JPH06505207A - Pre-baking printing lithographic composition - Google Patents

Abstract

(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

[Detailed description of the invention] The present invention involves dissolving an effective amount of a strong organic acid salt and a weak organic acid salt in water before baking. The present invention relates to a printing lithographic composition. The composition of the present invention can be used after development and A lithographic plate that has been exposed to chemically active light when applied to the lithographic surface prior to kinging. Protects the lithographic surface of the print, thereby preventing contamination of the lithographic surface caused by heat treatment It is useful for The composition of the present invention is superior to the prior art compositions currently in use. It is particularly significant in providing a wide range of applications.

Background technology of the invention Radiation-sensitive lithographic plates suitable for lithographic printing are well known. Such a flat plate is Aluminum, which can be patterned and/or anodized or zinc, magnesium, copper, steel or combinations (e.g. bimetallic or a substrate such as a laminate) and a radiation-sensitive material deposited on the surface of the substrate. Consists of layers.

A radiation-sensitive lithographic plate is chemically processed through a transparency to form an image. Exposure to useful radiation increases the solubility of the radiation-exposed areas compared to the unexposed areas. changes the solubility of the region. When the exposed lithographic plate is processed with a suitable developer, it becomes more The soluble regions are easily removed to reveal the underlying substrate, and the less soluble regions are composed of An image can be left on the resulting substrate. The area of the substrate that appears after development is Configure a non-print area.

A radiation-sensitive type of material known as a photopolymer dissolves after exposure to radiation. The transparency is lower and hence the exposure results in a negative transp. arency) is used. In this case, the radiation-unexposed areas and the substrate are removed after development. The radiation-exposed area remaining above forms the image area. Examples of suitable photopolymers include dia chromium-sensitive colloids, diazonium- or azide-sensitive resins, or or polymers containing such resins. Concentrations based on such substances Lithographic plates with a radiation-sensitive layer are known as negative-working lithographic plates.

Radiation-sensitive substances, such as those based on orthoquinone diazides, cannot be exposed to radiation. After exposure, it becomes more soluble and therefore transparent on exposure. e.transparency). In this case, the radiance removed by development The radiation-exposed area and the radiation-unexposed area remaining on the substrate surface form the image area. . Lithographic plates with such radiation-sensitive layers are known as positive-working lithographic plates.

The lifespan of a printing plate depends, of course, on the number of copies it can produce. Baking of the lithographic plate is often used, provided that the area is made of suitable material. In other words, it increases due to burning-in of the image area. can be done. Burning manufactures lithographic printing plates from radiation-sensitive lithographic plates Burning is a well-established technical means for version). By burning, the polygon of the material that makes up the drawing area is Extensive cross-linking occurs within the mer structure. Burning temperature and time for aluminum Temperatures and times that would damage the annealing strength required for printing lithography. Limited to:

British Patent No. 669,412 discloses an image area based on naphthoquinone diazides. Burning is disclosed. According to this patent, the radiation with a layer of said diazide A radiation-sensitive lithographic plate is exposed to develop the image area and developed with an alkaline solution to remove the radiation. The exposed areas of the n-layer are selectively removed and then placed in an oven and exposed to radiation. The image area constituted by the unexposed area of the layer that was not exposed is heated. After that, lithography The lithographic plate was treated with an alkaline solution again to remove any remaining contaminants and used for printing. It is necessary to obtain a flat plate that can be used.

In many cases, reinforcing substances are mixed into the radiation-sensitive layer and/or the image after development is The marking area to be heated by applying a reinforcing lacquer-type reinforcing substance in the marking area - Areas can be reinforced. Examples of commonly used reinforcing materials include novolak Examples include resins and/or resol resins. However, British Patent No. 1.1 54.749, the resin-reinforced image area is cured. Heating at a temperature sufficient to cause at least a portion of the exposed substrate area after development This results in a partial coating with a layer of contaminants that absorbs the printing ink. therefore causing smearing and the background during the printing process. becomes contaminated.

