JPH0638330A - Stripping method for enameled wire - Google Patents

Stripping method for enameled wire

Info

Publication number
JPH0638330A
JPH0638330A JP4213381A JP21338192A JPH0638330A JP H0638330 A JPH0638330 A JP H0638330A JP 4213381 A JP4213381 A JP 4213381A JP 21338192 A JP21338192 A JP 21338192A JP H0638330 A JPH0638330 A JP H0638330A
Authority
JP
Japan
Prior art keywords
laser
acid
insulated wire
irradiated
enamel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4213381A
Other languages
Japanese (ja)
Inventor
Atsushi Higashiura
厚 東浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP4213381A priority Critical patent/JPH0638330A/en
Publication of JPH0638330A publication Critical patent/JPH0638330A/en
Pending legal-status Critical Current

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  • Removal Of Insulation Or Armoring From Wires Or Cables (AREA)
  • Laser Beam Processing (AREA)

Abstract

PURPOSE:To provide highly reliable laser stripping method for various enameled wires. CONSTITUTION:The laser stripping method for enameled wire comprises a prestep for irradiating an enameled wire with laser beam wherein the surface to be irradiated with laser beam is previously coated with a medicine functioning to remove oxides from the surface of metal conductor of the enameled wire.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は絶縁電線のエナメル皮膜
の剥離方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for removing an enamel film from an insulated wire.

【0002】[0002]

【従来の技術およびその課題】近年の電子機器等の小型
化、高機能化に伴い、それらの中に用いられる部品やコ
イルの使用環境は非常に厳しくなって来ている。そのた
め、これら部品やコイルに用いられている絶縁電線の高
耐熱性化、細線化が重要になって来ているが、一方で品
質、加工性等に大きく影響するエナメル皮膜の端末剥離
技術が充分ではない為、高耐熱性化や細線化ができない
という問題点があった。
2. Description of the Related Art With the recent miniaturization and higher functionality of electronic devices and the like, the environment in which the components and coils used therein are used has become extremely severe. For this reason, it is becoming important to make the insulated wires used for these parts and coils highly heat resistant and thin, but on the other hand, enamel film end stripping technology, which greatly affects quality and workability, is sufficient. However, there is a problem that it is not possible to achieve high heat resistance and thin lines.

【0003】つまり、機械剥離では細線においては致命
的な導体キズ発生の問題、薬品剥離ではより強力な剥離
剤を用いることで絶縁皮膜の剥離周辺部の劣化、あるい
は付着した剥離剤除去に長時間を要する問題、火による
燃焼除去法では導体自体の軟化/断線の問題等を満足さ
せることはできなかった。
That is, in mechanical peeling, a problem of fatal conductor scratches is generated in fine wires, and in chemical peeling, a stronger peeling agent is used to deteriorate the peeling peripheral portion of the insulating film or to remove the attached peeling agent for a long time. However, the problem of softening / disconnection of the conductor itself could not be satisfied by the burning removal method using fire.

【0004】その為、近年、これらの問題を改善する手
法として、直接剥離半田付けできる耐熱半田付け可能な
エナメル線の研究が活発に行われているが、半田付け性
を保持させる為に充分な耐熱性を付与することが未だに
達成されていない。また、更にレーザーを用いた剥離手
法も研究が活発化し、容易に皮膜剥離のできる耐熱性エ
ナメル絶縁の細線も開発されてきているが、特殊な構成
を持つ材料に限定する必要があった。
Therefore, in recent years, as a method for improving these problems, research has been actively conducted on an enameled wire which can be directly peel-soldered and capable of heat-resisting soldering, but it is sufficient to maintain solderability. It has not yet been achieved to impart heat resistance. Further, research on a peeling method using a laser has been further activated, and a thin wire of heat resistant enamel insulation capable of easily peeling a film has been developed, but it was necessary to limit to a material having a special constitution.

【0005】[0005]

【発明が解決しようとする課題】本発明は上述の如き点
に鑑みてなされたものであり、処理できる絶縁電線のエ
ナメル皮膜の材質が特定されることなく、レーザーを用
いて容易かつ短時間にて、しかも信頼性の高いエナメル
皮膜の剥離処理のできる剥離方法を提供するものであ
る。
SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and it is possible to easily and quickly use a laser without specifying the material of the enamel film of the insulated wire that can be treated. In addition, the present invention provides a peeling method capable of highly reliable peeling treatment of an enamel film.

