JPH06318608A - Flat semiconductor device - Google Patents

Flat semiconductor device

Info

Publication number
JPH06318608A
JPH06318608A JP10710893A JP10710893A JPH06318608A JP H06318608 A JPH06318608 A JP H06318608A JP 10710893 A JP10710893 A JP 10710893A JP 10710893 A JP10710893 A JP 10710893A JP H06318608 A JPH06318608 A JP H06318608A
Authority
JP
Japan
Prior art keywords
electrode body
electrode
semiconductor device
pressure
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10710893A
Other languages
Japanese (ja)
Other versions
JP3102201B2 (en
Inventor
Hirotoshi Kaneda
博利 兼田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP05107108A priority Critical patent/JP3102201B2/en
Publication of JPH06318608A publication Critical patent/JPH06318608A/en
Application granted granted Critical
Publication of JP3102201B2 publication Critical patent/JP3102201B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Electrodes Of Semiconductors (AREA)
  • Thyristors (AREA)
  • Die Bonding (AREA)

Abstract

PURPOSE:To unify the pressure applied to the electrode surface of a semiconductor substrate by making the inner surface of an electrode body a projecting surface with a high center part. CONSTITUTION:An electrode body inner surface 7 is formed as a spherical surface and the center part is raised. When the difference between the center part and the outer-periphery part of the electrode body inner surface 7 is made 5, 10, and 20mum, 5mum projecting surface has no effect, 20mum projecting surface causes a pressure equal to or larger than the twice the pressure at the outer- periphery part to be applied to the center part, which being undesirable, and 10 and 15mum projecting surfaces achieves a uniformly pressed state. The proper projection numeric value is proportional to the diameter of the electrode body. Therefore, when the diameter of the electrode body is made Dmm, it is desirable to raise the center part by 0.1-0.2D, thus unifying the pressure applied to the electrode surface of the semiconductor substrate when a connection conductor comes into pressure contact with the outer surface of the electrode body.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、それぞれ接続導電体が
加圧接触する電極体が容器の両面に露出する平形半導体
装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat semiconductor device in which electrode bodies to which a connecting conductor is brought into pressure contact are exposed on both sides of a container.

【0002】[0002]

【従来の技術】放熱体を兼ねる接続導電体に加圧接触さ
れる電極体を有する平形半導体装置は、通電容量、放熱
能力を増大できる利点をもつので、電力用半導体装置と
してよく知られている。図2はそのような平形半導体装
置の一例を概念的に示し、モリブデンなどシリコンと近
似した熱膨張係数をもつ材料からなる支持板2にろう付
けされたシリコン基板1が、絶縁性環状側壁3とそれと
フランジ4を介して結合された電極体5とよりなる容器
内に収容され、シリコン基板1の反支持体側には導電性
接触板6が挿入されている。そして、電極体5に外部の
接続導電体が加圧接触するときに、半導体基板1の上面
の電極面に接触体6が、接触体6および支持板2に電極
体5の内面が加圧接触する。
2. Description of the Related Art A flat semiconductor device having an electrode body that is pressed into contact with a connection conductor that also serves as a heat radiator has the advantage of increasing the current carrying capacity and heat dissipation capability, and is therefore well known as a power semiconductor device. . FIG. 2 conceptually shows an example of such a flat semiconductor device, in which a silicon substrate 1 brazed to a support plate 2 made of a material having a thermal expansion coefficient similar to that of silicon such as molybdenum is used as an insulating annular side wall 3. It is housed in a container composed of it and an electrode body 5 connected via a flange 4, and a conductive contact plate 6 is inserted on the side opposite to the support of the silicon substrate 1. When an external connecting conductor is brought into pressure contact with the electrode body 5, the contact body 6 is brought into pressure contact with the electrode surface of the upper surface of the semiconductor substrate 1, and the inner surface of the electrode body 5 is brought into pressure contact with the contact body 6 and the support plate 2. To do.

