JPH07249445A - Tin or tin alloy plating material for terminal connector of electronic device, electric parts, etc., with superior surface contact resistance characteristics and manufacture thereof - Google Patents

Tin or tin alloy plating material for terminal connector of electronic device, electric parts, etc., with superior surface contact resistance characteristics and manufacture thereof

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Publication number
JPH07249445A
JPH07249445A JP3996794A JP3996794A JPH07249445A JP H07249445 A JPH07249445 A JP H07249445A JP 3996794 A JP3996794 A JP 3996794A JP 3996794 A JP3996794 A JP 3996794A JP H07249445 A JPH07249445 A JP H07249445A
Authority
JP
Japan
Prior art keywords
tin
contact resistance
tin alloy
copper
acid ester
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3996794A
Other languages
Japanese (ja)
Other versions
JP3263229B2 (en
Inventor
Satoshi Maruo
聡 丸尾
Masaaki Isono
誠昭 磯野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP03996794A priority Critical patent/JP3263229B2/en
Publication of JPH07249445A publication Critical patent/JPH07249445A/en
Application granted granted Critical
Publication of JP3263229B2 publication Critical patent/JP3263229B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To obtain superior surface contact resistance characteristics by setting a specific value for the peak area ratio of PC (2p)/Sn (3d) of a plating surface obtained by X-ray photoelectric spectroscopy in a plating surface formed by applying tin or tin alloy plating on a copper or copper alloy. CONSTITUTION:Tin or tin alloy plating is applied on copper or copper alloy. The plating surface of the tin or tin alloy plating material is formed so that the peak area ratio of P (2p)/Sn (3d) on the tin or tin alloy plating surface obtained by X-ray photoelectric spectroscopy may be 0.03 to 0.05. If the peak area ratio is less than 0.003, the film is incomplete and oxydation of Sn may probably advance. On the other hand, if it exceeds 0.05, the film becomes thicker, and the contact resistance value on the plated surface may probably increase. The peak area of P (2p)/Sn (3d) can be controlled according to a electrolyzing time. When the electrolyzing time is longer or shorter, the peak area ratio of P (2p)/Sn (3d) is increased or decreased, respectively.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電子機器、電気部品等
の端子・コネクター用錫または錫合金めっき材とその製
造方法に関し、特に表面接触抵抗特性に優れた端子・コ
ネクター用錫または錫合金めっき材とその製造方法に関
する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a tin or tin alloy plating material for terminals and connectors of electronic devices, electric parts and the like and a method for producing the same, and in particular tin or tin alloy for terminals and connectors having excellent surface contact resistance characteristics. The present invention relates to a plated material and its manufacturing method.

【0002】[0002]

【従来の技術】一般に、銅または銅合金に錫または錫合
金めっきを施した、錫または錫合金めっき銅材または銅
合金材は、電子機器、電気部品等の端子およびコネクタ
ーの材料として広く利用されている。近年、電子部品の
はんだ付け方式は、従来の装入実装タイプから自動化が
容易で生産性が高い表面実装タイプ(SMT;Surface
Mount Technology)へと変化している。
2. Description of the Related Art Generally, tin or a tin alloy-plated copper material or copper alloy material obtained by plating copper or a copper alloy with tin or a tin alloy is widely used as a material for terminals and connectors of electronic devices, electric parts and the like. ing. In recent years, the soldering method for electronic parts is a surface mount type (SMT;
Mount Technology).

