JPH0653199A - Surface cleaning method using dry ice stick - Google Patents

Surface cleaning method using dry ice stick

Info

Publication number
JPH0653199A
JPH0653199A JP27430192A JP27430192A JPH0653199A JP H0653199 A JPH0653199 A JP H0653199A JP 27430192 A JP27430192 A JP 27430192A JP 27430192 A JP27430192 A JP 27430192A JP H0653199 A JPH0653199 A JP H0653199A
Authority
JP
Japan
Prior art keywords
dry ice
cleaning
coating
cleaned
stick
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27430192A
Other languages
Japanese (ja)
Inventor
Fumiyoshi Murakami
文祥 村上
Hiroyuki Tsuruoka
洋幸 鶴岡
Hisha Kudo
飛車 工藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Teisan KK
Original Assignee
Ebara Corp
Teisan KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp, Teisan KK filed Critical Ebara Corp
Priority to JP27430192A priority Critical patent/JPH0653199A/en
Publication of JPH0653199A publication Critical patent/JPH0653199A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To effectively remove a pollutant stuck to the surface of an article by contact moving a dry ice stick along the surface to be cleaned in a state where the dry ice stick is made to contact with the surface of a cleaned part of an article to be cleaned. CONSTITUTION:A columnar dry ice stick 3 is tightly held by a retainer 2 of a head, for instance, of a device of a jig for electrostatic coating. Then, the head 1 is set up, for instance, on a rotary polisher. In case of removing the stuck coating, the under face, that is the sliding surface 4 of the dry stick 3 is pressure welded with the coating surface of the part to be removed so as to turn and move it. Then, the coating gets a low temperature for being fragile, broken so as to be peeled off and removed by a rapid gas flow due to sublimation of dry ice.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電子部品製造分野にお
けるシリコン基板の洗浄、磁気ディスク基板の洗浄、光
学部品製造分野におけるレンズやその他の部品の洗浄、
自動車、家電、建材などの製造分野における電着塗装用
治具の導電部洗浄など、品物の表面に付着している汚染
物を除去するドライアイススティックを使った表面洗浄
方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to cleaning of silicon substrates, cleaning of magnetic disk substrates in the field of electronic component manufacturing, cleaning of lenses and other parts in the field of optical component manufacturing,
The present invention relates to a surface cleaning method using a dry ice stick for removing contaminants adhering to the surface of an article, such as cleaning the conductive part of an electrodeposition coating jig in the field of manufacturing automobiles, home appliances, building materials and the like.

【0002】[0002]

【従来の技術】電子部品製造分野、光学部品製造分野等
精密洗浄を行う分野では、湿式洗浄としてブラシを回転
させ、これに純水または洗剤溶液をかけながら場合によ
りシリカゲルなどの研磨材を含むこともあるが、被洗浄
面に押し当てるブラシスクラビング、20〜200kg
/cm2 に加圧した純水・洗剤液・フロンなどをノズル
から噴射して洗浄する高圧液噴射洗浄、超音波を液中に
照射して得られる直進流・キャビテーション・媒体の振
動加速度を利用する超音波洗浄、被洗浄物を洗浄処理液
に浸漬して汚染物の溶解・酸化分解・あるいは表面層溶
解など洗浄液の化学作用を利用する化学洗浄などが行わ
れている。
2. Description of the Related Art In the field of precision cleaning such as in the field of electronic parts manufacturing and optical parts manufacturing, it is necessary to rotate a brush as a wet cleaning and sprinkle pure water or a detergent solution on it, and optionally include an abrasive such as silica gel. There is also scrubbing that presses against the surface to be cleaned, 20-200 kg
High-pressure liquid jet cleaning that sprays pure water, detergent liquid, CFCs pressurized to / cm 2 from the nozzle, and uses straight flow, cavitation, and vibration acceleration of medium obtained by irradiating ultrasonic waves into the liquid Ultrasonic cleaning, immersion of the object to be cleaned in a cleaning treatment liquid, and chemical cleaning utilizing the chemical action of the cleaning liquid such as dissolution / oxidative decomposition of contaminants or surface layer dissolution are performed.

