JPH0667006A - Manufacture of diffraction grating assembly - Google Patents

Manufacture of diffraction grating assembly

Info

Publication number
JPH0667006A
JPH0667006A JP22396692A JP22396692A JPH0667006A JP H0667006 A JPH0667006 A JP H0667006A JP 22396692 A JP22396692 A JP 22396692A JP 22396692 A JP22396692 A JP 22396692A JP H0667006 A JPH0667006 A JP H0667006A
Authority
JP
Japan
Prior art keywords
diffraction grating
partial
region
diffraction
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22396692A
Other languages
Japanese (ja)
Inventor
Naoko Yoshitake
吉武尚子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP22396692A priority Critical patent/JPH0667006A/en
Publication of JPH0667006A publication Critical patent/JPH0667006A/en
Priority to US08/872,498 priority patent/US5991078A/en
Pending legal-status Critical Current

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  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE:Not to make the processes up to a failure in photographing a certain partial area useless even in case of the failure and generate no grating-absence area or not overlap area between partial diffraction gratings of a finished product even if there is a position deviation by manufacturing specific diffraction grating assemblies in respective partial areas. CONSTITUTION:A substrate 1 is coated with, for example, a positive type photoresist and the entire surface of the resist layer 2 is exposed to interference fringes, which have a direction and a pitch corresponding to the 1st diffraction grating at the 1st area part of the diffraction grating assembly to be manufactured, by interference between two pieces of luminous flux. Then, the exposed surface is coated with, for example, an ultraviolet-ray setting type resin, which is irradiated with ultraviolet rays to form a 1st replica 3 where the 1st diffraction rating is transferred to the entire surface; and the replica 3 is coated with a photoresist and the entire surface of the photoresist layer 4 is exposed to interference fringes, which have a direction and a pitch corresponding to the 2nd diffraction grating at the 2nd partial area of the assembly to be manufacture, by interference between two pieces of luminous flux. Thus, the exposure to the two-luminous-flux interference fringes and the exposure to the lower diffraction grating at a specific part by the light irradiation are repeated.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上に利用分野】本発明は、回折格子集合体の作製
方法に関し、特に、方向又はピッチの異なる回折格子を
複数並列して配置してなる表示体等の作製方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a diffraction grating assembly, and more particularly to a method of manufacturing a display body or the like in which a plurality of diffraction gratings having different directions or pitches are arranged in parallel.

【0002】[0002]

【従来の技術】従来、微小なドット各々を回折格子で作
製し、このドットを2次元的に配置して表示体を構成す
るものが知られており、各ドットの回折格子の向き、格
子ピッチを種々のものにして、見る向きによりパターン
が変化するようにしたものが、特開平2−72320号
において提案されている。
2. Description of the Related Art Conventionally, it is known that each minute dot is formed by a diffraction grating and the dots are arranged two-dimensionally to form a display body. The direction of the diffraction grating of each dot and the grating pitch are known. Japanese Patent Application Laid-Open No. 2-73220 proposes various patterns in which the pattern changes depending on the viewing direction.

【0003】しかし、これは、回折格子の輪郭により表
示パターンを区画して表示するものではなく、また、視
点に移動に伴う表示パターンの変化は滑らかなものでは
ない。しかも、1つの画面を網点のように極めて多数の
ドットを規則的に配置して構成するため、作製が容易で
ないと言う問題点もある。
However, this does not display the display pattern by dividing it by the contour of the diffraction grating, and the change of the display pattern due to the movement of the viewpoint is not smooth. In addition, since one screen is formed by regularly arranging an extremely large number of dots such as halftone dots, it is not easy to manufacture.

【0004】このような状況に鑑みて本出願人は、特願
平4−220074号において、滑らかな曲線を直線近
似した折れ線を構成する部分直線回折格子群からなる回
折格子の外側輪郭又は内側輪郭により文字、画像等の表
示パターンを区画して表示する表示体を提案した。これ
は、表示体に対する視点を変えると、回折により輝いて
見える位置が滑らかに多様に移動し、かつ、白色光で照
明すると、この輝いて見える領域に虹色の色が付いた領
域となり、表示パターンが容易に認識できるだけでな
く、視覚的に面白く、表示効果、意匠効果が極めて優れ
たものである。
In view of such a situation, the present applicant has proposed in Japanese Patent Application No. 4-220074 that the outer contour or the inner contour of a diffraction grating composed of a group of partial linear diffraction gratings forming a polygonal line that is a linear approximation of a smooth curve. We proposed a display that divides and displays the display pattern such as characters and images. This is because when the viewpoint of the display is changed, the brightly shining position moves smoothly and variously, and when illuminated with white light, this brightly shining area becomes an area with a rainbow color. Not only can the pattern be easily recognized, it is visually interesting and the display effect and design effect are extremely excellent.

【0005】また、表示体ではなく、機械読み取り可能
な情報記録体として、方向又はピッチの異なる回折格子
を複数並列して配置したものが、例えば特開平3−21
1096号において提案されている。
Further, a machine-readable information recording body, not a display body, in which a plurality of diffraction gratings having different directions or pitches are arranged in parallel is disclosed in, for example, Japanese Patent Laid-Open No. 3-21.
1096.

