, each arm rotation support 9 is supported by a common movable frame 10 via respective guide rails 11 so as to be vertically movable, and they are linearly aligned in the direction perpendicular to the plane of FIG. It is supported in parallel.

The movable frame 10 includes a guide rail 13 and a device frame 12 fixed to the rotary substrate processing apparatus.
It is supported movably in the horizontal direction via. The rack 14 provided on the movable frame 10 is engaged with a pinion 16 driven by a motor 15 capable of rotating in the forward and reverse directions. Therefore, by rotating the motor 15 in the forward and reverse directions, the arm rotation support 9 moves in the parallel direction.

An elevating frame 18 which is vertically moved by a pair of air cylinders 17a and 17b connected in series is provided on the side of the arm rotation support 9. The lifting frame 18 is provided with a movable bracket 20 which is vertically moved by an air cylinder 19. A support shaft 21a that is rotatable around a rotation center P at a predetermined position is provided on the upper portion of the movable bracket 20, and a drive arm 21 is provided below the support shaft 21a so as to be rotatable around the rotation center P. .

A conical engagement recess 22 is formed on the upper surface of the support block 6 of each support arm 4 so as to be located on the axial center of the cylindrical shaft 7, and at a position away from the nozzle 1 side. A dowel pin 23 is provided so as to project.

On the lower surface of the drive arm 21, a conical engagement projection 24 is provided coaxially with the center of rotation P so as to project from the center of rotation P. A hole 25 is formed. And the support arm 4
By lowering the drive arm 21 relative to the drive arm 21, the engagement recess 22 and the engagement pin 23 of the support arm 4 are engaged with the engagement protrusion 24 and the engagement hole 25 of the drive arm 21, respectively. 21 and the support arm 4 are integrally engaged and connected.

Further, the support shaft 21a of the drive arm 21 is interlockingly connected to a motor 26, which is mounted on the movable bracket 20 and is capable of forward and reverse rotation, via a timing belt 27. Therefore, by driving and rotating the motor 26 in the forward and reverse directions to drive the drive arm 21 in an interlocking manner, the support arm 4 engaged and held is rotated around the rotation center P, and the nozzle 1 of the support arm 4 is moved to the substrate W. It can be moved over a standby position that is off to the side and an ejection position near the center of the substrate.

Next, the structure of each support arm 4 is shown in FIG.
It will be described with reference to FIGS. The nozzle 1 is communicatively connected to the treatment liquid reservoir T via a treatment liquid supply tube 2 made of a fluororesin. The treatment liquid supply tube 2 is inserted into the first temperature control pipe 3a made of stainless steel, and the constant temperature fluid is circulated in the gap between the treatment liquid supply tube 2 and the first temperature control pipe 3a to supply the treatment liquid. The temperature of the treatment liquid in the tube 2 is configured to be constant. In addition,
In this embodiment, hot water whose temperature is adjusted to 23 ° C. is used as the constant temperature fluid, and preferably a solution having a large specific heat such as antifreeze is used. The first temperature control pipe 3a is not limited to stainless steel, and may be any metal that does not easily oxidize, and may be made of resin such as fluorinated resin. Alternatively, it may be supported externally using a stretchable tube.

As shown in FIG. 4, the processing liquid supply tube 2
A pair of elongated partition plates 40 along the pipe axis
The interior of the space formed by the outer wall 2a of the treatment liquid supply tube 2 and the inner wall 3c of the first temperature control pipe 3a is divided into two along the flow path, the space being formed so as to abut the inner wall 3c of the temperature control pipe 3a. Is configured to. One of the two divided channels is a constant temperature fluid supply channel 41, and the other partition channel is a constant temperature fluid return channel 42. Each partition plate 40 is provided so as to project in a substantially horizontal direction in the cross section (FIG. 4) of the support arm 4, and the first temperature control pipe 3a.
The processing liquid supply tube 2 is configured to be easily bent in the vertical direction (vertical direction in FIG. 4). Therefore,
Even at the tip portion of the first temperature control pipe 3a bent vertically downward, the treatment liquid supply tube 2 can be easily bent vertically downward. In order to efficiently exchange heat between the constant temperature fluid and the processing liquid in the processing liquid supply tube 2, it is desirable that the supply flow channel 41 and the return flow channel 42 be completely isolated. However, usually, in the processing liquid supply device in such a rotary substrate processing apparatus, the temperature difference between the constant temperature fluid and the processing liquid is very small,
Therefore, the temperature difference between the constant temperature fluids flowing through the supply flow channel 41 and the return flow channel 42 is also small, so that the contact between the tip portion 40a of the partition plate 40 and the inner wall 3c of the first temperature control pipe 3a is slightly incomplete. Even if there is such a part, there is no problem in practical use.

