JPH06321829A - Alpha,alpha-dimethylcyclohexanecarbinol derivative or its salt - Google Patents

Alpha,alpha-dimethylcyclohexanecarbinol derivative or its salt

Info

Publication number
JPH06321829A
JPH06321829A JP5131205A JP13120593A JPH06321829A JP H06321829 A JPH06321829 A JP H06321829A JP 5131205 A JP5131205 A JP 5131205A JP 13120593 A JP13120593 A JP 13120593A JP H06321829 A JPH06321829 A JP H06321829A
Authority
JP
Japan
Prior art keywords
group
hydroxy
reaction
formula
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5131205A
Other languages
Japanese (ja)
Inventor
Masayasu Kimura
正康 木村
Ikuko Kimura
郁子 木村
Shingo Yano
伸吾 矢野
Motoaki Tanaka
基明 田中
Katsunao Tanaka
克尚 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiho Pharmaceutical Co Ltd
Original Assignee
Taiho Pharmaceutical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiho Pharmaceutical Co Ltd filed Critical Taiho Pharmaceutical Co Ltd
Priority to JP5131205A priority Critical patent/JPH06321829A/en
Publication of JPH06321829A publication Critical patent/JPH06321829A/en
Pending legal-status Critical Current

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  • Heterocyclic Compounds That Contain Two Or More Ring Oxygen Atoms (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

PURPOSE:To obtain a new alpha, alpha-dimethylcyclohexanecarbinol derivative or its salt, having myoneural blocking and arterialization inhibiting actions and useful as a medicine. CONSTITUTION:This alpha,alpha-dimethylcyclohexanecarbinol derivative or its salt is expressed by formula 1 [R is amino, lower alkenyl, lower acyl, exo-methylene, OH, oxo, lower alkoxy or 1,3-dioxane forming a spiro ring; (m) is 0-3, except the case where (m) is 0-1 and R is lower alkoxy substituted at the 2-position; (m) is 0-1 and R is lower acyl substituted at the 4-position; (m) is 0-1 and R is amino substituted at the 2- or 3-position and (m) is 0-1 and R is exo- methylene,0H or oxo[, e.g. 3-(4-hydroxy-4-methylpentyl)cyclohexanol. The compound expressed by formula 1 is obtained by starting from, e.g. a compound expressed by formula 2 (R<2> is alkoxycarbonyl, etc.) through a compound expressed by formula 3 (X is alkylene, etc.) or a compound expressed by formula 4.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は新規なα,α−ジメチル
シクロヘキサンカルビノール誘導体又はその塩に関す
る。本発明のα,α−ジメチルシクロヘキサンカルビノ
ール誘導体は、神経筋遮断作用及び血管新生阻害作用を
有しており医薬品として有用である。
The present invention relates to a novel α, α-dimethylcyclohexanecarbinol derivative or a salt thereof. INDUSTRIAL APPLICABILITY The α, α-dimethylcyclohexanecarbinol derivative of the present invention has a neuromuscular blocking action and angiogenesis inhibiting action and is useful as a pharmaceutical.

【0002】[0002]

【従来の技術】現在、α,α−ジメチルシクロヘキサン
カルビノール誘導体としては、Aust.J.Chem.,3
7,629(1984)、特開昭58−187158号、及び特
開昭55−23977号に記載されている化合物等が挙
げられるが、これら化合物の生物学的挙動についての記
載は無い。また特開昭55−92349号に記載されて
いる化合物において抗アレルギー作用、抗腫瘍作用、抗
リウマチ作用、抗炎症作用をもつα,α−ジメチルシク
ロヘキサンカルビノール誘導体が挙げられるがシクロヘ
キサン環の4位にメチル基、シアノ基またはカルバモイ
ル基が置換されており、本発明化合物の置換基とは異な
つている。
2. Description of the Related Art Currently, as an α, α-dimethylcyclohexanecarbinol derivative, Aust. J. Chem., 3
7 , 629 (1984), JP-A-58-187158 and JP-A-55-23977, and the like, but the biological behavior of these compounds is not described. Further, compounds described in JP-A-55-92349 include α, α-dimethylcyclohexanecarbinol derivatives having antiallergic action, antitumor action, antirheumatic action and antiinflammatory action, but they are at the 4-position of the cyclohexane ring. Is substituted with a methyl group, a cyano group or a carbamoyl group, which is different from the substituent of the compound of the present invention.

【0003】[0003]

【発明が解決しようとする課題】本発明の目的は、神経
筋遮断作用を有し運動麻痺などの治療薬として、また血
管新生阻害作用を有し、慢性関節リウマチ、慢性腎炎、
慢性肝炎等の慢性炎症、乾癬、癌、糖尿病性網膜症、動
脈硬化等の治療薬として有用な新規なα,α−ジメチル
シクロヘキサンカルビノール誘導体又はその塩を提供す
ることにある。
DISCLOSURE OF THE INVENTION The object of the present invention is to treat rheumatoid arthritis, chronic nephritis, as a therapeutic agent for neuromuscular blockade and as a therapeutic agent for motor paralysis, and also for angiogenesis inhibition.
It is intended to provide a novel α, α-dimethylcyclohexanecarbinol derivative or a salt thereof useful as a therapeutic drug for chronic inflammation such as chronic hepatitis, psoriasis, cancer, diabetic retinopathy, arteriosclerosis and the like.

【0004】[0004]

【課題を解決するための手段】本発明は一般式[化2]
で表されるα,α−ジメチルシクロヘキサンカルビノー
ル誘導体又はその塩に係る。
The present invention has the general formula [Chemical formula 2]
The α, α-dimethylcyclohexanecarbinol derivative represented by or a salt thereof.

【0005】[0005]

【化2】 [Chemical 2]

【0006】[式中、Rはアミノ基、低級アルケニル
基、低級アシル基、エキソメチレン基、水酸基、オキソ
基、低級アルコキシ基又はスピロ環を形成する1,3−
ジオキサンを、mは0〜3を示す。但しmが0〜1でR
が2位に置換された低級アルコキシ基、mが0〜1でR
が4位に置換された低級アシル基、mが0〜1でRが2
位又は3位に置換されたアミノ基、あるいはmが0〜1
でRがエキソメチレン基、水酸基又はオキソ基の場合を
除く。]
[In the formula, R is an amino group, a lower alkenyl group, a lower acyl group, an exomethylene group, a hydroxyl group, an oxo group, a lower alkoxy group or 1,3-forming a spiro ring.
Dioxane and m are 0 to 3. However, m is 0 to 1 and R
Is a lower alkoxy group substituted at the 2-position, m is 0 to 1 and R
Is a lower acyl group substituted at the 4-position, m is 0 to 1 and R is 2
Amino group substituted at the 3-position or 3-position, or m is 0 to 1
Except when R is an exomethylene group, a hydroxyl group or an oxo group. ]

【0007】本発明においてRで示される低級アルケニ
ル基としては、例えば、ビニル、アリル、イソプロペニ
ル、1−ブテニル、1−ブテ−2−ニル、1−ブテ−3
−ニル、2−ブテニル、2−ブテ−2−ニル、2−ブテ
−3−ニル、1−イソブテニル、2−イソブテニル等の
炭素数2から4の直鎖状または分枝状のアルケニル基を
例示できる。
In the present invention, the lower alkenyl group represented by R is, for example, vinyl, allyl, isopropenyl, 1-butenyl, 1-but-2-enyl, 1-bute-3.
-2, 4-, 2-butenyl, 2-but-2-enyl, 2-but-3-yl, 1-isobutenyl, 2-isobutenyl and the like straight-chain or branched alkenyl groups having 2 to 4 carbon atoms. Can be illustrated.

【0008】低級アシル基としては、アセチル、プロピ
オニル、ブチリル、イソブチリル基等の炭素数2から4
の直鎖状または分枝状のアシル基を例示できる。
The lower acyl group has 2 to 4 carbon atoms such as acetyl, propionyl, butyryl and isobutyryl groups.
The linear or branched acyl group can be exemplified.

【0009】低級アルコキシ基としては、例えば、メト
キシ、エトキシ、n−プロポキシ、イソプロポキシ、n
−ブトキシ、イソブトキシ、t−ブトキシ基等の炭素数
1から4の直線状または分枝状のアルコキシ基を例示で
きる。
Examples of the lower alkoxy group include methoxy, ethoxy, n-propoxy, isopropoxy and n.
Examples thereof include linear or branched alkoxy groups having 1 to 4 carbon atoms such as -butoxy, isobutoxy and t-butoxy groups.