【0006】[0006]

【課題を解決するための手段】レーザーを使用した絶縁
電線のエナメル皮膜の剥離方法において、絶縁電線にレ
ーザーを照射する前工程として、被照射絶縁電線のレー
ザー照射面に該絶縁電線の金属導体表面の酸化物を除去
する働きをもつ薬剤を予め塗布する工程を組み込み、し
かるのち該薬剤塗布個所にレーザーを照射する。
[Means for Solving the Problems] In a method of peeling an enamel film of an insulated wire using a laser, as a pre-process of irradiating the insulated wire with a laser, a laser-irradiated surface of the insulated wire to be irradiated is a metal conductor surface of the insulated wire. Incorporating a step of pre-applying a drug having a function of removing the oxide, and then irradiating the drug application site with a laser.

【0007】本発明にて、金属導体表面の酸化物を除去
する働きをもつ薬剤としては、例えば、松脂、リン酸、
塩酸、フッ酸、オルソリン酸、塩化亜鉛、塩化アンモニ
ウム、塩化第一スズ、乳酸、ステアリン酸、オレイン
酸、グルタミン酸、フタル酸、塩酸アニリン、塩酸グル
タミン、塩酸ヒドラジン、ユリア、エチレンジアミン、
ロジン酸、変性フェノールなどが使用でき、これらの薬
剤は一種又は二種以上混合して、或いは剥離特性を均一
にするために、水や溶剤で希釈したり、或いは粘度調製
のために、増粘剤などを添加したりして調製して使用す
るのが好ましい。なお薬剤濃度は高い程効果が大きくな
るが、付着量を均一化するため、1000センチポイズ
(30℃)程度に調製するのが望ましい。
In the present invention, examples of the agent having a function of removing oxides on the surface of the metal conductor include pine resin, phosphoric acid,
Hydrochloric acid, hydrofluoric acid, orthophosphoric acid, zinc chloride, ammonium chloride, stannous chloride, lactic acid, stearic acid, oleic acid, glutamic acid, phthalic acid, aniline hydrochloride, glutamine hydrochloride, hydrazine hydrochloride, urea, ethylenediamine,
Rosin acid, modified phenol, etc. can be used, and these agents are mixed with one or more kinds, or diluted with water or a solvent in order to obtain uniform release characteristics, or for viscosity adjustment, thickening. It is preferable to prepare and use by adding agents and the like. The higher the drug concentration, the greater the effect, but it is desirable to adjust the concentration to about 1000 centipoise (30 ° C.) in order to make the adhesion amount uniform.

【0008】また、本発明方法が適用できるエナメル絶
縁電線としてはポリイミド樹脂、ポリアミドイミド樹
脂、ポリエステルアミドイミド樹脂、ポリヒダントン樹
脂、ポリエステルイミド樹脂、ポリパラバン酸樹脂、ポ
リエステル樹脂、ポリビニルホルマール樹脂、ポリウレ
タン樹脂などの熱硬化性樹脂、あるいはこれらの樹脂の
2種以上複合し構成した複合絶縁層をもつエナメル絶縁
電線のほとんどが可能である。
Examples of the enamel insulated wire to which the method of the present invention can be applied include polyimide resin, polyamideimide resin, polyesteramideimide resin, polyhydanton resin, polyesterimide resin, polyparabanic acid resin, polyester resin, polyvinyl formal resin and polyurethane resin. Most of the enamel insulated wires having a thermosetting resin or a composite insulating layer formed by combining two or more of these resins are possible.

【0009】また本発明にて使用するレーザーとしては
特にエキシマレーザーや炭酸ガスレーザー、しかも高出
力を有するものが好適である。
Further, as the laser used in the present invention, an excimer laser or a carbon dioxide laser, and a laser having a high output is particularly preferable.

【0010】[0010]

【作用】本発明方法では、レーザー照射する工程の前工
程として、金属導体表面の酸化物を除去する働きを持つ
薬剤を、予め、被照射絶縁電線のレーザー照射面に塗布
する工程を組み込んだことにより、レーザー照射による
絶縁被覆材料の分解微量残留物と導体酸化物層(酸化
銅)の形成を、金属表面の酸化物を除去する働きをもつ
薬剤の微少揮発物の剥離部への付着浸透により、酸化銅
を還元すると同時に分解微量残留物の密着も低下させる
ことから、半田の導体表面への進入、拡散を著しく改善
する。
In the method of the present invention, a step of applying a chemical agent having a function of removing oxides on the surface of the metal conductor in advance to the laser-irradiated surface of the insulated wire to be irradiated is incorporated as a pre-step of the step of laser irradiation. Decomposition of insulating coating material by laser irradiation and formation of trace amount residue and conductor oxide layer (copper oxide) by adhesion permeation to the exfoliation part of the minute volatile agent which has the function of removing the oxide on the metal surface. Since the copper oxide is reduced and the adhesion of the decomposed trace amount residue is also reduced at the same time, the penetration and diffusion of the solder to the conductor surface are significantly improved.