【0003】装入実装タイプとは、電子部品のリード線
をプリント基板の穴に挿入してからはんだ付けする方式
である。これに対し、表面実装タイプとは、電子部品を
プリント基板表面にはんだ付けする方式である。表面実
装タイプのはんだ付けは、部品と基板の接合部にあらか
じめ適量のはんだを供給しておき、部品を載せた後はん
だを溶融させ、はんだ付けを行なうリフロー方式であ
る。リフローはんだ付けに用いられる加熱方法には、赤
外線、気化潜熱、熱風循環方式、ホットプレート等の全
体加熱方式と、加熱ツール、光ビーム、レーザ、エアヒ
ータ等の局部加熱方式がある。
The loading mounting type is a method in which lead wires of an electronic component are inserted into holes of a printed board and then soldered. On the other hand, the surface mount type is a method of soldering an electronic component to the surface of a printed circuit board. The surface mounting type soldering is a reflow method in which an appropriate amount of solder is supplied in advance to a joint between a component and a substrate, the component is placed and then the solder is melted, and soldering is performed. As a heating method used for reflow soldering, there are an infrared ray, latent heat of vaporization, a hot air circulation method, an overall heating method such as a hot plate, and a local heating method such as a heating tool, a light beam, a laser, and an air heater.

【0004】[0004]

【発明が解決しようとする課題】全体加熱方式は、基板
上に搭載されている電子部品を一括してはんだ付け出来
るため生産性に優れるが、不要な部分までも熱影響を受
けることになる。このため、端子・コネクタ等の接触子
部分の錫または錫合金めっき表面が酸化されて接触抵抗
値が高くなることがある。対策として、加熱炉内の雰囲
気をN2 雰囲気やH2 ,CO等の還元雰囲気とすること
が考えられるが、コストアップにつながる。
The total heating method is excellent in productivity because the electronic components mounted on the substrate can be soldered together, but the unnecessary portions are also affected by heat. As a result, the tin or tin alloy plating surface of the contactor portion of the terminal / connector may be oxidized to increase the contact resistance value. As a countermeasure, the atmosphere in the heating furnace may be an N 2 atmosphere or a reducing atmosphere such as H 2 or CO, but this leads to an increase in cost.

【0005】これに対し、局部加熱方式は必要な部分の
みを選択的に加熱することが出来るという利点がある反
面、生産性が低いという問題点がある。今後、生産性の
高い全体加熱方式が増加すると考えられるが、従来の錫
めっき材では表面酸化の問題を抱えている。
On the other hand, the local heating method has an advantage of being able to selectively heat only a necessary portion, but has a problem of low productivity. It is considered that the total heating method with high productivity will increase in the future, but the conventional tin-plated material has a problem of surface oxidation.

