JPH0633262A - Surface coating method of aluminum or aluminum alloy base body - Google Patents

Surface coating method of aluminum or aluminum alloy base body

Info

Publication number
JPH0633262A
JPH0633262A JP24149292A JP24149292A JPH0633262A JP H0633262 A JPH0633262 A JP H0633262A JP 24149292 A JP24149292 A JP 24149292A JP 24149292 A JP24149292 A JP 24149292A JP H0633262 A JPH0633262 A JP H0633262A
Authority
JP
Japan
Prior art keywords
aluminum
film
electrodeposition coating
ceramic
base body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24149292A
Other languages
Japanese (ja)
Other versions
JP3143225B2 (en
Inventor
Haruo Hanagata
晴雄 花形
Yasuhiro Takii
康裕 瀧井
Kazuo Yanagida
和夫 柳田
Hidesato Igarashi
英郷 五十嵐
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DEITSUPUSOOLE KK
Dipsol Chemicals Co Ltd
Original Assignee
DEITSUPUSOOLE KK
Dipsol Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DEITSUPUSOOLE KK, Dipsol Chemicals Co Ltd filed Critical DEITSUPUSOOLE KK
Priority to JP04241492A priority Critical patent/JP3143225B2/en
Publication of JPH0633262A publication Critical patent/JPH0633262A/en
Application granted granted Critical
Publication of JP3143225B2 publication Critical patent/JP3143225B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To form a multilayer film excellent in insulating property by applying electrodeposition coating on a ceramic coating film formed by an anodic spark discharge method on the surface of an aluminum metal base body. CONSTITUTION:A ceramic coating film is formed by an anodic spark discharging on the surface of an Al or alloy base body. Further, an electrodeposition coating film is formed on the ceramic film. By this method, excellent insulating property can be imparted to an Al die-cast or cast product. As for anodic spark discharging method, such a method is preferable that the Al base body is dipped in the electrolytic bath of an aq. soln. containing water-soluble or colloidal silicate and/or oxoacid, or suspension of ceramic fine particles in the soln. As for the electrodeposition coating, it is preferable that the ceramic film is sufficiently washed with deionized water or the like, hydro-extracted and dried, and then dipped in a cation electrodeposition coating material.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、絶縁性にすぐれる多層
皮膜をアルミニウムおよびアルミニウム合金基体表面に
形成する、陽極火花放電法と電着塗装法とを利用したア
ルミニウムおよびアルミニウム合金基体の表面被覆方法
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the surface coating of aluminum and aluminum alloy substrates using the anodic spark discharge method and the electrodeposition coating method, which forms a multi-layer coating having excellent insulating properties on the surface of aluminum and aluminum alloy substrates. It is about the method.

【0002】[0002]

【従来の技術】アルミニウムまたはアルミニウム合金基
体などのアルミニウム素材上に、特性の異なった表面被
覆を形成する方法として種々の方法が知られている。例
えば、耐食性を付与するために陽極火花放電法によりセ
ラミックス皮膜を形成する方法が知られている(特公昭
58−17278号公報、特公昭59−45722号公
報、特公昭60−12438号公報)。この方法よりセ
ラミックス皮膜を形成すると全体として、耐食性が向上
することが示されている。一方、電着塗装法も表面被覆
を形成する方法として知られている。アルミニウムまた
はアルミニウム合金基体などのアルミニウム素材上に、
電着塗装法を施す場合には、該アルミニウム素材に、先
ず下地処理としてリン酸化成皮膜処理、クロメート皮膜
処理及び陽極酸化等が行われている。アルミニウムまた
はアルミニウム合金基体などのアルミニウム素材上にセ
ラミックス皮膜を形成すると絶縁性は向上するが、さら
に絶縁性を向上させることができる方法については知ら
れていない。
2. Description of the Related Art Various methods are known as methods for forming surface coatings having different characteristics on an aluminum material such as an aluminum or aluminum alloy substrate. For example, a method of forming a ceramic film by an anode spark discharge method to impart corrosion resistance is known (Japanese Patent Publication No. 58-17278, Japanese Patent Publication No. 59-45722, Japanese Patent Publication No. 60-12438). It has been shown that the formation of a ceramic film by this method improves the corrosion resistance as a whole. On the other hand, the electrodeposition coating method is also known as a method for forming a surface coating. On aluminum material such as aluminum or aluminum alloy substrate,
When the electrodeposition coating method is applied, the aluminum material is first subjected to a phosphoric acid conversion film treatment, a chromate film treatment, an anodization and the like as a base treatment. When a ceramic film is formed on an aluminum material such as an aluminum or aluminum alloy substrate, the insulating property is improved, but there is no known method capable of further improving the insulating property.

