JPH07115884B2 - Enamel frit - Google Patents

Enamel frit

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Publication number
JPH07115884B2
JPH07115884B2 JP62062120A JP6212087A JPH07115884B2 JP H07115884 B2 JPH07115884 B2 JP H07115884B2 JP 62062120 A JP62062120 A JP 62062120A JP 6212087 A JP6212087 A JP 6212087A JP H07115884 B2 JPH07115884 B2 JP H07115884B2
Authority
JP
Japan
Prior art keywords
enamel
weight
frit
enamel layer
matte
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62062120A
Other languages
Japanese (ja)
Other versions
JPS63230538A (en
Inventor
誠 太田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to JP62062120A priority Critical patent/JPH07115884B2/en
Publication of JPS63230538A publication Critical patent/JPS63230538A/en
Publication of JPH07115884B2 publication Critical patent/JPH07115884B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 (産業上の利用分野) この発明はほうろうフリツトに関する。DETAILED DESCRIPTION OF THE INVENTION Industrial Field This invention relates to enamel frits.

(従来の技術) 従来、鉄、アルミ、ステンレス等の基材の表面を被覆す
るほうろう層としては、光沢を有するグロス質のものが
一般に用いられていたが、最近建材用ほうろうパネルや
看板、表示板あるいは黒板やホワイトボード(マーカー
ボード)等においては、光沢の少ないマツト質のほうろ
う層が要求されることが多くなつてきた。
(Prior Art) Conventionally, as a enamel layer that covers the surface of a base material such as iron, aluminum, and stainless, a glossy glossy material has been generally used, but recently, a enamel panel for building materials, a signboard, and a display. For boards, blackboards, whiteboards (marker boards) and the like, matte enamel layers with low gloss have often been required.

この艶消し状態のマツト質ほうろう層を得る方法として
は種々の方法が試みられているが問題が多い。
Various methods have been tried as methods for obtaining the matt enamel layer in a matte state, but there are many problems.

すわわち、通常のほうろうフリツトにSiO2,Al2O3,TiO2
等の高融点材料を多量に添加し、これらの材料の融点以
下で焼成する方法は、ほうろう層の表面がざらつき、耐
汚染性および耐食性が劣るうえ、焼成温度のばらつきに
より光沢むらを生じるという問題がある。またアルミほ
うろうで使用する鉛の含有量の多い低融点フリツトにア
ルカリ又はほう酸を多量に加えて、珪酸塩等の結晶を析
出させる方法は、ほうろう層表面のざらつき、および熱
膨張係数の差によるヘアラインやクラツクの発生により
外観が劣り、耐薬品性、耐汚染性、耐水性、耐候性とも
劣るものしか得られない。さらにSiO2,TiO2,Al2O3,ZrO2
などの高融点材料をプラズマ溶射により通常の光沢を有
するグロス質のほうろう層上に溶射する方法もあるが、
表面のざらつきが発生しやすく、耐汚染性の点で問題が
ある。
That is, SiO 2 , Al 2 O 3 and TiO 2 are added to ordinary enamel frit.
The method of adding a large amount of high melting point materials such as, and baking at a temperature below the melting point of these materials has the problem that the surface of the enamel layer is rough, stain resistance and corrosion resistance are poor, and uneven glossing occurs due to variations in baking temperature. There is. In addition, a method of precipitating crystals such as silicate by adding a large amount of alkali or boric acid to the low melting point frit containing a large amount of lead used in aluminum enamel is the roughness of the enamel layer and the hairline due to the difference in thermal expansion coefficient. The appearance is inferior due to the occurrence of cracks and cracks, and only inferior chemical resistance, stain resistance, water resistance and weather resistance can be obtained. Furthermore, SiO 2 , TiO 2 , Al 2 O 3 , ZrO 2
There is also a method of spraying a high melting point material such as, for example, on a glossy enamel layer having ordinary gloss by plasma spraying,
Roughness of the surface is likely to occur and there is a problem in terms of stain resistance.