【0006】錫めっき表面の酸化を防止する技術とし
て、鋼に錫をめっきするブリキでは、めっき後に重クロ
ム酸ソーダ溶液中で電解処理する方法が広く用いられて
いる。この処理を行なうと、錫めっき表面にCr3+の水
和酸化物が形成され、錫の酸化が抑制される。しかし、
錫めっき上のCr3+の水和酸化物が接触抵抗に悪影響を
及ぼすため、この技術を電子部品用の錫めっき材に適用
できない。また、この時に発生する有害な6価のクロム
を含んだ排水処理の問題がある。以上のように電子部品
のSMT化が進むにつれて、錫や錫合金めっき表面の酸
化による接触抵抗の劣化の少ない、錫または錫合金めっ
き材の開発が望まれていた。本発明は、前記従来技術の
問題点を解消し、特に表面接触抵抗特性に優れた電子機
器、電気部品等の端子・コネクター用錫または錫合金め
っき材とその製造方法を提供することを目的としてい
る。
[0006] As a technique for preventing the oxidation of the tin-plated surface, a method of electrolytically treating a tin-plated steel in a sodium dichromate solution after plating is widely used. When this treatment is performed, a hydrated oxide of Cr 3+ is formed on the tin-plated surface, and the oxidation of tin is suppressed. But,
This technique cannot be applied to tin-plated products for electronic parts because the hydrated oxide of Cr 3+ on tin-plating has a bad influence on the contact resistance. In addition, there is a problem of wastewater treatment containing harmful hexavalent chromium generated at this time. As described above, with the progress of SMT in electronic components, there has been a demand for the development of a tin or tin alloy plated material with less deterioration in contact resistance due to the oxidation of the tin or tin alloy plated surface. An object of the present invention is to solve the above-mentioned problems of the prior art and to provide a tin or tin alloy plated material for terminals and connectors of electronic devices, electric parts, etc., which are excellent in surface contact resistance characteristics, and a method for producing the same. There is.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するた
め、本発明者等は、鋭意研究を重ねた結果、X線光電子
分光法により得られた錫または錫合金めっき材表面にお
けるP(2p)/Sn(3d)のピーク面積比と密接な
関連のあることを知見し、本発明を完成するに至った。
すなわち、上記知見に基づいた本発明は、銅または銅合
金上に錫または錫合金めっきを施した錫または錫合金め
っき材のめっき表面において、X線光電子分光法により
得られた錫または錫合金めっき表面のP(2p)/Sn
(3d)のピーク面積比が0.003〜0.05である
ことを特徴とする表面接触抵抗特性に優れた電子機器、
電気部品等の端子・コネクター用錫または錫合金めっき
材を要旨としている。また、本発明は銅または銅合金に
錫または錫合金めっきを施した後、芳香族置換基を有す
るリン酸エステルまたは芳香族置換基を有する亜リン酸
エステルを少なくとも1種以上と、水溶性有機溶媒を含
む処理液に浸漬し、陽極電解することを特徴とする表面
接触抵抗特性に優れた電子機器、電気部品等の端子・コ
ネクター用錫または錫合金めっき材の製造方法を要旨と
している。
In order to achieve the above object, the inventors of the present invention have conducted extensive research and as a result, as a result, P (2p) on the surface of a tin or tin alloy plated material obtained by X-ray photoelectron spectroscopy The inventors have found that the peak area ratio of / Sn (3d) is closely related, and completed the present invention.
That is, the present invention based on the above findings is based on the fact that the tin or tin alloy plating obtained by X-ray photoelectron spectroscopy is applied on the plating surface of a tin or tin alloy plating material obtained by plating tin or tin alloy on copper or copper alloy. Surface P (2p) / Sn
An electronic device having excellent surface contact resistance characteristics, wherein the peak area ratio of (3d) is 0.003 to 0.05,
The main point is tin or tin alloy plated materials for terminals and connectors of electric parts. Further, the present invention provides that after copper or a copper alloy is plated with tin or a tin alloy, at least one phosphoric acid ester having an aromatic substituent or phosphorous acid ester having an aromatic substituent is used, and a water-soluble organic compound. The gist is a method for producing a tin or tin alloy plated material for terminals and connectors of electronic devices, electric parts and the like, which is characterized by immersing in a treatment liquid containing a solvent and subjecting it to anodic electrolysis.

【0008】本発明はまた、処理液が、芳香族置換基を
有するリン酸エステルを0.1〜10wt%または芳香
族置換基を有する亜リン酸エステルを0.1〜10wt
%と水溶性有機溶媒を5〜50wt%を含む水溶液であ
ることが望ましく、さらに、陽極電解が、電圧2〜20
V、電解時間1〜60秒で行われることが望ましい。
According to the present invention, the treatment liquid further comprises 0.1 to 10 wt% of phosphoric acid ester having an aromatic substituent or 0.1 to 10 wt% of phosphorous acid ester having an aromatic substituent.
%, And an aqueous solution containing 5 to 50 wt% of a water-soluble organic solvent is preferable, and the anodic electrolysis is performed at a voltage of 2 to 20.
V, electrolysis time is preferably 1 to 60 seconds.

