JPH0677671B2 - Exhaust gas treatment method and apparatus - Google Patents

Exhaust gas treatment method and apparatus

Info

Publication number
JPH0677671B2
JPH0677671B2 JP2062055A JP6205590A JPH0677671B2 JP H0677671 B2 JPH0677671 B2 JP H0677671B2 JP 2062055 A JP2062055 A JP 2062055A JP 6205590 A JP6205590 A JP 6205590A JP H0677671 B2 JPH0677671 B2 JP H0677671B2
Authority
JP
Japan
Prior art keywords
exhaust gas
cooling liquid
dust
plate
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2062055A
Other languages
Japanese (ja)
Other versions
JPH03262510A (en
Inventor
洋 柳岡
芳雄 小川
健二 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chiyoda Chemical Engineering and Construction Co Ltd
Original Assignee
Chiyoda Chemical Engineering and Construction Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chiyoda Chemical Engineering and Construction Co Ltd filed Critical Chiyoda Chemical Engineering and Construction Co Ltd
Priority to JP2062055A priority Critical patent/JPH0677671B2/en
Priority to CS902069A priority patent/CS206990A2/en
Priority to EP90304697A priority patent/EP0396375B1/en
Priority to US07/515,756 priority patent/US5120518A/en
Priority to ES90304697T priority patent/ES2066126T3/en
Priority to DE69015248T priority patent/DE69015248T2/en
Priority to KR1019900006215A priority patent/KR950012520B1/en
Priority to PL90285043A priority patent/PL165481B1/en
Priority to CN90104117A priority patent/CN1021020C/en
Publication of JPH03262510A publication Critical patent/JPH03262510A/en
Publication of JPH0677671B2 publication Critical patent/JPH0677671B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
  • Separation Of Particles Using Liquids (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、粉塵及び化学汚染物を含有する排ガスの処理
方法及び装置に関するものである。
The present invention relates to a method and an apparatus for treating exhaust gas containing dust and chemical pollutants.

〔従来の技術及びその問題点〕[Conventional technology and its problems]

従来、湿式排煙脱硫法においては、亜硫酸ガスの吸収脱
硫段階より以前に排ガスを冷却することが不可欠であ
り、従来の脱硫装置では、亜硫酸ガスを吸収反応させる
脱硫装置本体とは別に、冷却液循環ポンプを有する除塵
搭を設け,ここで排ガスの冷却と除塵を行っている。そ
の結果、装置全体が大型化し、かつ設備、用役等の費用
もこれに付随して増大する等の欠点があった。
Conventionally, in the wet flue gas desulfurization method, it is indispensable to cool the exhaust gas before the absorption desulfurization step of sulfurous acid gas. A dust removal tower with a circulation pump is installed to cool the exhaust gas and remove dust. As a result, the size of the entire apparatus is increased, and the costs of equipment, utilities, etc. are also increased, which is a drawback.

そこで、本発明手らは、先に、除塵搭を省略するため
に、亜硫酸ガスを吸収反応させる脱硫装置本体内におい
て高温排ガスに冷却液微粒子と吸収液微粒子を接触させ
て排ガス中の汚染物をそれら液体微粒子に捕捉させると
ともに、排ガスの増湿冷却を行わせ、その後、冷却され
た排ガスをガス分散管を介して吸収液中に導入し、ここ
で排ガス中の亜硫酸ガスを吸収除去し、清浄化された排
ガスを得る方法を提案した(特開昭64−18427号公
報)。
Therefore, in order to omit the dust removal tower, the present invention hands first contact the cooling liquid fine particles and the absorbing liquid fine particles with the high temperature exhaust gas in the desulfurization apparatus main body for absorbing and reacting with sulfurous acid gas to remove contaminants in the exhaust gas. In addition to capturing them in the liquid fine particles, the exhaust gas is humidified and cooled, and then the cooled exhaust gas is introduced into the absorbent through a gas dispersion pipe, where the sulfurous acid gas in the exhaust gas is absorbed and removed, and cleaned. A method for obtaining the converted exhaust gas has been proposed (Japanese Patent Laid-Open No. 64-18427).

しかし、この方法は、吸収液中に導入する排ガスが、冷
却液微粒子と吸収液微粒子を含み、しかも、これらの微
粒子は排ガス中の粉塵、HCl、HF、Al等の汚染物を含有
するため、吸収液の希釈化が起るとともに、それらの汚
染物の混入により、脱硫副生物、例えば石コウの品質が
低下するという問題や、さらには、冷却液微粒子の混入
による吸収液の希釈化や吸収液中への汚染物の混入が原
因となって、装置の脱硫性能ものものにも悪影響が生じ
る等の問題点を包含し、未だ満足し得るものではなかっ
た。
However, this method, the exhaust gas to be introduced into the absorption liquid, contains the cooling liquid particles and the absorption liquid particles, further, since these particles contain dust in the exhaust gas, HCl, HF, Al and other contaminants, The problem that the desulfurization by-product, such as gypsum, deteriorates in quality due to the contamination of the absorption liquid as well as the dilution of the absorption liquid, and the dilution or absorption of the absorption liquid due to the mixing of cooling liquid particles. It was not yet satisfactory, including the problem that the desulfurization performance of the device was adversely affected due to the inclusion of contaminants in the liquid.

〔発明の課題〕[Problems of the Invention]

本発明は、前記した如き従来技術に見られる問題を解決
し、排ガスの冷却と排ガス中に含まれる粉塵及び化学汚
染物の除去を1つの装置で達成することができ、かつ吸
収液中への排ガス中の粉塵の混入や、排ガスの冷却に用
いた冷却液の混入の著しく減少された排ガスの処理方法
及び装置を提供することをその課題とする。
INDUSTRIAL APPLICABILITY The present invention solves the problems found in the prior art as described above, can achieve cooling of exhaust gas and removal of dust and chemical contaminants contained in the exhaust gas with one device, and An object of the present invention is to provide a method and an apparatus for treating exhaust gas, in which dust in the exhaust gas and the cooling liquid used for cooling the exhaust gas are significantly reduced.

