JPH0667392A - Photosensitive material processing method and photosensitive material processing device - Google Patents

Abstract

PURPOSE:To enable the rapid processing of a photosensitive material by a processing liquid of a high liquid temp. by lessening the evaporation and oxidation fatigue of the lower processing liquid. CONSTITUTION:A processing tank 14 in which a developer is stored, is segmented with a partition plate 102 into an upper processing tank 14A for storing the surface layer part of the developer and a lower processing tank 14B for storing the lower part to separate the internal developer. A film F is transported through a slit 104 provided on the partition plate. The developer stored in the lower processing tank is heated to a set temp. between 35 deg.C and 45 deg.C. The developer stored in the upper processing tank is heated to the set temp. between 30 deg.C and 35 deg.C which are the liquid temps. of the conventional methods. The film F is immersed into the developer in the upper processing tank and is then rapidly processed with the developer in the lower processing tank where the liquid temp. is higher.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive material processing method and a photosensitive material processing apparatus for carrying a photosensitive material while dipping it in a processing solution for processing.

[0002]

2. Description of the Related Art A photosensitive material processing apparatus for processing a photosensitive material having an image printed thereon by immersing it in a processing solution is provided with a processing tank in which each processing solution is stored. There is one in which a photosensitive material is processed while being transported in a substantially U shape. For example, a film which is a light-sensitive material is sequentially immersed in a developing solution, a fixing solution, etc. to perform development and fixing processing, and then the processing solution is washed away with washing water stored in a washing tank and dried to finish. ing.

Generally, processing solutions such as a developing solution and a fixing solution used in such a light-sensitive material processing apparatus are activated by maintaining a liquid temperature at a predetermined temperature so as to maintain processing performance for processing a light-sensitive material. I have to. Therefore, in the photosensitive material processing apparatus, the liquid temperature of the processing liquid stored in the processing tank is kept at a predetermined liquid temperature (for example, about 30 ° C. to 35 ° C.) by the heating means.

[0004]

However, in order to process the light-sensitive material rapidly, if the temperature of the processing liquid is set higher than the conventional temperature of, for example, 30 ° C. to 35 ° C., the light-sensitive material is processed. The evaporation of the processing solution becomes violent, the oxidation fatigue of the developing solution in the processing solution due to the air progresses, the replacement cycle of the processing solution becomes short, and the replenishment amount of the processing solution increases. There's a problem.

The present invention has been made in view of the above circumstances, and provides a method of processing a light-sensitive material and a light-sensitive material processing apparatus capable of suppressing evaporation of a processing solution and oxidation fatigue and enabling rapid processing of a light-sensitive material. With the goal.

[0006]

A method for processing a photosensitive material according to claim 1 of the present invention is a photosensitive material for processing a photosensitive material by transporting the photosensitive material while immersing the photosensitive material in a processing solution stored in a processing tank. A method of treating a material, wherein the treatment liquid stored in the treatment tank is separated into at least two of an upper treatment liquid at a surface layer portion and a lower treatment liquid below the upper treatment liquid, and the lower treatment liquid is higher than the upper treatment liquid. It is characterized in that the photosensitive material is processed by heating to a predetermined temperature.

A photosensitive material processing apparatus according to a second aspect of the present invention is a photosensitive material processing apparatus which conveys a photosensitive material while dipping the photosensitive material in a processing solution stored in a processing tank to process the photosensitive material. Partitioning means for partitioning the processing liquid stored in the tank so as to suppress mixing of at least the upper processing liquid at the surface layer and the lower processing liquid therebelow, and a partitioning means having a passage portion for the photosensitive material; And a heating means for heating the liquid.