【0006】このような回折格子集合体の製造には、通
常、二光束干渉方法が用いられている。これは、回折格
子集合体の各部分領域の形のマスクを1組用意し、1枚
の感光板をこれらマスクを交換しながら位置決めしてマ
スキングし、各マスク領域の格子方向とピッチを有する
干渉縞をマスクの開口を通して感光板に露光し、最終的
に感光板の回折格子集合体領域全体をカバーする露光を
行い、現像して回折格子集合体又はそのマスターを作製
するものである。
A two-beam interference method is usually used for manufacturing such a diffraction grating assembly. This is to prepare one set of masks in the shape of each partial area of the diffraction grating assembly, position and mask one photosensitive plate while exchanging these masks, and perform interference with the grating direction and pitch of each mask area. The fringes are exposed on the photosensitive plate through the openings of the mask, and finally exposed so as to cover the entire area of the diffraction grating assembly of the photosensitive plate, and developed to produce a diffraction grating assembly or a master thereof.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、この従
来の二光束干渉を用いた回折格子集合体の作製方法にお
いては、ある1枚のマスクを通しての撮影の失敗を冒す
と、それまでの工程が全て無駄になってしまうことがあ
る。さらに、あるマスクの位置決めに狂いがあると、最
終的に出来上がった回折格子集合体の部分回折格子間に
格子のない領域や重なる領域が生じ、製品として見栄え
のしないものとなってしまう。
However, in the conventional method of manufacturing a diffraction grating assembly using the two-beam interference, if the image capturing through a certain mask fails, all the steps up to that point are performed. It may be wasted. Further, if the positioning of a certain mask is incorrect, a region without a grating or an overlapping region will be generated between the partial diffraction gratings of the finally completed diffraction grating assembly, which makes the product unattractive.

【0008】本発明はこのような状況に鑑みてなされた
ものであり、その目的は、二光束干渉による干渉縞の露
光の際にはマスクを用いず、ある部分領域の撮影に失敗
してもそれまでの工程が無駄にならず、位置決めに狂い
があっても最終製品の部分回折格子間に格子の存在しな
い領域や重なる領域が生じない回折格子集合体の作製方
法を提供することである。
The present invention has been made in view of such a situation, and an object thereof is to use a mask when exposing interference fringes due to two-beam interference, and to take an image of a certain partial area even if the image pickup fails. It is an object of the present invention to provide a method for producing a diffraction grating assembly in which the steps up to that point are not wasted and a region where no grating exists or an overlapping region does not occur between the partial diffraction gratings of the final product even if the positioning is incorrect.

【0009】[0009]

【課題を解決するための手段】上記目的を達成する本発
明の回折格子集合体の作製方法は、方向又はピッチの異
なる回折格子を複数並列配置してなる回折格子集合体の
作製方法において、基板に感光材をコーティングし、そ
の全面に第1の部分領域の方向とピッチを持つ二光束干
渉縞を露光して第1の回折格子を作製し、次に、その回
折格子の複製をとり、複製板を新たな基板とし再度感光
材をコーティングし、その全面に第2の部分領域の方向
とピッチを持つ二光束干渉縞を露光して第2の回折格子
を作製し、その後、第2の部分領域以外の少なくとも第
1の部分領域を含む領域に光を照射し、現像処理により
光の照射領域の感光材を剥離ないし除去して、少なくと
も、第1の部分領域に第1の回折格子が、第2の部分領
域に第2の回折格子が形成された回折格子体を作製し、
次に、その回折格子体の複製をとり、第3の部分領域以
降について、同様な工程を繰り返すことにより、各部分
領域それぞれに所定の回折格子が形成された回折格子集
合体を作製することを特徴とする方法である。
A method of manufacturing a diffraction grating assembly of the present invention that achieves the above object is a method of manufacturing a diffraction grating assembly in which a plurality of diffraction gratings having different directions or pitches are arranged in parallel. Is coated with a photosensitive material, and the entire surface thereof is exposed with a two-beam interference fringe having the direction and pitch of the first partial region to produce a first diffraction grating, and then the diffraction grating is duplicated and duplicated. The plate is used as a new substrate, the photosensitive material is coated again, and the entire surface thereof is exposed with two-beam interference fringes having the direction and pitch of the second partial region to form the second diffraction grating, and then the second portion is formed. The region including at least the first partial region other than the region is irradiated with light, and the photosensitive material in the light-irradiated region is peeled off or removed by the development process, and at least the first diffraction grating is formed in the first partial region. The second diffraction pattern in the second partial region There was prepared formed diffraction grating member,
Next, by making a copy of the diffraction grating body and repeating the same steps for the third and subsequent partial regions, it is possible to manufacture a diffraction grating assembly in which a predetermined diffraction grating is formed in each partial region. This is a characteristic method.

【0010】この場合、感光材は、光の照射量に応じて
レリーフ模様として記録でき、かつ、紫外線等の照射に
より感光材を分解ないし可溶にできる感光材からなるこ
とが望ましい。
In this case, the photosensitive material is preferably a photosensitive material which can be recorded as a relief pattern depending on the irradiation amount of light and which can be decomposed or dissolved by irradiation with ultraviolet rays or the like.

【0011】なお、回折格子集合体の部分領域の回折格
子が、隣接するもの同士で、その格子の傾きが徐々に滑
らかに変化し、また、その格子ピッチが滑らかに変化す
るかほぼ同じで、各部分領域の回折格子又はそれに平行
な直線を隣接するものの間で連結するとき、滑らかな曲
線を直線近似した折れ線になるものからなり、各部分領
域がその外側輪郭又は内側輪郭により文字、画像等の表
示パターンを区画して表示するように配置されているも
のの作製に適用することができる。
It should be noted that the diffraction gratings in the partial regions of the diffraction grating assembly are adjacent to each other, and the inclination of the grating gradually changes smoothly, and the grating pitch also changes smoothly or almost the same. When connecting the diffraction grating of each partial area or a straight line parallel to it, it becomes a polygonal line that approximates a smooth curve to a straight line, and each partial area has characters, images, etc. depending on its outer contour or inner contour. It can be applied to the production of the display pattern which is arranged so as to be divided and displayed.

