JPH07168011A - Optical system including total reflection prism - Google Patents

Optical system including total reflection prism

Info

Publication number
JPH07168011A
JPH07168011A JP31198793A JP31198793A JPH07168011A JP H07168011 A JPH07168011 A JP H07168011A JP 31198793 A JP31198793 A JP 31198793A JP 31198793 A JP31198793 A JP 31198793A JP H07168011 A JPH07168011 A JP H07168011A
Authority
JP
Japan
Prior art keywords
total reflection
reflection prism
prism
component
polarized light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP31198793A
Other languages
Japanese (ja)
Other versions
JP3340824B2 (en
Inventor
Koji Machida
孝二 町田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LASER TEC KK
Original Assignee
LASER TEC KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LASER TEC KK filed Critical LASER TEC KK
Priority to JP31198793A priority Critical patent/JP3340824B2/en
Publication of JPH07168011A publication Critical patent/JPH07168011A/en
Application granted granted Critical
Publication of JP3340824B2 publication Critical patent/JP3340824B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To provide an optical system including a total reflection prism whereby incoming and outgoing beams of light are made to have the same polarization characteristic. CONSTITUTION:An optical system includes a total reflection prism 11 that provides a phase difference of 90 deg. between the P- and S-components of incoming and outgoing beams of light and a quarter wavelength plate 13 disposed opposite to the incidence plane 12 of the prism. When a plane-polarized laser beam 17 is made to impinge on the quarter wavelength plate 13 by properly adjusting the directions of the total reflection surfaces 14, 16 of the total reflection prism 11 and that of the crystal axis of the quarter wavelength plate 13, the outgoing beam emitted from the total reflection prism 11 also becomes plane-polarized; i.e., a laser beam of the same polarization characteristic as the laser beam 17 impinging on the quarter wavelength plate 13 is emitted from the plane 15 of emission of light.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、例えばフォトマスク検
査装置の2個の対物レンズの間隔を受光側を固定したま
ま変化させるのに用いる全反射プリズムを含む光学系に
関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical system including a total reflection prism used for changing the distance between two objective lenses of a photomask inspection apparatus while keeping the light receiving side fixed.

【0002】[0002]

【従来の技術】一定のパターンを有するフォトマスクの
欠陥を検査するフォトマスク検査装置では、2個の対物
レンズを介してフォトマスクの互いに対応する領域に光
を照射し、これらの反射光または透過光から得られる信
号の差を求めることにより欠陥を検出している。このよ
うなフォトマスク欠陥検査装置においては、被検体の同
一部分を同時に検出できるように2個の対物レンズの間
隔を、受光側を固定したままで変えることができるよう
にしている。
2. Description of the Related Art In a photomask inspection apparatus for inspecting a photomask having a certain pattern for defects, light is applied to regions corresponding to each other of the photomask through two objective lenses to reflect or transmit the reflected light or the transmitted light. Defects are detected by finding the difference between the signals obtained from the light. In such a photomask defect inspection apparatus, the distance between the two objective lenses can be changed while the light receiving side is fixed so that the same portion of the subject can be detected at the same time.

【0003】図5は、従来の全反射プリズムを含む光学
系の概略構成図である。この全反射プリズムを含む光学
系は、第1の平行四辺形全反射プリズム1に第2の平行
四辺形全反射プリズム2を、第3の平行四辺形全反射プ
リズム3に第4の平行四辺形全反射プリズム4をそれぞ
れ直角に張り合わせた構造であり、第1および第3の全
反射プリズム1および3を、第1の全反射プリズムから
第3の全反射プリズムの入射する光の光軸を中心に相互
回転するようにしている。このような全反射プリズムを
含む光学系を用いて2つの対物レンズの光軸の間隔を変
化させることができる。
FIG. 5 is a schematic configuration diagram of an optical system including a conventional total reflection prism. An optical system including this total reflection prism includes a first parallelogram total reflection prism 1 with a second parallelogram total reflection prism 2 and a third parallelogram total reflection prism 3 with a fourth parallelogram total reflection prism 3. The total reflection prisms 4 are attached to each other at right angles, and the first and third total reflection prisms 1 and 3 are centered on the optical axis of the light incident from the first total reflection prism to the third total reflection prism. I am trying to rotate with each other. An optical system including such a total reflection prism can be used to change the distance between the optical axes of the two objective lenses.