[0008]

The method of processing a light-sensitive material according to the present invention divides a processing solution stored in a processing tank into an upper processing solution that comes into contact with the outside air and a lower processing solution that does not come into contact with the outside air, and a lower processing solution that does not come into contact with the outside air. Is heated to a temperature (for example, a set temperature between 35 ° C. and 45 ° C.) at which the processing performance is stable and the photosensitive material can be processed quickly. As a result, since the lower processing liquid heated to a high temperature does not come into contact with the outside air, evaporation of the lower processing liquid and oxidation fatigue particularly in the case of a developing solution can be reduced and deterioration of the processing liquid can be suppressed. Therefore, the light-sensitive material conveyed in the lower processing solution can be processed rapidly in a stable state.

At this time, the upper processing solution of the surface layer portion may be used at room temperature, but the temperature of the conventional processing solution (for example, 30 ° C.) is used so as to assist the rapid processing of the photosensitive material by the lower processing solution.
It is preferable to heat to a set temperature between 35 ° C and 35 ° C. As a result, the processing solution in the processing tank can rapidly process the photosensitive material in a stable state at a high temperature as a whole, and evaporation of the processing solution and fatigue in the developing solution due to oxidation can be reduced. The light-sensitive material can be continuously processed with constant quality. That is, by increasing the temperature of the lower processing solution, which occupies most of the processing tank, and processing the photosensitive material with this lower processing solution, the photosensitive material can be given a predetermined sensitivity in a short time. The processing time in the tank can be shortened, and the photosensitive material can be processed quickly.

In the rapid processing of the photosensitive material in the present invention, a developing solution, a fixing solution, a rinsing water, etc. are passed after the leading edge of the photosensitive material such as a film has passed an insertion detection sensor near the photosensitive material insertion port of the photosensitive material processing apparatus. It takes 20 seconds to 60 seconds to reach the last conveying roller at the discharge port after being successively dipped in the processing solution, dried, and shortened the time for dipping the photosensitive material in the processing solution. If this is possible, the photosensitive material can be processed quickly by shortening the conveying path of the photosensitive material in each processing tank or increasing the conveying speed of the photosensitive material.

In the present invention, the lower processing liquid and the outside air are separated so that the lower processing liquid is not affected by the outside air by the upper processing liquid in the surface layer portion. If the time during which the liquid passes through the upper processing liquid can be shortened, the effect of the upper processing liquid, which is relatively fatigued compared to the lower processing liquid, can be reduced, and rapid processing can be performed in a stable state. You can

The light-sensitive material processing apparatus according to the present invention is provided with a partitioning means having a passage for the light-sensitive material in the processing tank, and the processing solution inside is divided into the upper processing solution in the surface layer and the lower processing solution therebelow. Separated. As described above, the upper processing solution in the surface layer portion comes into contact with the outside air, but the lower processing solution below the upper processing solution does not come into direct contact with the outside air. Never progresses. By heating the lower processing liquid to a predetermined temperature by the heating means, the photosensitive material can be effectively processed, and the photosensitive material can be processed rapidly in an optimum state in a short time. Further, since the lower processing liquid does not come into direct contact with the outside air, it is possible to maintain a predetermined processing performance for a long time.

The partition means does not need to completely separate the processing solution in the processing tank, and the partitioning means does not interfere with the processing of the photosensitive material even if the upper processing solution is mixed with the lower processing solution. It suffices if they can be separated so that they can be mixed.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows an automatic developing apparatus 10 which is a photosensitive material processing apparatus applied to this embodiment. The automatic developing device 10 is provided with a processing liquid processing section 11 and a drying section 20 in a machine frame 12. The processing liquid processing unit 11 is a film F.
The developing tank 14, the fixing tank 16 and the water washing tank 18 are partitioned by the partition wall 13 along the conveyance direction of.

Inserting port 1 for film F of automatic developing device 10
An insertion rack 17 for drawing the film F into the automatic developing device 10 is arranged near the position 5. Also, the insertion slot 1
An insertion detection sensor 80 for detecting the film F to be inserted is provided in the vicinity of 5. Further, an insertion stand for manually inserting the film F or an auto feeder or the like for automatically inserting the film F by the conveying means can be attached to the insertion opening 15 of the automatic developing device 10.

