JPH06320411A - Barrel polishing method - Google Patents

Barrel polishing method

Info

Publication number
JPH06320411A
JPH06320411A JP10797993A JP10797993A JPH06320411A JP H06320411 A JPH06320411 A JP H06320411A JP 10797993 A JP10797993 A JP 10797993A JP 10797993 A JP10797993 A JP 10797993A JP H06320411 A JPH06320411 A JP H06320411A
Authority
JP
Japan
Prior art keywords
polishing
liquid
work
mass
polishing tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10797993A
Other languages
Japanese (ja)
Inventor
Katsutoshi Ukai
勝俊 鵜飼
Kazutoshi Nishimura
一敏 西村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sintobrator Ltd
Original Assignee
Sintobrator Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sintobrator Ltd filed Critical Sintobrator Ltd
Priority to JP10797993A priority Critical patent/JPH06320411A/en
Publication of JPH06320411A publication Critical patent/JPH06320411A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent a work from being dented and broken by filling a polishing vessel with a liquid, then charging a work into the vessel, and polishing the work after discharging the liquid. CONSTITUTION:A discharge port 14a of the lower part of a polishing vessel 14 is closed, and water is filled in the polishing vessel 14. A mass comprising a work, a media and a compound is charged from a supply bucket 50 into the polishing vessel 14. A designated amount of mass is settled in the liquid to be accommodated in the polishing vessel 14. Subsequently, the discharge port 14a is opened to discharge the water. After discharging the water, the polishing vessel 14 is operated by a driving device 12, and a longitudinal shaft 11 is rotated to rotate a disc-like base plate 8 horizontally. Thus, the mass is repeatedly raised, turned and lowered along the inner peripheral wall of a liner 7 of a fixed cylinder by centrifugal force to perform polishing. Thus, the work is charged into a liquid so that shock at the time of charging can be lessened, and furthermore, as the mass is separated and slowly settled, the work can be prevented from being dented and broken.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はワークを研摩槽内へ投入
する際や研摩槽外へ排出する際において、ワークの打ち
傷や欠け等の発生を有効に防止することができるバレル
研摩方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a barrel polishing method capable of effectively preventing a work from being scratched or chipped when the work is put into the polishing tank or discharged from the polishing tank. Is.

【0002】[0002]

【従来の技術】研摩槽内にワーク、メディア、コンパウ
ンド等よりなるマスを投入し、該研摩槽を回転あるいは
振動させてマスを遠心力により研摩槽内で旋回流動させ
る等してワークのバリ取り、丸味付け等を行うようにし
た遠心流動式あるいは振動式のバレル研摩方法は従来よ
り広く知られている(例えば金属表面技術講座3「表面
研摩法」金属表面技術協会編(朝倉書店)参照)。
2. Description of the Related Art A mass of work, media, compound, etc. is put into a polishing tank, and the polishing tank is rotated or vibrated so that the mass is swirled and flowed in the polishing tank by centrifugal force. Centrifugal flow type or vibration type barrel polishing methods such as rounding have been widely known (see, for example, Metal Surface Technology Course 3, “Surface Polishing Method”, Metal Surface Technology Association (Asakura Shoten)). .

【0003】ところが、従来のこの種バレル研摩方法に
おいては、供給バケットからマスを研摩槽内へ単純に排
出シュートに自然落下させて投入するものであるため、
落下途中や研摩槽内への落下時においてワーク同志の接
触や研摩槽との衝突によりワークに打ち傷や欠け等が発
生するという問題点があった。一方、研摩槽から処理済
のワークを排出する場合においても、例えば、研摩槽を
傾動反転する等して次の選別装置等へ自然落下させる
が、この場合にもワーク同志の接触や選別装置との衝突
によりワークに打ち傷や欠け等が発生するという問題点
があった。この結果、特にセラミック部品やベアリング
のコロ等の衝撃に弱いとか打痕の発生を嫌うワークの場
合には不良品の発生が多発し、歩留り率が低下するとい
う問題点があった。
However, in the conventional barrel polishing method of this kind, since the mass is simply dropped from the supply bucket into the polishing tank to the discharge chute, the mass is introduced.
There has been a problem that the work is hit or chipped due to the contact between the works or the collision with the polishing tank during the fall or the drop into the polishing tank. On the other hand, even when the processed work is discharged from the polishing tank, for example, the polishing tank is tilted and inverted so as to be naturally dropped to the next sorting device or the like. However, there is a problem that the work may be scratched or chipped due to the collision. As a result, particularly in the case of a work that is vulnerable to impacts such as ceramic parts and roller of a bearing or in which the generation of dents is disliked, defective products frequently occur and the yield rate decreases.