〔課題を解決するための手段〕[Means for Solving the Problems]

本発明者らは、前記課題を解決すべく鋭意研究を重ねた
結果、排ガスに冷却液を微粒子状に噴霧させて排ガスを
冷却させるとともに、排ガス中の粉塵を冷却液微粒子に
捕捉させ、そしてこの粉塵を捕捉した冷却液微粒子を含
む排ガスを垂直隔壁に衝突させてその流れを水平流から
上昇流に変換させるとともに、上昇する排ガスから粉塵
を捕捉した冷却液微粒子をその重力により落下させて分
離し、この冷却液微粒子の分離された排ガスをその隔壁
の上端を越えて下降流に変換させていったん空間部に収
容させ、この空間部から複数のガス分散管により分配さ
せて吸収液中に吹込み、排ガス中の化学汚染物を吸収液
中に吸収させて排ガスから分離することによって、前記
課題を解決し得ることを見出し、本発明を完成するに至
った。
The present inventors, as a result of repeated studies to solve the above problems, while cooling the exhaust gas by spraying a cooling liquid into the exhaust gas in a particulate form, the dust in the exhaust gas is trapped in the cooling liquid particles, and this Exhaust gas containing cooling liquid particles that have captured dust is collided with a vertical partition wall to convert the flow from a horizontal flow to an upward flow, and at the same time, cooling liquid particles that have captured dust from rising exhaust gas are dropped by gravity and separated. , The exhaust gas from which the cooling liquid particles have been separated is converted into a downward flow over the upper end of the partition wall and is once stored in the space part, and then distributed from the space part by a plurality of gas dispersion pipes and blown into the absorption liquid. The inventors have found that the above-mentioned problems can be solved by absorbing the chemical contaminants in the exhaust gas into the absorbing liquid and separating them from the exhaust gas, and have completed the present invention.

即ち、本発明によれば、排ガス中に冷却液を微粒子状に
噴霧する工程、該排ガスを垂直隔壁に衝突させて該排ガ
スを上昇流に変換させるとともに該上昇する排ガスから
排ガス中の粉塵を捕捉した冷却液微粒子をその重力によ
り落下させ、排ガスから分離する工程、該排ガスから分
離された該冷却液微粒子を捕集し、系外へ排出する工
程、該冷却液微粒子の分離された排ガスを該垂直隔壁の
上端を越えて下降流に変換させていったん空間部に収容
させる工程、この空間部から複数のガス分散管により分
配させて吸収液中に吹込み、排ガス中の化学汚染物を吸
収液中に吸収させて排ガスから分離する工程からなる粉
塵及び化学汚染物を含有する排ガスの処理方法が提供さ
れる。
That is, according to the present invention, the step of spraying the cooling liquid into the exhaust gas in the form of fine particles, colliding the exhaust gas with the vertical partition walls to convert the exhaust gas into an upward flow and capturing dust in the exhaust gas from the rising exhaust gas The cooling liquid fine particles are dropped by gravity and separated from the exhaust gas, the cooling liquid fine particles separated from the exhaust gas are collected and discharged to the outside of the system, and the exhaust gas from which the cooling liquid fine particles are separated is separated. The process of converting into a downward flow beyond the upper end of the vertical partition and once storing it in the space part, distributing from this space part with a plurality of gas dispersion pipes and blowing it into the absorption liquid, chemical contaminants in the exhaust gas are absorbed. Provided is a method for treating exhaust gas containing dust and chemical pollutants, which comprises a step of absorbing it and separating it from exhaust gas.

また、本発明によれば、排ガス中の冷却液を微粒子状に
噴出させる冷却液噴霧器と、内部に排ガスの流れを上昇
流に変換させる垂直隔壁と排ガスから分離された排ガス
中の粉塵を捕捉した冷却液微粒子を捕集する捕集板を有
する排ガス除塵室と、該粉塵を捕捉した冷却液微粒子が
分離され、垂直隔壁の上端を越えて下降流となった排ガ
スをいったん収容させる空間部と、該空間部に収容され
た排ガスを分配し、吸収液中に吹込むための複数のガス
分散管と、排ガス中の化学汚染物を吸収液中に吸収させ
て排ガスから分離する排ガス化学処理室と、該排ガス除
塵室で冷却液捕集板に捕集された粉塵を捕捉した冷却液
を排ガス除塵室の外部へ排出する排出管を備えたことを
特徴とする粉塵及び化学汚染物を含有する排ガスの処理
装置が提供される。
Further, according to the present invention, the cooling liquid sprayer for ejecting the cooling liquid in the exhaust gas into fine particles, the vertical partition wall for converting the flow of the exhaust gas into the upward flow inside, and the dust in the exhaust gas separated from the exhaust gas are captured. An exhaust gas dust removal chamber having a collection plate for collecting cooling liquid fine particles, and a cooling liquid fine particles that have captured the dust are separated, and a space portion for temporarily storing the exhaust gas that has become a downflow over the upper end of the vertical partition wall, A plurality of gas dispersion pipes for distributing the exhaust gas accommodated in the space and blowing it into the absorption liquid, an exhaust gas chemical treatment chamber for absorbing chemical contaminants in the exhaust gas into the absorption liquid and separating the exhaust gas from the exhaust gas, Treatment of exhaust gas containing dust and chemical pollutants, characterized in that it is provided with an exhaust pipe for discharging the cooling liquid that has captured the dust collected on the cooling liquid collection plate in the exhaust gas dust removal chamber to the outside of the exhaust gas dust removal chamber Equipment provided

次に、本発明を図面により説明する。第1図は本発明の
装置の1つの実施例についての縦断面概要図、第2図は
その装置本体の一部切欠斜視図である。第3図は本発明
の装置の他の実施例についての縦断面概要図、第4図は
その装置本体の一部切欠斜視図である。第2図及び第4
図においては、冷却液噴霧器は図示されていない。
Next, the present invention will be described with reference to the drawings. FIG. 1 is a schematic vertical sectional view of one embodiment of the apparatus of the present invention, and FIG. 2 is a partially cutaway perspective view of the apparatus body. FIG. 3 is a schematic vertical sectional view of another embodiment of the apparatus of the present invention, and FIG. 4 is a partially cutaway perspective view of the apparatus body. 2 and 4
In the figure, the cooling liquid atomizer is not shown.