A developer is stored in the developer tank 14, and a transport rack 24 having a transport roller 22 for transporting the film F driven by a motor (not shown) is provided so as to be immersed in the developer. In the fixing tank 16, a fixing liquid is stored, and a transport rack 28 having a transport roller 26 that drives the film F by being driven by a motor (not shown) is soaked in the fixing liquid. Further, the washing water is stored in the washing tank 18 and is driven by a motor (not shown) to transport the film F.
A transport rack 32 having 0 is arranged so as to be immersed in washing water.

A heat exchanger 19, which is a heating means, is arranged below the processing liquid processing section 11, and the developing tank 14 is provided.
The developing solution inside and the fixing solution inside the fixing tank 16 are respectively sent to a heat exchanger 19 which is a heating means, where heat exchange is performed and a predetermined solution temperature is reached, and then the developing solution is transferred to the developing tank 14 and the fixing tank 16. Each is sent back. As a result, the liquid temperatures of the developing solution in the developing tank 14 and the fixing solution in the fixing tank 16 are maintained within a predetermined range. Details of the developing tank 14 and the fixing tank 16 will be described later.

Between the developing tank 14 and the fixing tank 16 and the fixing tank 1
A crossover rack 34 is disposed on the upper portion between the 6 and the washing tank 18. The crossover rack 34 holds the nipping / conveying rollers 3 for conveying the film F from the tank on the upstream side in the conveying direction of the film F to the tank on the downstream side.
6 and a guide 38 for guiding the film F.

Therefore, the automatic developing device 10 is inserted from the insertion port 15.
The film F fed into the inside is inserted into the developing tank 14 by the insertion rack 17 and is conveyed in the developing solution by the conveying roller 22 to be developed. The developed film F is sent to the fixing tank 16 by the crossover rack 34, where it is carried in the fixer by the carrying roller 26 and fixed. The fixed film F is sent to the rinsing tank 18 by the crossover rack 34, where it is carried in rinsing water by the carrying roller 30 and washed. In this way, the film F is treated with the treatment liquid.

A drainage pipe (not shown) is provided at the bottom of each of the developing bath 14, the fixing bath 16 and the washing bath 18, and a drainage valve 21 is attached to each of these drainage pipes. Therefore, if necessary, these drain valves 21
Is opened, the developing solution, the fixing solution and the washing water in the developing tank 14, the fixing tank 16 and the washing tank 18 can be discharged.

Further, between the washing tank 18 and the drying section 20,
A squeeze rack 40 is provided. The squeeze rack 40 has a conveyance roller 42 that conveys the film F, which is sent from the washing tank 18 and has washing water adhered thereto, to the drying unit 20 while squeezing it, and a guide 43 that guides the film F.

The drying section 20 includes a transport roller 44 for transporting the film F, a drying fan 45 for feeding dry air, and a chamber 46 containing a heater for heating the dry air.
And heated dry air to the film F and the transport roller 44.
And a spray pipe 47 that ejects to the. Further, the film F is conveyed obliquely upward in the drying turn portion 48 on the downstream side of the conveying roller 44 in the conveying path.

The automatic developing device 10 includes a drying turn section 48.
A receiving box 49 for accommodating the film F sent from is provided in a state of protruding from the outer wall of the automatic developing device 10.

Therefore, the film F squeezed by the squeeze rack 40 is dried by the dry air blown out from the spray pipe 47 while being transported by the transport roller 44 which is warmed by the dry air heated in the drying section 20. It
After that, the film F is discharged while being turned by the drying turn section 48, sent to the receiving box 49, and accommodated therein.

Next, the structure for replenishing the developing replenisher and the fixing replenisher to the developing tank 14 and the fixing tank 16 will be described.

