JPH0665794A - Anode - Google Patents

Anode

Info

Publication number
JPH0665794A
JPH0665794A JP22017092A JP22017092A JPH0665794A JP H0665794 A JPH0665794 A JP H0665794A JP 22017092 A JP22017092 A JP 22017092A JP 22017092 A JP22017092 A JP 22017092A JP H0665794 A JPH0665794 A JP H0665794A
Authority
JP
Japan
Prior art keywords
anode electrode
clearance
electrolytic solution
anode
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22017092A
Other languages
Japanese (ja)
Inventor
Toshio Horie
俊男 堀江
Koichi Ashizawa
公一 芦澤
Hitoshi Kato
人士 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FURUKAWA SAAKITSUTO FOIL KK
Furukawa Electric Co Ltd
Original Assignee
FURUKAWA SAAKITSUTO FOIL KK
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FURUKAWA SAAKITSUTO FOIL KK, Furukawa Electric Co Ltd filed Critical FURUKAWA SAAKITSUTO FOIL KK
Priority to JP22017092A priority Critical patent/JPH0665794A/en
Publication of JPH0665794A publication Critical patent/JPH0665794A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To provide an anode capable of uniformly agitating an electrolyte in a narrow space between both electrodes. CONSTITUTION:An electrical insulating protrusion 1 and/or a recessed hole are formed on the surface of an anode 2 opposed to a cathode. An electrolyte is circulated between the cathode and anode 2 or the anode 2 is moved with respect to the electrolyte, and the electrolyte is uniformly agitated by the protrusion 1.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はアノード電極に関し、更
に詳しくは、対極であるカソード電極との間に位置する
電解液に対して均一な撹拌作用を及ぼすことができるア
ノード電極に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an anode electrode, and more particularly to an anode electrode capable of exerting a uniform stirring action on an electrolytic solution located between a cathode electrode which is a counter electrode.

【0002】[0002]

【従来の技術】大面積の平板の表面に所定金属を均一に
電解めっきしたり、またはその平板に各種の電解表面処
理を施す場合には、この平板に対向して対極として略同
面積の表面平滑な平板電極を近接して並行配置し、被電
解処理物をカソード電極,並行配置した平板電極をアノ
ード電極としてそれぞれ結線し、両極間のクリアランス
に所定の電解液を満たして電解反応を起こさせる。
2. Description of the Related Art When a surface of a large-area flat plate is electrolytically plated with a predetermined metal uniformly, or when various kinds of electrolytic surface treatments are applied to the flat plate, the surface of the same area as a counter electrode is opposed to the flat plate. Smooth flat plate electrodes are closely arranged in parallel, the object to be electrolyzed is connected as a cathode electrode, and the parallel plate electrodes are connected as an anode electrode, and the clearance between both electrodes is filled with a predetermined electrolytic solution to cause an electrolytic reaction. .

【0003】また、例えば電解銅箔を成膜する場合に
は、カソード電極として大型ドラムを用い、アノード電
極には前記大型ドラムより若干大径で内面が平滑な円筒
体を軸方向に2つ割りした形状の槽を用い、この槽内に
前記大型ドラムを同軸的にセットし、前記大型ドラムを
回転させながら槽の内面と大型ドラムの外面とのクリア
ランスに銅めっき浴を通流させて電解反応を起こさせ、
前記大型ドラムの表面に連続的に銅を電析させる。
For example, in the case of depositing an electrolytic copper foil, a large drum is used as the cathode electrode, and the anode electrode is divided into two axially cylindrical bodies having a diameter slightly larger than that of the large drum and having a smooth inner surface. Using the tank of the shape described above, set the large drum coaxially in this tank, and while rotating the large drum, the copper plating bath is passed through the clearance between the inner surface of the tank and the outer surface of the large drum to carry out the electrolytic reaction. Cause
Copper is continuously electrodeposited on the surface of the large drum.

【0004】このように、大面積のカソード電極とアノ
ード電極を近接配置して電解反応を行う場合の重要な問
題は、両極間のクリアランスに通流させる電解液を均一
に撹拌して、カソード電極の表面への電析を均一に行わ
せることである。この場合、電極間のクリアランスが広
ければそこに撹拌作用を持つ機構を配置して均一撹拌を
実現することができる。
As described above, an important problem in carrying out an electrolytic reaction by arranging a large-area cathode electrode and an anode electrode in close proximity is to uniformly stir the electrolytic solution flowing through the clearance between the two electrodes so that the cathode electrode Is to uniformly perform the electrodeposition on the surface of. In this case, if the clearance between the electrodes is wide, a mechanism having a stirring action can be arranged there to achieve uniform stirring.

