JPH06309922A - Electroconductive paste and light transmissive electroconductive film - Google Patents
Electroconductive paste and light transmissive electroconductive filmInfo
- Publication number
- JPH06309922A JPH06309922A JP12051893A JP12051893A JPH06309922A JP H06309922 A JPH06309922 A JP H06309922A JP 12051893 A JP12051893 A JP 12051893A JP 12051893 A JP12051893 A JP 12051893A JP H06309922 A JPH06309922 A JP H06309922A
- Authority
- JP
- Japan
- Prior art keywords
- film
- paste
- resin
- fine powder
- ito
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electroluminescent Light Sources (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Led Devices (AREA)
- Conductive Materials (AREA)
- Non-Insulated Conductors (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、エレクトロルミネッセ
ンス(EL)発光素子等の透光性電極の形成に用いる導
電ペースト及び透光性導電膜に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive paste and a transparent conductive film used for forming a transparent electrode such as an electroluminescence (EL) light emitting element.
【0002】[0002]
【従来の技術】従来のエレクトロルミネッセンス(E
L)発光素子等の透光性電極の形成に用いる導電ペース
トとしては、導電性フィラーとしてインジウム−錫酸化
物(ITO)超微粉末を、樹脂を溶解した溶剤中に分散
させたものや、リン片状のITO粉末を樹脂を溶解した
溶剤中に分散させたものがある。2. Description of the Related Art Conventional electroluminescence (E
L) As a conductive paste used for forming a light-transmitting electrode such as a light-emitting element, indium-tin oxide (ITO) ultrafine powder as a conductive filler is dispersed in a solvent in which a resin is dissolved, or phosphorus. There is one in which flaky ITO powder is dispersed in a solvent in which a resin is dissolved.
【0003】有機分散型EL素子では、基板に、発光層
である硫化亜鉛(ZnS)層をスクリーン印刷やブレー
ドコートで形成し、その上に導電ペーストをスクリーン
印刷等で塗布して透光性導電膜が形成される。In an organic dispersion type EL device, a zinc sulfide (ZnS) layer, which is a light emitting layer, is formed on a substrate by screen printing or blade coating, and a conductive paste is applied thereon by screen printing or the like to transmit a transparent conductive material. A film is formed.
【0004】ITO超微粉を導電性フィラーとして用い
る導電ペーストでは、導電性を得るために、樹脂に対し
て多量の導電性フィラーを用いる必要がある。この透光
性導電膜は、光線透過性を得るために、膜厚を2〜3μ
m程度の薄さとするのが好ましいとされている。In a conductive paste using ITO ultrafine powder as a conductive filler, it is necessary to use a large amount of conductive filler with respect to the resin in order to obtain conductivity. This transparent conductive film has a film thickness of 2 to 3 μm in order to obtain light transmittance.
It is said that it is preferable that the thickness is about m.
【0005】発光層である硫化亜鉛層は、硫化亜鉛粒子
が数十μmの大きさなので、印刷表面に凹凸が生じ、導
電ペーストを塗布した場合、硫化亜鉛層表面の凹凸によ
り導電ペーストの膜厚が不均一となり1μm以下の部分
や5μm以上の部分が生じ、全面に2〜3μmの導電膜
を均一に形成できず、薄い部分に亀裂が生じ、抵抗が増
加するという問題があった。In the zinc sulfide layer which is the light emitting layer, since the zinc sulfide particles have a size of several tens of μm, unevenness occurs on the printed surface, and when the conductive paste is applied, the unevenness of the surface of the zinc sulfide layer causes the thickness of the conductive paste to be different. Is non-uniform, and a portion of 1 μm or less or a portion of 5 μm or more is generated, a conductive film of 2 to 3 μm cannot be uniformly formed on the entire surface, and there is a problem that cracks occur in a thin portion and resistance increases.
【0006】リン片状のITO粉末を、樹脂を溶解した
溶剤中に分散させた導電ペーストでは、樹脂に対して少
量の導電性フィラーを用いることにより、導電性が得ら
れるため、5μm以上の厚さにしても十分な光線透過性
が得られ、硫化亜鉛層表面の凹凸はあまり問題とならな
い。しかし、膜の抵抗は十分とは言えない問題がある。In the conductive paste in which the flaky ITO powder is dispersed in the solvent in which the resin is dissolved, conductivity can be obtained by using a small amount of the conductive filler with respect to the resin. Even so, sufficient light transmittance is obtained, and unevenness on the surface of the zinc sulfide layer is not a serious problem. However, there is a problem that the resistance of the film is not sufficient.
【0007】[0007]
【発明が解決しようとする課題】本発明は、十分な導電
性と光線透過性がえられる導電ペースト及び透光性導電
膜を提供することを課題とする。SUMMARY OF THE INVENTION It is an object of the present invention to provide a conductive paste and a light-transmitting conductive film which have sufficient conductivity and light transmittance.
【0008】[0008]
【課題を解決するための手段】本発明の課題を解決する
ための手段は、樹脂及びその溶剤中に、長径5μm以上
で短径に対する長径の比が5以上の針状インジウム−錫
酸化物微粉末を含有する導電ペースト、及び針状インジ
ウム−錫酸化物微粉末と樹脂とからなる透光性導電膜で
あって、膜の比抵抗が1.0Ω・cm以下、膜中の針状
インジウム−錫酸化物微粉末の体積含有量が25容量%
以下である透光性導電膜にある。Means for Solving the Problems The means for solving the problems of the present invention is to provide acicular indium-tin oxide fine particles having a major axis of 5 μm or more and a major axis to minor axis ratio of 5 or more in a resin and its solvent. A conductive paste containing powder, and a translucent conductive film composed of acicular indium tin oxide fine powder and a resin, the specific resistance of the film being 1.0 Ω · cm or less, and the acicular indium in the film. Tin oxide fine powder volume content is 25% by volume
The following is in the transparent conductive film.
