JPH0676378A - Protecting film of magneto-optical recording medium - Google Patents

Protecting film of magneto-optical recording medium

Info

Publication number
JPH0676378A
JPH0676378A JP20816292A JP20816292A JPH0676378A JP H0676378 A JPH0676378 A JP H0676378A JP 20816292 A JP20816292 A JP 20816292A JP 20816292 A JP20816292 A JP 20816292A JP H0676378 A JPH0676378 A JP H0676378A
Authority
JP
Japan
Prior art keywords
film
recording medium
magneto
optical recording
amorphous silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20816292A
Other languages
Japanese (ja)
Inventor
Mitsuaki Kobayashi
光明 小林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Priority to JP20816292A priority Critical patent/JPH0676378A/en
Publication of JPH0676378A publication Critical patent/JPH0676378A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To obtain a protective film having two excellent effects; a light interference effect and an antioxidation effect for a magneto-optical recording medium. CONSTITUTION: The protective film of the magneto-optical recording medium contains hydrogenated amorphous silicon added with carbon. The hydrogenated amorphous silicon added with carbon has the following compsn.: a-(C11-x Cx )1-x :Hy (where, the values of x and y are x<=0.5, 0.4<=y<=0.5).

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、光磁気記録媒用の優れ
た光干渉効果及び酸化防止効果を有する保護膜に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a protective film for a magneto-optical recording medium, which has excellent optical interference effect and anti-oxidation effect.

【0002】[0002]

【従来の技術】光磁気記録媒体は、光学的に入力された
情報を磁気的に記録し、さらに光学的に読み取るための
記載媒体であり、その基本構成としてポリカーボネート
等の基板並びにその上に積層された記録膜及び保護膜か
ら成っていた。ここで、記録膜には、従来より、TbF
eCo等の希土類−遷移金属合金(RE−TM合金)、
ガーネット等の酸化物,あるいは白金はコバルト等から
なる積層材料等が使われていた。しかしながら、RE−
TM合金膜は一般に、酸化されやすく、化学的安定性が
悪いため,長期間の使用ができず、信頼性に欠けるとい
う問題があった。
2. Description of the Related Art A magneto-optical recording medium is a recording medium for magnetically recording and optically reading information that has been input optically, and its basic structure is a substrate of polycarbonate or the like and a laminated layer on the substrate. It was composed of a recording film and a protective film. Here, the recording film is conventionally made of TbF.
Rare earth-transition metal alloy (RE-TM alloy) such as eCo,
Oxides such as garnet, or platinum was used as a laminated material such as cobalt. However, RE-
The TM alloy film generally has a problem that it cannot be used for a long time and lacks reliability because it is easily oxidized and has poor chemical stability.

【0003】また、一般に記録膜材料単独では、十分な
反射光が得られず、情報の再生感度が低いため、情報の
再現性に乏しく、実用上問題があった。そこで、かかる
問題を解決するため保護膜や再生感度を向上するための
光干渉膜を設けることが提案されている。ここで、光干
渉膜とは、光記録媒体において、入射光に対しての反射
光を増幅させる光干渉効果を有する膜をいい、膜材料の
複素屈折率と密接に関係している。すなわち、材料の複
素屈折率をn−ikで表した時に,実部nの値が大きい
ほど、あるいは虚部kの値が小さい程、光干渉効果が高
いことが知られている。具体的には、nが2.0以上で
あり、かつkが0.01以下であれば、優れた光干渉効
果を有するといえる。
Further, in general, the recording film material alone cannot obtain sufficient reflected light and has a low information reproducing sensitivity, so that the reproducibility of information is poor and there is a problem in practical use. Therefore, in order to solve such a problem, it has been proposed to provide a protective film or an optical interference film for improving the reproduction sensitivity. Here, the optical interference film is a film having an optical interference effect of amplifying reflected light with respect to incident light in an optical recording medium, and is closely related to the complex refractive index of the film material. That is, when the complex refractive index of a material is represented by n-ik, it is known that the larger the value of the real part n or the smaller the value of the imaginary part k, the higher the optical interference effect. Specifically, if n is 2.0 or more and k is 0.01 or less, it can be said that an excellent optical interference effect is obtained.