【0003】[0003]

【発明が解決しようとする課題】従って、本発明は、ア
ルミニウムまたはアルミニウム合金素材表面にセラミッ
クス皮膜を形成した材料の絶縁性を向上させることがで
きる方法を提供することを目的とする。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide a method capable of improving the insulating property of a material having a ceramic film formed on the surface of an aluminum or aluminum alloy material.

【0004】[0004]

【課題を解決するための手段】本発明は、アルミニウム
またはアルミニウム合金素材表面に形成したセラミック
ス皮膜上に電着塗装皮膜を形成すると、上記目的を効率
的に達成できるとの知見に基づいてなされたのである。
すなわち、本発明は、陽極火花放電法によってアルミニ
ウム又はアルミニウム合金基体表面に形成したセラミッ
クス皮膜上に、電着塗装を行なうことを特徴とするアル
ミニウムまたはアルミニウム合金基体の表面被覆方法を
提供する。本発明で使用するアルミニウム基体として
は、アルミニウムまたはアルミニウム合金があげられ
る。アルミニウムダイカスト、鋳物等の複雑な形状品に
も均一に皮膜を形成できる。本発明では、先ず、アルミ
ニウム基体上に陽極火花放電法によるセラミックス皮膜
の形成する。陽極火花放電法によるセラミックス皮膜の
形成方法及び組成は、例えば特公昭58−17298号
公報及び特開平3−94077号公報に記載のものを用
いることができる。より具体的には、セラミックス皮膜
を形成させる陽極火花放電法としては、水溶性若しくは
コロイド状ケイ酸塩及び/又は酸素酸塩を含有する水溶
液ないし、それらにセラミックス微粒子を懸濁させた電
解浴中にアルミニウム系素材を浸して陽極火花放電を行
なう方法が好ましい。
The present invention has been made based on the finding that the above object can be efficiently achieved by forming an electrodeposition coating film on a ceramic film formed on the surface of an aluminum or aluminum alloy material. Of.
That is, the present invention provides a surface coating method for an aluminum or aluminum alloy substrate, which comprises subjecting a ceramic film formed on the surface of an aluminum or aluminum alloy substrate by an anode spark discharge method to electrodeposition coating. Examples of the aluminum substrate used in the present invention include aluminum and aluminum alloys. A film can be evenly formed on complicated shaped products such as aluminum die castings and castings. In the present invention, first, a ceramic film is formed on an aluminum substrate by the anodic spark discharge method. As a method and composition for forming a ceramic film by the anode spark discharge method, those described in JP-B-58-17298 and JP-A-3-94077 can be used. More specifically, as an anode spark discharge method for forming a ceramic film, an aqueous solution containing a water-soluble or colloidal silicate and / or oxyacid salt or an electrolytic bath in which ceramic fine particles are suspended is used. A method in which an aluminum-based material is dipped in to perform anode spark discharge is preferable.

