JPH0666509A - Measuring apparatus for shape - Google Patents

Abstract

PURPOSE:To obtain a measuring apparatus of a shape which can ensure highly- precise scanning and measurement, correction of a tilt or undulation of a sample and reproducibility of measurement. CONSTITUTION:A Z-axis rough-motion mechanism 11 is fixed on an X-Y rough- motion mechanism 10, a six-axes fine-motion mechanism 12 is fixed thereon and further a sample 2 is set thereon. By the X-Y rough-motion mechanism 10 and the Z-axis rough-motion mechanism 11, a measuring area of the sample 2 is opposed to a probe 5 of a tunnel microscope with a gap in which a tunnel current is generated, and by the fine-motion mechanism 12, scanning of the area and an Z-axis fine motion for keeping the tunnel current fixed during this scanning are executed. This Z-axis fine motion produces measured data on a shape.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a shape measuring apparatus using a tunnel microscope, an atomic force microscope or the like, and more particularly to a shape measuring apparatus suitable for measuring the shape of a wide area.

[0002]

2. Description of the Related Art In recent years, it has become necessary to measure the surface shape of a sample having a diameter of 100 mm or more, such as a fine circuit element for semiconductors, an optical disk, a magnetic disk, etc., without cutting the surface of the sample. . For such shape measurement, a shape measurement device using a tunnel microscope, an atomic force microscope, or the like has been proposed.

FIG. 10 is a side view of a conventional shape measuring apparatus using a tunnel microscope. In the figure, X, Y, and Z indicate coordinate axes. The Y axis is an axis perpendicular to the paper surface. Reference numeral 1 is an XY coarse movement mechanism that is displaced in a large stroke in the X axis direction and the Y axis direction, and 2 is a sample placed on the XY coarse movement mechanism 1. 3 is a Z-axis coarse movement mechanism that displaces in the Z-axis direction with a large stroke,
4 is a 3-axis fine movement mechanism fixed to the bottom of the Z-axis coarse movement mechanism 3,
Reference numeral 5 is a probe fixed to the lower portion of the triaxial fine movement mechanism 4 and facing the surface of the sample 2. The triaxial fine movement mechanism is a mechanism that generates a minute translational displacement in the X, Y, and Z axis directions, and a specific example thereof is shown in FIGS. 11 and 12.

11 and 12 are perspective views of specific examples of the triaxial fine movement mechanism. In each figure, X, Y, and Z indicate coordinate axes. In FIG. 11, 40X is a piezoelectric element that expands and contracts in the X-axis direction, 40Y is a piezoelectric element that expands and contracts in the Y-axis direction, and 40Z is a piezoelectric element that expands and contracts in the Z-axis direction. One end is fixed and the other end is gathered. Holds the probe 5. The electrodes of the piezoelectric elements 40X, 40Y, and 40Z are not shown.

On the other hand, in FIG. 12, 41 is a cylindrical piezoelectric element, 42X is an X-axis electrode provided at the symmetrical position on the surface of the piezoelectric element 41, and 42Y is Y provided at the symmetrical position on the surface of the piezoelectric element 41. The shaft electrode 42Z is a Z-axis electrode provided on the entire circumference of the surface of the piezoelectric element 41.

The probe 5 is fixed to the lower end of the piezoelectric element 41.

Next, the operation of the conventional shape measuring apparatus shown in FIG. 10 will be described. First, the entire image is observed with an optical microscope or the like, the region to be measured is specified from this image, and the region of the sample 2 is moved to the lower portion of the probe 5 by the XY coarse movement mechanism 1. Next, the Z-axis coarse movement mechanism 3 moves the probe 5 toward the surface of the sample 2 to a tunnel current detectable position (position at which the distance from the sample surface is on the order of nanometers).
After this movement, the piezoelectric elements 40X, 40Y of the triaxial fine movement mechanism 4
Drive the X-axis electrodes 42X and Y.
By applying a predetermined voltage to the shaft electrode 42Y, the probe 5 is scanned in the surface X-Y direction of the sample 2, and at the same time, the tunnel current becomes a constant value (the probe 5 and the sample surface). Fine movement control in the Z-axis direction is performed by the piezoelectric element 40Z or the Z-axis electrode 42Z so that the distance becomes constant. The shape of the sample surface can be observed from the displacement data of the Z axis.