【0004】[0004]

【発明が解決しようとする課題】本発明が解決しようと
する課題は、上記のような従来の問題点を解決して、ワ
ークを研摩槽内へ投入する際や研摩槽外へ排出する際に
おけるワークの打ち傷や欠け等の発生を有効に防止する
ことができて処理効率および歩留りを大幅に向上させる
ことができるバレル研摩方法を提供することにある。
SUMMARY OF THE INVENTION The problem to be solved by the present invention is to solve the above-mentioned problems of the prior art, and when the work is put into the polishing tank or discharged from the polishing tank. It is an object of the present invention to provide a barrel polishing method which can effectively prevent the work from being scratched or chipped and can greatly improve the processing efficiency and the yield.

【0005】[0005]

【課題を解決するための手段】上記の課題を解決するた
めになされた本発明は、研摩槽内に液体を満たしたのち
ワークを投入し、前記液体を排出したうえバレル研摩す
ることを特徴とするバレル研摩方法を第1の発明とし、
研摩槽内においてバレル研摩し、研摩後のマスを液体が
満たされた中間ホッパを介して排出することを特徴とす
るバレル研摩方法を第2の発明とし、研摩槽内に液体を
満たしたのちワークを投入し、前記液体を排出したうえ
バレル研摩し、研摩後のマスを液体が満たされたホッパ
を介して排出することを特徴とするバレル研摩方法を第
3の発明とするものである。
The present invention, which has been made to solve the above-mentioned problems, is characterized in that a polishing tank is filled with a liquid, a work is introduced, the liquid is discharged, and barrel polishing is performed. The first invention is a barrel polishing method
A second invention is a barrel polishing method characterized by barrel-polishing in a polishing tank and discharging the mass after polishing through an intermediate hopper filled with a liquid. A third aspect of the present invention is a barrel polishing method, characterized in that the liquid is discharged, the liquid is discharged, barrel polishing is performed, and the mass after polishing is discharged through a hopper filled with the liquid.

【0006】本発明は、ワークを研摩槽内に投入したり
研摩槽から排出させる際に研摩槽内や排出されるホッパ
に水等のバレル研摩に直接関係のない液体を満たしてこ
の液体の緩衝作用でワークの打痕などをなくそうとする
点に特長がある。すなわち、この方法によれば、研摩槽
やホッパに満たされた液体の液面が一次的な落下面とな
るのでワークが落下する距離が短くなるうえに液体が衝
撃を緩和し、しかも、ワークはこの液体によってゆっく
りと液中を沈降することとなるため、研摩槽やホッパ内
への投入されるワークの打ち傷や欠け等の発生が防止さ
れ、高い歩留り率で効率的に処理できる。なお、研摩槽
内には予めメディアやコンパウンド等の研摩材料を投入
しておいてもこれら研摩材料をワークとともに研摩槽に
投入するようにしてもよいことは勿論である。
According to the present invention, when a work is put into the polishing tank or discharged from the polishing tank, the polishing tank and the discharged hopper are filled with a liquid such as water, which is not directly related to barrel polishing, to buffer the liquid. The feature is that it tries to eliminate dents on the work by its action. That is, according to this method, since the liquid surface of the liquid filled in the polishing tank or the hopper serves as a primary drop surface, the distance that the workpiece falls is shortened, the liquid absorbs the impact, and the workpiece is Since this liquid causes the liquid to slowly settle in the liquid, it is possible to prevent the work that is put into the polishing tank or the hopper from being scratched or chipped, and to efficiently process with a high yield rate. It is needless to say that even if polishing materials such as media and compounds are put into the polishing tank in advance, these polishing materials may be put into the polishing tank together with the work.

