JPH07234315A - Optical multilayered film filter - Google Patents
Optical multilayered film filterInfo
- Publication number
- JPH07234315A JPH07234315A JP4791794A JP4791794A JPH07234315A JP H07234315 A JPH07234315 A JP H07234315A JP 4791794 A JP4791794 A JP 4791794A JP 4791794 A JP4791794 A JP 4791794A JP H07234315 A JPH07234315 A JP H07234315A
- Authority
- JP
- Japan
- Prior art keywords
- rays
- glass substrate
- optical
- transparent glass
- filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、光学多層膜フィルタに
関し、より具体的には、液晶プロジェクタやオーバーヘ
ッドプロジェクタのような投影形画像表示装置の光源か
ら放射される紫外線と赤外線の両方をほぼ遮蔽する能力
を有する光学多層膜フィルタに関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical multilayer film filter, and more specifically, it substantially blocks both ultraviolet rays and infrared rays emitted from a light source of a projection type image display device such as a liquid crystal projector or an overhead projector. The present invention relates to an optical multilayer filter having the capability of
【0002】[0002]
【従来の技術】一般に液晶プロジェクタやオーバーヘッ
ドプロジェクタのような投影形画像表示装置の光源とし
ては、メタルハライドランプ、キセノンランプ、ハロゲ
ンランプ等の発光管が使用される。2. Description of the Related Art Generally, an arc tube such as a metal halide lamp, a xenon lamp or a halogen lamp is used as a light source of a projection type image display device such as a liquid crystal projector or an overhead projector.
【0003】ところで、これらの発光管からは、可視光
以外にも、多量の紫外線や赤外線が放射され、これらの
放射線が、投影形画像表示装置のレンズや反射ミラーと
いった光学部品に照射されると、光学部品の劣化を招き
やすい。Incidentally, in addition to visible light, a large amount of ultraviolet rays and infrared rays are radiated from these arc tubes, and when these radiations are applied to optical parts such as lenses and reflection mirrors of the projection type image display device. , Easily deteriorate optical components.
【0004】従ってこの種の装置では、発光管から放射
された紫外線と赤外線が、光学部品に照射されるまでに
遮蔽することが要求され、そのため発光管と光学部品と
の間に紫外線遮蔽フィルタ(UVカットフィルタ)と赤
外線遮蔽フィルタ(コールドフィルタ)を設けたり、紫
外線と赤外線の両方を遮蔽する機能を有する誘電体多層
膜を透明ガラス基板上に形成した光学多層膜フィルタを
設けたりしている。Therefore, in this type of device, it is required that the ultraviolet rays and infrared rays emitted from the arc tube are shielded before the optical parts are irradiated. Therefore, the ultraviolet ray shielding filter ( For example, a UV cut filter) and an infrared shielding filter (cold filter) are provided, or an optical multilayer film filter in which a dielectric multilayer film having a function of blocking both ultraviolet rays and infrared rays is formed on a transparent glass substrate is provided.
【0005】[0005]
【発明が解決しようとする課題】しかしながら発光管と
光学部品との間にUVカットフィルタとコールドフィル
タを設ける場合は、部品点数が増えると共に、光学的な
調整をする必要が生じるため、コスト高となりやすい。However, when the UV cut filter and the cold filter are provided between the arc tube and the optical parts, the number of parts increases and it becomes necessary to perform optical adjustment, resulting in high cost. Cheap.
【0006】また紫外線と赤外線の両方を遮蔽するよう
な誘電体多層膜を透明ガラス基板上に形成した光学多層
膜フィルタは、膜層数が30層以上となるため、成膜コ
ストが高くなると共に、膜の応力が大きくなり、熱ショ
ック等による膜剥がれが生じたり、大気中の水分を吸収
して光学特性が大きく変化しやすくなる。An optical multilayer filter having a dielectric multilayer film for blocking both ultraviolet rays and infrared rays formed on a transparent glass substrate has 30 or more film layers, resulting in high film formation cost. As a result, the stress of the film becomes large, the film is peeled off due to heat shock or the like, and the moisture in the atmosphere is absorbed, so that the optical characteristics are likely to change greatly.
