JPH07226410A - Method for manufacturing thin film made of chalcopyrite type compound, and solar cell having the thin film - Google Patents

Method for manufacturing thin film made of chalcopyrite type compound, and solar cell having the thin film

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Publication number
JPH07226410A
JPH07226410A JP6017399A JP1739994A JPH07226410A JP H07226410 A JPH07226410 A JP H07226410A JP 6017399 A JP6017399 A JP 6017399A JP 1739994 A JP1739994 A JP 1739994A JP H07226410 A JPH07226410 A JP H07226410A
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JP
Japan
Prior art keywords
thin film
film
cuin
solar cell
raw materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6017399A
Other languages
Japanese (ja)
Other versions
JP2732352B2 (en
Inventor
Katsuaki Sato
勝昭 佐藤
Hiroyuki Sano
寛幸 佐野
Kenichi Kondo
健一 近藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stanley Electric Co Ltd
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Stanley Electric Co Ltd
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Filing date
Publication date
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Priority to JP6017399A priority Critical patent/JP2732352B2/en
Publication of JPH07226410A publication Critical patent/JPH07226410A/en
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Publication of JP2732352B2 publication Critical patent/JP2732352B2/en
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

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  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Photovoltaic Devices (AREA)

Abstract

PURPOSE:To form easily a thin film made of CuInSe based chalcopyrite type compound which has a good crystal quality and a strong adhesive force, and to realize a highly efficient solar cell using this thin film. CONSTITUTION:First, the raw materials (Cu, In, Ge, Se, S, etc.) of a film are filled respectively into respective enclosed type crucibles (step S1), and the raw materials are jetted respectively into a high vacuum from respective jetting nozzles provided in the respective crucibles (step S2), and further, by the supercooling phenomenon (action) caused by the adiabatic expanding of the raw materials in the high vacuum, block-like atomic groups (cluster) in each of which the 5X10<2>-2X10<3> atoms of the foregoing raw materials are combined loosely with each other are formed (step S3). Subsequently, the block-like atomic groups are ionized respectively, and they are accelerated, and thereby, on a substrate, the thin film made of CuInSe2, CuInxGa1-xSe2, CuInSySe2-y and CuInxGa1-xSySe2-y is formed (step S4).

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、クラスターイオンビー
ム法によるCuInSe2 、CuInx Ga1-x Se
2 、CuInSy Se2-y 及びCuInx Ga1-xy
Se2-y のカルコパイライト型化合物の薄膜の作製方法
とその薄膜を有した太陽電池に関するものである。
FIELD OF THE INVENTION The present invention relates to CuInSe 2 , CuIn x Ga 1 -x Se by the cluster ion beam method.
2 , CuInS y Se 2-y and CuIn x Ga 1-x S y
The present invention relates to a method for producing a thin film of an Se 2-y chalcopyrite type compound and a solar cell having the thin film.

【0002】[0002]

【従来の技術】CuInSe2 は、閃亜鉛鉱構造のII−
VI族半導体ZnSeにおいて、Znを規則的にCuとI
nに置き換えたカルコパイライト型の結晶構造を持つ化
合物半導体であり、またCuInx Ga1-x Se2 ,C
uInSy Se2-y 及びCuInx Ga1-xy Se
2-y (0≦x<1,0<y≦)も同様の結晶構造を持つ
化合物半導体である。
2. Description of the Related Art CuInSe 2 is a zinc blende structure II-
In the Group VI semiconductor ZnSe, Zn is regularly added to Cu and I.
It is a compound semiconductor having a chalcopyrite type crystal structure in which n is replaced by n, and CuIn x Ga 1-x Se 2 , C
uInS y Se 2-y and CuIn x Ga 1-x S y Se
2-y (0 ≦ x <1, 0 <y ≦) is also a compound semiconductor having a similar crystal structure.

【0003】上記CuInSe2 の特徴は、禁制帯幅
1.04eVの直接遷移型半導体であること、既存の半
導体中で最も高い光の吸収係数を持つこと、アモルファ
スSiで問題となっている光劣化が全く存在しないこ
と、また元素を種々選択することにより禁制帯幅を制御
することができるなどがあげられ、多結晶薄膜太陽電池
材料として研究が進められている。
The characteristics of CuInSe 2 are that it is a direct transition type semiconductor with a forbidden band width of 1.04 eV, that it has the highest light absorption coefficient among existing semiconductors, and photodegradation that is a problem with amorphous Si. It is possible to control the forbidden band width by selecting various elements, and research is being conducted as a polycrystalline thin film solar cell material.

【0004】従来、上記のCuInSe2 膜やCuIn
x Ga1-x Se2 膜、CuInSySe2-y 膜、CuI
x Ga1-xy Se2-y 膜は、蒸着法、スパッタ法、
セレン化法などの手法により作製されており、成膜の際
には、膜の結晶性を向上させるために基板温度が450
℃以上必要とされている。
Conventionally, the above CuInSe 2 film and CuIn
x Ga 1-x Se 2 film, CuInS y Se 2-y film, CuI
n x Ga 1-x S y Se 2-y film, vapor deposition, sputtering,
It is produced by a method such as selenization, and the substrate temperature is set to 450 ° C. in order to improve the crystallinity of the film during film formation.
Required above ℃.

【0005】図6は一般的なCuInSe2 系の薄膜を
有した太陽電池の構造を示す図であり、(a)はサブス
トレート型、(b)はスーパーストレート型の構造をそ
れぞれ示している。
6A and 6B are views showing the structure of a solar cell having a general CuInSe 2 -based thin film. FIG. 6A shows a substrate type structure, and FIG. 6B shows a superstrate type structure.

【0006】図6の(a)のサブストレート型は、ガラ
ス基板(Glass)1上にMo電極2を蒸着させた
後、CuInSe2 系薄膜3を堆積させ、その上に窓層
としてII−VI族化合物半導体のCdS膜4及びZnO膜
5を堆積させて太陽電池としたものである。
In the substrate type shown in FIG. 6 (a), a Mo electrode 2 is vapor-deposited on a glass substrate (Glass) 1, a CuInSe 2 -based thin film 3 is deposited, and a window layer II-VI is formed thereon. A CdS film 4 and a ZnO film 5 of a group compound semiconductor are deposited to form a solar cell.

