JPH07146523A - Silver halide photographic sensitive material - Google Patents

Abstract

PURPOSE:To enhance contrast and to improve fluctuation of sensitivity and occurrence of fog by incorporating a specified compound in a silver halide emulsion layer. CONSTITUTION:The silver halide emulsion layer and/or another hydrophilic colloidal layer formed on a support contains a tetrazolium compound and this emulsion layer contains the compounds represented by formulae I-III in which R<1> is sulfoalkyl or sulfoalkenyl; each of R<2>-R<4> is alkyl, alkenyl, or the like; each of V<1>-V<4> is alkyl, alkoxy, or the like and at least one of V<3> and V<4> is alkoxycarbonyl or the like; each of L<1> and L<2> is a methine group; L is a 2-6 C methylene chain; M is H, an alkali metal atom, or the like; Z<11> is a nonmetallic atomic group necessary to form a 5- or 6-membered N-containing heterocyclic group except an imidazole ring; R<11> is sulfoalkyl or the like; each of R<12> and R<13> is same as each of R<2>--R<4>.

Description

Detailed Description of the Invention

The present invention relates to a silver halide photographic light-sensitive material having a silver halide light-sensitive layer on a support, and more particularly to a silver halide photographic light-sensitive material capable of obtaining high contrast.

[0002]

2. Description of the Related Art The photolithography process includes a process of converting a continuous-tone original into a halftone dot image. In this process, a technique based on infectious development has been used as a photographic technique capable of reproducing an image in ultra-high contrast.

The lithographic silver halide photographic light-sensitive material used for infectious development has, for example, an average particle diameter of 0.2 μm, a narrow particle distribution and a well-shaped particle shape, and a high silver chloride content (at least 50 mol). % Or more) of silver chlorobromide emulsion.
By treating this lith-type silver halide photographic light-sensitive material with an alkaline hydroquinone developer having a low sulfite ion concentration, a so-called lith-type developer, a high contrast,
Images with high sharpness and high resolution can be obtained.

However, since these lith-type developers are susceptible to aerial oxidation, their preservative properties are extremely poor.
It is difficult to keep the development quality constant during continuous use.

There is known a method of rapidly obtaining a high-contrast image without using the lith developer. For example, Japanese Patent Publication No. 59-17825, Japanese Publication No. 59-17818, and Japanese Publication No. 59-178
No. 19, Kosho 59-17820, Kosho 59-17821, Kosho 59-17826
No. 59-17822, No. 59-17825, etc., a silver halide photographic light-sensitive material containing a tetrazolium compound is treated with a super-additive developer. According to these methods, it is possible to obtain a high-contrast image even by processing with a developer which has good preservative property and can be processed rapidly.

On the other hand, in recent years, silver halide photographic light-sensitive materials recorded by a laser light source have been frequently used in the field of printing plate making. As a light source, an Ar laser having an output wavelength of 488 nm, a He-Ne laser having an output wavelength of 632.8 nm, a light emitting diode (LED) having an output wavelength of 650 to 700 nm, or a red semiconductor laser having an output wavelength of 670 to 680 nm is used. Are known.

From the viewpoint of ease of use, the photosensitive material used in the exposure apparatus having these light sources is advantageous in that it can be handled under bright safe light. As a silver halide photographic light-sensitive material recorded by a laser light source, a high-sensitivity emulsion color-sensitized with a sensitizing dye so as to have optimum sensitivity to these light sources is used.

However, when the silver halide photographic light-sensitive material has a high gradation while being color-sensitized with the sensitizing dye as described above, the storage stability is deteriorated, and in particular, sensitivity fluctuation and fog are caused. There was a problem.

[0009]

SUMMARY OF THE INVENTION In view of the above problems, an object of the present invention is to provide a silver halide light-sensitive material which has high contrast and improved sensitivity variation and fog generation.

[0010]

The above object of the present invention can be achieved by the following constitution.

(1) In a silver halide photographic light-sensitive material containing a tetrazolium compound in at least one silver halide emulsion layer and / or other hydrophilic colloid layer on a support, the silver halide emulsion layer is General formula [D
-1], general formula [D-2], general formula [D-3], general formula [D-4] and general formula [D-5] are contained in at least one compound. Silver halide photographic light-sensitive material.

