JPH07250798A - Dish washing device - Google Patents
Dish washing deviceInfo
- Publication number
- JPH07250798A JPH07250798A JP7004394A JP7004394A JPH07250798A JP H07250798 A JPH07250798 A JP H07250798A JP 7004394 A JP7004394 A JP 7004394A JP 7004394 A JP7004394 A JP 7004394A JP H07250798 A JPH07250798 A JP H07250798A
- Authority
- JP
- Japan
- Prior art keywords
- abrasive
- chamber
- shutter
- washing
- basket
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Washing And Drying Of Tableware (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、食器洗浄装置に関す
る。FIELD OF THE INVENTION The present invention relates to a dishwasher.
【0002】[0002]
【従来の技術】従来、食器洗浄装置は、洗浄槽内に着脱
可能に固定されたかご形ケース等の食器支持手段、及び
攪拌翼等の渦巻水流発生手段を備えてなり、食器支持手
段に食器をセットした状態で、洗浄槽内の洗浄水を攪拌
して渦巻水流を発生させ、該水流により食器を洗浄して
いた。そして、洗浄効果を高めるために、洗浄水に軟質
の粒状研磨材を混入し、渦巻水流の流動と共に粒状研磨
材が食器に接触するようにしていた。2. Description of the Related Art Conventionally, a dishwashing apparatus is provided with dishware supporting means such as a basket-like case which is detachably fixed in a washing tank, and swirling water flow generating means such as stirring blades, and the dishware supporting means is equipped with dishware. With the above set, the washing water in the washing tank was stirred to generate a swirling water flow, and the dishes were washed with the water flow. Then, in order to enhance the cleaning effect, a soft granular abrasive is mixed in the cleaning water so that the granular abrasive comes into contact with the tableware as the swirling water flow flows.
【0003】このような食器洗浄装置は、洗浄槽の底部
の排水口の上位にパンチメタルや金網等よりなるストレ
ーナを設け、排水時に上記粒状研磨材を分離して残留さ
せて繰返し使用可能としているが、食器に付着していた
食べ残しの固形物が粒状研磨材に混入して残留したり、
洗浄終了時に食器に研磨材が付着していたりするといっ
た問題があった。In such a dishwashing apparatus, a strainer made of punched metal, wire mesh or the like is provided above the drainage port at the bottom of the washing tank, and the granular abrasives are separated and left at the time of drainage to enable repeated use. However, the uneaten solids attached to the tableware are mixed into the granular abrasive and remain,
There was a problem that the polishing material adhered to the dishes at the end of washing.
【0004】[0004]
【発明が解決しようとする課題】本発明は、従来の食器
洗浄装置のこのような点に鑑みて、洗浄行程に従って、
粒状研磨材を洗浄槽より分離回収して、食べ残しの固形
物の粒状研磨材への混入、及び洗浄終了時における食器
への研磨材の付着を防止すると共に、洗浄効果を高めた
食器洗浄装置を提供することを目的とするものである。SUMMARY OF THE INVENTION In view of such a point of the conventional dishwashing apparatus, the present invention provides a washing process according to the following steps.
A dishwasher that separates and collects the granular abrasive from the washing tank to prevent the uneaten solids from mixing into the granular abrasive and to prevent the abrasive from adhering to the dishes at the end of washing, and enhancing the washing effect It is intended to provide.
【0005】[0005]
【課題を解決するための手段】渦巻水流発生手段、及
び、食器の支持手段を備えた洗浄槽と、該洗浄槽に上下
2箇所の連通口で連通する研磨材室とを備え、上記洗浄
槽には主給水管及び主排水管を、上記研磨材室には副給
水管及び、副排水管を夫々配管し、上記研磨材室内には
研磨材かごを挿脱可能に設けるとともに、下側連通口に
は、該下側連通口を開閉するシャッターを設けた。A cleaning tank provided with a swirling water flow generating means and a tableware supporting means, and an abrasive material chamber communicating with the cleaning tank at two upper and lower communication ports, the cleaning tank , A main water supply pipe and a main drain pipe, and a sub water supply pipe and a sub drain pipe in the abrasive material chamber, respectively. The mouth was provided with a shutter for opening and closing the lower communication port.
【0006】また、上記シャッターを、研磨材室内に昇
降自在に支持されているフロートと一体であるか若しく
は連動するものとし、該フロートに作用する浮力によ
り、上記研磨材室内の水位に応じて開閉するようにし
た。Further, the shutter is integral with or interlocked with a float that is liftably supported in the abrasive chamber, and buoyancy acting on the float opens and closes according to the water level in the abrasive chamber. I decided to do it.