A second temperature control pipe 3b similar to the above-mentioned first temperature control pipe 3a is connected to the lower end of the cylinder shaft 7. Second
The base end of the temperature control pipe 3b is connected to the joint member 8 so as to communicate therewith, and the treatment liquid supply tube 2 is inserted through the second temperature control pipe 3b and the joint member 8. As shown in FIGS. 3 and 5, two sets of parallel ridges 8a and 8b are integrally formed on the inner walls of the side portions of the joint member 8 which face each other. Ridges 8a, 8
b is formed from the inner upper surface to the lower surface of the joint member 8 along the insertion direction of the treatment liquid supply tube 2.
Then, the partition plates 40 of the treatment liquid supply tube 2 are fitted between the sets of the ridges 8a and 8b, and the partition plates 4 are inserted.
The front end 40a of 0 abuts on the inner wall between the ridges 8a and 8b. Further, the end portions 40b of each partition plate 40 are configured to abut the lower inner wall of the joint member 8, respectively. Therefore, the internal space of the joint member 8 is divided into two, and the second space
It is configured to communicate with the supply flow channel 41 and the return flow channel 42 in the temperature control pipe 3b, respectively. A constant temperature water supply pipe 43 communicating with the supply flow channel 41 and a constant temperature water recovery pipe 44 communicating with the return flow channel 42 are connected to the lower end of the joint member 8 so as to communicate with each other. The constant temperature water supply pipe 43 and the constant temperature water recovery pipe 44 are connected to a temperature control unit 45 equipped with a liquid feed pump, respectively, and are configured to circulate a constant temperature fluid.

The constant temperature fluid is temperature-controlled to a constant temperature by temperature control means (not shown) in the temperature control unit 45, and the supply flow path from the temperature control unit 45 into the first and second temperature control pipes 3a and 3b. 41. Then, after the treatment liquid in the treatment liquid supply tube 2 is kept at a predetermined temperature, the temperature adjustment unit 45 collects the treatment liquid via the return flow path 42.

The nozzle 1 attached to the tip of the first temperature control pipe 3a is, as shown in FIG. 6, a temperature control nozzle 1a.
And a cap nut 1b and a nozzle tip member 1c. The temperature control nozzle 1a has an inner hole that is formed in a taper shape toward the lower side, and the tip end of the taper shape is engaged with the tip of the treatment liquid supply tube 2. The constant temperature fluid circulates to the tapered portion of the temperature control nozzle 1a, and the temperature of the processing liquid in the processing liquid supply tube 2 is adjusted until just before being discharged from the nozzle 1, and the temperature is maintained at a predetermined temperature. Is dripping A nozzle tip member 1c is connected to the lower end of the temperature control nozzle 1a via a cap nut 1b. The nozzle tip member 1c has a through hole in its axial center through which the photoresist liquid flows, and the upper opening diameter of the through hole is formed to be substantially equal to the inner diameter of the processing liquid supply tube 2.

The end portion 40c of each partition plate 40 terminates at the upper end portion of the temperature control nozzle 1a, and in the gap between the tapered inner hole of the temperature control nozzle 1a and the processing liquid supply tube 2, As the constant temperature fluid circulates, that is,
The constant temperature fluid supplied to the supply channel 41 is configured to flow into the return channel 42.

Next, the operation of the processing liquid supply apparatus configured as described above will be described. Before ejecting the processing liquid onto the upper surface of the substrate W, a constant temperature fluid is supplied into the first temperature control pipe 3a in order to keep the temperature of the processing liquid in the processing liquid supply tube 2 constant. First, the liquid feed pump of the temperature control unit 45 is operated. The constant temperature fluid whose temperature is adjusted by the temperature adjustment unit 45 passes through the constant temperature water supply pipe 43, the joint member 8 and the second
It is sent to the supply flow path 41 of the temperature control pipe 3b, and further to the supply flow path 41 of the first temperature control pipe 3a through the inside of the support block 6. The constant temperature fluid supplied to the supply flow path 41 flows into the return flow path 42 through the gap between the internal hole of the temperature control nozzle 1a and the processing liquid supply tube 2 described above, and then flows through the reverse path to the constant temperature water. Temperature control unit 4 via recovery pipe 44
Recovered in 5. That is, the constant temperature fluid is circulated between the temperature control unit 45 and the support arm 4 through the first and second temperature control pipes 3a and 3b, so that the processing liquid in the processing liquid supply tube 2 is always kept at a constant temperature. It is kept.

Before the processing liquid is discharged onto the substrate, all the nozzles 1 are at the standby positions off the side of the substrate W, as shown by the solid lines in FIGS. The support arm 4 stands by at the lowered position L. From this state, when supplying the processing liquid to the substrate W, first, the movable frame 10 is driven by the motor 15, and the support arm 4 of the desired nozzle 1 among the plurality of nozzles 1 is horizontally moved to the rotation center P. . Next, the drive arm 21 descends by the extension operation of the air cylinder 19 and engages with the support block 6 of the support arm 4. Then, the air cylinders 17a, 17b
Is extended to raise the elevating frame 18, and the abutting portion 31 of the elevating frame 18 presses the upper end projection 32 of the arm rotation support 9 from below, so that the supporting arm is provided between the drive arm 21 and the elevating frame 18. 4 is clamped and further raised by the elevation of the elevating frame 18 to the upper limit (H). Then, the motor 26 is driven to rotationally move the nozzle 1 to a predetermined discharge position above the substrate W, and only one of the air cylinders 17a and 17b is contracted to move the support arm 4 to a predetermined discharge height (F). )
Down to.