【0010】また本発明の具体的な化合物としては3−
(4−ヒドロキシ−4−メチルペンチル)シクロヘキサ
ノール、3−(4−ヒドロキシ−4−メチルペンチル)
メトキシシクロヘキサン、3−(3−ヒドロキシ−3−
メチルブチル)シクロヘキサノール、2−(3−ヒドロ
キシ−3−メチルブチル)シクロヘキサノール、3−
(4−ヒドロキシ−4−メチルペンチル)シクロヘキサ
ノン、3−(3−ヒドロキシ−3−メチルブチル)シク
ロヘキサノン、3−(1−ヒドロキシ−1−メチルエチ
ル)アセチルシクロヘキサン、3−(4−ヒドロキシ−
4−メチルペンチル)シクロヘキシリデン、3−(3−
ヒドロキシ−3−メチルブチル)シクロヘキシリデン、
3−(1−ヒドロキシ−1−メチルエチル)イソプロペ
ニルシクロヘキサン、4−(1−ヒドロキシ−1−メチ
ルエチル)シクロヘキシルアミン、2−(3−ヒドロキ
シ−3−メチルブチル)シクロヘキシリデン、7−
(3'−ヒドロキシ−3'−メチルブチル)−1,5−ジ
オキソスピロ[5,5]ウンデカンが例示できる。
Specific compounds of the present invention include 3-
(4-Hydroxy-4-methylpentyl) cyclohexanol, 3- (4-hydroxy-4-methylpentyl)
Methoxycyclohexane, 3- (3-hydroxy-3-
Methylbutyl) cyclohexanol, 2- (3-hydroxy-3-methylbutyl) cyclohexanol, 3-
(4-hydroxy-4-methylpentyl) cyclohexanone, 3- (3-hydroxy-3-methylbutyl) cyclohexanone, 3- (1-hydroxy-1-methylethyl) acetylcyclohexane, 3- (4-hydroxy-
4-methylpentyl) cyclohexylidene, 3- (3-
Hydroxy-3-methylbutyl) cyclohexylidene,
3- (1-hydroxy-1-methylethyl) isopropenylcyclohexane, 4- (1-hydroxy-1-methylethyl) cyclohexylamine, 2- (3-hydroxy-3-methylbutyl) cyclohexylidene, 7-
An example is (3'-hydroxy-3'-methylbutyl) -1,5-dioxospiro [5,5] undecane.

【0011】一般式(1)で表される本発明化合物は、
神経筋遮断作用を有し運動麻痺などの治療薬として、ま
た血管新生阻害作用を有し、慢性関節リウマチ、慢性腎
炎、慢性肝炎等の慢性炎症、乾癬、癌、糖尿病性網膜
症、動脈硬化等の治療薬として有用である。
The compound of the present invention represented by the general formula (1) is
It has a neuromuscular blocking effect and a therapeutic drug for motor paralysis, and also has an angiogenesis inhibiting effect, chronic inflammation such as rheumatoid arthritis, chronic nephritis, chronic hepatitis, psoriasis, cancer, diabetic retinopathy, arteriosclerosis, etc. It is useful as a remedy for.

【0012】一般式(1)で表される本発明化合物は、
下記[化3]〜[化7]に示す反応工程式により製造さ
れる。[化3]及び[化4]の反応工程式で原料として
使用される、一般式(2)、(4)、(5)で表される
化合物は、公知の入手容易な化合物、あるいは従来公知
の合成法により製造することもできる。ここで公知の入
手容易な化合物、あるいは従来公知の合成法としては、
J.Med.Chem.,35,958(1992)記載の化合物、
J.Am.Chem.Soc.,86,5626(1964)記載の合成
法が挙げられるが、これらに限定されるものではない。
The compound of the present invention represented by the general formula (1) is
It is produced by the reaction process formulas shown in [Chemical Formula 3] to [Chemical Formula 7] below. The compounds represented by the general formulas (2), (4) and (5), which are used as raw materials in the reaction process formulas of [Chemical Formula 3] and [Chemical Formula 4], are publicly known and readily available compounds, or conventionally publicly known compounds. It can also be produced by the synthetic method of. Here, as a known and easily available compound, or a conventionally known synthetic method,
J. Med. Chem., 35 , 958 (1992),
J. Am. Chem. Soc., 86 , 5626 (1964), but not limited thereto.

【0013】[0013]

【化3】 [Chemical 3]

【0014】[式中、R、mは前記に同じ。R1は、ア
ミノ基、低級アルケニル基、低級アシル基、エキソメチ
レン基、水酸基、水酸基を有する低級アルキル基、オキ
ソ基、低級アルコキシ基、ベンジルオキシ基又はスピロ
環を形成する1,3−ジオキサンを示す。R2は低級アル
コキシカルボニル基、シアノ基、アセチル基を示す。X
は直鎖状低級アルキレン基及び直鎖状低級アルケニレン
基を示すか、又は直接結合を示す。]
[In the formula, R and m are the same as above. R 1 is an amino group, a lower alkenyl group, a lower acyl group, an exomethylene group, a hydroxyl group, a lower alkyl group having a hydroxyl group, an oxo group, a lower alkoxy group, a benzyloxy group or 1,3-dioxane forming a spiro ring. Show. R 2 represents a lower alkoxycarbonyl group, a cyano group or an acetyl group. X
Represents a linear lower alkylene group and a linear lower alkenylene group, or represents a direct bond. ]

【0015】上記のR1で示される低級アルケニル基、
低級アシル基、低級アルコキシ基としては、それぞれR
と同様な低級アルケニル基、低級アシル基、低級アルコ
キシ基が挙げられる。水酸基を有する低級アルキル基と
しては、例えば、ヒドロキシメチル、1−ヒドロキシエ
チル、2−ヒドロキシエチル、1−ヒドロキシプロピ
ル、2−ヒドロキシプロピル、3−ヒドロキシプロピ
ル、1−ヒドロキシ−2−プロピル、2−ヒドロキシ−
2−プロピル、1−ヒドロキシブチル、2−ヒドロキシ
ブチル、3−ヒドロキシブチル、4−ヒドロキシブチ
ル、1−ヒドロキシ−2−ブチル、2−ヒドロキシ−2
−ブチル、3−ヒドロキシ−2−ブチル、4−ヒドロキ
シ−2−ブチル等の水酸基1個を有する炭素数1から4
の直鎖状または分枝状のアルキル基を例示できる。
A lower alkenyl group represented by R 1 above,
The lower acyl group and the lower alkoxy group are each R
The same lower alkenyl group, lower acyl group, and lower alkoxy group as mentioned above can be mentioned. Examples of the lower alkyl group having a hydroxyl group include hydroxymethyl, 1-hydroxyethyl, 2-hydroxyethyl, 1-hydroxypropyl, 2-hydroxypropyl, 3-hydroxypropyl, 1-hydroxy-2-propyl, 2-hydroxy. −
2-propyl, 1-hydroxybutyl, 2-hydroxybutyl, 3-hydroxybutyl, 4-hydroxybutyl, 1-hydroxy-2-butyl, 2-hydroxy-2
1 to 4 carbon atoms having one hydroxyl group such as -butyl, 3-hydroxy-2-butyl, 4-hydroxy-2-butyl
The straight-chain or branched alkyl group can be exemplified.

【0016】上記のR2で示される低級アルコキシカル
ボニル基としては、メトキシカルボニル、エトキシカル
ボニル、n−プロポキシカルボニル、イソプロポキシカ
ルボニル、n−ブトキシカルボニル、sec−ブトキシカ
ルボニル、tert−ブトキシカルボニル等の炭素数2から
5の直鎖状または分枝状のアルコキシカルボニル基を例
示できる。
The lower alkoxycarbonyl group represented by R 2 is carbon number such as methoxycarbonyl, ethoxycarbonyl, n-propoxycarbonyl, isopropoxycarbonyl, n-butoxycarbonyl, sec-butoxycarbonyl and tert-butoxycarbonyl. 2 to 5 linear or branched alkoxycarbonyl groups can be exemplified.

【0017】上記のXで示される直鎖状低級アルキレン
基としては、メチレン、エチレン、プロピレン、ブチレ
ン等の炭素数1から4の直鎖状低級アルキレン基を例示
できる。また直鎖状低級アルケニレン基としては、例え
ば、ビニレン、1−プロペニレン、2−プロペニレン、
1−ブテニレン、2−ブテニレン、3−ブテニレン等の
炭素数2から4の直鎖状のアルケニレン基を例示でき
る。
Examples of the linear lower alkylene group represented by X above include linear lower alkylene groups having 1 to 4 carbon atoms such as methylene, ethylene, propylene and butylene. Examples of linear lower alkenylene groups include vinylene, 1-propenylene, 2-propenylene,
Examples thereof include linear alkenylene groups having 2 to 4 carbon atoms such as 1-butenylene, 2-butenylene and 3-butenylene.

【0018】各工程の詳細を次に述べる。Details of each step will be described below.

【0019】A工程 一般式(2)又は(4)で表される化合物を適当な溶媒
中、窒素雰囲気下、メチルアニオンと反応させることに
より一般式(3)又は(1)で表される化合物を得る。
ただしR2がシアノ基の時には、一旦メチルケトン体と
して単離し、さらに同様な反応を行うことによつても一
般式(3)又は(1)で表される化合物を得ることがで
きる。メチルアニオンのカウンターカチオンとしてはリ
チウムカチオン、マグネシウムカチオン等を例示でき
る。上記溶媒としては、反応に関与しなければ特に制限
は無く、例えば、エーテル、テトラヒドロフラン等のエ
ーテル類、塩化メチレン、クロロホルム等のハロゲン化
炭化水素類、ベンゼン、トルエン等の芳香族炭化水素類
等を例示できる。反応に際しては、一般式(2)又は
(4)で表される化合物に対してメチルアニオンは、2
〜10倍当量程度用いるのが好ましい。反応は−78℃から
室温程度であり、反応時間は30分から48時間程度で有利
に進行する。
Step A The compound represented by the general formula (3) or (1) is obtained by reacting the compound represented by the general formula (2) or (4) with a methyl anion in a suitable solvent under a nitrogen atmosphere. To get
However, when R 2 is a cyano group, the compound represented by the general formula (3) or (1) can be obtained by once isolating it as a methyl ketone body and then performing the same reaction. Examples of the counter cation of methyl anion include lithium cation and magnesium cation. The solvent is not particularly limited as long as it does not participate in the reaction, and examples thereof include ethers such as ether and tetrahydrofuran, halogenated hydrocarbons such as methylene chloride and chloroform, and aromatic hydrocarbons such as benzene and toluene. It can be illustrated. In the reaction, the methyl anion is 2 relative to the compound represented by the general formula (2) or (4).
It is preferable to use about 10 to 10 equivalents. The reaction proceeds from -78 ° C to room temperature, and the reaction time proceeds advantageously for about 30 minutes to 48 hours.