【0007】なお、研摩槽やホッパに満たす液体として
は安価な水が一般的であるが、研摩槽へ満たされる液体
としては水の他、研摩液や防錆剤等を適宜添加しておく
こともでき、この場合には研摩槽からの液体排出時にそ
の一部を研摩槽内に残して研摩液として再利用すればよ
い。また、研摩槽としては遠心流動式のバレル研摩槽の
他、遊星旋回式のバレル研摩槽やボックス型あるいはサ
ークル型の振動式バレル研摩槽などあらゆるタイプの研
摩槽を用いることが可能である。
Although cheap water is generally used as a liquid to fill the polishing tank and the hopper, the liquid to be filled in the polishing tank should be water, as well as a polishing liquid, an anticorrosive agent and the like. In this case, when the liquid is discharged from the polishing tank, a part of the liquid may be left in the polishing tank and reused as the polishing liquid. Further, as the polishing tank, it is possible to use all types of polishing tanks such as a centrifugal flow type barrel polishing tank, a planetary rotation type barrel polishing tank, a box type or a circle type vibrating barrel polishing tank.

【0008】[0008]

【実旋例】次に、本発明を図示の傾動反転可能な遠心流
動式の研摩槽を用いた場合の一実旋例について詳細に説
明する。1は基台で、これに立設した一対の門形フレー
ム2、2には軸受3、3が対応設置してあり、該軸受
3、3間には上部が開放した皿状の回動フレーム4がそ
の両側に突設した水平軸5、5を介して軸支させてあ
る。回動フレーム4の上部開放側には内側にポリウレタ
ン等のライナ7を添装した固定筒体6が連結固定してあ
る。8は回動フレーム4の内側に沿って間隔を設けて位
置される皿状底盤であって、該皿状底盤8は、回動フレ
ーム4の底部中央のボス部9に設けた軸受10に軸支さ
れた縦軸11に水平状に固定されている。縦軸11の下
端はモータ等よりなる駆動装置12の駆動軸と連結され
ていて、皿状底盤8は回動フレーム4内において水平回
転可能とされている。皿状底盤8の表面には、前記ライ
ナ7と同様のライナ13が添装され、ライナ13の外周
側に環状に形成した突条部の上面が固定筒体6のライナ
7の下面に摺動可能に当接されて両ライナ7、13は連
続状の構成とされ、以上により研摩槽14が形成され
る。なお、14a は該研摩槽14の下部に設けられた開閉
自在な排出口、50は研摩槽14内へマスを供給するた
めの供給バケットである。
Example of Actual Rotation Next, one example of actual rotation in the case of using the illustrated centrifugal flow type polishing tank capable of tilting and reversing the present invention will be described in detail. Reference numeral 1 is a base, and bearings 3 are installed correspondingly to a pair of gate-shaped frames 2 and 2 which are erected on the base, and a plate-like rotating frame having an open top between the bearings 3 and 3. 4 is rotatably supported by horizontal shafts 5 and 5 projecting from both sides thereof. A fixed cylinder body 6 having a liner 7 made of polyurethane or the like attached therein is connected and fixed to the upper open side of the rotating frame 4. Reference numeral 8 denotes a dish-shaped bottom plate which is positioned along the inner side of the rotating frame 4 with a space therebetween. The dish-shaped bottom plate 8 is mounted on a bearing 10 provided on a boss portion 9 at the bottom center of the rotating frame 4. It is horizontally fixed to the supported vertical axis 11. The lower end of the vertical axis 11 is connected to a drive shaft of a drive device 12 including a motor or the like, and the dish-shaped bottom plate 8 is horizontally rotatable within the rotating frame 4. A liner 13 similar to the liner 7 is attached to the surface of the dish-shaped bottom plate 8, and the upper surface of the annular projection formed on the outer peripheral side of the liner 13 slides on the lower surface of the liner 7 of the fixed cylindrical body 6. Both liners 7 and 13 are brought into contact with each other as much as possible to form a continuous structure, and the polishing tank 14 is formed as described above. Reference numeral 14a is a discharge port provided in the lower portion of the polishing tank 14 which can be opened and closed, and 50 is a supply bucket for supplying a mass into the polishing tank 14.