This contaminant layer must therefore be removed before printing starts, which is done according to this patent. This is accomplished by treating the planographic plate with an alkaline aqueous solution.

U.S. Patent No. 4,294,910 to avoid problems arising from the burning process. , gumming solution or pre-bake (Above) discloses the use of various aqueous compositions known as solutions. It takes The solution is sodium dodecylphenoxybenzenedisulfonate, alkylated naphtha. Rensulfonic acid sodium salts, sulfonated alkyldiphenyl oxides, methi Including materials such as dinaphthalenedisulfonic acid and the like.

U.S. Pat. No. 4,786,581 to protect the lithographic plate during the burning process This aqueous solution contains hydrophilic polymer components and , and an organic acid component. The organic acid component (or its water-soluble salt) can be Contains larger acid functional groups such as benzenecarboxylic acids, sulfonic acids and phosphoric acids. phosphonic acids (including alkanephosphonic acids). The present invention in contrast to this U.S. patent There is no need to use hydrophilic polymers. U.S. Patent No. 4,885.230 of monomers such as styrene sulfonic acid, vinylphosphonic acid and its water-soluble salts. Discloses methods of using water-soluble homopolymers and copolymers. However, this feature The compositions disclosed in the patent do not include polymers containing strong acid functional groups and salts thereof. do not have.

The contaminant layer formed as a result of the burning process is generally not visible to the naked eye. It is difficult to reliably remove all contamination. Furthermore, anodizing In the case of porous substrate surfaces, such as in the case of processed aluminum lithographic plates, Contaminants are present in the pores as a result of the residual material that remains behind. Such dirt Dyeing can cause stains as the substrate surface is gradually worn away during the long printing process. There is even a tendency to After the burning process, the lithographic plate is reimaged to remove the contaminant layer. A variant requires that the lithographic plate must be returned to the lithographic processing equipment after it is removed from the oven. This increases costs and is inconvenient.

In view of the difficulties associated with the removal of contaminants formed by the burning process, It is desirable to prevent contamination that occurs at this stage. Also, contamination is clearly visible during heating. After sublimating from the line area, it is redeposited on the substrate area exposed by development. was found to be caused as a result of certain material components. Also However, even if the lithographic plate does not contain any substances that can cause contamination during heating, Contaminants previously deposited on the internal surfaces of the burning oven as a result of repeated use It can also be contaminated by material deposits. Therefore, the success of the burning process requires baking An effective pre-gluing composition is needed.

It is important to consider the requirements for an effective glue solution before baking. The melt The liquid components are used to clean or seal the porous aluminum oxide surface. It must act like a chain. In fact, the fine lines of the printing plate The area around the image structure must be precisely cleaned. On the other hand, before baking, The ingredients of the cleaning agent must not corrode the coating that makes up the image area. . Such components not only prevent penetration into the basal layer or the vicinity of the basal layer, but also , the formation of serious irregularities on the surface of the coating must also be avoided. baking Defects generated during the pre-printing process can cause damage to the coating under the stresses of press conditions. I can do that.

The aqueous compositions of the present invention provide excellent pre-baking protection and are suitable for a range of thicknesses. Allows for a thin coating layer. Superior properties of the composition of the invention compared to prior art compositions The quality is good during adhesion to the lithographic surface and during thermal decomposition (i.e. during the burning process). This results from the coating adhesion. Furthermore, the anionic surfactant component of the composition of the present invention It has temperature-decreasing properties and also increases significantly (i.e., 10-30 times) with temperature. It also has unique wetting activity.

