JPH0628615A - Production of alloy film of magnetic head core and its apparatus for production - Google Patents
Production of alloy film of magnetic head core and its apparatus for productionInfo
- Publication number
- JPH0628615A JPH0628615A JP18327492A JP18327492A JPH0628615A JP H0628615 A JPH0628615 A JP H0628615A JP 18327492 A JP18327492 A JP 18327492A JP 18327492 A JP18327492 A JP 18327492A JP H0628615 A JPH0628615 A JP H0628615A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- alloy film
- gaseous
- pressures
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/14—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel
- H01F10/147—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing iron or nickel with lattice under strain, e.g. expanded by interstitial nitrogen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
- H01F41/183—Sputtering targets therefor
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は磁気ヘッドコアの合金膜
製造方法およびその製造装置に関し、特に積層型磁気ヘ
ッドコアに適用する窒化鉄系の合金膜製造方法およびそ
の製造装置に関す。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing an alloy film for a magnetic head core and a manufacturing apparatus thereof, and more particularly to a method of manufacturing an iron nitride alloy film applied to a laminated magnetic head core and a manufacturing apparatus thereof.
【０００２】[0002]
【従来の技術】近年のハイビジョンＶＴＲに代表される
高画質ＶＴＲ等では、高密度の磁気記録再生が要求さ
れ、図４に示すような、積層型ヘッドが使用される。こ
こで、磁性膜１１は、飽和磁化の大きな軟磁気特性を有
する材質で形成する必要があり、例えば、鉄（Ｆｅ）、
タンタル（Ｔａ）、および窒素（Ｎ）を成分とする窒化
鉄系の合金膜（ＦｅＴａＮ）としたものが開発されてい
る。（第１５回日本応用磁気学会学術講演概要集，２９
ａＡ−１１）。2. Description of the Related Art In a high-quality VTR represented by a high-definition VTR in recent years, high density magnetic recording / reproducing is required, and a laminated head as shown in FIG. 4 is used. Here, the magnetic film 11 needs to be formed of a material having a large saturation magnetization and having a soft magnetic characteristic. For example, iron (Fe),
An iron nitride-based alloy film (FeTaN) containing tantalum (Ta) and nitrogen (N) as components has been developed. (Proceedings of the 15th Annual Meeting of the Applied Magnetics Society of Japan, 29
aA-11).
【０００３】このような合金膜は、スパッタリング装置
を使用して、ＦｅＴａ合金ターゲットをアルゴンと窒素
の混合ガス中でスパッタリングさせ、窒素ガスと反応さ
せて成膜する。このとき、アルゴンガスは、スパッタガ
スとして作用し、また、窒素ガスは、反応ガスとして作
用する。Such an alloy film is formed by sputtering a FeTa alloy target in a mixed gas of argon and nitrogen using a sputtering device and reacting it with nitrogen gas. At this time, the argon gas acts as a sputtering gas, and the nitrogen gas acts as a reaction gas.
【０００４】[0004]
【発明が解決しようとする課題】図２は、スパッタリン
グ中の窒素ガス分圧と成膜された合金膜中の窒素組成と
の関係を示しており、また、図３は、合金膜中の窒素組
成と膜の保磁力との関係を示している。この図から窒素
ガス分圧と合金膜中の窒素組成とは比例関係にあり、ま
た、窒素組成が１０．５〜１６ａｔ％の範囲において、
優れた軟磁気特性を示すことが分る。FIG. 2 shows the relationship between the nitrogen gas partial pressure during sputtering and the nitrogen composition in the formed alloy film, and FIG. 3 shows the nitrogen in the alloy film. The relationship between the composition and the coercive force of the film is shown. From this figure, there is a proportional relationship between the nitrogen gas partial pressure and the nitrogen composition in the alloy film, and when the nitrogen composition is in the range of 10.5 to 16 at%,
It can be seen that it exhibits excellent soft magnetic properties.
【０００５】このように、優れた軟磁気特性を有する窒
化鉄系の合金膜を再現性よく生成するためには、スパッ
タリング中の窒素ガスの分圧を一定に制御することが必
要となる。As described above, in order to produce an iron nitride-based alloy film having excellent soft magnetic characteristics with good reproducibility, it is necessary to control the partial pressure of nitrogen gas during sputtering to be constant.
【０００６】しかし、従来のスパッタリング装置では、
放電の開始によるゲッター効果や、チャンバ内の環境変
化等によってガス分圧が変動するため、合金膜の窒素組
成を一定値に制御できず、従って、優れた軟磁気特性を
有する窒化鉄系の合金膜を再現性よく生成できないとい
う問題点を有している。However, in the conventional sputtering apparatus,
Because the gas partial pressure fluctuates due to the getter effect due to the start of discharge and the environmental changes in the chamber, etc., the nitrogen composition of the alloy film cannot be controlled to a constant value, and therefore an iron nitride alloy with excellent soft magnetic characteristics There is a problem that a film cannot be produced with good reproducibility.