【0020】B工程 一般式(2)又は(3)で表される化合物を室温で適当
な溶媒中、金属触媒を加え水素加圧下で反応させること
により一般式(4)又は(1)で表される化合物を得
る。上記溶媒としては、反応に関与しなければ特に制限
はなく、例えば、メタノール、エタノール等のアルコー
ル類、テトラヒドロフラン、ジオキサン等のエーテル
類、N,N−ジメチルホルムアミド、水、酢酸等を例示
できる。金属触媒としては特に限定はないが、ロジウム
/アルミナ、白金、二酸化白金、ニツケル、パラジウム
/カーボン等を例示できる。金属触媒は、一般式(2)
又は(3)で表される化合物に対し、0.05〜0.5倍重量
比程度用いるのが好ましい。反応時間は、12時間から72
時間程度で有利に進行する。水素圧力は、1から200気
圧程度が好ましい。
Step B The compound represented by the general formula (4) or (1) is obtained by reacting the compound represented by the general formula (2) or (3) at room temperature in a suitable solvent with a metal catalyst and reacting under hydrogen pressure. To obtain the compound. The solvent is not particularly limited as long as it does not participate in the reaction, and examples thereof include alcohols such as methanol and ethanol, ethers such as tetrahydrofuran and dioxane, N, N-dimethylformamide, water, acetic acid and the like. The metal catalyst is not particularly limited, but rhodium / alumina, platinum, platinum dioxide, nickel, palladium / carbon and the like can be exemplified. The metal catalyst has the general formula (2)
Alternatively, it is preferable to use about 0.05 to 0.5 times the weight ratio of the compound represented by (3). Reaction time is 12 to 72 hours
It progresses in an advantageous manner in about time. The hydrogen pressure is preferably about 1 to 200 atm.

【0021】[0021]

【化4】 [Chemical 4]

【0022】[式中、mは前記に同じ。R3は水酸基又
は水酸基を有する低級アルキル基を示す。R4はオキソ
基又は低級アシル基を示す。R5はエキソメチレン基又
は低級アルケニル基を示す。]上記のR3で示される水
酸基を有する低級アルキル基としては、R1と同様な水
酸基を有する低級アルキル基が挙げられる。上記のR4
で示される低級アシル基及びR5で示される低級アルケ
ニル基としては、Rと同様な低級アシル基及び低級アル
ケニル基が挙げられる。]
[In the formula, m is the same as above. R 3 represents a hydroxyl group or a lower alkyl group having a hydroxyl group. R 4 represents an oxo group or a lower acyl group. R 5 represents an exomethylene group or a lower alkenyl group. Examples of the lower alkyl group having a hydroxyl group represented by R 3 include the lower alkyl group having a hydroxyl group similar to R 1 . R 4 above
Examples of the lower acyl group represented by and the lower alkenyl group represented by R 5 include the same lower acyl groups and lower alkenyl groups as R. ]

【0023】各工程の詳細を次に述べる。Details of each step will be described below.

【0024】C工程 [化3]の反応工程式で得られる一般式(5)で表され
る化合物を、適当な溶媒中、酸化剤と反応させることに
より一般式(1a)で表されるα,α−ジメチルシクロ
ヘキサンカルビノール誘導体を得る。上記溶媒として
は、反応に関与しなければ特に制限はなく、例えば、塩
化メチレン、クロロホルム等のハロゲン化炭化水素類、
ベンゼン、トルエン等の芳香族炭化水素類、アセトン、
メチルエチルケトン等のアルキルケトン類等を例示でき
る。酸化剤としては特に制限は無いが、例えばジヨーン
ズ試薬、クロロクロム酸ピリジニウム、ピリジニウムジ
クロメイト、ジメチルスルホキシド−塩化オキサリル等
を例示できる。酸化剤は、一般式(5)で表される化合
物に対し、1〜5倍当量程度用いるのが好ましい。反応
時間は、10分〜24時間程度で有利に進行する。反応温度
は、−20℃から溶媒の沸点程度が好ましい。
Step C The compound represented by the general formula (5) obtained by the reaction formula of the chemical formula [3] is reacted with an oxidizing agent in an appropriate solvent to form an α represented by the general formula (1a). , Α-Dimethylcyclohexanecarbinol derivative is obtained. The solvent is not particularly limited as long as it does not participate in the reaction, for example, methylene chloride, halogenated hydrocarbons such as chloroform,
Aromatic hydrocarbons such as benzene and toluene, acetone,
Examples thereof include alkyl ketones such as methyl ethyl ketone. The oxidizing agent is not particularly limited, and examples thereof include Diones reagent, pyridinium chlorochromate, pyridinium dichromate, and dimethyl sulfoxide-oxalyl chloride. The oxidizing agent is preferably used in an amount of about 1 to 5 times the equivalent amount of the compound represented by the general formula (5). The reaction time is advantageously about 10 minutes to 24 hours. The reaction temperature is preferably from -20 ° C to the boiling point of the solvent.

【0025】D工程 一般式(1a)で表される化合物を適当な溶媒中、不活
性ガス雰囲気下、ハロゲン化メチルトリフエニルホスホ
ニウムと塩基によつて調製されたホスホニウムイリドと
反応させることにより、一般式(1b)で表されるα,
α−ジメチルシクロヘキサンカルビノール誘導体を得
る。上記溶媒としては、反応に関与しなければ特に制限
はなく、例えばエーテル、テトラヒドロフラン等のエー
テル類、塩化メチレン等のハロゲン化炭化水素類、ベン
ゼン、トルエン等の芳香族炭化水素類等を例示できる。
また不活性ガスとしては反応に関与しなければ特に制限
は無く、例えば、窒素、アルゴン等を例示できる。塩基
としては、例えばメチルリチウム、n−ブチルリチウム
等の有機リチウム化合物、水素化ナトリウム、水素化カ
リウムなどの金属ハライド等を例示できる。ハロゲン化
メチルトリフエニルホスホニウムのハロゲンとしては、
塩素、臭素、ヨウ素等が挙げられる。ハロゲン化メチル
トリフエニルホスホニウムと塩基は、一般式(1a)で
表される化合物に対し、1〜10倍当量程度用いるのが好
ましい。反応時間は、1時間〜24時間程度で有利に進行
する。反応温度は、−78℃から室温程度が好ましい。
Step D By reacting the compound represented by the general formula (1a) with a methyltriphenylphosphonium halide and a phosphonium ylide prepared by a base in an appropriate solvent in an inert gas atmosphere, Α represented by the formula (1b),
An α-dimethylcyclohexane carbinol derivative is obtained. The solvent is not particularly limited as long as it does not participate in the reaction, and examples thereof include ethers such as ether and tetrahydrofuran, halogenated hydrocarbons such as methylene chloride, and aromatic hydrocarbons such as benzene and toluene.
The inert gas is not particularly limited as long as it does not participate in the reaction, and examples thereof include nitrogen and argon. Examples of the base include organic lithium compounds such as methyllithium and n-butyllithium, metal halides such as sodium hydride and potassium hydride, and the like. As the halogen of methyltriphenylphosphonium halide,
Examples thereof include chlorine, bromine and iodine. It is preferable to use the methyltriphenylphosphonium halide and the base in an amount of about 1 to 10 times equivalent to that of the compound represented by the general formula (1a). The reaction time is advantageously about 1 to 24 hours. The reaction temperature is preferably about -78 ° C to room temperature.

【0026】E工程 一般式(5)で表される化合物を、塩基の存在下スルホ
ン酸ハライドと反応させることにより、スルホン酸エス
テル体とし、ついでアジ化ナトリウムと反応させること
によりアジド体を合成する。さらにアジド体を還元する
ことにより一般式(1c)で表されるα,α−ジメチル
シクロヘキサンカルビノール誘導体を得る。
Step E The compound represented by the general formula (5) is reacted with a sulfonic acid halide in the presence of a base to form a sulfonic acid ester body, and then reacted with sodium azide to synthesize an azide body. . Further, the azide is reduced to obtain an α, α-dimethylcyclohexanecarbinol derivative represented by the general formula (1c).