【0009】[0009]

【作用】本発明の構成と作用を説明する。本発明におい
ては、錫または錫合金めっき材を芳香族置換基を有する
リン酸エステルまたは芳香族置換基を有する亜リン酸エ
ステルを少なくとも1種以上と、水溶性有機溶媒を含む
処理液に浸漬し、陽極電解することにより、錫または錫
合金めっき表面に錫と前記リン酸エステルまたは亜リン
酸エステルあるいはこの混合物からなる有機物との化合
物被膜が形成される。この処理を施した錫または錫合金
めっき材は、めっき表面が空気中のO2 やH2 Oから遮
断されるため酸化されにくく、接触抵抗が劣化しない。
前記リン酸エステルまたは亜リン酸エステルあるいはこ
の混合物と錫との化合物からなる被膜は薄いため、接触
抵抗に悪影響を及ぼさない。
The structure and operation of the present invention will be described. In the present invention, a tin or tin alloy plated material is immersed in a treatment liquid containing at least one kind of phosphoric acid ester having an aromatic substituent or phosphorous acid ester having an aromatic substituent and a water-soluble organic solvent. By anodic electrolysis, a compound film of tin and an organic substance composed of the phosphoric acid ester or phosphorous acid ester or a mixture thereof is formed on the surface of the tin or tin alloy plating. The tin or tin alloy plated material that has been subjected to this treatment has its plated surface shielded from O 2 and H 2 O in the air, so that it is difficult to oxidize and the contact resistance does not deteriorate.
Since the coating film made of the phosphoric acid ester or phosphorous acid ester or the compound of tin and tin is thin, it does not adversely affect the contact resistance.

【0010】酸化防止処理液の成分は、芳香族置換基を
有するリン酸エステルまたは芳香族置換基を有する亜リ
ン酸エステルを少なくとも1種以上と、水溶性有機溶媒
を含まなければならない。またこの酸化防止処理液に含
まれる前記リン酸エステルまたは亜リン酸エステルの濃
度は0.1〜10wt%が望ましい。0.1wt%未満
では酸化防止効果が少なく、10wt%を超えても酸化
防止効果の向上はなく経済的に無駄である。
The components of the antioxidant treatment liquid must contain at least one kind of phosphoric acid ester having an aromatic substituent or phosphorous acid ester having an aromatic substituent and a water-soluble organic solvent. The concentration of the phosphoric acid ester or phosphorous acid ester contained in the antioxidant treatment liquid is preferably 0.1 to 10 wt%. If it is less than 0.1 wt%, the antioxidant effect is small, and if it exceeds 10 wt%, the antioxidant effect is not improved and it is economically wasteful.

【0011】水溶性の有機溶媒は、水に溶けにくい前記
リン酸エステルまたは亜リン酸エステルを、容易に水に
溶かす効果と、酸化防止処理液と錫または錫合金めっき
表面との濡れ性向上の効果がある。水溶性有機溶媒の濃
度は5〜50wt%が望ましい。5wt%未満では上記
の効果が小さく、50wt%を超えても濃度増加による
効果の向上はなく、経済的に無駄である。水溶性有機溶
媒としてはエタノールやプロパノール等が良い。
The water-soluble organic solvent has an effect of easily dissolving the phosphoric acid ester or phosphite ester, which is hardly soluble in water, in water, and improves wettability between the antioxidant treatment liquid and the tin or tin alloy plating surface. effective. The concentration of the water-soluble organic solvent is preferably 5 to 50 wt%. If it is less than 5 wt%, the above effect is small, and if it exceeds 50 wt%, the effect is not improved due to the increase in concentration, which is economically wasteful. As the water-soluble organic solvent, ethanol, propanol or the like is preferable.

【0012】本発明の錫または錫合金めっき表面は、X
線光電子分光法により得られためっき材表面におけるP
(2p)/Sn(3d)のピーク面積比は0.003〜
0.05でなければならない。X線光電子分光法とは、
固体表面にX線を照射して、光電効果により放出された
光電子の運動エネルギーを測定することによって、元素
分析を行なう方法である。得られたピーク面積比より、
PとSnの組成比を求めることが出来る。
The tin or tin alloy plated surface of the present invention is X
P on the surface of plated material obtained by line photoelectron spectroscopy
The peak area ratio of (2p) / Sn (3d) is 0.003 to
Must be 0.05. What is X-ray photoelectron spectroscopy?
This is a method for elemental analysis by irradiating a solid surface with X-rays and measuring the kinetic energy of photoelectrons emitted by the photoelectric effect. From the obtained peak area ratio,
The composition ratio of P and Sn can be obtained.

