JPH06336690A - Production of metal transferred ornamental pattern - Google Patents

Production of metal transferred ornamental pattern

Info

Publication number
JPH06336690A
JPH06336690A JP12742693A JP12742693A JPH06336690A JP H06336690 A JPH06336690 A JP H06336690A JP 12742693 A JP12742693 A JP 12742693A JP 12742693 A JP12742693 A JP 12742693A JP H06336690 A JPH06336690 A JP H06336690A
Authority
JP
Japan
Prior art keywords
metal
adhesive
pattern
substrate
adhesive tape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12742693A
Other languages
Japanese (ja)
Inventor
Hideki Horiuchi
英樹 堀内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP12742693A priority Critical patent/JPH06336690A/en
Publication of JPH06336690A publication Critical patent/JPH06336690A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To produce a highly ornamental metal transferred pattern having a metallic highlight and ornamenting the surface of a small-sized article such as a timepiece, an ornamental box or accessories. CONSTITUTION:A fine pattern 2 having a metallic highlight is carved by a diamond cutting method in the surface 1 of a metallic substrate coated with a 1st photoresist 4 and this pattern 2 is finely adjusted with a 2nd photoresist 5. A metallic thin layer 7 is deposited by electroforming on the metal exposed part on the substrate and this deposited layer 7 is transferred to adhesive tapes 8, 10 in two steps. The rear side of the metallic highlight part used as appearance is partially coated with an adhesive 12 and bonded to a surface to be ornamented with the adhesive 12 to give an ornamental effect.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、小物製品のための装飾
用金属薄層転写パターンの製造方法に関する。
FIELD OF THE INVENTION The present invention relates to a method for producing a decorative metal thin layer transfer pattern for small articles.

【0002】[0002]

【従来の技術】従来、時計、飾り箱等の小物製品の表面
部装飾のためには、特開昭59−16989あるいは特
開昭59−140384に見るように、金属基板にフォ
トレジスト塗布を行ない、所要パターンを焼き付け現像
して基板金属表面部を露出させ離型処理を施した後、電
鋳法でこの部分のみに金属層を適当厚さにまで析出生成
させ、粘着テープに粘着させつつ剥がし取りその裏面側
に被接着品への接着用接着剤を塗布、接着剤表面保護用
ライナーを添付する、転写ロゴマーク等の製造方法が提
案されている。これらの方法は図7(ロ)3に示すよう
にいずれも得られる金属層断面が、基板への金属電鋳析
出時の電流分布に支配され不可避的にキノコ状を呈す
る。これを避けるために、特開昭58−34194では
レジスト皮膜として厚膜のドライフィルムを応用、図8
のようなよりシャープな形状を得る方法を提案してい
る。しかし、この場合にも電鋳析出生成物の上面の断面
形状は曲線を構成し、シャープな金属性ハイライトを得
るには程遠い。
2. Description of the Related Art Conventionally, as shown in JP-A-59-16989 or JP-A-59-140384, a metal substrate is coated with a photoresist to decorate the surface of small articles such as watches and decorative boxes. After baking and developing the required pattern to expose the metal surface of the substrate and subjecting it to a mold release process, a metal layer is deposited and formed to an appropriate thickness only on this part by electroforming, and peeled off while sticking to the adhesive tape. There has been proposed a method for producing a transfer logo mark or the like, in which an adhesive for adhering to an article to be adhered is applied to the back side thereof and a liner for protecting the surface of the adhesive is attached. In these methods, as shown in FIG. 7B, the obtained metal layer cross-section is inevitably mushroom-shaped because it is dominated by the current distribution during metal electroforming deposition on the substrate. In order to avoid this, in JP-A-58-34194, a thick dry film is applied as a resist film.
Has proposed a method of obtaining a sharper shape such as. However, in this case as well, the cross-sectional shape of the upper surface of the electroformed precipitation product constitutes a curve, which is far from obtaining a sharp metallic highlight.