【0007】[0007]
【作用】洗浄すべき食器をセットした洗浄槽に、主排水
管及び副排水管を閉じた状態で主給水管より洗浄槽内に
給水すると、下側連通口より研磨材室内に流入する水に
より、該研磨材室内の水位が上昇し、これと共に下側連
通口のシャッターが閉じる。この後、洗浄槽内の水位が
所定の高水位に達すれば、渦巻水流を発生して研磨材無
しで予洗いを行ない、主排水管及び副排水管を開いて排
水すれば、食器に付着していた固形物や液状物は除去さ
れる。[Function] When water is supplied from the main water supply pipe into the cleaning tank with the main drain pipe and the sub drain pipe closed in the cleaning tank in which the dishes to be cleaned are set, the water flowing into the abrasive chamber from the lower communication port The water level in the polishing material chamber rises, and at the same time, the shutter of the lower communication port closes. After this, when the water level in the washing tank reaches a predetermined high level, a swirling water flow is generated and pre-washing is performed without an abrasive material.If the main drain pipe and sub drain pipe are opened and drained, they will adhere to the dishes. The solid and liquid substances that had been removed are removed.
【0008】次に、各排水管を閉じた状態で副給水管よ
り研磨材室内に給水すれば、研磨材室内の水位上昇と共
に直ちに下側連通口のシャッターが閉じるが、更に水位
が上昇して、上側連通口より洗浄槽内に洗浄水及び研磨
材が流入する。そして、洗浄槽の水位が所定高水位に達
した後に給水を停止し、渦巻水流を発生して、該水流と
研磨材とにより食器の洗浄を行ない、各排水管を開いて
排水する。この際、研磨材は洗浄槽底部や、排水口のス
トレーナ上に残留している。Next, when water is supplied from the sub water supply pipe into the abrasive chamber with each drain pipe closed, the shutter at the lower communication port closes immediately as the water level in the abrasive chamber rises, but the water level further rises. The cleaning water and the abrasive flow into the cleaning tank through the upper communication port. Then, after the water level in the washing tank reaches a predetermined high water level, the water supply is stopped, a swirling water flow is generated, the dishes are washed with the water flow and the abrasive, and the drain pipes are opened for draining. At this time, the abrasive remains on the bottom of the cleaning tank and on the strainer at the drain port.
【0009】続いて、主排水管のみを閉じ、副排水管は
開けた状態で主給水管より洗浄槽内に給水し、所定の低
水位に達した後、渦巻水流を発生すれば、研磨材は該研
磨材に作用する浮力及び遠心力により水と共に下側連通
口より研磨材室内に流入し研磨材かご内に回収される。
この際、研磨材は上記水流により洗浄される。この後、
副排水管を閉じれば、研磨材室内の水位が上昇し、これ
と共に下側連通口のシャッターが閉じ、洗浄槽の水位が
所定の高水位に達すればオーバーフローさせながらすす
ぎを行ない、各排水管を開いて排水すれば、洗浄行程は
終了する。Next, when only the main drain pipe is closed and the sub drain pipe is opened, water is supplied from the main water pipe into the cleaning tank, and after a predetermined low water level is reached, a swirling water flow is generated, and the abrasive material Is introduced into the abrasive chamber through the lower communication port together with water by the buoyancy and centrifugal force acting on the abrasive, and is collected in the abrasive basket.
At this time, the abrasive is washed with the water stream. After this,
When the sub drain pipe is closed, the water level in the abrasive chamber rises, and at the same time, the shutter at the lower communication port closes, and when the water level in the cleaning tank reaches a predetermined high water level, rinsing is performed by overflowing each drain pipe. If it is opened and drained, the washing process is completed.
【0010】[0010]
【実施例】実施例について図面と共に説明する。Embodiments will be described with reference to the drawings.
【0011】図1及び図2に本発明実施例の食器洗浄装
置1を示す。図において食器洗浄装置1は、円筒状の洗
浄槽2、及び、該洗浄槽2の外側壁3に2個の略半円筒
状の研磨材室4,4を設けている。1 and 2 show a dishwasher 1 according to an embodiment of the present invention. In the drawing, a dishwashing apparatus 1 is provided with a cylindrical cleaning tank 2 and two substantially semi-cylindrical abrasive chambers 4 and 4 on an outer wall 3 of the cleaning tank 2.
【0012】洗浄槽2の底部5の中央にはモータ6を動
力源とする駆動装置7を設け、該駆動装置7の出力軸に
は渦巻発生手段として、攪拌翼8を固定している。攪拌
翼8は、図2に示す如く、基円板9上に8枚のフィン1
0を形成してなり、上記基円板9には2箇所の円孔1
1,11が穿設され、該円孔11,11には、蓋体1
2,12が取外し可能な状態に固定してある。A drive device 7 having a motor 6 as a power source is provided at the center of the bottom portion 5 of the cleaning tank 2, and a stirring blade 8 is fixed to the output shaft of the drive device 7 as a spiral generating means. As shown in FIG. 2, the stirring blade 8 has eight fins 1 on the base disk 9.
0 is formed, and two circular holes 1 are formed in the base disk 9.
1 and 11 are provided in the circular holes 11 and 11, respectively.
2, 12 are fixed in a removable state.