(発明が解決しようとする問題点) この発明は上記従来の問題点を解決するもので、焼成温
度の温度領域によつてグロス質およびマツト質のいずれ
のほうろう層をも形成することができ、かつ得られるグ
ロス質およびマツト質ほうろう層は表面の平滑性、耐酸
性、耐汚染性、耐候性等がすぐれ、グロス質およびマツ
ト質の焼成温度領域内で焼成温度のばらつきの影響を受
けずに均質で良好な外観を有するグロス質あるいはマツ
ト質ほうろう層を形成させることができるほうろうフリ
ツトを提供しようとするものである。
(Problems to be Solved by the Invention) The present invention is to solve the above-mentioned conventional problems, and it is possible to form any enamel layer of both glossy and matty depending on the temperature range of the firing temperature, And the resulting glossy and matty enamel layers have excellent surface smoothness, acid resistance, stain resistance, weather resistance, etc., and are not affected by variations in firing temperature within the firing temperature range of glossy and matte materials. It is an object of the present invention to provide an enamel frit capable of forming a glossy or matte enamel layer having a uniform and good appearance.

(問題点を解決するための手段) しかしてこの発明のほうろうフリツトは、SiO2とTiO2
ZrO2の合計を40〜65重量%、Na2O,K2O,Li2Oのうち少な
くともLi2Oを含む2種以上を10〜25重量%、ZnO,MgO,Ba
O,CaOのうち少なくともBaOとZnOを含む2種以上を4〜2
6重量%、B2O3,Al2O3,Sb2O3のうち少なくともB2O3を含
む1種以上を5〜20重量%、P2O5とMoO3のうち少なくと
もP2O5を含む1種以上を0.5〜6.5重量%含有して成り、
かつ前記各成分の含有割合は、SiO2が18〜42重量%、Ti
O2が14〜28重量%、ZrO2が1〜4重量%、Li2Oが2〜6
重量%、Na2Oが0〜11重量%、K2Oが0〜12重量%、ZnO
が1.5〜10重量%、BaOが1.5〜10重量%、MgOが0〜5重
量%、CaOが0〜8重量%、B2O3が5〜13重量%、Al2O3
が0〜4重量%、Sb2O3が0〜3重量%、P2O5が0.5〜2.
5重量%、MoO3が0〜4重量%であるとともに、SiO2/Ti
O2の値が65/35〜40/60の範囲内にあることを特徴とする
ほうろうフリツトである。
(Means for Solving Problems) However, the enamel frit of the present invention is composed of SiO 2 and TiO 2 .
The total amount of ZrO 2 is 40 to 65% by weight, two or more kinds containing at least Li 2 O among Na 2 O, K 2 O and Li 2 O are 10 to 25% by weight, ZnO, MgO, Ba
2 or more of O and CaO containing at least BaO and ZnO is 4 to 2
6 wt%, B 2 O 3, Al 2 O 3, Sb 5 to 20% by weight of one or more of which contains at least B 2 O 3 of 2 O 3, at least P 2 O of P 2 O 5 and MoO 3 Containing 0.5 to 6.5% by weight of one or more types including 5 ,
And the content ratio of each of the above components, SiO 2 is 18 to 42 wt%, Ti
O 2 is 14 to 28 wt%, ZrO 2 is 1 to 4 wt%, Li 2 O is 2 to 6
% By weight, 0 to 11% by weight of Na 2 O, 0 to 12% by weight of K 2 O, ZnO
1.5-10% by weight, BaO 1.5-10% by weight, MgO 0-5% by weight, CaO 0-8% by weight, B 2 O 3 5-13% by weight, Al 2 O 3
Is 0 to 4% by weight, Sb 2 O 3 is 0 to 3% by weight, and P 2 O 5 is 0.5 to 2.
5 wt%, MoO 3 0-4 wt%, SiO 2 / Ti
Enamel frit having an O 2 value in the range of 65/35 to 40/60.

この発明においては、発明者が研究の結果得た知見に基
づき、ほうろうフリツトの各構成成分を限定している
が、以下その限定理由を説明する。
In the present invention, each constituent component of the enamel frit is limited based on the knowledge obtained by the inventor as a result of the research. The reason for the limitation will be described below.