【0009】[0009]
【作用】本発明で用いる針状インジウム−錫酸化物微粉
末は、例えば、インジウムメタルを硝酸に溶解した溶液
に四塩化錫含水塩を加え、撹拌しながら加熱濃縮し、液
温130〜150℃まで濃縮して濃厚なスラリーを生成
せしめ、このスラリーに多量の水を加えて濾過し、濾過
によって得た針状粉末を洗浄、乾燥し、700℃程度で
30分程度仮焼して得られる。The acicular indium-tin oxide fine powder used in the present invention is obtained, for example, by adding tin tetrachloride hydrous salt to a solution of indium metal dissolved in nitric acid, concentrating by heating with stirring, and a liquid temperature of 130 to 150 ° C. Concentrate to form a thick slurry, add a large amount of water to this slurry, filter, wash the needle-shaped powder obtained by filtration, dry, and calcinate at about 700 ° C. for about 30 minutes to obtain a slurry.
【0010】この針状インジウム−錫酸化物微粉末は、
長径5μm以上、アスペクト比5以上で、添加する錫化
合物、濃縮条件によりアスペクト比が30程度のものま
で得られる。この粉末を100kgf/cm2の圧力を
加えてペレット状にしたときの比抵抗(以下、圧粉抵抗
という)は0.03Ω・cm程度である。This acicular indium-tin oxide fine powder is
A major axis of 5 μm or more, an aspect ratio of 5 or more, and an aspect ratio of about 30 can be obtained depending on the tin compound to be added and the concentration conditions. When this powder is applied with a pressure of 100 kgf / cm 2 to form a pellet, the specific resistance (hereinafter referred to as powder resistance) is about 0.03 Ω · cm.
【0011】本発明において、針状インジウム−錫酸化
物微粉末のアスペクト比を5以上とするのは、樹脂への
少量の使用で、導電性が得られるようにするためであ
る。アスペクト比5以下であると、透光性導電膜の導電
性フィラーの体積含有量を25%以下で、膜の比抵抗を
1.0Ω・cm以下にすることが達成出来ないからであ
る。アスペクト比は高い方がよく好ましくは10以上が
よい。In the present invention, the reason why the needle-like indium-tin oxide fine powder has an aspect ratio of 5 or more is that conductivity can be obtained by using a small amount of the resin in the resin. This is because if the aspect ratio is 5 or less, it is impossible to achieve the volume resistivity of the conductive filler of the translucent conductive film of 25% or less and the specific resistance of the film to 1.0 Ω · cm or less. A higher aspect ratio is better and preferably 10 or more.
【0012】本発明において、針状インジウム−錫酸化
物微粉末の長径を5μm以上とするのは、長径が大きい
程、粒子同士の接点の数が少なくて低抵抗の膜が得られ
ることと、例えば、分散型ELに用いる場合、塗布面の
蛍光体層は5〜30μm径の硫化亜鉛粒子を用いている
ため、その表面に数μm程度の凹凸があるが、長径が5
μm以上あると、このような凹凸があっても、針状粒子
同士の接触が保たれ、必要な導電性がえられるからであ
る。In the present invention, the acicular indium-tin oxide fine powder has a major axis of 5 μm or more because the larger the major axis, the smaller the number of contact points between the particles and the low resistance film is obtained. For example, when used in a dispersion type EL, since the phosphor layer on the coated surface uses zinc sulfide particles having a diameter of 5 to 30 μm, the surface has irregularities of about several μm, but the major axis is 5
This is because when the thickness is at least μm, the needle-shaped particles are kept in contact with each other even if such irregularities are present, and required conductivity is obtained.
【0013】ただし、長径が100μm以上となると、
スクリーン印刷時にスクリーンの網目を通りにくくな
り、印刷に支障を来す恐れがあるため、一般的には、1
00μm以下の長径のものが好ましい。ただ、100メ
ッシュ以下の粗い目のスクリーンを用いる場合はこの限
りではない。本発明導電ペーストでは、比較的に大きな
フィラーを用いているが、200μm程度の幅の線をス
クリーン印刷することは可能である。However, when the major axis is 100 μm or more,
Generally, it is difficult to pass through the screen mesh during screen printing, which may hinder printing.
A long diameter of 00 μm or less is preferable. However, this is not the case when using a coarse screen of 100 mesh or less. The conductive paste of the present invention uses a relatively large filler, but it is possible to screen-print a line having a width of about 200 μm.
【0014】本発明に用いる樹脂は、従来の透光性導電
膜に使用されている樹脂と同様の、熱可塑性樹脂、熱硬
化性樹脂、紫外線硬化樹脂等が用いられる。ペースト中
の針状インジウム−錫酸化物微粉末と樹脂の重量比は、
針状インジウム−錫酸化物微粉末:樹脂=60:40〜
80:20が良い。60:40より樹脂が多いと透光性
導電膜の抵抗が高くなりすぎ、80:20より樹脂が少
ないと透光性導電膜の強度が低下すると同時に抵抗も高
くなるからである。As the resin used in the present invention, a thermoplastic resin, a thermosetting resin, an ultraviolet curable resin or the like similar to the resin used in the conventional transparent conductive film is used. The weight ratio of acicular indium-tin oxide fine powder and resin in the paste is
Needle-shaped indium-tin oxide fine powder: resin = 60: 40-
80:20 is good. This is because if the amount of resin is more than 60:40, the resistance of the transparent conductive film becomes too high, and if the amount of resin is less than 80:20, the strength of the transparent conductive film is lowered and at the same time the resistance is increased.
【0015】導電性ペーストを塗布する基板によって
も、得られる透光性導電膜の抵抗が若干異なる。例え
ば、ポリエステルフイルムに塗布した方が、全般的にガ
ラスに塗布した場合よりも低抵抗の膜がえられる。The resistance of the obtained transparent conductive film is slightly different depending on the substrate to which the conductive paste is applied. For example, a film applied to a polyester film generally has a lower resistance than a film applied to glass.
【0016】本発明の透光性導電膜を、従来のITO超
微粉末を導電性フィラーとして用いた導電膜と比較する
と、本発明では高アスペクト比を有する針状インジウム
−錫酸化物微粉末を導電性フィラーとして用いているた
めに、最適な針状インジウム−錫酸化物微粉末と樹脂の
重量比が60:40〜80:20、好ましくは、65:
35〜70:30程度であるのに対して、従来のITO
超微粉末を用いたものでは、ITO:樹脂の重量比は8
5:15〜90:10程度である。このため本発明で
は、透光性導電膜の膜中の針状インジウム−錫酸化物微
粉末の体積含有量を25%以下にして、1.0Ω・cm
以下の比抵抗をうることができる。本発明では従来より
も導電膜を厚くすることが出来るので、表面抵抗を低く
することができる。Comparing the light-transmitting conductive film of the present invention with a conventional conductive film using ITO ultrafine powder as a conductive filler, in the present invention, acicular indium-tin oxide fine powder having a high aspect ratio is obtained. Since it is used as a conductive filler, the optimum weight ratio of acicular indium-tin oxide fine powder to resin is 60:40 to 80:20, preferably 65:40.