As shown in FIG. 2, the developing replenisher is filled in the cartridge 100 in advance and hermetically sealed. The cartridge 100 is divided into three chambers by a partition wall, and the developer replenishing stock solutions A, B, and C are individually stored therein. Further, the fixing replenishing stock solution is pre-filled in the cartridge 120. The automatic developing device 10 supplies the stock replenishment solutions from the cartridges 100 and 120 to the stock tank 50 and stores them.

The stock tank 50 is divided into four tanks by partition walls. Of these, the first tank 50A and the second tank 5
0B and the third tank 50C are for the above-mentioned developing replenishment stock solutions A, B and C, respectively, and the fourth tank 50D is for the fixing replenishment stock solution, which are connected by a pipe 144. A liquid surface level sensor 52 is provided in each of these tanks 50A to 50D, and the first tank 50A of the stock tank 50 is provided by these liquid surface level sensors 52.
The cartridge 100, 12 by detecting the liquid level of each tank of the second tank 50B, the third tank 50C and the fourth tank 50D.
Cartridge 100, which detects the remaining amount of each replenishing stock solution in 0
It is possible to determine when to replace 120.

In the above embodiment, the stock tank 50 is
Although four tanks are provided by partitioning with partition walls, separate stock tanks may be provided corresponding to the developing replenishment stock solutions A, B and C and the fixing replenishment stock solution.

Inside the automatic developing device 10, a water supply tank 54 to which tap water is supplied is arranged behind the squeeze rack 40 (shown in FIG. 1). A liquid level sensor 56 is also provided in the water supply tank 54. The liquid level sensor 56 detects the liquid level of the water supply tank 54 so that the timing of tap water supply can be determined.

Further, in the automatic developing device 10, the developing tank 1
First mixing tank 5 for adjusting the replenisher supplied to
8 and the second mixing tank 60 for adjusting the replenisher supplied to the fixing tank 16.

Development replenishment stock solutions A and B of the first tank 50A, the second tank 50B and the third tank 50C of the stock tank 50.
And C and the tap water of the water supply tank 54 are the first mixing tank 58.
To be supplied to. That is, the first tank 50
A, the second tank 50B and the third tank 50C are connected to one ends of the conduits 62A, 62B and 62C, respectively, and the other ends of the conduits 62A, 62B and 62C are connected to the first mixing tank 58. It is in communication. These conduits 62A, 62B
And a bellows pump 64A, 64 in the middle of 62C.
B and 64C are provided respectively. Further, one end of a pipeline 66A communicates with the water supply tank 54, and the pipeline 6A
The other end of 6A communicates with the first mixing tank 58. A bellows pump 68A is arranged in the middle of the pipe 66A. Therefore, bellows pumps 64A, 64B and 6
When 4C and 4 and the bellows pump 68A are operated, the developer replenishing stock solutions A, B and C in the first tank 50A, the second tank 50B and the third tank 50C and the tap water in the water supply tank 54 are respectively discharged. The developing solution replenishing stock solutions A, B and C are supplied to the first mixing tank 58 via the conduits 62A, 62B, 62C and 66A to be mixed and diluted with tap water.
It is used as a replenisher for supply to the.

Further, the fixing replenishing stock solution of the fourth tank 50D and the tap water of the water supply tank 54 are supplied to the second mixing tank 60. That is, in the fourth tank 50D, the conduit 62
One end of D is communicated with, and the other end of the conduit 62D is communicated with the second mixing tank 60. A bellows pump 64D is arranged in the middle of the conduit 62D. One end of a pipeline 66B communicates with the water supply tank 54, and the pipeline 6B
The other end of 6B is communicated with the second mixing tank 60. A bellows pump 68B is arranged in the middle of the pipe 66B. Therefore, when the bellows pumps 64D and 68B are operated, the fixing replenishing stock solution of the fourth tank 50D and the tap water of the water supply tank 54 are supplied to the second mixing tank 60 through the pipelines 62D and 66B to fix and replenish the fixing. The stock solution is diluted with tap water and used as a replenisher solution for supplying to the fixing tank 16.