【0005】ところで、電極間のクリアランスを狭くす
るほど電解反応に必要な電力量を少なくすることができ
るので、経済的には、電極間のクリアランスを狭くする
ことが好ましい。しかし、電極間のクリアランスを狭く
すると、上記した撹拌機構を用いる電解液の撹拌は事実
上不可能になってしまう。このため、従来は、両極間の
クリアランスに下方から電解液を供給して上方から溢流
させ、電解液の流れで電解液それ自体を撹拌するという
方法や、クリアランスの下方から気体を噴流してそのバ
ブルでクリアランス内の電解液を撹拌するという方法が
採用されている。
By the way, as the clearance between the electrodes is reduced, the amount of electric power required for the electrolytic reaction can be reduced. Therefore, it is preferable to reduce the clearance between the electrodes economically. However, if the clearance between the electrodes is narrowed, stirring of the electrolytic solution using the stirring mechanism described above becomes practically impossible. For this reason, conventionally, a method of supplying an electrolytic solution from below to the clearance between both electrodes and causing the electrolytic solution to overflow from above, stirring the electrolytic solution itself by the flow of the electrolytic solution, or jetting gas from below the clearance A method of stirring the electrolytic solution in the clearance with the bubbles is adopted.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、前者の
撹拌方法の場合、電解液を狭いクリアランスに均一に通
流することは困難であり、かつ、下方の電解液供給口か
ら供給したときの初速は大きくても、その供給口から離
れた場所では不可避的に電解液の流速が小さくなり、上
下方向では電解液の撹拌状態が不均一になる。しかも、
クリアランスの下方から上方にかけて、電解液の流れや
すい流路が形成されることがあって、電解液の均一撹拌
は非常に困難となる。
However, in the case of the former stirring method, it is difficult to uniformly flow the electrolytic solution through a narrow clearance, and the initial velocity when the electrolytic solution is supplied from the lower electrolytic solution supply port is Even if it is large, the flow velocity of the electrolytic solution becomes unavoidably small at a place distant from the supply port, and the stirring state of the electrolytic solution becomes non-uniform in the vertical direction. Moreover,
A flow path in which the electrolytic solution easily flows may be formed from the lower side to the upper side of the clearance, which makes it extremely difficult to uniformly stir the electrolytic solution.

【0007】また後者の撹拌方法の場合、クリアランス
の下方から浮上してきたバブルはクリアランスの上方で
合体して大気泡となる。そのため、この合体気泡が両電
極の表面を被覆するようになり、その部分における電析
が阻害され、全体の仕上がり表面の状態は不均一にな
る。本発明は、上記した問題を解決し、それ自体が電解
液を均一に撹拌する能力を備えているアノード電極の提
供を目的とする。
In the latter stirring method, the bubbles floating from below the clearance are merged into the large bubbles above the clearance. Therefore, the coalesced bubbles cover the surfaces of both electrodes, and the electrodeposition in those portions is hindered, and the state of the entire finished surface becomes uneven. An object of the present invention is to solve the above-mentioned problems and to provide an anode electrode which itself has an ability of uniformly stirring an electrolytic solution.

【0008】[0008]

【課題を解決するための手段・作用】上記した目的を達
成するために、本発明においては、被処理体であるカソ
ード電極との対向面に、電気絶縁性突起部または/およ
び凹没孔が形成されていることを特徴とするアノード電
極が提供される。本発明のアノード電極は、カソード電
極に近接して並行配置したときに、カソード電極との対
向面の上に上記した複数の突起部または凹没孔が形成さ
れている。
In order to achieve the above object, in the present invention, an electrically insulating protrusion or / and a recessed hole are provided on the surface facing the cathode electrode which is the object to be treated. An anode electrode is provided which is characterized by being formed. The anode electrode of the present invention has the above-described plurality of protrusions or recessed holes formed on the surface facing the cathode electrode, when the anode electrode is arranged in parallel near the cathode electrode.