【0007】また、図6の(b)のスーパーストレート
型は、上記のサブストレート型と逆構造となっており、
ガラス基板(Glass)上にITO,ZnO,SnO
2 等からなるTCO膜7が形成され、その上に窓層とし
てCdS膜4を堆積した後、CuInSe2 系薄膜3を
堆積し、さらにその上に金属(Metal)電極6を設
けた構造となっている。このスーパーストレート型は、
ガラス基板1側から光(hν)を入射できるので、気密
性、量産性に優れている。
The superstrate type shown in FIG. 6 (b) has a structure opposite to that of the above substrate type.
ITO, ZnO, SnO on a glass substrate (Glass)
A TCO film 7 made of 2 or the like is formed, a CdS film 4 is deposited thereon as a window layer, a CuInSe 2 -based thin film 3 is deposited thereon, and a metal (Metal) electrode 6 is further provided thereon. ing. This super straight type is
Since light (hν) can be incident from the glass substrate 1 side, it is excellent in hermeticity and mass productivity.

【0008】ここで、上記のような構造の太陽電池にお
いては、Mo電極2及び金属電極6は低抵抗で安定した
オーミック接触が得られるようにする必要があり、特に
Mo電極2とCuInSe2 系薄膜3との間には付着性
を向上させるためにTe膜やGa膜を設けても良い。ま
た、CuInSe2 系薄膜3とCdS膜4の境界面では
相互拡散を抑制し、高開放電圧化を図ることが有効であ
る。
In the solar cell having the above structure, it is necessary that the Mo electrode 2 and the metal electrode 6 have low resistance and stable ohmic contact. In particular, the Mo electrode 2 and the CuInSe 2 system are used. A Te film or a Ga film may be provided between the thin film 3 and the thin film 3 in order to improve adhesion. Further, it is effective to suppress mutual diffusion at the boundary surface between the CuInSe 2 -based thin film 3 and the CdS film 4 to achieve a high open circuit voltage.

【0009】[0009]

【発明が解決しようとする課題】しかしながら、従来で
はCuInSe2 の薄膜を上記のように蒸着法、スパッ
タ法、セレン化法等で作製しており、膜の結晶性を向上
させるために基板温度に450℃以上の高温が必要であ
る一方、気密性、量産性に優れたスーパーストレート型
の構造の場合はII−VI族化合物(例えばCdS)上にC
uInSe2 系の薄膜を堆積させるのでII−VI族化合物
に影響を与えない(CuがCdS等の中に拡散しない)
ようにするために基板温度が300℃以下の低温成膜が
必要とされる。
However, conventionally, a CuInSe 2 thin film is produced by the vapor deposition method, the sputtering method, the selenization method or the like as described above, and the substrate temperature is increased in order to improve the crystallinity of the film. While a high temperature of 450 ° C or higher is required, in the case of a superstrate type structure excellent in airtightness and mass productivity, C is added on a II-VI group compound (for example, CdS).
Since a uInSe 2 -based thin film is deposited, it does not affect II-VI group compounds (Cu does not diffuse into CdS etc.)
In order to do so, low temperature film formation with a substrate temperature of 300 ° C. or lower is required.

【0010】このため、従来ではスーパーストレート型
の太陽電池を作製する際に結晶性の良いCuInSe2
系の薄膜を形成することが困難であり、高性能、高効率
の太陽電池を得ることが困難であるという問題点があっ
た。
Therefore, conventionally, when a super straight type solar cell is manufactured, CuInSe 2 having good crystallinity is used.
There is a problem that it is difficult to form a thin film of a system, and it is difficult to obtain a solar cell with high performance and high efficiency.

【0011】また、CuInSe2 系の薄膜をガラス基
板上に堆積させる場合、従来では熱膨張係数の違いなど
により膜と基板との間に空隙が生じ、膜の付着力が弱く
なるという問題点があった。
Further, when depositing a CuInSe 2 -based thin film on a glass substrate, conventionally, there is a problem in that a gap is formed between the film and the substrate due to a difference in thermal expansion coefficient and the adhesive force of the film is weakened. there were.

【0012】本発明は、上記のような問題点に着目して
なされたもので、容易に結晶性の良いCuInSe2
膜、CuInx Ga1-x Se2 膜、CuInSy Se
2-y 膜及びCuInx Ga1-xy Se2-y 膜を作製す
ることができ、また強い膜の付着力が得られるCuIn
Se2 膜、CuInx Ga1-x Se2 膜、CuInSy
Se2-y 膜及びCuInx Ga1-xy Se2-y 膜の作
製方法とその薄膜を有した高効率の太陽電池を提供する
ことを目的としている。
The present invention has been made in view of the above problems, and CuInSe 2 having a good crystallinity can be easily obtained.
Film, CuIn x Ga 1-x Se 2 film, CuInS y Se
2-y layer and CuIn x Ga 1-x S y Se 2-y film can be prepared, also adhesion strong film can be obtained CuIn
Se 2 film, CuIn x Ga 1-x Se 2 film, CuInS y
And its object is to provide a Se 2-y layer and CuIn x Ga 1-x S y Se 2-y film highly efficient solar cell manufacturing method and had the thin film.

【0013】[0013]

【課題を解決するための手段】本発明のCuInSe2
のカルコパイライト型化合物の薄膜の作製方法は、C
u,In,Seの原料をそれぞれ噴射ノズルを有した密
閉形容器に入れてその噴射ノズルから真空中に噴射さ
せ、その真空中での断熱膨張による過冷却作用によって
前記原料の原子が互いに緩く結合した塊状原子集団を形
成し、この塊状原子集団をイオン化して加速することに
より基板上にCuInSe2 膜を成膜させるようにした
ものであり、また、Cuのイオン化電流をInのイオン
化電流よりも大きくして加速するようにしたものであ
る。
CuInSe 2 of the present invention
The method for producing the thin film of the chalcopyrite type compound is
Raw materials of u, In and Se are put in a closed container having a spray nozzle, respectively, and sprayed into a vacuum from the spray nozzle, and the atoms of the raw materials are loosely bonded to each other by a supercooling action by adiabatic expansion in the vacuum. To form a CuInSe 2 film on the substrate by ionizing and accelerating the lumped atomic populations, and the Cu ionization current is higher than the In ionization current. It was made larger and accelerated.