【0004】近年照射光源として直線偏光を放射するレ
ーザが使用されるようになってきたが、上述した光学系
を使用する場合には、全反射プリズム等の回転に伴う偏
光特性への影響が問題となっている。すなわち、全反射
面に直線偏光を入射させた場合、一か所の全反射面での
P偏光成分とS偏光成分の位相差は、その面への入射角
と屈折率により決まるが、入射光軸の回りに反射面が回
転するとP偏光成分とS偏光成分の振幅の比率が変化
し、PS偏光の位相差は一定でありながらも例えば位相
差が90°の場合出射光は直線偏光から円偏光の間で変化
する。図6は、図5の平行四辺形の全反射プリズム1お
よび3を2個組み合わせた光学系の概略構成図である。
図6に示すように平行四辺形プリズムを2個組み合わせ
た光学系を軸Gの回りで相対的に回転させると、軸Aと
軸Cの偏光特性は同一とならない。このような不具合を
なくすために、図5に示した光学系においては、第1お
よび第3の全反射プリズム1および3にそれぞれ第2お
よび第4の全反射プリズムを結合してPS偏光成分間の
位相差を相殺するようにしている。
In recent years, a laser emitting linearly polarized light has been used as an irradiation light source. However, when the above-mentioned optical system is used, there is a problem that the polarization characteristics are affected by the rotation of the total reflection prism or the like. Has become. That is, when linearly polarized light is incident on the total reflection surface, the phase difference between the P-polarized component and the S-polarized component on one total reflection surface is determined by the incident angle and the refractive index on that surface. When the reflection surface rotates around the axis, the ratio of the amplitudes of the P-polarized component and the S-polarized component changes, and the phase difference of PS polarized light is constant, but for example, when the phase difference is 90 °, the outgoing light is circularly polarized light and circularly polarized light. It changes between polarizations. FIG. 6 is a schematic configuration diagram of an optical system in which two parallelogram total reflection prisms 1 and 3 of FIG. 5 are combined.
When the optical system in which two parallelogram prisms are combined as shown in FIG. 6 is relatively rotated around the axis G, the polarization characteristics of the axes A and C are not the same. In order to eliminate such inconvenience, in the optical system shown in FIG. 5, the second and fourth total reflection prisms are coupled to the first and third total reflection prisms 1 and 3, respectively, and the PS polarization components The phase difference of is canceled out.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、図5に
示すような全反射プリズムを含む光学系では全反射プリ
ズムを4個も使用する必要があり、それだけ反射面が多
くなるため面精度の誤差が積算されることになり、解像
度が低下するという欠点がある。また、光軸のオフセッ
ト量、全反射プリズムを張り合わせる際のねじれ等の機
械的寸法の調整誤差によって入射光と出射光との間に偏
角が起きるなどの種々の問題により所望の光学的特性を
得ることができない欠点がある。
However, in an optical system including a total reflection prism as shown in FIG. 5, it is necessary to use four total reflection prisms, and since the number of reflection surfaces increases, the surface accuracy error is increased. There is a disadvantage that the resolution is reduced because the data is integrated. Also, due to various problems such as an offset amount of the optical axis and an adjustment error of mechanical dimensions such as twisting when attaching the total reflection prism, a deviation angle occurs between the incident light and the emitted light, and the desired optical characteristics are obtained. There is a drawback that cannot be obtained.

【0006】本発明の目的は、上述した問題が発生する
ことなく、全反射プリズムの入射光と出射光との偏光特
性を正確かつ簡単に等しくすることができ、その結果と
して所望の光学的特性を得ることができる全反射プリズ
ムを含む光学系を提供しようとするものである。
An object of the present invention is to make it possible to exactly and easily equalize the polarization characteristics of incident light and output light of a total reflection prism without causing the above-mentioned problems, and as a result, to obtain desired optical characteristics. It is intended to provide an optical system including a total reflection prism capable of obtaining

【0007】[0007]

【課題を解決するための手段】本発明の全反射プリズム
を含む光学系は、少なくとも1つの全反射面を有し、入
射直線偏光のP成分とS成分との間に90°の位相差を導
入する全反射プリズムと、1/4 波長板とを具え、この1/
4 波長板の結晶軸の方向と全反射プリズムの全反射面と
の方向とを、出射直線偏光のP成分とS成分との間の位
相差が零となるように調整したことを特徴とするもので
ある。
An optical system including a total reflection prism of the present invention has at least one total reflection surface, and has a phase difference of 90 ° between the P component and the S component of incident linearly polarized light. It is equipped with a total reflection prism to be introduced and a 1/4 wavelength plate.
4 The crystal axis of the wave plate and the direction of the total reflection surface of the total reflection prism are adjusted so that the phase difference between the P component and the S component of the outgoing linearly polarized light becomes zero. It is a thing.