【0009】したがって、両極を静止した状態で両極間
のクリアランスに電解液を通流させた場合、流れる電解
液はこれらの突起部や凹没孔と複雑に衝突しながら流れ
るのでクリアランスの中には、上下方向,左右方向を問
わず、完全な乱流が発生する。また、逆に電解液を静止
した状態で、カソード電極に対向配置されたアノード電
極を上下方向また左右方向に動かすことにより、両極間
のクリアランスに乱流を発生させることができる。
Therefore, when the electrolytic solution is caused to flow through the clearance between the two electrodes while the both electrodes are stationary, the flowing electrolytic solution flows while colliding with these projections and recessed holes in a complicated manner, and therefore, there is no clearance. Complete turbulence occurs regardless of vertical or horizontal direction. On the contrary, by moving the anode electrode facing the cathode electrode in the vertical direction and the horizontal direction while the electrolytic solution is stationary, a turbulent flow can be generated in the clearance between the electrodes.

【0010】本発明のアノード電極において、突起部は
電気絶縁性の材料で構成される。その理由は、突起部が
良電導体で構成されていると、その部分のカソード電極
との極間距離は突起部が形成されていない部分よりも狭
くなるため、電極間における電流の流れ方が不均一とな
り、その結果、被処理体のカソード電極への電析状態も
不均一になるからである。
In the anode electrode of the present invention, the protrusion is made of an electrically insulating material. The reason is that if the protrusion is made of a good electric conductor, the distance between the cathode and the cathode electrode in that part will be narrower than in the part where the protrusion is not formed, so the flow of current between the electrodes will be different. This is because it becomes nonuniform, and as a result, the state of electrodeposition on the cathode electrode of the object to be processed also becomes nonuniform.

【0011】この突起部は、例えば表面が平滑なアノー
ド電極本体の表面に、各種のプラスチック材やセラミッ
クス材のような電気絶縁性材料で製造したチップ、板な
どの突片を例えばねじ止めなどの機械的手段で取付ける
ことによって形成することができる。これら突起部は、
アノード電極本体の表面に複数個形成されるが、カソー
ド電極と対向しているその突起部の占有面積が過度に大
きくなると、アノード電極本体の通電面積が小さくなっ
て良好な電解反応を行えなくなるので、突起部の占有面
積は10%以下、好ましくは5%以下となるように形成
する。
The protrusions are formed by, for example, screwing a protrusion such as a chip or a plate made of an electrically insulating material such as various plastic materials or ceramic materials on the surface of the anode electrode body having a smooth surface. It can be formed by attachment by mechanical means. These protrusions are
A plurality of electrodes are formed on the surface of the anode electrode body, but if the area occupied by the protrusion facing the cathode electrode becomes excessively large, the current-carrying area of the anode electrode body will become small, and a good electrolytic reaction will not be possible. The area occupied by the protrusions is 10% or less, preferably 5% or less.

【0012】また、この突起部の高さは、上記した占有
面積や、両極間のクリアランスの大きさ、電解液の粘性
などによっても異なるが、電解液に均一な撹拌効果を与
えるためには、概ね、クリアランスの30〜90%程度
の値であることが好ましい。とくに好ましくは、クリア
ランスの50〜80%程度の値である。また、上記した
絶縁性突起部を形成することなく、アノード電極本体の
表面に、微細な複数の凹没孔を穿設して本発明のアノー
ド電極としてもよい。なお、凹没孔は電極を貫通する孔
であってもよい。
The height of the protrusion varies depending on the above-mentioned occupied area, the size of the clearance between both electrodes, the viscosity of the electrolytic solution, etc., but in order to give a uniform stirring effect to the electrolytic solution, Generally, the value is preferably about 30 to 90% of the clearance. Particularly preferably, the value is about 50 to 80% of the clearance. In addition, a plurality of fine recessed holes may be formed on the surface of the anode electrode body without forming the above-mentioned insulating protrusion to form the anode electrode of the present invention. The recessed hole may be a hole that penetrates the electrode.