【0003】[0003]

【発明が解決しようとする課題】時計、飾り箱、アクセ
サリー等の装飾性の高い小物製品の表面をかざるのに
は、シャープな金属性ハイライトが極めて効果的である
が、製品そのものの表面にひとつづつ手作り的に加工を
行なうことが非生産的であることから、従来技術に説明
したように装飾部品として別途製造のうえ転写する方法
が提案された。しかしこれらの方法ではシャープな金属
性ハイライトが得られにくく、これに代わる新して外観
装飾効果を手軽に得る方法が求められていた。
A sharp metallic highlight is extremely effective for avoiding the surface of small decorative products such as watches, decorative boxes, and accessories, but the surface of the product itself is very effective. Since it is non-productive to perform hand-made processing one by one, a method of separately manufacturing and transferring as decorative parts has been proposed as described in the prior art. However, with these methods, it is difficult to obtain sharp metallic highlights, and there has been a demand for a new alternative method for easily obtaining the effect of appearance decoration.

【0004】[0004]

【課題を解決するための手段】本発明による金属転写パ
ターン製造方法は、金属転写パターンの表面に金属性ハ
イライトを得るために電鋳析出用基板に、ダイヤバイト
等金属ハイライトを美しく演出出来る刃物で必要なパタ
ーンを彫り込み、このパターンの内必要部分のみに電鋳
析出を行なって電鋳析出層に目的とするハイライトを転
写する。従来法と異なり、装飾面として生かす表面がダ
イヤカット等の切削加工を行なった基板の美麗表面であ
るため、仮保持用粘着テープへの転写作業は2ステップ
となる。すなわち、まず一旦第1の粘着テープに電鋳層
析出の相互位置関係を保持しつつ剥離転写する。次にこ
れを、やはり相互位置関係を保持しつつ第2の粘着テー
プに転写する。この2ステップにより、金属層の生かす
べきハイライト面は第2の粘着テープの粘着剤に粘着し
ており、被装飾小物製品へ接着するための接着剤はこの
ハイライト面の裏側に塗布され、接着層保護のためのラ
イナーが貼付され被装飾小物製品へ接着されるまでの間
保管される。第1の粘着テープと第2の粘着テープの粘
着力の間、および第2の粘着テープと被装飾小物製品へ
接着するための接着剤の接着力の間には幾分かの差を設
けて選択し、金属転写パターンの転写がスムーズに安定
して行なわれるように図る。
The method for producing a metal transfer pattern according to the present invention can beautifully produce a metal highlight such as a diamond bite on a substrate for electroforming deposition in order to obtain a metal highlight on the surface of the metal transfer pattern. A necessary pattern is engraved with a blade, and electroforming deposition is performed only on a necessary part of the pattern to transfer the intended highlight to the electroforming deposition layer. Unlike the conventional method, since the surface to be utilized as a decorative surface is the beautiful surface of the substrate that has been cut such as diamond cut, the transfer operation to the temporary holding adhesive tape requires two steps. That is, first, peeling transfer is performed on the first adhesive tape while maintaining the mutual positional relationship of deposition of the electroformed layer. Next, this is transferred to the second adhesive tape while also maintaining the mutual positional relationship. By these two steps, the highlight surface of the metal layer to be utilized is adhered to the adhesive of the second adhesive tape, and the adhesive for adhering to the small article to be decorated is applied to the back side of the highlight surface, It is stored until a liner for protecting the adhesive layer is attached and adhered to the small accessory product. There should be some difference between the adhesive force of the first adhesive tape and the second adhesive tape, and the adhesive force of the second adhesive tape and the adhesive for adhering to the small article to be decorated. Select to ensure that the metal transfer pattern is transferred smoothly and stably.

【0005】[0005]