[0008]

By the way, the above-mentioned conventional shape measuring apparatus is not always satisfactory in the following points. (A) As shown in the concrete examples of FIGS. 11 and 12, a piezoelectric element is usually used for the triaxial fine movement mechanism 4. However, since the piezoelectric element has a hysteresis characteristic as shown in FIG. 13, accurate positioning is difficult. In FIG. 13, the horizontal axis represents the voltage applied to the piezoelectric element, and the vertical axis represents the displacement amount of the piezoelectric element. Furthermore, the piezoelectric element
Even if a constant voltage is applied, a so-called drift in which the displacement amount gradually changes cannot be avoided, and accurate positioning is difficult from this point as well.

(B) The triaxial fine movement mechanism 4 has a structure of 1
Even if only the piezoelectric element 40X is driven in an attempt to generate a displacement only in one axial direction, for example, only in the X-axis direction, or a voltage is applied only to the X-axis electrode 42X, a displacement in the other axial direction (interference displacement) simultaneously occurs. Will also occur. Therefore, when scanning in the XY directions is performed by the triaxial fine movement mechanism 4, accurate scanning cannot be performed, and eventually, it becomes impossible to obtain data that accurately corresponds to each position in the scanning region.

(C) When the sample 2 has a large size such as a diameter of 100 mm or more, the sample 2 has an inclination or a waviness.
If these tilts and undulations are larger than the range of fine movement of the triaxial fine movement mechanism 4, the probe 5 cannot be followed, and the process of approaching the sample 2 by the Z-axis coarse movement mechanism 3 is required again, and the measurement time becomes longer. Is greatly increased. Moreover, when the probe 5 is made to approach again by the Z-axis coarse movement mechanism 3 in this way, it is difficult to suppress the displacement in the X-axis and Y-axis directions within the range of nanometers. 5
The position of is shifted, and its reproducibility cannot be secured.
Further, in the conventional method, the sum of the waviness of the sample over a wide area and the mechanical error caused by the scanning is observed as the measured value. In this case, since there is no means for measuring or correcting a mechanical error caused by scanning, it is impossible to measure the waviness of the sample over the wide area.

(D) Since the measurement is performed at high speed, the scanning of the XY plane is performed using high frequency. Usually, the piezoelectric element can be modeled with a capacitor, but in reality, not only the capacitor but also the resistor exists, so that local heat is generated in the piezoelectric element during scanning at high frequency, and this heat causes triaxial fine movement. There is a possibility that thermal deformation may occur between the mechanism 4 and the probe 5 and the measurement accuracy may deteriorate.

An object of the present invention is to solve the above-mentioned problems in the prior art and to provide a shape measuring apparatus capable of performing highly accurate measurement and capable of coping with the inclination and waviness of a sample.

[0013]

In order to achieve the above-mentioned object, the present invention scans a sample surface, and between the sample surface and a probe which is close to the sample surface during the scanning. In a shape measuring device that measures the shape of the surface of a sample by using a phenomenon that occurs, a coarse movement mechanism fixed to a base, and a sample mounted on the coarse movement mechanism to mount the sample and at least four axes related to a scanning axis A fine movement mechanism for performing displacement, a displacement measuring means for measuring the displacement of the fine movement mechanism,
Target displacement generating means for outputting the target displacement of the fine movement mechanism, and displacement control means for controlling the displacement of the fine movement mechanism based on the target displacement output from the target displacement generating means and the displacement measured by the displacement measuring means. And is provided.

[0014]

In the shape measurement, the measurement area of the sample is opposed to the probe by the coarse movement mechanism, and the coarse movement mechanism or the coarse movement mechanism provided on the probe side makes the gap between the probe and the sample surface a predetermined gap. Then, scanning is performed by the fine movement mechanism. During this scanning, the displacement is performed by the fine movement mechanism or the fine movement mechanism provided on the probe side so that the gap between the probe and the sample surface is kept constant. The displacement including the above scanning is performed by the output of the target displacement from the target displacement generating means, and the displacement control means drives the fine movement mechanism according to the target displacement. If the sample has tilts or undulations, they are corrected by the rotational displacement of the fine movement mechanism.