【0027】スルホン酸エステル体は、一般式(5)で
表される化合物の置換基R3に存在する水酸基を不活性
ガス雰囲気下、適当な溶媒中、塩基の存在下にスルホン
酸ハライドと反応させることにより合成することができ
る。不活性ガスとしては反応に関与しなければ特に制限
はなく、例えば、窒素、アルゴン等を例示できる。スル
ホン酸ハライドとしては、トルエンスルホン酸クロリ
ド、メチルスルホン酸クロリド等を例示できる。また塩
基としては水素化ナトリウム、水素化カリウムなどの金
属ハライド等、ピリジン、トリエチルアミン、ピペリジ
ン等の有機アミン類を例示できる。上記溶媒としては、
反応に関与しなければ特に制限はなく、例えば、エーテ
ル、テトラヒドロフラン等のエーテル類、塩化メチレ
ン、クロロホルム等のハロゲン化炭化水素類、ベンゼ
ン、トルエン等の芳香族炭化水素類、N,N−ジメチル
ホルムアミド、ジメチルスルホキシド、アセトニトリル
等の非プロトン性極性溶媒等を例示でき、また塩基をそ
のまま溶媒に使用してもよい。塩基が溶媒として用いら
れる時を除き、一般式(5)の化合物に対して、塩基と
スルホン酸ハライドはそれぞれ1〜2倍当量程度用いる
のが望ましい。反応温度は氷冷下から溶媒の沸点程度で
あり、反応時間は2時間から72時間程度で有利に進行す
る。さらに反応溶液にジメチルアミノピリジン等を0.1
〜1倍当量程度加えることにより反応を有利に進行させ
ることができる。
The sulfonate ester compound is obtained by reacting the hydroxyl group present in the substituent R 3 of the compound represented by the general formula (5) with a sulfonate halide in an inert gas atmosphere in the presence of a base in a suitable solvent. It can be synthesized by The inert gas is not particularly limited as long as it does not participate in the reaction, and examples thereof include nitrogen and argon. Examples of the sulfonic acid halide include toluenesulfonic acid chloride and methylsulfonic acid chloride. Examples of the base include metal halides such as sodium hydride and potassium hydride, and organic amines such as pyridine, triethylamine and piperidine. As the solvent,
There is no particular limitation as long as it does not participate in the reaction, and examples thereof include ethers such as ether and tetrahydrofuran, halogenated hydrocarbons such as methylene chloride and chloroform, aromatic hydrocarbons such as benzene and toluene, N, N-dimethylformamide. Examples thereof include aprotic polar solvents such as dimethyl sulfoxide and acetonitrile, and the base may be used as the solvent as it is. Except when the base is used as a solvent, it is desirable to use the base and the sulfonic acid halide in an amount of about 1 to 2 times the equivalent of the compound of the general formula (5). The reaction temperature is from under ice-cooling to about the boiling point of the solvent, and the reaction time is about 2 to 72 hours, and the reaction proceeds advantageously. Furthermore, add 0.1% of dimethylaminopyridine to the reaction solution.
The reaction can be advantageously carried out by adding about 1 to 1 equivalent.

【0028】アジド体は、スルホン酸エステル体を適当
な溶媒中、アジ化ナトリウムと反応させることにより合
成することができる。溶媒としては、アセトン、メチル
エチルケトン等のケトン類、N,N−ジメチルホルムア
ミド、ジメチルスルホキシド、アセトニトリル等の非プ
ロトン性極性溶媒等を例示できる。スルホン酸エステル
体に対して、アジ化ナトリウムは1〜10倍当量程度用い
るのが望ましい。反応温度は室温から溶媒の沸点程度で
あり、反応時間は2時間から24時間程度で有利に進行す
る。
The azide form can be synthesized by reacting the sulfonate form with sodium azide in a suitable solvent. Examples of the solvent include ketones such as acetone and methyl ethyl ketone, and aprotic polar solvents such as N, N-dimethylformamide, dimethyl sulfoxide and acetonitrile. It is desirable to use sodium azide in an amount of 1 to 10 equivalents relative to the sulfonate ester. The reaction temperature is from room temperature to the boiling point of the solvent, and the reaction time is advantageously from 2 hours to 24 hours.

【0029】アジド体は前記[化3]の反応工程式のB
工程と同様な方法で還元することにより、一般式(1
c)で表されるα,α−ジメチルシクロヘキサンカルビ
ノール誘導体を得る。
The azide is represented by B in the reaction formula of the above [Chemical formula 3].
By reduction in the same manner as in the step, general formula (1
An α, α-dimethylcyclohexanecarbinol derivative represented by c) is obtained.

【0030】上記[化3]の反応工程式で原料として使
用される一般式(2)の置換基R2がシアノ基である化
合物については、下記[化5]の反応工程式に従い製造
することもできる。また一般式(4)における置換基R
1がスピロ環を形成する1,3−ジオキサンである化合
物、もしくは低級アシル基又はオキソ基である化合物
は、それぞれ下記の[化6]、[化7]の反応工程式に
従い製造することもできる。
The compound of the general formula (2) in which the substituent R 2 is a cyano group used as a raw material in the reaction formula of the above [Chemical Formula 3] is produced according to the reaction formula of the following [Chemical Formula 5]. You can also Further, the substituent R in the general formula (4) is
A compound in which 1 is 1,3-dioxane forming a spiro ring, or a compound having a lower acyl group or an oxo group can also be produced according to the following reaction schemes of [Chemical Formula 6] and [Chemical Formula 7], respectively. .

【0031】[0031]

【化5】 [Chemical 5]

【0032】[式中、m、R1、Xは前記に同じ。R3
カルボキシル基又は低級アルコキシカルボニル基を示
す。]
[In the formula, m, R 1 and X are the same as defined above. R 3 represents a carboxyl group or a lower alkoxycarbonyl group. ]

【0033】上記R3で示される低級アルコキシカルボ
ニル基としては、R2と同様なアルコキシカルボニル基
が挙げられる。
Examples of the lower alkoxycarbonyl group represented by R 3 include the same alkoxycarbonyl groups as R 2 .

【0034】F工程 公知の一般式(6)で表される化合物を適当な溶媒中、
還元剤と反応させることにより一般式(7)で表される
化合物を得る。上記溶媒としては、反応に関与しなけれ
ば特に制限はなく、例えば、メタノール、エタノール、
tert−ブタノール等のアルコール類、エーテル、テトラ
ヒドロフラン等のエーテル類、塩化メチレン、クロロホ
ルム等のハロゲン化炭化水素類、ベンゼン、トルエン等
の芳香族炭化水素類、ヘキサン、ヘプタン等の脂肪族炭
化水素類等を例示できる。還元剤としては、例えば水素
化リチウムアルミニウム、水素化ホウ素ナトリウム等を
例示できる。還元剤は一般式(6)で表される化合物に
対し、2〜10倍当量程度用いるのが好ましい。また、反
応温度は氷冷下から溶媒の沸点程度であり、反応時間
は、10分〜24時間程度で有利に進行する。
Step F: A known compound represented by the general formula (6) is added to a suitable solvent,
A compound represented by the general formula (7) is obtained by reacting with a reducing agent. The solvent is not particularly limited as long as it does not participate in the reaction, for example, methanol, ethanol,
Alcohols such as tert-butanol, ethers such as ether and tetrahydrofuran, halogenated hydrocarbons such as methylene chloride and chloroform, aromatic hydrocarbons such as benzene and toluene, and aliphatic hydrocarbons such as hexane and heptane. Can be illustrated. Examples of the reducing agent include lithium aluminum hydride and sodium borohydride. It is preferable to use the reducing agent in an amount of about 2 to 10 times equivalent to the compound represented by the general formula (6). Further, the reaction temperature is from under ice cooling to about the boiling point of the solvent, and the reaction time is about 10 minutes to 24 hours, and the reaction proceeds advantageously.

【0035】G工程 前記[化4]の反応工程式におけるE工程と同様の方法
でスルホン酸エステル体を合成し、さらに適当な溶媒
中、このスルホン酸エステル体とシアン化カリウムもし
くはシアン化ナトリウムと反応させることにより一般式
(2a)で表される化合物を得る。溶媒としては、反応
に関与しなければ特に制限はなく、アセトン、メチルエ
チルケトン等のアルキルケトン類、N,N−ジメチルホ
ルムアミド、ジメチルスルホキシド、アセトニトリル等
の非プロトン性極性溶媒等を例示することができる。反
応に際し、スルホン酸エステル体に対しシアン化カリウ
ム若しくはシアン化ナトリウムは1〜2倍当量程度用い
るのが好ましい。また、反応温度は室温から溶媒の沸点
程度であり、反応時間は、1時間〜24時間程度で有利に
進行する。
Step G: A sulfonate ester compound is synthesized by the same method as the step E in the reaction formula of [Chemical Formula 4], and the sulfonate ester compound is reacted with potassium cyanide or sodium cyanide in a suitable solvent. Thus, the compound represented by the general formula (2a) is obtained. The solvent is not particularly limited as long as it does not participate in the reaction, and examples thereof include alkyl ketones such as acetone and methyl ethyl ketone, and aprotic polar solvents such as N, N-dimethylformamide, dimethyl sulfoxide and acetonitrile. In the reaction, it is preferable to use potassium cyanide or sodium cyanide in an amount of about 1 to 2 equivalents relative to the sulfonate ester. The reaction temperature is from room temperature to the boiling point of the solvent, and the reaction time is advantageously about 1 to 24 hours.

【0036】[0036]

【化6】 [Chemical 6]

【0037】[式中、m、R2は前記に同じ。][In the formula, m and R 2 are the same as defined above. ]

【0038】H工程 公知の一般式(4a)で表される化合物を適当な溶媒
中、酸を用いトリメチレングリコールと反応させること
により一般式(4b)で表される化合物を得る。酸とし
ては、例えばパラトルエンスルホン酸、フエニルスルホ
ン酸等のスルホン酸、塩酸、硫酸等の無機酸等が挙げら
れる。上記溶媒としては、反応に関与しなければ特に制
限はなく、例えば、エーテル、テトラヒドロフラン等の
エーテル類、塩化メチレン、クロロホルム等のハロゲン
化炭化水素類、ベンゼン、トルエン等の芳香族炭化水素
類等を例示できる。酸は、一般式(4a)で表される化
合物に対し、0.05〜0.2倍当量添加して行うのが好まし
い。トリメチレングリコールは一般式(4a)で表され
る化合物に対し、1〜5倍当量程度用いるのが好まし
い。又、反応温度は氷冷下から溶媒の沸点程度であり、
反応時間は、1時間〜24時間程度で有利に進行する。上
記において系内から水を除く操作を行いながら反応を進
行させれば、反応は特に有利に進行する。脱水の操作と
しては、例えばベンゼン、トルエン等の溶媒を用い共沸
で除く方法、系内にモレキユラシーブス等の脱水剤を加
える方法等が挙げられる。
Step H The compound represented by the general formula (4b) is obtained by reacting the known compound represented by the general formula (4a) with trimethylene glycol in an appropriate solvent using an acid. Examples of the acid include sulfonic acids such as paratoluenesulfonic acid and phenylsulfonic acid, and inorganic acids such as hydrochloric acid and sulfuric acid. The solvent is not particularly limited as long as it does not participate in the reaction, and examples thereof include ethers such as ether and tetrahydrofuran, halogenated hydrocarbons such as methylene chloride and chloroform, aromatic hydrocarbons such as benzene and toluene. It can be illustrated. The acid is preferably added in an amount of 0.05 to 0.2 times the equivalent amount of the compound represented by the general formula (4a). It is preferable to use trimethylene glycol in an amount of 1 to 5 times equivalent to that of the compound represented by the general formula (4a). The reaction temperature is from under ice cooling to the boiling point of the solvent,
The reaction time is advantageously about 1 to 24 hours. The reaction proceeds particularly advantageously if the reaction is allowed to proceed while removing water from the system. Examples of the dehydration operation include a method of azeotropically removing with a solvent such as benzene and toluene, and a method of adding a dehydrating agent such as molecular sieves into the system.