【0013】この場合、これら凹没孔の深さや孔径をあ
まり過大にすると、たしかに電解液の乱流化にとっては
好適になるが、しかし電解反応に悪影響を及ぼして均一
な電析ができなくなり、また凹没孔が小さすぎると電解
液の乱流化を充分実現できなくなる。そのため、アノー
ド電極の全表面積に対する凹没孔全体の占有面積は15
%以下であることが好ましい。とくに好ましくは5%以
下である。
In this case, if the depth and the hole diameter of these recessed holes are made excessively large, it will be suitable for making the electrolyte solution turbulent, but it will adversely affect the electrolytic reaction and uniform electrodeposition will not be possible. Further, if the recessed holes are too small, turbulence of the electrolyte cannot be sufficiently realized. Therefore, the occupied area of the entire depressed hole is 15 with respect to the total surface area of the anode electrode.
% Or less is preferable. It is particularly preferably 5% or less.

【0014】[0014]

【発明の実施例】Examples of the invention

実施例1 図1で示したように、縦5mm,横8mm,高さ12mmで背
面にねじ1aが突設加工されているポリエチレン製チッ
プ1を用意した。縦1050mm,横1050mm,厚み5
mmの鉛板2の片面に、1000個の上記したチップ1を
上下方向と左右方向のピッチをいずれも30mmで千鳥状
にねじ込んで固定して図2で示したようなアノード鉛電
極とした。チップの占有面積は4%である。
Example 1 As shown in FIG. 1, a polyethylene chip 1 having a length of 5 mm, a width of 8 mm, a height of 12 mm and a screw 1a protruding from the back surface was prepared. Vertical 1050 mm, horizontal 1050 mm, thickness 5
On one surface of a lead plate 2 having a size of 1,000 mm, 1,000 pieces of the above-mentioned chips 1 were screwed and fixed in a staggered manner at a pitch of 30 mm in both vertical and horizontal directions to form an anode lead electrode as shown in FIG. The occupied area of the chip is 4%.

【0015】また、縦1000mm,横1000mm,厚み
5mmの低炭素鋼板を40℃の10%硫酸液に5分間浸漬
したのちこれを取り出し、水洗,脱錆,脱脂を順次行な
って被めっき板とした。無水クロム酸250g/l,硫
酸2.5g/lのクロムめっき浴を建浴し、このめっき浴
の中に、上記の低炭素鋼板の両面に上記アノード鉛電極
のチップ側の面を間隔20mmで並行配置した。なお、こ
の低炭素鋼板の両面に並行配置された2枚の鉛板は低炭
素鋼板と並行配置の状態を維持したままめっき浴中を上
下に移動できるようにした。
Further, a low carbon steel plate having a length of 1000 mm, a width of 1000 mm and a thickness of 5 mm was immersed in a 10% sulfuric acid solution at 40 ° C. for 5 minutes and then taken out, followed by washing with water, derusting and degreasing in order to obtain a plated plate. . A chrome plating bath containing 250 g / l of chromic anhydride and 2.5 g / l of sulfuric acid was placed in the plating bath. I arranged them in parallel. The two lead plates arranged in parallel on both sides of this low carbon steel plate were allowed to move up and down in the plating bath while maintaining the condition of parallel arrangement with the low carbon steel plate.

【0016】浴温50℃,電流密度30A/dm2 の電解
条件で40分間鉄板へのクロムめっきを行った。この過
程で、2枚の鉛板には、上下方向への振幅5cmで15回
/分の頻度で上下方向への往復運動を与えた。低炭素鋼
板の両面には、平均の厚みが14.2μmのクロムめっき
層が形成された。このめっき層の表面光沢は満足すべき
状態にあり、また周囲20mmを除く部分のめっき厚のば
らつきは、標準偏差値で1.01μmであった。
Chromium plating was performed on an iron plate for 40 minutes under electrolytic conditions of a bath temperature of 50 ° C. and a current density of 30 A / dm 2 . In this process, the two lead plates were given a reciprocating motion in the vertical direction with an amplitude of 5 cm in the vertical direction and a frequency of 15 times / minute. A chrome plating layer having an average thickness of 14.2 μm was formed on both surfaces of the low carbon steel sheet. The surface gloss of this plating layer was in a satisfactory state, and the variation in the plating thickness of the portion excluding the periphery of 20 mm was 1.01 μm in standard deviation.