【0011】[0011]

【実施例】実施例1 (ポリエステル樹脂塗料の調製)1.0モルのテレフタ
ル酸ジメチルと0.6モルのエチレングリコールと、
0.5モルのグリセリンをフラスコ内に投入し、これを
攪拌しながら加熱反応させ、メタノールを流出させなが
ら反応を進めて、反応温度を約220℃まで上昇させ
た。反応生成物の粘度が急速に高まったところで、この
反応系にクレゾールを投入し、反応生成物を溶解すると
共に溶液の温度を80℃まで冷却した。次にこの溶液中
に12gのテトラブチルチタネートを投入し約3時間攪
拌したのち、この反応生成物中にクレゾールおよびソル
ベントナフサを投入し希釈して不揮発分30%のポリエ
ステル樹脂塗料を調製した。 (絶縁電線の製造)上記のポリエステル樹脂塗料を直径
0.1mmの銅線上に塗布し焼付ける工程を繰返し施して
膜厚10μmのポリエステル樹脂皮膜を有する絶縁電線
を製造した。
Example 1 (Preparation of polyester resin coating) 1.0 mol of dimethyl terephthalate and 0.6 mol of ethylene glycol,
0.5 mol of glycerin was put into a flask, the mixture was heated and reacted with stirring, the reaction was allowed to proceed while allowing methanol to flow out, and the reaction temperature was raised to about 220 ° C. When the viscosity of the reaction product rapidly increased, cresol was added to this reaction system to dissolve the reaction product and cool the temperature of the solution to 80 ° C. Next, 12 g of tetrabutyl titanate was added to this solution and stirred for about 3 hours, and then cresol and solvent naphtha were added to this reaction product for dilution to prepare a polyester resin coating material having a nonvolatile content of 30%. (Production of Insulated Electric Wire) The above-mentioned polyester resin coating material was applied onto a copper wire having a diameter of 0.1 mm and baked to obtain an insulated electric wire having a polyester resin film with a film thickness of 10 μm.

【0012】而して製造したポリエステルエナメル線を
用いてその端末10mm部分に種々の薬剤を全周まんべん
なく塗布して試料線を作製した。また、而して作製した
試料線の端末部に下記のCO2 ガスレーザー照射条件
で、レーザーを照射して、絶縁電線からのポリエステル
エナメル皮膜の剥離状態、剥離に必要な被照射時間及び
剥離処理後の露出導体のはんだ付き性等を調べた。得ら
れた結果を表1に示す。
Using the polyester enamel wire thus produced, various chemicals were evenly applied to the 10 mm portion of the end to make a sample wire. Further, the end portion of the sample wire thus produced is irradiated with a laser under the following CO 2 gas laser irradiation conditions to peel the polyester enamel film from the insulated wire, the irradiation time required for the peeling, and the peeling treatment. Then, the solderability of the exposed conductor was examined. The results obtained are shown in Table 1.

【0013】炭酸ガスレーザー照射条件(TEA型炭酸
ガスレーザー照射装置) 照射面積:10mm×2mm 照射出力:4ジュール 照射方向:2方向 照射周波数:5Hz(5回/秒) はんだ付き性 レーザー照射にて露出させた導体を380℃の半田浴
(Pb/Sn=50/50)に2秒間浸漬することによ
り、導体部に半田付けが良好になるまでの時間とその状
態を調べた。
Carbon dioxide laser irradiation condition (TEA type carbon dioxide laser irradiation device) Irradiation area: 10 mm × 2 mm Irradiation output: 4 joules Irradiation direction: 2 directions Irradiation frequency: 5 Hz (5 times / sec) Solderability Laser irradiation By immersing the exposed conductor in a solder bath (Pb / Sn = 50/50) at 380 ° C. for 2 seconds, the time until the solder was satisfactorily soldered to the conductor and its state were examined.