Disclosure of invention The present invention describes the use of an aqueous composition applied to the surface of a planographic plate after development and before burning. include. This composition is a protective agent to prevent contamination that occurs during the burning process. This eliminates the need for lithographic reproduction. Unique features of the present invention The improvement is to expand the range of application, that is, to manually apply the glue solution before baking. The purpose is to allow variations in coating thickness, such as those that occur when applying

The aqueous composition of the present invention comprises (a) an ammonium salt, a sodium salt, a potassium salt of a strong organic acid; (b) salts of strong organic acids and salts of weak organic acids; Ammonium, sodium, potassium or lysate anionic surfactants thium salts, and (C) ammonium salts, sodium salts, potassium salts of organic weak acids or consisting of an effective amount of a lithium salt. In addition, these organic strong acid salts and anionic surfactants The cations in the sex agent and the weak organic acid salt are, but need not be, the same. The experiment included Preferably, the aqueous composition contains a combination of potassium and sodium salts.

It is preferable to use each of the strong organic acid salt and the weak organic acid salt in the potassium salt form. On the other hand, anionic surfactants are preferably used in the form of sodium salts. this The potassium:sodium molar ratio is (1:1) to (15:1), preferably (2 :1) to (8:i).

The potassium-sodium salt combination is preferred for several reasons. Firstly, the planographic base is When subjected to kinging treatment, the color changes significantly to brown. This discoloration is caused by It provides a direct indication as to whether the That's helpful. The combination of potassium and sodium salts can also be used for drying and thermal decomposition ( i.e., during the baking or barking process), the film retains its integrity. It turns out that Smooth, scar-free lithographic coat after baking and cleaning This results in a surface that is When the salt is only sodium salt, drying and During quenching, small cracks appear in the film, resulting in areas with linear wavy surface patterns. This indicates coating damage.

The organic strong acid is a straight chain or branched alkyl, alkaryl (alkaryl) of C, to C46. karyl), aralkyl, aryl or aryl ether group. n-decyl(sulfophenoxy)benzenesulfonic acid, oxybis(n -decylbenzenesulfonic acid), naphthyl alcohol having 1 to 4 carbon atoms in the alkyl group Linear or branched mono- or dialkyl derivatives of talenesulfonic acid, methylene dinaphthalenedisulfonic acid, dodecylbenzenesulfonic acid, alkyl group is carbon atom Sulfonated alkyldiphenyl oxide containing 1 to 4 children, dodecyl (sulfof) phenoxy)benzenesulfonic acid, oxybis(dodecylbenzenesulfonic acid), Hexadecyl(sulfophenoxy)benzenesulfonic acid, oxybis(hexade silbenzenesulfonic acid) and mixtures thereof. preferably The strong organic acids are n-decyl(sulfophenoxy)benzenesulfonic acid and oxybibenzenesulfonic acid. (n-decylbenzenesulfonic acid).

An example of a suitable anionic surfactant is N-(1,2-dicarboxyethyl)-N -Octadecyl sulfosuccinamide sodium salt, N-(1,2-dical boxyethyl)-N-dodecylsulfosuccinamide sodium salt, N-( 1゜2-dicarboxyethyl)-N-butylsulfosuccinamide salt, N-(1,2-dicarboxyethyl)-N-amyloxypropyl sulfonate Succinamide several sodium salts, N-(β-hydroxyethyl)-N-(sulfur) Ho-2,5-endomethylene hexahydrophthalylate aspartic acid form um salt, N-methyl-N-dicoil taurine sodium salt, and mixtures thereof Contain things.

A preferred anionic surfactant is N-(1,2-dicarboxyethyl)-N- Kutadecyl sulfosuccinamide is the sodium salt.

Typically the salt of a strong organic acid is present in an amount of 1 to 12% by weight, preferably 3 to 8% by weight; The salt of the ionic surfactant is present in an amount of 1 to 10% by weight, preferably 2 to 6% by weight. let

Weak organic acids include citric acid (preferably), isomalic acid, glycolic acid, and malic acid. acid, tartronic acid, malic acid, glyceric acid, tartaric acid, tricarballylic acid and and 1.2.3.4-butanetetracarboxylic acid.

Preferably the weak organic acid salt includes potassium citrate salt. Organic weak acid salts are generally It is used in an amount of 0.5 to 12% by weight, preferably 1 to 9% by weight.