【0017】比較のため、鉛板を上下方向に往復運動さ
せることなく、実施例1と同様の条件でクロムめっきを
行った。形成されたクロムめっき層の表面光沢は不満足
な状態であり、まためっき厚のばらつきは標準偏差値で
1.48μmであった。 実施例2 実施例1で用いた鉛板に取付けられているチップを、鉛
板の上下方向で1列おきに配置し、しかも、チップ列の
間に直径8mmの貫通孔3を配置して図3に示すアノード
電極とした。
For comparison, chromium plating was performed under the same conditions as in Example 1 without reciprocating the lead plate in the vertical direction. The surface gloss of the formed chrome plating layer is in an unsatisfactory state, and the variation in plating thickness is the standard deviation value.
It was 1.48 μm. Example 2 The chips attached to the lead plate used in Example 1 are arranged every other row in the vertical direction of the lead plate, and the through holes 3 having a diameter of 8 mm are arranged between the chip rows. The anode electrode shown in FIG.

【0018】このアノード電極を用いて、実施例1と同
様の操作で低炭素鋼板へのクロムめっきを行った。形成
されたクロムめっき層の平均の厚みは14.9μmであ
り、その標準偏差値は1.06μmであった。また、めっ
き層の表面は非常に良好な光沢を備えていた。
Using this anode electrode, chromium plating was performed on a low carbon steel sheet in the same manner as in Example 1. The formed chromium plating layer had an average thickness of 14.9 μm and a standard deviation value of 1.06 μm. In addition, the surface of the plating layer had a very good gloss.

【0019】実施例3 図4で示した連続銅箔製造装置を組み立てた。酸化イリ
ジウムで被覆されたチタン板を湾曲加工して直径152
0mm,長さ1200mmの半円筒体4にし、その内面に、
高さ8mm,幅1.5mm,長さ1200mmのポリエチレン製
の板状突起5を周方向に、図5で示したように、30mm
の間隔で53枚配列固定して本発明のアノード電極とし
た。板状突起5の占有面積は5%である。
Example 3 The continuous copper foil manufacturing apparatus shown in FIG. 4 was assembled. The titanium plate coated with iridium oxide is bent to a diameter of 152
The semi-cylindrical body 4 with a length of 0 mm and a length of 1200 mm is formed on the inner surface thereof.
A polyethylene plate-like projection 5 having a height of 8 mm, a width of 1.5 mm and a length of 1200 mm is circumferentially arranged to have a length of 30 mm as shown in FIG.
The anode electrode of the present invention was prepared by fixing 53 sheets arranged at intervals of. The area occupied by the plate-like protrusions 5 is 5%.

【0020】このアノード電極に、直径1500mm,長
さ1200mmのステンレス鋼製のドラム6を同軸的にセ
ットした。アノード電極の内面とドラム6の外周面との
間に形成されている10mmのクリアランスに、アノード
電極の底部中央から、硫酸銅231g/l,硫酸113
g/l,浴温60℃の銅めっき浴を500l/分の流量
で供給し、ドラム6を矢印のように周速16cm/分で回
転させながら、17.3A/dm2 の電流密度で10分間銅
めっきを行った。
A drum 6 made of stainless steel having a diameter of 1500 mm and a length of 1200 mm was coaxially set on the anode electrode. At a clearance of 10 mm formed between the inner surface of the anode electrode and the outer peripheral surface of the drum 6, copper sulfate 231 g / l, sulfuric acid 113 from the center of the bottom of the anode electrode.
While supplying a copper plating bath having a bath temperature of 60 ° C and a flow rate of 500 l / min while rotating the drum 6 at a peripheral speed of 16 cm / min as indicated by an arrow, the current density of 17.3 A / dm 2 is 10 Copper plating was performed for a minute.

【0021】供給されためっき浴は上部から溢流する
が、これは再びクリアランスに供給して循環使用した。
また、ドラム5の外周面に形成した銅箔は連続的に剥離
した。このようにして、長さ約10m,幅約1000mm
の銅箔を製造し、その銅箔を縦200mm,横200mmに
裁断し、それら裁断片につき、重量と厚みを測定した。
The supplied plating bath overflows from the upper part, but this is supplied again to the clearance for recycling.
Further, the copper foil formed on the outer peripheral surface of the drum 5 was continuously peeled off. In this way, the length is about 10m and the width is about 1000mm.
Of the copper foil was manufactured, the copper foil was cut into a length of 200 mm and a width of 200 mm, and the weight and thickness of the cut pieces were measured.