【0014】本発明のCuInx Ga1-x Se2 のカル
コパイライト型化合物の薄膜の作製方法は、Cu,I
n,Ga,Seの原料をそれぞれ噴射ノズルを有した密
閉形容器に入れてその噴射ノズルから真空中に噴射さ
せ、その真空中での断熱膨張による過冷却作用によって
前記原料の原子が互いに緩く結合した塊状原子集団を形
成し、この塊状原子集団をイオン化して加速することに
より基板上にCuInx Ga1-x Se2 膜を成膜させる
ようにしたものであり、また、Cuのイオン化電流をI
n及びGaのイオン化電流よりも大きくして加速するよ
うにしたものである。このときのxの値は0≦x<1で
ある。
The method for producing a thin film of the chalcopyrite type compound of CuIn x Ga 1 -x Se 2 of the present invention is Cu, I.
The raw materials of n, Ga, and Se are put in a sealed container each having a spray nozzle, sprayed from the spray nozzle into a vacuum, and the atoms of the raw material are loosely bonded to each other by a supercooling action by adiabatic expansion in the vacuum. To form a CuIn x Ga 1 -x Se 2 film on the substrate by ionizing and accelerating this massive atomic population. I
The ionization currents of n and Ga are set to be larger than the ionization currents of n and Ga for acceleration. The value of x at this time is 0 ≦ x <1.

【0015】本発明のCuInSy Se2-y のカルコパ
イライト型化合物の薄膜の作製方法は、Cu,In,
S,Seの原料をそれぞれ噴射ノズルを有した密閉形容
器に入れてその噴射ノズルから真空中に噴射させ、その
真空中での断熱膨張による過冷却作用によって前記原料
の原子が互いに緩く結合した塊状原子集団を形成し、こ
の塊状原子集団をイオン化して加速することにより基板
上にCuInSy Se2-y 膜を成膜させるようにしたも
のであり、また、Cuのイオン化電流をInのイオン化
電流よりも大きくして加速するようにしたものである。
このときのyの値は0<y≦2である。
The method for producing a thin film of the chalcopyrite type compound of CuInS y Se 2-y of the present invention is as follows.
The raw materials of S and Se are put into a closed container having a spray nozzle, respectively, and sprayed into a vacuum from the spray nozzle, and the atom of the raw material is loosely bonded to each other by a supercooling action by adiabatic expansion in the vacuum. A CuInS y Se 2-y film is formed on a substrate by forming an atomic population and ionizing and accelerating this massive atomic population. Further, the Cu ionization current is the In ionization current. It is designed to be bigger than the above to accelerate.
At this time, the value of y is 0 <y ≦ 2.

【0016】本発明のCuInx Ga1-xy Se2-y
のカルコパイライト型化合物の薄膜の作製方法は、C
u,In,Ga,S,Seの原料をそれぞれ噴射ノズル
を有した密閉形容器に入れてその噴射ノズルから真空中
に噴射させ、その真空中での断熱膨張による過冷却作用
によって前記原料の原子が互いに緩く結合した塊状原子
集団を形成し、この塊状原子集団をイオン化して加速す
ることにより基板上にCuInx Ga1-xy Se2-y
膜を成膜させるようにしたものであり、また、Cuのイ
オン化電流をIn及びGaのイオン化電流よりも大きく
して加速するようにしたものである。このときのx,y
の値はそれぞれ0≦x<1,0<y≦2である。
The CuIn x Ga 1-x S y Se 2-y of the present invention
The method for producing the thin film of the chalcopyrite type compound is
The raw materials of u, In, Ga, S, and Se are put into a sealed container having an injection nozzle, respectively, and injected into a vacuum from the injection nozzle, and the atoms of the raw material are atomized by a supercooling action by adiabatic expansion in the vacuum. Form a lumpy atomic population that is loosely bonded to each other and ionize and accelerate the lumpy atomic population to form CuIn x Ga 1-x S y Se 2-y on the substrate.
A film is formed, and the ionization current of Cu is made larger than the ionization currents of In and Ga to accelerate the film. X, y at this time
The values of 0 are respectively 0 ≦ x <1 and 0 <y ≦ 2.

【0017】本発明の基板上にCuInSe2 の薄膜を
有した太陽電池は、CuInSe2の薄膜を、Cu,I
n,Seの原料を真空中に噴射させた時に形成される互
いの原子が緩く結合した塊状原子集団をイオン化して加
速することにより成膜したものである。
The solar cell having a CuInSe 2 thin film on the substrate of the present invention is a CuInSe 2 thin film containing Cu, I
It is a film formed by ionizing and accelerating a massive atomic group in which the atoms are loosely bound to each other and formed when the raw materials of n and Se are jetted in a vacuum.

【0018】また、本発明の基板上にCuInx Ga
1-x Se2 の薄膜を有した太陽電池は、CuInx Ga
1-x Se2 の薄膜を、Cu,In,Ga,Seの原料を
真空中に噴射させた時に形成される互いの原子が緩く結
合した塊状原子集団をイオン化して加速することにより
成膜したものである。
Further, CuIn x Ga may be formed on the substrate of the present invention.
A solar cell having a thin film of 1-x Se 2 is CuIn x Ga
A thin film of 1-x Se 2 was formed by ionizing and accelerating a massive atomic group in which atoms of each of which are loosely bound to each other and which are formed when a raw material of Cu, In, Ga, and Se is injected in a vacuum. It is a thing.