【0013】また、洗浄槽2の底部5の、前記攪拌翼8
を適宜回動することにより円孔11と重なる位置には、
排水口13が開口され、該排水口13には、パンチメタ
ル又は金網等よりなるストレーナ14が着脱可能に嵌合
してある。更に、上記排水口13の下側を覆うように排
水溝15を形成し、該排水溝15の底面には主排水管P
3が配管されている。The stirring blade 8 of the bottom portion 5 of the cleaning tank 2
By rotating the
A drain port 13 is opened, and a strainer 14 made of punch metal, wire mesh, or the like is detachably fitted to the drain port 13. Further, a drainage groove 15 is formed so as to cover the lower side of the drainage port 13, and the main drainage pipe P is provided on the bottom surface of the drainage groove 15.
3 is piped.
【0014】洗浄槽2の上記攪拌翼8の上側には、食器
の支持手段としてかご形ケース17を着脱自在に固定し
ている。かご形ケース17は、図5に示す如く該ケース
の底部に同心円状に配置した環状の線材18,19,2
0と8本の放射状に配置した線材21とで形成される円
錐形部分の上位に、前記環状の線材18,19,20と
同じく同心円状に配置した環状の線材22,23,24
を、上記円錐部分に立設した柱状の線材25,26,2
7,28で支持することにより、3層の異形円筒を同軸
に積層した形状をなしている。そして、各層の間隙部に
食器を盛付け面を内側にして挿入することにより、食器
はかご形ケース17内に同心円状に配置されるようにな
っている。尚、綿材21は、食器に当接する部分では図
5に示す如く下方にV字状に折曲した折曲部21bを形
成して食器の下落ちを防止すると共に確実に支持される
ようにしている。そして、上記かご形ケース17は、前
記8本の放射状線材21の先端を下方に折曲して形成し
た脚部21aを洗浄槽2の内側面に固着したソケット2
9に挿入することにより固定される。On the upper side of the stirring blade 8 of the washing tank 2, a basket-shaped case 17 is detachably fixed as a tableware supporting means. As shown in FIG. 5, the cage-shaped case 17 is an annular wire rod 18, 19, 2 arranged concentrically on the bottom of the case.
The annular wire rods 22, 23, 24 arranged concentrically with the annular wire rods 18, 19, 20 above the conical portion formed by 0 and 8 radially arranged wire rods 21.
Is a columnar wire rod 25, 26, 2 erected on the conical portion.
By supporting with 7 and 28, it has a shape in which three layers of deformed cylinders are coaxially laminated. Then, the tableware is arranged concentrically in the basket-shaped case 17 by inserting the tableware into the gaps of the layers with the serving surface inside. Incidentally, the cotton material 21 has a bent portion 21b bent downward in a V shape at the portion contacting the tableware as shown in FIG. 5 so as to prevent the tableware from falling and to be surely supported. ing. The cage-shaped case 17 has a socket 2 in which leg portions 21a formed by bending the tips of the eight radial wires 21 downward are fixed to the inner surface of the cleaning tank 2.
It is fixed by inserting into 9.
【0015】洗浄槽2の側壁3上端付近には、オーバー
フロー管P5を接続したオーバーフロー部30、及び主
給水管P1を接続した給水部31を夫々設けている。3
2は洗浄槽2の蓋である。Near the upper end of the side wall 3 of the cleaning tank 2, an overflow section 30 connected to an overflow pipe P5 and a water supply section 31 connected to a main water supply pipe P1 are provided. Three
Reference numeral 2 is a lid of the cleaning tank 2.
【0016】次に、研磨材室4,4について説明する。
尚、各研磨材室4,4は同一構造であり、且つ、動作の
タイミングも同一であるので、以下において一方につい
てのみ説明するものとする。Next, the polishing material chambers 4 and 4 will be described.
Since each of the polishing material chambers 4 and 4 has the same structure and the same operation timing, only one of them will be described below.
【0017】研磨材室4は、洗浄槽2の側壁3に設けた
上下2箇所の連通口41,42により洗浄槽2内部と連
通しており、底部43の中央には、給水ノズル44を開
口し、該給水ノズル44の他端には副給水管P2を接続
している。また、上記給水ノズル44の近傍には排水口
45を開口し、該排水口45には副排水管P4を接続し
ている。The polishing material chamber 4 communicates with the inside of the cleaning tank 2 through two upper and lower communication ports 41, 42 provided on the side wall 3 of the cleaning tank 2, and a water supply nozzle 44 is opened at the center of the bottom portion 43. A sub water supply pipe P2 is connected to the other end of the water supply nozzle 44. A drain port 45 is opened near the water supply nozzle 44, and a sub drain pipe P4 is connected to the drain port 45.