[0015]

The present invention will be described below with reference to the illustrated embodiments. FIG. 1 is a side view of a shape measuring apparatus according to an embodiment of the present invention. In the figure, X, Y and Z indicate the same coordinate axes as those shown in FIG. 10 is an XY coarse movement mechanism fixed to the base and displaced with a large stroke in the X-axis and Y-axis directions, 11
Is a Z-axis coarse movement mechanism that is fixed on the XY coarse movement mechanism 10 and is displaced in the Z-axis direction with a large stroke. Reference numeral 12 denotes a fine movement mechanism fixed on the Z-axis coarse movement mechanism 11, which produces a minute translational displacement in the X, Y, and Z axis directions and a minute rotational displacement about the X, Y, and Z axes. Reference numeral 13 denotes a displacement measuring mirror provided on the fine movement mechanism 12, which constitutes a part of the laser displacement meter and reflects a laser beam 14 from a laser light source (not shown). In the figure, only the mirror along the Y-axis direction is shown, but a mirror along the X-axis direction is also provided. Reference numeral 2 is a sample placed on the fine movement mechanism 12, and 5 is a probe fixed to the base via a rigid body. In this embodiment, unlike the conventional device, the probe 5 is fixed to the fixed portion.

A concrete example of the fine movement mechanism 12 is shown in FIGS. 2 is an exploded perspective view of a specific example of the fine movement mechanism, FIG.
FIG. 6 is a perspective view of another specific example of the fine movement mechanism. The fine movement mechanism shown in FIG. 2 includes three blocks 120U _XY , 120U _Z , 1
It is composed of 20θ _XYZ . In each block, the reference symbol G indicates a strain gauge for measuring the displacement amount of each axis (only one strain gauge in each block is assigned a reference symbol), and the reference symbol P indicates a piezoelectric element. Further, a symbol with a number attached to S indicates a connecting portion between blocks, and block 1
20 U _Z is coupled to a block 120U _XY at the junction S _1, S _2, block 120Shita _XYZ is coupled to a block 120U _Z at the junction S _3, S _4. Block 120θ
_A table (not shown) is connected to the connecting portion S _{5 of XYZ} ,
The sample 2 is placed on this table. As shown by the arrow, the block 120U _XY generated X, Y-axis direction of the translational displacement U _X, the U _Y, block 120U _Z generates a translational displacement U _Z in the Z-axis direction, also the block 120Shita _XYZ is X , Y, Z rotational displacements θ _X , θ _Y , θ _Z are generated. Details of this fine movement mechanism are described in "Development of multi-axis positioning device using parallel plate / radiation plate", Proc.

The fine movement mechanism shown in FIG. 3 includes six actuators 121 to 126 and these actuators 121 to 126.
The table T is connected to the table 126. Each of the actuators 121 to 126 has a similar structure, and as shown in the actuator 126, an elastic hinge H that connects the base B, the piezoelectric element P, the base B and the piezoelectric element P, and the table T and the piezoelectric element P. Composed. Each elastic hinge H has a characteristic that it is rigid with respect to the expansion / contraction direction of the piezoelectric element P and is flexible in other directions. Sample 2 on table T
Is placed. With this fine movement mechanism, the translational displacement in the X-axis direction is the actuator 124 or 126, the translational displacement in the Y-axis direction is the actuator 125, the translational displacement in the Z-axis direction is the actuators 121, 122, 123, and the rotational displacement about the X-axis is the actuator 122. , 123, the rotational displacement about the Y axis is generated by driving the actuators 121, 122, 123, and the rotational displacement about the Z axis is generated by driving the actuators 124, 126. The details of this fine movement mechanism are described in "Preliminary Lecture of Robotics Society of 1987""Calibration with multiple degrees of freedom".

In the fine movement mechanism 12 of the present embodiment, at least the translational displacement in the Z-axis direction, the rotational displacement about the X axis, and the rotational displacement about the Y axis are measured by a displacement gauge built in the fine movement mechanism 12 (see FIG. In the example of 2 and FIG. 3, it is measured by a strain gauge G). For such a displacement gauge, a capacitance type displacement measuring means, a semiconductor gauge, or the like is used in addition to the strain gauge, and measurement on the order of 1 nanometer is possible. The translational displacement in the X and Y axis directions and the rotational displacement about the Z axis are measured by the laser displacement meter.

FIG. 4 is a block diagram of a control device for the fine movement mechanism 12. In the figure, 16 is a target displacement generator,
The target displacements of the axes (translational displacements in the three axis directions and rotational displacements around the three axes) are output. U ₀ indicates six target displacements. 17
Is a subtracter, and 18 is an interference matrix. The interference matrix 18 is a matrix peculiar to the fine movement mechanism 12 that determines how much voltage should be applied to the piezoelectric element of each axis to generate a predetermined displacement in the fine movement mechanism 12. For example, when it is desired to generate only the translational displacement in the X-axis direction, only the target displacement of the X-axis is set in the target displacement generation unit 16 and the target displacement of the other axis is 0, but only the X-axis translational piezoelectric element is driven. In order to exclude the interference displacement that occurs when
Voltages according to the above matrix are also applied to the piezoelectric elements of other axes, and as a result, translational displacement in the X-axis direction is accurately achieved. C indicates the matrix and is called an inverse Jacobian matrix.