In this state, the inside of the processing liquid reservoir T is pressurized with an inert gas to supply the processing liquid into the processing liquid supply tube 2. At this time, since the constant temperature fluid has been previously supplied into the supply passage 41, the processing liquid in the processing liquid supply tube 2 is kept at a predetermined temperature. Then, a predetermined amount of the processing liquid is dropped and supplied onto the upper surface of the substrate W which has begun to rotate before or at low speed.
After the supply of the processing liquid, the substrate W is rotated at a high speed so that the processing liquid on its upper surface is uniformly applied.

The ridges 8 formed on the inner wall of the joint member 8
a and 8b, together with each partition plate 40 of the treatment liquid supply tube 2, are for more sufficiently partitioning the supply flow channel 41 and the return flow channel 42, and not only the inner wall of the joint member 8, The ridges 8a, 8 that also extend to the inner wall of the first temperature control pipe 3a
The same as b can be formed. Further, in the present embodiment, the processing liquid supply tube 2 is provided with the pair of partition plates 40, but the present invention is not limited to this, and various modifications can be made. For example, as shown in FIG. 7 (a), one outer wall of the treatment liquid supply tube 2 is in contact with the inner wall of the temperature control pipe 3 and one outer wall of the treatment liquid supply tube 2 is in contact with the inner wall of the temperature control pipe 3. A partition plate 50 may be provided. Further, as shown in FIG. 7 (b), the processing liquid supply tube 2 may remain cylindrical and the partition plate 40 may be provided from the inner wall of the temperature control pipe 3 toward the inside. Further, FIG. 7 (c)
As shown in FIG. 3, a plurality of protruding members 51 different from the partition plate 40 are provided in the treatment liquid supply tube 2 along the flow path direction, and when the temperature control pipe 3 is bent, the supply flow in the temperature control pipe 3 is increased. The passage 41 and the return passage 42 may be made hard to collapse.

Further, in the present embodiment, the processing liquid is supplied by pressurizing the inside of the processing liquid storage portion T with the inert gas, but the present invention is not limited to this, and the processing liquid is supplied by being pumped, for example. Good. Further, as the processing liquid, there are various processing liquids such as a developing liquid and a rinsing liquid other than the photoresist liquid, and the present invention can be applied to a processing liquid supply device for supplying these.

[0030]

As is apparent from the above description, according to the present invention, the partition plate serves to provide a constant temperature fluid supply flow path and a return flow in one pipe by the partition plate. Since it is divided into two parts, the diameter of the temperature control pipe containing the processing liquid pipe can be reduced. As a result, the entire device can be downsized.

[Brief description of drawings]

FIG. 1 is a partially cutaway side view showing a processing liquid supply device of a rotary substrate processing apparatus according to an embodiment.

FIG. 2 is a plan view of the processing liquid supply apparatus shown in FIG.

FIG. 3 is a partially cutaway side view of a main part of a support arm.

4 is a cross-sectional view taken along the line AA in FIG.

5 is a cross-sectional view taken along the line BB in FIG.

FIG. 6 is a vertical cross-sectional view of a tip portion of a support arm.

FIG. 7 is a diagram showing a main part of another embodiment.

FIG. 8 is a diagram showing a main part of a conventional device.

[Explanation of symbols]

 1 ... Nozzle 2 ... Treatment liquid supply tube (treatment liquid pipe) 3a ... 1st temperature control piping 3b ... 2nd temperature control piping 4 ... Support arm 8 ... Joint member 40 ... Partition plate 41 ... Supply channel 42 ... Return channel 43 ... Constant temperature water supply pipe 44 ... Constant temperature water recovery pipe 45 ... Temperature control unit T ... Treatment liquid reservoir W ... Substrate

Claims (1)

[Claims] 1. A treatment liquid pipe for supplying a treatment liquid to a rotatably supported substrate, and a temperature control pipe having the treatment liquid pipe built-in, wherein a gap is provided between the treatment liquid pipe and the temperature control pipe. In the processing liquid supply device of the rotary substrate processing apparatus, which makes the temperature of the processing liquid in the processing liquid pipe constant by circulating a constant temperature fluid, the outer wall of the processing liquid pipe and the inner wall of the temperature control pipe are formed. A partition plate that divides the interior of the space into at least two parts along the flow path, one partition flow path serving as a constant temperature fluid supply flow path, and the other partition flow path serving as a constant temperature fluid return flow path, A processing liquid supply device for a rotary substrate processing apparatus.