Both ends of a pipe 71 for circulating the developing solution are communicated with the developing tank 14, and a circulation pump 72 is provided at an intermediate portion of the pipe 71. Here first
One end of a pipe 70 communicates with the mixing tank 58 of
The other end is connected to the upstream side of the circulation pump 72 in the pipe 71. Therefore, by the operation of the circulation pump 72, the replenisher mixed in the first mixing tank 58 is supplied to the developing tank 14 while being mixed with the developing solution circulating in the pipe 71 through the pipe 70. Then, the developer is replenished.

Both ends of a pipe line 75 for circulating the fixing solution are communicated with the fixing tank 16, and a circulation pump 76 is provided at an intermediate portion of the pipe line 75. Second mixing tank 60
Is connected to one end of a pipe line 74, and the other end is connected to the upstream side of the circulation pump 76 of the pipe line 75.
Therefore, by operating the circulation pump 76, the second mixing tank 6
The replenisher mixed with 0 is supplied to the fixing tank 16 and is replenished to the fixer while being mixed with the fixer circulated in the conduit 75 via the conduit 74.

The water supply tank 54 and the water washing tank 18 are connected to each other by a pipe line (not shown), and the water supply tank 54 and the water washing tank 18 are arranged so that the water surfaces of the water supply tank 54 and the water washing tank 18 are at the same level. . The replenishment of water to the washing tank 18 is performed by a pipe provided from the tap to the water supply tank 54 in response to the detection of the film F by the insertion detection sensor 80 provided near the insertion opening 15 of the film F of the automatic developing device 10. It is performed by opening and closing a solenoid valve 92 arranged in the middle of 90.

As shown in FIG. 1, the automatic developing device 10 includes a cleaning pump 78 for cleaning the above-mentioned crossover rack 34. This wash pump 78
The tap water in the water supply tank 54 is jetted through a spray pipe (not shown) arranged on the upper end surface of the partition wall 13 to wash each crossover rack 34. The cleaning water for the crossover rack 34 is mixed with an antibacterial agent to prevent clogging by water algae at the cleaning water discharge port of a spray pipe (not shown). The cleaning of the crossover rack 34 is performed, for example, at the end of the one-day operation of the automatic developing device 10.

Here, as shown in FIGS. 1 to 3,
The developing tank 14 and the fixing tank 16 (not shown in FIG. 3) are each provided with a partition plate 102 for vertically partitioning the surface layer portion and the lower portion of the processing liquid stored therein. Developing tank 14, fixing tank 16
Is divided by the partition plate 102 into upper processing tanks 14A and 16A for storing the upper processing liquid of the processing liquid and lower processing tanks 14B and 16B for storing the lower processing liquid therebelow.

Since the partition plate 102 has substantially the same structure in the developing tank 14 and the fixing tank 16, the developing tank 14 will be mainly described below.

As shown in FIG. 3, this partition plate 10
2 is a slit 104 for passing the film F.
Is provided. A blade 106 is projectingly provided in each slit 104 along the transport direction of the film F, and suppresses the mixing of the developing solution in the lower processing tank 14B and the developing solution in the upper processing tank 14A. Therefore, rack 2
The film F conveyed to the No. 4 is conveyed from the upper processing tank 14A to the lower processing tank 14B below through the slit 104 of the partition plate 102, and also to the lower processing tank 14B below.
From the above, it is conveyed to the upper processing tank 14A through the slit 104.

At this time, since the film F is pinched by the blade 106 and passes through, the processing liquid in the upper processing tank 14A and the lower processing tank 14B has almost no end. The blade 106 is made of, for example, silicon rubber, and is attached to the partition plate in a state in which it is opened upstream in the transport direction of the film F and closed downstream in the transport direction. Here, the partition plate 102 is arranged at a position where the depth of the developer in the upper processing tank 14A is at least 2-3 cm.

