JPH06245755A - Apparatus for culture - Google Patents

Apparatus for culture

Info

Publication number
JPH06245755A
JPH06245755A JP6272393A JP6272393A JPH06245755A JP H06245755 A JPH06245755 A JP H06245755A JP 6272393 A JP6272393 A JP 6272393A JP 6272393 A JP6272393 A JP 6272393A JP H06245755 A JPH06245755 A JP H06245755A
Authority
JP
Japan
Prior art keywords
gas
pressure
culture
concentration
adsorption
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6272393A
Other languages
Japanese (ja)
Inventor
Tatsuo Kinoshita
龍生 木下
Chiaki Marumo
千郷 丸茂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanebo Ltd
Original Assignee
Kanebo Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanebo Ltd filed Critical Kanebo Ltd
Priority to JP6272393A priority Critical patent/JPH06245755A/en
Publication of JPH06245755A publication Critical patent/JPH06245755A/en
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12M—APPARATUS FOR ENZYMOLOGY OR MICROBIOLOGY; APPARATUS FOR CULTURING MICROORGANISMS FOR PRODUCING BIOMASS, FOR GROWING CELLS OR FOR OBTAINING FERMENTATION OR METABOLIC PRODUCTS, i.e. BIOREACTORS OR FERMENTERS
    • C12M29/00—Means for introduction, extraction or recirculation of materials, e.g. pumps
    • C12M29/04—Filters; Permeable or porous membranes or plates, e.g. dialysis
    • C—CHEMISTRY; METALLURGY
    • C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12M—APPARATUS FOR ENZYMOLOGY OR MICROBIOLOGY; APPARATUS FOR CULTURING MICROORGANISMS FOR PRODUCING BIOMASS, FOR GROWING CELLS OR FOR OBTAINING FERMENTATION OR METABOLIC PRODUCTS, i.e. BIOREACTORS OR FERMENTERS
    • C12M29/00—Means for introduction, extraction or recirculation of materials, e.g. pumps
    • C12M29/26—Conditioning fluids entering or exiting the reaction vessel
    • C—CHEMISTRY; METALLURGY
    • C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12M—APPARATUS FOR ENZYMOLOGY OR MICROBIOLOGY; APPARATUS FOR CULTURING MICROORGANISMS FOR PRODUCING BIOMASS, FOR GROWING CELLS OR FOR OBTAINING FERMENTATION OR METABOLIC PRODUCTS, i.e. BIOREACTORS OR FERMENTERS
    • C12M41/00—Means for regulation, monitoring, measurement or control, e.g. flow regulation
    • C12M41/30—Means for regulation, monitoring, measurement or control, e.g. flow regulation of concentration
    • C12M41/34—Means for regulation, monitoring, measurement or control, e.g. flow regulation of concentration of gas

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  • Chemical & Material Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Bioinformatics & Cheminformatics (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Zoology (AREA)
  • Biomedical Technology (AREA)
  • Sustainable Development (AREA)
  • Microbiology (AREA)
  • Biochemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Genetics & Genomics (AREA)
  • Biotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)

Abstract

PURPOSE:To readily control the ambient gas composition in a culture tank by controlling the amount of gas supplied from a pressure swing unit involving plural adsorption columns to the culture tank while interlocking to a gas sensor for detecting the concentration of the gas component in the culture tank. CONSTITUTION:A culture tank 27 is connected to a reserver tank 6 of a pressure swing unit 1 for supplying a mixture gas of air, etc., to adsorption columns 4, 4A packed with an adsorbent, alternately repeating a high-pressure adsorption process and a low-pressure adsorption process through the respective adsorption columns and changing the gas composition of the mixture gas. The amount of the gas supplied from the pressure swing unit is controlled by using a gas flow device 33 while interlocking to a gas sensor 41 for detection of the concentration of the gas component in the culture tank.

Description

【発明の詳細な説明】Detailed Description of the Invention

【０００１】[0001]

【産業上の利用分野】本発明は、培養装置内の雰囲気ガ
ス組成を制御し得る培養装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a culture device capable of controlling the atmospheric gas composition in the culture device.