【0008】さらに本発明の全反射プリズムを含む光学
系は、互いに平行な入射面および出射面と、互いに平行
な第1および第2の全反射面を有し、入射直線偏光のP
成分とS成分との間に90°の位相差を導入する第1の平
行四辺形全反射プリズムと、互いに平行な入射面および
出射面と、互いに平行な第1および第2の全反射面を有
し、入射直線偏光のP成分とS成分との間に90°の位相
差を導入する第2の平行四辺形全反射プリズムと、前記
第1の全反射プリズムの入射面に対向して配置された第
1の1/4 波長板と、前記第2の全反射プリズムの出射面
に対向して配置された第2の1/4 波長板とを具え、前記
第1の全反射プリズムの第1の全反射面および第1の1/
4 波長板の結晶軸の方向および前記第2の全反射プリズ
ムの第2の全反射面および第2の1/4 波長板の結晶軸の
方向を出射直線偏光のP成分とS成分との間の位相差が
零となるように調整し、前記第1の全反射プリズムの第
2反射面と出射面との間の光軸と前記第2の全反射プリ
ズムの入射面と第1反射面との間の光軸とを一致させ、
これら第1および第2の全反射プリズムを前記光軸を中
心に相互回転し得るように構成したことを特徴とするも
のである。
Further, the optical system including the total reflection prism of the present invention has an entrance surface and an exit surface that are parallel to each other, and first and second total reflection surfaces that are parallel to each other.
A first parallelogram total reflection prism that introduces a 90 ° phase difference between the S component and the S component, an incident surface and an emission surface that are parallel to each other, and a first and second total reflection surfaces that are parallel to each other. A second parallelogram total reflection prism for introducing a phase difference of 90 ° between the P component and the S component of the incident linearly polarized light, and the second parallelogram total reflection prism is arranged to face the incident surface of the first total reflection prism. A first quarter-wave plate and a second quarter-wave plate arranged to face the exit surface of the second total reflection prism. 1 total reflection surface and the first 1 /
4 The direction of the crystal axis of the wave plate and the direction of the crystal axis of the second total reflection surface of the second total reflection prism and the second 1/4 wave plate are between the P component and the S component of the outgoing linearly polarized light. Of the first total reflection prism and the optical axis between the second reflection surface and the emission surface of the first total reflection prism and the incident surface and the first reflection surface of the second total reflection prism. The optical axis between
It is characterized in that the first and second total reflection prisms are configured so as to be mutually rotatable about the optical axis.

【0009】[0009]

【作用】本発明の全反射プリズムを含む光学系では、直
線偏光のP成分とS成分との間に90°の位相差を与える
全反射プリズムを用いる場合、直線偏光の光を全反射プ
リズムに入射させると、上述したように円偏光または楕
円偏光の光が出射し、逆に円偏光または楕円偏光を入射
させると直線偏光が出射する。また、1/4 波長板も同様
の機能を有している。したがって全反射プリズムと1/4
波長板とを組み合わせ、全反射面の方向と1/4 波長板の
結晶軸の方向とを調整することによってP成分とS成分
との位相差を零とすることができ、入射光と出射光との
偏光特性を等しくすることができる。すなわち、直線偏
光を入射させた場合に同じ偏光面を持つ直線偏光を出射
させることができる。
In the optical system including the total reflection prism of the present invention, when the total reflection prism that gives a phase difference of 90 ° between the P component and the S component of the linearly polarized light is used, the linearly polarized light is converted into the total reflection prism. When incident, circularly polarized light or elliptically polarized light is emitted as described above, and conversely, when circularly polarized light or elliptically polarized light is incident, linearly polarized light is emitted. The quarter-wave plate also has a similar function. Therefore, a total reflection prism and 1/4
The phase difference between the P and S components can be made zero by combining the wave plate with the direction of the total reflection surface and the direction of the crystal axis of the 1/4 wave plate, and the incident light and the outgoing light can be made zero. And the polarization characteristics can be made equal. That is, when linearly polarized light is made incident, linearly polarized light having the same polarization plane can be emitted.