【0018】上記研磨材室4の内部には研磨材かご46
を挿脱可能に設けている。研磨材かご46は図3に示す
如く研磨材室4とほぼ同形状で僅かに小径の略半円筒状
をなすと共に、底部は円錐漏斗状をなしており、該底部
中央には開口部47を形成し、該開口部47にはストレ
ーナ47aを設けている。また、研磨材かご46の半円
筒周側壁及び、底部の漏斗状部分は、いずれも粒状研磨
材Wの粒径より小なる多数の貫通孔48a,48bを有
するパンチメタルで形成し、上記側壁の平面部分49
は、研磨材かご46を研磨材室4に挿入した際、上下の
連通口41,42と重なる部分を開口51,52とした
平板材で形成している。An abrasive basket 46 is provided inside the abrasive chamber 4.
Is installed so that it can be inserted and removed. As shown in FIG. 3, the abrasive basket 46 has substantially the same shape as the abrasive chamber 4 and has a substantially semi-cylindrical shape with a slightly smaller diameter, and has a conical funnel shape at the bottom and an opening 47 at the center of the bottom. A strainer 47a is provided in the opening 47. The semi-cylindrical peripheral side wall of the abrasive basket 46 and the funnel-shaped portion at the bottom are both formed of punch metal having a large number of through holes 48a, 48b smaller than the particle size of the granular abrasive W, and the side wall Plane part 49
Is formed of a flat plate material having openings 51 and 52 which overlap the upper and lower communication ports 41 and 42 when the abrasive basket 46 is inserted into the abrasive chamber 4.
【0019】そして、研磨材かご46の上側開口部51
の周囲には、研磨かご46を研磨材室4内に挿入した
際、洗浄槽側壁3の上側連通口41の周囲に密接するパ
ッキン50を固着する。また、研磨材かご46の平面部
分49の下半部にはシャッター53が以下の如く昇降自
在に支持されている。The upper opening 51 of the abrasive basket 46
When the polishing basket 46 is inserted into the polishing material chamber 4, a packing 50 that is in close contact with the periphery of the upper communication port 41 of the cleaning tank side wall 3 is fixed to the periphery of the. A shutter 53 is supported on the lower half of the flat portion 49 of the abrasive basket 46 so as to be able to move up and down as follows.
【0020】即ち、シャッター53は、両側部に設けた
ガイドフレーム54,54を、図3及び図4に示す研磨
材かご46の平面部分49の両側に固着した一対のガイ
ドレール部材55,55の対向するガイド溝56に係合
することにより、上下方向に摺動自在に支持され、且
つ、研磨材かご46の平面部分49の下端に設けた部材
57により下落ちを防止している。シャッター53は、
下端が上記部材57に接した位置で、研磨材かご46の
下側開口部52と重なる位置に、該開口部52と同形の
貫通口58を貫設し、且つ、該貫通口58の下側に隣接
して遮蔽部材60を固着している。該遮蔽部材60及
び、上記貫通口58の周囲前面59は、洗浄槽側壁3と
同一曲面を形成して、シャッター前面の他の部分より突
出している。That is, the shutter 53 includes a pair of guide rail members 55 and 55, in which the guide frames 54 and 54 provided on both sides are fixed to both sides of the plane portion 49 of the abrasive basket 46 shown in FIGS. 3 and 4. By engaging with the guide grooves 56 facing each other, the member 57 is slidably supported in the vertical direction, and is prevented from falling down by the member 57 provided at the lower end of the flat surface portion 49 of the abrasive basket 46. The shutter 53 is
A through-hole 58 having the same shape as the opening 52 is formed at a position where the lower end is in contact with the member 57 and overlaps with the lower opening 52 of the abrasive basket 46, and the lower side of the through-hole 58 is formed. The shielding member 60 is fixed adjacent to. The shielding member 60 and the front surface 59 around the through-hole 58 form the same curved surface as the cleaning tank side wall 3 and project from other portions of the front surface of the shutter.
【0021】このような外形状を有するシャッター53
は、主材として発泡スチロール等の軽量材料を用いる
か、又は、樹脂材等で中空に形成することにより、前記
遮蔽部材60の上縁61を吃水線として水に浮くフロー
トとして構成されている。The shutter 53 having such an outer shape
Is made of a lightweight material such as Styrofoam as a main material, or is made of a resin material or the like so as to be hollow, so that the upper edge 61 of the shielding member 60 is configured as a float that floats on water as a water line.
