JPH0721969A - Implanting amount counting device of ion implanter - Google Patents

Abstract

PURPOSE:To reduce an error of the practical ion implanting-amount to a set implanting amount by giving a function to count the neutralize beams by the pressure variation of an implanting member. CONSTITUTION:The beam current amount and the pressure in an implanting operation by an implanting member 1 is monitored, and the value data is delivered to a beam current correction controller 3. In the controller 3, it is decided whether the beam current is within a set scope or not, the rate of the neutralized beam is decided to calculate the correcting beam current amount, and the result is delivered to a dose controller 2. In the dose controller 2, the practical implanting amount is calculated, and the implantation is carried out until the practical implanting amount reaches to the set implanting amount. Consequently, the error between the set implanting amount and the practical implanting amount can be reduced by correcting the beam component neutralized by the pressure variation of the implanting member 1.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an implantation dose counting device for an ion implantation device, and more particularly to an implantation dose counting device for an ion implantation device having a function of counting beams that have been neutralized due to a change in implant portion pressure during implantation. .

[0002]

2. Description of the Related Art Referring to a block diagram of FIG. 3 showing a method of counting an implantation dose of a conventional ion implantation apparatus and FIG. 4 showing a flow chart of the implantation dose counting of FIG. The dose controller 2 calculates the execution injection amount and performs the injection until the set injection amount is reached.

That is, in process 40, the beam current amount during injection is monitored, and in the next process 41, it is judged whether or not the beam current amount is within the set range. If "NO", an alarm is issued in process 42. If YES, the execution injection amount is calculated in process 43, and it is determined whether or not the set injection amount is reached in process 44. If YES, the injection is completed (process 4).
6), and if “NO”, the process returns to step 45.

[0004]

According to the conventional method of counting the amount of implantation in the ion implantation apparatus, the beam neutralized due to the pressure change of the implant portion cannot be monitored, and the neutralized beam component is set and implanted. There was a problem of over-injection with respect to the amount.

[0005]

The structure of the present invention comprises means for monitoring the pressure of the implant part in an implant amount counting device of an ion implanter for monitoring the beam current amount at the implant part and calculating the implant amount. And a means for correcting the beam current amount monitored by the implant section by a change in the pressure of the implant section.

[0006]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT Referring to the block diagram of FIG. 1 showing an embodiment of the present invention, this embodiment comprises an implant part 1 which hits a beam 4, a beam current correction controller 3 and a dose controller 2.

First, the implant portion 1 monitors the beam current amount and pressure during implantation, and the amount data is sent to the beam current amount correction controller 3. The ratio of the neutralized beam 4 is determined from the pressure of the implant part 1 and the beam current amount is corrected.

The corrected beam current amount is adjusted to the dose controller 2
, The execution injection amount is calculated, and injection is performed until the set injection amount is reached.

Referring to FIG. 2 which illustrates the operation of the implant dose counter of FIG. 1, process 20 monitors the beam current during implant, and process 21 monitors the pressure during implant.
In process 22, it is determined whether or not the beam current amount is within the set range. If "YES", the process proceeds to process 25, and if "NO", an alarm is issued (process 24).

In step 23, it is judged whether the pressure is within the set range or not.
In the case of “O”, the processing shifts to processing 24.

In process 25, the ratio of the neutralized beam is determined, in the next process 26, the corrected beam current amount is calculated, in the next process 27, the execution injection amount is calculated, and in process 28, the set injection amount is calculated. It is determined whether or not the injection is completed. If “YES”, the injection is completed (process 30), and if “NO”, the process 2 is performed.
Return to the first at 9.

[0012]

As described above, the present invention has the function of counting the number of beams that have been neutralized due to the change in pressure at the implant portion, and thus has the effect of reducing the error in the actual injection amount relative to the set injection amount. .

[Brief description of drawings]

FIG. 1 is a block diagram of an apparatus according to an embodiment of the present invention.

FIG. 2 is a flow chart of counting an injection amount in the embodiment of FIG.

FIG. 3 is a block diagram of a conventional device.

FIG. 4 is a flow chart of conventional injection amount counting.

[Explanation of symbols]

 1 Implant part 2 Dose controller 3 Beam current correction controller 20-30, 40-46 Processing

Claims (1)

[Claims] 1. An implant dose counting device of an ion implanter for monitoring a beam current amount at an implant part and calculating an implant dose, a means for monitoring the pressure of the implant part, and a beam monitored at the implant part. An implanting dose counting device for an ion implanting device, comprising: means for correcting a current amount by a change in pressure of the implant portion.