まずSiO2,TiO2,ZrO2(以下RO2群と総称する)は、結晶
化およびほうろうの耐久性向上のための必須成分であ
り、RO2群の総量がほうろうフリツト中に占める割合が4
0%(重量%。以下同じ)未満であると焼成後のほうろ
う層の耐久性、耐酸性および表面の艶消状態が劣るもの
となり、また65%を越えると結晶化によりマツト質化す
る温度が高くなり、生産性および製品品質を低下させ
る。また各成分別には、SiO2が18%未満だとほうろう層
の耐久性、耐酸性が低下し、42%を越えるとマツト質化
温度が高くなりすぎる。またTiO2が14%未満だと結晶化
が悪く、28%を越えると焼成温度が高くなり、密着性も
低下する。このSiO2とTiO2の相互比率SiO2/TiO2を限定
するのは、この発明のフリツトに、グロス質ほうろう層
を得るための通常焼成域と、結晶化マツト質ほうろう層
を得るためのマツト質化焼成域の両焼成域を生じさせ、
グロス質およびマツト質両用に使いわけできる性質を付
与するためのもので、該相互比率が65/35よりも大きく
なるとマツト質化が困難であり、たとえマツト質化して
も必要焼成温度が非常に高温度であつたり、マツト質の
均一性、表面平滑性、発色の均一性などを欠くことにな
る。また上記相互比率が40/60未満になると焼成時にほ
うろうとしてガラス化しにくくなり、密着性の低下をき
たすので好ましくない。さらにZrO2については、その含
有率が1%未満だとほうろう層の耐久性、耐酸性が劣
り、4%を越えると他の成分との関係でフリツト中に均
一に溶けにくくなり、溶融に時間を要し、かつ耐酸性の
低下、マツト質化温度の高騰をきたし好ましくない。
First, SiO 2 , TiO 2 , and ZrO 2 (hereinafter collectively referred to as RO 2 group) are essential components for crystallization and improving the durability of enamel, and the total amount of RO 2 group in the enamel frit is 4%.
If it is less than 0% (% by weight, the same applies hereinafter), the durability, acid resistance and matt state of the surface of the enamel layer after firing will be poor, and if it exceeds 65%, the temperature at which the crystallization will become matte due to crystallization will occur. Higher, lowering productivity and product quality. For each component, if the SiO 2 content is less than 18%, the durability and acid resistance of the enamel layer will deteriorate, and if it exceeds 42%, the matting temperature will be too high. Further, if TiO 2 is less than 14%, crystallization is poor, and if it exceeds 28%, the firing temperature becomes high and the adhesiveness also deteriorates. To limit the mutual proportions SiO 2 / TiO 2 of SiO 2 and TiO 2 are mat for the Furitsuto of the present invention, to obtain a normal firing range for obtaining the gloss quality enamel layer, the crystallization mat substance enamel layer Produces both firing zones of the qualitative firing zone,
The purpose is to impart a property that can be used for both glossy and matte materials, and when the mutual ratio is greater than 65/35, it is difficult to make matte material, and even if matte material is used, the required firing temperature is extremely high. At high temperatures, the quality of the matte, the surface smoothness, and the uniformity of the color development will be lacking. On the other hand, if the mutual ratio is less than 40/60, it becomes difficult to vitrify into enamel during firing and the adhesion is deteriorated, which is not preferable. With respect to ZrO 2 , if the content is less than 1%, the durability and acid resistance of the enamel layer are poor, and if it exceeds 4%, it becomes difficult to uniformly dissolve in the frit due to the relationship with other components, and the time required for melting Is required, and the acid resistance is lowered and the matting temperature is soared, which is not preferable.

