JPH06938A - Metal mask production thereof - Google Patents

Abstract

PURPOSE:To obtain a metal mask enhanced in dimensional accuracy and excellent in fine line reproducibility at the time of printing by forming meshes by an electroforming method so as to integrate the same with a mask part also formed by an electroforming method. CONSTITUTION:A metal mask 1 is constituted of a mask part 2 and pattern parts 3 and the pattern parts 3 are constituted in a mesh like state integrally formed from a metal along with the mask part 2 and the specifications of meshes are made different corresponding to the width of the pattern parts 3. That is, by providing small meshes 4b to the wide pattern part 3 and large meshes 4a to the narrow pattern part, the passing amount of ink at the time of printing is made constant and meshes are not provided when the width of the pattern part 3 is fine.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION The present invention relates to an etching resist ink, a solder resist,
Conductive pastes, etc. (hereinafter simply referred to as "ink")
TECHNICAL FIELD The present invention relates to a metal mask used when printing a sheet and a manufacturing method thereof.

[0002]

2. Description of the Related Art Conventionally, as a mask, a screen plate has been used in which a photosensitive emulsion is applied to a synthetic resin or metal gauze, and then a pattern portion through which ink should pass and a mask portion for blocking the passage of ink are formed. It was

However, in the above-mentioned prior art, since the base body supporting the mask portion is a gauze having a difficulty in elastic restoring ability, there are problems in dimensional accuracy and durability.

Therefore, in order to solve the above problems, a metal mask in which the mask portion is made of a metal plate and the mask portion is laminated on a metal gauze has been used recently.

[0005]

However, even in the above-mentioned prior art, although the mask portion made of metal is used, the main body is still a gauze, so the dimensional accuracy is still inferior. Due to the structure in which the mask portions are laminated, the smoothness of the front and back surfaces is difficult, and there is a problem that the edge portion of the pattern is not printed accurately during use.

Further, the gauze is naturally positioned uniformly in the pattern part due to the structure in which the mask part is laminated on the gauze, and the following phenomenon occurs during printing. That is, regardless of whether the pattern portion is wide or narrow, the gauze positioned there is the same. Therefore, for example, if the mesh of the gauze is set to be small assuming a wide pattern portion, the ink passing amount is too small in the narrow pattern portion. If the mesh thickness of the printed material becomes smaller on the assumption of a narrow pattern part on the contrary, and the mesh size of the gauze is set to a large value, the amount of ink passing through the wide pattern part is too large to print on that part of the substrate. There was a problem that the thickness became too thick.

The present invention was created for the purpose of providing a completely new metal mask and a method for manufacturing the same, which solves the above-mentioned problems of the prior art.

[0008]

That is, the metal mask of the present invention is characterized in that the pattern portion and the mask portion, which are formed in a mesh shape, are made of an integral metal to be formed by electroforming.

Further, in the method for producing a metal mask of the present invention, the first step of forming a resist film corresponding to the watermark holes of the mesh of the pattern portion on the electroformed substrate, and the resist film of the first step are covered. A second step of forming a mesh-shaped primary electrodeposition layer to form a pattern portion in a non-existing portion,
A third step of forming a resist film covering the mesh-shaped electrodeposition layer obtained in the second step, and a secondary electrode for forming a mask portion at a portion not covered by the resist film of the third step. It is characterized by comprising a fourth step of forming an electrodeposition layer and a fifth step of peeling the integrally bonded primary electrodeposition layer and secondary electrodeposition layer from the electroformed substrate.

[0010]

Therefore, according to the metal mask of the present invention, the mask portion prevents the ink from passing therethrough, and the pattern portion causes the ink to be transferred to the printing object, thereby producing the function of a known metal mask, and the mesh-shaped pattern. Since the mask portion and the mask portion are made of an integral metal which should be formed by electroforming, the metal mask having smooth front and back surfaces is obtained, and the specifications of the mesh are changed according to the width of the pattern portion. It produces an action that makes it possible.

Further, according to the method for manufacturing a metal mask of the present invention, first, a mesh-shaped primary electrodeposition layer to form a pattern portion is formed, and then a secondary electrodeposition layer to form a mask portion is formed. As a result, the two are integrally combined to form one metal mask, and the boundary between the mask portion and the pattern portion is formed very accurately.

[0012]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Specific embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a diagram showing an example of the metal mask of the present invention. The metal mask 1 is composed of a mask portion 2 and a pattern portion 3. The pattern portion 3 is formed by electroforming into a mesh formed of metal that is integral with the mask portion 2. Here, the specifications of the mesh are changed according to the width of the pattern portion 3. That is, by providing a mesh 4b with small eyes in the wide pattern portion and a mesh 4a with large eyes in the narrow pattern portion, the amount of ink passing during printing is made constant. Further, in this embodiment, as shown in the drawing, the pattern portion 3
No mesh is provided when the width is small.