【0019】また、本発明の基板上にCuInSy Se
2-y の薄膜を有した太陽電池は、CuInSy Se2-y
の薄膜を、Cu,In,S,Seの原料を真空中に噴射
させた時に形成させる互いの原子が緩く結合した塊状原
子集団をイオン化して加速することにより成膜したもの
である。
Further, CuInS y Se may be formed on the substrate of the present invention.
A solar cell having a thin film of 2-y is CuInS y Se 2-y
Is a thin film formed by ionizing and accelerating a massive atomic group in which atoms of each of which are loosely bonded and formed when the raw materials of Cu, In, S, and Se are jetted in a vacuum.

【0020】また、本発明の基板上にCuInx Ga
1-xy Se2-y の薄膜を有した太陽電池は、CuIn
x Ga1-xy Se2-y の薄膜を、Cu,In,Ga,
S,Seの原料を真空中に噴射させた時に形成される互
いの原子が緩く結合した塊状原子集団をイオン化して加
速することにより成膜したものである。この時のxの値
は0<x<1であり、yの値は0<y<2である。
Further, CuIn x Ga may be formed on the substrate of the present invention.
Solar cell having a thin film of 1-x S y Se 2- y is, CuIn
A thin film of x Ga 1-x S y Se 2-y is formed of Cu, In, Ga,
This is a film formed by ionizing and accelerating a massive atom population in which atoms of each other are loosely bonded and formed when the raw materials of S and Se are injected into a vacuum. At this time, the value of x is 0 <x <1, and the value of y is 0 <y <2.

【0021】[0021]

【作用】本発明のCuInSe2 、CuInx Ga1-x
Se2 、CuInSy Se2-y、及びCuInx Ga1-x
y Se2-y の薄膜の作製方法においては、膜の原料
がそれぞれノズルから真空中に噴射され、その真空中で
の膨張、冷却作用によって互いの原子が緩く結合した塊
状原子集団が形成され、この塊状原子集団がイオン化、
加速されて基板上に成膜が行われるので、低温成膜が可
能であり、またイオン化のために膜の付着力も強くな
る。
Function : CuInSe 2 , CuIn x Ga 1-x of the present invention
Se 2 , CuInS y Se 2-y , and CuIn x Ga 1-x
In the method for producing a thin film of S y Se 2-y , the raw materials of the film are sprayed from a nozzle into a vacuum, respectively, and expansion and cooling action in the vacuum form a massive atomic group in which the atoms are loosely bonded to each other. , This massive atomic population is ionized,
Since the film is formed on the substrate by being accelerated, the film can be formed at a low temperature, and the adhesion of the film becomes strong due to the ionization.

【0022】また、本発明の太陽電池においては、上記
のように成膜されたCuInSe2膜、CuInGaS
2 膜、CuInSy Se2-y 膜あるいはCuInx
1-xy Se2-y 膜が使用されているので、窓層とな
るII−VI族化合物に影響を与えることなく、高効率が得
られる。
Further, in the solar cell of the present invention, the CuInSe 2 film and CuInGaS film formed as described above are used.
e 2 film, CuInS y Se 2-y film or CuIn x G
Since a 1-x S y Se 2 -y film is used, without affecting the group II-VI compound to be a window layer, a high efficiency is obtained.

【0023】[0023]

【実施例】図1は本発明に係るCuInSe2 膜、Cu
Inx Ga1-x Se2 膜、CuInSy Se2-y 膜及び
CuInx Ga1-xy Se2-y 膜の作製過程を示す図
である。これらの薄膜の作製方法はクラスターイオンビ
ーム法(ICB法)と呼ばれるものであり、まず膜の原
料(Cu,In,Seなど)を各々の密閉形るつぼに入
れ(ステップS1)、このるつぼに設けた噴射ノズルか
ら高真空中に噴射させ(ステップS2)、その高真空中
での断熱膨張による過冷却現象(作用)によって5×1
2 〜2×103 個の上記原料の原子が互いに緩く結合
した塊状原子集団(クラスター)を形成する(ステップ
S3)。そして、この塊状原子集団をイオン化して加速
することにより、基板上にCuInSe2 やCuInx
Ga1-x Se2 やCuInSy Se2-y やCuInx
1-xy Se2-y の薄膜を成膜させる(ステップS
4)。
EXAMPLE FIG. 1 shows a CuInSe 2 film, Cu according to the present invention.
In x Ga 1-x Se 2 film is a diagram illustrating a manufacturing process of the CuInS y Se 2-y layer and CuIn x Ga 1-x S y Se 2-y film. A method for producing these thin films is called a cluster ion beam method (ICB method). First, raw materials (Cu, In, Se, etc.) for the films are put into each closed crucible (step S1), and then the crucible is provided. 5 × 1 by the supercooling phenomenon (action) by adiabatic expansion in the high vacuum (step S2).
A mass atomic cluster (cluster) in which 0 2 to 2 × 10 3 atoms of the above-mentioned raw material are loosely bonded to each other is formed (step S3). Then, by ionizing and accelerating this massive atomic population, CuInSe 2 and CuIn x are deposited on the substrate.
Ga 1-x Se 2 or CuInS y Se 2-y or CuIn x G
a 1-x S y Se 2-y thin film is formed (step S
4).

【0024】このようにして、CuInSe2 膜やCu
Inx Ga1-x Se2 膜やCuInSy Se2-y 膜やC
uInx Ga1-xy Se2-y 膜が得られるが、その際
熱エネルギーの代わりにイオン化による運動エネルギー
を利用しており、その運動エネルギーを制御し、かつ化
学的に活性化させることで薄膜を得ている。このため、
成膜条件としては、基板温度は300℃程度で良く、低
温で良質の薄膜を形成することができる。また、イオン
の加速電圧は0〜3KV程度であり、イオン化電流はC
uのイオン化電流ICuをInやGaのイオン化電流
In,IGaよりも大きくして(ICu>IIn,IGa>0m
A)加速することが望ましい。
In this way, the CuInSe 2 film and the Cu
In x Ga 1-x Se 2 film, CuInS y Se 2-y film and C
Although uIn x Ga 1-x S y Se 2-y film is obtained, and by utilizing the kinetic energy due to ionization in place of the Sainetsu energy to control the kinetic energy, and chemically to activate To get a thin film. For this reason,
As a film forming condition, the substrate temperature may be about 300 ° C., and a good quality thin film can be formed at a low temperature. Further, the acceleration voltage of ions is about 0 to 3 KV, and the ionization current is C
The ionization current I Cu of u is made larger than the ionization currents I In and I Ga of In and Ga (I Cu > I In , I Ga > 0 m
A) It is desirable to accelerate.