[0012]

[Chemical 2]

In the formulas [D-1] to [D-3], R ¹ is a sulfoaralkyl group, a sulfoalkenyl group or-(Cm ¹ H ₂ m ₁ O) lCm ² H ₂ m ² SO ₃ M ¹ group (m ¹ and m ² each represent 2 to 4, 1 represents 1 to 2 and M ¹ represents a hydrogen atom or an alkali metal atom), a sulfoalkyl group or a carboxyalkyl group. R ² , R ³ and R ⁴ each represent an alkyl group, an alkenyl group, an aralkyl group, an aryl group or a heterocyclic group, and these groups can optionally have a substituent. V ¹ and V ² are each an alkyl group, alkoxy group, halogen atom, cyano group, carboxy group, alkoxycarbonyl group, trifluoromethyl group, aryl group, sulfonamide group, acyl group, amide group, sulfamoyl group, carbamoyl group or Represents a hydrogen atom.

L ¹ and L ² each represent a methine carbon and may be substituted with an alkyl group, an alkoxy group, an aralkyl group or an aryl group. L represents a methylene chain having 2 to 6 carbon atoms, and M represents a hydrogen atom or an alkali metal atom.

In the general formula [D-2], V ³ and V ⁴ are the same as V ¹ and V ² , respectively, but one of V ³ and V ⁴ is an alkoxycarbonyl group, a sulfonamide group,
It is a group selected from an acyl group, an amide group, a sulfamoyl group, a carbamoyl group or an alkoxy group.

In the general formula [D-3], R ⁵ , R ⁶ and R ⁷ are the same as R ² , R ³ and R ⁴ , respectively, but at least one of R ⁵ , R ⁶ and R ⁷ is an aryl group. , A heterocyclic group, an aralkyl group, or an alkenyl group.

In the general formula [D-4], Z ¹¹ represents a group of non-metal atoms necessary for forming a 5- or 6-membered nitrogen-containing heterocycle excluding the imidazole ring, and R ¹¹ is a sulfoalkyl group or sulfoaralkyl. Group, a carboxyalkyl group or-(Cm ¹
It represents an _{^{H 2 m 1 O) lCm 2}} H 2 m 2 SO 3 M 1 group. R ¹² , R ¹³ and R ¹⁴
Are the same as R ² , R ³ and R ⁴ , respectively, and L ¹¹ and L
¹² is the same as L ¹ and L ² , respectively, and n ₁₁ is 0 or 1
Represents

In the general formula [D-5], Z ²¹ is 5 member, 6
Represents a non-metal atomic group necessary for forming a nitrogen-containing heterocyclic ring, R ²¹ is the same as R ¹¹ , R ²² , R ²³ and R ²⁴ are the same as R ² , R ³ and R ⁴ , respectively. Yes, L ²¹ , L ²² , L
²³ and L ²⁴ are the same as L ¹ and L ² , respectively, and n ₂₁
Represents 0 or 1.

The present invention will be described in detail below.

In the photosensitive dyes represented by the general formulas [D-1] to [D-5] according to the present invention, specific examples of the sulfoaralkyl group represented by R ¹ , R ¹¹ and R ²¹ are o-
Examples include groups such as sulfobenzyl, p-sulfobenzyl, p-sulfophenethyl and the like, and specific examples of the carboxyalkyl group include groups such as carboxymethyl and carboxyethyl, and-(Cm ¹ H ₂ m ¹ O) lCm Specific examples of the ² H ₂ m ² SO ₃ M ¹ group include groups such as 6-sulfo-3, oxahexyl, 7-sulfo-3-oxaheptyl, 9-sulfo-3,6-dioxanonyl and the like.

Specific examples of the sulfoalkenyl group represented by R ¹ include 3-sulfo-2-propenyl group, and specific examples of the sulfoalkyl group include groups such as 3-sulfopropyl and 2-sulfoethyl. Specific examples of the sulfoalkyl group represented by R ¹¹ and R ¹² include groups such as 2-sulfoethyl, 3-sulfopropyl, 4-sulfobutyl and 5-sulfopentyl.