【0004】保護膜に関する従来技術としては、例え
ば,米国特許No4661420に開示されており、珪
素に、水素、炭素、窒素又は酸素のいずれか1つを加え
た保護膜が知られている。しかしながら、係る保護膜
は、保護効果に乏しいばかりか、光干渉効果をほとんど
有さず、実際には光干渉膜を別に設ける必要があった。
また、特開昭63−195840には水素化非晶質炭化
珪素材料が開示されているが、目的が、基板と保護膜と
の密着力向上であり、保護膜としての効果や光干渉効果
についてはなんら言及していない。更に、特開平3−6
6049には、水素化非晶質炭化珪素を保護膜として使
用する光磁気記録媒体を提案しているが、係る材料は保
護効果は優れているものの光干渉効果に乏しく、光干渉
膜としては別個に設ける必要があった。
As a conventional technique relating to a protective film, for example, it is disclosed in US Pat. No. 4,661,420, and a protective film in which any one of hydrogen, carbon, nitrogen or oxygen is added to silicon is known. However, such a protective film not only has a poor protective effect but also has almost no optical interference effect, and in practice, it was necessary to separately provide an optical interference film.
Further, Japanese Patent Application Laid-Open No. 63-195840 discloses a hydrogenated amorphous silicon carbide material, but its purpose is to improve the adhesion between the substrate and the protective film, and to obtain the effect as the protective film and the light interference effect. Does not mention anything. Furthermore, JP-A-3-6
No. 6049 proposes a magneto-optical recording medium using hydrogenated amorphous silicon carbide as a protective film. However, such a material has an excellent protective effect but has a poor optical interference effect, and is therefore a separate optical interference film. Had to be installed in.

【0005】[0005]

【発明が解決しようとする課題】本発明は、これらの問
題を解決し、一層で光干渉効果と保護効果の両方の優れ
た効果を有する光磁気記録媒体用の保護膜を提供するこ
とを目的としている。
SUMMARY OF THE INVENTION It is an object of the present invention to solve these problems and to provide a protective film for a magneto-optical recording medium which has both excellent optical interference effect and excellent protective effect. I am trying.

【0006】[0006]

【課題を解決するための手段】本発明者は上記の問題点
を解決すべく、種々の検討を行った結果、炭化添加水素
化非晶質珪素の原子数の比率を特定の範囲にすることに
より、光干渉効果と保護効果の両方の優れた効果を有す
る光磁気記録媒体用の保護膜が得られることを見出だし
た。
As a result of various studies to solve the above problems, the present inventor has set the ratio of the number of atoms of carbonized hydrogenated amorphous silicon within a specific range. As a result, it was found that a protective film for a magneto-optical recording medium having both excellent optical interference effect and protective effect can be obtained.

【0007】すなわち、本発明は、光磁気記録媒体用保
護膜であって、炭化添加水素非晶質珪素を含んでなり、
該炭化添加水素非晶質珪素が次の組成: a−(Si1-x X 1 -y:Hy (xおよびyの値は、x≦0.5、かつ0.4≦y≦
0.5である。)を有することを特徴とする。
That is, the present invention is a protective film for a magneto-optical recording medium, comprising hydrogenated amorphous silicon carbide.
The carbonized hydrogenated amorphous silicon has the following composition: a- (Si 1-x C x ) 1 -y : H y (where x and y have values of x ≦ 0.5 and 0.4 ≦ y ≦
It is 0.5. ) Is included.

【0008】ここで、xの値を0.5以下と特定するの
は、Siの含有量がへり、保護効果に乏しくなるうえ、
複素屈折率における実部nが小さくなるため、光干渉効
果が低下するためである。さらに、yの値を0.4以
上、0.5以下と特定するのは,0.4未満では、kの
値が大きくなり、逆に0.5を超えるとnの値が小さく
なり、どちらにしても光干渉効果が低下するためであ
る。
Here, the value of x is specified to be 0.5 or less because the Si content is low and the protective effect is poor.
This is because the real part n in the complex refractive index becomes small and the optical interference effect is reduced. Further, the value of y is specified to be 0.4 or more and 0.5 or less, that is, if the value is less than 0.4, the value of k becomes large, and if it exceeds 0.5, the value of n becomes small. Even so, the optical interference effect is reduced.