【０００７】本発明の目的は、高密度磁気記録再生用の
積層型ヘッドコアに使用できる優れた軟磁気特性を有す
る窒化鉄系の合金膜を再現性よく生成できる磁気ヘッド
コアの合金膜製造方法およびその製造装置を提供するこ
とにある。An object of the present invention is to provide a method for producing an alloy film for a magnetic head core, which is capable of reproducibly producing an iron nitride-based alloy film having excellent soft magnetic properties, which can be used for a laminated head core for high density magnetic recording and reproduction. To provide a manufacturing apparatus.
【０００８】[0008]
【課題を解決するための手段】本発明の磁気ヘッドコア
の合金膜製造方法は、合金ターゲットをスパッタガスお
よび反応ガスの混合ガス中でスパッタリングさせて合金
膜を生成する合金膜製造方法において、前記スパッタガ
スおよび反応ガスの圧力をそれぞれ所定の圧力に一定に
制御しながらスパッタリングさせる方法である。また、
前記合金ターゲットが、ＦｅＭ（ＭはＴａ，Ｈｆ，Ｎ
ｂ，Ｚｒ，Ｖ，Ｔｉの内の少なくとも１種類の元素）で
あり、前記反応ガスが窒素ガスであり、前記合金膜内の
窒素組成が１０〜１６ａｔ％となるように生成する。A method for producing an alloy film for a magnetic head core according to the present invention is the method for producing an alloy film, wherein an alloy target is sputtered in a mixed gas of a sputtering gas and a reaction gas to produce an alloy film. This is a method of sputtering while controlling the pressures of the gas and the reaction gas to be constant at predetermined pressures. Also,
The alloy target is FeM (M is Ta, Hf, N
b, Zr, V, and Ti), the reaction gas is nitrogen gas, and the nitrogen composition in the alloy film is 10 to 16 at%.
【０００９】本発明の磁気ヘッドコアの合金膜製造装置
は、合金ターゲットをスパッタガスおよび反応ガスの混
合ガス中でスパッタリングさせて合金膜を生成する合金
膜製造装置において、前記スパッタガスおよび反応ガス
の圧力をそれぞれ検出するガス圧検出手段と、前記スパ
ッタガスおよび反応ガスの流量を制御信号に応じてそれ
ぞれ制御するガス流量制御手段と、前記ガス圧検出手段
が検出した圧力に応じて前記スパッタガスおよび反応ガ
スの圧力が一定となるように前記制御信号を生成する制
御手段とを備えて構成される。An apparatus for producing an alloy film for a magnetic head core according to the present invention is an apparatus for producing an alloy film, wherein an alloy target is sputtered in a mixed gas of a sputtering gas and a reaction gas to produce an alloy film. A gas pressure detecting means for detecting the gas pressure, a gas flow rate controlling means for controlling the flow rates of the sputter gas and the reactive gas, respectively, according to a control signal, and the sputter gas and the reaction depending on the pressure detected by the gas pressure detecting means. And a control means for generating the control signal so that the gas pressure becomes constant.
【００１０】[0010]
【実施例】次に本発明について図面を参照して説明す
る。The present invention will be described below with reference to the drawings.
【００１１】図１は本発明の磁気ヘッドコアの合金膜製
造装置の一実施例を示す図である。この装置は、チャン
バ１内に配置されて合金ターゲット８に磁界を与える永
久磁石２と、合金ターゲット８に対向して配置され、合
金膜を成膜する基板９を載置する電極３と、合金ターゲ
ット８に電力を供給する電源部４と、チャンバ内に供給
するガスの流量を制御するガス流量調整機構６およびガ
ス流量コントロールユニット７と、チャンバ内に供給さ
れたガスの圧力を測定するガス圧検出器５とを備えてい
る。FIG. 1 is a diagram showing an embodiment of an apparatus for producing an alloy film for a magnetic head core according to the present invention. This apparatus includes a permanent magnet 2 arranged in a chamber 1 for applying a magnetic field to an alloy target 8, an electrode 3 arranged opposite to the alloy target 8 for mounting a substrate 9 on which an alloy film is formed, and an alloy. A power supply unit 4 for supplying electric power to the target 8, a gas flow rate adjusting mechanism 6 and a gas flow rate control unit 7 for controlling the flow rate of the gas supplied into the chamber, and a gas pressure for measuring the pressure of the gas supplied into the chamber. And a detector 5.