【0012】[0012]

【作用】本発明においては、感光材のコーティング、そ
の全面への二光束干渉縞の露光、複製、感光材のコーテ
ィング、その全面への二光束干渉縞の露光、光照射によ
る所定部分の下部の回折格子の露出を繰り返すことによ
り、各部分領域それぞれに所定の回折格子が形成された
回折格子集合体を作製するので、ある部分領域の撮影に
失敗してもそれまでの工程が無駄にならず、位置決めに
狂いがあっても最終製品の部分回折格子間に格子の存在
しない領域や重なる領域が生じない高品質の回折格子集
合体を容易に作製することができる。
In the present invention, the coating of the photosensitive material, the exposure of the two-beam interference fringes to the entire surface, the duplication, the coating of the photosensitive material, the exposure of the two-beam interference fringes to the entire surface, the lower part of the predetermined portion by the light irradiation. By repeating the exposure of the diffraction grating, a diffraction grating assembly in which a predetermined diffraction grating is formed in each partial area is manufactured, so even if the imaging of a certain partial area fails, the steps up to that point are not wasted. It is possible to easily manufacture a high-quality diffraction grating assembly in which a region where no grating exists or an overlapping region does not occur between the partial diffraction gratings of the final product even if the positioning is incorrect.

【0013】[0013]

【実施例】以下、図面を参照にして、本発明の回折格子
集合体の作製方法の実施例について説明する。実施例の
説明に先立って、本出願人の提案による特願平4−22
0074号の回折格子を用いた表示体について簡単に説
明する。図1(a)に平面図を示すように、所定ピッチ
dの上に凸の曲線群からなる反射型の回折格子Aについ
て検討すると、光源が図面手前側上方に位置する場合、
視点を左から右へ移動させると、格子面上で輝いて見え
る領域は、視点の移動方向と同じ左から右へ移動する。
その移動を格子面の下の矢印で示す。反対に視点を移動
すると輝いて見える領域の移動は矢印と反対の方向にな
る。光源が白色光源の場合、輝いて見える領域は、上下
方向に虹色の色が付いた帯状領域になる。そして、回折
格子を構成する曲線の曲率半径が大きくなる程、輝いた
領域の移動速度は速くなる。図1(b)に示すように、
回折格子Aの上下を逆転した下に凸の曲線群からなる回
折格子Bについては、図(a)の場合とは逆に、視点の
移動方向と逆の右から左へ移動する。
EXAMPLES Examples of the method for producing a diffraction grating assembly of the present invention will be described below with reference to the drawings. Prior to the description of the embodiments, Japanese Patent Application No. 4-22 proposed by the present applicant is proposed.
A display body using the diffraction grating of No. 0074 will be briefly described. As shown in the plan view of FIG. 1A, when a reflection type diffraction grating A composed of a curve group convex on a predetermined pitch d is examined, when the light source is located on the front side in the drawing,
When the viewpoint is moved from left to right, the area that appears bright on the lattice plane moves from left to right in the same direction as the viewpoint moves.
The movement is indicated by the arrow below the lattice plane. On the contrary, when the viewpoint is moved, the area that appears to be shining moves in the opposite direction of the arrow. When the light source is a white light source, the brightly visible area is a strip-shaped area with a rainbow color in the vertical direction. As the radius of curvature of the curve forming the diffraction grating increases, the moving speed of the bright area increases. As shown in FIG. 1 (b),
Regarding the diffraction grating B formed by a downward convex convex curve group of the diffraction grating A, the diffraction grating B moves from right to left opposite to the direction of movement of the viewpoint, contrary to the case of FIG.

【0014】このように上に凸の曲線群からなる回折格
子と下に凸の曲線群からなる回折格子を組み合わせて、
例えば、図2(a)、(b)に示すように、波線群から
なる回折格子C、Dを構成して、上記と同様に光源を配
置し、視点を移動させると、図示矢印のように、格子面
上で輝いて見える領域が移動する。したがって、このよ
うな回折格子C、Dを視点を移動させながら観察する
と、輝いて見える領域もそれに伴って同じ方向又は反対
方向に移動し、かつ、その領域が虹色に輝くので、表示
効果、意匠効果は顕著なものとなる。
As described above, the diffraction grating composed of the upward convex curve group and the diffraction grating composed of the downward convex curve group are combined,
For example, as shown in FIGS. 2 (a) and 2 (b), when diffraction gratings C and D composed of a group of wavy lines are configured, a light source is arranged in the same manner as above, and the viewpoint is moved, as shown by arrows in FIG. , The area that looks bright on the grid surface moves. Therefore, when observing such diffraction gratings C and D while moving the viewpoint, the shining region also moves in the same direction or the opposite direction, and the region shines iridescent, so that the display effect, The design effect becomes remarkable.

【0015】さらに、上記のように、曲線群からなる回
折格子において、格子ピッチdも場所に応じて変化する
ようにすると、その輝いて見える領域の面積、移動方向
もさらに多様になり、表示効果、意匠効果が一層顕著な
ものとなる。
Further, as described above, in the diffraction grating consisting of a group of curves, if the grating pitch d is also changed according to the place, the area of the brightly visible region and the moving direction are further varied, and the display effect is obtained. The design effect becomes more remarkable.