第1図及び第2図に示した本発明の装置本体は、その全
体が密閉容器構造に形成され、上方に位置する排ガス除
塵室Aと、下方に位置する排ガス化学処理室Bとからな
っている。排ガス除塵室Aは、その内部に、上端が天板
3から間隔を置いた下方に位置する筒状垂直隔壁9及び
この筒状垂直隔壁9の下端部と側壁との間に水平に配設
された冷却液捕集板5を有している。筒状隔壁を形成す
る筒状体の水平断面形状は、円形、半円形、正方形、長
方形等の各種の形状であることができる。なお、この筒
状垂直隔壁9は、以下においては、単に垂直隔壁又は筒
状体とも言う。排ガス除塵室Aの側壁には、ガス導入口
11が配設され、このガス導入口11には排ガス導入管12が
連結される。ガス導入口11の開口最上端は、垂直隔壁9
の上端より下方に位置し、一方、その開口最上端は冷却
液捕集板5より上方に位置させる。冷却液捕集板5上に
は、冷却液排出管10を開口させる。排ガス導入管12は、
容器側壁に対して接線方向になるように配設することも
できる。このように配設した排ガス導入管では、排ガス
が回転しながら除塵室内を上昇するので、冷却液微粒子
と排ガスとの接触時間が長くなり、高められた排ガス除
塵効果及び冷却効果が得られる。
The apparatus main body of the present invention shown in FIG. 1 and FIG. 2 is formed into a closed container structure as a whole, and comprises an exhaust gas dust removal chamber A located above and an exhaust gas chemical treatment chamber B located below. There is. The exhaust gas dust removal chamber A has a cylindrical vertical partition 9 whose upper end is located below and spaced from the top plate 3, and is horizontally arranged between the lower end of the cylindrical vertical partition 9 and the side wall. It also has a cooling liquid collecting plate 5. The horizontal cross-sectional shape of the tubular body forming the tubular partition can be various shapes such as a circle, a semicircle, a square, and a rectangle. In addition, this cylindrical vertical partition 9 is also simply referred to as a vertical partition or a cylindrical body below. A gas inlet is provided on the side wall of the exhaust gas dust removal chamber A.
An exhaust gas introducing pipe 12 is connected to the gas introducing port 11. The uppermost end of the gas inlet 11 is a vertical partition 9
The uppermost end of the opening is located above the cooling liquid collecting plate 5. A cooling liquid discharge pipe 10 is opened on the cooling liquid collecting plate 5. The exhaust gas introduction pipe 12 is
It can also be arranged so as to be tangential to the side wall of the container. In the exhaust gas introducing pipe thus arranged, the exhaust gas rises in the dust removing chamber while rotating, so that the contact time between the cooling liquid particles and the exhaust gas becomes longer, and the enhanced exhaust gas dust removing effect and cooling effect can be obtained.

排ガス除塵室Aと、排ガス化学処理室Bとは、板面に多
数の透孔7を有し、この透孔7にガス分散管8を垂下さ
せた中央部が開口した水平隔板4を介して連絡してい
る。また、この水平隔板4と筒状垂直隔壁9の上端との
間は、隔壁9の上端を越えて下降流となった排ガスをい
ったん収容させる空間部に形成されている。ガス分散管
8の下端は底板2から間隔を置いた上方に位置する。こ
のガス分散管8の下端は、底板2から1〜10m程度上方
に位置させるのがよい。また、このガス分散管8の下端
部には、下端から一定の距離(約5〜50cm)の位置の周
面に排ガス吹出し用透孔を多数穿設し、排ガスをその下
端部周面から水平方向に噴出させる構造のものにするの
が好ましい。水平隔板4の中央開口には、排ガス排出管
6が立設され、その先端は、筒状垂直隔壁9を形成する
筒体内部を通り、天板3を貫通して容器1の外部へ導出
されている。
The exhaust gas dust removal chamber A and the exhaust gas chemical treatment chamber B have a large number of through holes 7 on the plate surface, and a horizontal partition plate 4 having a central portion opened through which a gas dispersion pipe 8 is hung is interposed. I am contacting you. Further, a space between the horizontal partition plate 4 and the upper end of the cylindrical vertical partition 9 is formed in a space for temporarily storing the exhaust gas which has passed the upper end of the partition 9 and has a downward flow. The lower end of the gas dispersion pipe 8 is located above and spaced from the bottom plate 2. The lower end of the gas dispersion pipe 8 is preferably located above the bottom plate 2 by about 1 to 10 m. Further, at the lower end of the gas dispersion pipe 8, a large number of through holes for blowing out exhaust gas are formed on the peripheral surface at a constant distance (about 5 to 50 cm) from the lower end, so that the exhaust gas is leveled from the peripheral surface of the lower end. It is preferable that the structure is such that it is ejected in the direction. An exhaust gas discharge pipe 6 is erected at the center opening of the horizontal partition plate 4, and the tip of the exhaust gas discharge pipe 6 passes through the inside of the cylindrical body forming the cylindrical vertical partition wall 9, penetrates the top plate 3, and is led out of the container 1. Has been done.

排ガス導入管12の内部又は排ガス除塵室内の冷却液捕集
板5の上方あるいはその両方に冷却液噴霧器13を配設す
る。冷却液噴霧器13は冷却液を微粒子として噴霧できれ
ばいかなるものであってもよく、例えば、旋回型のスプ
レー、ジェット型のスプレー又は二流体ノズル等を挙げ
ることができる。
A cooling liquid sprayer 13 is arranged inside the exhaust gas introducing pipe 12 or above the cooling liquid collecting plate 5 in the exhaust gas dust removing chamber. The cooling liquid sprayer 13 may be of any type as long as it can spray the cooling liquid as fine particles, and examples thereof include a swirl type spray, a jet type spray, and a two-fluid nozzle.

冷却液排出管10は貯液タンク15に連結し、この貯液タン
ク15は循環ポンプ16及び配管17を介して冷却液噴霧器13
に連結する。また、配管17には配管18が連結し、これは
粉塵分離器19に連結する。配管20は排液管である。
The cooling liquid discharge pipe 10 is connected to a liquid storage tank 15, and this liquid storage tank 15 is provided with a cooling liquid sprayer 13 via a circulation pump 16 and a pipe 17.
Connect to. A pipe 18 is connected to the pipe 17, which is connected to a dust separator 19. The pipe 20 is a drainage pipe.

排ガス化学処理室Bの側壁には、吸収剤供給用の配管26
及び吸収液排出用の配管27が配設されている。
On the side wall of the exhaust gas chemical treatment chamber B, a pipe for supplying the absorbent 26
Also, a pipe 27 for discharging the absorbing liquid is provided.