【実施例】【Example】

(実施例1)図1、図2、図3に本発明の基本的な工程
実施例を示し、これにより本発明を説明する。図1
(イ)は本発明による金属転写装飾パターン製造方法の
最初のステップを示す図で、パターン位置決めガイド3
をフォトレジスト法で前もって形成し、このガイドを基
準に第1のレジスト4を塗布した金属基板1の表面部
に、球面ダイヤバイトにより切削溝2を彫り込んだ後の
平面図である。図1(ロ)は、図1(イ)で形成された
切削溝2に第2のフォトレジストをスピンナー塗布し
て、金属転写装飾パターン部のみ基板金属表面が露出す
るよう焼き付け現像露光する。この際、レジスト皮膜に
より区分する部分の境界部を明確にするため、第1のレ
ジストと第2のレジストの特性に相反性をもたせた。当
実施例の場合は、第1のフォトレジストとしてネガタイ
プのフォトレジストを用い、第2のフォトレジストとし
てはポジタイプのフォトレジストを用いた。図1(ハ)
は図1(ロ)のA−A′部拡大断面図であり、当実施例
の場合は基盤上金属露出面は2のように形成されてい
る。図2(イ)〜(チ)は金属転写装飾パターンの製造
プロセスを示すステップ毎の断面図であり、金属基板に
彫り込んだ金属層形成のためのパターン(イ)2金属表
面露出部に、重クロム酸カリ2%溶液に浸漬処理離型皮
膜(ロ)6を化成し、この表面に電鋳法によりニッケル
金属層(ニ)7を50ミクロン析出形成した。次に基板
上電鋳析出したパターンに粘着テープの粘着面9を押し
付けつつ基板に歪み応力を与え、これを粘着テープに写
し取る。この際同時に析出した位置決め用ガイドを含む
金属転写パターン全体の相互の位置関係を崩さないよ
う、粘着テープの粘着強度、粘着剤層支持基材8の剛性
等の条件選定に配慮した。続いてこの金属転写パターン
を、第2の粘着テープの粘着面11に、やはりパターン
相互の位置関係を維持しつつ転写、(ヘ)のように金属
転写パターンを得る。引き続いてこの粘着テープ上の金
属転写パターン裏面部に、被接着面へ最終接着するため
の接着剤12を塗布する。塗布は金属転写パターン裏面
部のみに塗布を限定出来るよう、スクリーン印刷法を応
用した。最後に金属転写パターン裏面部接着剤層を保護
するため、ライナー13を貼付して一時保管の形態を取
った。図3は、以上のプロセスで得られた金属転写パタ
ーンを、実際の被転写面に応用する場合のプロセスを示
した図で、接着剤保護ライナーを取り除き、被接着面1
4に、金属転写パターンと相互関係を維持して転写保持
されている、位置決め用ガイドをガイドとして押圧し接
着転写する。被着面への最終接着用接着剤としては、最
近性能向上の著しい感圧接着剤を応用、当初は粘着性を
示し時間とともに硬化し接着強度が向上していく特性を
十分に利用することとした。(ハ)は当実施例によって
得られた金属転写パターンによって装飾された表面を示
す略図である。
(Embodiment 1) FIG. 1, FIG. 2 and FIG. 3 show a basic process embodiment of the present invention to explain the present invention. Figure 1
FIG. 3A is a diagram showing a first step of the method for producing a metal transfer decorative pattern according to the present invention, which is a pattern positioning guide 3;
FIG. 3 is a plan view after engraving a cutting groove 2 with a spherical diamond bit on the surface portion of the metal substrate 1 which was previously formed by a photoresist method and coated with the first resist 4 based on this guide. In FIG. 1B, a second photoresist is applied to the cutting groove 2 formed in FIG. 1A by spinner coating, and a developing and exposing process is performed so that only the metal transfer decoration pattern portion exposes the substrate metal surface. At this time, the characteristics of the first resist and the second resist were made reciprocal in order to clarify the boundary between the sections separated by the resist film. In this example, a negative type photoresist was used as the first photoresist and a positive type photoresist was used as the second photoresist. Figure 1 (c)
1 is an enlarged cross-sectional view taken along the line AA 'of FIG. 1 (B), and in this embodiment, the metal exposed surface on the base is formed as 2. 2A to 2H are cross-sectional views showing a manufacturing process of a metal transfer decorative pattern, in which a pattern (B) 2 for exposing a metal surface, which is engraved on a metal substrate, is formed on a metal surface. A dip coating (b) 6 was formed by dipping in a 2% potassium chromate solution, and a nickel metal layer (d) 7 was deposited on the surface by a thickness of 50 μm by electroforming. Next, while the adhesive surface 9 of the adhesive tape is being pressed against the pattern formed by electroforming on the substrate, strain stress is applied to the substrate, and this is transferred to the adhesive tape. At this time, consideration was given to the selection of conditions such as the adhesive strength of the adhesive tape and the rigidity of the adhesive layer supporting base material 8 so that the mutual positional relationship of the entire metal transfer pattern including the positioning guide deposited at the same time was not disturbed. Subsequently, this metal transfer pattern is transferred onto the adhesive surface 11 of the second adhesive tape while also maintaining the mutual positional relationship of the patterns, and a metal transfer pattern is obtained as shown in (f). Then, the adhesive 12 for final adhesion to the adherend is applied to the back surface of the metal transfer pattern on the adhesive tape. The screen printing method was applied so that the application can be limited to only the back surface of the metal transfer pattern. Finally, in order to protect the adhesive layer on the back surface of the metal transfer pattern, a liner 13 was attached and temporarily stored. FIG. 3 is a diagram showing a process in which the metal transfer pattern obtained by the above process is applied to an actual transferred surface.
4, the positioning guide, which is transferred and held while maintaining the mutual relationship with the metal transfer pattern, is pressed as a guide for adhesive transfer. As the adhesive for final adhesion to the surface to be adhered, a pressure-sensitive adhesive whose performance has recently been remarkably improved is applied, and it is necessary to take full advantage of the property that it initially shows tackiness and cures over time to improve the adhesive strength. did. (C) is a schematic view showing a surface decorated with a metal transfer pattern obtained in this example.