【0013】Pの2p電子によるピーク面積と、Snの
3d電子によるピーク面積比は0.003〜0.05に
しなければならない。ピーク面積比が0.003未満で
は皮膜が不完全でSnの酸化が進行する恐れがある。一
方0.05を超えると皮膜が厚くなり、めっき表面の接
触抵抗値が増加する恐れがある。前記のP(2p)/S
n(3d)のピーク面積比のコントロールは電解時間に
よって行なうことが出来る。電解時間が長いとP(2
p)/Sn(3d)のピーク面積比は大きくなり、電解
時間が短くなると前記面積比は小さくなる。
The peak area ratio due to the 2p electron of P and the peak area due to the 3d electron of Sn must be 0.003 to 0.05. If the peak area ratio is less than 0.003, the film is incomplete and Sn oxidation may proceed. On the other hand, if it exceeds 0.05, the coating becomes thick and the contact resistance value of the plating surface may increase. The above P (2p) / S
The peak area ratio of n (3d) can be controlled by the electrolysis time. If the electrolysis time is long, P (2
The peak area ratio of p) / Sn (3d) increases and the area ratio decreases as the electrolysis time decreases.

【0014】陽極電解の条件は、電圧2〜10V、電解
時間1〜60秒が望ましい。電圧2V未満、電解時間1
秒未満では、錫とリン酸エステルまたは亜リン酸エステ
ルの化合物が均一な皮膜を形成せず、酸化防止効果が小
さい。一方、電圧が10Vを超え、電解時間が60秒を
超えると皮膜が厚くなりすぎ、接触抵抗等に悪影響を及
ぼす恐れがある。また、陽極電解をせず、単に酸化防止
処理液に浸漬したのみでは、錫とリン酸エステルまたは
亜リン酸エステルの反応が遅く、酸化防止に十分な皮膜
を形成するのに長時間を必要とする。
The conditions for anodic electrolysis are preferably a voltage of 2 to 10 V and an electrolysis time of 1 to 60 seconds. Voltage less than 2V, electrolysis time 1
If it is less than a second, tin and the compound of phosphoric acid ester or phosphorous acid ester do not form a uniform film, and the antioxidant effect is small. On the other hand, when the voltage exceeds 10 V and the electrolysis time exceeds 60 seconds, the coating becomes too thick, which may adversely affect the contact resistance and the like. In addition, the reaction of tin with phosphoric acid ester or phosphorous acid ester is slow, and it takes a long time to form a film sufficient for antioxidation, by simply immersing in an antioxidation treatment liquid without performing anodic electrolysis. To do.

【0015】芳香族置換基を有するリン酸エステルとし
ては、一般式PO(OR)2 OH、PO(OR)(O
H)2 、PO(OR)3 (ただし、Rのうち1つ以上は
芳香族置換基である)で示されるリン酸ジフェニル等が
用いられる。芳香族置換基を有する亜リン酸エステルと
しては、一般式PO(OR)2 H、P(OH)(OR)
2 、PO(OR)(OH)H(ただし、Rのうち1つ以
上は芳香族置換基である)で示される亜リン酸ジフェニ
ル等が用いられる。疎水基としてフェニル基を有してい
ないと酸化防止効果が得られない。このため、疎水基と
して1つ以上芳香族置換基を有していなければならな
い。
Examples of the phosphoric acid ester having an aromatic substituent include PO (OR) 2 OH, PO (OR) (O
H) 2 , PO (OR) 3 (provided that at least one of R is an aromatic substituent) and diphenyl phosphate and the like are used. Examples of the phosphite having an aromatic substituent include the general formulas PO (OR) 2 H, P (OH) (OR)
2 , diphenyl phosphite represented by PO (OR) (OH) H (provided that at least one of R is an aromatic substituent) is used. If it does not have a phenyl group as a hydrophobic group, the antioxidant effect cannot be obtained. Therefore, it must have at least one aromatic substituent as a hydrophobic group.