【0009】また、一方の水平軸5には鎖歯車15が固
着しており、これはチェーン16を介して基台1のモー
タ17の鎖歯車18と連結され、モータ17の駆動によ
り回動フレーム4は研摩槽14を伴って水平軸5、5を
中心に垂直面内に正逆回転可能としてある。19は研摩
槽14のマス排出側に落差減少用として設けられる断面
U字形の案内シュートで、これは門形フレーム2、2間
に架設した横フレーム20に取付けてあり、案内シュー
ト19の案内面となる底板部21は、研摩槽14の傾動
反転中心である水平軸5を中心とする円弧状の湾曲面を
有し、その先端側は底板部21上を転動又は摺動しなが
ら落下するマスの落下速度減速用液体を収容するホッパ
22中へ臨ませてある。
A chain gear 15 is fixed to one of the horizontal shafts 5, and this chain gear 15 is connected to a chain gear 18 of a motor 17 of the base 1 via a chain 16 and driven by the motor 17 to rotate a rotating frame. 4 is capable of rotating in the vertical direction with the polishing tank 14 in the vertical plane about the horizontal axes 5 and 5. Reference numeral 19 is a guide chute having a U-shaped cross section provided on the mass discharge side of the polishing tank 14 for reducing the head. The bottom plate portion 21 has a curved surface in an arc shape centered on the horizontal axis 5 which is the tilt reversal center of the polishing tank 14, and its tip end falls while rolling or sliding on the bottom plate portion 21. It is exposed to the hopper 22 that contains the liquid for reducing the falling speed of the mass.

【0010】ホッパ22は門形フレーム2、2に設けた
適数個の支持アーム23に支持されている弾性部材24
を介して該門形フレーム2、2間に弾性支持され、その
一側には振動モータ25が取付けてある。また、ホッパ
22の一方の側壁26の下部にはマスの排出口27が形
成してあり、その外方には排出口27を開閉する扉28
が位置されている。扉28は外壁26の傾斜部の支持金
具26a に回動自在に取付けられた連結板29の一端に外
側が回動自在に連結され、更に連結板29の他端は、外
壁26に突設したブラケット30に回動自在として取付
けた流体圧シリンダ31のピストンロッド32の先端と
回動自在に連結されていて、流体圧シリンダ31の作動
によるピストンロッド32の進退動により扉28は排出
口27を閉鎖又は開放する構成となっている。また、扉
28の排出口27側には液体は通過できるがマスは通過
できないような透孔を多数設けたストレート33が取り
付けてあり、更に、扉28には排液口34が形成してあ
り、該排液口34に突設した筒体35の端部には薄形の
流体圧シリンダ36が固定してあり,そのピストンロッ
ド37の先端にはバルブ38が固着され,流体圧シリン
ダ36の作動によるピストンロッド37の進退動によ
り、バブル38が筒体35内を摺動して図示されない開
口を閉鎖又は開放するようにしてある。
The hopper 22 has an elastic member 24 supported by a suitable number of support arms 23 provided on the gate frames 2 and 2.
It is elastically supported between the gate-shaped frames 2 and 2, and a vibration motor 25 is attached to one side thereof. A discharge port 27 for the mass is formed in the lower part of one side wall 26 of the hopper 22, and a door 28 for opening and closing the discharge port 27 is provided outside thereof.
Is located. The outside of the door 28 is rotatably connected to one end of a connecting plate 29 that is rotatably attached to a supporting metal fitting 26a of the inclined portion of the outer wall 26, and the other end of the connecting plate 29 is provided on the outer wall 26 so as to project. A tip of a piston rod 32 of a fluid pressure cylinder 31 rotatably attached to a bracket 30 is rotatably connected, and the door 28 opens and closes the discharge port 27 by the movement of the piston rod 32 by the operation of the fluid pressure cylinder 31. It is configured to be closed or open. Further, a straight 33 having a large number of through holes through which the liquid can pass but the mass cannot pass is attached to the outlet 28 side of the door 28, and a drain port 34 is formed in the door 28. A thin fluid pressure cylinder 36 is fixed to the end of a cylindrical body 35 protruding from the drain port 34, and a valve 38 is fixed to the tip of a piston rod 37 of the fluid pressure cylinder 36. When the piston rod 37 moves back and forth due to the operation, the bubble 38 slides in the tubular body 35 to close or open an opening (not shown).