排ガス化学処理室Bには、吸収液Lが充填される。吸収
液は、排ガスの種類に対応して適当に選定され、従来公
知の各種のものが用いられる。このようなものとして
は、例えば、排ガス中の汚染物がSO、SO、NO、N
、NO、N、N、HCl、HF等の酸性物
質である場合、アルカリ金属化合物、アルカ土類金属化
合物等のアルカリ性物質を含む溶液やスラリーが用いら
れ、特に水酸化カルシウムスラリーや、炭酸カルシウム
スラリーが用いられる。また、吸収液として炭酸カルシ
ウムスラリーや水酸化カルシウムスラリーを用いる場
合、これらのカルシウム化合物は亜硫酸ガスと反応して
亜硫酸カルシウムを形成するが、この場合、吸収液中に
空気や酸素を導入することにより、亜硫酸カルシウムを
硫酸カルシウム(石コウ)に変換することができる。ま
た、排ガス中の汚染物がアンモニア等のアルカリ性物質
である場合には、酸性水溶液を吸収液として用いればよ
い。冷却液としては、通常の水や、アルカリ性又は酸性
水溶液が排ガスの種類に応じて適当に用いられる。
The exhaust gas chemical treatment chamber B is filled with the absorbing liquid L. The absorbing liquid is appropriately selected according to the type of exhaust gas, and various conventionally known absorbing liquids are used. Examples of such substances include pollutants in exhaust gas such as SO 2 , SO 3 , NO, and N 2.
In the case of an acidic substance such as O 3 , NO 2 , N 2 O 4 , N 2 O 5 , HCl and HF, a solution or slurry containing an alkaline substance such as an alkali metal compound or an alkaline earth metal compound is used. Calcium hydroxide slurry or calcium carbonate slurry is used. When calcium carbonate slurry or calcium hydroxide slurry is used as the absorbing liquid, these calcium compounds react with sulfurous acid gas to form calcium sulfite. In this case, by introducing air or oxygen into the absorbing liquid. , Calcium sulfite can be converted to calcium sulfate (gypsum). When the pollutant in the exhaust gas is an alkaline substance such as ammonia, an acidic aqueous solution may be used as the absorbing liquid. As the cooling liquid, ordinary water or an alkaline or acidic aqueous solution is appropriately used depending on the type of exhaust gas.

第1図及び第2図に示された装置を用いて粉塵及び化学
汚染物を含む排ガスの処理を行うには、例えば、排煙等
の高温排ガスを排ガス導入管12を介して排ガス除塵室A
に導入する。排ガス導入管12内及び又は除塵室A内には
冷却液噴霧器13から冷却液が噴霧され、高温排ガスは、
この微粒子状の冷却液と接触し、これによって冷却及び
増湿される。また、同時に、排ガス中の粉塵の大部分
は、この冷却液微粒子に捕捉される。この冷却液微粒子
を含む排ガスは、垂直隔壁9によってその流れを上昇流
に変えられる。一方、噴霧器13から噴霧された冷却液微
粒子は、排ガスの上昇流れ方向とは逆に、除塵室Aの空
間を下方に落下し、冷却液捕集板5上に落下し、ここに
滞留して滞留液25を形成する。高温排ガスに含まれる粉
塵の一部は、除塵室A内におけるガスの上昇流速が、通
常、1〜5m/secと小さいため、重力により冷却液微粒子
と共に落下し、滞留液25に捕捉される。高温排ガス中の
微粒子状の粉塵は、一般には、排ガスに同伴され、排ガ
スから分離するのは通常困難であるが、本発明の場合
は、冷却液噴霧により形成された冷却液微粒子と接触し
て、液滴に捕捉され、粗大化されるため沈降速度が増大
し、容易に重力により落下し、滞留液25のなかに取り込
まれる。除塵室Aでは水平方向のガス流速も通常、1〜
5m/secと小さいので、冷却液微粒子の再飛散はほとんど
なく、冷却液微粒子は排ガスから効率良く分離される。
冷却液噴霧器から噴霧して形成する冷却液微粒子の平均
粒径は、排ガスとの接触効率及び排ガスからの分離効率
を考えて、400〜4000μmの範囲に規定するのがよい。
In order to process the exhaust gas containing dust and chemical pollutants using the apparatus shown in FIGS. 1 and 2, for example, high temperature exhaust gas such as flue gas is exhausted through the exhaust gas introducing pipe 12 into the exhaust gas dust removing chamber A.
To introduce. The cooling liquid is sprayed from the cooling liquid sprayer 13 into the exhaust gas introducing pipe 12 and / or the dust removing chamber A, and the high temperature exhaust gas is
The cooling liquid in the form of fine particles comes into contact with the cooling liquid, whereby it is cooled and humidified. At the same time, most of the dust in the exhaust gas is captured by the cooling liquid particles. The flow of the exhaust gas containing the cooling liquid particles can be changed to an upward flow by the vertical partition wall 9. On the other hand, the cooling liquid fine particles sprayed from the sprayer 13 drop downward in the space of the dust removing chamber A, drop on the cooling liquid collecting plate 5 and stay there, contrary to the upward flow direction of the exhaust gas. A retention liquid 25 is formed. A part of the dust contained in the high-temperature exhaust gas falls along with the cooling liquid particles due to gravity because the rising velocity of the gas in the dust removing chamber A is usually small at 1 to 5 m / sec, and is trapped in the retained liquid 25. The particulate dust in the high-temperature exhaust gas is generally entrained in the exhaust gas and is usually difficult to separate from the exhaust gas, but in the case of the present invention, contact with the cooling liquid particles formed by cooling liquid spraying The droplets are captured and coarsened to increase the sedimentation velocity, and easily fall by gravity and are taken into the retained liquid 25. In the dust removal chamber A, the horizontal gas flow velocity is usually 1 to
Since it is as small as 5 m / sec, there is almost no re-dispersion of cooling liquid fine particles, and the cooling liquid fine particles are efficiently separated from the exhaust gas.
The average particle size of the cooling liquid fine particles formed by spraying from the cooling liquid sprayer is preferably specified in the range of 400 to 4000 μm in consideration of the contact efficiency with exhaust gas and the separation efficiency from exhaust gas.

前記のようにして冷却され、除塵され、さらに冷却液微
粒子の除去された排ガスは、垂直隔壁を形成する筒状体
9の上端を越えて筒状体9内を下方に流通し、筒状体9
の上端と水平隔板4との間の前記筒状体9の内部空間を
含む空間部にいったん収容された後、この空間部から、
水平隔板4に垂設されたガス分散管8により分配されて
化学処理室Bの吸収液L中に吹込まれ、吸収液をと接触
する。吸収液と排ガス中の化学汚染物との反応により化
学汚染物が除去され、化学汚染物の除去された排ガス
は、吸収液の表面から放散し、排ガス排出管6を通って
系外に排出される。吸収液Lに導入される排ガスは、そ
れ以前に十分に冷却され、かつ除塵されたもので、しか
もその冷却に際して接触させた冷却液微粒子を除去され
ていることから、排ガスの冷却液による処理は悪影響を
何ら受けない。
The exhaust gas, which has been cooled and dust-removed as described above, and further has the cooling liquid fine particles removed, flows downward in the tubular body 9 beyond the upper end of the tubular body 9 forming the vertical partition wall. 9
Once housed in a space portion including the internal space of the tubular body 9 between the upper end of the and the horizontal partition plate 4, from this space portion,
The gas is distributed by the gas dispersion pipe 8 vertically provided on the horizontal partition plate 4 and blown into the absorbing liquid L in the chemical treatment chamber B to contact the absorbing liquid. The chemical contaminants are removed by the reaction between the absorbing liquid and the chemical contaminants in the exhaust gas, and the exhaust gas from which the chemical contaminants have been removed diffuses from the surface of the absorbing liquid and is discharged to the outside of the system through the exhaust gas discharge pipe 6. It The exhaust gas introduced into the absorption liquid L has been sufficiently cooled and dust-removed before that time, and since the cooling liquid particles contacted during the cooling have been removed, the exhaust gas is not treated with the cooling liquid. No adverse effect.