【0003】また、乾式洗浄として高速の噴射ガスある
いはそれにドライアイス粒子を混入させたもので付着粒
子を飛散させるガス噴射洗浄、高出力レーザー光を洗浄
面表面に照射し、表面を高温にして汚染物を気化させる
レーザー洗浄、高周波放電で発生させた活性化学種のラ
ジカルを汚染物に反応させ、揮発性物質に変えて除去す
るプラズマ洗浄、O2 または03 を含む雰囲気下で紫外
線を照射し、有機汚染物を光励起と発生したO3 や酸素
ラジカルの作用で分解除去する紫外線オゾン洗浄などが
行われている。
Further, as a dry cleaning method, a high-speed jet gas or a mixed gas of dry ice particles is used to scatter adhering particles. Laser cleaning to vaporize substances, plasma cleaning to react radicals of active chemical species generated by high-frequency discharge with contaminants and convert them into volatile substances, and UV irradiation under an atmosphere containing O 2 or 0 3. Ultraviolet ozone cleaning, which decomposes and removes organic pollutants by photoexcitation and the action of generated O 3 and oxygen radicals, is performed.

【0004】他方、電着塗装では、導電性の材料で作っ
たハンガーなどの塗装用治具の導電部に付着した塗膜を
除去するため、ヤスリなどを用いて人手で磨く機械的洗
浄、塗装用治具を苛性ソーダなどの強アルカリ液で洗浄
する化学的洗浄が行われている。
On the other hand, in electro-deposition coating, in order to remove the coating film adhering to the conductive portion of a coating jig such as a hanger made of a conductive material, a mechanical cleaning and coating in which polishing is performed manually with a file or the like is performed. Chemical cleaning is performed by cleaning the jigs with a strong alkaline solution such as caustic soda.

【0005】[0005]

【発明が解決しようとする課題】電子部品製造分野、光
学部品製造分野などで行っている精密洗浄では、従来の
洗浄方法での設備価格が高価であり、また洗浄に使用す
る溶液やガスの回収処理が難しいなどの問題がある。ま
た半導体プロセスの中で、湿式の洗浄を行うことは、プ
ロセス内雰囲気の悪化、バクテリヤの発生などの問題が
あり、乾燥工程も必要となる。塗装用治具の洗浄では治
具の通電部に付着した塗膜を除去するのに、ヤスリなど
を用いて、被塗物の数だけ治具のフックを1本1本研磨
しなければならず、人件費が莫大となり、大量生産に向
かないという欠点がある。また苛性ソーダなどの強アル
カリで洗浄する方法においては、カチオンタイプの電着
塗装では治具上に残っている僅かのアルカリ分が電着塗
装に著しい悪影響を与えるので、溶材に有機アルカリま
たは有機酸を含有させて塗装用治具にアルカリ分が残っ
ていても、電着塗装に悪影響がでないようにしている。
In precision cleaning performed in the fields of electronic component manufacturing, optical component manufacturing, etc., the equipment cost in the conventional cleaning method is expensive, and the solution and gas used for cleaning are recovered. There are problems such as difficulty in processing. Further, wet cleaning in the semiconductor process has problems such as deterioration of the atmosphere in the process and generation of bacteria, and a drying process is also required. In cleaning the coating jig, in order to remove the coating film that has adhered to the current-carrying part of the jig, you have to grind the hooks of the jig one by one using a file etc. It has the disadvantage that the cost becomes huge and it is not suitable for mass production. Further, in the method of cleaning with a strong alkali such as caustic soda, in the cationic type electrodeposition coating, a small amount of the alkali content remaining on the jig has a significant adverse effect on the electrodeposition coating. Even if an alkaline component remains in the coating jig by containing it, the electrodeposition coating is not adversely affected.