【0009】本発明において、炭化水素化非晶質珪素膜
の保護膜の製法としては、特に限定されるものではない
が、珪素もしくは炭化水素のターゲットを使い、水素ガ
スの一方もしくは両方を混合したアルゴンガス雰囲気中
でスパッタリングを行うことで成膜することができる。
または、シランガスとメタンガス及びアルゴンガスと水
素ガスの一方もしくは両方との混合ガスを使い、化学気
相成長(CVD)法で成膜することも可能である。さら
に、光磁気記録媒体は常法に従って、例えばポリカーボ
ネートもしくはガラス基板等の上に、CVD法で炭化添
加水素化非晶質珪素膜を成膜し,その後スパッタリング
によりRE−TM合金膜およびAI等の反射膜を成膜す
ることにより製造することが可能である。
In the present invention, the method for producing the protective film of the hydrocarbonated amorphous silicon film is not particularly limited, but a silicon or hydrocarbon target is used and one or both of hydrogen gas is mixed. A film can be formed by performing sputtering in an argon gas atmosphere.
Alternatively, a mixed gas of silane gas and methane gas, or one or both of argon gas and hydrogen gas may be used to form a film by a chemical vapor deposition (CVD) method. Further, for the magneto-optical recording medium, a carbonized hydrogenated amorphous silicon film is formed by a CVD method on a polycarbonate or glass substrate or the like according to a conventional method, and then a RE-TM alloy film and an AI film or the like is formed by sputtering. It can be manufactured by forming a reflective film.

【0010】[0010]

【実施例】次に本発明を実施例によりさらに具体的に説
明する。サンプル作成 実施例1〜3及び比較例1〜5において、炭素添加水素
化非晶質珪素フィルムを、アルゴンガス中20%に希釈
されたシランガス、メタンガス及び水素ガス中で化学蒸
着法(CVD)によりガラス基体上に形成した。比較例
6〜8においてはSiCのターゲットを用いスパッター
法でフィルムを形成した。そして比較例9においては非
晶質シリコンを用いてSiのターゲットからスパッター
法によりフィルムを形成した。結果を表1に示す。この
場合、組成分析は、珪素及び炭素についてはRBS(R
utherford Back Scatterin
g)法により、水素についてはHFS(Hidroge
n Forward Scattering Anal
ysis)法により測定した。
EXAMPLES Next, the present invention will be described more specifically by way of examples. Sample preparation In Examples 1 to 3 and Comparative Examples 1 to 5, carbon-added hydrogenated amorphous silicon films were prepared by chemical vapor deposition (CVD) in silane gas, methane gas and hydrogen gas diluted to 20% in argon gas. It was formed on a glass substrate. In Comparative Examples 6 to 8, a film was formed by a sputtering method using a SiC target. Then, in Comparative Example 9, a film was formed by sputtering from a Si target using amorphous silicon. The results are shown in Table 1. In this case, the composition analysis shows that RBS (R
otherford Back Scatterin
g) method, for hydrogen, HFS (Hidroge
n Forward Scattering Anal
ysis) method.

【0011】 表 1 炭素添加水素化非晶質珪素の作成条件及び結果 ─────────────────────────────────── ガス流量 組 成 屈 折 率 (ccm) (atm. %) (n,k) ────────── ───── ───────────── シラン メタン 水素 炭素 水素 波長(850nm) ガス* ガ ス ガス x y 実部n>2.0 虚部k<0.01 ─────────────────────────────────── 実施例1 5.0 1.0 80 8 43 〇 〇 実施例2 2.0 1.0 80 25 47 〇 〇 実施例3 1.0 1.0 80 50 45 〇 〇 比較例1 1.0 2.0 80 57 42 △ 〇 比較例2 1.0 5.0 80 69 41 × 〇 比較例3 2.0 1.0 100 30 67 × 〇 比較例4 1.0 5.0 100 75 67 × 〇 比較例5 0.0 10 100 100 67 × 〇 比較例6 --- --- --- 61 15 △ × 比較例7 --- --- --- 61 0 〇 × 比較例8 --- --- --- 30 20 〇 × 比較例9 --- --- --- 0 0 〇 × ─────────────────────────────────── Table 1 Conditions and results for producing hydrogenated amorphous silicon containing carbon ───────────────────────────────── ─── Gas flow rate Compositional breakdown rate (ccm) (atm.%) (N, k) ───────────────────────────── ─ Silane Methane Hydrogen Carbon Hydrogen Wavelength (850nm) Gas * Gas Gas xy Real part n> 2.0 Imaginary part k <0.01 ──────────────────────── ──────────── Example 1 5.0 1.0 80 8 43 〇 〇 Example 2 2.0 1.0 80 25 47 〇 〇 Example 3 1.0 1.0 80 50 45 〇 〇 Comparative Example 1 1.0 2.0 80 57 42 △ ○ Comparative example 2 1.0 5.0 80 69 41 × ○ Comparative example 3 2.0 1.0 100 30 67 × ○ Comparative example 4 1.0 5.0 100 75 67 × ○ Comparative example 5 0.0 10 100 100 67 × ○ Comparative example 6 ---- ---- 61 15 △ × Comparative Example 7 --- --- --- 61 0 ○ × Comparative Example 8 --- --- --- 30 20 ○ × Comparative 9 --- --- --- 0 0 〇 × ───────────────────────────────────