Reference numeral 19 denotes a controller for generating and outputting a voltage applied to the piezoelectric element of each axis based on the signal of each axis determined by the interference matrix 18, and proportional, integral, differential, and amplified with respect to the input signal. Etc. are processed. A (s) indicates the function of the controller.

Reference numeral 20 denotes a fine movement part of the fine movement mechanism 12,
G (s) shows its mechanical properties. U is an actual displacement caused by the movement of the fine movement unit 20. 21 is the fine movement mechanism 12
Is a conversion matrix for converting the actual displacement of the above into a displacement of 6 axes, and feedback control is performed by inputting the converted values of each axis to the subtractor 17. The conversion matrix 21 indicates a logical function,
In the present embodiment, as described above, the translational displacement in the Z-axis direction, X
The displacements of the rotational displacement about the axis and the rotational displacement about the Y axis are measured by a displacement gauge built in the fine movement mechanism 12, and the translational displacement in the X and Y axis directions and the rotational displacement about the Z axis are measured by the laser. It will be measured by a displacement meter and these values will be input to the subtractor.

The operation of this embodiment will be described below. A region to be measured on the surface of the sample 2 is moved to a position facing the probe 5 by the XY coarse movement mechanism 10, and then the sample 2 is searched by the Z axis coarse movement mechanism 11 until a gap where a tunnel current is generated. Approach the needle 5.

By the way, the surface of the sample 2 having a particularly large diameter is inclined due to a difference in thickness of both ends thereof,
Some have undulations on the surface. These inclinations and undulations may be known in advance or may be known by separate measurement. FIG. 5 shows the inclination of Sample 2, and FIG. 6 shows the sample surface having waviness. The slopes and undulations in each figure are extremely exaggerated.

Before scanning the sample surface, if the sample surface is tilted by the angle θ _YC about the Y axis as shown in FIG. 5, the target of the axis θ _Y of the fine displacement mechanism 12 is the target. Set the displacement to θ _YC . Similarly, when the undulation exists on the surface of the sample as shown in FIG. 6, the target displacement of the axis θ _Y is set to the inclination angle of the undulation. As for the inclination angle of the undulation, for example, as shown in FIG. 6, the heights of the points A and B at both ends of the sample 2 are measured by the fine movement mechanism 12, and the center line O of the undulation is obtained based on the difference between the two. It can be obtained by obtaining the inclination of the center line O with respect to the horizontal line. It should be noted that the target displacement can be similarly set for inclinations and undulations around other axes.

After setting the target displacement in the target displacement generator 16 according to the inclination or waviness of the sample 2 as described above, the fine movement mechanism 12 scans the XY plane and the Z axis for obtaining a constant tunnel current. Perform directional displacement. The scanning by the fine movement mechanism 12 is performed by sequentially setting the XY coordinates on the scanning line in the target displacement generating unit 16 in time. The displacement in the Z-axis direction is performed by sequentially inputting signals from a tunnel current detection / control device (not shown) to the target displacement generator 16. The displacement in the Z-axis direction becomes shape data.

As described above, in this embodiment, since the 6-axis fine movement mechanism 12 is used and is controlled by the control device, it is possible to solve the above-mentioned problems in the conventional device. That is, (a) the hysteresis or drift of the piezoelectric element is caused by the fine movement mechanism 1.
Controlling 2 with a controller having an interference matrix 18 makes them completely irrelevant. (B) For the same reason, scanning can be performed without causing interference displacement, and data accurately corresponding to each position in the scanning region can be obtained. (C) Since the inclination and undulation of the sample 2 can be corrected by the rotational displacement of the fine movement mechanism 12, the measurement range in the Z-axis direction does not become larger than the fine movement range of the fine movement mechanism 12, and the re-approaching process in the Z-axis direction does not occur. It is not necessary, it is possible to prevent an increase in measurement time, and there is no problem of ensuring reproducibility. or,
Even if the need for the re-approaching process arises, or for other reasons, for example, when measuring a certain area, it becomes necessary to re-measure the already-measured area from the same viewpoint as the measurement at that time. Accurate reproduction can be performed for the same reason as (a) above. (D) Since the probe 5 is fixed to the fixed portion separately from the fine movement mechanism 12 that performs scanning, it is possible to prevent a decrease in measurement accuracy due to thermal deformation.