【0007】本発明は、上記事情に鑑みなされたもので
あり、紫外線と赤外線の遮蔽能力を有しながら、膜応力
が小さいため、耐熱性と耐湿性に優れ、しかも低コスト
で製造可能な光学多層膜フィルタを提供することを目的
とするものである。The present invention has been made in view of the above circumstances, and it has excellent heat resistance and moisture resistance because it has a small film stress while having the ability to shield ultraviolet rays and infrared rays, and can be manufactured at low cost. It is intended to provide a multilayer filter.
【0008】[0008]
【課題を解決するための手段】本発明の光学多層膜フィ
ルタは、波長360nm以下の紫外線の透過率が、10
%以下である透明ガラス基板上に、赤外線を遮蔽するよ
うに設計された誘電体多層膜が形成されてなることを特
徴とする。The optical multilayer filter of the present invention has a transmittance of ultraviolet rays having a wavelength of 360 nm or less of 10 or less.
% Or less, a dielectric multi-layer film designed to block infrared rays is formed on a transparent glass substrate.
【0009】また本発明における好ましい態様は、透明
ガラス基板が、30〜750℃の温度において−10〜
15×10-7/℃の熱膨張係数を有する結晶化ガラスか
らなることを特徴とする。In a preferred embodiment of the present invention, the transparent glass substrate has a temperature of 30 to 750 ° C. of −10 to −10.
It is characterized by being made of crystallized glass having a thermal expansion coefficient of 15 × 10 −7 / ° C.
【0010】[0010]
【作用】本発明の光学多層膜フィルタを使用すると、透
明ガラス基板によって紫外線がほぼ遮蔽され、また誘電
体多層膜によって赤外線がほぼ遮蔽されるため、ほとん
ど可視光のみが透過することになる。When the optical multilayer filter of the present invention is used, ultraviolet rays are substantially shielded by the transparent glass substrate and infrared rays are almost shielded by the dielectric multilayer film, so that only visible light is transmitted.
【0011】ところでガラスの紫外線透過率は、主に組
成によって決定され、ガラス中にFe2 O3 、TiO
2 、CeO2 等の成分を添加すると、その値が低くな
り、遮蔽能力が高くなる。通常の窓ガラスでも、その厚
みをかなり大きくすれば、このような透過率特性が得ら
れるが、光学多層膜フィルタの基板として使用されるよ
うな厚みで、波長360nm以下の紫外線透過率が10
%以下となるようなガラスを得るためには、上記の成分
を一定量以上添加させる必要がある。The UV transmittance of glass is mainly determined by its composition, and Fe 2 O 3 and TiO 2 are contained in the glass.
When components such as 2 and CeO 2 are added, the value becomes low and the shielding ability becomes high. Even a normal window glass can obtain such transmittance characteristics if its thickness is considerably increased. However, the ultraviolet transmittance at a wavelength of 360 nm or less is 10 when the thickness is such that it is used as a substrate of an optical multilayer film filter.
In order to obtain glass having a content of not more than%, it is necessary to add the above components in a certain amount or more.
【0012】またこのガラス基板の材料として、特に低
膨張の結晶化ガラスを選択すると、熱ショックに強く、
また熱的な歪みが小さいガラス基板が得られるため好ま
しい。このような結晶化ガラスとしては、重量百分率
で、SiO2 55〜70%、Al2 O3 20〜35
%、Li2 O 3〜5%、TiO2 1〜3%、ZrO
2 1〜4%、P2 O5 1〜5%、Na2 O 0〜4
%、K2 O 0〜4%の組成を有し、β−石英固溶体結
晶を析出し、30〜750℃の温度の熱膨張係数が、−
10〜15×10-7/℃の結晶化ガラスが挙げられ、し
かもこの結晶化ガラスは、TiO2 の作用によって紫外
線を吸収して遮蔽する能力に優れているため本発明のガ
ラス基板として好適である。Further, when crystallized glass of low expansion is particularly selected as the material of the glass substrate, it is resistant to heat shock,
Further, a glass substrate having a small thermal strain can be obtained, which is preferable. As such a crystallized glass, SiO 2 55-70%, Al 2 O 3 20-35, in weight percentage, is used.
