JPH0726297A - Cleaning fluid for sealed element - Google Patents

Cleaning fluid for sealed element

Info

Publication number
JPH0726297A
JPH0726297A JP16695593A JP16695593A JPH0726297A JP H0726297 A JPH0726297 A JP H0726297A JP 16695593 A JP16695593 A JP 16695593A JP 16695593 A JP16695593 A JP 16695593A JP H0726297 A JPH0726297 A JP H0726297A
Authority
JP
Japan
Prior art keywords
pyrrolidone
cleaning
contact
cleaning fluid
aliphatic amine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16695593A
Other languages
Japanese (ja)
Other versions
JP3261810B2 (en
Inventor
Riichiro Kawashima
理一郎 川島
Yoshitake Araki
良剛 荒木
Noboru Ueki
昇 植木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Corp filed Critical Mitsubishi Chemical Corp
Priority to JP16695593A priority Critical patent/JP3261810B2/en
Publication of JPH0726297A publication Critical patent/JPH0726297A/en
Application granted granted Critical
Publication of JP3261810B2 publication Critical patent/JP3261810B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a cleaning fluid which can efficiently clean a sealed element in the field of electronic material by mixing a pyrrolidone and an aliphatic amine at a specified ratio. CONSTITUTION:This cleaning fluid contains 80-99wt.%, preferably 90-98wt.% pyrrolidone compound and 1-9wt.%, preferably 2-7wt.% aliphatic amine. Examples of the pyrrolidone compound include N-methyl-2-pyrrolidone and 2-pyrrolidone, which are used alone or as a mixture of at least two of them. Examples of the aliphatic amine include triethanolamine and cyclohexylamine. A plurality of the aliphatic amines may be used together. Other solvents (e.g. an alcohol) may be added in an amount within such a range as not to adversely affect the detergent. To remove the flash from a sealed element, a technique such as spray contact, shower contact, dip contact or ultrasonic contact is used. The cleaning is performed usually at 50-150 deg.C for 1-120min.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、主に電子材料の分野で
使用される封止素子の洗浄に用いられる洗浄液に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning liquid used for cleaning sealing elements mainly used in the field of electronic materials.

【0002】[0002]

【従来の技術】封止素子は、例えば銅または銀などの導
体基盤に半導体チップ等を接続し、その継目をエポキシ
樹脂、フェノール樹脂、ケイ素樹脂などの封止剤で封じ
たものを成形することにより製造される。かかる封止素
子を製造する場合、成形時の封止剤由来のバリが封止素
子の表面に残存するため、一般に、溶剤を用いて洗浄処
理し、このバリを除去している。
2. Description of the Related Art A sealing element is formed by connecting a semiconductor chip or the like to a conductor substrate such as copper or silver and sealing the joints with a sealing agent such as epoxy resin, phenol resin or silicon resin. Manufactured by. When manufacturing such a sealing element, burrs derived from the sealing agent at the time of molding remain on the surface of the sealing element. Therefore, cleaning is generally performed using a solvent to remove the burrs.

【0003】従来、封止素子用の洗浄溶剤としては、フ
ロン系あるいは塩素系の溶剤が主に用いられてきたが、
現在、これらの溶剤は安全性、環境への影響などが大き
な問題となり、代替の洗浄剤が求められている。また、
集積回路封止素子用洗浄液として、N−メチル−2−ピ
ロリドンにアルカリ金属あるいはアルカリ土類金属化合
物を配合したものが提案されている(特開平4−240
738)。該洗浄液はバリ取りの洗浄効果自体は優れて
いるが、洗浄液中の金属イオンが被洗浄物に残留しやす
く、より高性能が要求される封止素子においては、その
信頼性を損う危険がある。また、封止素子の基体金属の
種類、あるいは洗浄条件によっては封止素子の表面が着
色しやすいという問題がある。
Conventionally, fluorocarbon-based or chlorine-based solvents have been mainly used as cleaning solvents for sealing elements.
Currently, these solvents pose major problems in terms of safety and environmental impact, and alternative cleaning agents are being sought. Also,
As a cleaning liquid for an integrated circuit sealing element, there has been proposed a mixture of N-methyl-2-pyrrolidone with an alkali metal or alkaline earth metal compound (Japanese Patent Laid-Open No. 4-240).
738). Although the cleaning solution is excellent in the cleaning effect itself of deburring, metal ions in the cleaning solution are likely to remain on the object to be cleaned, and there is a risk of impairing its reliability in a sealing element that requires higher performance. is there. Further, there is a problem that the surface of the sealing element is easily colored depending on the type of base metal of the sealing element or the cleaning conditions.