次にNa2O,K2O,Li2O(以下R2O群と総称する)の総量を10
〜25重量%に限定するのは、熱膨張係数の大きいアルミ
ほうろう基板以外のほうろう基板に適したほうろう層の
熱膨張係数を得るためであり、10%未満だと硼酸やフツ
化物などの低融点物質の混入が必要となり、この場合ほ
うろう層の耐久性、耐酸性の著しい低下をきたし、通常
の焼成温度では発色均一で滑らかなマツト質の形成が困
難であり、また25%を越えると熱膨張係数が大きくなり
すぎ、ヘアライン、微泡、変色等の外観的欠陥および耐
久性の低下が生じることになる。またR2O群中、Li2Oを
必須成分とするのは、TiO2より低温の焼成温度で均一な
乳白色の結晶化を助長するためであり、Li2Oが2%未満
だとほうろう層が青味を帯びかつ、むらのある乳白色と
なり、耐酸性の低下もきたし、6%を越えるとマツト質
ほうろう層の表面の荒れが進み、耐酸性、耐汚染性、耐
候性の低下をきたし、熱膨張係数が大きくなりすぎてほ
うろう欠陥を発生しやすくなる。
Next, the total amount of Na 2 O, K 2 O, Li 2 O (hereinafter collectively referred to as the R 2 O group) was adjusted to 10
The reason for limiting the content to 25% by weight is to obtain the coefficient of thermal expansion of the enamel layer suitable for the enamel substrate other than the aluminum enamel substrate having a large coefficient of thermal expansion. It is necessary to mix the substances, and in this case, the durability and acid resistance of the enamel layer are markedly reduced, and it is difficult to form a matte material that is uniform in color and smooth at normal firing temperatures. The coefficient becomes too large, resulting in appearance defects such as hair lines, fine bubbles, discoloration, and deterioration of durability. In addition, the reason why Li 2 O is an essential component in the R 2 O group is to promote uniform milky white crystallization at a firing temperature lower than that of TiO 2 , and if the Li 2 O content is less than 2%, the enamel layer Becomes bluish and uneven milky white, and the acid resistance is lowered, and if it exceeds 6%, the surface of the matte enamel layer becomes rough, and the acid resistance, stain resistance and weather resistance are deteriorated. The coefficient of thermal expansion becomes too large and enamel defects easily occur.

またZnO,MgO,BaO,CaO(以下RO群と総称する)の総量が
4%未満だと耐酸性、耐候性の低下をきたし、26%を越
えるとフリツトが高融点化し、焼成不足状態のマツト質
表面しか得られず、密着不良をおこし好ましくない。ま
たZnOおよびBaOをそれぞれ1.5〜10%に限定するのは、
ほうろうの耐酸性、耐久性の維持と、より低温域におけ
る均一で乳白色のマツト質ほうろう層の形成をはかるた
めである。一方MgOおよびCaOは金属素地の熱膨張係数に
合せて選択するものであり、各成分上限値を越えると高
融点化するとともに、ほうろう層の外観が鮮かな乳白色
を呈しなくなり、MgO過剰添加の場合は青味を帯び易
く、CaO過剰添加の場合は淡褐色状の乳濁マツト質にな
り易いという問題を生じる。
If the total amount of ZnO, MgO, BaO, CaO (hereinafter collectively referred to as RO group) is less than 4%, the acid resistance and weather resistance are deteriorated. If the total amount exceeds 26%, the frit has a high melting point and the mat is under-baked. It is not preferable because only a high quality surface can be obtained and poor adhesion occurs. Also, limiting ZnO and BaO to 1.5-10% respectively,
This is to maintain the acid resistance and durability of enamel and to form a uniform and milky matty enamel layer at lower temperatures. On the other hand, MgO and CaO are selected according to the coefficient of thermal expansion of the metal base, and when the upper limit of each component is exceeded, the melting point increases and the appearance of the enamel layer does not show a fresh milky white, and when MgO is excessively added. Causes a problem that it tends to be bluish, and when CaO is excessively added, it becomes a light brown emulsion mat.

次にB2O3,Al2O3,Sb2O3(以下R2O3群と総称する)の総量
を5〜20%とするのは、ほうろう層とほうろう基板の熱
膨張合せのためと、耐久性、耐酸性の維持を目的とする
ものである。このうちの必須成分B2O3が5%未満だとフ
リツトの高融点化および高熱膨張化とそれに伴うほうろ
う外観の劣化をきたし、13%を越えると耐酸性、耐候
性、耐汚染性等の低下が著しくなる。なおAl2O3,Sb2O3
をB2O3に併用添加すれば、ほうろう外観の向上、耐酸性
維持の点で好ましい。
Next, the total amount of B 2 O 3 , Al 2 O 3 and Sb 2 O 3 (hereinafter collectively referred to as the R 2 O 3 group) is set to 5 to 20% in order to match the thermal expansion of the enamel layer and the enamel substrate. And, the purpose is to maintain durability and acid resistance. If the content of the essential component B 2 O 3 is less than 5%, the frit has a high melting point and a high thermal expansion and the enamel appearance is deteriorated, and if it exceeds 13%, the acid resistance, weather resistance, stain resistance, etc. The decrease is significant. Al 2 O 3 , Sb 2 O 3
Is preferably added together with B 2 O 3 from the viewpoint of improving the appearance of enamel and maintaining acid resistance.