【0011】なお、39は案内シュート19の先端部下
方において研摩槽14に設けた落下マスの誘導板、41
はホッパ22の他の側壁40に取付けた給液管であり、
また、ホッパ22の排出口27の下方には選別装置42
が設置してある。選別装置42は適数個の弾性部材43
により基台1に弾性支持され、そのトラフ44の中間部
にはスクリーン45が水平状に張設してあり、スクリー
ン45の先端側のトラフ44にはワークの搬出口46が
スクリーン45上に臨ませて形成してあるとともに、先
端側のスクリーン45の下方には該スクリーン45を通
過して落下したメディア等の取り出し開口47が形成し
てあり、また、トラフ44の側壁には振動モータ48が
固定してあり、49は研摩槽14を傾動反転させた際、
内部のマスを正しく案内シュート19側へ流出させるた
めのマス絞り板で、研摩槽上端の反転側側面に所定の間
隔で取付けてあり、Sはホッパ22内の液体表面を示
す。
Reference numeral 39 is a drop mass guide plate provided in the polishing tank 14 below the tip of the guide chute 19;
Is a liquid supply pipe attached to the other side wall 40 of the hopper 22,
A sorting device 42 is provided below the discharge port 27 of the hopper 22.
Is installed. The sorting device 42 has an appropriate number of elastic members 43.
It is elastically supported by the base 1, and a screen 45 is horizontally stretched in the middle of the trough 44. A work carrying-out port 46 is exposed on the screen 45 in the trough 44 on the tip side of the screen 45. In addition to being formed, a take-out opening 47 for the media or the like that has passed through the screen 45 and dropped is formed below the screen 45 on the tip side, and a vibration motor 48 is provided on the side wall of the trough 44. It is fixed, and 49 is when the polishing tank 14 is tilted and inverted,
A mass diaphragm plate for allowing the internal mass to properly flow out to the guide chute 19 side, which is attached to the side of the upper end of the polishing tank on the reverse side at a predetermined interval, and S denotes the liquid surface in the hopper 22.

【0012】このように構成されたものは、まず研摩槽
14の下部にある排出口14a を閉状態として研摩槽14
内に水を満たした後、供給バケット50から研摩槽14
内にワーク、メディア、コンパウンド等よりなるマスを
投入して該マスを液中沈降させることにより所定量のマ
スを研摩槽14内に収容する。この時、液面と供給バケ
ット50の供給口との距離は短いのでマス中のワークの
落下時における衝撃は十分に緩衝され、また、集団で投
入されたマスは液中をバラバラになってゆっくりと沈降
するので、ワークの打ち傷や欠け等の発生が有効に防止
されることとなる。
In the case of such a structure, the polishing tank 14 is first closed with the discharge port 14a at the bottom of the polishing tank 14 being closed.
After filling the inside with water, from the supply bucket 50 to the polishing tank 14
A mass of work, media, compound, etc. is put therein and the mass is allowed to settle in the liquid, whereby a predetermined amount of mass is accommodated in the polishing tank 14. At this time, since the distance between the liquid surface and the supply port of the supply bucket 50 is short, the impact when the workpieces in the mass fall is sufficiently buffered, and the masses thrown in collectively disperse in the liquid slowly. Therefore, the work is effectively prevented from being scratched or chipped.