【0022】上記シャッター53を支持した研磨材かご
46の側面中央には、研磨材かご46の長さ方向に平行
にリブ62を形成しており、研磨材かご46を研磨材室
4内に挿入すれば、研磨材かご46は、上記リブ62と
ガイドレール部材55,55とにより研磨材室4内の所
定の位置に支持される。この状態において研磨材かご4
6の下端開口部47は、給水ノズル44に嵌合すると共
に、パッキン50は洗浄槽側壁3に密接し、且つ、シャ
ッター53の貫通口58の周囲前面59、及び、遮蔽部
材60は、上記側壁3に容易に摺動可能な状態で当接す
る。尚、63は研磨材室4の蓋である。A rib 62 is formed in the center of the side surface of the abrasive basket 46 supporting the shutter 53 in parallel with the length direction of the abrasive basket 46, and the abrasive basket 46 is inserted into the abrasive chamber 4. Then, the abrasive basket 46 is supported at a predetermined position in the abrasive chamber 4 by the ribs 62 and the guide rail members 55, 55. Abrasive basket 4 in this state
The lower end opening 47 of 6 fits into the water supply nozzle 44, the packing 50 is in close contact with the cleaning tank side wall 3, and the peripheral front surface 59 of the through hole 58 of the shutter 53 and the shielding member 60 are the side walls. It comes into contact with 3 in an easily slidable state. Incidentally, 63 is a lid of the polishing material chamber 4.
【0023】そして、主給水管P1,副給水管P2には
電磁弁SV1,SV2を、主排水管P3,副排水管P4
には電磁弁SV3,SV4を、夫々設け、これら4個の
電磁弁SV1〜SV4の開閉、及び、攪拌翼8(モータ
6)の回転は、それらに接続した図示しない制御装置に
よりシーケンス制御される。The main water supply pipe P1 and the sub water supply pipe P2 are provided with solenoid valves SV1 and SV2, a main drain pipe P3 and a sub drain pipe P4.
Solenoid valves SV3 and SV4 are provided respectively, and opening / closing of these four solenoid valves SV1 to SV4 and rotation of the stirring blade 8 (motor 6) are sequence-controlled by a control device (not shown) connected to them. .
【0024】次に洗浄過程の一例について、図4に示す
タイミングチャートを参照しながら説明する。尚、以下
の洗浄過程において使用する研磨材Wの材質は特に限定
されるものではないが、比重が1程度の軟質粒状の研磨
材が適当であり、例えば、粒径が5〜20mmの塊状又は
シート状の発泡ウレタンゴムや、ナイロン,ポリエステ
ル等の綿状短繊維を部分接着し不定形に破断又は切断し
たもの等を使用することができる。上記研磨材Wは研磨
材室4の研磨材かご46内に適量投入されている。Next, an example of the cleaning process will be described with reference to the timing chart shown in FIG. The material of the abrasive W used in the following cleaning process is not particularly limited, but a soft granular abrasive having a specific gravity of about 1 is suitable, for example, a lump having a particle diameter of 5 to 20 mm or It is possible to use a sheet-like urethane foam rubber, or a cotton-like short fiber such as nylon or polyester partially bonded and broken or cut into an indeterminate shape. An appropriate amount of the abrasive W is put in the abrasive basket 46 in the abrasive chamber 4.
【0025】そして、洗浄すべき食器をセットしたかご
形ケース17を洗浄槽2内に固定し、該洗浄槽4に、電
磁弁SV3,SV4を閉じた状態で電磁弁SV1を開い
て主給水管P1より給水すると、洗浄槽2内の水位が低
水位L2に達した後、下側連通口42より研磨材室4内
に流入する水により研磨材室4内の水位が上昇し、これ
と共にシャッター53が上昇して、遮蔽部材60により
下側連通口42が閉じられ、研磨材室4内からの研磨材
Wの流出が阻止される。この後、洗浄槽2内の水位が所
定の高水位L1に達すれば、モータ6を作動して攪拌翼
8を回転し、洗浄槽2内に渦巻水流を発生して研磨材無
しでオーバーフローしながら予洗いを行なう。所定時間
予洗いした後、モータ6を停止すると共に主排水管P3
及び副排水管P4の各電磁弁SV3,SV4を開いて排
水すれば、食器に付着していた固形物や液状物は除去さ
れる。Then, the basket-shaped case 17 in which the dishes to be cleaned are set is fixed in the cleaning tank 2, and the electromagnetic valve SV1 is opened in the cleaning tank 4 with the electromagnetic valves SV3 and SV4 closed. When water is supplied from P1, after the water level in the cleaning tank 2 reaches the low water level L2, the water level in the abrasive chamber 4 rises due to the water flowing into the abrasive chamber 4 through the lower communication port 42, and the shutter is also released. 53 rises, the lower communication port 42 is closed by the shielding member 60, and the abrasive W is prevented from flowing out of the abrasive chamber 4. After that, when the water level in the cleaning tank 2 reaches a predetermined high water level L1, the motor 6 is operated to rotate the stirring blade 8 to generate a swirling water flow in the cleaning tank 2 and to overflow without an abrasive. Pre-wash. After prewashing for a predetermined time, the motor 6 is stopped and the main drain pipe P3
When the electromagnetic valves SV3 and SV4 of the sub drain pipe P4 are opened and drained, the solid and liquid substances attached to the dishes are removed.