【００１２】ここで、ガス流量調整機構６には、ガス流
量調整部分にピエゾバルブを用い、ガス流量コントロー
ルユニット７からの制御信号によりバルブ開閉を制御し
てもよいし、あるいは、ガス流量調整部分にマスフロメ
ータを用いても制御してよもい。Here, in the gas flow rate adjusting mechanism 6, a piezo valve may be used in the gas flow rate adjusting section, and the valve opening / closing may be controlled by a control signal from the gas flow rate control unit 7, or the gas flow rate adjusting section may be controlled. It may be controlled using a mass flow meter.
【００１３】また、ガス圧検出器５には、電子衝撃で励
起された気体原子からの特性波長の光強度を測定して気
体の分圧を測定するＥＩＥＳ（Ｅｌｅｃｔｒｏｎ Ｅｍ
ｉｓｓｉｏｎ Ｓｐｅｃｔｒｏｎｓｃｏｐｙ）方式のセ
ンサを用いてもよいし、あるいは、気体原子の質量数を
測定するマスフィルタ型ガス分析計などでを用いてもよ
い。Further, the gas pressure detector 5 measures the light intensity of the characteristic wavelength from the gas atom excited by the electron impact to measure the partial pressure of the gas EIES (Electron Em).
A sensor of the "ion spectroscopy" type may be used, or a mass filter type gas analyzer for measuring the mass number of gas atoms may be used.
【００１４】さて、このような合金膜製造装置を使用し
てＦｅＴａＮ膜を製造する場合は、ＦｅＴａの合金ター
ゲットをアルゴンおよび窒素の混合ガス中でスパッタリ
ングさせ、窒素と反応させて成膜を行っている。When a FeTaN film is manufactured using such an alloy film manufacturing apparatus, an FeTa alloy target is sputtered in a mixed gas of argon and nitrogen and reacted with nitrogen to form a film. There is.
【００１５】ところで、２成分のガスの圧力の制御方法
は、まず、アルゴンガスおよび窒素ガスの圧力をガス圧
検出器５で測定し、各々の測定値をガス流量コントロー
ルユニット７に送出する。そして、あらかじめ設定して
おいた圧力になるように、ガス流量コントロールユニッ
ト７からガス流量調整機構６へ制御信号を送出し、バル
ブの開閉によりガス流量を調整することにより、ガス分
圧を一定値に制御する。その結果、成膜中の各ガス圧は
一定値に制御され、各ガス圧の変動を抑制することがで
きる。すなわち、成膜中のガス圧が、チャンバ内のシャ
ッタの位置、ターゲットの状態、放電の状態によって変
動しても、随時、ガス流量を調整してガス圧を一定に制
御することができるので、窒素組成が最良値に制御され
た合金膜を生成することができる。In the method of controlling the pressure of the two-component gas, first, the pressures of argon gas and nitrogen gas are measured by the gas pressure detector 5, and the respective measured values are sent to the gas flow rate control unit 7. Then, a control signal is sent from the gas flow rate control unit 7 to the gas flow rate adjusting mechanism 6 so that the pressure becomes a preset pressure, and the gas flow rate is adjusted by opening and closing the valve, so that the gas partial pressure is kept constant. To control. As a result, each gas pressure during film formation is controlled to a constant value, and fluctuations in each gas pressure can be suppressed. That is, even if the gas pressure during film formation varies depending on the position of the shutter in the chamber, the state of the target, and the state of discharge, the gas flow rate can be adjusted at any time to control the gas pressure at a constant level. It is possible to produce an alloy film in which the nitrogen composition is controlled to the optimum value.
【００１６】なお、ＦｅＭＮ（ＭはＴａ、Ｈｆ、Ｈｂ、
Ｚｒ、Ｖ、Ｔｉの内の少なくとも１種類の元素）から成
る窒素鉄系の合金膜を生成する場合にも、同様に適用で
きる。FeMN (M is Ta, Hf, Hb,
The same can be applied to the case of producing a nitrogen iron-based alloy film composed of at least one kind of element selected from Zr, V, and Ti).
【００１７】[0017]
【発明の効果】以上説明したように本発明は、窒素ガス
との反応スパッタリングによって磁気ヘッドコアの合金
膜を製造する際に、反応ガス（窒素ガス）及びスパッタ
ガス（アルゴンガス）のガス圧をそれぞれ同時に測定
し、一定のガス圧に制御しながらスパッタして合金膜を
形成することによって、優れた磁気特性を有する合金膜
を再現性よく生成することができる。As described above, according to the present invention, when the alloy film of the magnetic head core is manufactured by the reactive sputtering with the nitrogen gas, the gas pressures of the reactive gas (nitrogen gas) and the sputtering gas (argon gas) are different from each other. By simultaneously measuring and forming an alloy film by sputtering while controlling the gas pressure to a constant value, an alloy film having excellent magnetic properties can be produced with good reproducibility.
【図１】本発明の合金膜製造装置の一実施例を示す図で
ある。FIG. 1 is a diagram showing an embodiment of an alloy film manufacturing apparatus of the present invention.