冷却液捕集板5上の滞留液25は、冷却液排出管10を通っ
て貯液タンク15に導入され、ここから循環ポンプ16及び
配管17を通って冷却液噴霧器13に循環される。また、そ
の冷却液の一部は配管18を通って抜出され、粉塵分離器
19に送られ、ここで冷却液中の粉塵が除去される。粉塵
分離器19からは、粉塵の除去された排液が配管20を通っ
て排出され、また粉塵21が除去される。貯液タンク15に
は、配管20を通って抜出される排液量及び蒸発により減
少した冷却液量に応じて、新しい冷却液が補給される。
The accumulated liquid 25 on the cooling liquid collecting plate 5 is introduced into the liquid storage tank 15 through the cooling liquid discharge pipe 10, and then circulated to the cooling liquid sprayer 13 through the circulation pump 16 and the pipe 17. In addition, a part of the cooling liquid is extracted through the pipe 18, and the dust separator
It is sent to 19, where the dust in the cooling liquid is removed. From the dust separator 19, the waste liquid from which the dust has been removed is discharged through the pipe 20, and the dust 21 is also removed. The liquid storage tank 15 is replenished with new cooling liquid in accordance with the amount of drained liquid extracted through the pipe 20 and the amount of cooling liquid reduced by evaporation.

本発明において、高温排ガスを冷却液微粒子と接触させ
る場合、種々の変更を行なうことができる。例えば、冷
却液は、必ずしも排ガス導入管12内と除塵室A内の両方
に噴霧させる必要はなく、そのいずれか一方のみに噴霧
させることができる。また、排ガスの冷却の大部分を排
ガス導入管12内で行なうことによって、除塵室A内で用
いる冷却液噴霧器の設置数を減らすこともできる。
In the present invention, various changes can be made when the high temperature exhaust gas is brought into contact with the cooling liquid particles. For example, the cooling liquid does not necessarily have to be sprayed into both the exhaust gas introducing pipe 12 and the dust removing chamber A, but can be sprayed into only one of them. Further, by performing most of the cooling of the exhaust gas in the exhaust gas introducing pipe 12, it is possible to reduce the number of installed cooling liquid atomizers used in the dust removing chamber A.

除塵室Aにおる冷却液の噴霧は、単に排ガスの冷却のみ
でなく、排ガス中から分離された粉塵を含む粘稠な液が
垂直隔壁9に付着して生じた固形分を洗浄するためにも
用いられる。冷却液微粒子が、この垂直隔壁9の表面に
万遍なくかかることによって、隔壁9は、清浄に保たれ
る。
The spraying of the cooling liquid in the dust removing chamber A is not only for cooling the exhaust gas but also for cleaning the solid content generated by the viscous liquid containing dust separated from the exhaust gas adhering to the vertical partition walls 9. Used. The cooling liquid particles are evenly applied to the surfaces of the vertical partition walls 9, whereby the partition walls 9 are kept clean.

排ガスを冷却するための冷却液噴霧量は、供給される高
温排ガス量、排ガス温度、冷却液の温度等の関係におい
て適宜選択することができるが、噴霧液量/高温排ガス
量の比は、重量基準で約0.5〜5の範囲が適当である。
また、高温排ガス中の粉塵と冷却液微粒子とを緊密に接
触させ、粉塵を十分捕捉するとともに、ガスを十分冷却
するためには、筒状体9の開口上端は、排ガス導入口11
の最上端より250mm以上及び1500mm以下の上方に位置さ
せるのが好ましい。また筒状体9は上方開口ばかりでな
く、その周面に開口部を設けた側方開口とすることもで
き、その側方開口部の形状は、円形、三角形、四角形な
どいかなる形状にもすることができる。さらに、筒状体
9の開口上端の位置は、容器の天板3から下方に300mm
以上、3000mm以下の間隔を置いて位置させるのがよい。
The cooling liquid spray amount for cooling the exhaust gas can be appropriately selected in relation to the supplied high temperature exhaust gas amount, exhaust gas temperature, cooling liquid temperature, etc., but the ratio of spray liquid amount / high temperature exhaust gas amount is A range of about 0.5 to 5 is suitable as a standard.
Further, in order to bring the dust in the high-temperature exhaust gas into close contact with the cooling liquid fine particles to capture the dust sufficiently and to cool the gas sufficiently, the upper end of the opening of the tubular body 9 should have the exhaust gas introduction port 11
It is preferable to be located above the uppermost end of 250 mm or more and 1500 mm or less. Further, the cylindrical body 9 can be not only an upper opening but also a side opening having an opening on the peripheral surface thereof, and the shape of the side opening can be any shape such as a circle, a triangle, or a quadrangle. be able to. Furthermore, the position of the upper end of the opening of the tubular body 9 is 300 mm below the top plate 3 of the container.
As described above, it is preferable to place them at intervals of 3000 mm or less.

また、第1図及び第2図に示した排ガス処理装置におい
て、排ガスの冷却効率及び排ガス中からの冷却液微粒子
の分離効率を高度に維持するとともに、装置全体をコン
パクト化するためには、水平隔板4の全面積(容器断面
積)からその中央開口部の面積(筒状体9の断面積)を
除いた面積pと、その中央開口部の面積(筒状体9の断
面積)からその開口内を貫通する排ガス排出管6の断面
積を除いた面積Qとの比P/Qは、1〜5の範囲に規定す
るのがよい。この面積比P/Qが前記範囲より小さくなる
と、除塵室Aにおける排ガスの上昇温度が過大となり、
排ガスからの冷却液微粒子の分離効率が悪化し、相当量
の冷却液微粒子が排ガスに同伴し、吸収液L中に混入す
るようになる。一方、面積比P/Qが前記範囲より大きく
なると、ガス分散管8を下降するガス流速が過大とな
り、ガス圧力の損失が増大するようになる。ガス分散管
8の直径は、通常、5〜50cm程度である。
Further, in the exhaust gas treatment device shown in FIG. 1 and FIG. 2, in order to maintain the cooling efficiency of the exhaust gas and the separation efficiency of the cooling liquid particles from the exhaust gas at a high level and to make the entire device compact, From the total area of the partition plate 4 (container cross-sectional area) excluding the area of the central opening (cross-sectional area of the tubular body 9) and the area of the central opening (cross-sectional area of the tubular body 9) The ratio P / Q to the area Q excluding the cross-sectional area of the exhaust gas discharge pipe 6 penetrating the inside of the opening is preferably specified in the range of 1 to 5. If the area ratio P / Q becomes smaller than the above range, the temperature rise of the exhaust gas in the dust removing chamber A becomes excessive,
The efficiency of separating the cooling liquid particles from the exhaust gas deteriorates, and a considerable amount of the cooling liquid particles accompany the exhaust gas and become mixed in the absorbing liquid L. On the other hand, when the area ratio P / Q is larger than the above range, the gas flow velocity flowing down the gas dispersion pipe 8 becomes excessively large, and the loss of gas pressure increases. The diameter of the gas dispersion pipe 8 is usually about 5 to 50 cm.