【０００２】[0002]

【従来の技術】近年、培養システムは、細胞の育成に必
要な諸条件を、例えば温湿度、雰囲気ガス組成等をマイ
コン・プログラム制御などの、優れたエレクトロニクス
技術を駆使して高精度に管理している。なかでも、雰囲
気ガス中の二酸化炭素濃度は、細胞培養の培養液のＰＨ
の維持、植物や菌類の培養に於いて極めて重要であると
言われている。しかしながら、培養装置での二酸化炭素
供給源としては、従来、二酸化炭素充填ボンベが用いら
れており高価かつボンベ切り替え等の手間がかかる等の
欠点を有している。従って、安価で簡便な二酸化炭素供
給源とその制御技術を活用する培養装置は経済上有益で
あると考えられる。2. Description of the Related Art In recent years, a culture system manages various conditions necessary for cell growth with high precision by using excellent electronic technology such as temperature and humidity, atmospheric gas composition, etc., such as microcomputer and program control. ing. Among them, the carbon dioxide concentration in the atmosphere gas is the pH of the culture solution of the cell culture.
It is said to be extremely important in the maintenance of plants and the cultivation of plants and fungi. However, as a carbon dioxide supply source in a culture device, a carbon dioxide-filled cylinder has been conventionally used, and it has the drawbacks that it is expensive and it takes time and trouble to switch the cylinder. Therefore, a cheap and simple carbon dioxide supply source and a culture device utilizing the control technology thereof are considered to be economically beneficial.

【０００３】[0003]

【発明が解決しようとする課題】本発明者らは、上記既
存技術の諸問題を解決すべく鋭意研究を続けた結果、培
養槽内空気組成を変更したガスを供給すると共に培養槽
内ガス組成を制御する新しい方法を見出し本発明を完成
させたものである。本発明の目的は、培養室内の、雰囲
気ガス組成を簡便に制御できる培養装置を提供するにあ
る。DISCLOSURE OF THE INVENTION The inventors of the present invention, as a result of continuing diligent research to solve the problems of the above-mentioned existing technology, supply a gas with a changed air composition in the culture tank and at the same time, gas composition in the culture tank. The present invention has been completed by finding out a new method of controlling An object of the present invention is to provide a culture device that can easily control the atmospheric gas composition in the culture chamber.

【０００４】[0004]

【課題を解決するための手段】上述の目的は、少なくと
も２塔以上の吸着材を充填した吸着塔に混合ガスを供給
し、混合ガス中の特定成分の高圧吸着工程と、低圧脱着
工程とを、それぞれの吸着塔において交互に繰り返し、
混合ガス中のガス組成を変化せしめる圧力スイング装置
と、培養室とからなり、前記培養室内のガス成分濃度検
知用ガスセンサ−を設けると共に、該ガスセンサ−と連
動して前記圧力スイング装置から供給するガス量を制御
する手段を備えてなる培養装置により達成される。The above-mentioned object is to supply a mixed gas to an adsorption tower filled with at least two or more adsorbents, and to perform a high pressure adsorption step of a specific component in the mixed gas and a low pressure desorption step. , Alternately in each adsorption tower,
A pressure swing device for changing the gas composition in the mixed gas, and a culture chamber, provided with a gas sensor for detecting the gas component concentration in the culture chamber, and a gas supplied from the pressure swing device in conjunction with the gas sensor. It is achieved by a culture device comprising means for controlling the quantity.