【0006】しかし、溶剤に有機アルカリや有機酸を含
有させると、槽および治具を耐酸性のステンレス製にし
なければならないので、塗装設備の価格が高価となる。
また塗膜を剥離させるための所要時間が長く、しかも塗
膜が細分化しないので水洗時の残存塗膜落としが容易で
ないなどの欠点がある。
However, if the solvent contains an organic alkali or an organic acid, the tank and the jig must be made of acid-resistant stainless steel, which increases the cost of the coating equipment.
Further, it takes a long time to remove the coating film, and since the coating film is not subdivided, it is not easy to remove the residual coating film during washing with water.

【0007】本発明は、品物の表面に付着している汚染
物を効果的に除去するドライアイススティックを使った
乾式の表面洗浄方法を提供することを目的としている。
It is an object of the present invention to provide a dry surface cleaning method using a dry ice stick which effectively removes contaminants adhering to the surface of an article.

【0008】[0008]

【課題を解決するための手段】本発明による方法は、シ
リコン基板、磁気ディスク基板、光学部品、電着塗装用
治具その他の機器、部品など洗浄しようとする品物の洗
浄箇所の表面ドライアイススティックを接触させた状態
で、このドライアイススティックを前進・後進・往復動
・回転など洗浄面に対し接触移動させて表面を洗浄する
ことを特徴としている。
The method according to the present invention is applied to a surface dry ice stick for cleaning a product such as a silicon substrate, a magnetic disk substrate, an optical component, a jig for electrodeposition coating and other devices and components to be cleaned. The feature is that the dry ice stick is moved in contact with the cleaning surface such as forward, backward, reciprocating, and rotating in a state of being in contact with to clean the surface.

【0009】ドライアイスのスティックはニードル状か
ら大砲の筒のように大きいものまで、その形状寸法を被
洗浄物に合せて自由に製造できるが、十分高い圧力でプ
レスすることにより非常に固いやや透明になったものを
得ることができる。そして常温の大気中に取出しても、
その硬度を保ち、急激に昇華することがないので、上記
のように表面洗浄に使用しうるのである。
Dry ice sticks, from needle-shaped to large ones like cannons, can be manufactured in various shapes and sizes according to the object to be cleaned, but they are very hard and slightly transparent when pressed with sufficiently high pressure. You can get what you became. And even if it is taken out into the atmosphere at room temperature,
Since it maintains its hardness and does not rapidly sublime, it can be used for surface cleaning as described above.

【0010】本発明による洗浄をより効果的にするため
に、他の方法と併用することもよい。例えば、油性の汚
染物を除去したいときには、あらかじめ界面活性剤の溶
液を汚染表面にハケ塗りしておいてから行えば洗浄効果
が向上する。
In order to make the cleaning according to the present invention more effective, it may be used in combination with other methods. For example, when it is desired to remove oily contaminants, the effect of cleaning can be improved by applying a solution of a surfactant on the contaminated surface in advance by brushing.

【0011】また、付着した異物が固くて除去に時間を
要するときは、被洗浄表面にキズがつかないような程度
の硬度および粒度の研磨材(例えばSiCやAl
2 3 )を適当量ドライアイスに混合してプレス成形す
ることにより、特に固く付着した異物の除去機能が向上
する。いろいろな硬度、粒度の研磨材を混合したドライ
アイススティックをあらかじめ製造しておくことによ
り、被洗浄物の状態や要求される洗浄程度、表面粗さな
どに応じて臨機に使い分けることも可能である。
When the adhered foreign matter is hard and requires a long time to be removed, an abrasive material (for example, SiC or Al) having a hardness and a particle size such that the surface to be cleaned is not scratched.
By mixing an appropriate amount of 2 O 3 ) with dry ice and press-molding it, the function of removing foreign matter that adheres particularly hard is improved. It is also possible to use dry ice sticks mixed with abrasives of various hardness and particle size in advance according to the condition of the object to be cleaned, the required degree of cleaning, surface roughness, etc. .

【0012】また、広い面積を洗浄するときには、先ず
汚染の程度のひどい部分のみを本発明で大まか洗浄し、
そのあとで、ドライアイス粒子(ペレット)を高速の噴
射ガスで吹きつける公知の方法を広く一様に適用するこ
により、より能率的に洗浄することができる。
Further, when cleaning a large area, first, the present invention roughly cleans only a portion where the degree of contamination is severe,
After that, a well-known method of spraying dry ice particles (pellets) with a high-speed injection gas is applied widely and uniformly, whereby the cleaning can be performed more efficiently.