35 to 70:30, while conventional ITO
In the case of using ultrafine powder, the weight ratio of ITO: resin is 8
It is about 5:15 to 90:10. Therefore, in the present invention, the volume content of the acicular indium-tin oxide fine powder in the film of the transparent conductive film is set to 25% or less and 1.0 Ω · cm.
The following specific resistance can be obtained. In the present invention, since the conductive film can be made thicker than before, the surface resistance can be lowered.
【0017】本発明の透光性導電膜の光学特性を従来の
ITO超微粉末を用いた膜と比較すると、本発明の膜は
ヘーズ値が90%程度と非常に高いため、光の散乱が大
きく、そのため測定される全光線透過率は、50〜80
%と低い。しかし、例えばEL素子の透光性導電膜とし
て用いられた場合、その光線透過率が単純にELの輝度
に反映しない。本発明の透光性導電膜において、光線透
過率が低いのは、光の吸収が大きいのではなく、高いヘ
ーズにより入射光線の多くが散乱される為であり、EL
素子の輝度を考える場合には、散乱光よりもITO粒子
の光の吸収が問題となる。Comparing the optical characteristics of the translucent conductive film of the present invention with that of a conventional film using ITO ultrafine powder, the film of the present invention has a very high haze value of about 90%, so that light scattering occurs. It is large and therefore the total light transmittance measured is 50-80.
% Is low. However, when it is used as a translucent conductive film of an EL element, the light transmittance thereof does not simply reflect on the brightness of the EL. In the translucent conductive film of the present invention, the light transmittance is low because a large amount of incident light is scattered due to high haze rather than large light absorption.
When considering the brightness of the device, the absorption of light from the ITO particles is more important than the scattered light.
【0018】膜中に存在する針状インジウム−錫酸化物
微粉末の量が少ない程、光の吸収量が少ないと考えられ
る。従って少量の針状インジウム−錫酸化物微粉末で低
抵抗の透光性導電膜を形成できる本発明の透光性導電膜
は測定される光線透過率が低いにも拘らず高い輝度を得
ることができる。It is considered that the smaller the amount of acicular indium-tin oxide fine powder present in the film, the smaller the amount of light absorption. Therefore, the light-transmitting conductive film of the present invention capable of forming a low-resistance light-transmitting conductive film with a small amount of acicular indium-tin oxide fine powder can obtain high brightness despite the low measured light transmittance. You can
【0019】[0019]
実施例1 図1に示す、出願人製造の長径が5μm以上でアスペク
ト比が5以上、圧粉抵抗0.03Ω・cm、錫含有量2.
6重量%の針状インジウム−錫酸化物微粉末(以下IT
O粉末という)と、樹脂液とを表1のペースト1の組成
に配合して混合しよく撹拌した後、200メッシュステ
ンレス金網で濾過し、導電ペーストを得た。Example 1 As shown in FIG. 1, the major axis manufactured by the applicant is 5 μm or more, the aspect ratio is 5 or more, the dust resistance is 0.03 Ω · cm, and the tin content is 2.
6% by weight of acicular indium-tin oxide fine powder (hereinafter referred to as IT
O powder) and the resin liquid were mixed in the composition of paste 1 in Table 1 and mixed and stirred well, and then filtered through a 200-mesh stainless wire mesh to obtain a conductive paste.
【0020】得られた導電ペーストを、75×75×
1.1mmのソーダライムガラス板及び、これと同じ大
きさで厚さ100μmのポリエステルフイルム(東レ社
製、商品名ルミラーTタイプ)に、200メッシュのス
クリーン版で、4×5cmの大きさにスクリーン印刷
し、120℃、20分間乾燥、硬化させ透光性導電膜を
得た。ポリエステルフイルム上に得られた透光性導電膜
の2000倍顕微鏡写真を図2に示す。The obtained conductive paste is 75 × 75 ×
A 1.1 mm soda lime glass plate and a 100 μm thick polyester film of the same size (made by Toray Industries, Inc., trade name Lumirror T type) are screened to a size of 4 × 5 cm with a 200 mesh screen plate. Printing was performed, followed by drying at 120 ° C. for 20 minutes and curing to obtain a translucent conductive film. FIG. 2 shows a 2000-times micrograph of the translucent conductive film obtained on the polyester film.
【0021】得られた膜の膜厚、表面抵抗、全光線透過
率、ヘーズ値、膜の重量(ガラス板のみ)を測定した。
膜には表面に凹凸があるため膜厚は測定チャートから
0.5μm単位で読み取った。ポリエステルフイルムに
ついては、吸湿等で重量が変化するため重量は測定しな
かった。膜の比抵抗は、膜厚と表面抵抗から求め、膜の
ITO粉末体積含有率については、導電膜の重量、膜
厚、ペースト組成から求めた。The film thickness, surface resistance, total light transmittance, haze value, and film weight (glass plate only) of the obtained film were measured.
Since the surface of the film has irregularities, the film thickness was read from the measurement chart in units of 0.5 μm. The weight of the polyester film was not measured because the weight changes due to moisture absorption and the like. The specific resistance of the film was determined from the film thickness and the surface resistance, and the ITO powder volume content of the film was determined from the weight of the conductive film, the film thickness, and the paste composition.
【0022】膜の比抵抗(Ω・cm)=表面抵抗(Ω/
□)×膜厚(10-4cm) ITO粉末体積含有率(%)=膜重量(g)×{ITO
(g)/〔ITO(g)+樹脂(g)〕}×{1/7.
2(ITOの比重g/cm3)}×{1/〔4×5(面
積cm2)×膜厚(10-4cm)〕}×100Specific resistance of film (Ω · cm) = surface resistance (Ω /
□) × Film thickness (10 −4 cm) ITO powder volume content (%) = Film weight (g) × {ITO
(G) / [ITO (g) + resin (g)]} × {1/7.