【0025】図2は上記の成膜に使用されるICB装置
の概略構成を示す図である。この装置は、真空装置(V
ACUUM SYSTEM)11とこれに接続された密
閉可能な真空容器12からなり、真空容器12内には上
述の噴射ノズルを有した密閉形容器であるるつぼ13,
14,15が各々の原料(Cu,In,Se)の発生源
(SOURCE)として配置されている。またこの真空
容器12内には、基板16や基板加熱用ランプ17、ま
たイオン化のための装置も配置されている。
FIG. 2 is a diagram showing a schematic configuration of an ICB device used for the above film formation. This device is a vacuum device (V
ACUUM SYSTEM 11 and a vacuum container 12 that can be sealed and connected thereto, and the vacuum container 12 is a crucible 13, which is a closed container having the above-mentioned injection nozzle.
14 and 15 are arranged as sources (SOURCE) of the respective raw materials (Cu, In, Se). Further, in the vacuum container 12, a substrate 16, a substrate heating lamp 17, and a device for ionization are arranged.

【0026】図3は上記CuとInのイオン化条件を変
えて成膜した時のCuInSe2 膜の表面SEM像を示
したものである。図3の(a)はCu,In共イオン化
しない場合(ICu=IIn=0mA)を示し、この場合膜
の粒径が小さく、粗い不均一な膜であった。図3の
(b)はCuのみイオン化した場合(ICu=50mA,
In=0mA)を示し、この時は粒径の増大が見られた
が、まだ不均一な膜であった。
FIG. 3 shows a surface SEM image of the CuInSe 2 film formed by changing the ionization conditions of Cu and In. FIG. 3A shows a case where Cu, In co-ionization is not performed (I Cu = I In = 0 mA). In this case, the particle size of the film was small and the film was rough and non-uniform. FIG. 3B shows a case where only Cu is ionized (I Cu = 50 mA,
I In = 0 mA), and an increase in particle size was observed at this time, but the film was still non-uniform.

【0027】また、図3の(c)はCu,In共、同程
度イオン化した場合(ICu=IIn=50mA)を示し、
この時は膜の均一性は向上したものの、粒径のやや小さ
い(0.3μm程度)膜となった。図3の(d)は上述
のようにCuのイオン化電流をInのそれより大きくし
た場合(ICu=100mA,IIn=50mA)を示し、
この時粒径が1μm程度に増大した均一な膜が得られ
た。この時の加速電圧は1〜2KV、基板温度は300
℃であった。図4に、図3の(d)のSEM像を拡大し
て示す。また図5にその時のCuInSe2 膜のX線回
折パターンを示す。
Further, FIG. 3C shows the case where Cu and In are ionized to the same degree (I Cu = I In = 50 mA),
At this time, the uniformity of the film was improved, but the particle size was rather small (about 0.3 μm). FIG. 3D shows the case where the ionization current of Cu is larger than that of In as described above (I Cu = 100 mA, I In = 50 mA),
At this time, a uniform film having a particle size increased to about 1 μm was obtained. At this time, the acceleration voltage is 1 to 2 KV, and the substrate temperature is 300.
It was ℃. FIG. 4 shows an enlarged SEM image of FIG. Further, FIG. 5 shows an X-ray diffraction pattern of the CuInSe 2 film at that time.

【0028】図5に示すように、本実施例で得られたC
uInSe2 膜のX線回折は(イ:(112))に強く
配向しており、半値幅は0.3°と狭く、結晶性の良い
ことがうかがえる。更にカルコパイライト構造特有の回
折線(ロ:(101)),(ハ:(103)),(ニ:
(211))等も見られ、良質の多結晶膜であることが
判明した。また、CuとInのイオン化電流の差は、好
ましくはICu−IIn≧30mAが良く、この時良好な結
果が得られた。
As shown in FIG. 5, the C obtained in this embodiment was obtained.
The X-ray diffraction of the uInSe 2 film is strongly oriented in (a: (112)), and the full width at half maximum is narrow at 0.3 °, indicating that the crystallinity is good. Furthermore, diffraction lines (b: (101)), (c: (103)), (d: peculiar to the chalcopyrite structure)
(211)) and the like were also found, and it was found that the film was a high quality polycrystalline film. The difference between the ionization currents of Cu and In is preferably I Cu −I In ≧ 30 mA, and good results were obtained at this time.

【0029】以上のことから、基板温度300℃の低温
成膜において、Cuのイオン化電流をInのイオン化電
流よりも大きくする(好ましくはICu−IIn≧30m
A)ことで、異相がなく、粒径も1μm程度にそろい、
結晶のファセットも観察されるような、結晶性の良いC
uInSe2 膜が得られることがわかった。また、In
の一部をGaで置換したCuInx Ga1-x Se2 膜に
ついても同様の実験をしたところ、ICu−IIn≧30m
A、かつICu−IGa≧30mAで、CIS膜と同様の良
好な結果が得られた。
From the above, in the low temperature film formation at the substrate temperature of 300 ° C., the Cu ionization current is made larger than the In ionization current (preferably I Cu −I In ≧ 30 m).
By A), there are no different phases and the particle size is about 1 μm.
C with good crystallinity such that facets of crystals are also observed
It was found that a uInSe 2 film was obtained. Also, In
Some were the same experiment for CuIn x Ga 1-x Se 2 film was replaced by Ga, I Cu -I In ≧ 30m of
When A and I Cu −I Ga ≧ 30 mA, good results similar to those of the CIS film were obtained.

【0030】ここで、上記の各化学式におけるxの範囲
については、好ましくは0.1<x<0.5で、最適値
としては0.25付近であった。
Here, the range of x in each of the above chemical formulas is preferably 0.1 <x <0.5, and the optimum value is around 0.25.