【0013】また、ある種の焼付塗料のように、非常に
除去しにくい付着物に対しては、本発明を適用する前に
塗膜ハクリ剤(例えば塩化メチレン)を塗布しておくこ
とも効果がある。
It is also effective to apply a coating film peeling agent (for example, methylene chloride) to the deposits that are very difficult to remove, such as a certain type of baking paint, before applying the present invention. There is.

【0014】有機系の汚染物についてはレーザー洗浄、
プラズマ洗浄あるいは紫外線オゾン洗浄との組合せも有
効である。
Laser cleaning of organic contaminants,
Combination with plasma cleaning or ultraviolet ozone cleaning is also effective.

【0015】以上のように、本発明は上述の如き公知の
洗浄方法の一つまたは複数のものと組合せることによ
り、多種多様な被洗浄物に対応できるが、汚染の程度の
比較的軽いものは、通常本発明のみで、十分に満足しう
る結果が得られるものである。ドライアイスの原料であ
る液化炭酸ガスはその純度は通常99.5%以上であ
る。
As described above, the present invention can be applied to a wide variety of objects to be cleaned by combining it with one or more of the known cleaning methods as described above, but the degree of contamination is comparatively light. In general, the present invention alone gives sufficiently satisfactory results. Liquefied carbon dioxide gas, which is a raw material of dry ice, usually has a purity of 99.5% or more.

【0016】従って、本発明のみによって、洗浄する場
合は、ドライアイスからくる新たな汚染の心配はなく、
洗浄器は完全にドライの状態であり、乾燥工程を必要と
しない。このことは、半導体工業などクリーンな環境下
での連続的なプロセス中に組入れる場合にとくに好都合
である。
Therefore, according to the present invention alone, when cleaning, there is no fear of new contamination from dry ice,
The washer is completely dry and does not require a drying step. This is particularly advantageous when incorporated in a continuous process in a clean environment such as the semiconductor industry.

【0017】[0017]

【作用】本発明の方法によれば、洗浄面にドライアイス
を圧接、移動させることによって、ドライアイスが昇華
で急激にガス化するが、このガス化する際の膨張圧力や
ドライアイスを押しつけている力によって表面の汚染異
物が除去洗浄される。また、付着塗膜にドライアイス
(約−80℃)を圧接移動することにより、塗膜の温度
が急速に低下して治具の金属表面と温度差が生じる。そ
のために、塗膜が治具の金属表面から剥離し易くなる。
また、温度低下により塗膜が脆化するので、ドライアイ
スの圧接移動により塗膜が容易に破れる。例えば、付着
物が塗膜のように高分子化合物である場合、その脆化温
度は(またはガラス軽移点)は−80℃以上であること
が多く、冷却により脆くなる。また、被洗浄物が金属た
とえば鉄で付着物が熱硬化性ポリマーの場合、それらの
線膨張係数は夫々12×10-6/℃および20〜70×
10-6/℃程度であり、ポリマーの方が冷却による収縮
が大きく、このことも脆化を促進すると考えられる。
According to the method of the present invention, dry ice is rapidly gasified by sublimation by bringing dry ice into contact with and moving it against the surface to be cleaned. The contaminants on the surface are removed and cleaned by the force. Further, when dry ice (about -80 ° C) is pressed and moved to the adhered coating film, the temperature of the coating film is rapidly lowered to cause a temperature difference with the metal surface of the jig. Therefore, the coating film is easily peeled off from the metal surface of the jig.
Further, since the coating film becomes brittle due to the temperature decrease, the coating film is easily broken by the pressure contact movement of dry ice. For example, when the adhered substance is a polymer compound such as a coating film, the embrittlement temperature (or glass light transition point) is often −80 ° C. or higher and becomes brittle when cooled. When the object to be cleaned is a metal such as iron and the adherent is a thermosetting polymer, their linear expansion coefficients are 12 × 10 −6 / ° C. and 20 to 70 ×, respectively.
It is about 10 −6 / ° C., and the polymer has a larger shrinkage due to cooling, which is also considered to promote embrittlement.