【0016】本発明の酸化防止技術は、光沢剤を使用し
た電気光沢錫または錫合金めっき材、錫または錫合金め
っき後、溶融処理をするリフロー錫または錫合金めっき
材、溶融した錫または錫合金の中に素材を通板してめっ
きする、溶融錫または錫合金めっき材、乾式めっき法の
蒸着めっきでめっきした、蒸着錫または錫合金めっき材
のうち、いずれのめっき材にも有効である。錫合金めっ
き材とは、Pb、In、Zn、Sb、Cd、Ag等を少
なくとも1種以上含む錫の合金めっきを施した銅合金材
である。叙上のようにして本発明により、錫または錫合
金めっき表面が表面が酸化され難く、接触抵抗の経時劣
化が少ない電子機器、電気部品等の端子・コネクター用
錫または錫合金めっき材とその製造方法が確立された。
The antioxidation technology of the present invention is an electro-bright tin or tin alloy plating material using a brightening agent, reflow tin or tin alloy plating material which is subjected to melting treatment after tin or tin alloy plating, and molten tin or tin alloy. The present invention is effective for any plated material, such as a molten tin or tin alloy plated material in which a material is passed through and plated, and an evaporated tin or tin alloy plated material plated by vapor deposition plating of a dry plating method. The tin alloy plated material is a copper alloy material plated with tin alloy containing at least one of Pb, In, Zn, Sb, Cd and Ag. As described above, according to the present invention, the tin or tin alloy plated surface is less likely to be oxidized, and the contact resistance is less likely to deteriorate with time, and the tin or tin alloy plated material for terminals and connectors of electronic devices, electric parts, etc. and its production. The method was established.

【0017】[0017]

【実施例】本発明の実施例を説明するが、これによって
本発明は何ら限定されるものではない。 実施例に用い
たサンプルを〔表1〕に示す。
EXAMPLES Examples of the present invention will be described, but the present invention is not limited thereto. The samples used in the examples are shown in [Table 1].

【0018】[0018]

【表1】 [Table 1]

【0019】〔表1〕に示す錫めっき材を各条件で酸化
防止処理した後、〔表2〕に示す条件で熱経時を与え、
〔表3〕に示す条件で、接触抵抗値の経時変化を測定し
た。
After the tin-plated material shown in [Table 1] was subjected to an antioxidant treatment under each condition, it was subjected to thermal aging under the conditions shown in [Table 2],
The change with time of the contact resistance value was measured under the conditions shown in [Table 3].

【0020】[0020]

【表2】 [Table 2]

【0021】[0021]

【表3】 [Table 3]

【0022】P(2p)/Sn(3d)のピーク面積比
が0.001〜0.065までの錫めっき材を作成し、
熱経時前後の接触抵抗値を測定した。〔表4〕にP(2
p)/Sn(3d)のピーク面積比と接触抵抗値の経時
変化の関係を示す。接触抵抗値の評価は10mΩ以下を
OK、それ以上をNGとした(酸化劣化を受けていない
錫めっき材の接触抵抗値は5〜10mΩである)。
A tin-plated material having a P (2p) / Sn (3d) peak area ratio of 0.001 to 0.065 was prepared.
The contact resistance value before and after thermal aging was measured. In Table 4, P (2
The relationship between the peak area ratio of p) / Sn (3d) and the change over time in the contact resistance value is shown. Evaluation of the contact resistance value was set to 10 mΩ or less as OK and NG or higher as NG (the contact resistance value of the tin-plated material not subjected to oxidative deterioration is 5 to 10 mΩ).