The components in the aqueous composition of the present invention are those that do not volatilize at the burning temperature and that are The choice should be made depending on the quality of the material, the radiation-sensitive layer and the intended use of the lithographic plate.

For example, when producing a lithographic printing plate, the components selected must be physically effective blocking materials. In addition to having a (or failure to accept printing ink) do not have. Furthermore, after the burning process, it has a negative effect on the drawing area and non-printing area. It must be easily removed without any damage.

The above-mentioned examples of ingredients are used to remove the lithographic plate from lithographic printing due to contamination caused as a result of the burning process. Particularly useful for protecting The composition of the invention can be prepared by conventional methods such as spraying. It is easily applied to the developed planographic surface by methods such as dipping, brushing, etc. Provides a good protective shield. After burning, just wipe with water to seal. can be easily removed from the lithographic plate. This removal procedure set the lithographic plate on the printing press. After the burning operation is completed, the lithographic plate can be returned to the lithographic manufacturing equipment. There's no need to. Remove the shield by rinsing it with water and make it insensitive, for example with gum arabic. The next step is to prepare this lithographic plate for printing. .

A pre-sensitized material consisting of a metal substrate and a radiation-sensitive layer consisting of a photosensitive organic compound. A radiation sensitive lithographic plate can be processed according to the following steps.

(a) There is a region of the radiation exposed layer and a region of the non-radiation exposed layer, and these regions are different. radiation sensitivity prior to exposure to include the soluble region. exposing the lithographic plate to radiation to form the image; (b) removing the exposed layer from the soluble areas; Creates a streak by selectively removing and revealing the substrate beneath the soluble region (c) treating the developed lithographic plate with the aqueous composition of the present invention for visualization; The aqueous layer on top of the exposed substrate and the exposed radiation susceptibility that was not removed during the development step. Let the layers form.

(d) burning the lithographic plate in the presence of stain-forming contaminants; (e) burning the plate in the presence of stain-forming contaminants; The aqueous layer is removed from the lithographic plate after the printing process, and the lithographic substrate area is revealed by this. Removes dirt-forming contaminants from.

The present invention will be explained in further detail with reference to Examples below.

In the following, all percentages are by weight unless otherwise specified. Test methods and results are provided before the examples. Show the resulting code. Two separate tests were conducted to evaluate the aqueous compositions. 1st The test investigated the effectiveness of thick layers of aqueous compositions coated on lithographic plates and also tested whether the composition Determine the effectiveness of cleaning-sealing the base. This is a test for The second test is the clean-coating seal around the composite pattern on the test surface. This is a test to study the accuracy of. All lithographic evaluations were performed on positive-working lithographic plates. It was.

Thick layer and base test Using a test lithographic plate consisting of 12.7 x 25.4 co+ part, about 2.5 x 3 ．． Expose 8cm. Develop the entire lithographic plate and wipe it off to dry or nearly dry state Make it. Treat the exposed area with a few ml of the aqueous composition, carefully rubbing the surface and After leaving it for a while, rub it again until it is almost dry.

Lithography in a manner designed to reproduce field conditions when corrected by hand Treat non-exposed areas. Soak a wipe in the aqueous composition and remove any excess composition. Squeeze out. Rub the resulting water-based pad onto the surface of the unexposed area and spread it thickly and evenly. form a layer. Do not rub this layer. Air dry this flat plate. rubbed after exposure Areas (i.e. thin layers) with a solution coating weight of 3-4 g/m'', non-exposed areas (i.e. (thick layer) has a solution coating weight of 12 to 16 g/+e''.

The treated lithographic plate was then baked in a laboratory oven at 265-270°C for 2 minutes. do. After cooling, wash the entire lithographic plate with tap water, then treat only the exposed parts with ink using a cloth. , then ink only the exposed areas with a pad moistened with an ink-water mixture and flatten. Dry the plate.