【0004】更に、N−メチル−2−ピロリドン自体
は、古くから周知の溶剤であり、これを含む洗浄剤組成
物も多く知られている。例えば、特公昭58−2100
0号公報には、主にフラックス洗浄用として、少なくと
も50重量%のN−メチル−2−ピロリドンと、少なく
とも10重量%のアルカノールアミンとを含み、好まし
くはアルカリ金属またはアルカリ土類金属を含む組成物
が開示されている。
Further, N-methyl-2-pyrrolidone itself has been a well-known solvent for a long time, and many detergent compositions containing it are also known. For example, Japanese Patent Publication Sho 58-2100
No. 0 publication contains a composition containing at least 50% by weight of N-methyl-2-pyrrolidone and at least 10% by weight of alkanolamine, and preferably containing an alkali metal or an alkaline earth metal, mainly for flux cleaning. The thing is disclosed.

【0005】一方、特開昭64−81949号公報に
は、フォトレジスト用剥離剤としてγ−ブチロラクト
ン、N−メチルホルムアミド、N,N−ジメチルホルム
アミド、N,N−ジメチルアセトアミド、N−メチル−
2−ピロリドンより選ばれる少なくとも一種と、アルカ
ノールアミンと水とを含有する組成物が開示されてい
る。該組成物では、水が必須成分であって、フォトレジ
スト用剥離剤としては、前記の特公昭58−21000
号公報で提案されているN−メチル−2−ピロリドンと
アルカノールアミンだけからなる組成物では不十分とし
ている。
On the other hand, in JP-A-64-81949, as a stripping agent for photoresist, γ-butyrolactone, N-methylformamide, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-
A composition containing at least one selected from 2-pyrrolidone, an alkanolamine and water is disclosed. In the composition, water is an essential component, and as the photoresist release agent, the above-mentioned JP-B-58-21000 is used.
It is said that the composition proposed in Japanese Patent Publication, which is composed only of N-methyl-2-pyrrolidone and alkanolamine, is insufficient.

【0006】[0006]

【発明が解決しようとする課題】以上のように、従来、
多くの洗浄剤組成物が提案されているにもかかわらず、
洗浄対象物の種類、あるいは、要求される洗浄の度合に
応じてなお最適な洗浄剤を開発していく必要がある。本
発明では、より厳格な洗浄が要求される主に電子材料の
分野における封止素子の洗浄に最適な洗浄液を提供する
ことを目的とする。
As described above, as described above,
Despite the proposal of many cleaning compositions
It is necessary to develop the most suitable cleaning agent according to the type of cleaning object or the degree of cleaning required. An object of the present invention is to provide a cleaning liquid most suitable for cleaning the sealing element in the field of electronic materials, which requires more rigorous cleaning.

【0007】[0007]

【課題を解決するための手段】本発明者等は、上記の課
題を解決すべく鋭意検討した結果、以下の洗浄液に関す
る発明を完成した。即ち、本発明はピロリドン類を80
〜99重量%、脂肪族アミンを1〜9重量%含有するこ
とを特徴とする封止素子用洗浄液に関する。
Means for Solving the Problems The inventors of the present invention have made extensive studies to solve the above problems, and as a result, have completed the invention relating to the following cleaning liquid. That is, the present invention provides pyrrolidones of 80
To 99% by weight and 1 to 9% by weight of an aliphatic amine are contained in the cleaning liquid for a sealing element.