第3図及び第4図に示した本発明の装置本体は、全体的
には第1図及び第2図に示した装置と同様の構造に構成
されたものがあるが、この場合には、垂直隔壁9は板状
体で形成され、また、排ガス排出管6は化学処理室Bの
上部側壁に配設されている。また、第3図及び第4図に
おいて、第1図及び第2図に示した符号と同一の各符号
は同一の意味を有する。
The apparatus main body of the present invention shown in FIGS. 3 and 4 has an overall structure similar to that of the apparatus shown in FIGS. 1 and 2, but in this case, The vertical partition 9 is formed of a plate-shaped body, and the exhaust gas discharge pipe 6 is arranged on the upper side wall of the chemical treatment chamber B. Further, in FIGS. 3 and 4, the same reference numerals as those shown in FIGS. 1 and 2 have the same meanings.

〔発明の効果〕〔The invention's effect〕

本発明の方法によれば、1つの装置において、排ガスの
冷却、除塵及び吸収反応(例えば、脱硫反応)の三者を
同時にかつ効率よく実施することができる。また、本発
明の装置は、排ガスの冷却、除塵及び吸収反応の三者を
同時に実施し得る機能を有するので、脱硫装置本体から
独立した除塵搭を備えた従来一般の脱硫装置と比較し、
著しく小型化されたものである。
According to the method of the present invention, it is possible to simultaneously and efficiently perform the three functions of exhaust gas cooling, dust removal and absorption reaction (for example, desulfurization reaction) in one device. Further, the apparatus of the present invention has a function capable of simultaneously performing exhaust gas cooling, dust removal and absorption reaction, so that compared with a conventional general desulfurization apparatus having a dust removal tower independent from the desulfurization apparatus main body,
It is remarkably miniaturized.

さらに、垂直隔壁を越えて下降する排ガスは、いったん
空間部に収容され、この空間部からガス分散管により分
配されることから、排ガスはそのガス分散管に均等に分
配されて吸収液中に吹込まれ、効率的な排ガスと吸収液
との接触が達成される。
Further, since the exhaust gas descending beyond the vertical partition is once stored in the space and is distributed from this space by the gas dispersion pipe, the exhaust gas is evenly distributed to the gas dispersion pipe and blown into the absorbing liquid. In rare cases, efficient contact between the exhaust gas and the absorbing liquid is achieved.

本発明の装置において、排ガス導入口11の最上端の上方
にその上端が位置する垂直隔壁が設けられているので、
排ガス中の粉塵を捕捉した冷却液微粒子は、排ガスが隔
壁9の上端に至るまでの間に重力により落下し、排ガス
から分離される。これによって排ガスからの冷却液微粒
子と粉塵の除去が同時に達成される。また、本発明装置
では、排ガス導入管12を通って導入された排ガスは垂直
隔壁9の壁面と衝突するように構成されているので、排
ガス中に含まれる冷却液微粒子及び粉塵の分離は、この
衝突によって促進される。本発明では、除塵室Aから化
学処理室Bに入る排ガスに含まれる冷却液微粒子の割合
は、2重量%以下という非常に低いものである。
In the apparatus of the present invention, since the vertical partition wall whose upper end is located above the uppermost end of the exhaust gas introduction port 11,
The cooling liquid fine particles that have captured the dust in the exhaust gas fall by gravity until the exhaust gas reaches the upper end of the partition wall 9 and are separated from the exhaust gas. As a result, the removal of cooling liquid particles and dust from the exhaust gas is achieved at the same time. Further, in the device of the present invention, since the exhaust gas introduced through the exhaust gas introduction pipe 12 is configured to collide with the wall surface of the vertical partition wall 9, the separation of the cooling liquid fine particles and the dust contained in the exhaust gas is Promoted by a collision. In the present invention, the proportion of the cooling liquid fine particles contained in the exhaust gas entering the chemical treatment chamber B from the dust removal chamber A is as low as 2% by weight or less.

また、本発明装置は、除塵室A内において、冷却液捕集
板5上に滞留液25が形成されるように構成されているの
で、滞留液と衝突した排ガス中の粉塵はこの滞留液に取
込まれて、排ガスからの除塵が促進される。
Further, since the device of the present invention is configured such that the retained liquid 25 is formed on the cooling liquid collecting plate 5 in the dust removing chamber A, the dust in the exhaust gas that collides with the retained liquid is generated in this retained liquid. Incorporated to promote dust removal from exhaust gas.