【0006】(実施例2)本発明による金属転写パター
ンを、時計用文字板に応用した実施例2について説明す
る。図4(イ)〜(ハ)は、第1のフォトレジストを表
面に形成した金属基板に電鋳法による金属転写パターン
形成用の切削パターン彫り込みプロセスを示すもので、
(イ)中金属基板1全面に第1のレジスト4を塗布し、
この表面に位置決めガイドパターン3を形成、このガイ
ドパターンをガイドとしてダイヤバイトによりV字カッ
ト2を行った。ダイヤカットパターン〜部の拡大図
(ロ)中2は、時計文字板時刻表示片製作用に彫り込ん
だV字カットであり、このV字カットの両端部を第1の
フォトレジスト4とは感光特性の異なる第2のフォトレ
ジスト5を塗布、境界部を明瞭に出すためのパターニン
グを行なう。(ハ)は(イ)中B−B’部の断面図であ
り、金属基板1上第1のフォトレジスト4と第2のフォ
トレジスト5が積層されており、V字カット部2にはダ
イヤ刃物でカットされた基板金属のハイライト表面が露
出しており、このハイライト面が転写され転写パターン
の装飾表面として利用されることになる。ここに第1の
フォトレジストと第2のフォトレジストとは相反する感
光特性のものを選択し、転写パターン精度の確保と安定
化に配慮した。図5(イ)〜(ト)は前記基板金属のハ
イライト表面露出部に、電鋳法により金属層を50〜7
0ミクロンの厚さに析出形成する加工から、これを粘着
テープに剥離転写するまでのプロセスを示すステップ毎
の断面図である。基板金属のハイライト表面露出部は
(イ)2にダイヤカットによるV溝として形成され、こ
の露出部に重クロム酸カリウムの2%溶液に10〜30
秒浸漬処理することで、離型のための皮膜(ロ)6を化
成した。このV溝部に電鋳法によりニッケル金属層を5
0〜70ミクロンの厚さまで析出させ、次いでこの析出
金属層に第1の粘着テープの粘着面を押圧しつつ基板に
歪み応力を加え、析出金属層すなわち転写金属パターン
を粘着テープに剥離写し取る。この際金属転写パターン
と同時に析出させた位置決めガイドパターンを含むパタ
ーンの全体相互位置を崩すことのないよう、粘着剤の粘
着強度、粘着剤支持ベース材8の剛性にも考慮を払っ
た。続いて、この金属転写パターンを第2の粘着テープ
の粘着面(ホ)11に写し取り、(ヘ)の状態とする。
金属転写パターン7の裏面部に、被接着面への接着用接
着剤12を塗布し、この接着剤面保護のためライナー1
3を貼付して、実際に使用するまでの保管形態とした。
なお、接着剤12の塗布は金属転写パターン裏面部のみ
に限定するよう、スクリーン印刷法を応用して行なっ
た。図6(イ)〜(ハ)は上記のステップで得られた金
属転写パターンを、被接着表面に接着応用するプロセス
を示す。金属転写パターンは、使用直前ライナーを取り
去り位置決めガイドをガイドとして被接着面14に押圧
し接着する。最終的に被接着面に接着するのに用いる接
着剤は、実施例1と同じく感圧接着剤としたので、接着
当初は粘着剤として作用し、時間とともに硬化接着強度
が向上する結果となり、作業性、耐久品質の両面で満足
する結果となった。(ハ)はこのようにして得た時計用
文字板、時刻表示片の配置平面図である。
(Second Embodiment) A second embodiment in which the metal transfer pattern according to the present invention is applied to a timepiece dial will be described. 4A to 4C show a cutting pattern engraving process for forming a metal transfer pattern by electroforming on a metal substrate having a first photoresist formed on its surface.
(A) Apply the first resist 4 on the entire surface of the medium metal substrate 1,
A positioning guide pattern 3 was formed on this surface, and a V-shaped cut 2 was performed with a diamond tool using this guide pattern as a guide. In the enlarged diagram (b) of the diamond cut pattern (part), reference numeral 2 is a V-shaped cut carved for the production of the time display piece of the timepiece dial, and both ends of this V-shaped cut are sensitive to the first photoresist 4. Different second photoresists 5 are applied, and patterning is performed to clearly show the boundaries. (C) is a cross-sectional view taken along the line BB ′ in (A), in which the first photoresist 4 and the second photoresist 5 are laminated on the metal substrate 1, and the V-shaped cut portion 2 has a diamond pattern. The highlight surface of the substrate metal cut by the blade is exposed, and this highlight surface is transferred and used as the decorative surface of the transfer pattern. Here, the first photoresist and the second photoresist were selected to have opposite photosensitivity characteristics, and consideration was given to securing and stabilizing the transfer pattern accuracy. 5A to 5G show a metal layer 50 to 7 formed on the exposed surface of the highlight of the substrate metal by electroforming.