【０００５】本発明の圧力スイング装置（以下ＰＳＡ装
置と略記する）に供給するガスは、空気等の混合ガスで
ある。本発明のＰＳＡ装置は、リザーバータンクにとり
つけた圧力センサーが圧力を検知し、所定圧力を超える
と自動停止し、所定圧力より低下すると自動的に起動す
る様、プログラム制御されることが電力消費量低減の観
点より好ましい。本発明のＰＳＡ装置に充填される吸着
材は、分子ふるい炭素、ゼオライト、活性炭等であり、
適宜選択して使用すればよいが、特に本発明者らが先に
特開昭６３ー５７１７５号公報，特願平３ー２０４７７
６号公報等で提案したフェノール樹脂微粉末、熱硬化性
樹脂溶液及び高分子バインダーを主原料として製造した
分子ふるい炭素を充填材として用いた場合、一層好まし
い結果が得られる。The gas supplied to the pressure swing device (hereinafter abbreviated as PSA device) of the present invention is a mixed gas such as air. In the PSA device of the present invention, the pressure sensor attached to the reservoir tank detects the pressure, automatically stops when the pressure exceeds a predetermined pressure, and automatically starts when the pressure falls below the predetermined pressure. It is preferable from the viewpoint of reduction. The adsorbent filled in the PSA device of the present invention is molecular sieving carbon, zeolite, activated carbon, or the like,
It may be appropriately selected and used. In particular, the present inventors have previously disclosed the Japanese Patent Application Laid-Open No. 63-57175 and Japanese Patent Application No. 3-20477.
More preferable results are obtained when the molecular sieving carbon produced by using the phenol resin fine powder, thermosetting resin solution and polymer binder proposed in Japanese Patent No. 6 etc. as main raw materials is used.

【０００６】本発明の培養装置は、初代培養、受精卵培
養、組織培養等に利用される。本発明の培養装置に使用
される培養室内のガス成分濃度検知用ガスセンサーとし
ては、例えば非分散赤外線吸収方式ガスセンサーや熱伝
導方式ガスセンサー等を用いることができる。これらの
ガスセンサーが検知した濃度値は、出力電圧信号として
取出し、ガス成分表示器およびガス成分濃度設定器に送
る。そして、ガス成分濃度設定器は出力信号を認識判断
し、ガス流量調節弁に流量設定のための出力信号を送
る。本発明の培養装置に備えられたガス流量調節弁とし
ては、電子式流量計測制御可能なガス流量調節弁、例え
ばバイパスキャピラリー方式の高精度センサーとソレノ
イド式コントロールバルブの組合せによって流量制御を
精度良く行うサーマルマスフローコントローラー等が好
ましい。The culture device of the present invention is used for primary culture, fertilized egg culture, tissue culture and the like. As the gas sensor for detecting the gas component concentration in the culture chamber used in the culture apparatus of the present invention, for example, a non-dispersive infrared absorption type gas sensor or a heat conduction type gas sensor can be used. The concentration value detected by these gas sensors is taken out as an output voltage signal and sent to a gas component indicator and a gas component concentration setter. Then, the gas component concentration setting device recognizes and judges the output signal, and sends the output signal for setting the flow rate to the gas flow rate control valve. As the gas flow rate control valve provided in the culture apparatus of the present invention, a gas flow rate control valve capable of electronically controlled flow rate measurement, for example, a combination of a bypass capillary type high precision sensor and a solenoid type control valve is used to accurately control the flow rate. A thermal mass flow controller or the like is preferable.

【０００７】以下、図面に基づいて本発明を具体的に説
明する。図１は本発明に係る培養装置の実施態様の一例
を示す説明図である。培養室２７とＰＳＡ装置１のリザ
ーバータンク６とは、ガス供給パイプ２６を介して接続
されている。培養室２７には、ガス濃度を検知するガス
センサー４１、室内温度を検知する温度センサー４８お
よび湿度を検知する湿度センサー４４がそれぞれ配設さ
れている。培養室２７は二層構造になっており、外層は
断熱層３０であり、内層はウオータジャケット３１であ
る。温度測定用センサー４８によって、培養室２７内の
温度を測定し温度設定器４６によりヒータ３７に信号を
発しウオータジャケット３１内の温度を一定に保つ。The present invention will be specifically described below with reference to the drawings. FIG. 1 is an explanatory view showing an example of an embodiment of a culture device according to the present invention. The culture chamber 27 and the reservoir tank 6 of the PSA device 1 are connected via a gas supply pipe 26. A gas sensor 41 for detecting the gas concentration, a temperature sensor 48 for detecting the room temperature, and a humidity sensor 44 for detecting the humidity are arranged in the culture chamber 27. The culture chamber 27 has a two-layer structure, the outer layer is a heat insulating layer 30, and the inner layer is a water jacket 31. The temperature measuring sensor 48 measures the temperature inside the culture chamber 27, and the temperature setting device 46 sends a signal to the heater 37 to keep the temperature inside the water jacket 31 constant.