【0012】複素屈折率の測定 図1及び図2にxとyの値を種々に変えたときの、波長
830nmにおける複素屈折率のnおよびkの値を測定
した結果を示す。なお、図1中、○はn値が2.0以
上、△は1.5以上およびxは1.5未満を意味し、図
2中、○はk値が0.01以下、xは0.01をこえる
ことを意味する。
Measurement of Complex Refractive Index FIGS. 1 and 2 show the results of measuring the values of n and k of the complex refractive index at a wavelength of 830 nm when the values of x and y are variously changed. In FIG. 1, ◯ means an n value of 2.0 or more, Δ means 1.5 or more and x is less than 1.5, and ◯ means a k value of 0.01 or less and x is 0. It means that it exceeds .01.

【0013】保護膜の効果測定 磁気記録媒体に対する、耐酸化性の保護効果の確認を耐
熱性試験および保持力Hc測定よりおこなった。具体的
には、耐熱性試験は115℃の雰囲気中で行い、オージ
ェ電子分光法を用いて、酸素分布より評価した。結果を
図3及び4に示す。
Measurement of effect of protective film The effect of protecting the magnetic recording medium against oxidation was confirmed by a heat resistance test and a holding force Hc measurement. Specifically, the heat resistance test was performed in an atmosphere of 115 ° C., and the oxygen distribution was evaluated using Auger electron spectroscopy. The results are shown in Figures 3 and 4.

【0014】図4は耐候試験1000時間後の保護膜を
付けないTbFe膜の組成をオージェ電子分光法を使
い、その深さ方向に分析した結果である。図の縦軸は各
元素の量に比例し、横軸のスッパター時間は表面からの
深さに比例し、スッパター時間30分の深さの所までは
TbFe膜で、それより深い所は基板に使用したガラス
に対応する。酸素量が表面からTbFe膜内に入るに従
って減少してはいるが、TbFe膜内の深い所まで存在
していることから、経時的にTbFe膜の表面から酸化
が起こり、徐々にその酸化がTbFe膜内に進行してい
ったと考えられる。
FIG. 4 shows the results of analyzing the composition of the TbFe film without the protective film after 1000 hours of the weather resistance test in the depth direction using Auger electron spectroscopy. The vertical axis of the figure is proportional to the amount of each element, the horizontal axis of the sputter time is proportional to the depth from the surface, the TbFe film is formed up to a depth of 30 minutes, and the deeper portion is formed on the substrate. Corresponds to the glass used. Although the amount of oxygen decreases as it enters the TbFe film from the surface, since it exists deep inside the TbFe film, oxidation occurs from the surface of the TbFe film over time, and the oxidation gradually occurs in the TbFe film. It is thought that it progressed into the membrane.

【0015】図3は、耐候性試験1000時間後の上記
実施例1の炭素添加水素化非晶質珪素膜の保護膜を付け
たTbFe膜の組成をオージェ電子分光法で、深さ方向
に分析した結果である。図中で、スッパター時間18分
の深さの所までは炭素添加水素化非晶質珪素膜、42分
の深さの所まではTbFe膜、それより深い所は基板で
あるガラスに対応している。酸素は、炭素添加水素化非
晶質珪素膜とTbFe膜、及びTbFe膜とガラスとの
境界だけに存在し、炭素添加水素化非晶質珪素、TbF
e膜内ではみられなかった。
FIG. 3 shows the composition of the TbFe film provided with the protective film of the carbon-doped hydrogenated amorphous silicon film of Example 1 after 1000 hours of the weather resistance test, analyzed in the depth direction by Auger electron spectroscopy. This is the result. In the figure, a carbon-doped hydrogenated amorphous silicon film is formed up to a depth of 18 minutes, a TbFe film is formed up to a depth of 42 minutes, and a deeper portion is a glass substrate. There is. Oxygen exists only at the boundary between the carbon-doped hydrogenated amorphous silicon film and the TbFe film, and the TbFe film and the glass.
e was not observed in the film.