さらに、本発明の装置においては、吸収液中に導入分散
される排ガスは、冷却液微粒子及び粉塵を実質上含有し
ないので、吸収液が冷却液微粒子によって希釈されるこ
とがない上、吸収液が粉塵によって汚染されることもな
い。さらに、排ガス中に粉塵とともに含まれるHCl、H
F、Al等の不純物も排ガスと冷却液微粒子との接触によ
り除去される。従って、本発明においては、吸収液と化
学汚染物との反応により得られる反応生成物、例えば石
コウの純度が高くなり、その製品価値が高められるとい
う利点がある。
Furthermore, in the device of the present invention, the exhaust gas introduced and dispersed in the absorbing liquid does not substantially contain the cooling liquid fine particles and the dust, so that the absorbing liquid is not diluted with the cooling liquid fine particles, and the absorbing liquid is It is not polluted by dust. In addition, HCl and H contained in the exhaust gas together with dust
Impurities such as F and Al are also removed by contact between the exhaust gas and the cooling liquid particles. Therefore, in the present invention, there is an advantage that the purity of the reaction product obtained by the reaction between the absorbing liquid and the chemical contaminant, for example, Gypsum, is increased and the product value thereof is enhanced.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の装置の実施例の1つについての縦断面
概要図、第2図はその装置本体の一部切欠斜視図であ
る。 第3図は本発明の装置の他の実施例についての縦断面概
略図、第4図はその装置本体の一部切欠斜視図である。 1……容器、4……水平隔板、5……冷却液捕集板、6
……排ガス排出管、8……ガス分散管、9……垂直隔
壁、10……冷却液排出管、12……排ガス導入管、13……
冷却液噴霧器、25……滞留液、G……排ガス、L……吸
収液。
FIG. 1 is a schematic vertical sectional view of one embodiment of the apparatus of the present invention, and FIG. 2 is a partially cutaway perspective view of the apparatus body. FIG. 3 is a schematic vertical sectional view of another embodiment of the apparatus of the present invention, and FIG. 4 is a partially cutaway perspective view of the apparatus body. 1 ... Container, 4 ... Horizontal diaphragm, 5 ... Coolant collecting plate, 6
...... Exhaust gas exhaust pipe, 8 …… Gas dispersion pipe, 9 …… Vertical partition wall, 10 …… Coolant exhaust pipe, 12 …… Exhaust gas introduction pipe, 13 ……
Cooling liquid sprayer, 25 ... Retaining liquid, G ... Exhaust gas, L ... Absorption liquid.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】排ガス中に冷却液を微粒子状に噴霧する工
程、該排ガスを垂直隔壁に衝突させて該排ガスを上昇流
に変換させるとともに該上昇する排ガスから排ガス中の
粉塵を捕捉した冷却液微粒子をその重力により落下さ
せ、排ガスから分離する工程、該排ガスから分離された
該冷却液微粒子を捕集し、系外へ排出する工程、該冷却
液微粒子の分離された排ガスを該垂直隔壁の上端を越え
て下降流に変換させていったん空間部に収容させる工
程、この空間部から複数のガス分散管により分配させて
吸収液中に吹込み、排ガス中の化学汚染物を吸収液中に
吸収させて排ガスから分離する工程からなる粉塵及び化
学汚染物を含有する排ガスの処理方法。
1. A step of spraying a cooling liquid in the form of fine particles in the exhaust gas, a cooling liquid in which dust in the exhaust gas is captured from the rising exhaust gas while colliding the exhaust gas with a vertical partition wall to convert the exhaust gas into an upward flow. The step of dropping the fine particles by its gravity to separate them from the exhaust gas, the step of collecting the cooling liquid particles separated from the exhaust gas and discharging them to the outside of the system, the exhaust gas from which the cooling liquid particles have been separated to the vertical partition wall Process of converting into a downward flow beyond the upper end and once accommodating it in the space part, distributing from this space part with multiple gas dispersion pipes and blowing it into the absorption liquid, absorbing chemical contaminants in the exhaust gas into the absorption liquid A method for treating exhaust gas containing dust and chemical contaminants, which comprises a step of separating the exhaust gas from the exhaust gas.
【請求項2】該排ガスが硫黄酸化物を含み、吸収液が脱
硫液である請求項1の方法。
2. The method according to claim 1, wherein the exhaust gas contains sulfur oxides, and the absorption liquid is a desulfurization liquid.
【請求項3】排ガス中の冷却液を微粒子状に噴出させる
冷却液噴霧器と、内部に排ガスの流れを上昇流に変換さ
せる垂直隔壁と、排ガスから分離された排ガス中の粉塵
を捕捉した冷却液微粒子を捕集する捕集板を有する排ガ
ス除塵室と、該粉塵を捕捉した冷却液微粒子が分離さ
れ、垂直隔壁の上端を越えて下降流となった排ガスをい
ったん空間部に収容させる空間部と、該空間部に収容さ
れた排ガスを分配し、吸収液中に吹込むための複数のガ
ス分散管と、排ガス中の化学汚染物を吸収液中に吸収さ
せて排ガスから分離する排ガス化学処理室と、該排ガス
除塵室で冷却液捕集板に捕集された粉塵を捕捉した冷却
液を排ガス除塵室の外部へ排出する排出管を備えたこと
を特徴とする粉塵及び化学汚染物を含有する排ガスの処
理装置。
3. A cooling liquid sprayer for ejecting the cooling liquid in the exhaust gas in the form of fine particles, a vertical partition wall for converting the flow of the exhaust gas into an upward flow, and a cooling liquid for trapping the dust in the exhaust gas separated from the exhaust gas. An exhaust gas dust removal chamber having a collection plate that collects fine particles, and a cooling liquid fine particles that have captured the dust are separated, and a space portion that temporarily stores the exhaust gas that has become a downflow over the upper end of the vertical partition wall in the space portion. , A plurality of gas dispersion pipes for distributing the exhaust gas contained in the space and blowing it into the absorption liquid, and an exhaust gas chemical treatment chamber for absorbing chemical contaminants in the exhaust gas into the absorption liquid and separating the exhaust gas from the exhaust gas, Of exhaust gas containing dust and chemical pollutants, characterized in that it is provided with a discharge pipe for discharging the cooling liquid, which has captured the dust collected on the cooling liquid collection plate in the exhaust gas dust removal chamber, to the outside of the exhaust gas dust removal chamber. Processing equipment.
【請求項4】該冷却液噴霧器が、該排ガス除塵室のガス
導入口に連結する排ガス導入管内及び/又は排ガス除塵
室内に配設されている請求項3の装置。
4. The apparatus according to claim 3, wherein the cooling liquid atomizer is arranged in an exhaust gas introducing pipe connected to a gas introducing port of the exhaust gas dust removing chamber and / or in an exhaust gas dust removing chamber.
【請求項5】該排ガス除塵室が、該排ガス化学処理室の
上方に設置され、該排ガス除塵室と該排ガス化学処理室
とが板面に多数のガス分散管を垂下させた水平隔板を介
して連絡している請求項3又は4の装置。
5. The exhaust gas dust removal chamber is installed above the exhaust gas chemical treatment chamber, and the exhaust gas dust removal chamber and the exhaust gas chemical treatment chamber form a horizontal partition plate having a large number of gas dispersion pipes suspended on the plate surface. The device according to claim 3 or 4, which is in communication with each other.