%, Li 2 O 3-5%, TiO 2 1-3%, ZrO
2 1~4%, P 2 O 5 1~5%, Na 2 O 0~4
%, K 2 O 0 to 4%, β-quartz solid solution crystals are deposited, and the coefficient of thermal expansion at a temperature of 30 to 750 ° C. is −
Crystallized glass of 10 to 15 × 10 −7 / ° C. may be mentioned, and since this crystallized glass is excellent in the ability to absorb and block ultraviolet rays by the action of TiO 2 , it is suitable as the glass substrate of the present invention. is there.
【0013】誘電体多層膜は、高屈折率材料と低屈折率
材料を交互に積層させたものであり、本発明において
は、赤外線を遮蔽する能力だけが要求されるため、膜層
数を少なくすること、具体的には10〜25層とするこ
とが可能である。因に、高屈折率材料としては、TiO
2 、Ta2 O5 、ZrO2 等、低屈折率材料としては、
SiO2 、MgF2 等が使用される。またこれらの材料
を基板上に成膜する方法としては、蒸着法やスパッタリ
ング法が適している。The dielectric multilayer film is formed by alternately stacking a high refractive index material and a low refractive index material. In the present invention, only the ability to shield infrared rays is required, so the number of film layers is small. It is possible to do so, specifically, 10 to 25 layers. As a high refractive index material, TiO 2 is used.
2 , low-refractive-index materials such as Ta 2 O 5 and ZrO 2 include
SiO 2 , MgF 2 or the like is used. Further, a vapor deposition method or a sputtering method is suitable as a method for forming a film of these materials on a substrate.
【0014】[0014]
【実施例】以下、本発明の光学多層膜フィルタを実施例
に基づいて詳細に説明する。The optical multi-layer film filter of the present invention will be described in detail below based on examples.
【0015】まず重量百分率で、SiO2 67%、A
l2 O3 23%、Li2 O 4%、TiO2 2%、
ZrO2 3%、P2 O5 1%の組成を有し、30〜
750℃の温度において−3×10-7/℃の熱膨張係数
を有する透明結晶化ガラス(日本電気硝子株式会社製ネ
オセラムN−0)からなり、60×90×1.3mmの
寸法を有するガラス基板を準備した。First, by weight percentage, SiO 2 67%, A
l 2 O 3 23%, Li 2 O 4%, TiO 2 2%,
ZrO 2 3%, P 2 O 5 1% composition, 30-
Glass made of transparent crystallized glass (Neoceram N-0 manufactured by Nippon Electric Glass Co., Ltd.) having a coefficient of thermal expansion of −3 × 10 −7 / ° C. at a temperature of 750 ° C. and a size of 60 × 90 × 1.3 mm. The substrate was prepared.
【0016】次いでこのガラス基板上に、低屈折率材料
(SiO2 )と高屈折率材料(TiO2 )を蒸着法によ
って交互に15層成膜することによって誘電体多層膜を
形成した。この誘電体多層膜は、SiO2 とTiO2
が、表1に示す番号順でガラス基板上に成膜されること
によって形成されており、赤外線を遮蔽するように設計
されている。尚、表1の光学膜厚は、中心波長890n
mの条件で設計したものである。Next, a dielectric multilayer film was formed by alternately depositing 15 layers of a low refractive index material (SiO 2 ) and a high refractive index material (TiO 2 ) on this glass substrate by a vapor deposition method. This dielectric multilayer film is composed of SiO 2 and TiO 2
Are formed by forming films on the glass substrate in the order of the numbers shown in Table 1, and are designed to block infrared rays. The optical film thickness in Table 1 has a central wavelength of 890n.