2 (specific gravity of ITO g / cm 3 )} × {1 / [4 × 5 (area cm 2 ) × film thickness (10 −4 cm)]} × 100
【0023】膜厚は、東京精密社製の表面粗さ測定機、
商品名サーフコム900Aにより、表面抵抗は、三菱油
化社製の商品名ローレスタMCP−T400によりそれ
ぞれ測定した。全光線透過率、ヘーズ値は、基板のガラ
ス板及びポリエステルフイルムと一緒にスガ試験機械社
製の直読ヘーズコンピュータHGM−ZDPにより測定
した。The film thickness is measured by a surface roughness measuring device manufactured by Tokyo Seimitsu Co., Ltd.
The surface resistance was measured with a product name Surfcom 900A, and the surface resistance was measured with a product name Loresta MCP-T400 manufactured by Mitsubishi Petrochemical Co., Ltd., respectively. The total light transmittance and the haze value were measured by a direct reading haze computer HGM-ZDP manufactured by Suga Test Machine Co., Ltd. together with the glass plate of the substrate and the polyester film.
【0024】実施例2 ペーストの組成が表1のペースト2である以外は、実施
例1と同じITO粉末を用い実施例1同様にして導電ペ
ースト及び透光性導電膜を得た。ポリエステルフイルム
上に得られた透光性導電膜の2000倍顕微鏡写真を図
3に示す。実施例1と同様の測定を行い、得られた結果
を表2に示す。Example 2 A conductive paste and a translucent conductive film were obtained in the same manner as in Example 1 except that the same ITO powder as in Example 1 was used except that the composition of the paste was Paste 2 in Table 1. FIG. 3 shows a 2000 × micrograph of the translucent conductive film obtained on the polyester film. The same measurement as in Example 1 was performed, and the obtained results are shown in Table 2.
【0025】実施例3 ペーストの組成が表1のペースト3である以外は、実施
例1と同じITO粉末を用い実施例1と同様にして導電
ペースト及び透光性導電膜を得た。ポリエステルフイル
ム上に得られた透光性導電膜の2000倍顕微鏡写真を
図4に示す。実施例1と同様の測定を行い、得られた結
果を表2に示す。Example 3 A conductive paste and a light-transmissive conductive film were obtained in the same manner as in Example 1 except that the same ITO powder as in Example 1 was used except that the composition of the paste was Paste 3 in Table 1. FIG. 4 shows a 2000 × photomicrograph of the translucent conductive film obtained on the polyester film. The same measurement as in Example 1 was performed, and the obtained results are shown in Table 2.
【0026】実施例4 ペーストの組成が表1のペースト4である以外は、実施
例1と同じITO粉末を用い実施例1と同様にして導電
ペースト及び透光性導電膜を得た。ポリエステルフイル
ム上に得られた透光性導電膜の2000倍顕微鏡写真を
図5に示す。実施例1と同様の測定を行い、得られた結
果を表2に示す。Example 4 A conductive paste and a transparent conductive film were obtained in the same manner as in Example 1 except that the same ITO powder as in Example 1 was used except that the composition of the paste was paste 4 in Table 1. FIG. 5 shows a 2000 × photomicrograph of the translucent conductive film obtained on the polyester film. The same measurement as in Example 1 was performed, and the obtained results are shown in Table 2.
【0027】実施例5 ペーストの組成が表1のペースト5である以外は、実施
例1と同じITO粉末を用い実施例1と同様にして導電
ペースト及び透光性導電膜を得た。ポリエステルフイル
ム上に得られた透光性導電膜の2000倍顕微鏡写真を
図6に示す。実施例1と同様の測定を行い、得られた結
果を表2に示す。Example 5 A conductive paste and a translucent conductive film were obtained in the same manner as in Example 1, except that the same ITO powder as in Example 1 was used except that the composition of the paste was Paste 5 in Table 1. FIG. 6 shows a 2000-times micrograph of the transparent conductive film obtained on the polyester film. The same measurement as in Example 1 was performed, and the obtained results are shown in Table 2.
【0028】実施例6 錫含有量2.6重量%、圧粉抵抗0.03Ω・cmの図7
に示すITO粉末を用い、ペースト組成を表1のペース
ト6の組成とした以外は、実施例1と同様にして導電ペ
ースト及び透光性導電膜を得た。ポリエステルフイルム
上に得られた透光性導電膜の2000倍顕微鏡写真を図
8に示す。実施例1と同様の測定を行い、得られた結果
を表2に示す。Example 6 FIG. 7 with a tin content of 2.6% by weight and a dust resistance of 0.03 Ω · cm.
A conductive paste and a translucent conductive film were obtained in the same manner as in Example 1 except that the ITO powder shown in 1 was used and the paste composition was changed to that of paste 6 in Table 1. FIG. 8 shows a 2000 × photomicrograph of the translucent conductive film obtained on the polyester film. The same measurement as in Example 1 was performed, and the obtained results are shown in Table 2.
【0029】実施例7 実施例6で使用したITO粉末を用い、ペースト組成を
表1のペースト7の組成とした以外は、実施例1と同様
にして導電ペースト及び透光性導電膜を得た。実施例1
と同様の測定を行い、得られた結果を表2に示す。Example 7 A conductive paste and a translucent conductive film were obtained in the same manner as in Example 1 except that the ITO powder used in Example 6 was used and the paste composition was changed to that of paste 7 in Table 1. . Example 1
Measurements similar to those described above were performed, and the obtained results are shown in Table 2.
【0030】実施例8 樹脂として表1に示す紫外線硬化型樹脂を用い、実施例
6で使用したITO粉末を用い、ペースト組成を表1の
ペースト8の組成にした以外は実施例1と同様にして導
電ペースト及び透光性導電膜を得た。実施例1と同様の
測定を行い、得られた結果を表2に示す。膜の硬化は、
アイグラフィツク社製のメタルハイランドランプM01
−L212、照射器(コールドミラー型)UE011−
201C、電源装置UB01.51−3A/BM−E
2、熱線カットフィルターをを使用して、照度150m
W/cm2、20秒間、窒素ガス中で行った。Example 8 The same procedure as in Example 1 was carried out except that the ultraviolet curable resin shown in Table 1 was used as the resin, the ITO powder used in Example 6 was used, and the paste composition was the paste 8 shown in Table 1. Thus, a conductive paste and a transparent conductive film were obtained. The same measurement as in Example 1 was performed, and the obtained results are shown in Table 2. The curing of the film
Metal highland lamp M01 made by Eyegraftik Inc.