【0013】このようにして研摩槽14内にマスが投入
されたならば、前記排出口14a を開状態として研摩槽1
4内の水を排出したうえ研摩槽14を駆動装置12によ
り作動させると、縦軸11が回転して皿状底盤8が水平
回転し、装入されているワーク等のマスは遠心力により
固定筒体6のライナ7の内周壁に沿って上昇しながら旋
回下降し、この流動運動によりワークの研摩作業が行わ
れる。しかして、所定の研摩時間が終了したら駆動装置
12を停止する。そして、ホッパ22中に給液管41よ
り所定量の水又はこれに適量の防錆成分等を添加した液
体を入れるとともに、モータ17を起動して鎖歯車1
8、チェーン16、鎖歯車15を経て水平軸5、5を図
1において反時計方向へ回転させると、回動フレーム4
と共に研摩槽14は図3の矢印方向へ回動し、該研摩槽
14は下向き姿勢となる。この反転につれて研摩槽14
内のマスはマス絞り板49、49間よりあふれて案内シ
ュート19側へ放出され、その底板部21に沿って転動
又は滑動下降し、これらは順次ホッパ22の液体中へ落
下し、この液中通過における液体抵抗により落下速度が
低減されて誘導板39上へ沈降堆積する。
When the mass is put into the polishing tank 14 in this way, the discharge port 14a is opened and the polishing tank 1 is opened.
When the polishing tank 14 is operated by the drive device 12 after draining the water in 4, the vertical axis 11 rotates and the dish-shaped bottom plate 8 rotates horizontally, and the mass of the loaded work etc. is fixed by centrifugal force. The cylindrical body 6 swings and descends along the inner peripheral wall of the liner 7 while being raised, and the work of polishing is performed by this flow motion. Then, the drive unit 12 is stopped when the predetermined polishing time is over. Then, a predetermined amount of water or a liquid containing an appropriate amount of rust preventive component added thereto is put into the hopper 22 from the liquid supply pipe 41, and the motor 17 is activated to start the chain gear 1.
When the horizontal shafts 5 and 5 are rotated counterclockwise in FIG. 1 via 8, the chain 16 and the chain gear 15, the rotating frame 4
At the same time, the polishing tank 14 rotates in the direction of the arrow in FIG. 3, and the polishing tank 14 is in a downward posture. Polishing tank 14
The internal mass overflows from between the mass throttle plates 49, 49 and is discharged to the guide chute 19 side, and rolls or slides down along the bottom plate portion 21 thereof, and these successively drop into the liquid of the hopper 22, and this liquid Due to the liquid resistance in the middle passage, the falling speed is reduced and the particles settle down on the guide plate 39.

【0014】研摩槽14が所定の回動をして内部のマス
排出が終了したら、モータ17を逆回転させて研摩槽1
4を元位置へ復帰させる。これと同時に流体圧シリンダ
36を作動させ、ピストンロッド37を介してバブル3
8を後退させ、筒体35に形成される図示されない開口
を開くと、ホッパ22内の液体のみは排出口27、スト
レーナ33を経て排除される。その後、流体圧シリンダ
36を逆作動させてバルブ38を復帰させるとともに流
体圧シリンダ31を作動させてピストンロッド32を後
退させると、連結板29が支持金具26a の連結ピン部を
中心に回動して扉28が外方へ揺動し、排出口27が開
放される。これと同時に振動モータ25、48を作動さ
せると、ホッパ22中に衝撃なく回収されていたマスは
ホッパ22の振動により徐々に進行して排出口27より
排出され、選別装置42のスクリーン45上へ移し変え
られたうえスクリーン45上を図3の矢印で示す方向へ
進行し、この間にワークとメディアとに分級されてそれ
ぞれトラフ44の先端の搬出部46、取り出し開口47
より外部へ搬送される。
After the polishing tank 14 has rotated a predetermined amount to finish discharging the internal mass, the motor 17 is rotated in the reverse direction to polish the polishing tank 1.
Return 4 to its original position. At the same time, the fluid pressure cylinder 36 is actuated to move the bubble 3 through the piston rod 37.
When 8 is retracted and an opening (not shown) formed in the cylindrical body 35 is opened, only the liquid in the hopper 22 is removed through the discharge port 27 and the strainer 33. After that, when the fluid pressure cylinder 36 is reversely actuated to return the valve 38 and the fluid pressure cylinder 31 is actuated to retract the piston rod 32, the connecting plate 29 is rotated around the connecting pin portion of the support fitting 26a. Door 28 swings outward, and outlet 27 is opened. Simultaneously with this, when the vibration motors 25 and 48 are operated, the mass collected in the hopper 22 without impact is gradually advanced by the vibration of the hopper 22 and is discharged from the discharge port 27 and onto the screen 45 of the sorting device 42. After being transferred, it moves on the screen 45 in the direction shown by the arrow in FIG.
Is transported to the outside.