Process the lithographic plates before and after baking, visually and under a stereomicroscope (40X) with a magnifying glass. ). First, test the quality of the air-dried thick layer coating. baking, After cleaning and inking, there may be insufficient ink uptake on exposed areas and surface changes. test for corrosion and coating damage or penetration.

The test lithography consists of a 20x2Scm plate size. Approximately 2.5 x 5.0C of lithography 11 unexposed areas, grayscale, and variable and complex tissues and A test surface with details is used to expose the remaining portion of the lithographic plate. Develop the planographic plate, Wipe it off until it's almost dry. Then apply the appropriate amount of test solution and carefully Wipe the surface.

The planographic plate is rubbed lightly until it is almost dry, and then air-dried. Solution used at this point The coating weight was approximately 3.5-4.0 g/m''.

The treated lithographic plate is heated in a laboratory oven at about 265-270°C for 2 minutes. After cooling , wash the lithographic plate and clean it by rubbing it with a pad moistened with the ink-water mixture. process. Next, the ink processing state of the drawing area and the non-ink processing state of the base region. visually and under magnification to test for precision and accuracy. In addition to this Note the cleanliness of the bottom area and observe the inking condition of the unexposed edge band.

exam code The following test code is used in each example.

H Smooth coated surface S Smooth covering, slightly irregular R somewhat irregular, striped ■ Irregular covering – stripes, wrinkles, and fissures are visible Z: Fully coated with no cohesion or laydown. Droplets gathered together N-IA exhibits lumps and patchy surface upon drying; coated surface smooth and unaltered No tissue difference between treated and untreated areas There is a striped pattern on the IA coated surface. There is very little difference in structure between the regions. IA-P coated There is a slight difference in the structure between areas, depending on the covering surface, and there is a striped pattern on the covering. IA-3P with small and slight penetration area, white patchy and striped, rough sanded surface , slight penetration area, large braid with covering pattern, very fine individually on the surface The fissures have eye edges or the fissures have an eye-like pattern. C Clean, no ink-up ■ Very slight ink pick-up ink pick-up T Full or partial ink pick-up (toning) test picture code K. Fine detail ink processing is precise and accurate. No problems with ink processing. P. Detailed pick-up of the drawing area. Problems caused by excessive ink or excessive ink. Line Area - Toning 1 The base area away from the line area can be clean. Examples 1-12 Using a commercially available aqueous pre-bake composition in Example 1 Ru. This composition (pH 6.9) contained 8.8% solids (of which 1.4% by weight was potassium citrate), and the balice is dodecyl (sulfonate). -Phenoxy)benzenesulfonic acid disodium salts and oxybis(dodecylbene) It is a mixture of sulfonic acid (benzene sulfonic acid). Dodecylalkyl substituents have a branched structure. Then it was reported. In Examples 2 to 8, different amounts of the preferred anion surfactant, i.e., N-(1,2-dicarboxyethyl)-N-octadecy Adding Rusulfosuccinamide Several Sodium Salts to a Commercially Available Composition: Example 2 ~8, the ratio of citrate to disodium salt mixture is substantially carried out The same level as in Example 1 is maintained, but the amount of commercial solution solids is gradually reduced. implementation Examples 9-12 are conducted using only the preferred anionic surfactants. Table shown below 1 for use in manual correction by adding anionic surfactant This supports the fact that a benzene pre-solution is obtained that encompasses the preferred range.

to Example 13 In this example, a commercially available compound containing branched dodecyl sulfonate The composition of Example 1 and a linear decyl sulfonate and a preferred sulfosuccinic acid Aqueous compositions containing mate salt surfactants were compared.

While stirring, add 10.76 kg of 87.1% potassium hydroxide to 92.18 kg of deionized water. kg, then add 11.34 kg of citric acid hydrate. After dissolution, n-decyl (sulfophenoxy)benzenesulfonic acid and oxybis(n-decylbenzene) 19.84 kg of a 40% solution of a mixture of 1.36 kg) in small amounts. The solution has the same anionic properties as Examples 1-12. Add 24.16 kg of a 35% solution of surfactant and dissolve the solution in deionized water (total volume 0.4 3kg) and rinse a small amount at a time. Finally, add 50.0 kg of deionized water. The temperature is 6 Do not rise above 0℃. The resulting solution contained 16.2% solids by weight and had a pH of 5, It is 8. This solution (designated Example 13) was compared with the commercially available composition of Example 1. The results are shown below.