【0018】熱可塑性ポリマーの線膨張係数は一般に5
0〜100×10-6/℃であり、更に大きな効果が期待
される。そして、一端、塗膜が破れると、その後はドラ
イアイスの昇華による急激なガス流で塗膜の剥離が促進
され、塗膜全体が短時間で効率良く除去される。
The coefficient of linear expansion of thermoplastic polymers is generally 5
It is 0 to 100 × 10 −6 / ° C., and a larger effect is expected. Then, once the coating film is torn, the rapid peeling of the coating film is accelerated by the sublimation of dry ice, and the entire coating film is efficiently removed in a short time.

【0019】ドライアイスは、硬度が砂よりも柔らか
く、しかも洗浄面との接触面で急激にガス化するので洗
浄面をいためることのないのが特徴である。しかも、ド
ライアイスの形状・寸法を被洗浄物の形状に最も適した
ように製造できる。
The characteristic feature of dry ice is that it has a hardness that is softer than that of sand and that it gasifies rapidly at the contact surface with the cleaning surface, so that the cleaning surface is not damaged. In addition, the shape and size of dry ice can be manufactured to be most suitable for the shape of the object to be cleaned.

【0020】ドライアイスは、時間の経過と共に昇華
し、ガスとして大気中に拡散してしまうので、排水処理
が不要であり、取扱いが簡便である。
Since dry ice sublimes over time and diffuses into the atmosphere as a gas, it is not necessary to treat waste water and is easy to handle.

【0021】[0021]

【実施例1】以下図面を参照して本発明の実施例を説明
する。
Embodiment 1 An embodiment of the present invention will be described below with reference to the drawings.

【0022】図1および図2には、本発明を実施する例
えば静電塗装用治具の装置のヘッド1が示されている。
このヘッド1の筒状で断熱材で形成された保持器2に
は、円柱状のドライアイススティック3がタイトに保持
されている。そして、ヘッド1は図示しない例えば回転
研磨機にセットされている。
FIG. 1 and FIG. 2 show a head 1 of, for example, an electrostatic coating jig apparatus for carrying out the present invention.
A cylindrical dry ice stick 3 is tightly held by a cage 2 of the head 1 formed of a heat insulating material. The head 1 is set on, for example, a rotary polishing machine (not shown).

【0023】次に、付着塗膜を除去する態様を説明す
る。
Next, a mode for removing the adhered coating film will be described.

【0024】除去に際し、除去すべき箇所の塗膜表面に
ドライアイススティック3の下面すなわち摺動面4を圧
接して回転させると共に移動させる。すると、塗膜はド
ライアイスに接触しているので、低温となって脆化す
る。更に、圧接しているドライアイススティック3が回
転移動するので、塗膜が破れ、ドライアイスの昇華によ
る急激なガス流によって塗膜が効果的に剥離、除去され
る。このように塗膜との接触面でドライアイスを回転、
あるいは前後に摺動させて、塗膜を除去する方法は処理
に要する時間が短く(回転数や圧接力などにより長短は
あるが、通常数10秒で完了)、しかも塗膜を除去した
後の金属面がきれいなので、さらなる洗浄の必要が無
く、塗装ラインの中に組み入れ、自動化することができ
る。
When removing, the lower surface of the dry ice stick 3, that is, the sliding surface 4 is pressed against the surface of the coating film to be removed, and is rotated and moved. Then, since the coating film is in contact with dry ice, it becomes brittle at a low temperature. Further, since the dry ice stick 3 in pressure contact is rotated and moved, the coating film is broken, and the coating film is effectively peeled and removed by a rapid gas flow due to sublimation of dry ice. In this way, dry ice is rotated on the contact surface with the coating film,
Alternatively, the method of sliding the coating back and forth to remove the coating film requires a short time for the treatment (it usually takes several tens of seconds depending on the number of rotations and the pressure contact force, etc.), and after removing the coating film, Since the metal surface is clean, it can be incorporated into the painting line and automated without the need for further cleaning.