【0005】ここで、ケイ酸塩としては、一般的 M2O・
nSiO2 (Mはアルカリ金属を示し、nは0.5乃至100
の整数を示す)で表わされる種々の水溶性のもの、例え
ば、ケイ酸ナトリウム、ケイ酸カリウム、ケイ酸リチウ
ムと、水分散性のものとしてはコロイダルシリカ等を挙
げることができる。又、酸素酸塩としては、タングステ
ン酸、錫酸塩、モリブデン酸、ホウ酸塩、アルミン酸
塩、リン酸塩等などの一種又は二種以上の混合物があげ
られる。本発明では、上記ケイ酸塩又は酸素酸塩単独
で、若しくは2種以上の混合物として、又は両者の混合
物として用いることができる。さらに、溶解性無機フッ
ソ化合物の水溶液への添加が、火花放電皮膜の形成促進
に有効である。ここに用いる溶解性無機フッソ化合物と
しては、HF、NaF 、KF、HBF4、NaBF4 、KBF4、H2SiF8
Na2SiF5 、K2SiF8等を上げることができる。さらに、電
解浴に不溶性で分散可能な種々のセラミックス微粒子を
懸濁させてもよい。例えば、Al2O3 、Al(OH)3 、SiO2
3Al2O3・2SiO2 、TiO2、ZrO2、部分安定化したジルコニ
ア、安定化ジルコニア、Cr2O3 等の酸化物系セラミック
スやSiC、TiC、TiN、TiB、ZrB、BN、WC、WS
i2、MoSi2 等の非酸化物系セラミックスをあげることが
出来る。尚、これらは単独で、又は2種以上の混合物を
用いることができる(特願平1−228639号及び同
2−54827号)。これらのうち、特に、浴種として
は、ケイ酸塩を含むものや、さらにセラミックス微粒子
を懸濁させたもの、又は酸素酸塩にセラミックス微粒子
を懸濁させたものを用いるのがよい。
Here, as the silicate, general M 2 O.
nSiO 2 (M is an alkali metal, n is 0.5 to 100)
Various types of water-soluble substances such as sodium silicate, potassium silicate, and lithium silicate, and water-dispersible substances include colloidal silica and the like. Examples of the oxyacid salt include tungstic acid, stannate, molybdic acid, borate, aluminate, phosphate and the like, or a mixture of two or more thereof. In the present invention, the silicate or oxygenate can be used alone, as a mixture of two or more kinds, or as a mixture of both. Furthermore, addition of a soluble inorganic fluorine compound to an aqueous solution is effective in promoting formation of a spark discharge film. As the soluble inorganic fluorine compound used here, HF, NaF, KF, HBF 4 , NaBF 4 , KBF 4 , H 2 SiF 8 ,
Na 2 SiF 5 , K 2 SiF 8, etc. can be increased. Further, various insoluble and dispersible ceramic fine particles may be suspended in the electrolytic bath. For example, Al 2 O 3 , Al (OH) 3 , SiO 2 ,
3Al 2 O 3 · 2SiO 2, TiO 2, ZrO 2, partially stabilized zirconia, stabilized zirconia, oxide ceramics or SiC, such as Cr 2 O 3, TiC, TiN , TiB, ZrB, BN, WC, WS
Non-oxide ceramics such as i 2 and MoSi 2 can be cited. These may be used alone or as a mixture of two or more kinds (Japanese Patent Application Nos. 1-228639 and 2-54827). Among these, in particular, as the bath type, it is preferable to use a bath containing silicate, a suspension of ceramic fine particles, or a suspension of ceramic fine particles in an oxyacid salt.