【0016】このように滑らかな曲線群からなる回折格
子の輪郭によって文字、画像等の表示パターンを区画し
て表現することにすると、例えば図3に示すように、文
字「DNP」を背景の中に表示する場合、各文字部につ
いては、比較的曲率半径が小さく、上に凸の曲線群から
なる回折格子A(図1(a))を文字「D」、「N」、
「P」の形に切り出して用いる。そして、背景について
は、比較的曲率半径が大きく、下に凸の曲線群からなる
回折格子B(図1(b))を文字部「DNP」を除いて
用いる。そして、これら両者を図示のよに組み合わして
表示パターン体を構成すると、光源が図面手前側上方に
位置する場合、視点を左から右へ移動させると、文字部
「DNP」は、視点移動方向に比較的遅く輝いて見える
領域が移動し、文字「DNP」が認識される。これに対
して、背景は、視点移動方向と反対の方向に輝いて見え
る領域が比較的速く移動し、この両者の移動が組み合わ
さって、表示効果、意匠効果が優れたものとなる。
When the display pattern of characters, images, etc. is divided and expressed by the contour of the diffraction grating composed of such smooth curved lines, the character "DNP" is displayed in the background as shown in FIG. 3, for example. In the case of displaying the above, the diffraction grating A (FIG. 1A), which has a relatively small radius of curvature and a convex curve group, is used for each character portion, and the letters “D”, “N”,
Cut out into a "P" shape for use. For the background, a diffraction grating B (FIG. 1B) having a relatively large radius of curvature and a downwardly convex curve group is used except for the character portion “DNP”. When the display pattern body is configured by combining these two as shown in the figure, when the viewpoint is moved from left to right when the light source is located above the front side of the drawing, the character portion “DNP” displays the viewpoint moving direction. The area that appears to shine relatively slowly moves, and the character "DNP" is recognized. On the other hand, in the background, a region that appears to shine in a direction opposite to the viewpoint moving direction moves relatively fast, and the movements of these two are combined to provide excellent display effects and design effects.

【0017】なお、図3において、文字部、背景の何れ
か一方の回折格子を省き、他方の回折格子のみで文字
「DNP」を表現することもできる。さらに、回折格子
A、Bとして、図2のような波線群からなるものを用い
ることもできるし、格子ピッチが場所に応じて変化する
ものを用いることもできる。
In FIG. 3, it is also possible to omit the diffraction grating of either the character portion or the background and express the character "DNP" only by the other diffraction grating. Further, as the diffraction gratings A and B, a diffraction grating consisting of a group of wavy lines as shown in FIG. 2 can be used, or a diffraction grating whose grating pitch changes depending on the place can be used.

【0018】ところで、以上のような曲線群からなる回
折格子は、電子ビーム描画装置、イオンビーム描画装
置、又は、レーザー描画装置により、基板に塗布したレ
ジストに所望の曲線群を所定のピッチで描画することに
より製作することができる。しかしながら、このような
描画装置を用いるにしても、面積のある回折格子の曲線
群を全て描画により製作するには時間と費用がかかる。
これに比較して、回折格子を直線群で構成できれば、例
えば二光束干渉により簡単に製作できるため、極めて望
ましい。
By the way, in the diffraction grating composed of the above curve group, a desired curve group is drawn at a predetermined pitch on the resist coated on the substrate by an electron beam drawing apparatus, an ion beam drawing apparatus or a laser drawing apparatus. It can be manufactured by doing. However, even if such a drawing apparatus is used, it takes time and cost to manufacture all curve groups of a diffraction grating having an area by drawing.
On the other hand, if the diffraction grating can be formed by a group of straight lines, it can be easily manufactured by, for example, two-beam interference, which is extremely desirable.

【0019】そこで、以上のような曲線群からなる回折
格子を直線群からなる部分回折格子で近似的に構成する
ことを考える。図4は、図1(a)の回折格子Aを部分
回折格子A1〜A7により構成する例を示す図であり、
回折格子Aの同じ傾きと同じ格子ピッチを有する部分を
1つのまとまりとして分割し、その部分をその傾きと格
子ピッチを有する直線回折格子A1〜A7で置き換えて
構成してある。したがって、部分回折格子A1〜A7は
それぞれ直線回折格子からなり、その格子の傾き、ピッ
チは、何れも隣接するものとの間で順次滑らかに変化し
ており、その元になる回折格子Aの領域においては、急
激に大きく変化することはない。このように、連続する
部分直線回折格子群からなり、各部分直線回折格子の格
子の傾き、ピッチが隣接する部分直線回折格子との間で
順次滑らかに変化し(ピッチは変化させなくともよ
い。)、急激に大きく変化することがない回折格子集合
体A′においても、図1(a)の回折格子Aと同様、視
点の移動に伴って輝いて見える領域が滑らかに移動す
る。分割面積が小さくなる程、その移動は滑らかとな
る。図1(b)、図2(a)、(b)の回折格子におい
ても同様に構成できる。なお、分割部分の形は、元とな
る曲線群の形と分布により決まるが、図1、図2の回折
格子は何れも、図4のように、縦の並列するストライプ
領域に分割される。なお、この場合に、分割されるスト
ライプの幅については、必ずしも等間隔である必要はな
い。
Therefore, it is considered that the diffraction grating composed of the above curve group is approximately constructed by the partial diffraction grating composed of the straight line group. FIG. 4 is a diagram showing an example in which the diffraction grating A of FIG. 1A is composed of partial diffraction gratings A1 to A7,
A portion of the diffraction grating A having the same inclination and the same grating pitch is divided into one unit, and the portion is replaced with linear diffraction gratings A1 to A7 having the inclination and the grating pitch. Therefore, each of the partial diffraction gratings A1 to A7 is composed of a linear diffraction grating, and the inclination and pitch of the diffraction grating sequentially change smoothly between adjacent diffraction gratings. Does not change drastically. In this way, the partial linear diffraction grating group is formed continuously, and the inclination and pitch of the grating of each partial linear diffraction grating sequentially and smoothly change between adjacent partial linear diffraction gratings (the pitch may not be changed. ), Even in the diffraction grating assembly A ′ that does not change drastically, as in the case of the diffraction grating A in FIG. 1A, the brightly shining region smoothly moves as the viewpoint moves. The smaller the divided area, the smoother the movement. The diffraction gratings shown in FIGS. 1B, 2A, and 2B can be similarly configured. The shape of the divided portion is determined by the shape and distribution of the original curve group, but both the diffraction gratings of FIGS. 1 and 2 are divided into vertical parallel stripe regions as shown in FIG. In this case, the widths of the divided stripes do not necessarily have to be evenly spaced.