As shown in FIG. 2, the pipes 71 and 75 are the partition plates 1 for the developing tank 14 and the fixing tank 16.
The lower processing baths 14B and 16B below 02 are connected to the bottoms and side walls, and the processing liquid heated to a predetermined temperature by the heat exchanger 19 is circulated in the lower processing baths 14B and 16B. The stock solution for replenishment and water are mixed and replenished.

Upper processing tank 14 of developing tank 14 and fixing tank 16
A and 16A have overflow pipes 1 as discharge means.
08 and 110 are provided. Overflow pipe 10
8, 110 has one end projecting and opening near the liquid surface of each upper processing tank 14A, 16A, and the other end opening in a waste liquid tank (not shown). When the developing solution and the fixing solution are replenished in the lower processing tanks 14B and 16B, the developing solution and the fixing solution which are not accommodated in the lower processing tanks 14B and 16B having a limited volume but become the excess developing solution and the fixing solution are The blade 10 provided mainly in the slit 104 on the downstream side in the transport direction of the fixing tank 16.
The contacted and closed portion of 6 passes through the gap between the blades 106 on the upper processing baths 14A, 16A side, and the lower processing bath 14
B and 16B flow into the upper processing tanks 14A and 16A,
As a result, the excess developer and fixer in the upper processing tanks 14A and 16A are discharged from their surface layers through these overflow pipes 108 and 110.

The operation of this embodiment will be described below. First, the processing of the film F in the automatic developing device 10 will be described.

The film F inserted into the automatic developing device 10 from the insertion port 15 is developed with the developing solution in the developing tank 14 and the fixing tank 16.
After the development and fixing process with the fixing solution, the film is washed with water in the water washing tank 18 to remove the processing solution attached to the film F. The film F that has been washed with water is sent to the drying unit 20 while the surface moisture is squeezed by the squeeze rack 40. In the drying section 20, the film F is dried by the drying air heated in the drying section 20 and the heated transport roller 44, and is discharged from the drying turn section 48 into the receiving box 49. In this way, the film F sequentially inserted into the automatic developing device 10
Are subjected to development processing and sequentially stored in the receiving box 49.

Here, the developing solution and the fixing solution stored in the developing tank 14 and the lower processing tanks 14B and 16B of the fixing tank 16 are heated to a predetermined temperature (3 in this embodiment by the heat exchanger 19).
The temperature is kept at a preset temperature between 5 ° C and 45 ° C). This temperature is a temperature at which the developing solution and the fixing solution can stably process the film F in an optimal state in a stable state. The developing solution and the fixing solution having the predetermined temperature are stored in the lower processing tank 14B of the developing tank 14 and the lower processing tank 16B of the fixing tank 16. The developing solution and the fixing solution stored in the lower processing tanks 14B and 16B pass through the heat exchanger 19 and the circulation pump 72,
The developer and the fixer are circulated by 76 and kept at a predetermined temperature (for example, a preset temperature between 35 ° C. and 45 ° C.).

In the upper processing tanks 14A and 16A,
A heater 118, which is a heating means, is arranged (shown in FIG. 2). By these heaters 118, the upper processing tank 1
The liquid temperature of the developer and fixer in 4A and 16A is 30 ° C to 3 ° C.
The set temperature is kept between 5 ° C.

The film F inserted in the developing tank 14 passes through the upper processing tank 14A, and then is inserted into the lower processing tank 14B through the slit 104. In the lower processing tank 14B, the developing solution in the upper processing tank 14A (for example, 30 ° C. to 35 ° C.) in order to allow the developing solution to rapidly develop the film F.
The temperature is maintained at an optimum temperature (setting temperature between 35 ° C. and 45 ° C. in this embodiment) higher than the setting temperature between C) and development processing is performed by this developing solution. Lower processing tank 1
The film F developed by the developing solution in 4B is
It makes a U-turn at the bottom of the lower processing tank 14B, passes through the slit 104 of the partition plate 102, and again passes through the upper processing tank 14A and is fed to the downstream fixing tank 16 and is mainly the lower processing tank of the fixing tank 16. The fixing process is carried out by the fixing solution stored in 16B. The fixing solution in the lower processing tank 16B is also maintained at an optimum temperature higher than that of the fixing solution in the upper processing tank 16A in order to quickly process the film F.