R ² , R ³ , R ⁴ , R ⁵ , R ⁶ , R ⁷ , R ¹² , R ¹³ ,
The alkyl groups represented by R ¹⁴ , R ²² , R ²³ and R ²⁴ include substituted and unsubstituted groups, such as methyl, ethyl, 2-hydroxyethyl, 2-methoxyethyl, carboxymethyl,
2-sulfoethyl, groups such as 3-sulfopropyl, and the like,
Specific examples of the alkenyl group include an allyl group, and specific examples of the aralkyl group include an unsubstituted group such as phenyl and naphthyl, and a substituted group such as p-carboxyphenyl, tolyl, and p-sulfophenyl. Specific examples of the heterocyclic group include unsubstituted groups such as pyridyl, furyl, thienyl and imidazolyl, and substituted groups such as chloropyridyl and carboxypyridyl.

Specific examples of the alkyl group represented by V ¹ , V ² , V ³ and V ⁴ include groups such as methyl and ethyl, and specific examples of the alkoxy group include groups such as methoxy and ethoxy. Specific examples of the halogen atom include fluorine, chlorine,
Examples of the alkoxycarbonyl group include groups such as ethoxycarbonyl and butoxycarbonyl, and examples of the aryl group include groups such as phenyl, tolyl, chlorophenyl, and sulfonamide. Specific examples of the group include groups such as methanesulfonamide and benzenesulfonamide, specific examples of the acyl group include groups such as acetyl and benzoyl, and specific examples of the amide group include acetylamino, benzoylamino and the like. Groups are mentioned, specific examples of the sulfamoyl group include groups such as sulfamoyl and dimethylsulfamoyl, and specific examples of the carbamoyl group include groups such as carbamoyl, dimethylcarbamoyl and morpholinocarbonyl.

Specific examples of the alkyl group substituted on the methine carbon represented by L ¹ , L ² , L ¹¹ , L ¹² , L ²¹ , L ²² , L ²³ and L ²⁴ include methyl, ethyl and butyl groups. Examples of the alkoxy group include groups such as methoxy and ethoxy, examples of the aralkyl group include groups such as benzyl and phenethyl, and examples of the aryl group include phenyl group. .

Specific examples of the alkali metal atom represented by M include atoms such as lithium, sodium and potassium.

The 5- or 6-membered nitrogen-containing heterocycle formed by Z ²¹ includes not only a monocycle but also a condensed ring, for example, oxazolidine, oxazoline, benzoxazoline, naphthoxazoline, thiazoline, benzothiazoline, naphthothiazoline. , Benzoselenazoline, naphthoselenazoline, benzimidazoline, naphthimidazoline, thiadiazoline, benzoterrazoline, and the like, and at any position on these rings, V ¹ , V ² , V ³ and V ⁴ It may have a substituent.

The general formula [D-1] to general formula [D-
Representative specific examples of the photosensitive dye represented by 5] are shown below, but the present invention is not limited thereto.

[0028]

[Chemical 3]

[0029]

[Chemical 4]

[0030]

[Chemical 5]

[0031]

[Chemical 6]

[0032]

[Chemical 7]

[0033]

[Chemical 8]

[0034]

[Chemical 9]

[0035]

[Chemical 10]

[0036]

[Chemical 11]

[0037]

[Chemical 12]

[0038]

[Chemical 13]

[0039]

[Chemical 14]

[0040]

[Chemical 15]

[0041]

[Chemical 16]

[0042]

[Chemical 17]

Next, the tetrazolium compound according to the present invention will be described.