その他の成分として、P2O5は少量で乳濁色のマツト質表
面を形成する作用を有するが、2.5%を越える過剰添加
の場合はほうろう層表面に微細な泡を形成しやすく、ま
た正常な焼付が困難とる。またMoO3の添加はほうろう層
表面を平滑化し、耐酸性、耐久性、耐汚染性を向上させ
るものであるが、4%を越える添加は逆にほうろうが高
融点化し焼不足を生じて密着不良となるので好ましくな
い。
As another component, P 2 O 5 has a function of forming an emulsion-colored matte surface with a small amount, but when added in excess of 2.5%, fine bubbles are easily formed on the surface of the enamel layer, and it is normal. It is difficult to print. Addition of MoO 3 smoothes the surface of the enamel layer and improves acid resistance, durability, and stain resistance. However, addition of more than 4% conversely causes the enamel to have a high melting point and cause insufficient baking, resulting in poor adhesion. Is not preferable.

(作用) この発明のほうろうフリツトにおいては、前記した各成
分比率の組合せによりその融点が調整され、620〜740℃
の焼成温度で溶融してガラス化し、光沢のあるグロス質
ほうろう層を形成する。さらにこの融点以上に加熱する
と、ガラス化したほうろう表面からの酸素供給が遮断さ
れ、ほうろう層内ではSb2O3,Li2O,P2O5などが核となりT
i結晶の析出が始まり、これの成長に伴つてほうろう層
表面が荒れ再び酸素供給が開始されて焼結物となり、失
沢化したマツト質状態を形成する。このマツト質化のた
めの焼成温度は前記した各成分比率の組合せにより700
〜850℃であり、均質で滑かな表面のマツト質ほうろう
層が形成される。
(Function) In the enamel frit of the present invention, the melting point thereof is adjusted by the combination of the above-mentioned respective component ratios, and 620 to 740 ° C.
It melts and vitrifies at the firing temperature of to form a glossy enamel layer. Further heating above this melting point cuts off the oxygen supply from the vitrified enamel surface, and Sb 2 O 3 , Li 2 O, P 2 O 5 etc. become nuclei in the enamel layer and become T.
Precipitation of i-crystals starts, the surface of the enamel layer is roughened with the growth of i-crystals, oxygen supply is restarted, and a sinter is formed to form a depleted matte state. The baking temperature for this matte treatment is 700 depending on the combination of the above-mentioned component ratios.
At 850 ° C, a matte enamel layer with a uniform and smooth surface is formed.

(実施例) 以下この発明の実施例および比較例を説明する。(Examples) Examples and comparative examples of the present invention will be described below.

フリツトとしては、第1表に示す組成のフリツトNo.1〜
28を用い、比較例として本発明のフリツト成分限定範囲
を一部が越えているフリツトNo.29〜33と、CaOのかわり
にPbOを26%含有するアルミ用有鉛フリツトNo.34と、Li
2Oのかわりにフッ素を4%含有する通常の鉄ほうろう用
チタン乳濁フリツトNo.35とを用いた。
As the flits, flit Nos. 1 to 1 having the composition shown in Table 1 are used.
As a comparative example, a frit No. 29 to 33 in which the frit component limited range of the present invention is partially exceeded as a comparative example, a leaded frit No. 34 for aluminum containing 26% of PbO instead of CaO, and Li
A conventional titanium emulsion frit No. 35 for iron enamel containing 4% of fluorine instead of 2 O was used.