The developing solution in the upper processing tank 14A of the developing tank 14 is in contact with the outside air, but mainly acts as the film F.
The developing solution stored in the lower processing tank 14B for developing is blocked from the outside air by the developing solution in the upper processing tank 14A.
Even when heated to a temperature higher than the liquid temperature of the developing solution therein, the amount of evaporation is small, and oxidation fatigue of the processing solution does not progress.

The developing solution and the fixing solution are replenished as the processing of the film F progresses. This replenishment is done in the lower processing tank 14B,
The developing solution and the fixing solution, which are stored in the lower processing tanks 14B and 16B after being carried into the 16B, maintain a substantially constant processing performance by a relatively fresh processing solution, and the film F can be quickly produced with a constant quality. It can be developed.

When the developing solution and the fixing solution are replenished to the lower developing tanks 14B and 16B, the lower processing tanks 14B and 16 are
Since the processing liquid in B becomes large, a part of it is slit
It flows into upper processing tanks 14A and 16A via 4 and the like.
As a result, the excess processing liquid in the upper processing tanks 14A and 16A overflows from the overflow pipes 108 and 110 and is collected in a waste liquid tank (not shown). For this reason, since the developer does not come into contact with the outside air, almost only the processing deterioration is caused, and the fixing solution is replenished with a small amount of the developing solution and the fixing solution is replenished, so that the fatigued developing solution and the fixing solution in the lower processing tanks 14B and 16B are efficiently removed. It can be discharged by overflow through the processing tanks 14A and 16A, and the running cost of the automatic developing device 10 can be suppressed.

Therefore, in the automatic developing apparatus 10, most of the developing solution and the fixing solution, which are the developing solution and the fixing solution, in the lower processing tanks 14B and 16B are processed at the conventional solution temperature in order to process the film F quickly. Even if the liquid temperature is heated to a temperature higher than a certain set temperature between 30 ° C and 35 ° C (for example, a set temperature between 35 ° C and 45 ° C), the evaporation of the developing solution and the fixing solution can be suppressed. it can. Further, when a large amount of the developing solution and the fixing solution evaporate in the processing section, rust and the like are generated in the apparatus due to gas and the like generated from them, but the liquid temperature of the developing solution and the fixing solution in the upper processing tanks 14A and 16A is controlled. Since the evaporation of the developing solution and the fixing solution is suppressed by setting the temperature between 30 ° C and 35 ° C as usual, it is possible to prevent the generation of rust in the apparatus. Further, when a large amount of the fixer evaporates, a bad odor may be emitted, but since the temperature of the fixer is kept as usual to suppress the evaporation of the fixer, this bad odor can be prevented and the working environment can be prevented from deteriorating.

The automatic processing machine 10 includes the upper processing tank 1
Although the developing solution and the fixing solution in 4A and 16A are heated by the heater 118, the heater 118 may not be provided. That is, the developing solution and the fixing solution in the upper processing tanks 14A and 16A are stored in the lower processing tanks 14B and 16B, respectively.
It may be set so as to be maintained at a set temperature between 0 ° C and 35 ° C. As a result, the upper processing tanks 14A, 16B
The heating means may be simplified.