【0006】電解浴に用いる水溶液中の水溶性若しくは
コロイド状ケイ酸塩及び/又は酸素酸塩の濃度は5g/
リットル以上が好ましく、25〜200g/リットルが
好適である。特に酸素酸塩では飽和に近い濃度とすると
皮膜形成速度が最も上昇するが、濃度上昇とともに形成
された皮膜が不均一となる現象も発生しやすくなるので
上記濃度とするのがよい。尚、水溶液のpHは任意である
が、3〜13.5とするのがよい。通常これらの金属基材
に火花放電皮膜を形成する場合、特に前処理を行なわな
くともよいが、脱脂、エッチング、酸洗等により充分に
清浄化しておくのが望ましい。又、ベーマイト処理等予
備的処理も必要としない。陰極には、鉄、ステンレス、
ニッケル等不溶性電極を用いる。火花放電を行う際の浴
温は、5〜90℃とするのが好ましく、15〜60℃が
より好ましい。低温では火花放電による皮膜の形成速度
がおそくなり、一方高温では、形成された皮膜が不均一
となりやすいからである。電解は定電流法で行ない、電
流密度は0.2〜20A/dm2 で行なうのがよく、好まし
くは1〜5A/dm 2 である。試料全面に均一に火花が発
生した後1〜30分間電解する。好ましくは、2〜10
分間である。又、電解終了時の電圧は150V以上に達
していなければならない、特に300V以上500V以
下が望ましい。整流器の出力は任意の波径の直流で良い
が、パルス波形(矩形波波形)、ノコギリ波形又は直流
半波波形が好ましい。パルス波形、ノコギリ波形がより
好ましい。火花放電皮膜の厚みは任意とすることができ
るが、1〜30μ、好ましくは3〜10μとするのがよ
い。
Water-soluble in an aqueous solution used for the electrolytic bath or
Colloidal silicate and / or oxygenate concentration is 5 g /
Liter or more is preferable, and 25 to 200 g / liter is preferable.
It is suitable. Especially for oxygenates, if the concentration is close to saturation,
The film formation speed increases the most, but forms with increasing concentration
The phenomenon that the formed film becomes non-uniform is likely to occur.
The above concentration is preferable. The pH of the aqueous solution is arbitrary
However, it is good to set it to 3 to 13.5. Usually these metal substrates
No special pretreatment is required when forming a spark discharge film on the
It may be fine, but degreasing, etching, pickling, etc.
It is desirable to clean it. Also, boehmite treatment etc.
No preparation is required. For the cathode, iron, stainless steel,
An insoluble electrode such as nickel is used. Bath for spark discharge
The temperature is preferably 5 to 90 ° C, preferably 15 to 60 ° C.
More preferable. Formation rate of film by spark discharge at low temperature
On the other hand, the formed film is non-uniform at high temperatures
It is easy to become. Electrolysis is performed by the constant current method,
Flow density is 0.2 to 20 A / dm2Good to do in
1-5 A / dm 2Is. Sparks are uniformly emitted over the entire surface of the sample.
Electrolyze for 1 to 30 minutes after birth. Preferably 2-10
It's a minute. Also, the voltage at the end of electrolysis reaches 150 V or higher.
Must be done, especially above 300V and below 500V
The bottom is desirable. The output of the rectifier may be a direct current of any wave size.
, Pulse waveform (rectangular waveform), sawtooth waveform or DC
Half-wave waveforms are preferred. More pulse waveforms and sawtooth waveforms
preferable. The thickness of the spark discharge coating can be arbitrary
However, it should be 1 to 30 μ, preferably 3 to 10 μ.
Yes.

【0007】本発明で電着塗装は常法により行なうこと
ができる。例えば、朝倉書店発行の“塗装の辞典”の第
154頁〜第161頁に記載の「5.9 電着塗装」の
欄や日刊工業新聞社発行の“塗装技術ハンドブック”の
第196頁〜第205頁及び第293頁〜第307頁参
照のこと。本発明では、陽極火花放電により形成したセ
ラミックス膜は、充分に脱イオン水等により洗浄し、好
ましくは水切り乾燥等行なった後、電着塗装液に浸漬し
て電着を行なうのがよい。電着塗料の種類は大別すると
カチオン系とアニオン系とがあるが、カチオン系電着塗
料が好ましい。ここで用いるカチオン電着塗料の種類は
任意で良いが、エポキシ系、アクリル系等をあげること
ができる。耐食性を目的とした用途としては、エポキシ
系が好ましい。一方、アニオン電着塗料としては、乾性
油、ポリブタジエン、エポキシエステル、ポリアクリル
酸エステル、アクリルメラミン系等を主骨格としたポリ
カルボン酸樹脂を用いた塗料をあげることができる。液
温、塗料の攪拌や陽極等は使用する塗料の性質に沿った
ものとし、一般的にエポキシ系カチオン電着塗料では、
液温は25〜30℃、陽極はAnion 交換隔膜を用いた隔
膜陽極を用いるのがよい。通電法としては、基本的に定
電圧法とし、通電開始時から、所定の電圧とする通称ド
カン法と、開始時より序々に電圧を上昇させるスロース
タート法があるが、スロースタート法がより好ましい。
電圧は塗料の性質により又、必要とする膜厚により決定
するが、一般的前処理による最適電圧より10〜50V
上昇させた方が良い。エポキシ系カチオン電着塗料では
190〜350Vである。カチオン電着塗膜の厚みは任
意とすることができるが、3〜50μ、好ましくは10
〜30μとするのがよい。電着処理後、焼付け炉中で焼
付処理を行なうのがよい。塗料の種類により条件は変わ
るが、通常130〜230℃で10〜60分行なうのが
よい。
In the present invention, electrodeposition coating can be carried out by a conventional method. For example, in the "Painting Dictionary" published by Asakura Shoten, pages 154 to 161 and the section "5.9 Electrodeposition coating" and "Painting Technology Handbook", published by Nikkan Kogyo Shimbun, page 196 to page 161. See pages 205 and 293-307. In the present invention, the ceramic film formed by anodic spark discharge should be thoroughly washed with deionized water or the like, preferably drained and dried, and then immersed in an electrodeposition coating solution for electrodeposition. The types of electrodeposition coatings are roughly classified into cation type and anion type, but cation type electrodeposition coatings are preferable. The cationic electrodeposition paint used here may be of any type, and examples thereof include epoxy type and acrylic type. Epoxy resins are preferred for use for the purpose of corrosion resistance. On the other hand, examples of the anionic electrodeposition coating material include coating materials using a polycarboxylic acid resin having a main skeleton of a drying oil, polybutadiene, epoxy ester, polyacrylic acid ester, acryl melamine type and the like. The liquid temperature, the stirring of the paint, the anode, etc. should be in accordance with the properties of the paint used, and generally in the epoxy cationic electrodeposition paint,
The liquid temperature is 25 to 30 ° C., and the anode is a diaphragm anode using an Anion exchange diaphragm. The energization method is basically a constant voltage method, and there are a so-called Dokan method in which a predetermined voltage is applied from the start of energization and a slow start method in which the voltage is gradually increased from the start, but the slow start method is more preferable. .
The voltage is determined by the properties of the paint and the required film thickness, but is 10 to 50 V from the optimum voltage by general pretreatment.
It is better to raise it. It is 190 to 350 V for the epoxy-based cationic electrodeposition coating. The thickness of the cationic electrodeposition coating film may be arbitrary, but it is 3 to 50 μm, preferably 10 μm.
It is preferable to set it to -30 μ. After the electrodeposition process, it is preferable to perform the baking process in a baking furnace. Although the conditions vary depending on the type of paint, it is usually good to carry out at 130 to 230 ° C. for 10 to 60 minutes.