The tetrazolium compound is represented by the following general formula [T]
Can be shown as

[0045]

[Chemical 18]

In the present invention, the substituents R ₁ , R ₂ and R ₃ of the phenyl group of the triphenyltetrazolium compound represented by the above general formula [T] are hydrogen atoms or Hammett's sigma value (σP) showing electron withdrawing degree. It is preferable that) is negative or positive. Particularly negative ones are preferable. Hammett's sigma values for phenyl substitution are well documented in many publications, such as the Journal of Medical Chemistry.
Chemistry) Vol. 20, p. 304, 1977, C. Hansch et al., And particularly preferable groups having a negative sigma value include a methyl group (σP = -0.17 or less for all σP values) Ethyl group (-0.1
5), cyclopropyl group (-0.21), n-propyl group (-0.1
3), isopropyl group (-0.15), cyclobutyl group (-0.1
5), n-butyl group (-0.16), iso-butyl group (-0.20), n-pentyl group (-0.15), cyclohexyl group (-0.22), amino group (-0.66), acetylamino group (-0.15) ), Hydroxyl group (-0.37), methoxy group (-0.27), ethoxy group (-0.2
4), propoxy group (-0.25), butoxy group (-0.32), pentoxy group (-0.34) and the like, all of which are useful as a substituent of the compound of the general formula [T] of the present invention. X ^- represents an anion. Examples thereof include halogen ions such as chloride ions and bromide ions, acid radicals of inorganic acids, and acid radicals of organic acids.

Specific examples of the compound of the formula [T] used in the present invention will be given below, but the compound of the present invention is not limited thereto.

[0048]

[Table 1]

The tetrazolium compound used in the present invention may be obtained, for example, from Chemical Reviews.
It can be easily synthesized according to the method described in Volume 55, pages 335 to 483.

The tetrazolium compound of the present invention is used in the range of about 1 mg to 10 g, preferably about 10 mg to about 2 g per mol of silver halide contained in the silver halide photographic light-sensitive material of the present invention. Is preferred.

Although the tetrazolium compound used in the present invention can be used alone to obtain preferable characteristics, the preferable characteristics are not deteriorated even if a plurality of tetrazolium compounds are combined in any proportion.

In a preferred embodiment of the present invention,
The addition of the tetrazolium compound according to the present invention to the silver halide emulsion layer can be mentioned. In another preferred embodiment of the present invention, it is added to the hydrophilic colloid layer directly adjacent to the silver halide emulsion layer or the hydrophilic colloid layer adjacent to the silver halide emulsion layer via an intermediate layer.

In another embodiment, the tetrazolium compound according to the present invention is dissolved in a suitable organic solvent, for example, alcohols such as methanol and ethanol, ethers, esters, etc., and silver halide photography is carried out by an overcoat method or the like. It may be incorporated in the silver halide photographic light-sensitive material by directly coating it on the portion of the light-sensitive material which will be the outermost layer on the silver halide emulsion layer side.

Silver bromide, silver iodobromide, silver chloroiodobromide and silver chlorobromide can be used in the silver halide emulsion (hereinafter referred to as a silver halide emulsion or simply an emulsion) used in the present invention. Although it can be used, silver chloroiodobromide or silver chlorobromide is preferable.

Further, (standard deviation of particle size) / (average value of particle size)
Monodisperse particles represented by × 100 and having a coefficient of variation of 15% or less are preferable.

Various techniques and additives known in the art can be used in the silver halide emulsion of the present invention.

For example, in the silver halide photographic emulsion and backing layer used in the present invention, various chemical sensitizers, toning agents, hardeners, surfactants, thickeners, plasticizers, slip agents,
A development inhibitor, an ultraviolet absorber, an anti-irradiation dye, a heavy metal, a matting agent and the like can be further contained by various methods. Further, a polymer latex can be contained in the silver halide photographic emulsion and the backing layer of the present invention.

As a support that can be used in the silver halide photographic light-sensitive material of the present invention, cellulose acetate, cellulose nitrate, polyester such as polyethylene terephthalate, polyolefin such as polyethylene, polystyrene, baryta paper, and polyolefin are coated. paper,
Examples thereof include glass and metal. These supports are subjected to a surface treatment if necessary.

These additives are described in more detail in Research Disclosure Vol. 176 Item / 7643 (December 1978) and Vol. 187 Item / 8716 (November 1979),
The relevant parts are summarized below.