【0010】また、現在の技術では1個の全反射プリズ
ムは十分な機械的精度を以て製造することができるた
め、上述した多数の反射面を用いることによる解像度の
低下や光軸のオフセット量、全反射プリズムを張り合わ
せる際のねじれ等の機械的寸法の調整の問題がなくな
り、したがって出射光の偏光特性を入射光の偏光特性と
正確かつ容易に一致させることができ、光学特性の良好
な光学系を実現できるようになった。
Further, in the present technology, one total reflection prism can be manufactured with sufficient mechanical accuracy. Therefore, the decrease in resolution, the amount of offset of the optical axis and the total amount of reflection caused by using the above-mentioned multiple reflection surfaces. There is no problem of adjusting mechanical dimensions such as twisting when attaching the reflecting prism, and therefore the polarization characteristics of the outgoing light can be accurately and easily matched with the polarization characteristics of the incident light, and an optical system with good optical characteristics can be obtained. Can be realized.

【0011】[0011]

【実施例】本発明の全反射プリズムを含む光学系の実施
例を図面を参照して詳細に説明する。図1は本発明の全
反射プリズムを含む光学系の第1実施例の概略構成図で
ある。図1において全反射プリズムを含む光学系は、直
線偏光のP成分とS成分との間に90°の位相差を導入す
る平行四辺形の全反射プリズム11と、この全反射プリ
ズムの入射面12と対向して配置した1/4 波長板13と
を具える。本例ではこの全反射プリズム11は、例えば
He-Ne レーザ(波長632.8nm )用のものであり、硝材と
してLLF1を使用したもので、入射面12には中心波長が
632.8nm の反射防止膜を形成する。また、入射面12と
第1反射面14との間の角θ1 および出射面15と第2
反射面16との間の角θ2 をともに45.54 ±0.03°とす
る。本発明においては、全反射プリズム11によって導
入される位相差を相殺するために、1/4 波長板13を設
け、その結晶軸を全反射面14,16の方向に対して調
整するものである。
Embodiments of an optical system including a total reflection prism of the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic configuration diagram of a first embodiment of an optical system including a total reflection prism of the present invention. In FIG. 1, an optical system including a total reflection prism includes a parallelogram total reflection prism 11 for introducing a phase difference of 90 ° between the P component and the S component of linearly polarized light, and an incident surface 12 of the total reflection prism. And a quarter-wave plate 13 arranged so as to face each other. In this example, the total reflection prism 11 is, for example,
It is for He-Ne laser (wavelength 632.8nm) and uses LLF1 as a glass material.
An antireflection film of 632.8 nm is formed. In addition, the angle θ 1 between the incident surface 12 and the first reflecting surface 14 and the angle between the exit surface 15 and the second reflecting surface 14
The angle θ 2 with the reflecting surface 16 is both 45.54 ± 0.03 °. In the present invention, in order to cancel the phase difference introduced by the total reflection prism 11, a quarter wave plate 13 is provided and its crystal axis is adjusted with respect to the directions of the total reflection surfaces 14 and 16. .

【0012】本例の光学系において、全反射プリズム1
1と1/4 波長板13との調整は種々の方法で行うことが
できるが、先ず基本的な調整方法について説明する。最
初に直線偏光された入射レーザ光17の偏光方向に対し
て1/4 波長板13の結晶軸が45°傾くように調整する。
このために1/4 波長板13を、その平面内で回転可能に
支持する機構を設けるのが好適である。このように調整
すると、直線偏光されたレーザ光17は1/4 波長板13
によって円偏光に変換されて出射することになる。この
円偏光は全反射プリズム11の入射面12を介して第1
の全反射面14に入射され、続いて第2の全反射面16
で反射されて出射面15から出射する。この全反射プリ
ズムは上述したようにP偏光とS偏光との間で90°の位
相差を生じさせる作用を有しているが、直線偏光を入射
させたときには、入射面と全反射面との相対位置関係に
よって円偏光を出射したり楕円偏光を出射することにな
る。そこで、本例においては入射円偏光を直線偏光に変
換するように、すなわち入射面と全反射面とが互いに直
交するように全反射プリズム11を調整する。このよう
に調整すると、直線偏光された入射レーザ光17は1/4
波長板13および全反射プリズム11を透過することに
よってP成分とS成分との間の位相差は零となるととも
に振幅も等しいものとなり、入射レーザ光17と等しい
偏光特性を有する直線偏光として全反射プリズム11の
出射面15から出射することになる。
In the optical system of this example, the total reflection prism 1
The adjustment of the 1/4 wave plate 13 can be performed by various methods. First, the basic adjustment method will be described. First, the crystal axis of the quarter-wave plate 13 is adjusted to be inclined by 45 ° with respect to the polarization direction of the linearly polarized incident laser light 17.
For this reason, it is preferable to provide a mechanism for rotatably supporting the quarter-wave plate 13 in its plane. When adjusted in this way, the linearly polarized laser light 17 is emitted by the quarter-wave plate 13
The light is converted into circularly polarized light by and emitted. This circularly polarized light is transmitted through the incident surface 12 of the total reflection prism 11 to the first
Is incident on the total reflection surface 14 of the
And is emitted from the emission surface 15. As described above, this total reflection prism has a function of causing a 90 ° phase difference between the P-polarized light and the S-polarized light. However, when linearly polarized light is made incident on the incident surface and the total reflection surface, Circularly polarized light or elliptically polarized light is emitted depending on the relative positional relationship. Therefore, in this example, the total reflection prism 11 is adjusted so as to convert the incident circularly polarized light into the linearly polarized light, that is, so that the incident surface and the total reflection surface are orthogonal to each other. With this adjustment, the linearly polarized incident laser light 17 is 1/4
By transmitting through the wave plate 13 and the total reflection prism 11, the phase difference between the P component and the S component becomes zero and the amplitudes become equal, and total reflection is performed as linearly polarized light having the same polarization characteristics as the incident laser light 17. The light is emitted from the emission surface 15 of the prism 11.