【0025】図3及び図4には、本発明を実施するヘッ
ドの別の実施例が示され、そのヘッド1aの保持器2に
は、摺動面4aに十字状の凹溝5が形成されたドライア
イススティック3aが保持されている。
3 and 4 show another embodiment of the head for carrying out the present invention, in which the cage 2 of the head 1a has a cross-shaped groove 5 formed on the sliding surface 4a. The dry ice stick 3a is held.

【0026】図5及び図6には、本発明を実施するヘッ
ドの別の実施例が示され、そのヘッド1bの保持器2に
は、摺動面4bに複数(図示の例では3個)の平行な凹
溝6が形成されたドライアイススティック3bが保持さ
れている。
FIGS. 5 and 6 show another embodiment of the head for carrying out the present invention. The holder 2 of the head 1b has a plurality of sliding surfaces 4b (three in the illustrated example). The dry ice stick 3b having the parallel concave grooves 6 is held.

【0027】図7及び図8には、本発明を実施するヘッ
ドの別の実施例が示され、そのヘッド1cの保持器2に
は、摺動面4cに複数(図示の例では3個)の環状凹溝
7が形成されたドライアイススティック3cが保持され
ている。
7 and 8 show another embodiment of the head for carrying out the present invention, in which the holder 2 of the head 1c has a plurality of sliding surfaces 4c (three in the illustrated example). The dry ice stick 3c having the annular groove 7 is held.

【0028】図には示さなかったが、以上のような溝付
のヘッドのほかに最も単純な溝のない円柱状のヘッドで
も場合によっては実施することができる。
Although not shown in the drawing, in addition to the above-described grooved head, the simplest cylindrical head without a groove can be used in some cases.

【0029】これらのドライアイススティック3a〜3
cの摺動面4a〜4cは、静電塗装用治具の大きさ、塗
膜を除去する箇所の形状などに応じて選択する。
These dry ice sticks 3a-3
The sliding surfaces 4a to 4c of c are selected according to the size of the electrostatic coating jig, the shape of the portion where the coating film is to be removed, and the like.

【0030】[0030]

【実施例2】実施例1と全く同じような回転研磨材およ
び円柱状のドライアイス、スティックを全面的あるいは
部分的に樹脂や薬液が付着することにより、汚染された
半導体用の金属シリコンなどのウエハーにも同様に適用
し、ほぼ同様な結果をうることができる。
[Embodiment 2] Exactly the same rotary abrasive and cylindrical dry ice as those in Embodiment 1 are used. It can be applied to a wafer in the same manner and almost the same result can be obtained.

【0031】[0031]

【発明の効果】以上説明したように本発明によれば、品
物に付着した塗膜、油などの異物や汚染物を効果的に除
去することができる。
As described above, according to the present invention, it is possible to effectively remove a coating film, foreign matter such as oil, and contaminants attached to an article.

【0032】また、塗膜を除去した面は綺麗で乾燥状態
にあり、乾燥しないでそのまま使用することができる。
The surface from which the coating film has been removed is clean and in a dry state, and can be used as it is without being dried.

【0033】また、洗浄薬液を使用していないので、か
つ、ドイラアイススティックは昇華して炭酸ガスとなっ
て大気中に放散するので、洗浄設備も耐蝕性の必要がな
く、設備費が安価である。
Further, since no cleaning chemical is used, and since the doira ice stick sublimes to carbon dioxide gas and is diffused into the atmosphere, the cleaning equipment does not need corrosion resistance and the equipment cost is low. Is.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明を実施する装置のヘッドを示す側断面
図。
FIG. 1 is a side sectional view showing a head of an apparatus for carrying out the present invention.

【図2】図1の下面図。FIG. 2 is a bottom view of FIG.

【図3】ヘッドの別の実施例を示す側断面図。FIG. 3 is a side sectional view showing another embodiment of the head.

【図4】図3の下面図。FIG. 4 is a bottom view of FIG.

【図5】ヘツドの別の実施例を示す側断面図。FIG. 5 is a side sectional view showing another embodiment of the head.