【0039】[0039]

【化7】 [Chemical 7]

【0040】[式中、m、R2は前記に同じ。R4は低級
アシル基又はオキソ基を示し、R5は低級アルケニル
基、エキソメチレン基を示す。]
[In the formula, m and R 2 are the same as defined above. R 4 represents a lower acyl group or oxo group, and R 5 represents a lower alkenyl group or exomethylene group. ]

【0041】[化4]の反応工程式のD工程と同様に反
応を行い、一般式(4d)で表される化合物を得る。上
記[化3]〜[化7]の反応工程式で得られた各化合物
は、濃縮、濾過、再結晶、各種クロマトグラフイー等の
通常当分野で用いられる手段により単離、精製される。
またかくして得られる化合物は、これに常法に従い適当
な酸性化合物を付加させることにより、容易に医薬的に
許容される酸付加塩とすることができ、該酸付加塩は、
遊離形態の本化合物と同様の薬理活性を有しており、本
発明はかかる酸付加塩をも包含する。上記酸付加塩を形
成する酸性化合物としては、例えば、塩酸、硫酸、リン
酸、臭化水素酸等の無機酸及びマレイン酸、フマール
酸、リンゴ酸、酒石酸、クエン酸、安息香酸、ベンゼン
スルホン酸等の有機酸を例示できる。
The reaction is carried out in the same manner as in the step D of the reaction formula of [Chemical formula 4] to obtain the compound represented by the general formula (4d). Each compound obtained by the reaction schemes of [Chemical Formula 3] to [Chemical Formula 7] is isolated and purified by means usually used in the art such as concentration, filtration, recrystallization, various chromatographies and the like.
Further, the compound thus obtained can be easily converted into a pharmaceutically acceptable acid addition salt by adding a suitable acidic compound thereto according to a conventional method.
It has the same pharmacological activity as the present compound in free form, and the present invention also includes such an acid addition salt. Examples of the acidic compound forming the acid addition salt include inorganic acids such as hydrochloric acid, sulfuric acid, phosphoric acid and hydrobromic acid, and maleic acid, fumaric acid, malic acid, tartaric acid, citric acid, benzoic acid and benzenesulfonic acid. Examples thereof include organic acids.

【0042】[0042]

【実施例】次に実施例を示し、本発明をさらに詳しく説
明する。表においてDSTはジアステレオマーを示す。
EXAMPLES The present invention will be described in more detail with reference to the following examples. In the table, DST indicates diastereomer.

【0043】実施例1 氷冷下、m−ベンジルオキシ桂皮酸 42.92gの乾燥テト
ラヒドロフラン溶液 600mlに水素化リチウムアルミニウ
ム 9.62gを加え、12時間撹拌した。反応後、3規定硫酸
を加え酢酸エチルにて抽出後、飽和食塩水で洗浄し、無
水硫酸マグネシウムにて乾燥した。有機層を減圧下濃縮
し、油状の残渣を得た。次に窒素ガス雰囲気下、この残
渣のピリジン溶液90mlに氷冷下メチルスルホン酸クロリ
ド 13.1mlを加え30分間撹拌した。反応後、3規定硫酸
を加え酢酸エチルにて抽出後、飽和食塩水で洗浄し、無
水硫酸マグネシウムにて乾燥した。有機層を減圧下濃縮
し、残渣をシリカゲルカラムクロマトグラフイー(展開
溶媒、酢酸エチル:n−ヘキサン)にて分離精製し、メ
シル体を32.1g(収率59%)得た。
Example 1 9.62 g of lithium aluminum hydride was added to 600 ml of a dry tetrahydrofuran solution of 42.92 g of m-benzyloxycinnamic acid under ice cooling, and the mixture was stirred for 12 hours. After the reaction, 3N sulfuric acid was added, the mixture was extracted with ethyl acetate, washed with saturated brine, and dried over anhydrous magnesium sulfate. The organic layer was concentrated under reduced pressure to give an oily residue. Next, under a nitrogen gas atmosphere, 13.1 ml of methylsulfonic acid chloride was added to 90 ml of a pyridine solution of this residue under ice cooling, and the mixture was stirred for 30 minutes. After the reaction, 3N sulfuric acid was added, the mixture was extracted with ethyl acetate, washed with saturated brine, and dried over anhydrous magnesium sulfate. The organic layer was concentrated under reduced pressure, and the residue was separated and purified by silica gel column chromatography (developing solvent, ethyl acetate: n-hexane) to obtain 32.1 g of mesyl derivative (yield 59%).

【0044】上記メシル体 32.1gのジメチルスルホキシ
ド溶液 200mlに、シアン化ナトリウム 7.35gを加え90℃
で1時間加熱撹拌した。反応後、飽和塩化アンモニウム
水溶液を加え塩化メチレンにて抽出後、飽和食塩水で洗
浄し、無水硫酸マグネシウムにて乾燥した。有機層を減
圧下濃縮し、残渣をシリカゲルカラムクロマトグラフイ
ー(展開溶媒、酢酸エチル:n−ヘキサン)にて分離精
製し、3−ベンジルオキシ−3'−シアノプロピルベン
ゼンを23.53g(収率94%)得た。
To 200 ml of a solution of 32.1 g of the above mesyl derivative in 200 ml of dimethyl sulfoxide, 7.35 g of sodium cyanide was added, and the mixture was kept at 90 ° C.
The mixture was heated and stirred for 1 hour. After the reaction, a saturated aqueous ammonium chloride solution was added, the mixture was extracted with methylene chloride, washed with saturated saline, and dried over anhydrous magnesium sulfate. The organic layer was concentrated under reduced pressure, and the residue was separated and purified by silica gel column chromatography (developing solvent, ethyl acetate: n-hexane) to give 23.53 g of 3-benzyloxy-3′-cyanopropylbenzene (yield 94 %)Obtained.

【0045】窒素ガス雰囲気下、エーテル 200ml中ヨウ
化メチル 14.5mlとマグネシウム5.24gを反応させヨウ化
メチルマグネシウムを調製した。氷冷下その溶液に3−
ベンジルオキシ−3'−シアノプロピルベンゼン 23.53g
のエーテル溶液 100mlを加え、室温で12時間撹拌し、さ
らに1時間加熱還流した。反応後、氷冷下ジオキサンと
6規定硫酸の混合溶液を加え10分間撹拌した後、エーテ
ルにて抽出、水酸化ナトリウム水溶液、飽和食塩水で順
次洗浄し、無水硫酸マグネシウムにて乾燥した。有機層
を減圧下濃縮し、残渣をシリカゲルカラムクロマトグラ
フイー(展開溶媒、酢酸エチル:n−ヘキサン)にて分
離精製し、5−(3−ベンジルオキシフエニル)−2−
ペンタノン 15.47g(収率62%)を得た。
Under a nitrogen gas atmosphere, 14.5 ml of methyl iodide and 5.24 g of magnesium were reacted in 200 ml of ether to prepare methyl magnesium iodide. Under ice-cooling the solution 3-
Benzyloxy-3'-cyanopropylbenzene 23.53g
100 ml of an ether solution of was added, and the mixture was stirred at room temperature for 12 hours, and heated under reflux for 1 hour. After the reaction, a mixed solution of dioxane and 6N sulfuric acid was added under ice cooling, and the mixture was stirred for 10 minutes, extracted with ether, washed successively with aqueous sodium hydroxide solution and saturated brine, and dried over anhydrous magnesium sulfate. The organic layer was concentrated under reduced pressure, the residue was separated and purified by silica gel column chromatography (developing solvent, ethyl acetate: n-hexane), and 5- (3-benzyloxyphenyl) -2-
15.47 g of pentanone (yield 62%) was obtained.