Table 11 The results shown in Table II demonstrate that formulations containing the sulfosuccinamate surfactant did not form a film. both in terms of good properties and the absence of damage on the surface of the lithographic coating. This proves once again that it has superiority.

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Claims (20)

[Claims] 1. (a) Ammonium, sodium, potassium or lithium salts of strong organic acids (b) anionic surfactants containing functional groups of strong organic acid salts and weak organic acid salts; Ammonium, sodium, potassium or lithium salts of sex agents, and ( c) ammonium, sodium, potassium or lithium salts of organic weak acids; A lithographic stamp exposed to chemically active light comprising an effective amount of In order to prevent surface contamination due to heat treatment of the lithographic plate, do not heat it after developing the lithographic plate. When applied onto the surface of an exposed lithographic substrate before printing, it is useful to protect the lithographic plate. Aqueous composition. 2. Strong organic acids include n-decyl(sulfophenoxy)benzenesulfonic acid, (n-decylbenzenesulfonic acid), having 1 to 4 carbon atoms in the alkyl group linear or branched mono- or dialkyl derivatives of naphthalene sulfonic acid, Methylene dinaphthalenedisulfonic acid, dodecylbenzenesulfonic acid, alkyl group sulfonated alkyldiphenyl oxide containing 1 to 4 carbon atoms, dodecyl (sulfophenoxy)benzenesulfonic acid, oxybis(dodecylbenzenesulfonic acid) (phonic acid), hexadecyl (sulfophenoxy)benzenesulfonic acid, oxybis (hexadecylbenzenesulfonic acid) and mixtures thereof 1. Aqueous composition according to item 1. 3. Strong organic acids are n-decyl(sulfophenoxy)benzenesulfonic acid and The aqueous solution according to claim 2, comprising a mixture of (n-decylbenzenesulfonic acid) Composition. 4. Aqueous composition according to claim 1, wherein the strong organic acid salt is present in an amount of 1 to 12% by weight. . 5. The surfactant is N-(1,2-dicarboxyethyl)-N-octadecylsulfate. Fosuccinamic acid tetrasodium salt, N-(1,2-dicarboxyethyl)-N -Dodecylsulfosuccinamic acid tetrasodium salt, N-(1,2-dicarboxylate) ethyl)-N-butylsulfosuccinamic acid tetrasodium salt, N-(1,2 -dicarboxyethyl)-N-amyloxypropyl sulfosuccinamic acid tetra Sodium salt, N-(β-hydroxyethyl)-N-(sulfo-2,5-endo hexahydrophthalylate) aspartate tetrasodium salt, N-methyl-N- Claims selected from cocoyl taurine sodium salt and mixtures thereof 1. Aqueous composition according to item 1. 6. The surfactant is N-(1,2-dicarboxyethyl)-N-octadecylsulfate. The aqueous composition according to claim 5, which is fosuccinamic acid tetrasodium salt. 7. Aqueous composition according to claim 1, wherein the surfactant salt is present in an amount of 1 to 10% by weight. A product. 8. Weak organic acids include citric acid, isomalic acid, glycolic acid, malonic acid, and tartronic acid. acid, malic acid, glyceric acid, tartaric acid, tricarballylic acid, 1,2,3,4-butyric acid The water according to claim 1, selected from tantetracarboxylic acids and mixtures thereof. sexual composition. 9. The aqueous composition according to claim 1, wherein the weak organic acid salt is potassium citrate. 10. Aqueous according to claim 1, in which the weak organic acid salt is present in an amount of 0.5 to 12% by weight. Composition. 