【0031】また、CuInSe2 のSeの一部をSで
置換したCuInSy Se2-y 膜についても同様の実験
をしたところ、上記と同様にCuとInのイオン化電流
の差は好ましくはICu−IIn≧30mAで、yの範囲は
0.3<y<1において良好な結果が得られた。このy
の最適値は、0.5付近であった。
A similar experiment was conducted on a CuInS y Se 2-y film in which a part of Se in CuInSe 2 was replaced with S. As a result, the difference in ionization current between Cu and In was preferably I Cu. Good results were obtained when -I In ≧ 30 mA and y range was 0.3 <y <1. This y
The optimum value of was about 0.5.

【0032】また、CuInx Ga1-xy Se2-y
についても同様の実験を行なったところ、上記と同様の
範囲において良好な結果が得られた。
Further, when the same experiment was conducted for the CuIn x Ga 1-x S y Se 2-y film, good results were obtained in the same range as above.

【0033】この時のCuやIn,Gaのイオン化は、
膜形成時において、蒸着原子の核形成、核成長を促進
し、結晶核凝集作用による良質の膜形成に関与するもの
と考えられる。
The ionization of Cu, In and Ga at this time is as follows.
It is considered that during film formation, it promotes nucleation and nucleation of vapor-deposited atoms and contributes to the formation of a high-quality film due to the action of crystal nucleus aggregation.

【0034】次に、上述のICB法で形成されたCIS
膜により作製したスーパーストレート型の太陽電池につ
いて説明する。この電池の構造は図6の(b)に示した
ものと同様であり、無アルカリのガラス基板上にZnO
(1μm),CdS(1000Å),CuInSe2
(1.5μm),Au(1μm)の各膜が順次形成され
た構成を有している。この太陽電池の特性として、AM
1.5、100mW/cm2 の照射条件の下で、変換効
率2%程度のものが得られた。
Next, the CIS formed by the above-mentioned ICB method
A superstrate type solar cell made of a film will be described. The structure of this battery is similar to that shown in FIG. 6B, and ZnO is formed on a non-alkali glass substrate.
(1 μm), CdS (1000 Å), CuInSe 2
(1.5 μm) and Au (1 μm) films are sequentially formed. The characteristics of this solar cell are AM
Under the irradiation conditions of 1.5 and 100 mW / cm 2 , a conversion efficiency of about 2% was obtained.

【0035】このように、ICB法によるCIS膜の低
温成膜技術を用いて、基板温度300℃以下で成膜でき
ることにより、スーパーストレート型の太陽電池を作製
した場合、下地の窓層(II−VI族化合物CdS)へのC
uの拡散が抑えられ、良好なCdS−CuInSe2
面が得られ、高性能、高効率の太陽電池が得られる。
As described above, when a CIS film is formed at a low temperature by the ICB method at a substrate temperature of 300 ° C. or less, when a super straight solar cell is produced, the underlying window layer (II- C to Group VI compound CdS)
The diffusion of u is suppressed, a good CdS-CuInSe 2 interface is obtained, and a high-performance and high-efficiency solar cell is obtained.

【0036】また、ICB法で作製したCuInSe2
膜は、イオン化の効果等により、膜の付着力が強く、テ
ープテストを行っても膜はがれが生じることはない。
Further, CuInSe 2 produced by the ICB method
The film has a strong adhesive force due to the effect of ionization and the like, so that film peeling does not occur even when a tape test is performed.

【0037】なお、上述の成膜法で得られた膜は、Cu
InSe2 膜でもCuInx Ga1-x Se2 膜でも、C
uInSy Se2-y 膜でも、CuInx Ga1-xy
2-y 膜でも同様の品質が保証される。また、これらの
膜は太陽電池だけでなく、撮像管など他にも適用するこ
とができる。
The film obtained by the above film forming method is Cu
For both the InSe 2 film and the CuIn x Ga 1-x Se 2 film, C
Even with the uInS y Se 2-y film, CuIn x Ga 1-x S y S
Similar quality is guaranteed for e2 -y films. Further, these films can be applied not only to the solar cell but also to an image pickup tube and the like.

【0038】[0038]

【発明の効果】以上のように、本発明によれば、容易に
結晶性の良いCuInSe2 膜、CuInx Ga1-x
2 膜、CuInSy Se2-y 膜及びCuInx Ga
1-xySe2-y 膜を作成することができ、また膜の強
い付着力が得られるという効果がある。
As described above, according to the present invention, a CuInSe 2 film and a CuIn x Ga 1 -x S film having good crystallinity can be easily obtained.
e 2 film, CuInS y Se 2-y film, and CuIn x Ga
There is an effect that a 1-x Sy Se 2-y film can be formed and a strong adhesive force of the film can be obtained.

【0039】また、上記のCuInSe2 膜、CuIn
x Ga1-x Se2 膜、CuInSySe2-y 膜あるいは
CuInx Ga1-xy Se2-y 膜により、高効率の太
陽電池を実現することができるという効果がある。
In addition, the above-mentioned CuInSe 2 film, CuIn
x Ga 1-x Se 2 film, the CuInS y Se 2-y film or CuIn x Ga 1-x S y Se 2-y film, there is an effect that it is possible to realize a high efficiency solar cells.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明に係る膜の作製過程を示す図FIG. 1 is a diagram showing a manufacturing process of a film according to the present invention.

【図2】 図1の成膜に使用される装置の概略構成図FIG. 2 is a schematic configuration diagram of an apparatus used for film formation in FIG.

【図3】 イオン化によるCuInSe2 膜の表面SE
M像を示す図(写真)
FIG. 3 Surface SE of CuInSe 2 film by ionization
Figure showing M image (photo)

【図4】 図3の(d)の拡大図(写真)FIG. 4 is an enlarged view (photograph) of FIG.

【図5】 図4のCuInSe2 膜のX線回折パターン
を示す図
5 is a diagram showing an X-ray diffraction pattern of the CuInSe 2 film of FIG.

【図6】 一般的な太陽電池の構造を示す図FIG. 6 is a diagram showing a structure of a general solar cell.