【0022】平均重量は14.53gであり、その標準偏
差値は1.54gであった。また平均の厚みは40.1μ
m,その標準偏差値は4.3μmであった。比較のため、
アノード電極にボッチを設けることなく、実施例2と同
様にして銅箔を連続製造した。実施例と同様の裁断片の
平均重量は14.48gであり、その標準偏差値は1.95
gであった。また平均の厚みは40.6μm、その標準偏
差値は5.5μmであった。この銅箔の表面は色むらが認
められた。
The average weight was 14.53 g, and the standard deviation value was 1.54 g. The average thickness is 40.1μ
m, and its standard deviation value was 4.3 μm. For comparison,
A copper foil was continuously manufactured in the same manner as in Example 2 without providing a botch on the anode electrode. The average weight of the cut pieces as in the example was 14.48 g, and the standard deviation value thereof was 1.95.
It was g. The average thickness was 40.6 μm, and the standard deviation value was 5.5 μm. Color unevenness was observed on the surface of this copper foil.

【0023】実施例4 実施例3のアノード電極に代えて、幅5mm,高さ8mm,
長さ8mmの突起片7を、図6で示したように、周方向に
30mmの間隔で千鳥状に20mmの間隔で配列固定したア
ノード電極を用いたことを除いては、実施例3と同様に
して銅箔を連続製造した。
Example 4 Instead of the anode electrode of Example 3, width 5 mm, height 8 mm,
As in Example 3, except that the projection electrodes 7 having a length of 8 mm were arranged and fixed in a zigzag manner at intervals of 30 mm in the circumferential direction at intervals of 20 mm as shown in FIG. The copper foil was continuously manufactured.

【0024】得られた銅箔を実施例2と同様にして裁断
片とした。その平均重量は14.45g,標準偏差値は1.
48gであった。また平均の厚みは40.5μm,標準偏
差値は4.1μmであった。
The resulting copper foil was cut into pieces in the same manner as in Example 2. The average weight is 14.45g, and the standard deviation is 1.
It was 48 g. The average thickness was 40.5 μm and the standard deviation was 4.1 μm.

【0025】[0025]

【発明の効果】以上の説明で明らかなように、本発明の
アノード電極は、その表面に形成されている突起部また
は凹没孔が電解液に対する撹拌子として機能することが
できるので、被処理体のカソード電極とのクリアランス
が狭くても、そこに位置する電解液を均一に撹拌するこ
とができ、対極への表面処理を均一に行うことができ
る。
As is clear from the above description, the anode electrode of the present invention has the projections or recesses formed on its surface that can function as a stirrer for the electrolytic solution. Even if the clearance between the body and the cathode electrode is narrow, the electrolytic solution located there can be uniformly stirred, and the surface treatment of the counter electrode can be performed uniformly.

【0026】したがって、本発明のアノード電極は、大
面積のカソード電極を処理するときに用いて非常に有効
である。
Therefore, the anode electrode of the present invention is very effective when used for treating a large-area cathode electrode.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のアノード電極の製造に用いるチップ例
を示す斜視図である。
FIG. 1 is a perspective view showing an example of a chip used for manufacturing an anode electrode of the present invention.

【図2】本発明のアノード電極例を示す斜視図である。FIG. 2 is a perspective view showing an example of an anode electrode of the present invention.

【図3】本発明の他のアノード電極例を示す斜視図であ
る。
FIG. 3 is a perspective view showing another example of the anode electrode of the present invention.

【図4】本発明のアノード電極を用いた銅箔連続製造装
置例を示す概略図である。
FIG. 4 is a schematic view showing an example of a copper foil continuous production apparatus using the anode electrode of the present invention.

【図5】図4の銅箔連続製造装置例に用いるアノード電
極例を示す一部切欠斜視図である。
5 is a partially cutaway perspective view showing an example of an anode electrode used in the example of the continuous copper foil manufacturing apparatus of FIG.

【図6】図4の銅箔連続製造装置例に用いる他のアノー
ド電極例を示す一部切欠斜視図である。
6 is a partially cutaway perspective view showing another example of the anode electrode used in the example of the continuous copper foil manufacturing apparatus of FIG.