【0015】ホッパ22中のマスの排出が終了したら、
振動モータ25を停止して流体圧シリンダ31を逆作動
させ、ピストンロッド32を前進させて連結板29を介
して扉28を排出口27へ圧接してこれを閉鎖したの
ち、給液管41を開いて液体をホッパ22中へ所定の液
体表面Sに達するまで供給し、更に選別装置42におけ
るマス等の送り出しが終了したらその振動モータ48を
停止させ、研摩作業の一サイクルが完了する。なお、研
摩槽14の反転動作は一時停止を組み入れた間欠運転あ
るいは微速運転を適宜組み入れた変速運転により行われ
る。また、排出口27はマス排出専用とし、液体の排出
はホッパ22の他の位置に分離設置した別の排液口より
行うようにしたり、扉28をスライドゲート式とするな
ど細部の構成は任意であることは勿論である。
When the discharge of the mass in the hopper 22 is completed,
The vibration motor 25 is stopped, the fluid pressure cylinder 31 is reversely operated, the piston rod 32 is moved forward, the door 28 is pressed against the discharge port 27 through the connecting plate 29, and the discharge port 27 is closed. The liquid is supplied to the hopper 22 until it reaches a predetermined liquid surface S by opening, and when the feeding of the mass or the like in the sorting device 42 is completed, the vibration motor 48 is stopped to complete one cycle of the polishing work. The reversing operation of the polishing tank 14 is performed by an intermittent operation that incorporates a temporary stop or a shift operation that appropriately incorporates a slow speed operation. Further, the discharge port 27 is exclusively used for mass discharge, liquid is discharged through another liquid discharge port separately installed in another position of the hopper 22, and the door 28 is of a slide gate type. Of course,

【0016】なお、このようなバレル研摩装置を用いて
φ17mm×高さ16mmの家電用セラミックス部品を研摩処理
した結果、研摩槽へのマス投入時における欠け不良等の
発生は70本中1本(歩留り率 98.5 %以上)となり、
また、研摩槽からのマス排出時における欠け不良等の発
生は70本中1本(歩留り率 98.5 %以上)で、従来法
による場合のそれぞれの歩留り率が75〜80%であっ
たのに比べて大幅に歩留り率を向上させられることが確
認できた。
Incidentally, as a result of polishing a ceramics part for home appliances of φ17 mm × height 16 mm by using such a barrel polishing apparatus, the occurrence of chipping defects and the like when the mass is put into the polishing tank is 1 in 70 ( Yield rate of 98.5% or more),
In addition, one out of 70 chips (yield rate 98.5% or more) caused chipping defects when discharging the mass from the polishing tank, which was 75-80% in comparison with the conventional method. It was confirmed that the yield rate could be improved significantly.

【0017】[0017]

【発明の効果】以上の説明からも明らかなように、本発
明はワークを研摩槽内へ投入する際や研摩槽外へ排出す
る際に生じ勝ちなワークの打ち傷や欠け等の発生を有効
に防止することができ、処理効率および歩留りを大幅に
向上させることができるものであり、特に、ワークを研
摩槽内へ投入する際だけではなく研摩槽外へ排出する際
にも衝撃緩和用の液体を用いれば一連のバレル研摩作業
の効率および歩留りをより向上させることができる。よ
って本発明は従来の問題点を一掃したバレル研摩方法と
して、産業の発展に寄与するところは極めて大である。
As is apparent from the above description, the present invention effectively causes the occurrence of scratches or chipping of the work which tends to occur when the work is put into the polishing tank or discharged from the polishing tank. It is possible to prevent the impact, and it is possible to greatly improve the processing efficiency and the yield. Especially, the liquid for buffering the impact is not only when the work is put into the polishing tank but also when it is discharged from the polishing tank. Can improve the efficiency and yield of a series of barrel polishing operations. Therefore, the present invention is extremely useful as a barrel polishing method that eliminates the conventional problems and contributes to industrial development.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の処理工程を示す概略説明図である。FIG. 1 is a schematic explanatory view showing a processing step of the present invention.