【0023】[0023]

【表4】 [Table 4]

【0024】実施例1〜3は熱経時による接触抵抗値の
増加もなく、優れた接触抵抗特性を示した。比較例1、
従来例1は熱経時により接触抵抗値が増加した。また、
比較例2は、熱経時を受ける前から高い接触抵抗値を示
した。各種酸化防止処理条件で酸化防止処理を行なった
錫めっき材の熱処理前後の接触抵抗の評価を表5に示
す。接触抵抗値の評価は10mΩ以下をOK、それ以上
をNGとした。
Examples 1 to 3 showed excellent contact resistance characteristics without an increase in contact resistance value due to heat aging. Comparative Example 1,
In Conventional Example 1, the contact resistance value increased due to heat aging. Also,
Comparative Example 2 showed a high contact resistance value before being subjected to heat aging. Table 5 shows the evaluation of the contact resistance before and after the heat treatment of the tin-plated material which was subjected to the antioxidant treatment under various antioxidant treatment conditions. The evaluation of the contact resistance value was set to 10 mΩ or less as OK, and more as NG.

【0025】[0025]

【表5】 [Table 5]

【0026】実施例3〜19、比較例4、6は熱処理に
よる接触抵抗値の増加もなく、優れた接触抵抗特性を示
した。しかし、比較例4や比較例6は亜リン酸ジフェニ
ル濃度の増加やプロパノール濃度の増加にともなう特性
のアップが無く、これ以上の濃度アップは経済的に無駄
である。比較例3、5、7〜9、従来例2は熱経時によ
り接触抵抗値が増加した。比較例10、11は熱経時を
受ける前から高い接触抵抗値を示した。
In Examples 3 to 19 and Comparative Examples 4 and 6, there was no increase in contact resistance value due to heat treatment, and excellent contact resistance characteristics were exhibited. However, in Comparative Example 4 and Comparative Example 6, there is no increase in the characteristics associated with an increase in the diphenyl phosphite concentration or the propanol concentration, and further increase in the concentration is economically useless. In Comparative Examples 3, 5, 7 to 9 and Conventional Example 2, the contact resistance value increased due to heat aging. Comparative Examples 10 and 11 showed high contact resistance values before being subjected to heat aging.

【0027】[0027]