ほうろう焼付のための釉薬としては、フリツトNo.1〜35
の各フリツト100部に対し、フリツトの特性に殆ど影響
しないように、炭酸カリウム0.2部、市販のカープレツ
クス(高SiO2粉末)0.5部、硼酸0.2部を加え、水45cc割
で2倍調合し、300g用ポツトミルにアルミナ玉石1.5kg
と共に投入し、3時間粉砕後100メツシユふるいでオー
ルパスしたものをそれぞれ釉薬No.1〜35とした。さらに
フリツトNo.35に、前記と同一添加物と、フリツト100部
に対し珪石粉40部を加え、前記と同様に調合粉砕したも
のを釉薬No.36とした。
As a glaze for baking enamels, frit No. 1-35
To 100 parts of each frit, 0.2 parts of potassium carbonate, 0.5 parts of commercially available car plex (high SiO 2 powder), and 0.2 parts of boric acid were added so as to hardly affect the characteristics of the frit, and the mixture was doubled with 45 cc of water. Alumina boulder 1.5kg in 300g pot mill
It was put together with the above, crushed for 3 hours, and all-passed through a 100 mesh sieve to give glaze Nos. 1 to 35, respectively. Further, the same additives as above and 100 parts of the frit and 40 parts of silica stone powder were added to the frit No. 35, and the mixture was crushed and ground in the same manner as the above to obtain a glaze No. 36.

次に上記各釉薬を用いて、20cm角で板厚1mmの鋼板に鉄
ほうろう黒下釉を焼付けたほうろう板に、3cm角の窓を
8個有する型板をのせてマスキングを繰返しながらスプ
レーにより施釉し、グロス質ほうろう層を得るため620
℃からはじめて30℃ごとに740℃まで焼成温度を変えて
焼成し、同様に施釉したテストピースをマツト質ほうろ
う層を得るため700℃〜850℃の範囲で同様に30℃ずつ焼
成温度を変えて焼成し、最も良好なほうろう層外観が得
られたものについて、その焼成温度およびほうろう層の
特性を第2表に示す。
Next, using each of the above glazes, a enamel plate made by baking iron enamel black bottom glaze on a 20 cm square 1 mm thick steel plate is placed on a enamel plate with eight 3 cm square windows and spraying is performed while repeating masking. 620 to obtain a glossy enameled layer
For the first time, the firing temperature is changed from ℃ to 740 ℃ every 30 ℃, and in order to obtain a matte enamel layer, a test piece that has been glazed in the same manner is heated in the range of 700 ℃ to 850 ℃, and the firing temperature is changed by 30 ℃. Table 2 shows the firing temperature and the characteristics of the enamel layer for the ones which were fired to obtain the best appearance of the enamel layer.

さらに施釉する基板の影響を見るために、上記試験とは
別に、釉薬No.8および9を用いて、10cm角で板厚0.5mm
のアルミメツキ鋼板を750℃で5分間加熱してメツキ表
面をAl−Fe合金化した基板に施釉し、また釉薬No.10を
用いて、10cm角で板厚1mmのSUS−430ステンレス鋼板か
ら成る基板に施釉し、前者は770℃、後者は840℃で焼成
したところ、前記鉄ほうろう黒下釉ベースに焼付けたも
のと同様な外観のマツト質ほうろう層を得ることができ
た。
In addition to the above test, glaze Nos. 8 and 9 were used to examine the influence of the substrate to be glazed.
The aluminum plated steel sheet of No. 10 is heated at 750 ° C for 5 minutes to apply glaze to an Al-Fe alloyed substrate, and using glaze No.10, a substrate made of SUS-430 stainless steel sheet of 10 cm square and 1 mm thick When the former was baked at 770 ° C. and the latter was baked at 840 ° C., a matte enamel layer having the same appearance as that baked on the iron enamel black bottom glaze base could be obtained.

第2表に示す特性試験の内容は次の通りである。The contents of the characteristic test shown in Table 2 are as follows.

(a)外観 肉眼によりほうろうの焼付外観を判定したもので、その
判定区分は次の通りである。
(A) Appearance The baking appearance of enamel is judged by the naked eye, and the judgment categories are as follows.

◎=異常なく良好。◎ = Good without any abnormality.

○=特に問題はなく良好。○ = No problem and good.

△=欠陥が一部認められる。Δ = Some defects are recognized.

(b)光沢度 JISZ−8741「光沢度測定方法」により75゜鏡面光沢測定
方法にて測定した。
(B) Glossiness Measured by the 75 ° specular glossiness measurement method according to JIS Z-8471 "Glossiness measurement method".