-L212, illuminator (cold mirror type) UE011-
201C, power supply device UB01.51-3A / BM-E
2. Using a heat ray cut filter, illuminance 150m
It was performed in nitrogen gas at W / cm 2 for 20 seconds.
【0031】実施例9 実施例1で使用したITO粉末を用い表1のペースト9
の組成とした以外は、実施例1と同様にして導電ペース
ト及び透光性導電膜を得た。実施例1と同様の測定を行
い、得られた結果を表2に示す。Example 9 Using the ITO powder used in Example 1, the paste 9 in Table 1 was used.
A conductive paste and a translucent conductive film were obtained in the same manner as in Example 1 except that the above composition was used. The same measurement as in Example 1 was performed, and the obtained results are shown in Table 2.
【0032】実施例10 実施例3で得られた導電ペーストで、3.3ライン/m
mのラインをスクリーン印刷し実施例1と同様にして得
られた透光性導電膜のラインパターンの100倍顕微鏡
写真を図9に示す。Example 10 The conductive paste obtained in Example 3 was used for 3.3 lines / m.
FIG. 9 shows a 100 × micrograph of the line pattern of the translucent conductive film obtained by screen-printing the line m in the same manner as in Example 1.
【0033】実施例11 実施例6で得られた導電ペーストを用い、有機分散型E
Lを試作した。先づ、片面にアルミニウムを蒸着した厚
さ100μm、面積4×5cm、0.95Ω/□のポリ
エステルフイルムのアルミニウム蒸着面に、絶縁層(誘
電層)としてチタン酸バリウムペースト(東北化工社製
TU−217)を200メッシュスクリーンを用いて
4×5cmの大きさに印刷し乾燥させた。Example 11 Using the conductive paste obtained in Example 6, organic dispersion type E
L was prototyped. First, a barium titanate paste (TU-made by Tohoku Kako Co., Ltd. as an insulating layer (dielectric layer) was formed on the aluminum vapor-deposited surface of a polyester film having a thickness of 100 μm, an area of 4 × 5 cm, and an area of 0.95 Ω / □, which was vapor-deposited on one surface. 217) was printed in a size of 4 × 5 cm using a 200 mesh screen and dried.
【0034】絶縁層の上に、硫化亜鉛ペースト(東北化
工社製 TU−219)を200メッシュスクリーンを
用いて4×5cmの大きさに2回刷りして乾燥した。そ
の上に実施例6の導電ペーストを200メッシュスクリ
ーンにより3×4cmの大きさに印刷し、120℃、1
0分間乾燥し透光性導電膜を形成した。On the insulating layer, zinc sulfide paste (TU-219 manufactured by Tohoku Kako Co., Ltd.) was printed twice in a size of 4 × 5 cm using a 200 mesh screen and dried. Then, the conductive paste of Example 6 was printed on a size of 3 × 4 cm with a 200 mesh screen, and 120 ° C., 1
It was dried for 0 minutes to form a transparent conductive film.
【0035】透光性導電膜の一端に電圧印荷用リード線
を、他端に抵抗測定用リード線を接続し、ポリエステル
フイルムのアルミニウム蒸着面の一端に電圧印荷用リー
ド線を接続した。そしてこれら積層体の両面に4×5c
mの捕水フイルムを重ね、更にその両側から前記のリー
ド線の端部を外部に露出せしめて5×6cmのフッ素フ
イルムで包み防湿ラミネート加工をしてEL素子を作っ
た。A voltage-carrying lead wire was connected to one end of the translucent conductive film, a resistance-measuring lead wire was connected to the other end, and the voltage-carrying lead wire was connected to one end of the aluminum deposition surface of the polyester film. And 4x5c on both sides of these laminates
m water-absorbing films were stacked, the ends of the lead wires were exposed to the outside from both sides of the film, and the film was wrapped with a 5 × 6 cm fluorine film for moisture-proof lamination to produce an EL device.
【0036】透光性導電膜の両端に接続した電圧印荷用
リード線と抵抗測定用リード線との間の抵抗を測定し
て、透光性導電膜の表面抵抗を測定し、透光性導電膜の
一端に接続した電圧印荷用リード線と、ポリエステルフ
イルムの蒸着面の一端に接続した電圧印荷用リード線と
の間に106V、800Hzの疑似台形波の電圧を印荷
し、EL素子を発光させ、その輝度を測定した。輝度測
定は輝度計(トプコン社製 商品名BM−8)で測定し
た。その結果を表3に示す。The resistance between the voltage-carrying lead wire and the resistance measuring lead wire connected to both ends of the transparent conductive film is measured to measure the surface resistance of the transparent conductive film. A voltage of a pseudo trapezoidal wave of 106 V and 800 Hz is applied between the voltage-carrying lead wire connected to one end of the conductive film and the voltage-carrying lead wire connected to one end of the vapor deposition surface of the polyester film. The device was made to emit light, and its brightness was measured. The brightness was measured with a brightness meter (trade name: BM-8, manufactured by Topcon). The results are shown in Table 3.
【0037】実施例12 実施例9のペーストを用いた以外は、実施例11と同様
にしてEL素子を作成し、同様の測定を行った。その結
果を表3に示す。Example 12 An EL device was prepared in the same manner as in Example 11 except that the paste of Example 9 was used, and the same measurement was carried out. The results are shown in Table 3.
【0038】比較例1 実施例1と同じITO粉末を用い、表1のペースト10
の組成とした以外は、実施例1と同様にして導電ペース
トを作成し、透光性導電膜を得た。実施例1と同様の測
定を行い、得られた結果を表2に示す。Comparative Example 1 The same ITO powder as in Example 1 was used, and the paste 10 in Table 1 was used.
A conductive paste was prepared in the same manner as in Example 1 except that the above composition was used to obtain a translucent conductive film. The same measurement as in Example 1 was performed, and the obtained results are shown in Table 2.