【0046】さらに氷冷中窒素ガス雰囲気下、エーテル
100ml中ヨウ化メチル 9mlとマグネシウム 3.22gを反
応させヨウ化メチルマグネシウムを調製した。氷冷下5
−(3−ベンジルオキシフエニル)−2−ペンタノン 1
5.47gのエーテル溶液 100mlを加え、室温にて12時間撹
拌した。反応後、氷冷下2規定塩酸の溶液を加え、酢酸
エチルにて抽出後、飽和食塩水で洗浄し、無水硫酸マグ
ネシウムにて乾燥した。有機層を減圧下濃縮し、残渣を
シリカゲルカラムクロマトグラフイー(展開溶媒、酢酸
エチル:n−ヘキサン)にて分離精製し、3−ベンジル
オキシ−(4−ヒドロキシ−4−メチルペンチル)ベン
ゼン 13.67g(収率83%)を得た。
Further, under ice cooling in a nitrogen gas atmosphere, ether was used.
Methyl iodide (9 ml) and magnesium (3.22 g) in 100 ml were reacted to prepare methyl magnesium iodide. Under ice cooling 5
-(3-Benzyloxyphenyl) -2-pentanone 1
5.47 g of ether solution (100 ml) was added, and the mixture was stirred at room temperature for 12 hours. After the reaction, a solution of 2N hydrochloric acid was added under ice cooling, the mixture was extracted with ethyl acetate, washed with saturated saline, and dried over anhydrous magnesium sulfate. The organic layer was concentrated under reduced pressure, and the residue was separated and purified by silica gel column chromatography (developing solvent, ethyl acetate: n-hexane) and 3-benzyloxy- (4-hydroxy-4-methylpentyl) benzene 13.67g. (Yield 83%) was obtained.

【0047】3−ベンジルオキシ−(4−ヒドロキシ−
4−メチルペンチル)ベンゼン 13.67gのエタノール溶
液30mlに、5%ロジウム−アルミナを0.7g加え、室温で
水素を5気圧に加圧し3時間反応させた。さらに5%ロ
ジウム−アルミナを3.5g加え、同様に12時間反応させ
た。ロジウム−アルミナを濾去しエタノールを減圧下濃
縮し、残渣をシリカゲルカラムクロマトグラフイー(展
開溶媒、酢酸エチル:n−ヘキサン)にて分離精製し、
表1記載の化合物1を6.87g(収率88%)得た。
3-benzyloxy- (4-hydroxy-
0.7 g of 5% rhodium-alumina was added to 30 ml of an ethanol solution of 13.67 g of 4-methylpentyl) benzene, and hydrogen was pressurized to 5 atm at room temperature and reacted for 3 hours. Furthermore, 3.5 g of 5% rhodium-alumina was added, and the reaction was conducted for 12 hours in the same manner. Rhodium-alumina was filtered off, ethanol was concentrated under reduced pressure, and the residue was separated and purified by silica gel column chromatography (developing solvent, ethyl acetate: n-hexane).
6.87 g (yield 88%) of Compound 1 shown in Table 1 was obtained.

【0048】実施例2 3−メトキシ桂皮酸を原料とし、実施例1と同様にして
表1記載の化合物2を合成した。
Example 2 Using 2-methoxycinnamic acid as a starting material, compound 2 shown in Table 1 was synthesized in the same manner as in Example 1.

【0049】実施例3 3−ヒドロキシ桂皮酸メチル 15.8g、5%ロジウム−ア
ルミナ 2.5gをエタノール 60mlに加え、室温で水素を5
気圧に加圧し5時間反応させた。ロジウム−アルミナを
濾去しエタノールを減圧下濃縮し、油状の化合物 16.5g
を得た。窒素ガス雰囲気下、エーテル 200ml中ヨウ化メ
チル 15.06mlとマグネシウム 5.23gを反応させヨウ化メ
チルマグネシウムを調製し、これに上記油状の化合物5
gのエーテル溶液 50mlを滴下し12時間撹拌した。反応
後、飽和塩化アンモニウム水溶液を加え酢酸エチルにて
抽出後、飽和食塩水で洗浄し、無水硫酸マグネシウムに
て乾燥した。有機層を減圧下濃縮し、残渣をシリカゲル
カラムクロマトグラフイー(展開溶媒、酢酸エチル:n
−ヘキサン)にて分離精製し、表1記載の化合物3を4.
9g(収率98%)得た。
Example 3 Methyl 3-hydroxycinnamate (15.8 g) and 5% rhodium-alumina (2.5 g) were added to ethanol (60 ml), and hydrogen was added at room temperature to 5%.
It was pressurized to atmospheric pressure and reacted for 5 hours. Rhodium-alumina was filtered off and ethanol was concentrated under reduced pressure to give 16.5 g of oily compound.
Got Under a nitrogen gas atmosphere, 15.06 ml of methyl iodide and 5.23 g of magnesium were reacted in 200 ml of ether to prepare methyl magnesium iodide.
50 ml of an ether solution of g was added dropwise and the mixture was stirred for 12 hours. After the reaction, a saturated aqueous ammonium chloride solution was added, the mixture was extracted with ethyl acetate, washed with saturated saline, and dried over anhydrous magnesium sulfate. The organic layer was concentrated under reduced pressure, and the residue was subjected to silica gel column chromatography (developing solvent, ethyl acetate: n
-Hexane) was used for separation and purification, and compound 3 shown in Table 1 was used in 4.
9 g (yield 98%) was obtained.

【0050】実施例4 2−ヒドロキシ桂皮酸を原料とし、実施例3と同様にし
て表1記載の化合物4を合成した。
Example 4 Using 4-hydroxycinnamic acid as a raw material, compound 4 shown in Table 1 was synthesized in the same manner as in Example 3.

【0051】実施例5 塩化メチレン 50mlにクロロクロム酸ピリジニウム 9
g、酢酸ナトリウム 3.42g、セライト 5gを加え、さら
に実施例1で得た、3−(4−ヒドロキシ−4−メチル
ペンチル)シクロヘキサノール 4.17gの塩化メチレン溶
液30mlを滴下し、2時間撹拌した。エーテルを加えセラ
イトを濾去し、さらにエーテルを減圧下濃縮し残渣をシ
リカゲルカラムクロマトグラフイー(展開溶媒、酢酸エ
チル:n−ヘキサン)にて分離精製し、表2記載の化合
物5を4.05g(収率98%)得た。
Example 5 Pyridinium chlorochromate 9 in 50 ml of methylene chloride
g, 3.42 g of sodium acetate and 5 g of celite were added, and 30 ml of a methylene chloride solution of 4.17 g of 3- (4-hydroxy-4-methylpentyl) cyclohexanol obtained in Example 1 was added dropwise and stirred for 2 hours. Ether was added, celite was filtered off, ether was further concentrated under reduced pressure, and the residue was separated and purified by silica gel column chromatography (developing solvent, ethyl acetate: n-hexane) to obtain 4.05 g of compound 5 shown in Table 2 ( Yield 98%).

【0052】実施例6 実施例3で得られた3−(1−ヒドロキシ−3−メチル
ブチル)シクロヘキサノールを原料とし、実施例5と同
様にして表2記載の化合物6を合成した。
Example 6 Using the 3- (1-hydroxy-3-methylbutyl) cyclohexanol obtained in Example 3 as a starting material, Compound 6 shown in Table 2 was synthesized in the same manner as in Example 5.

【0053】実施例7 1−(1−ヒドロキシエチル)−3−(1−ヒドロキシ
−1−メチルエチル)シクロヘキサンを原料とし、実施
例5と同様にして表2記載の化合物7を合成した。
Example 7 1- (1-hydroxyethyl) -3- (1-hydroxy-1-methylethyl) cyclohexane was used as a starting material and compound 7 shown in Table 2 was synthesized in the same manner as in Example 5.

【0054】実施例8 氷冷中、アルゴン雰囲気下、臭化メチルトリフエニルホ
スホニウム 5.82gのテトラヒドロフラン溶液 100mlに
2.5Mのn−ブチルリチウムのヘキサン溶液を6.5ml加
えイリドを調製した。この溶液に実施例7で得られた3
−(1−ヒドロキシ−1−メチルエチル)アセチルシク
ロヘキサン 1.5gのテトラヒドロフラン溶液 20mlを滴下
し、室温で5時間撹拌した。反応後、水を加えエーテル
にて抽出後、飽和食塩水で洗浄し、無水硫酸マグネシウ
ムにて乾燥した。有機層を減圧下濃縮し、残渣をシリカ
ゲルカラムクロマトグラフイー(展開溶媒、酢酸エチ
ル:n−ヘキサン)にて分離精製し、表2記載の化合物
8を0.61g(収率41%)得た。
Example 8 An ylide was prepared by adding 6.5 ml of a hexane solution of 2.5 M n-butyllithium to 100 ml of a tetrahydrofuran solution containing 5.82 g of methyltriphenylphosphonium bromide in an ice atmosphere while cooling with ice. 3 obtained in Example 7 in this solution
20 ml of a tetrahydrofuran solution containing 1.5 g of-(1-hydroxy-1-methylethyl) acetylcyclohexane was added dropwise, and the mixture was stirred at room temperature for 5 hours. After the reaction, water was added, the mixture was extracted with ether, washed with saturated brine, and dried over anhydrous magnesium sulfate. The organic layer was concentrated under reduced pressure, and the residue was separated and purified by silica gel column chromatography (developing solvent, ethyl acetate: n-hexane) to obtain 0.61 g (yield 41%) of compound 8 shown in Table 2.

【0055】実施例9 実施例6で得られた3−(3−ヒドロキシ−3−メチル
ブチル)シクロヘキサノンを原料とし、実施例8と同様
にして表3記載の化合物9を合成した。
Example 9 Using the 3- (3-hydroxy-3-methylbutyl) cyclohexanone obtained in Example 6 as a starting material, compound 9 shown in Table 3 was synthesized in the same manner as in Example 8.

【0056】実施例10 実施例5で得られた3−(4−ヒドロキシ−4−メチル
ペンチル)シクロヘキサノンを原料とし、実施例8と同
様にして表3記載の化合物10を合成した。
Example 10 Using the 3- (4-hydroxy-4-methylpentyl) cyclohexanone obtained in Example 5 as a starting material, compound 10 shown in Table 3 was synthesized in the same manner as in Example 8.