(c)表面粗さ JISB0601「表面あらさ」により測定したRmax(単位:μ
m)を示す。
(C) Surface roughness Rmax measured by JIS B0601 "Surface roughness" (unit: μ
m) is shown.

(d)色合 目視により発色を観察した。(D) Color The color development was visually observed.

(e)耐酸性 JISR−4601「ほうろう製品の品質基準」により判定し
た。
(E) Acid resistance Judged according to JIS R-4601 "Enamel product quality standard".

(f)耐汚染性 ほうろう白板(ホワイトボード)用の黒色のマーカで線
書きしたものを乾布、湿布でこすつて消去性を下記によ
り判定した。
(F) Contamination resistance The erasability was determined by rubbing a line drawn with a black marker for a enamel white plate (whiteboard) on a dry cloth or a compress to scrape it.

◎=乾布で消える。◎ = It disappears with a dry cloth.

○=乾布でよくこすれば消える。○ = If you rub it well with a dry cloth, it will disappear.

△=湿布でこすれば消える。Δ: It disappears when rubbed with a compress.

×=湿布でこすつても跡がのこる。× = Marks remain even if rubbed with a compress.

(g)耐候性 カーボンアーク式のウエザーメータ試験機を用いて2000
時間照射し、東京地区約10年に相当する促進試験をおこ
ない、ほうろう面を目視観察した。
(G) Weather resistance 2000 using a carbon arc type weather meter tester
After irradiation for an hour, an accelerated test equivalent to about 10 years in the Tokyo area was conducted, and the enamel surface was visually observed.

第2表から明らかなように、比較例のフリツトはグロス
質ほうろう層を形成できても光沢度50%以下のマツト質
ほうろう層は形成できないか外観、耐酸性、耐汚染性等
の劣るものしか得られないのに対し、実施例のフリツト
は、焼成温度を調整することによりグロス質、マツト質
いずれのほうろう層をも形成でき、得られたほうろう層
は外観、耐酸性、耐汚染性、耐候性等がいずれもすぐれ
ていることが判る。
As is clear from Table 2, the frit of the comparative example can form a glossy enamel layer but cannot form a matte enamel layer having a gloss of 50% or less, or the appearance, acid resistance and stain resistance are inferior. On the other hand, the frits of the examples can form glossy and matty enamel layers by adjusting the firing temperature, and the resulting enamel layers have appearance, acid resistance, stain resistance, and weather resistance. It can be seen that the sex is excellent.