【0039】比較例2 実施例3の導電ペーストをスリーロールミルを用いて強
力な分散処理を施し、ITO粉末が折れアスペクトが5
以下のITO粉末が多く含まれるペーストを作った。こ
のペーストを用いて実施例1と同様にして透光性導電膜
を得た。ポリエステルフイルム上に得られた透光性導電
膜の2000倍顕微鏡写真を図10に示す。実施例1と
同様の測定を行い、得られた結果を表2に示す。Comparative Example 2 The conductive paste of Example 3 was subjected to a strong dispersion treatment using a three-roll mill, and the ITO powder was broken and the aspect ratio was 5
A paste containing a large amount of the following ITO powder was made. Using this paste, a transparent conductive film was obtained in the same manner as in Example 1. FIG. 10 shows a 2000 × photomicrograph of the translucent conductive film obtained on the polyester film. The same measurement as in Example 1 was performed, and the obtained results are shown in Table 2.
【0040】比較例3 導電性フィラーとして平均粒径0.03μmのITO超
微粉を、アクリル樹脂と溶剤に分散させた表1のペース
ト11の組成になる導電ペースト(東北化工社製 商品
名X−101)を、75×75×1.1mm厚のソーダ
ーライムガラス及び厚さ100μmで大きさ75×75
mmのポリエステルフイルム(東レ社製ルミラーTタイ
プ)に、4×5cmの大きさに300メッシュのスクリ
ーン版で印刷した後、赤外線で50℃、10分間、次に
120℃、5分間乾燥し、透光性導電膜を得た。得られ
たポリエステルフイルム上の透光性導電膜の10000
倍顕微鏡写真を図11に示す。また実施例1と同様の測
定を行った。結果を表2に示す。Comparative Example 3 A conductive paste having a composition of paste 11 shown in Table 1 obtained by dispersing ITO ultrafine powder having an average particle size of 0.03 μm as a conductive filler in an acrylic resin and a solvent (trade name X- manufactured by Tohoku Kako Co., Ltd.). 101) is a 75 × 75 × 1.1 mm thick soda lime glass and a thickness of 100 μm and a size of 75 × 75.
mm polyester film (Lumirror T type, manufactured by Toray Industries, Inc.) was printed with a 300 mesh screen plate having a size of 4 × 5 cm, and then dried with infrared rays at 50 ° C. for 10 minutes, then 120 ° C. for 5 minutes, and then transparent A photoconductive film was obtained. 10000 of the translucent conductive film on the obtained polyester film
A magnified micrograph is shown in FIG. The same measurement as in Example 1 was performed. The results are shown in Table 2.
【0041】[0041]
【表1】 ペースト組成 成分 重量% ITO粉末/ 樹脂重量比 ─────────────────────────────────── ペースト1 ITO粉末 40.0 アクリル樹脂A 10.0 80:20 (綜研化学社製、商品名サーモラックM−45C) 溶剤A イソホロン 50.0 ─────────────────────────────────── ペースト2 ITO粉末 30.5 アクリル樹脂A 13.0 70:30 溶剤A 56.5 ─────────────────────────────────── ペースト3 ITO粉末 29.0 アクリル樹脂A 14.0 67.5:32.5 溶剤A 57.0 ─────────────────────────────────── ペースト4 ITO粉末 27.7 アクリル樹脂A 14.9 65:35 溶剤A 57.4 ─────────────────────────────────── ペースト5 ITO粉末 27.0 アクリル樹脂A 18.0 60:40 溶剤A 55.0 ─────────────────────────────────── ペースト6 ITO粉末 29.4 アクリル樹脂B 14.1 67.5:32.5 (三菱レイヨン社製 ダイヤナールBR−80) 溶剤A 56.5 ─────────────────────────────────── ペースト7 ITO粉末 39.8 アクリル系熱硬化性樹脂 19.1 67.5:32.5 (関西ペイント社製 商品名マジクロンNo.1000) 溶剤A 41.1 ─────────────────────────────────── ペースト8 ITO粉末 34.2 ビニルエステル樹脂 13.7 (昭和高分子社製 商品名リポキシVR−77) トリメチロールプロパントリアクリレート 8.0 2-ヒドロキシ-2-メチル-1-フェニル-プロパノン-1 1.1 60:40 溶剤A 43.0 ─────────────────────────────────── ペースト9 ITO粉末 30.5 高誘電熱可塑性樹脂 15.5 67:33 (信越化学工業社製 商品名シアノレジンCR−S) 溶剤 γ−ブチロラクトン 53.0 ─────────────────────────────────── ペースト10 ITO粉末 21.5 樹脂A 21.5 50:50 溶剤A 57.0 ─────────────────────────────────── ペースト11 ITO超微粉 29.0 樹脂A 6.9 88:12 溶剤A 42.7 ───────────────────────────────────[Table 1] Paste composition Ingredients% by weight ITO powder / resin weight ratio ──────────────────────────────────── Paste 1 ITO powder 40.0 Acrylic resin A 10.0 80:20 (Soken Chemical Co., Ltd., trade name Thermolac M-45C) Solvent A Isophorone 50.0 ─────────────── ───────────────────── Paste 2 ITO powder 30.5 Acrylic resin A 13.0 70:30 Solvent A 56.5 ──────── ─────────────────────────── Paste 3 ITO powder 29.0 Acrylic resin A 14.0 67.5: 32.5 Solvent A 57 .0 ─────────────────────────────────── Paste 4 ITO powder 27.7 Acrylic resin A 14.9 65:35 Solvent A 57.4 ─────────────────────────────────── Paste 5 ITO Powder 27.0 Acrylic resin A 18.0 60:40 Solvent A 55.0 ───────────────────────────────── ─── Paste 6 ITO powder 29.4 Acrylic resin B 14.1 67.5: 32.5 (Mitsubishi Rayon Co., Ltd. Dynal BR-80) Solvent A 56.5 ──────────── ──────────────────────── Paste 7 ITO powder 39.8 Acrylic thermosetting resin 19.1 67.5: 32.5 (Kansai Paint Company name