【0008】[0008]

【発明の効果】本発明によれば、リサイクル化、軽量化
の要求により増々用途の広がっているアルミニウム部
品、特に、ダイカストや鋳物部品に、優れた絶縁特性を
付与することができる。従って、本発明の方法により多
層皮膜を形成したアルミニウムおよびアルミニウム合金
素材は、軽量化等の特性を利用するとともに、一般的な
特性、たとえば耐食性等に加え優れた絶縁特性により幅
広い利用が期待されている。又、アルミニウム線材ない
しアルミニウムを最外層とする電線、例えば、アルミニ
ウムクラッド電線にこの多層皮膜を形成すれば、すぐれ
た絶縁被覆電線とすることができる。次に本発明を実施
例により説明する。
According to the present invention, excellent insulating properties can be imparted to aluminum parts, particularly die castings and casting parts, which are increasingly used due to the demand for recycling and weight reduction. Therefore, the aluminum and aluminum alloy materials on which the multilayer film is formed by the method of the present invention are expected to be widely used due to their properties such as weight reduction and general properties such as corrosion resistance and excellent insulating properties. There is. Further, by forming this multilayer film on an aluminum wire or an electric wire having aluminum as the outermost layer, for example, an aluminum clad electric wire, an excellent insulated covered electric wire can be obtained. Next, the present invention will be described with reference to examples.

【0009】[0009]