【0013】本発明による光学系の調整方法の他の例を
説明する。本例では、先ず全反射プリズム11の入射面
14の位置を固定した後、直線偏光を入射させ、全反射
プリズムから直線偏光が出射されるように1/4 波長板1
3を回転調整して固定する。このように調整すれば、全
反射プリズム11および1/4 波長板13の相対位置を変
えない限り入射直線偏光に対して光学系をどのように設
定しても常に直線偏光が出射されることになる。したが
って、光学系を入射光軸Aを中心として回動させても偏
光特性が変化することはない。
Another example of the adjusting method of the optical system according to the present invention will be described. In this example, first, the position of the incident surface 14 of the total reflection prism 11 is fixed, then linearly polarized light is made incident, and the 1/4 wavelength plate 1 is made to emit linearly polarized light from the total reflection prism.
Adjust the rotation of 3 and fix it. With this adjustment, linearly polarized light will always be emitted regardless of how the optical system is set for incident linearly polarized light, unless the relative positions of the total reflection prism 11 and the quarter-wave plate 13 are changed. Become. Therefore, the polarization characteristics do not change even if the optical system is rotated about the incident optical axis A.

【0014】上述したしたように本発明によれば、全反
射プリズム11と1/4 波長板13または1/4 波長板を調
整することによって、全反射プリズム11で導入される
偏光特性を、これとは逆の偏光特性を1/4 波長板13で
発生させることによって相殺除去することができ、出射
光の偏光特性を入射光の偏光特性に等しくすることがで
きる。この場合、全反射プリズム11および/または1/
4 波長板13の調整は従来の全反射プリズムを用いる場
合に比べて大幅に簡単かつ正確とすることができる。
As described above, according to the present invention, by adjusting the total reflection prism 11 and the 1/4 wavelength plate 13 or the 1/4 wavelength plate, the polarization characteristics introduced by the total reflection prism 11 are The polarization characteristic opposite to that can be offset and removed by generating the quarter-wave plate 13 and the polarization characteristic of the emitted light can be made equal to the polarization characteristic of the incident light. In this case, the total reflection prism 11 and / or 1 /
4 The adjustment of the wave plate 13 can be made significantly easier and more accurate than in the case where the conventional total reflection prism is used.

【0015】図2は本発明の全反射プリズムを含む光学
系の第2実施例の概略構成図である。図1に示した実施
例では直線偏光を1/4 波長板13に入射させた後に全反
射プリズム11に入射させたが、本例ではこの関係を逆
とし、直線偏光を先ず全反射プリズム21に入射させた
後、1/4 波長板22に入射させるようにしたものであ
る。本例では入射直線偏光は全反射プリズム21によっ
て円偏光または直線偏光に変換されるが、1/4 波長板2
2によって直線偏光に戻されるので、前例と同様に出射
光の偏光特性を入射光の偏光特性と一致させることがで
きる。なお本例でも、全反射プリズム21と1/4 波長板
22とを一緒に出射光軸Bの回りで回転させても出射光
の偏光特性には影響がない。
FIG. 2 is a schematic configuration diagram of a second embodiment of an optical system including a total reflection prism of the present invention. In the embodiment shown in FIG. 1, linearly polarized light is made incident on the quarter-wave plate 13 and then made incident on the total reflection prism 11, but in this example, this relationship is reversed, and the linearly polarized light is first made on the total reflection prism 21. After being made incident, it is made incident on the quarter-wave plate 22. In this example, the incident linearly polarized light is converted into circularly polarized light or linearly polarized light by the total reflection prism 21.
Since the light is returned to the linearly polarized light by 2, it is possible to match the polarization characteristic of the emitted light with the polarization characteristic of the incident light as in the previous example. Also in this example, even if the total reflection prism 21 and the quarter-wave plate 22 are rotated together around the output optical axis B, the polarization characteristics of the output light are not affected.