It is sectional drawing for every step which shows the process from the process of depositing and forming it to the thickness of 0 micron to peeling and transferring this to an adhesive tape. The exposed portion of the highlight surface of the substrate metal is formed as a V-shaped groove by diamond cutting on (a) 2, and 10 to 30% of the dilute potassium dichromate solution is added to this exposed portion.
By the second dipping treatment, a film (b) 6 for mold release was formed. A nickel metal layer is formed on the V groove by electroforming.
The deposited metal layer is deposited to a thickness of 0 to 70 μm, and then the deposited metal layer is pressed against the adhesive surface of the first adhesive tape to apply strain stress to the substrate, and the deposited metal layer, that is, the transferred metal pattern is peeled and copied onto the adhesive tape. At this time, the adhesive strength of the pressure-sensitive adhesive and the rigidity of the pressure-sensitive adhesive support base material 8 were also taken into consideration so as not to disturb the mutual mutual positions of the patterns including the positioning guide pattern deposited simultaneously with the metal transfer pattern. Then, this metal transfer pattern is transferred onto the adhesive surface (e) 11 of the second adhesive tape to obtain the state (f).
An adhesive 12 for adhering to a surface to be adhered is applied to the back surface of the metal transfer pattern 7, and the liner 1 is provided to protect this adhesive surface.
No. 3 was affixed, and the storage form was set until it was actually used.
The application of the adhesive 12 was performed by applying the screen printing method so that the application of the adhesive 12 was limited to only the back surface of the metal transfer pattern. 6A to 6C show a process of applying the metal transfer pattern obtained in the above steps to the surface to be adhered. For the metal transfer pattern, the liner is removed just before use and the positioning guide is used as a guide to press the surface to be adhered 14 for adhesion. The adhesive used to finally bond to the surface to be bonded was a pressure-sensitive adhesive as in Example 1, so that it acts as a pressure-sensitive adhesive at the beginning of bonding, resulting in improvement in cured adhesive strength over time. The results were satisfactory in terms of both durability and quality. (C) is a layout plan view of the timepiece dial and time display piece obtained in this manner.