【0014】[0014]

【表1】 [Table 1]

【0015】実施例2 ポリエステルイミド樹脂塗料(商品名Isomid RL :日触
スケネクタデー社製)を用いて実施例1と同様のポリエ
ステルイミド樹脂皮膜を絶縁電線を製造した。而して製
造したポリエステルイミドエナメル線を用いて、その端
末10mm部分に種々の薬剤を全周まんべんなく塗布して
試料線を作製した。而して作製した試料線の端末部につ
いて実施例1と同様の試験を行った。得られた結果を表
2に示す。
Example 2 An insulated wire having the same polyesterimide resin film as in Example 1 was produced using a polyesterimide resin coating (trade name: Isomid RL: manufactured by Nippon Schenectady). Using the polyesterimide enameled wire thus produced, various chemicals were evenly applied to the entire 10 mm portion of the end to prepare a sample wire. The same test as in Example 1 was conducted on the terminal portion of the sample wire thus produced. The obtained results are shown in Table 2.

【0016】[0016]

【表2】 [Table 2]

【0017】実施例3 ポリエステルイミド樹脂塗料(商品名 Isomid RL 日触
スケネクタデー社製)を直径0.1mmの銅線上に塗布
し、焼付ける工程を繰返し施して、膜厚5μmのポリエ
ステルイミド樹脂皮膜を設けたのち、この皮膜上にポリ
アミドイミド樹脂塗料(商品名HI−405、日立化成
(株)社製)を塗布し、焼付ける工程を繰返し施して、
絶縁電線を製造した。而して作製した二重皮膜絶縁の試
料線の端末部について実施例1と同様の試験を行った。
得られた結果を表3に示す。
Example 3 A polyester imide resin coating (trade name: Isomid RL, manufactured by Nippon Schenectady) was applied on a copper wire having a diameter of 0.1 mm, and a baking process was repeated to form a polyester imide resin film having a thickness of 5 μm. After being provided, a polyamide-imide resin coating (trade name HI-405, manufactured by Hitachi Chemical Co., Ltd.) is applied on this film, and the baking step is repeated,
An insulated wire was manufactured. The same test as in Example 1 was performed on the terminal portion of the double-coated insulating sample wire thus produced.
The results obtained are shown in Table 3.

【0018】[0018]

【表3】 [Table 3]

【0019】実施例4 ポリアミドイミド樹脂塗料(商品名HI−405、日立
化成(株)社製)を直径0.1mmの銅線上に塗布し、焼
付ける工程を繰返し、施して膜厚10μmのポリアミド
イミド樹脂皮膜を形成して絶縁電線を製造した。而して
作製したポリアミドイミドエナメル線について、その端
末10mmに種々の薬剤を全周にまんべんなく塗布して試
料線を作製した。而して作製した試料線の端末部に実施
例1と同様の試験を行った。得られた結果を表4に示
す。
Example 4 A polyamide-imide resin coating (trade name: HI-405, manufactured by Hitachi Chemical Co., Ltd.) was applied on a copper wire having a diameter of 0.1 mm, and the baking process was repeated. An imide resin film was formed to produce an insulated wire. With respect to the polyamide-imide enameled wire thus produced, various chemicals were evenly applied to the entire 10 mm of the end to produce a sample wire. The same test as in Example 1 was performed on the terminal portion of the sample wire thus produced. The results obtained are shown in Table 4.

【0020】[0020]

【表4】 [Table 4]

【0021】実施例5 ポリイミド樹脂塗料(商品名Pire ML)を直径0.1
mmの銅線上に塗布し、焼付ける工程を繰返し施して膜厚
10μmのポリイミド樹脂皮膜を形成して絶縁電線を製
造した。而して作製したポリイミドエナメル線につい
て、その端末10mmに種々の薬剤を全周にまんべんなく
塗布して試料線を作製した。而して作製した試料線の端
末部に実施例1と同様の試験を行った。得られた結果を
表5に示す。
Example 5 A polyimide resin paint (Pire ML, trade name) was used with a diameter of 0.1.
A copper wire having a thickness of 10 mm and a baking process were repeated to form a polyimide resin film having a thickness of 10 μm to produce an insulated wire. With respect to the polyimide enamel wire produced in this way, various chemicals were evenly applied to the end 10 mm to make a sample wire. The same test as in Example 1 was performed on the terminal portion of the sample wire thus produced. The results obtained are shown in Table 5.

【0022】[0022]

【表5】 [Table 5]

【0023】表1〜表5から明らかなように、本発明方
法によれば各種のエナメル絶縁電線のエナメル皮膜を短
時間にて容易に、しかも信頼性高く剥離処理できる。
As is clear from Tables 1 to 5, according to the method of the present invention, the enamel coating of various enamel insulated wires can be easily and reliably stripped in a short time.