Additive type RD / 7643 RD / 8716 1. Chemical sensitizer Page 23 Page 648 Right column 2. Sensitivity enhancer Same as above 3. Spectral sensitizer, pages 23 to 24, page 648, right column to supersensitizer, page 649, right column 4. Whitening agent Page 24 5. Antifoggants and stabilizers 24 to 25 pages 649 right column 6. Light absorbers, filter dyes 25 to 26 pages 649 right column ~ ultraviolet absorbers 650 page left column 7. Anti-stain agent page 25 right column page 650 left-right column 8. Dye image stabilizer page 25 9. Hardener 26 pages 651 left column 10. Binder page 26 Same as above 11. Plasticizer, lubricant Page 27 Page 650 Right column 12. Coating aid, surface active agent, pages 26 to 27, same as above 13. Antistatic Agent, page 27 Id. To process the silver halide photographic light-sensitive material of the present invention, for example, TH James, The Theory of the Photographic Process, Fourth Edition (The Theory of
the Photographic Process, Fourth Edition) No. 291-33
Page 4 and the Journal of the American Chemical Soci
ety) Volume 73, page 3,100 (1951), and the developers can be effectively used in the present invention.

These developers may be used alone or in combination of two or more kinds, but it is preferable to use two or more kinds in combination.

The effect of the present invention is not impaired even if a sulfite such as sodium sulfite or potassium sulfite is used as a preservative in the developer used for developing the light-sensitive material of the present invention. Further, hydroxylamine or a hydrazide compound may be used as a preservative. In addition, the pH can be adjusted by a caustic alkali, an alkali carbonate, an amine or the like used in a general black-and-white developer, and a buffer function can be provided.

The developing solution used in the present invention has a pH of 9.5 to 11.2.
Are preferred. If the pH is less than 9.5, the contrast becomes insufficient, and if the pH exceeds 11.2, the fog significantly deteriorates.

In addition, the developer includes an inorganic development inhibitor such as bromcali and an organic development inhibitor such as 5-methylbenzotriazole, 5-methylbenzimidazole, 5-nitroindazole, adenine, guanine and 1-phenyl-5-mercaptotetrazole. Agents, metal ion scavengers such as ethylenediamine tetraacetic acid, development accelerators such as methanol, ethanol, benzyl alcohol, polyalkylene oxides, sodium alkylaryl sulfonates, natural saponins, surface active agents such as sugars or alkyl esters of the above compounds Agent,
It is optional to add a hardening agent such as glutaraldehyde, formalin and glyoxal, and an ionic strength adjusting agent such as sodium sulfate.

The developer used in the present invention may contain glycols such as diethylene glycol and triethylene glycol as an organic solvent.

[0066]

EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited thereto.

Example 1 (Preparation of silver halide photographic emulsion A) pH = 3.0, pAg = 7.5
, And monodisperse silver chlorobromide emulsion using the function addition simultaneous mixing method (silver chloride is 77 mol% based on total silver halide
0.25 μm, monodispersity 10%) was adjusted. The obtained emulsion was washed with water and desalted by a conventional method to obtain compounds [A], [B],
After [C] was added, gold-sulfur sensitization was performed, and the amounts of [D-1] to [D-5] sensitizing dyes according to the present invention shown in Table 2 and 4-hydroxy-1,3 as stabilizer A dye-sensitized photosensitive photographic emulsion was obtained by adding 3,3a, 7-tetrazaindene.

[0068]

[Chemical 19]

(Preparation of Silver Halide Emulsion Layer) 1. Sensitizing dye (b) 4 mg / m ² 2. Tetrazolium compound (T-19) 20 mg / m ² 3. Styrene-butyl acrylate-acrylic acid copolymer latex 300 mg / m ² 4. Hydroquinone 2.5 mg / m ² 5. Sodium dodecylbenzenesulfonate 5.0 mg / m ² 6.1-Phenyl-5-mercapto-tetrazole 2 mg / m ² 7. Formalin 4 mg / m ² 8. Glyoxal 10mg / m ²

[0070]

[Chemical 20]