【0016】図3は本発明の全反射プリズムを含む光学
系の第3実施例の構成を示す斜視図であり、図4はその
正面図である。本例の光学系は、上述したホトマスクの
欠陥検査装置において、2つの対物レンズの光軸間の距
離を調整する光学系として使用することができるもので
ある。図4において全反射プリズムを含む光学系は、図
1の全反射プリズム11と同一の材質および形状の第1
および第2の全反射プリズム31および32と、第1の
全反射プリズム31の入射面33と対向して配置された
第1の1/4 波長板34と、第2の全反射プリズム32の
出射面35と対向して配置された第2の1/4 波長板36
とを具える。また、第1の全反射プリズム31の出射面
と第2の全反射プリズム32の入射面とを対向させると
ともに両プリズムを軸Cを中心として相対的に回動でき
るように結合する。
FIG. 3 is a perspective view showing the structure of a third embodiment of an optical system including a total reflection prism of the present invention, and FIG. 4 is a front view thereof. The optical system of this example can be used as an optical system for adjusting the distance between the optical axes of two objective lenses in the above-described photomask defect inspection apparatus. In FIG. 4, the optical system including the total reflection prism is the same as the total reflection prism 11 of FIG.
And the second total reflection prisms 31 and 32, the first quarter-wave plate 34 arranged to face the entrance surface 33 of the first total reflection prism 31, and the emission of the second total reflection prism 32. Second quarter-wave plate 36 arranged opposite to the surface 35
And with. Further, the exit surface of the first total reflection prism 31 and the entrance surface of the second total reflection prism 32 are opposed to each other, and both prisms are coupled so as to be relatively rotatable about the axis C.

【0017】第1の全反射プリズム31の全反射面と第
1の1/4 波長板34の結晶軸とを図1に示した実施例で
説明したように調整して第1の1/4 波長板に直線偏光3
7を入射させた場合に第1の全反射プリズムの出射面か
ら直線偏光が出射されるようにする。同様に第2の全反
射プリズム32の全反射面と第2の1/4 波長板36の結
晶軸とを図2に示した実施例で説明したように調整して
第2の全反射プリズムの入射面に直線偏光が入射された
場合に第2の1/4 波長板36から直線偏光が出射される
ようにする。
The total reflection surface of the first total reflection prism 31 and the crystal axis of the first quarter wave plate 34 are adjusted as described in the embodiment shown in FIG. Linearly polarized light on the wave plate 3
When 7 is incident, linearly polarized light is emitted from the emission surface of the first total reflection prism. Similarly, the total reflection surface of the second total reflection prism 32 and the crystal axis of the second quarter-wave plate 36 are adjusted as described in the embodiment shown in FIG. When the linearly polarized light is made incident on the incident surface, the second 1/4 wavelength plate 36 is made to emit the linearly polarized light.

【0018】本例においても第1の1/4 波長板34に直
線偏光37を入射させた場合、第2の1/4 波長板36か
ら入射直線偏光と同じ偏光特性を有する直線偏光が出射
されることになり、この関係は第1の1/4 波長板34お
よび第1の全反射プリズム31を一体として軸Dの回り
に回動させたり、第2の1/4 波長板36および第2の全
反射プリズム32を一体として軸Eの回りで回動させて
も変化しない。すなわち、本例の光学系を上述したホト
マスク欠陥検査装置に適用した場合、対物レンズの光軸
間の間隔を変化させるために光学系を回動させても偏光
特性が何ら変化しないことになる。
Also in this example, when the linearly polarized light 37 is made incident on the first 1/4 wavelength plate 34, the second 1/4 wavelength plate 36 outputs linearly polarized light having the same polarization characteristics as the incident linearly polarized light. This relationship means that the first quarter-wave plate 34 and the first total reflection prism 31 are integrally rotated about the axis D, and the second quarter-wave plate 36 and the second quarter-wave plate 36 are rotated. It does not change even if the total reflection prism 32 is rotated around the axis E as a unit. That is, when the optical system of the present example is applied to the photomask defect inspection apparatus described above, the polarization characteristics do not change at all even if the optical system is rotated to change the distance between the optical axes of the objective lenses.