【0057】実施例11 窒素ガス雰囲気下、4−(1−ヒドロキシ−1−メチル
エチル)シクロヘキサノール 1.6gをピリジン 8mlに溶
解し、パラトルエンスルホン酸クロリド 2.03g、ジメチ
ルアミノピリジン 0.25gを順次加え3日間室温で撹拌し
た。反応後、エーテルで希釈し水、2規定塩酸、飽和炭
酸水素ナトリウム水溶液、飽和食塩水で順次洗浄し、無
水硫酸マグネシウムにて乾燥した。有機層を減圧下濃縮
し、残渣をシリカゲルカラムクロマトグラフイー(展開
溶媒、酢酸エチル:n−ヘキサン)にて分離精製し、ト
シル体を2.7g(収率88%)得た。
Example 11 Under a nitrogen gas atmosphere, 1.6 g of 4- (1-hydroxy-1-methylethyl) cyclohexanol was dissolved in 8 ml of pyridine, and 2.03 g of paratoluenesulfonic acid chloride and 0.25 g of dimethylaminopyridine were sequentially added. Stir for 3 days at room temperature. After the reaction, the mixture was diluted with ether, washed successively with water, 2N hydrochloric acid, saturated aqueous sodium hydrogen carbonate solution and saturated brine, and dried over anhydrous magnesium sulfate. The organic layer was concentrated under reduced pressure, and the residue was separated and purified by silica gel column chromatography (developing solvent, ethyl acetate: n-hexane) to obtain 2.7 g of tosyl compound (yield 88%).

【0058】上記操作を数回繰り返すことにより得たト
シル体 10.18gを、N,N−ジメチルホルムアミド 100ml
に溶解し、この溶液にナトリウムアジド 11.78gの水溶
液30mlを滴下し、1時間80℃で加熱撹拌した。反応後、
エーテルで希釈し水、飽和食塩水で順次洗浄し、無水硫
酸マグネシウムにて乾燥した。有機層を減圧下濃縮し、
残渣をシリカゲルカラムクロマトグラフイー(展開溶
媒、酢酸エチル:n−ヘキサン)にて分離精製し、アジ
ド体を2.58g(収率43%)得た。
10.18 g of the tosyl compound obtained by repeating the above operation several times was added to 100 ml of N, N-dimethylformamide.
30 ml of an aqueous solution of 11.78 g of sodium azide was added dropwise to this solution, and the mixture was heated with stirring at 80 ° C. for 1 hour. After the reaction
It was diluted with ether, washed successively with water and saturated brine, and dried over anhydrous magnesium sulfate. The organic layer was concentrated under reduced pressure,
The residue was separated and purified by silica gel column chromatography (developing solvent, ethyl acetate: n-hexane) to obtain 2.58 g (yield 43%) of an azide compound.

【0059】アジド体 1g、二酸化白金 0.1gを95%エ
タノール 20mlに加え、オートクレーブを用い5気圧の
水素加圧下室温で3時間反応を行つた。二酸化白金を濾
去しエタノールを減圧下濃縮し、残渣をシリカゲルカラ
ムクロマトグラフイー(展開溶媒、クロロホルム:メタ
ノール:28%アンモニア水)にて分離精製し、さらにマ
レイン酸の塩とすることにより表3記載の化合物11を0.
61g(収率41%)得た。
1 g of azide and 0.1 g of platinum dioxide were added to 20 ml of 95% ethanol, and the reaction was carried out at room temperature for 3 hours under hydrogen pressure of 5 atm using an autoclave. Platinum dioxide was removed by filtration, ethanol was concentrated under reduced pressure, and the residue was separated and purified by silica gel column chromatography (developing solvent, chloroform: methanol: 28% aqueous ammonia) and further converted into maleic acid salt. Compound 11 as described in 0.
61 g (yield 41%) was obtained.

【0060】実施例12 氷冷中アルゴン雰囲気下、臭化メチルトリフエニルホス
ホニウム 8.66gのエーテル溶液 100mlに1.6Mのn−ブ
チルリチウムのヘキサン溶液を15.2ml加えイリドを調製
した。この溶液に3−(2−オキソシクロヘキシル)プ
ロピオン酸エチル 4.0gのエーテル溶液 20mlを滴下し、
室温で12時間撹拌した。反応後、水を加えエーテルにて
抽出後、飽和食塩水で洗浄し、無水硫酸マグネシウムに
て乾燥した。有機層を減圧下濃縮し、残渣をシリカゲル
カラムクロマトグラフイー(展開溶媒、酢酸エチル:n
−ヘキサン)にて分離精製し、3−(2−エチレンシク
ロヘキシル)プロピオン酸エチルを2.01g(収率51%)
得た。
Example 12 Ylide was prepared by adding 15.2 ml of a 1.6 M n-butyllithium hexane solution to 100 ml of an ether solution of 8.66 g of methyltriphenylphosphonium bromide in an ice-cooled argon atmosphere. To this solution, 20 ml of an ether solution of 4.0 g of ethyl 3- (2-oxocyclohexyl) propionate was added dropwise,
It was stirred at room temperature for 12 hours. After the reaction, water was added, the mixture was extracted with ether, washed with saturated brine, and dried over anhydrous magnesium sulfate. The organic layer was concentrated under reduced pressure, and the residue was subjected to silica gel column chromatography (developing solvent, ethyl acetate: n
-Hexane) was separated and purified, and 2.01 g of ethyl 3- (2-ethylenecyclohexyl) propionate (yield 51%)
Obtained.

【0061】氷冷下窒素ガス雰囲気下、エーテル 100ml
中ヨウ化メチル 2.2mlとマグネシウム 0.84gを反応させ
ヨウ化メチルマグネシウムを調製した。これに3−(2
−エチレンシクロヘキシル)プロピオン酸エチル 1.7g
のエーテル溶液を滴下し12時間撹拌した。反応後、飽和
塩化アンモニウム水溶液を加え酢酸エチルにて抽出後、
飽和食塩水で洗浄し、無水硫酸マグネシウムにて乾燥し
た。有機層を減圧下濃縮し、残渣をシリカゲルカラムク
ロマトグラフイー(展開溶媒、酢酸エチル:n−ヘキサ
ン)にて分離精製し、表3記載の化合物12を1.15g(収
率73%)得た。
100 ml of ether under nitrogen atmosphere under ice cooling
Methyl methyl iodide (2.2 ml) was reacted with magnesium (0.84 g) to prepare methyl magnesium iodide. 3- (2
-Ethylenecyclohexyl) ethyl propionate 1.7 g
Was added dropwise and the mixture was stirred for 12 hours. After the reaction, saturated aqueous ammonium chloride solution was added and extracted with ethyl acetate,
The extract was washed with saturated saline and dried over anhydrous magnesium sulfate. The organic layer was concentrated under reduced pressure, and the residue was separated and purified by silica gel column chromatography (developing solvent, ethyl acetate: n-hexane) to obtain 1.15 g of compound 12 shown in Table 3 (yield 73%).

【0062】実施例13 3−(2−オキソシクロヘキシル)プロピオン酸エチル
2.0g、トリメチレングリコール 1.1ml、パラトルエン
スルホン酸1水和物0.17gをベンゼン 40mlに加え、デイ
ーン−スタークの装置を用いて水を除きながら、12時間
加熱還流した。反応後、飽和炭酸水素ナトリウム水溶液
を加え酢酸エチルにて抽出後、水、飽和食塩水で順次洗
浄し、無水炭酸ナトリウムにて乾燥した。有機層を減圧
下濃縮し、残渣をシリカゲルカラムクロマトグラフイー
(展開溶媒、酢酸エチル:n−ヘキサン)にて分離精製
し、ジオキサン体を1.47g(収率57%)得た。
Example 13 Ethyl 3- (2-oxocyclohexyl) propionate
2.0 g, trimethylene glycol 1.1 ml, and paratoluenesulfonic acid monohydrate 0.17 g were added to benzene 40 ml, and the mixture was heated under reflux for 12 hours while removing water using a Dean-Stark apparatus. After the reaction, saturated aqueous sodium hydrogen carbonate solution was added, and the mixture was extracted with ethyl acetate, washed successively with water and saturated brine, and dried over anhydrous sodium carbonate. The organic layer was concentrated under reduced pressure, and the residue was separated and purified by silica gel column chromatography (developing solvent, ethyl acetate: n-hexane) to obtain 1.47 g of dioxane (yield 57%).

【0063】氷冷下窒素ガス雰囲気下、エーテル 100ml
中ヨウ化メチル 1.5mlとマグネシウム 0.53gを反応させ
ヨウ化メチルマグネシウムを調製した。これにジオキサ
ン体1.4gのエーテル溶液を滴下し12時間撹拌した。反応
後、飽和塩化アンモニウム水溶液を加え酢酸エチルにて
抽出後、飽和食塩水で洗浄し、無水硫酸マグネシウムに
て乾燥した。有機層を減圧下濃縮し、残渣をシリカゲル
カラムクロマトグラフイー(展開溶媒、酢酸エチル:n
−ヘキサン)にて分離精製し、表4記載の化合物13を1.
11g(収率84%)得た。
100 ml of ether under a nitrogen gas atmosphere under ice cooling
Methyl methyl iodide (1.5 ml) was reacted with magnesium (0.53 g) to prepare methyl magnesium iodide. An ether solution of 1.4 g of dioxane was added dropwise to this and stirred for 12 hours. After the reaction, a saturated aqueous ammonium chloride solution was added, the mixture was extracted with ethyl acetate, washed with saturated saline, and dried over anhydrous magnesium sulfate. The organic layer was concentrated under reduced pressure, and the residue was subjected to silica gel column chromatography (developing solvent, ethyl acetate: n
-Hexane) was used for separation and purification, and compound 13 in Table 4 was added to 1.
11 g (yield 84%) was obtained.