【符号の説明】[Explanation of symbols]

11 真空装置 12 真空容器 13 るつぼ(密閉形容器) 14 るつぼ(密閉形容器) 15 るつぼ(密閉形容器) 16 基板 17 基板加熱用ランプ 11 Vacuum Equipment 12 Vacuum Container 13 Crucible (Sealed Container) 14 Crucible (Sealed Container) 15 Crucible (Sealed Container) 16 Substrate 17 Substrate Heating Lamp

【手続補正書】[Procedure amendment]

【提出日】平成6年11月30日[Submission date] November 30, 1994

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】請求項8[Name of item to be corrected] Claim 8

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【手続補正2】[Procedure Amendment 2]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0002[Name of item to be corrected] 0002

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0002】[0002]

【従来の技術】CuInSe2 は、閃亜鉛鉱構造のII−
VI族半導体ZnSeにおいて、Znを規則的にCuとI
nに置き換えたカルコパイライト型の結晶構造を持つ化
合物半導体であり、またCuInx Ga1-x Se2 ,C
uInSy Se2-y 及びCuInx Ga1-xy Se
2-y (0≦x≦1,0<y≦)も同様の結晶構造を持
つ化合物半導体である。
2. Description of the Related Art CuInSe 2 is a zinc blende structure II-
In the Group VI semiconductor ZnSe, Zn is regularly added to Cu and I.
It is a compound semiconductor having a chalcopyrite type crystal structure in which n is replaced by n, and CuIn x Ga 1-x Se 2 , C
uInS y Se 2-y and CuIn x Ga 1-x S y Se
2-y (0 ≦ x ≦ 1, 0 <y ≦ 2 ) is also a compound semiconductor having a similar crystal structure.

Claims (12)