【0019】[0019]

【発明の効果】上述したように本発明の全反射プリズム
を含む光学系によれば、全反射プリズムによって導入さ
れるP偏光成分とS偏光成分との位相差を1/4 波長板に
よって相殺して零とすることができ、したがって入射光
と出射光との偏光特性を等しくすることができる。この
場合、全反射プリズムの全反射面と1/4 波長板の結晶軸
との調整は非常に簡単にかつ正確に行うことができるの
で、所望の光学的特性を容易に得ることができる。ま
た、本発明の光学系を例えばフォトマスク検査装置に用
いる場合、2つの対物レンズの光軸間の間隔を調整して
も偏光特性が変化することはないので、装置全体の光学
特性が変化することもない。
As described above, according to the optical system including the total reflection prism of the present invention, the phase difference between the P polarization component and the S polarization component introduced by the total reflection prism is canceled by the 1/4 wavelength plate. Therefore, the polarization characteristics of the incident light and the outgoing light can be made equal to each other. In this case, the total reflection surface of the total reflection prism and the crystal axis of the quarter-wave plate can be adjusted very easily and accurately, so that desired optical characteristics can be easily obtained. Further, when the optical system of the present invention is used in, for example, a photomask inspection apparatus, the polarization characteristics do not change even if the distance between the optical axes of the two objective lenses is adjusted, so the optical characteristics of the entire apparatus change. Nothing.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の全反射プリズムを含む光学系の第1実
施例の概略構成図である。
FIG. 1 is a schematic configuration diagram of a first embodiment of an optical system including a total reflection prism of the present invention.

【図2】本発明の全反射プリズムを含む光学系の第2実
施例の概略構成図である。
FIG. 2 is a schematic configuration diagram of a second embodiment of an optical system including a total reflection prism of the present invention.

【図3】本発明の全反射プリズムを含む光学系の第3実
施例の概略構成図である。
FIG. 3 is a schematic configuration diagram of a third embodiment of an optical system including a total reflection prism of the present invention.

【図4】本発明の全反射プリズムを含む光学系の第3実
施例の側面図である。
FIG. 4 is a side view of a third embodiment of an optical system including a total reflection prism of the present invention.

【図5】従来の全反射プリズムを含む光学系の概略構成
図である。
FIG. 5 is a schematic configuration diagram of an optical system including a conventional total reflection prism.

【図6】平行四辺形の全反射プリズムを2個組み合わせ
た光学系の概略構成図である。
FIG. 6 is a schematic configuration diagram of an optical system in which two parallelogram total reflection prisms are combined.

【符号の説明】[Explanation of symbols]

11,21,31,32 全反射プリズム 12 入射面 13,22,34,36 1/4 波長板 14 第1反射面 15,35 出射面 16 第2反射面 17,37 レーザ光 A,B,C,D,E 軸 11, 21, 31, 32 Total reflection prism 12 Incident surface 13, 22, 34, 36 1/4 wavelength plate 14 First reflection surface 15, 35 Emission surface 16 Second reflection surface 17, 37 Laser light A, B, C , D, E axis