(Preparation of emulsion protective layer) 1. Gelatin 1.2 g / m ² 2. Compound (d) 30 mg / m ² 3. Compound (e) 22.5 mg / m ² 4. Compound (m) 1.1mg / m ² 5.5--nitroindazole 5.4 mg / m ² 6.1- phenyl-3-pyrazolidone 1.7mg / m ² 7. Potassium bromide 2.4 mg / m ² 8. Polyethylene glycol 10.0 mg / m ² 9. Formalin 15.3 mg / m ² 10. Glyoxal 7.2 mg / m ²

[0072]

[Chemical 21]

(Preparation of Backing Layer) 1. Gelatin 2.7 g / m ² 2. Compound (f) 90 mg / m ² 3. Compound (g) 17 mg / m ² 4. Compound (h) 27.5 mg / m ² 5. Sodium dodecylbenzenesulfonate 37 mg / m ² 6.5-Nitroindazole 20 mg / m ² 7. Latex (i) 120 mg / m ² 8. Colloidal silica 100 mg / m ² 9.1-Phenyl-3-pyrazolidone 39 mg / m ² 10. Glyoxal 9.5 mg / m ² 11. Citric acid 31 mg / m ² 12. Hardener (j) 4.5 mg / m ² (Preparation of backing protective layer) 1. Gelatin 2.7 g / m ² 2. Compound (f) 90 mg / m ² 3. Compound (g) 17 mg / m ² 4. Compound (h) 27.5 mg / m ² 5. Compound (k) 10 mg / m ² 6. Spherical polymethylmethacrylate matting agent 25 mg / m ² (average particle size 4 μm) 7. Sodium chloride 10 mg / m ² 8. Glyoxal 10 mg / m ² 9. Hardener (l) 15mg / m ²

[0074]

[Chemical formula 22]

[0075]

[Chemical formula 23]

Undercoating with a thickness of 0.1 μm on both sides (Japanese Patent Laid-Open No. 59-19941)
(See Example 1 of No. 1) of a polyethylene terephthalate film having a thickness of 100 μm, and an emulsion layer, an emulsion protective layer, and a backing layer and a backing protective layer on the opposite side of the film, respectively. A silver photographic light-sensitive material was obtained.

The compositions of the developing solution and the fixing solution used in this embodiment are shown below.

(Developer Composition) Composition-A polyethylene glycol (molecular weight 600) 1.0 g ethylenediaminetetraacetic acid disodium 1.0 g sodium sulfite 24.4 g phenidone 0.5 g L-ascorbic acid 35.0 g 5-methylbenztriazole 0.2 g 1-phenyl- 5-Mercaptotetrazole 0.02g 5-Nitroindazole 0.06g Composition-B Polyethylene glycol 1.0g Potassium carbonate 50.0g Potassium bromide 9.0g Sodium sulfite 15.6g 5-Nitroindazole 0.06g Sodium hydroxide 7.4g Granular composition- A and -B were mixed in the above proportions, and the mixture was made up to 1 liter with water to give a working solution. At this time, adjust the pH value to 1 with sodium hydroxide and sulfuric acid.
Adjusted to 0.4.

(Fixing solution composition) Polyethylene glycol (molecular weight 600) 2.0 g Sodium sulfite 5.0 g Boric acid 13.0 g Ammonium thiosulfate 135.0 g Citric acid 80.9 g Anhydrous aluminum sulfate 40.0 g Glutaraldehyde 10.0 g It was finished to liter and used as a working solution. At this time, the pH value was adjusted to 4.6 with sulfuric acid.

The development processing conditions are: development 34 ° C., 12 seconds, fixing 32
C. 10 seconds, normal temperature 10 seconds for water washing, drying 50.degree. C. 13 seconds. The processing was carried out by an automatic processor GR-26SR manufactured by Konica Corporation.

[Evaluation of Photographic Performance] The obtained samples and a part of them were stored at 55 ° C. and 48% RH for 3 days as a substitute test for storability.
^-6 second exposure was given and processed under the above conditions.

The density of the obtained sample was measured with an optical densitometer, Konica PDA-65, and the relative sensitivity was shown with the sensitivity at a density of 2.5 of Sample No. 1 as 100. Was displayed. If the gamma value is less than 8.0, the contrast becomes insufficient and it cannot be used. Further, the fog density of the unexposed area of the sample of the developing treatment agent was measured. The fog density is 0.0
9 and above are unusable.