【実施例】【Example】

実施例1 アルミダイカスト部品(JIS ADC−12材)を脱
脂、活性化し清浄化した後、K2O-nSiO2 、200g/リ
ットル液中に浸漬し、火花放電法により5μmのセラミ
ックス皮膜を形成した。洗浄は市水とイオン交換水で充
分に行ない、130℃で10分水切り乾燥した。放冷
後、エポキシ−ポリアミド系樹脂と顔料(チタン白、カ
ーボン等)、溶剤、中和剤からなるエポキシ系カチオン
電着塗料(ディップソール(株)、商品名ED−63
0)により、液温28℃、電圧220Vで、電着し、1
80℃で20分焼きつけた。これにより、15μmのハ
ジキ、ヘコミ、ピンホール、ぶつ等のない、美麗なカチ
オン電着塗膜が形成された。 実施例2 実施例1と同様のアルミダイカスト部品を、同様に清浄
化した後、K2O-nSiO2、200g/リットル、NaF 、4
g/リットル液中に浸漬し、火花放電法により5μmの
セラミックス皮膜を形成した。その後、実施例1と同様
に洗浄、乾燥後、同様な条件で、カチオン電着塗装し
た。これにより、美麗な15μmのカチオン電着塗膜が
形成された。
Example 1 An aluminum die casting part (JIS ADC-12 material) was degreased, activated and cleaned, and then immersed in a K 2 O-nSiO 2 solution (200 g / liter) to form a ceramic film of 5 μm by a spark discharge method. . Washing was sufficiently performed with city water and ion-exchanged water, and drained and dried at 130 ° C. for 10 minutes. After cooling, an epoxy-cationic electrodeposition coating composition (Dipsol Co., Ltd., trade name ED-63) consisting of an epoxy-polyamide resin and a pigment (titanium white, carbon, etc.), a solvent and a neutralizer
0), liquid temperature 28 ℃, voltage 220V, electrodeposition, 1
It was baked at 80 ° C. for 20 minutes. As a result, a beautiful cationic electrodeposition coating film of 15 μm without cissing, dents, pinholes, bumps, etc. was formed. Example 2 An aluminum die-cast component similar to that of Example 1 was cleaned in the same manner and then K 2 O—nSiO 2 , 200 g / liter, NaF 4,
It was dipped in a g / l liquid and a 5 μm ceramics film was formed by a spark discharge method. Then, after washing and drying in the same manner as in Example 1, cationic electrodeposition coating was performed under the same conditions. As a result, a beautiful 15 μm cationic electrodeposition coating film was formed.

【0010】実施例3 実施例1と同様のアルミダイカスト部品を同様に清浄化
した後、Na4P2O17・10H2O 、80g/リットルの水溶液
にCr2O2 微粒子(日本電工(株)製、商品名、ND−8
02、平均粒子径0.7μm)50g/リットルを懸濁さ
せた溶液中で、火花放電法により、3μmのセラミック
ス皮膜を形成した。その後、実施例1と同様に洗浄、乾
燥後同一のカチオン電着塗料により、液温280℃、電
圧240Vで電着し、180℃で20分間焼き付けた。
これにより11μmのハジキ、ヘコミ、ピンホール、ぶ
つ等のない、美麗なカチオン電着塗膜が形成された。
Example 3 An aluminum die-cast component similar to that of Example 1 was cleaned in the same manner, and then Cr 2 O 2 fine particles (Nihon Denko Co., Ltd.) were added to an aqueous solution of Na 4 P 2 O 17 · 10H 2 O of 80 g / liter. ), Product name, ND-8
02, average particle diameter 0.7 μm) In a solution in which 50 g / liter was suspended, a ceramic film of 3 μm was formed by a spark discharge method. Then, after washing and drying in the same manner as in Example 1, the same cationic electrodeposition coating material was electrodeposited at a liquid temperature of 280 ° C. and a voltage of 240 V, and baked at 180 ° C. for 20 minutes.
As a result, a beautiful cationic electrodeposition coating film of 11 μm without cissing, dents, pinholes, bumps or the like was formed.

【0011】実施例4 実施例1と同様の基体に実施例1と同様の操作によりセ
ラミックス皮膜を形成し、同様の洗浄及び乾燥を行なっ
た。放冷後、ポリブタジエン系樹脂と顔料(チタン白、
カーボン等)、溶剤及び中和剤からなるアニオン電着塗
料(関西ペイント(株)、商品名#7200)を用い
て、液温28℃、電圧110Vで電着塗装し、180℃
で20分間焼きつけた。これによりハジキ、ヘコミ、ピ
ンホールやぶつ等のない美麗な15μmのアニオン電着
塗膜が形成された。 比較例1 実施例1と同様のアルミダイカスト部品をブラスト処理
した後、脱脂、エッチング、活性化し清浄化した後、ク
ロメート処理液(デイップソール(株)、AL−710
A、20ml/リットル、AL−710B、3g/リット
ル)により、クロメート皮膜処理した後、水洗、乾燥
し、他の条件は実施例1と同様とし、カチオン電着塗装
を行なった。 比較例2 実施例1と同様な部品に同様な操作で火花放電法により
セラミックス皮膜を形成し、洗浄、乾燥を同様に行なっ
た。但し、電着塗装は行なわなかった。
Example 4 A ceramic film was formed on the same substrate as in Example 1 by the same operation as in Example 1, and the same washing and drying were performed. After left to cool, polybutadiene resin and pigment (white titanium,
Carbon, etc.), an anionic electrodeposition paint (Kansai Paint Co., Ltd., trade name # 7200) consisting of a solvent and a neutralizing agent, and is electrodeposited at a liquid temperature of 28 ° C. and a voltage of 110 V to 180 ° C.
Baked for 20 minutes. As a result, a beautiful 15 μm anion electrodeposition coating film without cissing, dents, pinholes or bumps was formed. Comparative Example 1 The same aluminum die casting component as in Example 1 was blasted, degreased, etched, activated and cleaned, and then chromated (Dipsol Co., Ltd., AL-710).
A, 20 ml / liter, AL-710B, 3 g / liter), followed by cation electrodeposition coating under the same conditions as in Example 1, except that the chromate film treatment was followed by water washing and drying. Comparative Example 2 A ceramic film was formed on the same parts as in Example 1 by the same operation by the spark discharge method, and washing and drying were performed in the same manner. However, electrodeposition coating was not performed.