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 少なくとも1つの全反射面を有し、入射
直線偏光のP成分とS成分との間に90°の位相差を導入
する全反射プリズムと、1/4 波長板とを具え、この1/4
波長板の結晶軸の方向と全反射プリズムの全反射面との
方向とを、出射直線偏光のP成分とS成分との間の位相
差が零となるように調整したことを特徴とする全反射プ
リズムを含む光学系。
1. A total reflection prism having at least one total reflection surface, which introduces a phase difference of 90 ° between the P component and the S component of incident linearly polarized light, and a quarter wavelength plate, This 1/4
The direction of the crystal axis of the wave plate and the direction of the total reflection surface of the total reflection prism are adjusted so that the phase difference between the P component and the S component of the outgoing linearly polarized light is zero. Optical system including a reflecting prism.
【請求項2】 互いに平行な入射面および出射面と、互
いに平行な第1および第2の全反射面を有し、入射直線
偏光のP成分とS成分との間に90°の位相差を導入する
第1の平行四辺形全反射プリズムと、互いに平行な入射
面および出射面と、互いに平行な第1および第2の全反
射面を有し、入射直線偏光のP成分とS成分との間に90
°の位相差を導入する第2の平行四辺形全反射プリズム
と、前記第1の全反射プリズムの入射面に対向して配置
された第1の1/4 波長板と、前記第2の全反射プリズム
の出射面に対向して配置された第2の1/4 波長板とを具
え、前記第1の全反射プリズムの第1の全反射面および
第1の1/4 波長板の結晶軸の方向および前記第2の全反
射プリズムの第2の全反射面および第2の1/4 波長板の
結晶軸の方向を出射直線偏光のP成分とS成分との間の
位相差が零となるように調整し、前記第1の全反射プリ
ズムの第2反射面と出射面との間の光軸と前記第2の全
反射プリズムの入射面と第1反射面との間の光軸とを一
致させ、これら第1および第2の全反射プリズムを前記
光軸を中心に相互回転し得るように構成したことを特徴
とする全反射プリズムを含む光学系。
2. An incident surface and an exit surface which are parallel to each other and first and second total reflection surfaces which are parallel to each other, and a phase difference of 90 ° between the P component and the S component of the incident linearly polarized light. The first parallelogram total reflection prism to be introduced, the incident surface and the exit surface parallel to each other, and the first and second total reflection surfaces parallel to each other, the P component and the S component of the incident linearly polarized light Between 90
A second parallelogram total reflection prism that introduces a phase difference of °; a first quarter-wave plate facing the entrance surface of the first total reflection prism; and the second total reflection prism. A first quarter-wave plate of the first total reflection prism and a crystal axis of the first quarter-wave plate of the first total reflection prism. And the direction of the crystal axes of the second total reflection surface of the second total reflection prism and the second quarter-wave plate are such that the phase difference between the P component and the S component of the outgoing linearly polarized light is zero. And an optical axis between the second reflection surface and the emission surface of the first total reflection prism and an optical axis between the incidence surface and the first reflection surface of the second total reflection prism. And the first and second total reflection prisms are configured to be mutually rotatable about the optical axis. No optical system.
JP31198793A 1993-12-13 1993-12-13 Optical system including total reflection prism Expired - Fee Related JP3340824B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31198793A JP3340824B2 (en) 1993-12-13 1993-12-13 Optical system including total reflection prism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31198793A JP3340824B2 (en) 1993-12-13 1993-12-13 Optical system including total reflection prism

Publications (2)

Publication Number Publication Date
JPH07168011A true JPH07168011A (en) 1995-07-04
JP3340824B2 JP3340824B2 (en) 2002-11-05

Family

ID=18023843

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31198793A Expired - Fee Related JP3340824B2 (en) 1993-12-13 1993-12-13 Optical system including total reflection prism

Country Status (1)

Country Link
JP (1) JP3340824B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010508511A (en) * 2006-10-31 2010-03-18 ジェイ・エイ・ウーラム・カンパニー・インコーポレイテッド Substantially achromatic retarder that self-compensates for declination
JP2013130583A (en) * 2005-11-15 2013-07-04 Nikon Corp Plane position detector, exposure apparatus, and method for manufacturing device
US9594316B2 (en) 2005-11-15 2017-03-14 Nikon Corporation Surface positioning detecting apparatus, exposure apparatus and device manufacturing method
CN108873128A (en) * 2018-09-05 2018-11-23 四川新易盛通信技术有限公司 Prism, the application method of prism, prism group and optical assembly

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013130583A (en) * 2005-11-15 2013-07-04 Nikon Corp Plane position detector, exposure apparatus, and method for manufacturing device
US9594316B2 (en) 2005-11-15 2017-03-14 Nikon Corporation Surface positioning detecting apparatus, exposure apparatus and device manufacturing method
JP2010508511A (en) * 2006-10-31 2010-03-18 ジェイ・エイ・ウーラム・カンパニー・インコーポレイテッド Substantially achromatic retarder that self-compensates for declination
JP2012141623A (en) * 2006-10-31 2012-07-26 J A Woollam Co Inc Retarder system
CN108873128A (en) * 2018-09-05 2018-11-23 四川新易盛通信技术有限公司 Prism, the application method of prism, prism group and optical assembly
CN108873128B (en) * 2018-09-05 2024-02-23 四川新易盛通信技术有限公司 Prism, method for using prism as light beam adjuster, prism set and light assembly

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