【図２】窒素ガス分圧と合金膜中の窒素組成との関係を
示す図である。FIG. 2 is a diagram showing a relationship between a nitrogen gas partial pressure and a nitrogen composition in an alloy film.
【図３】合金膜中の窒素組成と保磁力との関係を示す図
である。FIG. 3 is a diagram showing a relationship between a nitrogen composition in an alloy film and a coercive force.
【図４】積層型ヘッドの一例を示す斜視図である。FIG. 4 is a perspective view showing an example of a laminated head.
１ チャンバ ット ２ 永久磁石 ３ 電極 ４ 電源部 ５ ガス圧検出器 ６ ガス流量調整機構 ７ ガス流量コントロールユニット ８ 合金ターゲット ９ 基板 1 Chambert 2 Permanent Magnet 3 Electrode 4 Power Supply Unit 5 Gas Pressure Detector 6 Gas Flow Adjustment Mechanism 7 Gas Flow Control Unit 8 Alloy Target 9 Substrate
Claims (3)
応ガスの混合ガス中でスパッタリングさせて合金膜を生
成する磁気ヘッドコアの合金膜製造方法において、前記
スパッタガスおよび反応ガスの圧力をそれぞれ所定の圧
力に一定に制御しながらスパッタリングさせて製造する
ことを特徴とする磁気ヘッドコアの合金膜製造方法。1. In a method for producing an alloy film for a magnetic head core, wherein an alloy target is sputtered in a mixed gas of a sputtering gas and a reaction gas to produce an alloy film, the pressures of the sputtering gas and the reaction gas are kept constant at predetermined pressures. A method for producing an alloy film for a magnetic head core, which comprises producing the alloy film while controlling sputtering.
ａ，Ｈｆ，Ｎｂ，Ｚｒ，Ｖ，Ｔｉの内の少なくとも１種
類の元素）であり、前記反応ガスが窒素ガスであり、前
記合金膜内の窒素組成が１０〜１６ａｔ％であることを
特徴とする請求項１記載の磁気ヘッドコアの合金膜製造
方法。2. The alloy target is FeM (M is T
a, Hf, Nb, Zr, V, and Ti), the reaction gas is nitrogen gas, and the nitrogen composition in the alloy film is 10 to 16 at%. The method of manufacturing an alloy film for a magnetic head core according to claim 1.
応ガスの混合ガス中でスパッタリングさせて合金膜を生
成する磁気ヘッドコアの合金膜製造装置において、前記
スパッタガスおよび反応ガスの圧力をそれぞれ検出する
ガス圧検出手段と、前記スパッタガスおよび反応ガスの
流量を制御信号に応じてそれぞれ制御するガス流量制御
手段と、前記ガス圧検出手段が検出した圧力に応じて前
記スパッタガスおよび反応ガスの圧力が一定となるよう
に前記制御信号を生成する制御手段とを備えることを特
徴とする磁気ヘッドコアの合金膜製造装置。3. An alloy film manufacturing apparatus for a magnetic head core, wherein an alloy target is sputtered in a mixed gas of a sputtering gas and a reaction gas to produce an alloy film, and gas pressure detection is performed to detect the pressures of the sputtering gas and the reaction gas, respectively. Means, a gas flow rate control means for controlling the flow rates of the sputter gas and the reaction gas, respectively, according to a control signal, and the pressures of the sputter gas and the reaction gas are constant according to the pressure detected by the gas pressure detection means. An apparatus for manufacturing an alloy film for a magnetic head core, comprising: a control unit that generates the control signal.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18327492A JPH0628615A (en) | 1992-07-10 | 1992-07-10 | Production of alloy film of magnetic head core and its apparatus for production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18327492A JPH0628615A (en) | 1992-07-10 | 1992-07-10 | Production of alloy film of magnetic head core and its apparatus for production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0628615A true JPH0628615A (en) | 1994-02-04 |
Family
ID=16132794
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18327492A Pending JPH0628615A (en) | 1992-07-10 | 1992-07-10 | Production of alloy film of magnetic head core and its apparatus for production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0628615A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0231717A (en) * | 1988-07-20 | 1990-02-01 | Matsushita Electric Ind Co Ltd | Coffee maker |
| JP2010507728A (en) * | 2006-10-26 | 2010-03-11 | ハウザー テクノ−コーティング ベー．フェー． | Dual magnetron sputtering power supply and magnetron sputtering equipment |
-
1992
- 1992-07-10 JP JP18327492A patent/JPH0628615A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0231717A (en) * | 1988-07-20 | 1990-02-01 | Matsushita Electric Ind Co Ltd | Coffee maker |
| JP2010507728A (en) * | 2006-10-26 | 2010-03-11 | ハウザー テクノ−コーティング ベー．フェー． | Dual magnetron sputtering power supply and magnetron sputtering equipment |
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