【0024】[0024]

【発明の効果】以上説明した如く、本発明のエナメル皮
膜の剥離方法によれば、炭酸ガスレーザーの如き安価な
レーザーを用いて、絶縁電線のエナメル皮膜を特定のも
のに限定することなく、各種のエナメル皮膜を容易に、
かつ高い信頼性をもって剥離することができるものであ
り、その実用的価値は極めて大きいものである。
As described above, according to the method for peeling off an enamel film of the present invention, various kinds of enamel films for insulated wires are not limited to a particular one by using an inexpensive laser such as a carbon dioxide gas laser. Enamel coating of easily,
Moreover, it can be peeled off with high reliability, and its practical value is extremely large.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 レーザーを使用した絶縁電線のエナメル
皮膜の剥離方法において、絶縁電線にレーザーを照射す
る前工程として、被照射絶縁電線のレーザー照射面に該
絶縁電線の金属導体表面の酸化物を除去する働きをもつ
薬剤を予め塗布する工程を組み込んだことを特徴とする
絶縁電線のエナメル皮膜の剥離方法。
1. A method for removing an enamel coating of an insulated wire using a laser, wherein as a pre-process of irradiating the insulated wire with a laser, an oxide on the metal conductor surface of the insulated wire is applied to a laser-irradiated surface of the insulated wire to be irradiated. A method for removing an enamel film of an insulated wire, which comprises a step of applying a chemical agent having a function of removing in advance.
【請求項2】 被照射絶縁電線のレーザー照射面に塗布
する薬剤が、松脂、リン酸、塩酸、フッ酸、オルソリン
酸、塩化亜鉛、塩化アンモニウム、塩化第一錫、乳酸、
ステアリン酸、オレイン酸、グルタミン酸、フタル酸、
塩酸アニリン、塩酸グルタミン、塩酸ヒドラジン、ユリ
ア、エチレンジアミン、ロジン酸、変性フェノールの群
から選ばれた少なくとも1種の単独、またはこれを水ま
たは溶剤にて溶解したものであることを特徴とする請求
項1記載の絶縁電線のエナメル皮膜の剥離方法。
2. The agent applied to the laser-irradiated surface of the insulated insulated wire is pine resin, phosphoric acid, hydrochloric acid, hydrofluoric acid, orthophosphoric acid, zinc chloride, ammonium chloride, stannous chloride, lactic acid,
Stearic acid, oleic acid, glutamic acid, phthalic acid,
At least one kind selected from the group consisting of aniline hydrochloride, glutamine hydrochloride, hydrazine hydrochloride, urea, ethylenediamine, rosin acid, and modified phenol, or a solution thereof dissolved in water or a solvent. The method for peeling off an enamel film of an insulated wire according to 1.
【請求項3】 被照射レーザーとして、エキシマレーザ
ー、パルス型炭酸ガスレーザーのいずれかを使用するこ
とを特徴とする請求項1記載の絶縁電線のエナメル皮膜
の剥離方法。
3. The method for peeling an enamel film of an insulated wire according to claim 1, wherein either one of an excimer laser and a pulsed carbon dioxide gas laser is used as the irradiated laser.
JP4213381A 1992-07-17 1992-07-17 Stripping method for enameled wire Pending JPH0638330A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4213381A JPH0638330A (en) 1992-07-17 1992-07-17 Stripping method for enameled wire

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4213381A JPH0638330A (en) 1992-07-17 1992-07-17 Stripping method for enameled wire

Publications (1)

Publication Number Publication Date
JPH0638330A true JPH0638330A (en) 1994-02-10

Family

ID=16638261

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4213381A Pending JPH0638330A (en) 1992-07-17 1992-07-17 Stripping method for enameled wire

Country Status (1)

Country Link
JP (1) JPH0638330A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007516083A (en) * 2003-07-08 2007-06-21 スペクトラム テクノロジーズ パブリック リミティド カンパニー Method and apparatus for removing coating layer or painted part from carrier with laser
JP2010005652A (en) * 2008-06-26 2010-01-14 Tdk Corp Method for peeling coating of insulating lead wire

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007516083A (en) * 2003-07-08 2007-06-21 スペクトラム テクノロジーズ パブリック リミティド カンパニー Method and apparatus for removing coating layer or painted part from carrier with laser
JP2010005652A (en) * 2008-06-26 2010-01-14 Tdk Corp Method for peeling coating of insulating lead wire

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