【0020】図5は、図3の表示体をこのような部分直
線回折格子からなる回折格子集合体により文字領域「D
NP」及びその背景を表した例であり、各領域に設ける
回折格子の方向を円弧で示してある。回折格子集合体
A′、B′共、図示のように縦の並列するストライプ領
域に分割されており、各領域の格子の傾きは、回折格子
集合体A′において、左から30°、25°、・・・、
10°、5°、0°、−5°、−10°、・・・・、−
25°、−30°の5°刻みで順次変化している。ま
た、回折格子集合体B′においては、−39°、−36
°、・・・、−6°、−3°、0°、3°、6°、・・
・・、36°、39°の3°刻みで順次変化している。
格子ピッチについては、回折格子集合体A′の各分割領
域において、何れも同じピッチのものを、また、回折格
子集合体B′の各分割領域においても、何れも同じピッ
チのものを用いている。この場合も、視点の移動に伴っ
て輝いて見える領域は、図3の場合と同様、滑らかに移
動する。
FIG. 5 shows the display unit of FIG. 3 in the character area "D" by the diffraction grating assembly composed of such partial linear diffraction gratings.
NP ”and its background, and the direction of the diffraction grating provided in each region is indicated by an arc. Both the diffraction grating assemblies A ′ and B ′ are divided into vertical parallel stripe regions as shown in the drawing, and the inclination of the grating in each region is 30 ° and 25 ° from the left in the diffraction grating assembly A ′. ...
10 °, 5 °, 0 °, −5 °, −10 °, ..., −
It changes in steps of 5 ° of 25 ° and -30 °. Further, in the diffraction grating assembly B ′, −39 °, −36
°, -6 °, -3 °, 0 °, 3 °, 6 °, ...
.., 36.degree., 39.degree. Are changed in 3 degree increments.
Regarding the grating pitch, the same pitch is used in each divided area of the diffraction grating assembly A ′, and the same pitch is used in each divided area of the diffraction grating assembly B ′. . In this case as well, the region that looks bright as the viewpoint moves moves smoothly, as in the case of FIG.

【0021】さて、このような表示パターン体を製作す
るには、各領域の輪郭を有する複数のマスクを用意し、
1枚の感光板に対してマスクを交換しながら各領域のみ
を露出させ、その領域の格子ピッチと向きに応じた干渉
縞が生じるように、2つの光束を干渉させて露光するこ
とにより、光学的に作製することができる。しかしなが
ら、このようなマスクを用いた二光束干渉による回折格
子集合体の作製方法においては、ある1枚のマスクを通
しての撮影の失敗を冒すと、それまでの工程が全て無駄
になってしまうことがある。さらに、あるマスクの位置
決めに狂いがあると、最終的に出来上がった回折格子集
合体の部分回折格子間に格子のない領域や重なる領域が
生じ、製品として見栄えのしないものとなってしまう。
In order to manufacture such a display pattern body, a plurality of masks having the contours of the respective areas are prepared,
By exchanging the mask on one photosensitive plate, exposing only each region, and exposing two regions by interfering two light fluxes so that interference fringes depending on the grating pitch and direction of the region are generated. Can be manufactured in a simple manner. However, in the method of manufacturing a diffraction grating assembly by two-beam interference using such a mask, if the image capturing through one mask fails, all the steps up to that point are wasted. is there. Further, if the positioning of a certain mask is incorrect, a region without a grating or an overlapping region will be generated between the partial diffraction gratings of the finally completed diffraction grating assembly, which makes the product unattractive.

【0022】そこで、本発明においては、各領域の干渉
縞を露光するのに、マスクを用いずに、基板に感光材を
コーティングし、その全面に第1の部分領域の方向とピ
ッチを持つ二光束干渉縞を露光して第1の回折格子を作
製し、次に、その回折格子の複製をとり、複製板を新た
な基板とし再度感光材をコーティングし、その全面に第
2の部分領域の方向とピッチを持つ二光束干渉縞を露光
して第2の回折格子を作製し、その後、マスクを密着し
て第2の部分領域以外の少なくとも第1の部分領域を含
む領域に紫外線等を照射し、現像処理して、紫外線等の
照射領域の感光材を剥離ないし除去して、少なくとも第
1の部分領域に第1の回折格子を、第2の部分領域に第
2の回折格子を形成し、次いで、同様な工程を繰り返す
ことにより、各部分領域それぞれに所定の回折格子が形
成された回折格子集合体を作製することができる。この
場合、感光材としては、光の照射量に応じてレリーフ模
様として記録でき、かつ、紫外線等の照射により感光材
を分解ないし可溶にできる例えばポジ型のフォトレジス
ト、フォトポリマーが用いられる。
Therefore, in the present invention, in order to expose the interference fringes of each region, a substrate is coated with a photosensitive material without using a mask, and the entire surface thereof has the direction and pitch of the first partial region. The light beam interference fringes are exposed to produce the first diffraction grating, and then the diffraction grating is duplicated, the duplicated plate is used as a new substrate, and the photosensitive material is coated again. A two-beam interference fringe having a direction and a pitch is exposed to produce a second diffraction grating, and then a mask is adhered to the region and at least the first partial region other than the second partial region is irradiated with ultraviolet rays or the like. Then, the photosensitive material in the irradiation region of ultraviolet rays or the like is peeled off or removed by the development treatment to form the first diffraction grating in at least the first partial region and the second diffraction grating in the second partial region. , Then, by repeating the same process, each part Can be manufactured diffraction grating assemblies predetermined diffraction grating is formed in each region. In this case, as the photosensitive material, for example, a positive photoresist or a photopolymer that can record as a relief pattern according to the irradiation amount of light and can decompose or dissolve the photosensitive material by irradiation with ultraviolet rays or the like is used.