FIG. 7 is a block diagram of another specific example of the control device for the fine movement mechanism. 7, parts that are the same as or equivalent to the parts shown in FIG. 4 are assigned the same reference numerals and explanations thereof are omitted. Feedback control is not performed in this control device, and the subtracter 1
7 is omitted. In addition, it goes without saying that feedback control can be performed if necessary. Reference numeral 22 is a storage device. This storage device 22 has an actual displacement U of 6 axes.
And the output voltage from the controller 19 is sequentially stored. The fine movement mechanism in this example has a built-in displacement gauge that measures the displacement in the X-axis direction and the displacement in the Y-axis direction.

The control device of this example and the control device of the previous example are different in that the former is provided with the storage device 22. The function of the storage device 22 will be described below. Both the control device of the specific example and the control device of this specific example measure the translational displacement in the X and Y directions and the rotational displacement about the Z axis with a laser displacement meter. By the way, the laser displacement meter is capable of measuring a long stroke and is suitable for measuring a large sample, but its resolution is about 1 to 10 nanometers, and in practice, there is no "fluctuation" in the measurement environment. The problem exists,
It is difficult to accurately measure on the order of nanometers, and most laser displacement meters that are commercially available usually have a resolution of about 10 nanometers.

Here, it is assumed that the laser displacement meter used in this example has a resolution of 10 nanometers. Such a laser displacement meter generates one pulse each time a displacement of 10 nanometers is measured, and detects the displacement amount by adding the number of generated pulses. In this case, the coordinates that can be set as the measurement points in the scanning of the XY plane are the minimum 10 nanometer intervals. Therefore, when more detailed shape information is required, such shape information cannot be obtained as long as the laser displacement meter is used. The present control device solves such a problem.

The operation of this control device will be described with reference to FIG. In this figure, p is the actual displacement and is stored in the storage device 22.
An output pulse of the laser displacement meter in the X-axis direction or the Y-axis direction stored in V is a voltage for generating displacement in the same direction, which is output from the controller 19 and stored in the storage device 22. If the values of the voltage v (v ₁ and v _{2 in the} figure) are stored each time the pulse p is input to the storage device 22, the values v ₁ and v ₂
It is possible to set the position (coordinates) between each pulse based on the difference between the two pulses, making the best use of the characteristic that the long stroke measurement for the predetermined axis of the laser displacement meter is possible, and more precise displacement measurement in the axial direction is also possible. can do. In addition,
Hysteresis and drift exist between the applied voltage and the displacement of the piezoelectric element, but the effect is negligible at a minute distance of 10 nanometers, and the difference between the voltages v ₁ and v ₂ is 1
Since it is known to correspond to 0 nanometer, accurate coordinate setting is possible.

FIG. 9 is a perspective view of a shape measuring apparatus according to another embodiment of the present invention. In the figure, parts that are the same as or equivalent to the parts shown in FIG. Thirty
Is a Z-axis fine movement mechanism, 31 is a laser displacement meter including a laser light source, 32 is a base, and 33 is a bridge-type structure fixed to the base 32. The Z-axis coarse movement mechanism 11 is the structure
3, the Z-axis fine movement mechanism 30 is fixed to the Z-axis coarse movement mechanism 11, and the probe 5 is fixed to the Z-axis fine movement mechanism 30. Laser displacement gauges are installed at three locations (one of which is
One is denoted by reference numeral 31 and the others are omitted), and the translational displacement of the fine movement mechanism 12 in the X and Y axis directions and the rotational displacement about the Z axis are measured. The other displacement of the fine movement mechanism 12 and the displacement of the Z-axis fine movement mechanism 30 are measured by a built-in displacement gauge.

This embodiment is different from the previous embodiment only in that the Z-axis coarse movement mechanism 11 and the Z-axis fine movement mechanism 30 are installed on the probe 5 side, and the operation thereof is the same as the previous embodiment. According to the operation of. Further, the effect of this embodiment is the same as the effect of the previous embodiment, but in addition to that effect, the Z-axis fine movement mechanism 30 can be made compact, so that the resonance point of the mechanism becomes high. There is also an effect that vibration can be suppressed, and therefore, measurement can be performed at higher speed.