【0064】[0064]

【表1】 [Table 1]

【0065】[0065]

【表2】 [Table 2]

【0066】[0066]

【表3】 [Table 3]

【0067】[0067]

【表4】 [Table 4]

【0068】薬理試験 骨格筋における神経筋遮断作用をJapan J.Pharmaco
l.,50,69(1989)記載の方法に従い、スクシニルコリ
ン(SuCh)の作用の増強効果を指標に検討した。摘出
マウス横隔膜神経筋標本を用い、36〜37℃クレブス−ヘ
ンゼライト溶液(118mM 塩化ナトリウム,5.4mM 塩化
カリウム,0.57mM 硫酸マグネシウム,2.5mM 塩化カ
ルシウム,1.2mM リン酸二水素ナトリウム,11.1mM
グルコース,12〜15.5mM 炭酸水素ナトリウム;pH=
7.2〜7.4)中にて実験を行つた。SuChは2分間隔で累
積的に投与し、神経を電気刺激し発生する単収縮の張力
を測定することにより、濃度−反応曲線を得てIC
50(control)を算出した。また、本発明化合物(80μ
M)を1時間前処理し同様にSuChの濃度−反応曲線を
得てIC50(drug)を算出した。これらIC50値より次
式を用いて増強効果を判定した。結果を表5に示す。 (増強効果)=IC50(control)/IC50(drug)
Pharmacological test The neuromuscular blocking effect on skeletal muscle was analyzed by Japan J. et al. Pharmaco
According to the method described in L., 50 , 69 (1989), the effect of enhancing the action of succinylcholine (SuCh) was examined as an index. Krebs-Henseleit solution (118 mM sodium chloride, 5.4 mM potassium chloride, 0.57 mM magnesium sulfate, 2.5 mM calcium chloride, 1.2 mM sodium dihydrogen phosphate, 11.1 mM) was used at 36 to 37 ° C. using an isolated mouse diaphragm neuromuscular specimen.
Glucose, 12 to 15.5 mM sodium hydrogen carbonate; pH =
Experiments were carried out in 7.2-7.4). SuCh was cumulatively administered at 2-minute intervals, and the tension of the twitch generated by electrically stimulating the nerve was measured to obtain a concentration-response curve and IC.
50 (control) was calculated. In addition, the compound of the present invention (80 μ
M) was pretreated for 1 hour and the concentration-reaction curve of SuCh was obtained in the same manner to calculate the IC 50 (drug). The enhancing effect was determined from these IC 50 values using the following formula. The results are shown in Table 5. (Enhancing effect) = IC 50 (control) / IC 50 (drug)

【0069】[0069]

【表5】 [Table 5]

【0070】[0070]

【発明の効果】本発明のα,α−ジメチルシクロヘキサ
ンカルビノール誘導体又はその塩は神経筋遮断作用を有
し運動麻痺などの治療薬として、また血管新生阻害作用
を有し、慢性関節リウマチ、慢性腎炎、慢性肝炎等の慢
性炎症、乾癬、癌、糖尿病性網膜症、動脈硬化等の治療
薬として有用である。
INDUSTRIAL APPLICABILITY The α, α-dimethylcyclohexanecarbinol derivative or a salt thereof of the present invention has a neuromuscular blocking action and a therapeutic drug for motor paralysis, and also has an angiogenesis inhibiting action, rheumatoid arthritis, chronic It is useful as a therapeutic drug for nephritis, chronic inflammation such as chronic hepatitis, psoriasis, cancer, diabetic retinopathy, arteriosclerosis and the like.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 C07C 215/42 7457−4H C07D 319/08 // A61K 31/045 ABG 9454−4C 31/12 ACV 9454−4C 31/13 AAT 9454−4C ABL ABX ADA ADU 31/335 ACS 9454−4C ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Internal reference number FI Technical display location C07C 215/42 7457-4H C07D 319/08 // A61K 31/045 ABG 9454-4C 31/12 ACV 9454-4C 31/13 AAT 9454-4C ABL ABX ADA ADU 31/335 ACS 9454-4C

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 一般式[化1]で表されるα,α−ジメ
チルシクロヘキサンカルビノール誘導体又はその塩。 【化1】 [式中、Rはアミノ基、低級アルケニル基、低級アシル
基、エキソメチレン基、水酸基、オキソ基、低級アルコ
キシ基又はスピロ環を形成する1,3−ジオキサンを、
mは0〜3を示す。但しmが0〜1でRが2位に置換さ
れた低級アルコキシ基、mが0〜1でRが4位に置換さ
れた低級アシル基、mが0〜1でRが2位又は3位に置
換されたアミノ基、あるいはmが0〜1でRがエキソメ
チレン基、水酸基又はオキソ基の場合を除く。]
1. An α, α-dimethylcyclohexanecarbinol derivative represented by the general formula [Chemical Formula 1] or a salt thereof. [Chemical 1] [In the formula, R represents an amino group, a lower alkenyl group, a lower acyl group, an exomethylene group, a hydroxyl group, an oxo group, a lower alkoxy group or 1,3-dioxane forming a spiro ring,
m shows 0-3. However, a lower alkoxy group in which m is 0 to 1 and R is substituted at the 2 position, a lower acyl group in which m is 0 to 1 and R is substituted at the 4 position, m is 0 to 1 and R is at the 2 or 3 position Or an amino group substituted by, or m is 0 to 1 and R is an exomethylene group, a hydroxyl group or an oxo group. ]
【請求項2】 Rがアミノ基、イソプロペニル基、アセ
チル基、エキソメチレン基、水酸基、オキソ基、メトキ
シ基又はスピロ環を形成する1,3−ジオキサン、mが
0〜3である請求項1のα,α−ジメチルシクロヘキサ
ンカルビノール誘導体又はその塩。
2. R is an amino group, isopropenyl group, acetyl group, exomethylene group, hydroxyl group, oxo group, methoxy group or 1,3-dioxane forming a spiro ring, and m is 0 to 3. An α, α-dimethylcyclohexanecarbinol derivative or a salt thereof.
【請求項3】 3−(4−ヒドロキシ−4−メチルペン
チル)シクロヘキサノール、3−(4−ヒドロキシ−4
−メチルペンチル)メトキシシクロヘキサン、3−(3
−ヒドロキシ−3−メチルブチル)シクロヘキサノー
ル、2−(3−ヒドロキシ−3−メチルブチル)シクロ
ヘキサノール、3−(4−ヒドロキシ−4−メチルペン
チル)シクロヘキサノン、3−(3−ヒドロキシ−3−
メチルブチル)シクロヘキサノン、3−(1−ヒドロキ
シ−1−メチルエチル)アセチルシクロヘキサン、3−
(4−ヒドロキシ−4−メチルペンチル)シクロヘキシ
リデン、3−(3−ヒドロキシ−3−メチルブチル)シ
クロヘキシリデン、3−(1−ヒドロキシ−1−メチル
エチル)イソプロペニルシクロヘキサン、4−(1−ヒ
ドロキシ−1−メチルエチル)シクロヘキシルアミン、
2−(3−ヒドロキシ−3−メチルブチル)シクロヘキ
シリデン、7−(3'−ヒドロキシ−3'−メチルブチ
ル)−1,5−ジオキソスピロ[5,5]ウンデカンであ
る請求項1のα,α−ジメチルシクロヘキサンカルビノ
ール誘導体又はその塩。
3. 3- (4-Hydroxy-4-methylpentyl) cyclohexanol, 3- (4-hydroxy-4)
-Methylpentyl) methoxycyclohexane, 3- (3
-Hydroxy-3-methylbutyl) cyclohexanol, 2- (3-hydroxy-3-methylbutyl) cyclohexanol, 3- (4-hydroxy-4-methylpentyl) cyclohexanone, 3- (3-hydroxy-3-)
Methylbutyl) cyclohexanone, 3- (1-hydroxy-1-methylethyl) acetylcyclohexane, 3-
(4-Hydroxy-4-methylpentyl) cyclohexylidene, 3- (3-hydroxy-3-methylbutyl) cyclohexylidene, 3- (1-hydroxy-1-methylethyl) isopropenylcyclohexane, 4- (1- Hydroxy-1-methylethyl) cyclohexylamine,
The α, α- of claim 1, which is 2- (3-hydroxy-3-methylbutyl) cyclohexylidene and 7- (3′-hydroxy-3′-methylbutyl) -1,5-dioxospiro [5,5] undecane. A dimethylcyclohexane carbinol derivative or a salt thereof.
JP5131205A 1993-05-07 1993-05-07 Alpha,alpha-dimethylcyclohexanecarbinol derivative or its salt Pending JPH06321829A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5131205A JPH06321829A (en) 1993-05-07 1993-05-07 Alpha,alpha-dimethylcyclohexanecarbinol derivative or its salt

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5131205A JPH06321829A (en) 1993-05-07 1993-05-07 Alpha,alpha-dimethylcyclohexanecarbinol derivative or its salt

Publications (1)

Publication Number Publication Date
JPH06321829A true JPH06321829A (en) 1994-11-22

Family

ID=15052506

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH06321829A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3908676A1 (en) * 1988-12-24 1990-06-28 Samsung Electronics Co Ltd Process for forming low-resistance contacts on at least two n<+>-/p<+>-type pre-ohmic zones of a large-scale integrated semiconductor circuit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3908676A1 (en) * 1988-12-24 1990-06-28 Samsung Electronics Co Ltd Process for forming low-resistance contacts on at least two n<+>-/p<+>-type pre-ohmic zones of a large-scale integrated semiconductor circuit

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