【0026】次に、電磁弁SV3,SV4を閉じた状態
で電磁弁SV2を開いて副給水管P2の給水ノズル44
より研磨材室4内に給水すれば、研磨材室4内の水位上
昇と共にシャッター53が上昇して直ちに下側連通口4
2が閉じるが、研磨材室4内の水位が更に上昇して、上
側連通口41より洗浄槽2内に洗浄水及び研磨材Wが流
入する。そして、洗浄槽2の水位が上昇し所定高水位L
1に達すれば、電磁弁SV2を閉じて給水を停止すると
共に、モータ6を作動して攪拌翼8を回転し、洗浄槽2
内に渦巻水流を発生して、該水流と研磨材Wとにより所
定時間食器の洗浄を行なう。この後モータ6を停止する
と共に各排水管P3,P4の電磁弁SV3,SV4を開
いて排水する。この際、研磨材Wは洗浄槽2の底部や、
該底部のストレーナ14上に残留している。Next, with the solenoid valves SV3 and SV4 closed, the solenoid valve SV2 is opened to supply the water supply nozzle 44 of the sub water supply pipe P2.
When water is supplied into the polishing material chamber 4, the shutter 53 rises as soon as the water level in the polishing material chamber 4 rises, and immediately the lower communication port 4
Although 2 is closed, the water level in the polishing material chamber 4 further rises, and the cleaning water and the polishing material W flow into the cleaning tank 2 through the upper communication port 41. Then, the water level in the cleaning tank 2 rises and the predetermined high water level L
When it reaches 1, the electromagnetic valve SV2 is closed to stop the water supply, and at the same time, the motor 6 is operated to rotate the stirring blades 8 and
A swirling water flow is generated inside, and the tableware is washed for a predetermined time by the water flow and the abrasive W. After that, the motor 6 is stopped and the electromagnetic valves SV3 and SV4 of the drainage pipes P3 and P4 are opened to drain the water. At this time, the polishing material W is the bottom of the cleaning tank 2,
It remains on the strainer 14 at the bottom.
【0027】続いて、主排水管P3の電磁弁SV3のみ
を閉じ、副排水管P4の電磁弁SV4は開けた状態で電
磁弁SV1を開いて主排水管P1より洗浄槽2内に給水
し、該洗浄槽2内の水位が所定の低水位L2に達した
後、攪拌翼8を回転して洗浄槽2内に渦巻水流を発生す
れば、研磨材Wは該研磨材に作用する浮力と遠心力とに
より下側連通口42よりオーバーフローする水と共に研
磨材室4内に流入し研磨材かご46内に回収される。こ
の際、研磨材Wは、上記水流により洗浄される。この
後、副排水管P2の電磁弁SV2を閉じれば、研磨材室
4内の水位上昇と共にシャッター53が上昇して下側連
通口42が閉じ、研磨材Wの洗浄槽2内への流出を阻止
した状態で、洗浄槽2の水位が所定の高水位L1に達す
れば攪拌翼8を回転し、オーバーフロー部30よりオー
バーフローさせながら所定時間すすぎを行なう。この
後、モータ6を停止し、各排水管P3,P4の電磁弁S
V3,SV4を開いて排水すれば、洗浄行程は終了す
る。Subsequently, only the solenoid valve SV3 of the main drain pipe P3 is closed, the solenoid valve SV4 of the sub drain pipe P4 is opened, and the solenoid valve SV1 is opened to supply water into the cleaning tank 2 from the main drain pipe P1. After the water level in the cleaning tank 2 reaches a predetermined low water level L2, if the stirring blade 8 is rotated to generate a swirling water flow in the cleaning tank 2, the abrasive W will have centrifugal force and centrifugal force acting on the abrasive. Along with the water overflowing from the lower communication port 42 due to the force, it flows into the abrasive chamber 4 and is collected in the abrasive basket 46. At this time, the abrasive W is washed with the water stream. After that, if the electromagnetic valve SV2 of the sub drain pipe P2 is closed, the shutter 53 rises as the water level in the polishing material chamber 4 rises, the lower communication port 42 closes, and the polishing material W flows out into the cleaning tank 2. When the water level in the cleaning tank 2 reaches a predetermined high water level L1 in the blocked state, the stirring blade 8 is rotated, and rinsing is performed for a predetermined time while overflowing from the overflow section 30. After this, the motor 6 is stopped and the solenoid valves S of the drain pipes P3 and P4 are
If V3 and SV4 are opened and drained, the cleaning process is completed.