It was designed under the condition of m.
【0017】[0017]
【表1】 [Table 1]
【0018】こうして透明ガラス基板上に誘電体多層膜
が形成された光学多層膜フィルタを作製した後、これの
紫外域、可視域及び赤外域における透過率を調べ、その
結果を図1に示した。After producing an optical multilayer filter in which a dielectric multilayer film was formed on a transparent glass substrate in this manner, the transmittance in the ultraviolet region, visible region and infrared region was examined, and the results are shown in FIG. .
【0019】図1のグラフの横軸は波長、縦軸は透過率
を示すが、このグラフから明らかなように、波長360
nm以下の紫外域における透過率は5%以下、波長40
0〜700nmの可視域における透過率は約90%、ま
た波長750〜1000nmの近赤外域における透過率
は5%以下であった。The horizontal axis of the graph in FIG. 1 represents wavelength and the vertical axis represents transmittance. As is clear from this graph, wavelength 360
The transmittance in the ultraviolet region of nm or less is 5% or less, and the wavelength is 40.
The transmittance in the visible region of 0 to 700 nm was about 90%, and the transmittance in the near infrared region of wavelength 750 to 1000 nm was 5% or less.
【0020】尚、この透過率は、光源がガラス基板に対
して垂直に入射する条件で、分光光度計を使用して測定
したものである。The transmittance is measured by using a spectrophotometer under the condition that the light source is vertically incident on the glass substrate.
【0021】またこの光学多層膜フィルタの耐熱性を調
べるため、これを電気炉に入れ、下記の(1)〜(5)
の工程で熱サイクル試験を行った。 (1)室温から20℃/分の速さで450℃まで昇温し
た後、5分間保持してから100℃まで自然冷却させ
る。 (2)100℃から20℃/分の速さで450℃まで昇
温した後、5分間保持してから100℃まで自然冷却さ
せる。 (3)上記(2)の工程と同じ。 (4)上記(2)の工程と同じ。 (5)100℃から20℃/分の速さで500℃まで昇
温した後、5分間保持してから室温まで自然冷却させ
る。In order to examine the heat resistance of this optical multilayer filter, it was placed in an electric furnace and the following (1) to (5)
The heat cycle test was performed in the process. (1) The temperature is raised from room temperature to 450 ° C. at a rate of 20 ° C./minute, held for 5 minutes, and then naturally cooled to 100 ° C. (2) The temperature is raised from 100 ° C. to 450 ° C. at a rate of 20 ° C./minute, held for 5 minutes, and then naturally cooled to 100 ° C. (3) Same as step (2) above. (4) Same as step (2) above. (5) The temperature is raised from 100 ° C. to 500 ° C. at a rate of 20 ° C./min, held for 5 minutes, and then naturally cooled to room temperature.
【0022】この熱サイクル試験を行った後の光学多層
膜フィルタを観察したところ、膜剥がれ等の異常は、全
く認められず、耐熱性に優れていることがわかった。Observation of the optical multi-layer film filter after the thermal cycle test revealed that no abnormality such as film peeling was observed and the heat resistance was excellent.
【0023】[0023]
【発明の効果】以上のように本発明の光学多層膜フィル
タは、紫外線と赤外線の両方をほぼ遮蔽する能力を有し
ながら、膜応力が小さいため、耐熱性と耐湿性に優れ、
しかも低コストで製造可能である。As described above, the optical multi-layer film filter of the present invention has the ability to substantially shield both ultraviolet rays and infrared rays, but has a small film stress, and therefore has excellent heat resistance and moisture resistance,
Moreover, it can be manufactured at low cost.
【図1】本発明の光学多層膜フィルタの透過率曲線を示
すグラフである。FIG. 1 is a graph showing a transmittance curve of an optical multilayer filter of the present invention.