2 to 9 are views showing steps of the method for manufacturing a metal mask of the present invention. (First Step) First, on the electroformed substrate 10, a resist film corresponding to the watermark holes of the mesh of the pattern portion of the metal mask is formed. This resist film is formed by a printing method, a photographic method, a transfer method or the like. In this embodiment, the electroformed substrate 1 is used.
A dry film 11f is laminated on the surface of the film 0 and mesh pattern 12a corresponding to the open holes of the mesh is formed.
2 is laminated (see FIG. 2), and after exposure and development, a resist film 11 having a watermark hole portion 11a corresponding to the watermark hole of the mesh is formed (see FIG. 3).

(Second Step) Then, the electroformed substrate 10 after the first step is transferred to an electrodeposition tank (nickel or nickel alloy is electrodeposited in this embodiment), and a mesh forming a pattern portion of the metal mask is transferred. To obtain the primary electrodeposition layer 4e,
Further, the resist film 11 is removed (see FIG. 4).

(Third Step) Next, a dry film 13f is formed on the electroformed substrate 10 and the primary electrodeposition layer 4e formed thereon.
And a mask film 14 having a transmissive pattern 14a corresponding to the pattern portion (see FIG. 5) and exposed and developed to form a resist film 13 on the primary electrodeposition layer 4e (FIG. 6). reference).

(Fourth step) Then, the electroformed substrate 10 which has undergone the second step is transferred to an electrodeposition tank to obtain a secondary electrodeposition layer 2e which constitutes a mask portion of the metal mask (see FIG. 7) and further resists The film 13 is removed (see FIG. 8). At this stage, the primary electrodeposition layer 4e and the secondary electrodeposition layer 2e are integrally bonded.

(Fifth Step) Finally, the primary electrodeposited layer 4e and the secondary electrodeposited layer 2e which are integrally combined are peeled off from the electroformed substrate 10 to form a mesh 4a (corresponding to the primary electrodeposited layer 4e). Pattern portion 3 having masks and mask portion 2 (secondary electrodeposition layer 2
A metal mask 2 made of (e corresponds) is obtained (see FIG. 9).

[0018]

According to the present invention having the above-described structure, the structure is fundamentally different from the screen plate and the metal mask of the prior art in which the gauze is used as the substrate and the mask portion is formed on the gauze. Produce an effect.

A mesh is formed by an electroforming method without using a gauze, which has a difficulty in elastic recovery, and since this mesh is formed integrally with a mask portion which is also formed by an electroforming method, the dimensional accuracy is high. It is possible to obtain a metal mask having excellent fine line reproducibility during printing.

Since the mesh is formed by the electroforming method and this mesh is formed integrally with the mask portion which is also formed by the electroforming method, the front and back surfaces are excellent in smoothness and the boundary between the mask portion and the pattern portion is excellent. Since it is formed very accurately, not only the screen plate, but also accurate printing without ink bleeding at the edge part compared to the conventional metal mask made of metallic gauze and mask part is realized. can do.

Since the mesh (corresponding to the gauze of the prior art) does not have a function as a base as in the prior art, it does not need to be an integral element over the entire metal mask, and the size of the pattern portion is not required. By changing the specifications of the mesh according to the shape and shape, it is possible to easily realize the constant amount of ink passing during printing, which cannot be realized by the conventional technology.

Since the mesh and the mask portion are integrally formed of metal, there is no risk of being invaded by a solvent or the like.

[Brief description of drawings]

FIG. 1 is a partially cutaway perspective view of an essential part showing an example of a metal mask of the present invention.

FIG. 2 is a sectional view showing a first step of the method for manufacturing a metal mask of the present invention.

FIG. 3 is a sectional view showing the first step of the above.

FIG. 4 is a sectional view showing a second step of the same.

FIG. 5 is a sectional view showing a third step of the same.

FIG. 6 is a sectional view showing a third step of the same.

FIG. 7 is a sectional view showing a fourth step of the same as above.

FIG. 8 is a sectional view showing a fourth step of the same as above.

FIG. 9 is a sectional view showing a fifth step of the same.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 metal mask 2 mask part 2e secondary electrodeposition layer 3 pattern part 4a mesh 4b mesh 4e primary electrodeposition layer 10 electroformed substrate 11 resist film 11a watermark hole part 13 resist film

Claims (4)

[Claims] 1. A metal mask comprising a pattern portion through which ink should pass and a mask portion which prevents the ink from passing, wherein the mesh-shaped pattern portion and the mask portion are an integral metal to be formed by electroforming. A metal mask characterized by being composed of. 2. The metal mask according to claim 1, wherein a plurality of kinds of meshes having different specifications according to the width of the pattern portion are mixed in one metal mask. 3. The metal mask according to claim 1, wherein a pattern portion having a mesh and a pattern portion having no mesh are mixed in one metal mask. 4. A first step of forming a resist film on the electroformed substrate corresponding to the watermark holes of the mesh of the pattern portion,
A second step of forming a mesh-shaped primary electrodeposition layer for forming a pattern portion in a portion not covered with the resist film in the first step, and the second step of forming the mesh-shaped electrodeposition layer obtained by the second step And a fourth step of forming a secondary electrodeposition layer for forming a mask portion in a portion not covered with the resist film in the third step, and a primary electrode integrally combined. A method for producing a metal mask, comprising a fifth step of peeling the deposition layer and the secondary electrodeposition layer from the electroformed substrate.