【0003】[0003]

【発明が解決しようとする課題】しかし、従来の平形半
導体装置で、半導体基板1の電極面に加わる圧力は、図
3に示すように中央部分より外周部分が大きくなること
が数値計算および実測により判明している。すなわち、
中央部分より外周部分の方が約1.5倍大きな加圧力が半
導体基板に加わる。このような圧力の不均一により、半
導体装置の特性が損なわれたり、電極体5あるいは接続
導電体の変形が生じてしまうという問題があった。
However, in the conventional flat semiconductor device, the pressure applied to the electrode surface of the semiconductor substrate 1 becomes larger in the outer peripheral portion than in the central portion as shown in FIG. It's known. That is,
About 1.5 times larger pressure is applied to the semiconductor substrate in the outer peripheral portion than in the central portion. Due to such uneven pressure, the characteristics of the semiconductor device are impaired, and the electrode body 5 or the connection conductor is deformed.

【0004】本発明の目的は、この問題を解決し、半導
体基板の電極面に中央部分でも外周部分でも均一な圧力
が加わる平形半導体装置を提供することにある。
An object of the present invention is to solve this problem and to provide a flat semiconductor device in which uniform pressure is applied to the electrode surface of the semiconductor substrate in both the central portion and the outer peripheral portion.

【0005】[0005]

【課題を解決するための手段】上記の目的を達成するた
めに、本発明は、半導体基板を収容した容器の両面に露
出する電極体の内面に半導体基板がそれに固着された支
持板あるいは固着されない接触板を介して容器外部から
の加圧力のもとで電気的および熱的に導通する平形半導
体装置において、電極体の内面が中央部分の高い凸面を
なすものとする。そして、電極体の内面が、電極体の内
面が、電極体が直径Dmmの円柱体であるとき、中央部が
最外周部分より0.1〜0.2Dμmだけ高いことが有効で
ある。また、電極体の内面が実質的に球面であることが
有効である。
In order to achieve the above object, the present invention is a support plate having a semiconductor substrate fixed to the inner surface of an electrode body exposed on both sides of a container accommodating the semiconductor substrate, or not fixed to the inner surface of the electrode body. In a flat semiconductor device that electrically and thermally conducts under pressure from the outside of the container via a contact plate, the inner surface of the electrode body has a high convex surface in the central portion. When the inner surface of the electrode body is a cylindrical body having a diameter Dmm, it is effective that the central portion is higher than the outermost peripheral portion by 0.1 to 0.2 Dμm. Further, it is effective that the inner surface of the electrode body is substantially spherical.

【0006】[0006]

【作用】電極体の内面が平面である場合に、支持板ある
いは接触板を介して半導体基板の電極面に加わる、中央
部分より外周部分より低くなる加圧力が、電極体の内面
の中央部分を高くすることにより、中央部分へ加わる加
圧力が増加するために均一になる。
When the inner surface of the electrode body is flat, the pressure applied to the electrode surface of the semiconductor substrate through the supporting plate or the contact plate and lower than the outer peripheral portion than the central portion causes the central portion of the inner surface of the electrode body to move. By increasing the height, the pressing force applied to the central portion increases, so that the pressure becomes uniform.

【0007】[0007]

【実施例】図1は本発明の一実施例の平形半導体装置を
誇張して示し、図2と共通の部分には同一の符号が付さ
れている。この平形半導体装置では、電極体内面7が球
面として形成され、中央部分が高くなっている。直径80
mmの電極体5において、この電極体内面7の中央部分と
外周部分との差を、5μm、10μm、15μmおよび20μ
m凸としたとき、電極体5の外面に4ton の力を加える
ことによって半導体基板1の電極面にかかる圧力の分布
は、実測および数値計算により図4のようになることが
確かめられた。すなわち、5μm凸では効果がなく、20
μm凸では逆に中央部分に外周部分の2倍以上の過大な
圧力が加わり好ましくない。10μm凸および15μm凸で
は均一な加圧状態である。この適切な凸の数値は、電極
体の直径に比例する。従って、電極体の直径をDmmとし
たとき、0.1〜0.2Dだけ中央部分を高くすることが望
ましい。
1 is an exaggerated view of a flat semiconductor device according to an embodiment of the present invention, in which the same parts as those in FIG. 2 are designated by the same reference numerals. In this flat semiconductor device, the inner surface 7 of the electrode is formed as a spherical surface, and the central portion is raised. Diameter 80
In the electrode body 5 mm, the difference between the central portion and the outer peripheral portion of the inner surface 7 of the electrode is 5 μm, 10 μm, 15 μm and 20 μm.
It has been confirmed by actual measurement and numerical calculation that the distribution of the pressure applied to the electrode surface of the semiconductor substrate 1 by applying a force of 4 tons to the outer surface of the electrode body 5 is as shown in FIG. That is, if the projection is 5 μm, there is no effect, and
On the contrary, in the case of the μm convex, an excessive pressure more than twice as much as that of the outer peripheral portion is applied to the central portion, which is not preferable. A uniform pressure is applied to the 10 μm convex and 15 μm convex. This appropriate convex value is proportional to the diameter of the electrode body. Therefore, when the diameter of the electrode body is D mm, it is desirable to raise the central portion by 0.1 to 0.2D.