Magicron No.1000) Solvent A 41.1 ─────────────────────────────────── Paste 8 IT Powder 34.2 Vinyl ester resin 13.7 (trade name Lipoxy VR-77 manufactured by Showa High Polymer Co., Ltd.) Trimethylolpropane triacrylate 8.0 2-Hydroxy-2-methyl-1-phenyl-propanone-1 1.1 60 : 40 Solvent A 43.0 ─────────────────────────────────── Paste 9 ITO powder 30.5 High Dielectric thermoplastic resin 15.5 67:33 (trade name Cyanoresin CR-S manufactured by Shin-Etsu Chemical Co., Ltd.) Solvent γ-butyrolactone 53.0 ───────────────────── ─────────────── Paste 10 ITO powder 21.5 Resin A 21.5 50:50 Solvent A 57.0 ─────────────── ──────────────────── Paste 11 ITO ultrafine powder 29.0 Resin A 6. 88:12 solvent A 42.7 ───────────────────────────────────
【0042】[0042]
【表2】 実施例 ヘ゜ースト 基板 塗膜物性 組成 膜厚 ITO 表面抵抗 膜比抵抗 全光線 ヘーズ値 (μm) 体積含 (Ω/□) (Ω・cm) 透過率 (%) 率(%) (%) 1 1 ガラス 7.5 19.7 630 0.47 40.1 92.8 PET 6.5 405 0.26 44.3 92.6 2 2 ガラス 6.0 17.5 383 0.23 58.7 92.8 PET 6.0 342 0.21 59.4 92.8 3 3 ガラス 6.0 17.6 410 0.25 62.5 92.6 PET 6.0 405 0.24 64.3 92.7 4 4 ガラス 5.0 16.5 486 0.24 64.2 92.8 PET 5.0 468 0.23 65.8 92.7 5 5 ガラス 5.5 15.0 1500 0.83 70.3 92.6 PET 5.5 1100 0.61 72.1 92.5 6 6 ガラス 5.0 15.8 347 0.17 77.1 82.2 PET 7.0 147 0.10 73.0 90.7 7 7 ガラス 9.0 19.8 189 0.17 63.7 91.2 PET 14.0 176 0.25 61.6 92.0 8 8 ガラス 8.0 16.9 140 0.11 50.5 92.2 PET 8.0 145 0.12 52.0 92.0 9 9 ガラス 6.0 16.2 490 0.29 60.4 92.7 PET 6.0 410 0.25 65.3 92.6 ─────────────────────────────────── 比較例 1 10 ガラス 5.0 12.3 1.5×104 7.5 78.0 91.5 PET 6.0 1.1×104 6.6 79.0 91.6 2 3 ガラス 4.0 21.1 4820 1.93 70.5 92.5 PET 4.5 3870 1.74 70.0 92.7 3 11 ガラス 1.9 43.4 630 0.12 80.7 9.3 PET 2.5 520 0.13 78.5 10.6 ─────────────────────────────────── ガラスはガラス板を、PETはポリエステルフイルムを
示す。[Table 2] Example Hoast Substrate Coating film Physical composition Composition Thickness ITO surface resistance Membrane specific resistance Total ray haze value (μm) Volume included (Ω / □) (Ω · cm) Transmittance (%) Rate (%) (%) ) 1 1 glass 7.5 19.7 630 0.47 40.1 92.8 PET 6.5 405 0.26 44.3 92.6 2 2 glass 6.0 17.5 383 0.23 58.7 92.8 PET 6.0 342 0.21 59.4 92.8 3 3 glass 6.0 17.6 410 0.25 62.5 92.6 PET 6.0 405 0.24 64.3 92.7 4 4 glass 5.0 16.5 486 0.24 64.2 92.8 PET 5.0 468 0.23 65.8 92.7 55 Glass 5.5 15.0 1500 0.83 70.3 92.6 PET 5.5 1100 0.61 72.1 92.5 6 6 Glass 5.0 15.8 347 0.17 77.1 82.2 PET 7.0 147 0.10 73.0 90.7 7 7 Glass 9.0 19.8 189 0.17 63.7 91.2 PET 14.0 176 0.25 61.6 92.0 8 8 Glass 8.0 16.9 140 0.11 50.5 92.2 PET 8.0 145 0.12 52.0 92.0 9 9 Glass 6.0 16.2 490 0.29 60.4 92.7 PET 6.0 410 0.25 65.3 92.6 ────────────── ───────────── ──────── Comparative Example 1 10 Glass 5.0 12.3 1.5 × 10 4 7.5 78.0 91.5 PET 6.0 1.1 × 10 4 6.6 79.0 91.6 2 3 Glass 4.0 21.1 4820 1.93 70.5 92.5 PET 4.5 3870 1.74 70.0 92.7 3 11 Glass 1.9 43.4 630 0.12 80.7 9.3 PET 2.5 520 0.13 78.5 10.6 ─────────────────────────────────── Glass is a glass plate And PET indicates a polyester film.
【0043】[0043]
【表3】 透光性導電膜 表面抵抗(Ω/□) EL輝度 (導電ペースト) (Cd/m2) 実施例11 ITO粉末膜 188 198 (ペースト6) 実施例12 ITO粉末膜 720 212 (ペースト9)[Table 3] Translucent conductive film Surface resistance (Ω / □) EL brightness (conductive paste) (Cd / m 2 ) Example 11 ITO powder film 188 198 (Paste 6) Example 12 ITO powder film 720 212 (Paste) 9)
【0044】[0044]
【発明の効果】本発明によれば、十分な導電性と光線透
過性がえられる導電ペースト及び透光性導電膜を提供す
ることができる。According to the present invention, it is possible to provide a conductive paste and a light-transmissive conductive film which have sufficient conductivity and light transmittance.
【図1】実施例1において使用した針状インジウム−錫
酸化物微粉末の結晶構造を示す顕微鏡写真図である。FIG. 1 is a micrograph showing a crystal structure of acicular indium-tin oxide fine powder used in Example 1.
【図2】実施例1で得られた透光性導電膜の顕微鏡写真
図である。FIG. 2 is a micrograph of a translucent conductive film obtained in Example 1.
【図3】実施例2で得られた透光性導電膜の顕微鏡写真
図である。FIG. 3 is a micrograph of a translucent conductive film obtained in Example 2.
【図4】実施例3で得られた透光性導電膜の顕微鏡写真
図である。FIG. 4 is a micrograph of the translucent conductive film obtained in Example 3.
【図5】実施例4で得られた透光性導電膜の顕微鏡写真
図である。5 is a micrograph of a translucent conductive film obtained in Example 4. FIG.