Further, in this embodiment, the developing solution and the fixing solution in the developing tank 14 and the fixing tank 16 are separated at the surface layer portion, but the partitioning method is not limited to this. For example, as shown in FIG.
Development tank 11 partitioned by A and lower processing tank 114B
The lower processing bath 114B of No. 4 may be further partitioned by the partition plate 112 into a plurality of downstream processing baths 116A and upstream processing baths 116B in the transport direction of the film F. At this time, if the temperature of the developing solution is gradually raised along the transport direction of the film F, the film F can be processed so as to increase the processing temperature as the development process of the film F progresses. it can. Alternatively, the temperature of the developing solution is gradually lowered along the transport direction of the film F so that the processing temperature is lowered as the developing processing of the film F progresses.
Can be developed. Therefore, it is possible to set the film F to be developed in an optimum state according to the processing speed.

Although the present invention is mainly applied to the developing solution, the developing tank, the fixing solution, and the fixing tank in the above-mentioned embodiments, the present invention is not limited to this and can be applied to other processing solutions and processing tanks. is there. Further, in the above example, the upper processing liquid and the lower processing liquid were the processing liquids of the same components, but the upper processing liquid is a liquid that does not affect the processing performance of the lower processing liquid which is the main processing liquid. The component may be different from that of the lower processing liquid.

In the above embodiment, the automatic developing apparatus 10 for processing the film F such as X-ray film as the photosensitive material has been described, but the photosensitive material processing apparatus to which the present invention is applied is not limited. For example, it can be applied to a processing device such as a developing device for photographic film, photographic paper and the like, and is particularly useful for a photosensitive material processing device that heats a processing liquid to a predetermined temperature for processing.

[0056]

As described above, according to the present invention, the treatment liquid in the treatment tank is separated into the upper treatment liquid in the surface layer portion which is in contact with the outside air and the lower treatment liquid other than the above. Further, in order to perform rapid processing, the lower processing solution which is not in contact with the outside air is heated to a predetermined temperature higher than the processing solution in the surface layer portion by the heating means, and the photosensitive material is mainly processed by the lower processing solution. For this reason, since the surface is covered with the upper processing solution, even if the temperature of the lower processing solution is set to a high temperature for rapid processing of the photosensitive material, evaporation of the lower processing solution and oxidation fatigue of the developing solution will not occur. It is possible to prevent deterioration and the like.

Therefore, the photosensitive material processing apparatus according to the present invention has an excellent effect that the photosensitive material can be processed quickly.

[Brief description of drawings]

FIG. 1 is a schematic side view showing an automatic developing device applied to this embodiment.

FIG. 2 is a schematic configuration diagram showing a circulation system of a processing liquid of an automatic developing device applied to this embodiment.

FIG. 3 is a schematic configuration diagram of a processing tank applied to this embodiment.

FIG. 4 is a schematic configuration diagram of a processing tank showing a modified example of partitioning means.

[Explanation of symbols]

 10 Automatic Developing Device (Photosensitive Material Processing Device) 14 Developing Tank (Processing Tank) 16 Fixing Tank (Processing Tank) 19 Heat Exchanger (Heating Means) 102 Partition Plate (Partitioning Means) 104 Slit 106 Blade (Partitioning Means) 108, 110 Overflow tube 118 Heater (heating means) F film (photosensitive material)

Claims (2)

[Claims] 1. A method of processing a photosensitive material for transporting a photosensitive material while dipping the photosensitive material in a processing solution stored in a processing tank to process the photosensitive material, wherein the processing solution stored in the processing tank is a surface layer portion. Of the upper processing solution and a lower processing solution thereunder, and the lower processing solution is heated to a predetermined temperature higher than that of the upper processing solution to process the photosensitive material. Material processing method. 2. A photosensitive material processing apparatus that conveys a photosensitive material while dipping the photosensitive material in the processing liquid stored in the processing tank to process the photosensitive material, wherein the processing liquid stored in the processing tank is stored in the processing tank. At least the upper processing solution of the surface layer part and a partitioning means having a partition so as to suppress mixing of the lower processing solution therebelow and having a passage portion of the photosensitive material; and a heating means for heating the lower processing solution, Characteristic photosensitive material processing device.