【図2】本発明方法に用いるバレル研摩装置の1例を示
す一部切欠正面図である。
FIG. 2 is a partially cutaway front view showing an example of a barrel polishing apparatus used in the method of the present invention.

【図3】本発明方法に用いるバレル研摩装置の1例を示
す一部切欠側面図である。
FIG. 3 is a partially cutaway side view showing an example of a barrel polishing apparatus used in the method of the present invention.

【図4】図3および図4に示すバレル研摩装置における
研摩槽の作動状態を示す一部切欠正面図である。
4 is a partially cutaway front view showing an operating state of a polishing tank in the barrel polishing apparatus shown in FIGS. 3 and 4. FIG.

【符号の説明】[Explanation of symbols]

14 研摩槽 14a 排出口 22 ホッパ 27 排出口 14 Polishing tank 14a Discharge port 22 Hopper 27 Discharge port

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 研摩槽内に液体を満たしたのちワークを
投入し、前記液体を排出したうえバレル研摩することを
特徴とするバレル研摩方法。
1. A barrel polishing method comprising filling a polishing tank with a liquid, introducing a work, discharging the liquid, and performing barrel polishing.
【請求項2】 研摩槽内においてバレル研摩し、研摩後
のマスを液体が満たされた中間ホッパを介して排出する
ことを特徴とするバレル研摩方法。
2. A barrel polishing method characterized by barrel polishing in a polishing tank, and discharging the polished mass through an intermediate hopper filled with a liquid.
【請求項3】 研摩槽内に液体を満たしたのちワークを
投入し、前記液体を排出したうえバレル研摩し、研摩後
のマスを液体が満たされたホッパを介して排出すること
を特徴とするバレル研摩方法。
3. The polishing tank is filled with a liquid, then a work is introduced, the liquid is discharged, barrel polishing is performed, and the mass after polishing is discharged through a hopper filled with the liquid. Barrel polishing method.
JP10797993A 1993-05-10 1993-05-10 Barrel polishing method Pending JPH06320411A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10797993A JPH06320411A (en) 1993-05-10 1993-05-10 Barrel polishing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10797993A JPH06320411A (en) 1993-05-10 1993-05-10 Barrel polishing method

Publications (1)

Publication Number Publication Date
JPH06320411A true JPH06320411A (en) 1994-11-22

Family

ID=14472913

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10797993A Pending JPH06320411A (en) 1993-05-10 1993-05-10 Barrel polishing method

Country Status (1)

Country Link
JP (1) JPH06320411A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003082474A (en) * 2001-09-10 2003-03-19 Macoho Co Ltd Surface treatment equipment using barrel
WO2004048036A1 (en) * 2002-11-28 2004-06-10 Macoho.,Ltd Surface treatment device using barrel
CN105522469A (en) * 2016-01-25 2016-04-27 湖州市千金宝云机械铸件有限公司 Grinding system convenient to use
CN117773663A (en) * 2024-02-26 2024-03-29 内蒙古工业大学 Automatic polishing device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003082474A (en) * 2001-09-10 2003-03-19 Macoho Co Ltd Surface treatment equipment using barrel
JP4676659B2 (en) * 2001-09-10 2011-04-27 マコー株式会社 Surface treatment equipment using barrel
WO2004048036A1 (en) * 2002-11-28 2004-06-10 Macoho.,Ltd Surface treatment device using barrel
CN100434235C (en) * 2002-11-28 2008-11-19 马可有限公司 Surface treatment device using barrel
CN105522469A (en) * 2016-01-25 2016-04-27 湖州市千金宝云机械铸件有限公司 Grinding system convenient to use
CN105522469B (en) * 2016-01-25 2018-04-20 湖州市千金宝云机械铸件有限公司 Grinding system easy to use
CN117773663A (en) * 2024-02-26 2024-03-29 内蒙古工业大学 Automatic polishing device
CN117773663B (en) * 2024-02-26 2024-04-30 内蒙古工业大学 Automatic polishing device

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