【符号の説明】[Explanation of symbols]

1 チップ 1a ねじ 2 鉛板 3 貫通孔 4 円筒体形状のアノード電極 5 板状突起 6 ドラム 7 突起片 1 chip 1a screw 2 lead plate 3 through hole 4 cylindrical anode electrode 5 plate-like protrusion 6 drum 7 protrusion piece

───────────────────────────────────────────────────── フロントページの続き (72)発明者 加藤 人士 東京都千代田区神田錦町1丁目8番地9 古河サーキットフォイル株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hitoshi Kato 1-8-8 Kandanishikicho, Chiyoda-ku, Tokyo Furukawa Circuit Foil Co., Ltd.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 カソード電極との対向面に、電気絶縁性
突起部または/および凹没孔が形成されていることを特
徴とするアノード電極。
1. An anode electrode, characterized in that an electrically insulating protrusion or / and a recessed hole are formed on the surface facing the cathode electrode.
【請求項2】 前記突起部または/および凹没孔を千鳥
状に配置した請求項1のアノード電極。
2. The anode electrode according to claim 1, wherein the protrusions and / or the recessed holes are arranged in a staggered pattern.
【請求項3】 前記突起部が板状突起として堰状に配置
されている請求項1のアノード電極。
3. The anode electrode according to claim 1, wherein the protrusions are arranged in a weir shape as plate-like protrusions.
JP22017092A 1992-08-19 1992-08-19 Anode Pending JPH0665794A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22017092A JPH0665794A (en) 1992-08-19 1992-08-19 Anode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22017092A JPH0665794A (en) 1992-08-19 1992-08-19 Anode

Publications (1)

Publication Number Publication Date
JPH0665794A true JPH0665794A (en) 1994-03-08

Family

ID=16746988

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22017092A Pending JPH0665794A (en) 1992-08-19 1992-08-19 Anode

Country Status (1)

Country Link
JP (1) JPH0665794A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100513774B1 (en) * 2000-12-16 2005-09-09 주식회사 포스코 Anode device for preventing strip from anode stick
KR101287439B1 (en) * 2012-10-15 2013-07-19 (주) 거양 Zinc plate for anode electrode of plating equipment having sulfuric acid

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100513774B1 (en) * 2000-12-16 2005-09-09 주식회사 포스코 Anode device for preventing strip from anode stick
KR101287439B1 (en) * 2012-10-15 2013-07-19 (주) 거양 Zinc plate for anode electrode of plating equipment having sulfuric acid

Similar Documents

Publication Publication Date Title
US4647345A (en) Metallurgical structure control of electrodeposits using ultrasonic agitation
US3461046A (en) Method and apparatus for producing copper foil by electrodeposition
US4318794A (en) Anode for production of electrodeposited foil
CN108588803B (en) Electro-deposition device
US5281325A (en) Uniform electroplating of printed circuit boards
US3567595A (en) Electrolytic plating method
KR100253607B1 (en) Insoluble electrode structural material
US6979391B1 (en) Method and device for the electrolytic treatment of electrically conducting structures which are insulated from each other and positioned on the surface of electrically insulating film materials and use of the method
US3970537A (en) Electrolytic treating apparatus
US3374159A (en) Marking of steel strip electrolytically using electrolyte adhering to the strip
JPH0665794A (en) Anode
JPH0665779A (en) Method for electrodepositing metal
US2424173A (en) Electrolytic production of alloy coatings
JPS62133097A (en) Apparatus for plating semiconductor wafer
JPH03134200A (en) Method and device for roughening treatment of metal surface by electrolytic process
US5348637A (en) Surface treatment apparatus for workpieces
CN110528054B (en) Device and method for electrodepositing nickel on PCB without stopping groove
KR20150141270A (en) Ultrasonic electroplating system
JP3468545B2 (en) Electrode for electrolysis
US6361673B1 (en) Electroforming cell
US1411657A (en) Circulation for electrodeposit systems
WO1995020064A1 (en) Uniform electroplating of printed circuit boards
KR200430588Y1 (en) Shielding panel for Uniform plating
KR200358909Y1 (en) Electroplating apparatus obtain two-sided uniform plated layer
KR100727270B1 (en) Plating electrode structure for manufacturing printed circuit board and electroplating device thereof