【0008】本発明の洗浄液の主成分であるピロリドン
類化合物としては2−ピロリドン、3−ピロリドン、N
−アルキル−2−ピロリドン(例えば、N−エチル−2
−ピロリドン、N−プロピル−2−ピロリドン)、5−
アルキル−2−ピロリドン(例えば、5−メチル−2−
ピロリドン、5−エチル−2−ピロリドン、5−プロピ
ル−2−ピロリドン)、N−ビニル−2−ピロリドン、
N−アルキル−3−ピロリドン(例えば、N−メチル−
3−ピロリドン、N−エチル−3−ピロリドン、N−プ
ロピル−3−ピロリドン)等が例示される。ピロリドン
類化合物は単独で用いてもよく、また、2種以上の混合
物で用いてもよい。
The pyrrolidone compounds which are the main components of the cleaning solution of the present invention include 2-pyrrolidone, 3-pyrrolidone and N.
-Alkyl-2-pyrrolidone (e.g. N-ethyl-2
-Pyrrolidone, N-propyl-2-pyrrolidone), 5-
Alkyl-2-pyrrolidone (for example, 5-methyl-2-
Pyrrolidone, 5-ethyl-2-pyrrolidone, 5-propyl-2-pyrrolidone), N-vinyl-2-pyrrolidone,
N-alkyl-3-pyrrolidone (for example, N-methyl-
3-pyrrolidone, N-ethyl-3-pyrrolidone, N-propyl-3-pyrrolidone) and the like. The pyrrolidone compounds may be used alone or as a mixture of two or more kinds.

【0009】本発明の洗浄液で使用される脂肪族アミン
としては、メチルアミン、エチルアミン、イソプロピル
アミン、ジエチルアミン、トリエチルアミン、エチレン
ジアミン、テトラメチルエチレンジアミン、シクロヘキ
シルアミン等の炭素数が1〜6程度のアルキル基を有す
る水溶性アミンが挙げられる。また、アルカノールアミ
ンも好ましく使用することができ、エタノールアミン、
ジエタノールアミン、トリエタノールアミン、N−メチ
ルジエタノールアミン、2−メチルアミノエタノール等
が挙げられる。これらの脂肪族アミンは複数の種類のも
のを併用してもよい。
As the aliphatic amine used in the cleaning solution of the present invention, an alkyl group having about 1 to 6 carbon atoms such as methylamine, ethylamine, isopropylamine, diethylamine, triethylamine, ethylenediamine, tetramethylethylenediamine and cyclohexylamine is used. Water-soluble amines that it has. Further, alkanolamine can also be preferably used, and ethanolamine,
Diethanolamine, triethanolamine, N-methyldiethanolamine, 2-methylaminoethanol and the like can be mentioned. These aliphatic amines may be used in combination of a plurality of types.

【0010】本発明の洗浄液の組成としては、ピロリド
ン類化合物を80〜99重量%、好ましくは90〜98
重量%含有し、また、脂肪族アミンを1〜9重量%、好
ましくは2〜7重量%含有するものである。脂肪族アミ
ンは、ピロリドン類のみでの洗浄作用を強化するもので
あるが、その含有量が1重量%未満では効果が充分では
なく、また8重量%以上になると洗浄効果自体は飽和す
るほか、被洗浄物の表面状態を損う恐れがあるので好ま
しくない。
The cleaning liquid of the present invention has a composition of a pyrrolidone compound of 80 to 99% by weight, preferably 90 to 98.
% By weight, and 1 to 9% by weight, preferably 2 to 7% by weight, of an aliphatic amine. The aliphatic amine enhances the cleaning action only with pyrrolidones, but if the content is less than 1% by weight, the effect is not sufficient, and if it is 8% by weight or more, the cleaning effect itself is saturated, It is not preferable because it may damage the surface condition of the object to be cleaned.