In the above description of the embodiment, the shape measuring device using the tunnel microscope has been described, but another probe type microscope such as an atomic force microscope may be used.
Further, although an example in which a displacement gauge and a laser displacement gauge built in the fine movement mechanism are used together as the displacement measuring means has been described, it is possible to use an appropriate displacement gauge other than the laser displacement gauge from the viewpoint of accuracy, Further, when the displacement of such a long stroke is not required, it is possible to use only the displacement gauge built in the fine movement mechanism.

[0034]

As described above, according to the present invention, the fine movement mechanism for displacing at least four axes with respect to the scanning axis is provided,
Since the displacement of the fine movement mechanism is controlled based on the target displacement, it is possible to eliminate the influence of hysteresis and drift of the piezoelectric element, and it is possible to perform scanning without causing interference displacement. It is possible to prevent the measurement time from increasing even if the sample is tilted or undulated, and it is possible to ensure the reproducibility of the measurement. Further, since the probe is provided on the fixed side separately from the fine movement mechanism that performs scanning, it is possible to prevent the measurement accuracy from deteriorating due to thermal deformation.

[Brief description of drawings]

FIG. 1 is a side view of a shape measuring apparatus according to an embodiment of the present invention.

FIG. 2 is a perspective view of a specific example of the fine movement mechanism shown in FIG.

3 is a perspective view of another specific example of the fine movement mechanism shown in FIG. 1. FIG.

FIG. 4 is a block diagram of a control device for the fine movement mechanism shown in FIG.

FIG. 5 is a diagram showing the inclination of a sample.

FIG. 6 is a diagram showing undulations of a sample.

7 is a block diagram of another control device for the fine movement mechanism shown in FIG. 1. FIG.

FIG. 8 is a diagram illustrating an operation of the control device shown in FIG.

FIG. 9 is a side view of a shape measuring apparatus according to another embodiment of the present invention.

FIG. 10 is a side view of a conventional shape measuring device.

11 is a perspective view of a specific example of the fine movement mechanism shown in FIG.

12 is a perspective view of another specific example of the fine movement mechanism shown in FIG.

FIG. 13 is a characteristic diagram showing hysteresis of a piezoelectric element.

[Explanation of symbols]

 2 sample 5 probe 10 XY coarse movement mechanism 11 Z-axis coarse movement mechanism 12 fine movement mechanism 13 mirror 16 target displacement setting unit 18 interference matrix 19 controller 20 fine movement unit

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Akira Hashimoto 650 Kazutachi-cho, Tsuchiura-shi, Ibaraki Hitachi Construction Machinery Co., Ltd. Tsuchiura Plant (72) Inventor, Yasuhiko Fukuchi, 650 Jinrachicho, Tsuchiura-shi, Ibaraki Hitachi Construction Machinery Co., Ltd.

Claims (7)

[Claims] 1. A shape measuring device for scanning a surface of a sample, and measuring a shape of the surface of the sample by using a phenomenon occurring between the surface of the sample and a probe which is close to the surface of the sample during the scanning. , A coarse movement mechanism fixed to the base, a fine movement mechanism installed on the coarse movement mechanism for placing the sample and performing at least four-axis displacement with respect to the scanning axis, and a displacement of the fine movement mechanism or the coarse movement mechanism. Displacement measuring means for measuring the combined displacement of the mechanism and the fine movement mechanism, target displacement generating means for outputting the target displacement of the fine movement mechanism, and the target displacement output from the target displacement generating means and the displacement measuring means. And a displacement control means for controlling the displacement of the fine movement mechanism on the basis of the determined displacement. 2. The shape measuring device according to claim 1, wherein the displacement measuring means is a laser interference displacement meter using a mirror provided in the fine movement mechanism. 3. The shape measuring device according to claim 1, wherein the displacement measuring means is a strain gauge incorporated in the fine movement mechanism. 4. The shape measuring device according to claim 1, wherein the displacement measuring unit is a capacitance type displacement measuring unit built in the fine movement mechanism. 5. The shape measuring device according to claim 1, wherein the probe is fixed to the base via a rigid body. 6. The shape measuring device according to claim 1, wherein the probe is fixed to a displacement mechanism that generates displacement in the direction of the sample. 7. The shape measuring apparatus according to claim 1,
A shape measuring device comprising a storage means for simultaneously storing the displacement obtained by the displacement measuring means and the drive signal of the fine movement mechanism of the displacement control means.