【0023】以下、本発明の作製工程を図6を参照にし
てより詳しく説明する。まず、同図(a)に示すよう
に、基板1に例えばポジ型のフォトレジスト2を塗布
し、レジスト層2全面に、作製すべき回折格子集合体の
第1の部分領域の第1の回折格子に相当する方向とピ
ッチの干渉縞を2光束の干渉により露光する。次いで、
同図(b)に示すように、露光されたレジスト層2を現
像し、第1の回折格子を作製する。次いで、その上に例
えば紫外線硬化型の樹脂を塗布して紫外線照射すること
により、同図(c)に示したような第1の回折格子が全
面に転写された第1の複製3を作製し、その上に上記と
同様なフォトレジスト4を塗布し、レジスト層4全面
に、作製すべき回折格子集合体の第2の部分領域の第
2の回折格子に相当する方向とピッチの干渉縞を2光束
の干渉により露光する。次いで、同図(d)に示すよう
に、第2の回折格子が露光されたレジスト層4上に第1
の領域以外の領域を遮蔽する第1のマスク5を密着
し、紫外線を照射し、レジスト層4の第1の領域を現
像液に可溶にし、現像すると、同図(e)に示すよう
に、第1の領域には第1の回折格子が露出し、それ以
外の領域には第2の回折格子が作製されたものが得られ
る。この上に例えば紫外線硬化型の樹脂を塗布して紫外
線照射することにより、同図(f)に示したような第1
の領域に第1の回折格子が、それ以外の領域には第2
の回折格子が転写された第2の複製6を作製する。次い
で、その上に上記と同様なフォトレジスト7を塗布し、
レジスト層7全面に、作製すべき回折格子集合体の第3
の部分領域の第3の回折格子に相当する方向とピッチ
の干渉縞を2光束の干渉により露光する。次いで、同図
(g)に示すように、第3の回折格子が露光されたレジ
スト層7上に第1の領域及び第2の領域以外の領域
を遮蔽する第2のマスク8を密着し、紫外線を照射し、
レジスト層7の第1の領域及び第2の領域を現像液
に可溶にし、現像すると、同図(h)に示すように、第
1の領域には第1の回折格子が露出し、第2の領域
には第2の回折格子が露出し、それ以外の領域には第3
の回折格子が作製されたものが得られる。この上に同様
に紫外線硬化型の樹脂を塗布して紫外線照射することに
より、同図(i)に示したような第1の領域に第1の
回折格子が、第2の領域には第2の回折格子が、それ
以外の領域には第3の回折格子が転写された第3の複
製9が作製される。この場合は、第1から第3の回折格
子のみによって回折格子集合体が構成されており、例え
ば、同図(j)に示すような配置の回折格子集合体又は
それを複製するマスター版が得られるが、回折格子集合
体が4個以上の回折格子からなる場合についても、同様
な工程を繰り返すことにより作製することができる。
Hereinafter, the manufacturing process of the present invention will be described in more detail with reference to FIG. First, as shown in FIG. 1A, for example, a positive photoresist 2 is applied to the substrate 1, and the first diffraction region of the first partial region of the diffraction grating assembly to be produced is applied to the entire surface of the resist layer 2. The interference fringes in the direction and pitch corresponding to the grating are exposed by the interference of the two light beams. Then
As shown in FIG. 3B, the exposed resist layer 2 is developed to produce a first diffraction grating. Then, for example, an ultraviolet curable resin is applied and irradiated with ultraviolet rays to produce a first replica 3 in which the first diffraction grating as shown in FIG. Then, a photoresist 4 similar to the above is applied thereon, and interference fringes of a direction and a pitch corresponding to the second diffraction grating of the second partial region of the diffraction grating assembly to be produced are formed on the entire surface of the resist layer 4. Exposure is performed by the interference of two light fluxes. Then, as shown in FIG. 2D, the first diffraction grating is formed on the exposed resist layer 4 by the first diffraction grating.
The first mask 5 that shields the region other than the region is adhered, and ultraviolet rays are irradiated to make the first region of the resist layer 4 soluble in the developing solution and developed, as shown in FIG. , The first diffraction grating is exposed in the first region, and the second diffraction grating is manufactured in the other regions. For example, by applying an ultraviolet curable resin and irradiating it with ultraviolet light, the first resin as shown in FIG.
The first diffraction grating in the area of
A second replica 6 to which the diffraction grating of 1 is transferred is produced. Then, a photoresist 7 similar to the above is applied thereon,
On the entire surface of the resist layer 7, the third diffraction grating assembly to be produced
The interference fringes in the direction and pitch corresponding to the third diffraction grating in the partial region of are exposed by the interference of two light fluxes. Then, as shown in FIG. 3G, a second mask 8 that shields a region other than the first region and the second region is brought into close contact with the resist layer 7 on which the third diffraction grating is exposed, Irradiate with ultraviolet rays,
When the first region and the second region of the resist layer 7 are made soluble in a developing solution and developed, the first diffraction grating is exposed in the first region as shown in FIG. The second diffraction grating is exposed in the region 2 and the third diffraction grating is exposed in the other regions.
The obtained diffraction grating is obtained. By similarly applying an ultraviolet curable resin on this and irradiating it with ultraviolet rays, the first diffraction grating is formed in the first region and the second region is formed in the second region as shown in FIG. The third replica 9 having the diffraction grating of No. 1 and the third diffraction grating transferred to the other region is produced. In this case, the diffraction grating assembly is composed of only the first to third diffraction gratings, and for example, the diffraction grating assembly having the arrangement shown in FIG. However, even when the diffraction grating assembly is composed of four or more diffraction gratings, it can be manufactured by repeating the same steps.