Claims (2)
が、10%以下である透明ガラス基板上に、赤外線を遮
蔽するように設計された誘電体多層膜が形成されてなる
ことを特徴とする光学多層膜フィルタ。1. An optical system comprising a transparent glass substrate having a transmittance of 10% or less for ultraviolet rays having a wavelength of 360 nm or less and a dielectric multilayer film designed to shield infrared rays. Multilayer filter.
度において、−10〜15×10-7/℃の熱膨張係数を
有する結晶化ガラスからなることを特徴とする請求項1
の光学多層膜フィルタ。2. The transparent glass substrate is made of crystallized glass having a coefficient of thermal expansion of −10 to 15 × 10 −7 / ° C. at a temperature of 30 to 750 ° C.
Optical multilayer filter.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4791794A JPH07234315A (en) | 1994-02-21 | 1994-02-21 | Optical multilayered film filter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4791794A JPH07234315A (en) | 1994-02-21 | 1994-02-21 | Optical multilayered film filter |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH07234315A true JPH07234315A (en) | 1995-09-05 |
Family
ID=12788726
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4791794A Pending JPH07234315A (en) | 1994-02-21 | 1994-02-21 | Optical multilayered film filter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07234315A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09197124A (en) * | 1996-01-23 | 1997-07-31 | Nippon Electric Glass Co Ltd | Dichroic mirror |
JP2001249206A (en) * | 1999-12-28 | 2001-09-14 | Asahi Techno Glass Corp | Reflection mirror and transparent crystallized glass used for the reflection mirror |
JP2002316580A (en) * | 2001-04-24 | 2002-10-29 | Murakami Corp | Mirror device with built-in camera |
WO2002096818A1 (en) * | 2001-05-29 | 2002-12-05 | Asahi Glass Company, Limited | Crystallized glass for optical filter substrate and optical filter |
KR100394043B1 (en) * | 1999-08-10 | 2003-08-06 | 가부시키가이샤 오하라 | Glass-ceramics for a light filter and a light filter |
KR100394044B1 (en) * | 1999-08-30 | 2003-08-06 | 가부시키가이샤 오하라 | Glass for a light filter and a light filter |
JP2006023471A (en) * | 2004-07-07 | 2006-01-26 | Olympus Corp | Multilayer minus filter and fluorescence microscope |
JP2006171076A (en) * | 2004-12-13 | 2006-06-29 | Nikon Corp | Manufacturing method for optical filter |
-
1994
- 1994-02-21 JP JP4791794A patent/JPH07234315A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09197124A (en) * | 1996-01-23 | 1997-07-31 | Nippon Electric Glass Co Ltd | Dichroic mirror |
KR100394043B1 (en) * | 1999-08-10 | 2003-08-06 | 가부시키가이샤 오하라 | Glass-ceramics for a light filter and a light filter |
KR100394044B1 (en) * | 1999-08-30 | 2003-08-06 | 가부시키가이샤 오하라 | Glass for a light filter and a light filter |
JP2001249206A (en) * | 1999-12-28 | 2001-09-14 | Asahi Techno Glass Corp | Reflection mirror and transparent crystallized glass used for the reflection mirror |
JP2002316580A (en) * | 2001-04-24 | 2002-10-29 | Murakami Corp | Mirror device with built-in camera |
WO2002090148A1 (en) * | 2001-04-24 | 2002-11-14 | Murakami Corporation | Camera-built-in mirror device |
WO2002096818A1 (en) * | 2001-05-29 | 2002-12-05 | Asahi Glass Company, Limited | Crystallized glass for optical filter substrate and optical filter |
US7008891B2 (en) | 2001-05-29 | 2006-03-07 | Asahi Glass Company, Limited | Crystallized glass for optical filter substrate, and optical filter |
JP2006023471A (en) * | 2004-07-07 | 2006-01-26 | Olympus Corp | Multilayer minus filter and fluorescence microscope |
JP2006171076A (en) * | 2004-12-13 | 2006-06-29 | Nikon Corp | Manufacturing method for optical filter |
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