【0012】上記実施例及び比較例により得られた多層
皮膜を表面に有するアルミニウム基体の絶縁破壊電圧を
次のようにして測定した。絶縁破壊電圧 JIS C2110固体電気絶縁材料の絶縁体力の試験
方法のワニス塗膜試験方法に準じた方法により、破壊電
圧計B−5110AF型((株)フェイス社製)で測定
した。結果を次に示す。
The dielectric breakdown voltage of the aluminum substrate having the multilayer coating on the surface obtained in the above Examples and Comparative Examples was measured as follows. Dielectric breakdown voltage Measured with a breakdown voltage meter B-5110AF type (manufactured by Faith Co., Ltd.) by a method according to the varnish coating film test method of the insulation strength test method of JIS C2110 solid electrical insulating material. The results are shown below.

【表1】 表−1 [Table 1] Table-1

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 陽極火花放電法によってアルミニウム又
はアルミニウム合金基体表面に形成したセラミックス皮
膜上に、電着塗装を行なうことを特徴とするアルミニウ
ムまたはアルミニウム合金基体の表面被覆方法。
1. A method of coating a surface of an aluminum or aluminum alloy substrate, which comprises performing electrodeposition coating on a ceramic film formed on the surface of an aluminum or aluminum alloy substrate by an anode spark discharge method.
JP04241492A 1992-05-21 1992-09-10 Surface coating method for aluminum or aluminum alloy substrate Expired - Fee Related JP3143225B2 (en)

Priority Applications (1)

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Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP4-128974 1992-05-21
JP12897492 1992-05-21
JP04241492A JP3143225B2 (en) 1992-05-21 1992-09-10 Surface coating method for aluminum or aluminum alloy substrate

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1420086A1 (en) * 2002-11-14 2004-05-19 Elisha Holding LLC Process for electrocoating and articles made therefrom
US20080093223A1 (en) * 2004-11-05 2008-04-24 Nobuaki Yoshioka Method for electrolytically depositing a ceramic coating on a metal, electrolyte for such electrolytic ceramic coating method, and metal member
US8999133B2 (en) 2010-08-30 2015-04-07 Sharp Kabushiki Kaisha Method for forming anodized layer and mold production method

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101798696B (en) * 2010-02-05 2011-08-17 广东工业大学 Preparation method of titanium carbide-based multi-ceramic coating

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1420086A1 (en) * 2002-11-14 2004-05-19 Elisha Holding LLC Process for electrocoating and articles made therefrom
WO2004046425A2 (en) * 2002-11-14 2004-06-03 Elisha Holding Llc Processes for electrocoating and articles made therefrom
WO2004046425A3 (en) * 2002-11-14 2004-11-18 Elisha Holding Llc Processes for electrocoating and articles made therefrom
US20080093223A1 (en) * 2004-11-05 2008-04-24 Nobuaki Yoshioka Method for electrolytically depositing a ceramic coating on a metal, electrolyte for such electrolytic ceramic coating method, and metal member
US8999133B2 (en) 2010-08-30 2015-04-07 Sharp Kabushiki Kaisha Method for forming anodized layer and mold production method

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