(発明の効果) 以上説明したようにこの発明のほうろうフリツトによれ
ば、焼成温度を調整することにより、グロス質およびマ
ツト質のいずれのほうろう層をも形成することができ、
得られるマツト質ほうろう層は光沢度が50%以下の均質
で良好な外観を有するうえ、グロス質ほうろう層および
マツト質ほうろう層はいずれも表面の平滑性、耐酸性、
耐汚染性、耐候性等がすぐれ、また有害物質である鉛や
フツ素をフリツト成分として用いないので、これらの無
害化処理のための設備を必要とせず経済的である。
(Effects of the Invention) As described above, according to the enamel frit of the present invention, by adjusting the firing temperature, it is possible to form any enamel layer of glossy or matte quality,
The resulting matty enamel layer has a uniform and good appearance with a glossiness of 50% or less, and both the glossy enamel layer and the matty enamel layer have surface smoothness, acid resistance, and
It is excellent in stain resistance and weather resistance, and does not use harmful substances such as lead and fluorine as fritted components, so that it does not require facilities for detoxification treatment and is economical.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】SiO2とTiO2とZrO2の合計を40〜65重量%、
Na2O,K2O,Li2Oのうち少なくともLi2Oを含む2種以上を1
0〜25重量%、ZnO,MgO,BaO,CaOのうち少なくともBaOとZ
nOを含む2種以上を4〜26重量%、B2O3,Al2O3,Sb2O3
うち少なくともB2O3を含む1種以上を5〜20重量%、P2
O5とMoO3のうち少なくともP2O5を含む1種以上を0.5〜
6.5重量%含有して成り、かつ前記各成分の含有割合
は、SiO2が18〜42重量%、TiO2が14〜28重量%、ZrO3
1〜4重量%、Li2Oが2〜6重量%、Na2Oが0〜11重量
%、K2Oが0〜12重量%、ZnOが1.5〜10重量%、BaOが1.
5〜10重量%、MgOが0〜5重量%、CaOが0〜8重量
%、B2O3が5〜13重量%、Al2O3が0〜4重量%、Sb2O3
が0〜3重量%、P2O5が0.5〜2.5重量%、MoO3が0〜4
重量%であるとともに、SiO2/TiO2の値が65/35〜40/60
の範囲内にあることを特徴とするほうろうフリツト。
1. The total amount of SiO 2 , TiO 2 and ZrO 2 is 40 to 65% by weight,
At least 2 kinds of Na 2 O, K 2 O and Li 2 O containing at least Li 2 O
0-25% by weight, at least BaO and Z out of ZnO, MgO, BaO, CaO
two or more containing nO 4 to 26 wt%, B 2 O 3, Al 2 O 3, Sb 5~20 % by weight of one or more of which contains at least B 2 O 3 of 2 O 3, P 2
0.5 to 1 or more of O 5 and MoO 3 containing at least P 2 O 5
The content of each of the components is 18 to 42% by weight of SiO 2 , 14 to 28% by weight of TiO 2 , 1 to 4% by weight of ZrO 3 , and 2 to 2% of Li 2 O. 6 wt%, Na 2 O is 0 to 11 wt%, K 2 O is 0 to 12 wt%, ZnO is 1.5 to 10 wt%, BaO 1.
5-10 wt%, MgO 0-5 wt%, CaO 0-8 wt%, B 2 O 3 5-13 wt%, Al 2 O 3 0-4 wt%, Sb 2 O 3
Is 0-3% by weight, P 2 O 5 is 0.5-2.5% by weight, MoO 3 is 0-4
% By weight, and SiO 2 / TiO 2 values of 65 / 35-40 / 60
Enamel frit characterized by being in the range of.
JP62062120A 1987-03-17 1987-03-17 Enamel frit Expired - Lifetime JPH07115884B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62062120A JPH07115884B2 (en) 1987-03-17 1987-03-17 Enamel frit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62062120A JPH07115884B2 (en) 1987-03-17 1987-03-17 Enamel frit

Publications (2)

Publication Number Publication Date
JPS63230538A JPS63230538A (en) 1988-09-27
JPH07115884B2 true JPH07115884B2 (en) 1995-12-13

Family

ID=13190880

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH07115884B2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003244299A1 (en) * 2002-06-20 2004-01-06 Asahi Glass Company, Limited Ceramic color composition
KR102234552B1 (en) 2018-10-31 2021-04-01 엘지전자 주식회사 Composition for enamel, method for preparation thereof
KR102234551B1 (en) * 2018-11-09 2021-04-01 엘지전자 주식회사 Composition for enamel, method for preparation thereof and cooking appliance
KR102172416B1 (en) * 2019-02-22 2020-10-30 엘지전자 주식회사 Composition for enamel, method for preparation thereof and cooking appliance
KR102172418B1 (en) 2019-02-22 2020-10-30 엘지전자 주식회사 Composition for enamel, method for preparation thereof and cooking appliance
KR102172460B1 (en) * 2019-02-22 2020-10-30 엘지전자 주식회사 Composition for enamel, method for preparation thereof and cooking appliance
KR102172417B1 (en) 2019-02-22 2020-10-30 엘지전자 주식회사 Composition for enamel, method for preparation thereof
KR20200102758A (en) 2019-02-22 2020-09-01 엘지전자 주식회사 Composition for enamel, method for preparation thereof and cooking appliance
KR102172459B1 (en) * 2019-02-22 2020-10-30 엘지전자 주식회사 Composition for enamel, method for preparation thereof and cooking appliance
KR102310341B1 (en) * 2019-02-22 2021-10-07 엘지전자 주식회사 Composition for enamel, method for preparation thereof and cooking appliance

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58200336A (en) * 1982-05-18 1983-11-21 Sharp Corp Coordinate input system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58200336A (en) * 1982-05-18 1983-11-21 Sharp Corp Coordinate input system

Also Published As

Publication number Publication date
JPS63230538A (en) 1988-09-27

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