【0016】このことから、TbFe膜とガラスとの境
界の酸素はTbFe膜を付ける前にガラス基板に付着し
ていた酸素であり、炭素添加水素化非晶質珪素膜とTb
Fe膜との境界の酸素は,TbFe膜を性膜した後炭素
添加水素化非晶質珪素膜を成膜するために別の装置に移
し変えた時にTbFe膜の表面に付着した酸素であると
考えられる。更に、炭素添加水素化非晶質珪素膜は十分
に表面からの酸素の進入を抑え、TbFe膜を酸化から
保護していることが分かる。また、保持力Hcはカ−測
定装置により測定し、評価した。結果を図5に示す。耐
熱性試験1000時間後においても、本発明の保護膜を
用いたサンプルは、保持力Hcの変化はほとんどみられ
なかった。
From this, the oxygen at the boundary between the TbFe film and the glass is the oxygen adhering to the glass substrate before attaching the TbFe film, and the carbon-doped hydrogenated amorphous silicon film and the TbFe film.
The oxygen at the boundary with the Fe film is the oxygen attached to the surface of the TbFe film when the TbFe film is transferred to another device for forming a carbon-doped hydrogenated amorphous silicon film after forming the film. Conceivable. Further, it can be seen that the carbon-added hydrogenated amorphous silicon film sufficiently suppresses the invasion of oxygen from the surface and protects the TbFe film from oxidation. Further, the holding power Hc was measured and evaluated by a curl measuring device. Results are shown in FIG. Even after 1000 hours of the heat resistance test, the sample using the protective film of the present invention showed almost no change in the holding force Hc.

【0017】[0017]

【効果】本発明によれば,光磁気記録媒体において、光
干渉効果と酸化防止効果の二つの優れた効果を有する保
護膜がえられる。
According to the present invention, in a magneto-optical recording medium, a protective film having two excellent effects of a light interference effect and an antioxidant effect can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】図1は、材料組成比が複素弾性率の実部n値が
2.0以上の領域を示す図である。
FIG. 1 is a diagram showing a region where a material composition ratio has a real part n value of complex elastic modulus of 2.0 or more.

【図2】図2は、材料組成比が複素弾性率の虚部k値が
0.01以下の領域を示す図である。
FIG. 2 is a diagram showing a region in which a material composition ratio has an imaginary part k value of a complex elastic modulus of 0.01 or less.

【図3】図3は、実施例1を用いた、耐熱性試験100
0時間後のオージェ電子分光チャートである。
FIG. 3 is a heat resistance test 100 using Example 1.
It is an Auger electron spectroscopy chart after 0 hour.

【図4】図4は、比較例1を用いた耐熱性試験1000
時間後のオージェ電子分光チャートである。
FIG. 4 is a heat resistance test 1000 using Comparative Example 1.
It is an Auger electron spectroscopy chart after time.

【図5】図5は、実施例1と比較例1を用いた、耐熱性
試験1000時間までの保持力Hcの変化を示す図であ
る。
FIG. 5 is a diagram showing changes in holding force Hc using Example 1 and Comparative Example 1 up to 1000 hours in a heat resistance test.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 光磁気記録媒体用の保護膜であって、炭
素添加水素化非晶質珪素を含んでなり、前記炭素添加水
素化非晶質珪素が次の組成、 a−(S11-xX 1-y :Hy (式中、x及びyの値はx≦0.5、0.4≦y≦0.
5である)を有することを特徴とする保護膜。
1. A protective film for a magneto-optical recording medium, comprising carbon-doped hydrogenated amorphous silicon, said carbon-doped hydrogenated amorphous silicon having the following composition: a- (S 11- x C X ) 1-y : H y (where x and y have values of x ≦ 0.5, 0.4 ≦ y ≦ 0.
The protective film is characterized in that it has 5).
【請求項2】 請求項1に記載の保護膜を有する光磁気
記録媒体。
2. A magneto-optical recording medium having the protective film according to claim 1.
JP20816292A 1992-08-04 1992-08-04 Protecting film of magneto-optical recording medium Pending JPH0676378A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20816292A JPH0676378A (en) 1992-08-04 1992-08-04 Protecting film of magneto-optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20816292A JPH0676378A (en) 1992-08-04 1992-08-04 Protecting film of magneto-optical recording medium

Publications (1)

Publication Number Publication Date
JPH0676378A true JPH0676378A (en) 1994-03-18

Family

ID=16551684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20816292A Pending JPH0676378A (en) 1992-08-04 1992-08-04 Protecting film of magneto-optical recording medium

Country Status (1)

Country Link
JP (1) JPH0676378A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9698339B1 (en) 2015-12-29 2017-07-04 International Business Machines Corporation Magnetic tunnel junction encapsulation using hydrogenated amorphous semiconductor material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9698339B1 (en) 2015-12-29 2017-07-04 International Business Machines Corporation Magnetic tunnel junction encapsulation using hydrogenated amorphous semiconductor material

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