【0028】上記洗浄行程において、研磨材Wは予洗い
時には、研磨材室4の研磨材かご46内にあって、該予
洗い行程で残飯等食器に付着した固形物を除去した後に
洗浄行程で洗浄槽2内に流入されるので、上記固形物が
研磨材Wに混入することは無い。また、研磨材Wは、該
研磨材Wによる洗浄を終了し、研磨材かご46内に回収
された後、下側連通口42よりオーバーフローしてくる
水により洗浄されるので、繰返して使用する場合におい
ても常に清潔に保たれている。また、繰返し使用した
後、研磨材Wが劣化した場合には、蓋63を開いて研磨
材室4内より研磨材Wを研磨材かご46ごと取り出して
新しい研磨材Wと交換する。In the above cleaning process, the abrasive W is in the abrasive basket 46 of the abrasive chamber 4 during the pre-cleaning process, and after the solid substances such as leftover foods and the like adhering to the dishes are removed in the pre-cleaning process. Since the solid matter does not flow into the cleaning tank 2, the solid matter is not mixed with the abrasive material W. When the abrasive material W is washed by the abrasive material W, is collected in the abrasive material basket 46, and is washed with water overflowing from the lower communication port 42, the abrasive material W is repeatedly used. It is always kept clean even in. If the abrasive W deteriorates after repeated use, the lid 63 is opened, and the abrasive W is taken out of the abrasive chamber 4 together with the abrasive basket 46 and replaced with a new abrasive W.
【0029】尚、上記実施例においては、シャッター5
3がフロートとして構成され研磨材室4内の水位に応じ
て昇降し、開閉する場合について述べたが、シャッター
とフロートとを別体とし、その間にリンク機構等を介在
させてフロートの動きとシャッターの動きが機械的に連
動するようにしても良い。また、シャッターにソレノイ
ド等の動力源を別途設けて、同様のタイミングで開閉す
るようにしても良い。また、食器洗浄装置1にセットす
る以前に粗大な残飯等が除かれていれば予洗い行程を省
略しても構わないことは勿論である。In the above embodiment, the shutter 5
Although 3 is configured as a float and moves up and down according to the water level in the polishing material chamber 4 to open and close, the shutter and the float are separate bodies, and a link mechanism or the like is interposed between them to move the float and the shutter. The movement of may be mechanically linked. Further, a power source such as a solenoid may be separately provided in the shutter, and the shutter may be opened and closed at the same timing. Further, it goes without saying that the pre-washing step may be omitted if coarse leftover food etc. has been removed before the dish washer 1 is set.
【0030】[0030]
【発明の効果】本発明食器洗浄装置は、上述の通り、渦
巻水流発生手段、及び、食器の支持手段を備えた洗浄槽
と、該洗浄槽に上下2箇所の連通口で連通する研磨材室
とを備え、上記洗浄槽には主給水管及び主排水管を、上
記研磨材室には副給水管及び、副排水管を夫々配管し、
上記研磨材室内には研磨材かごを挿脱可能に設けるとと
もに、下側連通口には、該下側連通口を開閉するシャッ
ターを設けたので、洗浄行程に従って研磨材を洗浄槽よ
り研磨材室内に分離回収することにより、残飯等の固形
物の研磨材への混入、及び、洗浄終了時における食器へ
の研磨材への付着を防止でき、且つ、一回の洗浄毎に研
磨材自体も洗浄され、洗浄効果を向上可能であると共
に、劣化した研磨材は研磨材室内より研磨材かごごと抜
き出して、新しい研磨材と容易に交換することができ
る。As described above, the dishwashing apparatus of the present invention has a washing tank equipped with a swirling water flow generating means and a tableware supporting means, and an abrasive chamber which communicates with the washing tank at two upper and lower communication ports. And a main water supply pipe and a main drain pipe in the cleaning tank, and a sub water supply pipe and a sub drain pipe in the abrasive chamber, respectively,
An abrasive basket is provided in the abrasive chamber so that it can be inserted and removed, and a shutter for opening and closing the lower communication port is provided at the lower communication port. Separation and recovery of solid foods such as leftover food can be prevented from adhering to the polishing material at the end of cleaning, and the polishing material itself can also be cleaned after each cleaning. As a result, the cleaning effect can be improved, and the deteriorated abrasive material can be easily removed from the abrasive material chamber together with the abrasive material basket and replaced with a new abrasive material.
【0031】また、上記シャッターが、研磨材室内に昇
降自在に支持されているフロートと一体であるか若しく
は連動し、該フロートに作用する浮力により、上記研磨
材室内の水位に応じて開閉するものであるので、シャッ
ターの開閉に特別な動力源を用いることなく、適正なタ
イミングを得ることができ、装置の構造の簡素化、及
び、エネルギーの節減に寄与することができる。Further, the shutter is integral with or interlocked with a float that is supported in the abrasive chamber so as to be able to move up and down, and opens and closes according to the water level in the abrasive chamber by the buoyancy acting on the float. Therefore, proper timing can be obtained without using a special power source for opening and closing the shutter, which can contribute to simplification of the structure of the device and energy saving.
【図1】本発明実施例の食器洗浄装置を示す要部側断面
図である。FIG. 1 is a side sectional view of an essential part showing a dishwasher according to an embodiment of the present invention.
【図2】本発明実施例の食器洗浄装置を示す要部平面図
である。FIG. 2 is a plan view of the essential parts showing the dishwasher of the embodiment of the present invention.
【図3】研磨材かご及びシャッターを示す斜視図であ
る。FIG. 3 is a perspective view showing an abrasive basket and a shutter.