【0024】なお、図6の場合、同図(d)の第1のマ
スク5は、第1の領域以外の領域を全て遮蔽するもの
であっが、これは第2の領域のみを遮蔽する形状にして
もよい。その場合は、同図(i)の複製8は、第3の領
域の第3の回折格子の高さは第2の領域の第2の回
折格子の高さと同じになり、第1の領域の第1の回折
格子の高さのみが他より低くなる。さらに、これらの混
合形態に構成することもできる。また、図6の工程にお
いて、各複製の作製は、同じ形のものができる複製、す
なわち、2度の複製を繰り返すものを考えていたが、凹
凸が反転する1回の複製であってもよい。この場合は、
奇数番目又は偶数番目のマスクは裏と表を反転して使用
する必要がある。
Incidentally, in the case of FIG. 6, the first mask 5 of FIG. 6D shields all regions other than the first region, but this has a shape that shields only the second region. You may In that case, in the replica 8 of FIG. 7I, the height of the third diffraction grating in the third region is the same as the height of the second diffraction grating in the second region, and Only the height of the first diffraction grating is lower than the others. Further, it is possible to configure them in a mixed form. Further, in the process of FIG. 6, the production of each duplicate was considered to be a duplicate that can have the same shape, that is, the duplicate is repeated twice, but it may be one duplicate in which the unevenness is reversed. . in this case,
It is necessary to use the odd-numbered or even-numbered mask with the back side and the front side reversed.

【0025】以上は、回折格子集合体として、本出願人
の提案に係る回折格子を用いた表示体を前提にして説明
してきたが、本出願の作製方法は、特開平2−7232
0号のように、微小なドット各々を回折格子で作製し、
このドットを2次元的に配置して表示体を構成するもの
にも、また、特開平3−211096号のように、方向
又はピッチの異なる回折格子を複数並列して配置して構
成した機械読み取り可能な情報記録体にも適用できる。
さらに、それ以外の種々の回折格子集合体の作製方法に
も適用できる。
The above description has been made on the premise of the display body using the diffraction grating proposed by the present applicant as the diffraction grating assembly, but the manufacturing method of the present application is described in Japanese Patent Application Laid-Open No. 27322/1990.
Like No. 0, each minute dot is made with a diffraction grating,
A machine which is constructed by arranging these dots two-dimensionally and which is constructed by arranging a plurality of diffraction gratings having different directions or pitches in parallel as in JP-A-3-211096 is also used. It can also be applied to possible information recording media.
Further, it can be applied to various other methods of manufacturing a diffraction grating assembly.

【0026】以上、本発明の回折格子集合体の作製方法
を実施例に基づいて説明してきたが、本発明はこれら実
施例に限定されず、種々の変形が可能である。
Although the method for producing the diffraction grating assembly of the present invention has been described above based on the embodiments, the present invention is not limited to these embodiments and various modifications can be made.

【0027】[0027]

【発明の効果】以上の説明から明らかなよに、本発明の
回折格子集合体の作製方法によると、感光材のコーティ
ング、その全面への二光束干渉縞の露光、複製、感光材
のコーティング、その全面への二光束干渉縞の露光、光
照射による所定部分の下部の回折格子の露出を繰り返す
ことにより、各部分領域それぞれに所定の回折格子が形
成された回折格子集合体を作製するので、ある部分領域
の撮影に失敗してもそれまでの工程が無駄にならず、位
置決めに狂いがあっても最終製品の部分回折格子間に格
子の存在しない領域や重なる領域が生じない高品質の回
折格子集合体を容易に作製することができる。
As is apparent from the above description, according to the method of manufacturing a diffraction grating assembly of the present invention, the coating of the photosensitive material, the exposure of the two-beam interference fringes on its entire surface, the duplication, the coating of the photosensitive material, By repeating the exposure of the two-beam interference fringes on the entire surface and the exposure of the diffraction grating under the predetermined portion by light irradiation, a diffraction grating assembly in which a predetermined diffraction grating is formed in each partial region is produced. Even if the imaging of a partial area fails, the process up to that point is not wasted, and even if the positioning is incorrect, there is no grating-existing area or overlapping area between the partial diffraction gratings of the final product. The lattice assembly can be easily manufactured.

【図面の簡単な説明】[Brief description of drawings]

【図1】曲線群からなる回折格子の視点移動に伴う輝い
て見える領域の動きを説明するための図である。
FIG. 1 is a diagram for explaining the movement of a brightly appearing region associated with a viewpoint movement of a diffraction grating including a group of curves.

【図2】波線群からなる回折格子の場合の動きを説明す
るための図である。
FIG. 2 is a diagram for explaining movement in the case of a diffraction grating including a group of wavy lines.

【図3】表示体の1例の平面図である。FIG. 3 is a plan view of an example of a display body.

【図4】曲線群からなる回折格子を直線群からなる部分
回折格子で近似的に構成する原理を説明するための図で
ある。
FIG. 4 is a diagram for explaining the principle of approximately constructing a diffraction grating including a group of curves with a partial diffraction grating including a group of straight lines.

【図5】図3の表示体を部分直線回折格子からなる回折
格子集合体により表した例を示すための図である。
FIG. 5 is a diagram showing an example in which the display body of FIG. 3 is represented by a diffraction grating assembly composed of partial linear diffraction gratings.

【図6】本発明の回折格子集合体の作製方法の1実施例
を説明するための工程図である。
FIG. 6 is a process drawing for explaining one example of the method for producing a diffraction grating assembly according to the present invention.