【特許請求の範囲】[Claims] 【請求項1】 CuInSe2 のカルコパイライト型化
合物の薄膜の作製方法において、Cu,In,Seの原
料をそれぞれ噴射ノズルを有した密閉形容器に入れてそ
の噴射ノズルから真空中に噴射させ、その真空中での断
熱膨張による過冷却作用によって前記原料の原子が互い
に緩く結合した塊状原子集団を形成し、この塊状原子集
団をイオン化して加速することにより基板上にCuIn
Se2膜を成膜させることを特徴とするCuInSe2
のカルコパイライト型化合物の薄膜の作製方法。
1. A method for producing a thin film of a chalcopyrite-type compound of CuInSe 2 , wherein raw materials of Cu, In, and Se are put in a sealed container each having a spray nozzle and sprayed from the spray nozzle into a vacuum. Due to the supercooling effect of adiabatic expansion in vacuum, the atoms of the raw material are loosely bound to each other to form a cluster of massive atoms, which is ionized and accelerated to form CuIn on the substrate.
CuInSe 2 characterized by forming a Se 2 film
Method for producing thin film of chalcopyrite type compound of.
【請求項2】 Cuのイオン化電流をInのイオン化電
流よりも大きくして加速することを特徴とする請求項1
記載のCuInSe2 のカルコパイライト型化合物の薄
膜の作製方法。
2. The Cu ionization current is made larger than the In ionization current to accelerate.
A method for producing a thin film of the chalcopyrite type compound of CuInSe 2 described.
【請求項3】 CuInx Ga1-x Se2 (但し0≦x
<1)のカルコパイライト型化合物の薄膜の作製方法に
おいて、Cu,In,Ga,Seの原料をそれぞれ噴射
ノズルを有した密閉形容器に入れてその噴射ノズルから
真空中に噴射させ、その真空中での断熱膨張による過冷
却作用によって前記原料の原子が互いに緩く結合した塊
状原子集団を形成し、この塊状原子集団をイオン化して
加速することにより基板上にCuInx Ga1-x Se2
膜を成膜させることを特徴とするCuInx Ga1-x
2 のカルコパイライト型化合物の薄膜の作製方法。
3. CuIn x Ga 1-x Se 2 (where 0 ≦ x
In the method for producing a thin film of a chalcopyrite type compound according to <1), Cu, In, Ga, and Se raw materials are placed in a sealed container each having a spray nozzle and sprayed from the spray nozzle into a vacuum. By the supercooling effect due to adiabatic expansion at 1, the atoms of the raw material are loosely bound to each other to form a cluster of atomic clusters, and the cluster of atomic clusters is ionized and accelerated to form CuIn x Ga 1 -x Se 2 on the substrate.
CuIn x Ga 1-x S characterized by forming a film
e 2 A method for producing a thin film of a chalcopyrite compound.
【請求項4】 Cuのイオン化電流をIn及びGaのイ
オン化電流よりも大きくして加速することを特徴とする
請求項3記載のCuInx Ga1-x Se2 のカルコパイ
ライト型化合物の薄膜の作製方法。
4. The thin film of the chalcopyrite type compound of CuIn x Ga 1 -x Se 2 according to claim 3, characterized in that the ionization current of Cu is made larger than the ionization currents of In and Ga to accelerate it. Method.
【請求項5】 CuInSy Se2-y (但し0<y≦
2)のカルコパイライト型化合物の薄膜の作製方法にお
いて、Cu,In,S,Seの原料をそれぞれ噴射ノズ
ルを有した密閉形容器に入れてその噴射ノズルから真空
中に噴射させ、その真空中での断熱膨張による過冷却作
用によって前記原料の原子が互いに緩く結合した塊状原
子集団を形成し、この塊状原子集団をイオン化して加速
することにより基板上にCuInSy Se2-y 膜を成膜
させることを特徴とするCuInSy Se2-y のカルコ
パイライト型化合物の薄膜の作製方法。
5. CuInS y Se 2-y (where 0 <y ≦
In the method for producing a thin film of a chalcopyrite type compound according to 2), Cu, In, S and Se raw materials are placed in a sealed container having an injection nozzle and injected into a vacuum from the injection nozzle. By the supercooling action due to the adiabatic expansion of the above, the atoms of the raw material are loosely bound to each other to form a lumped atomic group, and the lumped atomic group is ionized and accelerated to form a CuInS y Se 2-y film on the substrate. A method for producing a thin film of a chalcopyrite type compound of CuInS y Se 2-y , characterized in that
【請求項6】 Cuのイオン化電流をInのイオン化電
流よりも大きくして加速することを特徴とする請求項5
記載のCuInSy Se2-y のカルコパイライト型化合
物の薄膜の作製方法。
6. The ionization current of Cu is made larger than that of In to accelerate the ionization current.
A method for producing a thin film of the chalcopyrite type compound of CuInS y Se 2 -y described.
【請求項7】 CuInx Ga1-xy Se2-y (但し
0≦x<1,0<y≦2)のカルコパイライト型化合物
の薄膜の作製方法においてCu,In,Ga,S,Se
の原料をそれぞれ噴射ノズルを有した密閉形容器に入れ
てその噴射ノズルから真空中に噴射させ、その真空中で
の断熱膨張による過冷却作用によって前記原料の原子が
互いに緩く結合した塊状原子集団を形成し、この塊状原
子集団をイオン化して加速することにより基板上にCu
Inx Ga1-xy Se2-y 膜を成膜させることを特徴
とするCuInx Ga1-xy Se2-y のカルコパイラ
イト型化合物の薄膜の作製方法。
7. A method for producing a thin film of a chalcopyrite type compound of CuIn x Ga 1-x S y Se 2-y (where 0 ≦ x <1,0 <y ≦ 2), wherein Cu, In, Ga, S, Se
Each of the raw materials is put in a closed container having a spray nozzle and sprayed into the vacuum from the spray nozzle, and a massive atomic group in which the atoms of the raw material are loosely bonded to each other by a supercooling action by adiabatic expansion in the vacuum is generated. Cu is formed on the substrate by ionizing and accelerating this massive atomic population.
In x Ga 1-x S y Se 2-y film CuIn x Ga 1-x S y Se 2-y method for manufacturing a thin film of the chalcopyrite-type compound, which is characterized in that for forming the.
【請求項8】 Cuのイオン化電流をIn及びGaのイ
オン化電流よりも大きくして加速することを特徴とする
請求項7記載のCuInx Ga1-x Se2-yのカルコパ
イライト型化合物の薄膜の作製方法。
8. The thin film of the chalcopyrite type compound of CuIn x Ga 1 -x Se 2-y according to claim 7, wherein the ionization current of Cu is made larger than the ionization currents of In and Ga to accelerate. Of manufacturing.
【請求項9】 基板上にCuInSe2 の薄膜を有した
太陽電池において、前記CuInSe2 の薄膜は、C
u,In,Seの原料を真空中に噴射させた時に形成さ
れる互いの原子が緩く結合した塊状原子集団をイオン化
して加速することにより成膜したことを特徴とするスー
パーストレート型の太陽電池。
9. A solar cell having a CuInSe 2 thin film on a substrate, wherein the CuInSe 2 thin film is C
A superstrate type solar cell characterized in that a film is formed by ionizing and accelerating a lumpy atomic group in which atoms of each of which are loosely bonded and formed when the raw materials of u, In, and Se are jetted in a vacuum. .
【請求項10】 基板上にCuInx Ga1-x Se2
(但し0≦x<1)の薄膜を有した太陽電池において、
前記CuInx Ga1-x Se2 の薄膜は、Cu,In,
Ga,Seの原料を真空中に噴射させた時に形成される
互いの原子が緩く結合した塊状原子集団をイオン化して
加速することにより成膜したことを特徴とするスーパー
ストレート型の太陽電池。
10. CuIn x Ga 1 -x Se 2 on a substrate
In a solar cell having a thin film (where 0 ≦ x <1),
The CuIn x Ga 1-x Se 2 thin film is made of Cu, In,
A super straight solar cell, wherein a film is formed by ionizing and accelerating a massive atomic group in which atoms of each Ga and Se are loosely bonded and formed when the raw materials of Ga and Se are injected into a vacuum.
【請求項11】 基板上にCuInSy Se2-y (但し
0<y≦2)の薄膜を有した太陽電池において、前記C
uInSy Se2-y の薄膜は、Cu,In,S,Seの
原料を真空中に噴射させた時に形成される互いの原子が
緩く結合した塊状原子集団をイオン化して加速すること
により成膜したことを特徴とするスーパーストレート型
の太陽電池。
11. A solar cell having a thin film of CuInS y Se 2-y (where 0 <y ≦ 2) on a substrate, wherein C
The thin film of uInS y Se 2-y is formed by ionizing and accelerating a massive atomic population in which atoms of each of the Cu, In, S, and Se formed when the raw materials are loosely bonded are formed. A super straight type solar cell that is characterized.
【請求項12】 基板上にCuInx Ga1-xy Se
2-y (但し0≦x<1,0<y≦2)の薄膜を有した太
陽電池において、前記CuInx Ga1-xy Se2-y
の薄膜は、Cu,In,Ga,S,Seの原料を真空中
に噴射させた時に形成される互いの原子が緩く結合した
塊状原子集団をイオン化して加速することにより成膜し
たことを特徴とするスーパーストレート型の太陽電池。
12. CuIn x Ga 1 -x S y Se on a substrate
In 2-y (where 0 ≦ x <1,0 <y ≦ 2) solar cell having a thin film of the CuIn x Ga 1-x S y Se 2-y
The thin film of is characterized by being formed by ionizing and accelerating a massive atomic population in which atoms of each of which are formed by spraying the raw materials of Cu, In, Ga, S, and Se into each other are loosely bound to each other. A super straight solar cell.
JP6017399A 1994-02-14 1994-02-14 Method for preparing thin film of chalcopyrite type compound Expired - Fee Related JP2732352B2 (en)

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WO2011021546A1 (en) * 2009-08-21 2011-02-24 Dowaホールディングス株式会社 Chalcogen compound powder, chalcogen compound paste, and method for producing chalcogen compound powder
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WO2012090339A1 (en) * 2010-12-28 2012-07-05 東北精機工業株式会社 Process for production of compound having chalcopyrite structure
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Non-Patent Citations (2)

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Title
11THE C PVSEC=1992 *
JPN J APPL PHYS=1992 *

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