【図4】研磨材室を示す平断面図である。FIG. 4 is a plan sectional view showing an abrasive chamber.
【図5】かご形ケースを示す斜視図である。FIG. 5 is a perspective view showing a cage case.
【図6】本発明実施例の食器洗浄器における洗浄過程を
示すタイミングチャートである。FIG. 6 is a timing chart showing a cleaning process in the dishwasher of the embodiment of the present invention.
1 食器洗浄装置 2 洗浄槽 4 研磨材室 6 モータ 8 攪拌翼 13 排水口 14 ストレーナ 17 かご形ケース 30 オーバーフロー部 31 給水部 41 上側連通口 42 下側連通口 44 給水ノズル 45 排水口 46 研磨材かご 53 シャッター 54 ガイドフレーム 55 ガイドレール部材 62 リブ P1 主給水管 P2 副給水管 P3 主排水管 P4 副排水管 SV1,SV2,SV3,SV4 電磁弁 W 研磨材 L1 高水位 L2 低水位 1 Dishwasher 2 Cleaning Tank 4 Abrasive Room 6 Motor 8 Stirring Blade 13 Drain Port 14 Strainer 17 Basket Case 30 Overflow Part 31 Water Supply Section 41 Upper Communication Port 42 Lower Communication Port 44 Water Supply Nozzle 45 Drain Port 46 Abrasive Basket 53 Shutter 54 Guide frame 55 Guide rail member 62 Rib P1 Main water supply pipe P2 Sub water supply pipe P3 Main drain pipe P4 Sub drain pipe SV1, SV2, SV3, SV4 Solenoid valve W Abrasive material L1 High water level L2 Low water level
Claims (2)
段を備えた洗浄槽と、該洗浄槽に上下2箇所の連通口で
連通する研磨材室とを備え、上記洗浄槽には主給水管及
び主排水管を、上記研磨材室には副給水管及び、副排水
管を夫々配管し、上記研磨材室内には研磨材かごを挿脱
可能に設けるとともに、下側連通口には、該下側連通口
を開閉するシャッターを設けたことを特徴とする食器洗
浄装置。1. A washing tank provided with a swirling water flow generating means and a tableware supporting means, and an abrasive chamber which communicates with the washing tank at two upper and lower communicating ports, and the washing tank is provided with a main water supply. The pipe and the main drain pipe, the auxiliary water supply pipe and the auxiliary drain pipe in the abrasive material chamber, respectively, the abrasive material basket is provided in the abrasive material chamber in a removable manner, the lower communication port, A dishwasher comprising a shutter for opening and closing the lower communication port.
在に支持されているフロートと一体であるか若しくは連
動し、該フロートに作用する浮力により、上記研磨材室
内の水位に応じて開閉するものである請求項1記載の食
器洗浄装置。2. The shutter, which is integral with or interlocked with a float that is vertically movable in the abrasive chamber, and opens and closes according to the water level in the abrasive chamber by buoyancy acting on the float. The dishwashing apparatus according to claim 1, wherein
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7004394A JP2573552B2 (en) | 1994-03-14 | 1994-03-14 | Dishwashing equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7004394A JP2573552B2 (en) | 1994-03-14 | 1994-03-14 | Dishwashing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07250798A true JPH07250798A (en) | 1995-10-03 |
JP2573552B2 JP2573552B2 (en) | 1997-01-22 |
Family
ID=13420164
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7004394A Expired - Lifetime JP2573552B2 (en) | 1994-03-14 | 1994-03-14 | Dishwashing equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2573552B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104905747A (en) * | 2015-06-30 | 2015-09-16 | 彭竞原 | Dish-washing method, dish-washing device and dish washer |
CN108903869A (en) * | 2015-07-09 | 2018-11-30 | 宁波中物东方光电技术有限公司 | Water tank type dish-washing machine |
US10172508B2 (en) | 2012-05-30 | 2019-01-08 | Arcelik Anonim Sirketi | Dishwasher comprising a detergent dispenser |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101980667B1 (en) * | 2017-12-27 | 2019-05-22 | 유영환 | Washer for roaster |
-
1994
- 1994-03-14 JP JP7004394A patent/JP2573552B2/en not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10172508B2 (en) | 2012-05-30 | 2019-01-08 | Arcelik Anonim Sirketi | Dishwasher comprising a detergent dispenser |
CN104905747A (en) * | 2015-06-30 | 2015-09-16 | 彭竞原 | Dish-washing method, dish-washing device and dish washer |
CN108903869A (en) * | 2015-07-09 | 2018-11-30 | 宁波中物东方光电技术有限公司 | Water tank type dish-washing machine |
CN108903869B (en) * | 2015-07-09 | 2019-12-20 | 宁波中物东方光电技术有限公司 | Water tank type dish washing machine |
Also Published As
Publication number | Publication date |
---|---|
JP2573552B2 (en) | 1997-01-22 |
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