11. (a) There is a region of the radiation exposed layer and a region of the non-radiation exposed layer, and these regions are radiation before exposure so that the regions have different solubility and encompass the soluble region. exposing the sensitive lithographic plate to light for image formation; (b) selecting the exposed layer from the soluble areas; Form the streak by selectively removing and revealing the substrate beneath the soluble region. (c) treating the developed lithographic plate with an aqueous composition to remove the exposed groups; Forms an aqueous layer on top of the quality and an exposed radiation-sensitive layer that was not removed during the development step. (d) burning the lithographic plate in the presence of stain-forming contaminants; (e) burning the plate in the presence of stain-forming contaminants; The aqueous layer is removed from the planographic plate after the coating process, and the exposed planographic base is removed by using water. removing soil-forming contaminants from the soil area, the aqueous composition containing (i) a strong organic acid; ammonium salt, sodium salt, potassium salt or lithium salt, (ii) organic strong Ammonium anionic surfactants containing acid salt and organic weak acid salt functional groups salts, sodium salts, potassium salts or lithium salts, and (iii) organic weak acids. Contains an effective amount of ammonium, sodium, potassium or lithium salts. a metal substrate, and an organic photosensitive compound. A method of processing a pre-exposed radiation-sensitive lithographic plate comprising a radiation-sensitive layer. 12. Strong organic acids include n-decyl(sulfophenoxy)benzenesulfonic acid, oxy bis(n-decylbenzenesulfonic acid), with 1 to 4 carbon atoms in the alkyl group linear or branched mono- or dialkyl derivatives of naphthalene sulfonic acid with , methylene dinaphthalenedisulfonic acid, dodecylbenzenesulfonic acid, alkyl sulfonated alkyldiphenyl oxides, dodecyl radicals containing 1 to 4 carbon atoms; (sulfophenoxy)benzenesulfonic acid, oxybis(dodecylbenzene) sulfonic acid), hexadecyl (sulfophenoxy)benzenesulfonic acid, (hexadecylbenzenesulfonic acid), and mixtures thereof. The method according to claim 11. 13. Strong organic acids are n-decyl(sulfophenoxy)benzenesulfonic acid and oxy The method according to claim 12, which is a mixture of bis(n-decylbenzenesulfonic acid) Law. 14. Claim 11 wherein the strong organic acid in the aqueous composition is present in an amount of 1 to 12% by weight. Method described. 15. The surfactant is N-(1,2-dicarboxyethyl)-N-octadecyl Rufosuccinamic acid tetrasodium salt, N-(1,2-dicarboxyethyl)- N-dodecylsulfosuccinamic acid tetrasodium salt, N-(1,2-dicarboxylic acid) xyethyl-N-butylsulfosuccinamic acid) tetrasodium salt, N-(1, 2-dicarboxyethyl)-N-amyloxypropyl sulfosuccinamic acid Tetrasodium salt, N-(β-hydroxyethyl)-N-(sulfo-2,5-ene Domethylene hexahydronaphthalylate) aspartic acid tetrasodium salt, N- selected from methyl-N-cocoyltaurine sodium salt and mixtures thereof; 12. The method according to claim 11. 16. The surfactant is N-(1,2-dicarboxyethyl)-N-octadecyl- 16. The method according to claim 15, which is sulfosuccinamic acid tetrasodium salt. 17. The anionic surfactant in the aqueous composition is present in an amount of 1 to 10% by weight. The method according to claim 11. 18. Weak organic acids include citric acid, isomalic acid, glycolic acid, malonic acid, and tartaric acid. acid, malic acid, glyceric acid, tartaric acid, tricarballylic acid, 1,2,3,4- Claim 11 selected from butanetetracarboxylic acid and mixtures thereof. the method of. 19. 19. The method of claim 18, wherein the weak organic acid salt is potassium citrate. 20. Claims wherein the weak organic acid salt in the aqueous composition is present in an amount of 0.5 to 12% by weight. The method described in Box 11.