【図6】図5の下面図。6 is a bottom view of FIG.

【図7】ヘッドの別の実施例を示す側断面図。FIG. 7 is a side sectional view showing another embodiment of the head.

【図8】図7の下面図。FIG. 8 is a bottom view of FIG.

【符号の説明】[Explanation of symbols]

1、1a〜1c・・・ヘッド 2・・・保持器 3、3a〜3c・・・ドライアイススティック 4、4a〜4c・・・摺動面 5・・・十字状の凹溝 6・・・平行な凹溝 7・・・環状凹溝 1, 1a to 1c ... Head 2 ... Retainer 3, 3a to 3c ... Dry ice stick 4, 4a to 4c ... Sliding surface 5 ... Cross-shaped concave groove 6 ... Parallel groove 7 ... Annular groove

───────────────────────────────────────────────────── フロントページの続き (72)発明者 鶴岡 洋幸 東京都江東区東雲一丁目9番1号 テイサ ン株式会社内 (72)発明者 工藤 飛車 千葉県我孫子市天王台三丁目7−1−104 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroyuki Tsuruoka 1-9-1 Shinonome, Koto-ku, Tokyo Inside Teisan Co., Ltd. (72) Inventor Kyudo Hakaku 3-7-1-10 Tennodai, Abiko, Chiba Prefecture

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 シリコン基板、磁気ディスク基板、光学
部品、電着塗装用治具その他の機器、部品など洗浄しよ
うとする品物の洗浄箇所の表面にドライアイススティッ
クを接触させた状態で、このドライアイススティックを
前進・後進・往復動・回転など洗浄面に対し接触移動さ
せて表面を洗浄することを特徴とするドライアイスステ
ィックを使った表面洗浄方法。
1. A dry ice stick is brought into contact with the surface of a cleaning portion of an article to be cleaned such as a silicon substrate, a magnetic disk substrate, an optical component, a jig for electrodeposition coating and other devices, components, and the dry ice stick. A surface cleaning method using a dry ice stick, characterized in that the surface is cleaned by moving the ice stick forward, backward, reciprocating, rotating, etc. to the cleaning surface.
JP27430192A 1992-06-03 1992-10-13 Surface cleaning method using dry ice stick Pending JPH0653199A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27430192A JPH0653199A (en) 1992-06-03 1992-10-13 Surface cleaning method using dry ice stick

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP14282492 1992-06-03
JP4-142824 1992-06-03
JP27430192A JPH0653199A (en) 1992-06-03 1992-10-13 Surface cleaning method using dry ice stick

Publications (1)

Publication Number Publication Date
JPH0653199A true JPH0653199A (en) 1994-02-25

Family

ID=26474711

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27430192A Pending JPH0653199A (en) 1992-06-03 1992-10-13 Surface cleaning method using dry ice stick

Country Status (1)

Country Link
JP (1) JPH0653199A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6558473B2 (en) * 2000-12-05 2003-05-06 Canon Kabushiki Kaisha Dry ice cleaning method, dry ice cleaning apparatus, and part or unit cleaned by dry ice
JP2006058777A (en) * 2004-08-23 2006-03-02 Hoya Corp Method for manufacturing mask blank substrate, method for manufacturing mask blank, and method for manufacturing exposure mask
JP2011171487A (en) * 2010-02-18 2011-09-01 Tokyo Electron Ltd Substrate rear surface flattening method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6558473B2 (en) * 2000-12-05 2003-05-06 Canon Kabushiki Kaisha Dry ice cleaning method, dry ice cleaning apparatus, and part or unit cleaned by dry ice
JP2006058777A (en) * 2004-08-23 2006-03-02 Hoya Corp Method for manufacturing mask blank substrate, method for manufacturing mask blank, and method for manufacturing exposure mask
JP4508779B2 (en) * 2004-08-23 2010-07-21 Hoya株式会社 Mask blank substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing method
JP2011171487A (en) * 2010-02-18 2011-09-01 Tokyo Electron Ltd Substrate rear surface flattening method

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