【請求項6】内部に上端が天板から間隔を置いた下方に
位置する筒状垂直隔壁及び該筒状垂直隔壁の下端部と側
壁との間に水平に配設された冷却液捕集板を有し、側壁
に開口最上端が該筒状垂直隔壁の上端より下方に位置
し、開口最上端が該冷却液捕集板より上方に位置するガ
ス導入口を有する排ガス除塵室と、該ガス導入口に連結
する排ガス導入管と、該排ガス除塵室の下方に配設され
た排ガス化学処理室と、該排ガス除塵室と該排ガス化学
処理室とを連絡する板面に多数のガス分散管を垂下させ
た中央部が開口した水平隔板と、該水平隔板の中央開口
に立設され、該排ガス除塵室内の該筒状垂直隔壁の筒体
内部を通って天板を貫通する排ガス排出管と、該排ガス
導入管内及び/又は該冷却液捕集板の上方に配設された
冷却液噴霧器と、該冷却液捕集板に開口する冷却液排出
管を備えていることを特徴とする粉塵及び化学汚染物を
含有する排ガス処理装置。
6. A cylindrical vertical partition having an upper end located below and spaced from a top plate, and a cooling liquid collecting plate horizontally disposed between a lower end of the cylindrical vertical partition and a side wall. An exhaust gas dust removal chamber having a gas inlet whose uppermost opening is located below the upper end of the cylindrical vertical partition in the side wall, and whose uppermost opening is located above the cooling liquid collecting plate; An exhaust gas introduction pipe connected to the introduction port, an exhaust gas chemical treatment chamber disposed below the exhaust gas dust removal chamber, and a large number of gas dispersion pipes on a plate surface connecting the exhaust gas dust removal chamber and the exhaust gas chemical treatment chamber. A horizontal partition plate having an open central portion and a flue gas exhaust pipe erected at the central opening of the horizontal partition plate and penetrating the top plate through the inside of the tubular vertical partition wall in the exhaust gas dust removal chamber. A cooling liquid sprayer disposed in the exhaust gas introducing pipe and / or above the cooling liquid collecting plate; Exhaust gas treatment device containing dust and chemical contaminants, characterized in that it comprises a cooling liquid discharge pipe opening into 却液 collection plate.
【請求項7】内部に上端が天板から間隔を置いた下方に
位置する板状垂直隔壁及び該板状垂直隔壁の下端部と側
壁との間に水平に配設された冷却液捕集板を有し、側壁
に開口最上端が該板状垂直隔壁の上端より下方に位置
し、開口最下端が該冷却液捕集板より上方に位置するガ
ス導入口を有する排ガス除塵室と、該ガス導入口に連結
する排ガス導入管と、該排ガス除塵室の下方に配設され
た排ガス化学処理室と、該排ガス除塵室と該排ガス化学
処理室とを連結する板面に多数のガス分散管の垂下させ
た水平隔板と、該排ガス化学処理室の上部側隔に配設さ
れたガス排出口と、該ガス排出口に連結された排ガス排
出管と、該排ガス導入管内及び/又は該冷却液捕集板の
上方に配設された冷却液噴霧器と、該冷却液捕集板に開
口する冷却液排出管を備えていることを特徴とする粉塵
及び化学汚染物を含有する排ガス処理装置。
7. A plate-shaped vertical partition having an upper end located below and spaced from a top plate, and a cooling liquid collecting plate horizontally disposed between a lower end and a side wall of the plate-shaped vertical partition. An exhaust gas dust removal chamber having a gas inlet whose uppermost opening is located below the upper end of the plate-like vertical partition wall and whose lowermost opening is located above the cooling liquid collecting plate; An exhaust gas introduction pipe connected to the introduction port, an exhaust gas chemical treatment chamber arranged below the exhaust gas dust removal chamber, and a large number of gas dispersion pipes on a plate surface connecting the exhaust gas dust removal chamber and the exhaust gas chemical treatment chamber. A suspended horizontal partition plate, a gas exhaust port arranged in an upper side space of the exhaust gas chemical treatment chamber, an exhaust gas exhaust pipe connected to the gas exhaust port, and in the exhaust gas introduction pipe and / or the cooling liquid. Cooling liquid sprayer disposed above the collecting plate, and cooling liquid discharge pipe opening to the cooling liquid collecting plate Exhaust gas treatment device containing dust and chemical contaminants, characterized in that it comprises.
JP2062055A 1989-05-02 1990-03-13 Exhaust gas treatment method and apparatus Expired - Fee Related JPH0677671B2 (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2062055A JPH0677671B2 (en) 1990-03-13 1990-03-13 Exhaust gas treatment method and apparatus
CS902069A CS206990A2 (en) 1989-05-02 1990-04-25 Method of waste gas cleaning that contains dust and chemical impurities and equipment for this method realization
EP90304697A EP0396375B1 (en) 1989-05-02 1990-04-30 Method and apparatus for the treatment of a waste gas containing dusts and chemical contaminants
US07/515,756 US5120518A (en) 1989-05-02 1990-04-30 Method and apparatus for the treatment of a waste gas containing dusts and chemical contaminants
ES90304697T ES2066126T3 (en) 1989-05-02 1990-04-30 PROCEDURE AND APPARATUS FOR THE TREATMENT OF A RESIDUAL GAS CONTAINING DUST AND CHEMICAL CONTAMINANTS.
DE69015248T DE69015248T2 (en) 1989-05-02 1990-04-30 Method and apparatus for treating a gas containing dust and chemical contaminants.
KR1019900006215A KR950012520B1 (en) 1989-05-02 1990-05-01 Method and apparatus for the treatment of a waste gas containing dusts and chemical contaminants
PL90285043A PL165481B1 (en) 1989-05-02 1990-05-02 Method of and apparatus for treating waste gases containing dusty matter and chemical pollutants
CN90104117A CN1021020C (en) 1989-05-02 1990-05-02 Method and apparatus for treatment of waste gas containing dusts and chemical contaminants

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2062055A JPH0677671B2 (en) 1990-03-13 1990-03-13 Exhaust gas treatment method and apparatus

Publications (2)

Publication Number Publication Date
JPH03262510A JPH03262510A (en) 1991-11-22
JPH0677671B2 true JPH0677671B2 (en) 1994-10-05

Family

ID=13189081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2062055A Expired - Fee Related JPH0677671B2 (en) 1989-05-02 1990-03-13 Exhaust gas treatment method and apparatus

Country Status (1)

Country Link
JP (1) JPH0677671B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW287962B (en) * 1994-06-13 1996-10-11 Chiyoda Chem Eng Construct Co
JP5166791B2 (en) * 2007-07-24 2013-03-21 三菱重工業株式会社 Flue gas desulfurization equipment
ITMI20121893A1 (en) * 2012-11-06 2014-05-07 Innovation In Sciences & Technologi Es S R L METHOD AND SYSTEM FOR MIXING GAS AND LIQUID FOR GRAVITATIONAL, PHYSICAL AND CHEMICAL COLLECTION OF COMPOUNDS

Also Published As

Publication number Publication date
JPH03262510A (en) 1991-11-22

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