【0007】[0007]

【発明の効果】本発明によって得られた主要な効果は、
被装飾表面を飾る繊細でシャープな金属性ハイライトを
具備した、生産性の高い装飾性金属転写パターンを部品
として提供出来たことである。この結果、従来製品の表
面にひとつひとつ手作り的に行なっていた加飾加工を、
手軽にしかも品質的にも安定した位置決め接着加工に切
り代えることが出来、生産性の飛躍的向上をもたらすこ
とが出来た。また、従来加工の困難であった高度に繊細
なパターンについても、加工可能の範囲に入れることが
出来ることとなった。外観的にはさらに、彫り込んだ凹
面に対して、接着形成した凸面は製品表面に立体感を与
え、従来にないデザイン要素技術として関係する業界に
大きなデザイン開発の可能性をもたらすものである。
The main effects obtained by the present invention are:
It was possible to provide, as a part, a highly productive decorative metal transfer pattern having a delicate and sharp metallic highlight that decorates the surface to be decorated. As a result, the decoration processing that was traditionally done by hand on the surface of the product,
It was possible to switch to a positioning and bonding process that was easy and stable in terms of quality, resulting in a dramatic improvement in productivity. In addition, even highly delicate patterns, which were difficult to process in the past, can now be included in the processable range. In terms of appearance, the convex surface formed by adhesion, in contrast to the engraved concave surface, gives a three-dimensional appearance to the product surface, providing a great potential for design development to the related industry as an unprecedented design element technology.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明実施例1の場合のパターン形成段階のス
テップを示す図。 (イ)金属転写パターン平面レイアウト図。 (ロ)フォトレジストを2層積層した時の金属転写パタ
ーン平面レイアウト図。 (ハ)A−A’断面図。
FIG. 1 is a diagram showing steps of a pattern forming step in the case of a first embodiment of the present invention. (A) A plan view of a metal transfer pattern layout. (B) A metal transfer pattern plane layout diagram when two layers of photoresist are laminated. (C) AA 'sectional view.

【図2】本発明実施例1の場合のパターン形成粘着テー
プに転写するまでプロセスのステップ毎の断面図。 (イ)図1におけるA−A’断面図。 (ロ)基板金属露出表面に離型皮膜化成処理を施したこ
とを示す断面図。 (ハ)上記離型皮膜上に電鋳法で50〜70μのニッケ
ル金属層形成を示す断面図。 (ニ)上記金属層を第1の粘着テープに転写するステッ
プを示す断面図。 (ホ)上記金属層を再び第2の粘着テープに転写するス
テップを示す断面図。 (ヘ)金属転写パターンを保持する粘着テープの形態を
示す断面図。 (ト)金属転写パターン裏面部に接着剤を部分塗布する
ステップを示す断面図。 (チ)上記接着剤を保護するライナーを貼付した形態を
示す断面図。
FIG. 2 is a cross-sectional view of each step of the process until transfer to the pattern-forming pressure-sensitive adhesive tape according to the first embodiment of the present invention. (B) AA 'sectional drawing in FIG. (B) A cross-sectional view showing that the release coating chemical conversion treatment is applied to the exposed surface of the substrate metal. (C) A cross-sectional view showing formation of a nickel metal layer of 50 to 70 μm on the release film by electroforming. (D) A cross-sectional view showing a step of transferring the metal layer to the first adhesive tape. (E) Sectional drawing which shows the step which transfers the said metal layer to a 2nd adhesive tape again. (F) A sectional view showing the form of an adhesive tape holding a metal transfer pattern. (G) A sectional view showing a step of partially applying an adhesive to the back surface of the metal transfer pattern. (H) Sectional drawing which shows the form which stuck the liner which protects the said adhesive agent.

【図3】本発明実施例1の場合の金属転写パターンを使
用する段階のプロセスを示す図。 (イ)ライナーを除去被接着表面に接着しようとするス
テップの断面図。 (ロ)被接着表面に接着の完了した時の断面図。 (ハ)被接着表面に接着の完了した時の平面図。
FIG. 3 is a diagram showing a process of a step of using a metal transfer pattern in the case of Example 1 of the present invention. (A) A cross-sectional view of the step of removing the liner and attempting to adhere to the surface to be adhered. (B) A cross-sectional view when the bonding is completed on the surface to be bonded. (C) A plan view when the bonding is completed on the surface to be bonded.