The results are shown in Table 2.

[0084]

[Table 2]

As is clear from the results shown in Table 2, the present invention is superior to the comparative examples.

Example 2 Example 1 except that the sensitizing dye of the present invention was changed as shown in Table 3.
A sample was obtained in the same manner as in. The obtained sample was evaluated in the same manner as in Example 1 except that the Ar laser was changed to a He-Ne laser for exposure.

The results are shown in Table 3.

[0088]

[Table 3]

[0089]

[Chemical formula 24]

As is clear from the results shown in Table 3, the present invention is superior to the comparative examples.

[0091]

The silver halide light-sensitive material according to the present invention comprises
It has a high contrast and can improve sensitivity fluctuation and fogging.

Claims (1)

[Claims] 1. A silver halide photographic light-sensitive material containing a tetrazolium compound in at least one silver halide emulsion layer and / or another hydrophilic colloid layer on a support, wherein the silver halide emulsion layer has the following general composition. Formula [D-
1], the general formula [D-2], the general formula [D-3], the general formula [D-4] and the halogen represented by the general formula [D-5] containing at least one compound. Silver halide photographic light-sensitive material. [Chemical 1] [Wherein R ¹ in general formulas [D-1] to [D-3]
Is a sulfoaralkyl group, a sulfoalkenyl group,-(Cm ¹ H ₂
O) lCm ² H ₂ m ² SO ₃ M ¹ group (m ¹ and m ² each represent 2 to 4,
1 represents 1 to 2 and M ¹ represents a hydrogen atom or an alkali metal atom. ), A sulfoalkyl group or a carboxyalkyl group. R ² , R ³ and R ⁴ each represent an alkyl group, an alkenyl group, an aralkyl group, an aryl group or a heterocyclic group, and these groups can have a substituent at any position. V ¹ and V ² are each an alkyl group, alkoxy group, halogen atom, cyano group, carboxy group, alkoxycarbonyl group, trifluoromethyl group, aryl group, sulfonamide group, acyl group, amide group, sulfamoyl group, carbamoyl group or Represents a hydrogen atom. L
¹ and L ² each represent a methine carbon, which may be substituted with an alkyl group, an alkoxy group, an aralkyl group or an aryl group. L represents a methylene chain having 2 to 6 carbon atoms,
M represents a hydrogen atom or an alkali metal atom. In the general formula [D-2], V ³ and V ⁴ are the same as V ¹ and V ² , respectively, but one of V ³ and V ⁴ is an alkoxycarbonyl group, a sulfonamide group, an acyl group, an amide group, It is a group selected from a sulfamoyl group, a carbamoyl group or an alkoxy group. In formula [D-3], R ⁵ , R ⁶ and R ⁷ are the same as R ² , R ³ and R ⁴ , respectively, but at least one of R ⁵ , R ⁶ and R ⁷ is an aryl group or a heterocycle. A group selected from a group, an aralkyl group and an alkenyl group. In the general formula [D-4], Z ¹¹ represents a nonmetallic atom group necessary for forming a 5-membered or 6-membered nitrogen-containing heterocycle excluding an imidazole ring, and R ¹¹ represents a sulfoalkyl group or a sulfoaralkylene group carboxy. It represents an alkyl group or a-(Cm ¹ H ₂ m ¹ O) lCm ² H ₂ m ² SO ₃ M ¹ group. R ¹² , R ¹³ and R ¹⁴ are the same as R ² , R ³ and R ⁴ , respectively, and L ¹¹
And L ¹² are the same as L ¹ and L ² , respectively, and n ₁₁ is 0.
Or represents 1. In the general formula [D-5], Z ²¹ is 5
Represents a non-metal atom group necessary for forming a 6-membered nitrogen-containing heterocyclic ring, R ²¹ is the same as R ¹¹ , and R ²² , R ²³ and R ²⁴ are R ² , R ³ and R ^{4 respectively.} Is the same as L ²¹ , L
²² , L ²³ and L ²⁴ are the same as L ¹ and L ² , respectively, and n ₂₁ represents 0 or 1. ] [Industrial applications]