【0008】[0008]

【発明の効果】本発明によれば、容器外面に露出する電
極体の内面を平面でなく中央部の高い凸面とすることに
より、電極体外面に接続導電体が加圧接触したときに半
導体基板の電極面に加わる圧力を均一にすることがで
き、特性の劣化もしくは容器あるいは接続導電体の変形
の生ずることのない平形半導体装置が得られた。
According to the present invention, the inner surface of the electrode body exposed to the outer surface of the container is not a flat surface but a highly convex surface in the central portion, so that when the connecting conductor is pressed against the outer surface of the electrode body, the semiconductor substrate The flat semiconductor device can be obtained in which the pressure applied to the electrode surface can be made uniform, and the deterioration of the characteristics or the deformation of the container or the connecting conductor does not occur.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の平形半導体装置の概念的断
面図
FIG. 1 is a conceptual cross-sectional view of a flat semiconductor device according to an embodiment of the present invention.

【図2】従来の平形半導体装置の概念的断面図FIG. 2 is a conceptual sectional view of a conventional flat semiconductor device.

【図3】図2の半導体装置の半導体基板に加わる圧力の
分布線図
FIG. 3 is a distribution diagram of pressure applied to a semiconductor substrate of the semiconductor device of FIG.

【図4】図1の半導体装置の半導体基板に加わる圧力の
分布線図
4 is a distribution diagram of pressure applied to a semiconductor substrate of the semiconductor device of FIG.

【符号の説明】[Explanation of symbols]

1 半導体基板 2 支持板 3 容器側壁 5 電極体 6 接触板 7 電極体内面 1 semiconductor substrate 2 supporting plate 3 container side wall 5 electrode body 6 contact plate 7 electrode inner surface

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】半導体基板を収容した容器の両面に露出す
る電極体の内面に半導体基板がそれに固着された支持板
あるいは固着されない接触板を介して容器外部からの加
圧力のもとで電気的および熱的に導通するものにおい
て、電極体の内面が中央部分の高い凸面をなすことを特
徴とする平形半導体装置。
1. A container for accommodating a semiconductor substrate is electrically connected to the inner surface of an electrode body exposed on both sides of the container through a support plate fixed to the semiconductor substrate or a contact plate not fixed to the container under electrical pressure from the outside of the container. A flat semiconductor device in which the inner surface of the electrode body has a high convex surface in the central portion in the thermally conductive one.
【請求項2】電極体の内面が、電極体が直径Dmmの円柱
体であるとき、中央部分が最外周部分より0.1〜0.2D
μmだけ高い請求項1記載の平形半導体装置。
2. When the inner surface of the electrode body is a columnar body having a diameter Dmm, the central portion is 0.1 to 0.2D from the outermost peripheral portion.
The flat semiconductor device according to claim 1, which is higher by μm.
【請求項3】電極体の内面が実質的に球面である請求項
1あるいは2記載の平形半導体装置。
3. The flat semiconductor device according to claim 1, wherein the inner surface of the electrode body is substantially spherical.
JP05107108A 1993-05-10 1993-05-10 Flat semiconductor device Expired - Fee Related JP3102201B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP05107108A JP3102201B2 (en) 1993-05-10 1993-05-10 Flat semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP05107108A JP3102201B2 (en) 1993-05-10 1993-05-10 Flat semiconductor device

Publications (2)

Publication Number Publication Date
JPH06318608A true JPH06318608A (en) 1994-11-15
JP3102201B2 JP3102201B2 (en) 2000-10-23

Family

ID=14450677

Family Applications (1)

Application Number Title Priority Date Filing Date
JP05107108A Expired - Fee Related JP3102201B2 (en) 1993-05-10 1993-05-10 Flat semiconductor device

Country Status (1)

Country Link
JP (1) JP3102201B2 (en)

Also Published As

Publication number Publication date
JP3102201B2 (en) 2000-10-23

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