【図4】本発明実施例2の場合のパターン形成段階のス
テップを示す図。 (イ)金属転写パターン平面レイアウト図。 (ロ)フォトレジストを2層積層した時の金属転写パタ
ーン平面レイアウト図。 (ハ)B−B’断面図。
FIG. 4 is a diagram showing steps in a pattern forming stage in the case of the second embodiment of the present invention. (A) A plan view of a metal transfer pattern layout. (B) A metal transfer pattern plane layout diagram when two layers of photoresist are laminated. (C) BB 'sectional drawing.

【図5】本発明実施例2の場合のパターン形成粘着テー
プに転写するまでプロセスのステップ毎の断面図。 (イ)図1におけるB−B’断面図。 (ロ)基板金属露出表面に離型皮膜化成処理を施したこ
とを示す断面図。 (ハ)上記離型皮膜上に電鋳法で50〜70μのニッケ
ル金属層形成を示す断面図。 (ニ)上記金属層を第1の粘着テープに転写するステッ
プを示す断面図。 (ホ)上記金属層を再び第2の粘着テープに転写するス
テップを示す断面図。 (ヘ)金属転写パターンを保持する粘着テープの形態を
示す断面図。 (ト)金属転写パターン裏面部に接着剤を部分塗布する
ステップを示す断面図。 (チ)上記接着剤を保護するライナーを貼付した形態を
示す断面図。
FIG. 5 is a cross-sectional view of each step of the process until transfer to the pattern-forming adhesive tape in the case of the second embodiment of the present invention. (A) BB 'sectional drawing in FIG. (B) A cross-sectional view showing that the release coating chemical conversion treatment is applied to the exposed surface of the substrate metal. (C) A cross-sectional view showing formation of a nickel metal layer of 50 to 70 μm on the release film by electroforming. (D) A cross-sectional view showing a step of transferring the metal layer to the first adhesive tape. (E) Sectional drawing which shows the step which transfers the said metal layer to a 2nd adhesive tape again. (F) A sectional view showing the form of an adhesive tape holding a metal transfer pattern. (G) A sectional view showing a step of partially applying an adhesive to the back surface of the metal transfer pattern. (H) Sectional drawing which shows the form which stuck the liner which protects the said adhesive agent.

【図6】本発明実施例2の場合の金属転写パターンを時
計文字板に使用する段階のプロセスを示す図。 (イ)ライナーを除去被接着面に接着しようとするステ
ップの断面図。 (ロ)被接着面に接着の完了した時の断面図。 (ハ)被接着面に接着の完了した時の時計文字板の平面
図。
FIG. 6 is a diagram showing a process of using a metal transfer pattern for a timepiece dial in the case of Embodiment 2 of the present invention. (A) A cross-sectional view of a step of attempting to adhere the liner to the adherend surface to be removed. (B) A cross-sectional view when the bonding is completed on the surface to be bonded. (C) A plan view of the timepiece dial when the bonding is completed on the surface to be bonded.

【図7】従来技術による金属転写パターンの製造方法を
示すプロセス図。 (イ)基板材にレジストを形成するステップの断面図。 (ロ)上記基板材の金属露出部へ金属電鋳析出層を得た
断面図。 (ハ)金属電鋳析出層を粘着テープに転写するステップ
の断面図。 (ニ)金属電鋳析出層を粘着テープに仮保持した断面
図。 (ホ)金属電鋳析出層裏面に接着剤を塗布するステップ
の断面図。 (ヘ)接着剤層を保護するためのライナー貼付後の断面
図。
FIG. 7 is a process diagram showing a method for manufacturing a metal transfer pattern according to a conventional technique. (A) A sectional view of a step of forming a resist on a substrate material. (B) A cross-sectional view of a metal electroformed deposited layer obtained on a metal exposed portion of the substrate material. (C) A sectional view of the step of transferring the metal electroformed deposition layer to the adhesive tape. (D) A cross-sectional view in which the metal electroforming deposition layer is temporarily held on an adhesive tape. (E) Sectional drawing of the step which applies an adhesive agent on the back surface of a metal electroformed deposition layer. (F) A cross-sectional view after attaching a liner for protecting the adhesive layer.