【発明の効果】本発明は以上説明したように構成されて
いるから、めっき表面が酸化し難く、接触抵抗の経時劣
化が少ない電子機器、電気部品等の端子・コネクター用
錫または錫合金めっき材とその製造方法が得られ、産業
上極めて有用である。
EFFECTS OF THE INVENTION Since the present invention is constituted as described above, the tin or tin alloy plating material for terminals and connectors of electronic devices, electric parts, etc., in which the plating surface is difficult to oxidize and the contact resistance is less likely to deteriorate over time. And its manufacturing method are obtained, which is extremely useful in industry.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 銅または銅合金上に錫または錫合金め
っきを施した錫または錫合金めっき材のめっき表面にお
いて、X線光電子分光法により得られた錫または錫合金
めっき表面のP(2p)/Sn(3d)のピーク面積比
が0.003〜0.05であることを特徴とする表面接
触抵抗特性に優れた電子機器、電気部品等の端子・コネ
クター用錫または錫合金めっき材。
1. A P (2p) of a tin or tin alloy plated surface obtained by X-ray photoelectron spectroscopy on a plated surface of a tin or tin alloy plated material obtained by plating tin or a tin alloy on copper or a copper alloy. / Sn (3d) peak area ratio is 0.003 to 0.05, and tin or tin alloy plated material for terminals and connectors of electronic devices, electric parts and the like having excellent surface contact resistance characteristics.
【請求項2】 銅または銅合金に錫または錫合金めっ
きを施した後、芳香族置換基を有するリン酸エステルま
たは芳香族置換基を有する亜リン酸エステルを少なくと
も1種以上と、水溶性有機溶媒を含む処理液に浸漬し、
陽極電解することを特徴とする表面接触抵抗特性に優れ
た電子機器、電気部品等の端子・コネクター用錫または
錫合金めっき材の製造方法。
2. A water-soluble organic compound containing at least one phosphoric acid ester having an aromatic substituent or at least one phosphorous acid ester having an aromatic substituent after copper or a copper alloy is plated with tin or a tin alloy. Immerse in a treatment liquid containing a solvent,
A method for producing a tin or tin alloy plated material for terminals and connectors of electronic devices, electric parts and the like, which is characterized by performing anode electrolysis and has excellent surface contact resistance characteristics.
【請求項3】 処理液が、芳香族置換基を有するリン
酸エステルを0.1〜10wt%または芳香族置換基を
有する亜リン酸エステルを0.1〜10wt%と水溶性
有機溶媒を5〜50wt%を含む水溶液である請求項2
記載の表面接触抵抗特性に優れた電子機器、電気部品等
の端子・コネクター用錫または錫合金めっき材の製造方
法。
3. The treatment liquid comprises 0.1 to 10% by weight of a phosphoric acid ester having an aromatic substituent or 0.1 to 10% by weight of a phosphorous acid ester having an aromatic substituent and 5 parts by weight of a water-soluble organic solvent. An aqueous solution containing ˜50 wt%.
A method for producing a tin or tin alloy plated material for terminals and connectors of electronic devices, electric parts, etc., which has excellent surface contact resistance characteristics as described above.
【請求項4】 電圧2〜20V、電解時間1〜60秒
で陽極電解する請求項2または3記載の表面接触抵抗特
性に優れた電子機器、電気部品等の端子・コネクター用
錫または錫合金めっき材の製造方法。
4. A tin or tin alloy plating for terminals / connectors of electronic devices, electric parts and the like having excellent surface contact resistance characteristics according to claim 2 or 3, wherein anodic electrolysis is carried out at a voltage of 2 to 20 V and an electrolysis time of 1 to 60 seconds. Method of manufacturing wood.
JP03996794A 1994-03-10 1994-03-10 Tin or tin alloy plated material for terminals and connectors of electronic equipment and electrical components with excellent surface contact resistance characteristics Expired - Lifetime JP3263229B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03996794A JP3263229B2 (en) 1994-03-10 1994-03-10 Tin or tin alloy plated material for terminals and connectors of electronic equipment and electrical components with excellent surface contact resistance characteristics

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03996794A JP3263229B2 (en) 1994-03-10 1994-03-10 Tin or tin alloy plated material for terminals and connectors of electronic equipment and electrical components with excellent surface contact resistance characteristics

Publications (2)

Publication Number Publication Date
JPH07249445A true JPH07249445A (en) 1995-09-26
JP3263229B2 JP3263229B2 (en) 2002-03-04

Family

ID=12567732

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Country Status (1)

Country Link
JP (1) JP3263229B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6183885B1 (en) 1997-04-28 2001-02-06 Harness System Technologies Research, Ltd. Fitting-type connection terminal
JP2012201942A (en) * 2011-03-25 2012-10-22 Jx Nippon Mining & Metals Corp Sn OR Sn ALLOY PLATED MATERIAL AND METHOD FOR PRODUCING THE SAME
WO2015056554A1 (en) * 2013-10-17 2015-04-23 株式会社オートネットワーク技術研究所 Electrical connection structure

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6183885B1 (en) 1997-04-28 2001-02-06 Harness System Technologies Research, Ltd. Fitting-type connection terminal
JP2012201942A (en) * 2011-03-25 2012-10-22 Jx Nippon Mining & Metals Corp Sn OR Sn ALLOY PLATED MATERIAL AND METHOD FOR PRODUCING THE SAME
WO2015056554A1 (en) * 2013-10-17 2015-04-23 株式会社オートネットワーク技術研究所 Electrical connection structure
US9637461B2 (en) 2013-10-17 2017-05-02 Autonetworks Technologies, Ltd. Electrical connection structure

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