【図6】実施例5で得られた透光性導電膜の顕微鏡写真
図である。FIG. 6 is a micrograph of a translucent conductive film obtained in Example 5.
【図7】実施例6において使用した針状インジウム−錫
酸化物微粉末の結晶構造を示す顕微鏡写真図である。7 is a micrograph showing a crystal structure of needle-shaped indium-tin oxide fine powder used in Example 6. FIG.
【図8】実施例6で得られた透光性導電膜の顕微鏡写真
図である。8 is a micrograph of a translucent conductive film obtained in Example 6. FIG.
【図9】実施例10で得られた透光性導電膜のラインパ
ターンの顕微鏡写真図である。9 is a micrograph of a line pattern of the transparent conductive film obtained in Example 10. FIG.
【図10】比較例2で得られた透光性導電膜の顕微鏡写
真図である。10 is a micrograph of a transparent conductive film obtained in Comparative Example 2. FIG.
【図11】比較例3で得られた透光性導電膜の顕微鏡写
真図である。11 is a micrograph of a transparent conductive film obtained in Comparative Example 3. FIG.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 H01L 23/31 33/00 N 7376−4M H05K 1/09 A 6921−4E ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI Technical display location H01L 23/31 33/00 N 7376-4M H05K 1/09 A 6921-4E
Claims (3)
で短径に対する長径の比が5以上の針状インジウム−錫
酸化物微粉末を含有する導電ペースト。1. A conductive paste comprising a resin and a solvent thereof containing acicular indium-tin oxide fine powder having a major axis of 5 μm or more and a major axis to minor axis ratio of 5 or more.
の重量比が60:40から80:20である請求項1に
記載の導電ペースト。2. The conductive paste according to claim 1, wherein a weight ratio of acicular indium-tin oxide fine powder: resin is 60:40 to 80:20.
とからなる透光性導電膜であって、膜の比抵抗が1.0
Ω・cm以下、膜中の針状インジウム−錫酸化物微粉末
の体積含有量が25容量%以下である透光性導電膜。3. A translucent conductive film comprising acicular indium-tin oxide fine powder and a resin, the specific resistance of which is 1.0.
A translucent conductive film having an Ω · cm or less and a volume content of fine acicular indium-tin oxide powder in the film of 25% by volume or less.
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12051893A JP3359093B2 (en) | 1993-04-23 | 1993-04-23 | Conductive paste and translucent conductive film |
US08/222,280 US5580496A (en) | 1993-04-05 | 1994-04-04 | Raw material for producing powder of indium-tin oxide aciculae and method of producing the raw material, powder of indium-tin oxide aciculae and method of producing the powder, electroconductive paste and light-transmitting |
US08/659,821 US5833941A (en) | 1993-04-05 | 1996-06-07 | Raw material for producing powder of indium-tin oxide aciculae and method of producing the raw material, powder of indium-tin oxide aciculae and method of producing the powder, electroconductive paste and light-transmitting electroconductive film |
US08/662,150 US5849221A (en) | 1993-04-05 | 1996-06-12 | Raw material for producing powder of indium-tin oxide aciculae and method of producing the raw material, powder of indium-tin oxide aciculae and method of producing the powder, electroconductive paste and light-transmitting electroconductive film |
US08/662,145 US5820843A (en) | 1993-04-05 | 1996-06-12 | Raw material for producing powder of indium-tin oxide aciculae and method of producing the raw material, powder of indium-tin oxide aciculae and method of producing the powder, electroconductive paste and light-transmitting electroconductive film |
US09/199,443 US6511614B1 (en) | 1993-04-05 | 1999-02-19 | Raw material for producing powder of indium-tin oxide aciculae and method of producing the raw material, powder of indium-tin oxide aciculae and method of producing the powder, electroconductive paste and light-transmitting electroconductive film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12051893A JP3359093B2 (en) | 1993-04-23 | 1993-04-23 | Conductive paste and translucent conductive film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH06309922A true JPH06309922A (en) | 1994-11-04 |
JP3359093B2 JP3359093B2 (en) | 2002-12-24 |
Family
ID=14788228
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12051893A Expired - Fee Related JP3359093B2 (en) | 1993-04-05 | 1993-04-23 | Conductive paste and translucent conductive film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3359093B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007149631A (en) * | 2005-11-02 | 2007-06-14 | Sumitomo Metal Mining Co Ltd | Translucent conductive coating and translucent conductive film |
JP2009224152A (en) * | 2008-03-14 | 2009-10-01 | Sumitomo Metal Mining Co Ltd | Transparent electrode, transparent conductive substrate, and transparent touch panel |
JP2010103109A (en) * | 2009-10-08 | 2010-05-06 | Jgc Catalysts & Chemicals Ltd | Application liquid for forming transparent conductive coat, base material with transparent conductive coat, and display device |
JP2010165641A (en) * | 2009-01-19 | 2010-07-29 | Hitachi Maxell Ltd | Transparent conductive film and method of manufacturing the same |
US8388871B2 (en) | 2006-04-07 | 2013-03-05 | Sumitomo Metal Mining Co., Ltd. | Translucent conductive film forming coating liquid, translucent conductive film, and dispersive type electroluminescent device |
-
1993
- 1993-04-23 JP JP12051893A patent/JP3359093B2/en not_active Expired - Fee Related
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007149631A (en) * | 2005-11-02 | 2007-06-14 | Sumitomo Metal Mining Co Ltd | Translucent conductive coating and translucent conductive film |
US8388871B2 (en) | 2006-04-07 | 2013-03-05 | Sumitomo Metal Mining Co., Ltd. | Translucent conductive film forming coating liquid, translucent conductive film, and dispersive type electroluminescent device |
JP2009224152A (en) * | 2008-03-14 | 2009-10-01 | Sumitomo Metal Mining Co Ltd | Transparent electrode, transparent conductive substrate, and transparent touch panel |
JP2010165641A (en) * | 2009-01-19 | 2010-07-29 | Hitachi Maxell Ltd | Transparent conductive film and method of manufacturing the same |
JP2010103109A (en) * | 2009-10-08 | 2010-05-06 | Jgc Catalysts & Chemicals Ltd | Application liquid for forming transparent conductive coat, base material with transparent conductive coat, and display device |
Also Published As
Publication number | Publication date |
---|---|
JP3359093B2 (en) | 2002-12-24 |
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