【図8】金属電鋳析出層をよりシャープなものにするた
めの厚膜レジスト断面図。
FIG. 8 is a thick film resist cross-sectional view for making a metal electroformed deposit layer sharper.

【符号の説明】[Explanation of symbols]

1 金属基板 2 切削溝 3 位置決めガイド 4 第1レジスト 5 第2レジスト 6 離型皮膜 7 電鋳析出した金属層 8 第1粘着テープ基材 9 第1粘着テープ粘着剤 10 第2粘着テープ基材 11 第2粘着テープ粘着剤 12 接着剤 13 接着剤層保護ライナー 14 被装飾物表面 1 Metal Substrate 2 Cutting Groove 3 Positioning Guide 4 First Resist 5 Second Resist 6 Release Film 7 Electroformed Metal Layer 8 First Adhesive Tape Base Material 9 First Adhesive Tape Adhesive 10 Second Adhesive Tape Base Material 11 Second adhesive tape Adhesive 12 Adhesive 13 Adhesive layer protective liner 14 Surface of object to be decorated

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】金属基板に第1のレジスト皮膜を形成した
後カッティングによってパターンを彫り込み、必要でな
い部分を第2のレジスト皮膜で被覆後露出している基板
金属表面に離型皮膜処理を施し、電鋳法により30〜1
00ミクロンの金属層の析出生成を行ない、この電鋳形
成された金属層を第1の粘着テープにその相互位置を保
持し粘着しつつ基板より剥がし取り、次に第2の粘着テ
ープに第1の粘着テープ上の相互位置を保持し粘着しつ
つ再び写し取り、電鋳形成された金属層のみの裏面に被
装飾品表面への接着用接着剤を塗布し、塗布された接着
剤表面保護用ライナーを添付することを特徴とする、金
属転写装飾パターンの製造方法。
1. A first resist film is formed on a metal substrate, and then a pattern is engraved by cutting, and an unnecessary portion is covered with a second resist film, and then the exposed metal surface of the substrate is subjected to a release film treatment, 30 to 1 by electroforming
A metal layer of 00 micron is deposited and formed, and this electroformed metal layer is peeled off from the substrate while holding its mutual position on the first adhesive tape and adhering, and then on the second adhesive tape. Retaining the mutual position on the adhesive tape and copying it again while adhering, applying an adhesive for adhering to the surface of the object to be decorated on the back side of only the electroformed metal layer, and protecting the applied adhesive surface A method for producing a metal transfer decorative pattern, which comprises attaching a liner.
JP12742693A 1993-05-28 1993-05-28 Production of metal transferred ornamental pattern Pending JPH06336690A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12742693A JPH06336690A (en) 1993-05-28 1993-05-28 Production of metal transferred ornamental pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12742693A JPH06336690A (en) 1993-05-28 1993-05-28 Production of metal transferred ornamental pattern

Publications (1)

Publication Number Publication Date
JPH06336690A true JPH06336690A (en) 1994-12-06

Family

ID=14959670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12742693A Pending JPH06336690A (en) 1993-05-28 1993-05-28 Production of metal transferred ornamental pattern

Country Status (1)

Country Link
JP (1) JPH06336690A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100403863B1 (en) * 2001-07-30 2003-11-03 조학희 Letter and device printing method using metal photoresister
JP2005290429A (en) * 2004-03-31 2005-10-20 Seiko Instruments Inc Method for producing electroformed component using low melting point metal

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100403863B1 (en) * 2001-07-30 2003-11-03 조학희 Letter and device printing method using metal photoresister
JP2005290429A (en) * 2004-03-31 2005-10-20 Seiko Instruments Inc Method for producing electroformed component using low melting point metal
JP4530262B2 (en) * 2004-03-31 2010-08-25 セイコーインスツル株式会社 Manufacturing method of electroformed parts using low melting point metal

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