【0011】また、本発明の洗浄液においては、他の溶
媒も、それらが望ましくない程度まで洗浄剤に悪影響を
与えない範囲で含有させることができる。他の溶媒とし
ては、アルコール類、エーテル類、エステル類、芳香族
炭化水素類、脂環式炭化水素類などである。本発明の洗
浄液による封止素子のバリ除去の処理方法は、封止素子
を洗浄剤溶液と接触させる洗浄処理であれば特に制限は
なく、例えば、噴霧接触、シャワー接触、浸漬接触、超
音波接触等があげられる。洗浄温度は、通常50〜15
0℃、好ましくは60〜120℃、洗浄時間としては、
通常1〜120分、好ましくは3〜30分で実施され
る。
Further, the cleaning liquid of the present invention may contain other solvent in a range in which they do not adversely affect the cleaning agent to an undesired degree. Other solvents include alcohols, ethers, esters, aromatic hydrocarbons and alicyclic hydrocarbons. The treatment method for removing the burr of the sealing element with the cleaning liquid of the present invention is not particularly limited as long as it is a cleaning treatment in which the sealing element is brought into contact with a cleaning agent solution, and for example, spray contact, shower contact, immersion contact, ultrasonic contact Etc. The washing temperature is usually 50 to 15
0 ° C., preferably 60 to 120 ° C., and the washing time is
It is usually carried out for 1 to 120 minutes, preferably 3 to 30 minutes.

【0012】[0012]

【実施例】以下、実施例により本発明を更に詳細に説明
するが、本発明はその要旨を越えない限り以下の実施例
に限定されるものではない。
The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to the following examples unless it exceeds the gist.

【0013】実施例 表−1に示す組成の洗浄液を所定の温度に昇温し、これ
に銅の導体基板を用い、かつ、封止剤としてエポキシ樹
脂を用いて製造された封止素子を浸漬し、表−1に示す
条件で洗浄処理を行った。洗浄後、水洗、乾燥を行っ
た。洗浄処理前後の上記IC封止素子付着物の除去の程
度について、光学顕微鏡を用いて観察し、バリ除去の程
度を調査した結果を表−1に示す。
Example A cleaning liquid having the composition shown in Table 1 was heated to a predetermined temperature, and a sealing element manufactured by using a copper conductor substrate and an epoxy resin as a sealing agent was immersed in the cleaning liquid. Then, the cleaning process was performed under the conditions shown in Table-1. After washing, it was washed with water and dried. The degree of removal of the above IC sealing element deposits before and after the cleaning process was observed using an optical microscope, and the results of investigating the degree of burr removal are shown in Table 1.

【0014】表−1において、洗浄後のIC封止素子表
面の観察結果を以下の記号で示した。 ○…バリが完全に除去されている。 △…バリがわずかに残存している。 ×…バリの大部分が残存している。
In Table 1, the observation results of the surface of the IC sealing element after cleaning are shown by the following symbols. ○: Burrs are completely removed. Δ: A slight amount of burr remained. X: Most of the burr remains.

【0015】[0015]

【表1】 [Table 1]

【0016】[0016]

【発明の効果】本発明の洗浄液を用いることにより、封
止素子を効率よく洗浄することができる。
By using the cleaning liquid of the present invention, the sealing element can be efficiently cleaned.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 ピロリドン類を80〜99重量%、脂肪
族アミンを1〜9重量%含有することを特徴とする封止
素子用洗浄液。
1. A cleaning liquid for a sealing element, which comprises 80 to 99% by weight of pyrrolidones and 1 to 9% by weight of an aliphatic amine.
JP16695593A 1993-07-06 1993-07-06 Cleaning liquid for sealing element Expired - Fee Related JP3261810B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16695593A JP3261810B2 (en) 1993-07-06 1993-07-06 Cleaning liquid for sealing element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16695593A JP3261810B2 (en) 1993-07-06 1993-07-06 Cleaning liquid for sealing element

Publications (2)

Publication Number Publication Date
JPH0726297A true JPH0726297A (en) 1995-01-27
JP3261810B2 JP3261810B2 (en) 2002-03-04

Family

ID=15840723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16695593A Expired - Fee Related JP3261810B2 (en) 1993-07-06 1993-07-06 Cleaning liquid for sealing element

Country Status (1)

Country Link
JP (1) JP3261810B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100365708B1 (en) * 1998-07-29 2003-02-25 이홍모 DETERGENT COMPOSlTION COMPRISING ANTIOXIDANT

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100365708B1 (en) * 1998-07-29 2003-02-25 이홍모 DETERGENT COMPOSlTION COMPRISING ANTIOXIDANT

Also Published As

Publication number Publication date
JP3261810B2 (en) 2002-03-04

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