【符号の説明】[Explanation of symbols]

1…基板 2…レジスト層 3…第1の複製 4…レジスト層 5…第1のマスク 6…第2の複製 7…レジスト層 8…第2のマスク 9…第3の複製 …第1の部分領域 …第2の部分領域 …第3の部分領域 DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... Resist layer 3 ... 1st copy 4 ... Resist layer 5 ... 1st mask 6 ... 2nd copy 7 ... Resist layer 8 ... 2nd mask 9 ... 3rd copy ... 1st part Area ... Second partial area ... Third partial area

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 方向又はピッチの異なる回折格子を複数
並列配置してなる回折格子集合体の作製方法において、
基板に感光材をコーティングし、その全面に第1の部分
領域の方向とピッチを持つ二光束干渉縞を露光して第1
の回折格子を作製し、次に、その回折格子の複製をと
り、複製板を新たな基板とし再度感光材をコーティング
し、その全面に第2の部分領域の方向とピッチを持つ二
光束干渉縞を露光して第2の回折格子を作製し、その
後、第2の部分領域以外の少なくとも第1の部分領域を
含む領域に光を照射し、現像処理により光の照射領域の
感光材を剥離ないし除去して、少なくとも、第1の部分
領域に第1の回折格子が、第2の部分領域に第2の回折
格子が形成された回折格子体を作製し、次に、その回折
格子体の複製をとり、第3の部分領域以降について、同
様な工程を繰り返すことにより、各部分領域それぞれに
所定の回折格子が形成された回折格子集合体を作製する
ことを特徴とする回折格子集合体の作製方法。
1. A method of manufacturing a diffraction grating assembly, in which a plurality of diffraction gratings having different directions or pitches are arranged in parallel,
The substrate is coated with a photosensitive material, and the entire surface thereof is exposed with two-beam interference fringes having the direction and pitch of the first partial region to expose the first partial region.
Of the two-beam interference fringes having the direction and pitch of the second partial region on the entire surface of the diffraction grating, and then duplicating the diffraction grating, using the duplicate plate as a new substrate, and coating the photosensitive material again. To form a second diffraction grating, and then irradiate light on a region including at least the first partial region other than the second partial region, and the photosensitive material in the light-irradiated region is not peeled off by a developing process. To produce a diffraction grating body having at least a first diffraction grating in a first partial area and a second diffraction grating in a second partial area, and then replicating the diffraction grating body. And producing a diffraction grating assembly having a predetermined diffraction grating formed in each of the partial areas by repeating the same steps for the third partial area and thereafter. Method.
【請求項2】 前記感光材が、光の照射量に応じてレリ
ーフ模様として記録でき、かつ、紫外線等の照射により
感光材を分解ないし可溶にできる感光材からなることを
特徴とする請求項1記載の回折格子集合体の作製方法。
2. The photosensitive material comprises a photosensitive material which can be recorded as a relief pattern in accordance with the irradiation amount of light and which can be decomposed or dissolved by irradiation with ultraviolet rays or the like. 1. The method for producing the diffraction grating assembly according to 1.
【請求項3】 前記回折格子集合体の部分領域の回折格
子が、隣接するもの同士で、その格子の傾きが徐々に滑
らかに変化し、また、その格子ピッチが滑らかに変化す
るかほぼ同じで、各部分領域の回折格子又はそれに平行
な直線を隣接するものの間で連結するとき、滑らかな曲
線を直線近似した折れ線になるものからなり、各部分領
域がその外側輪郭又は内側輪郭により文字、画像等の表
示パターンを区画して表示するように配置されているこ
とを特徴とする請求項1又は2記載の回折格子集合体の
作製方法。
3. The diffraction gratings in the partial regions of the diffraction grating assembly are adjacent to each other, and the inclination of the grating gradually changes smoothly, and the grating pitch changes smoothly or almost the same. , When connecting a diffraction grating of each partial area or a straight line parallel to it, it becomes a polygonal line that approximates a smooth curve to a straight line, and each partial area has characters or images depending on its outer contour or inner contour. The method for producing a diffraction grating assembly according to claim 1 or 2, wherein the display patterns are arranged so as to be divided and displayed.
JP22396692A 1992-08-19 1992-08-24 Manufacture of diffraction grating assembly Pending JPH0667006A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP22396692A JPH0667006A (en) 1992-08-24 1992-08-24 Manufacture of diffraction grating assembly
US08/872,498 US5991078A (en) 1992-08-19 1997-06-10 Display medium employing diffraction grating and method of producing diffraction grating assembly

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22396692A JPH0667006A (en) 1992-08-24 1992-08-24 Manufacture of diffraction grating assembly

Publications (1)

Publication Number Publication Date
JPH0667006A true JPH0667006A (en) 1994-03-11

Family

ID=16806480

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22396692A Pending JPH0667006A (en) 1992-08-19 1992-08-24 Manufacture of diffraction grating assembly

Country Status (1)

Country Link
JP (1) JPH0667006A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100313461B1 (en) * 1999-10-11 2001-11-07 윤종용 Fabrication method of long-period fiber grating for reduction of polarization dependence loss
KR100388232B1 (en) * 2000-08-22 2003-06-19 (주)해빛정보 Method for grating-pattern formation on glass substrate
JP2008107469A (en) * 2006-10-24 2008-05-08 Toppan Printing Co Ltd Optically variable device medium and information printed matter equipped with optically variable device medium
JP2020530593A (en) * 2017-08-18 2020-10-22 エルジー・ケム・リミテッド A method for manufacturing a module having a plurality of pattern regions, a module having a plurality of pattern regions according to the manufacturing method, and a method for manufacturing a diffraction grating module or a mold for a diffraction grating module.

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100313461B1 (en) * 1999-10-11 2001-11-07 윤종용 Fabrication method of long-period fiber grating for reduction of polarization dependence loss
KR100388232B1 (en) * 2000-08-22 2003-06-19 (주)해빛정보 Method for grating-pattern formation on glass substrate
JP2008107469A (en) * 2006-10-24 2008-05-08 Toppan Printing Co Ltd Optically variable device medium and information printed matter equipped with optically variable device medium
JP2020530593A (en) * 2017-08-18 2020-10-22 エルジー・ケム・リミテッド A method for manufacturing a module having a plurality of pattern regions, a module having a plurality of pattern regions according to the manufacturing method, and a method for manufacturing a diffraction grating module or a mold for a diffraction grating module.

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