【０００８】培養室内循環パイプ入口３４からエアーフ
ィルター４３、循環ポンプ４２、三方開閉弁３８、培養
室内循環パイプ出口３６を介し培養室内にガスを循環す
る。三方開閉弁３８は、ガス濃度設定器３９と接続され
ており、ガス濃度設定器３９の設定濃度以下の時に信号
が発せられ、三方開閉弁３８により外部にガスを放出す
る。ガス成分濃度を検知するガスセンサー４１からの信
号は、ガス濃度指示計４０、ガス濃度設定器３９に接続
され、ガス濃度設定器３９からの出力はガス供給パイプ
２６に取り付けられているガス流量調節弁３３に接続さ
れている。室内温度を検知する温度測定用センサー４８
からの信号は、温度指示計４５、温度設定器４６を介し
ヒータ３７に接続されている。湿度測定用センサー４７
は、湿度指示器４４に接続されている。Gas is circulated in the culture chamber from the culture chamber circulation pipe inlet 34 through the air filter 43, the circulation pump 42, the three-way on-off valve 38, and the culture chamber circulation pipe outlet 36. The three-way on-off valve 38 is connected to the gas concentration setting device 39, a signal is issued when the concentration is less than or equal to the set concentration of the gas concentration setting device 39, and the three-way on-off valve 38 releases gas to the outside. The signal from the gas sensor 41 for detecting the gas component concentration is connected to the gas concentration indicator 40 and the gas concentration setting device 39, and the output from the gas concentration setting device 39 is attached to the gas supply pipe 26 to adjust the gas flow rate. It is connected to the valve 33. Temperature measurement sensor 48 for detecting indoor temperature
The signal from is connected to the heater 37 via the temperature indicator 45 and the temperature setter 46. Humidity measurement sensor 47
Is connected to the humidity indicator 44.

【０００９】図１のＰＳＡ装置１において２はブロア
ー、３はエアードライヤーである。４、４Ａは、内部に
吸着材が充填されている吸着塔であり、それぞれの入口
が第１の開閉弁７、７Ａを備えた流入路パイプ１５によ
ってエアードライヤー３の出口と連通状態になってい
る。５は、真空ポンプであり、開閉弁８、８Ａを備えた
吸引路パイプ１９によって上記吸着塔４、４Ａの入口と
連結されており真空ポンプ５の排気はリザーバータンク
６と連通している。逆流路パイプ２０は、開閉弁１４を
介しリザーバータンク６と吸引路パイプ１９とを連結し
ている。１６は、吸着塔、４Ａの出口からそれぞれ延び
る取出路パイプであり開閉弁９、９Ａを備えており、開
閉弁１０を介してメインパイプ１８に連結されている。
開閉弁１１は排気路１７に備えられており、メインパイ
プ１８、リザーバータンク６に連通状態にある。In the PSA apparatus 1 of FIG. 1, 2 is a blower and 3 is an air dryer. Numerals 4 and 4A are adsorption towers filled with an adsorbent, and the respective inlets are in communication with the outlet of the air dryer 3 by the inflow passage pipes 15 equipped with the first on-off valves 7 and 7A. There is. Reference numeral 5 denotes a vacuum pump, which is connected to the inlets of the adsorption towers 4 and 4A by a suction passage pipe 19 having open / close valves 8 and 8A, and the exhaust of the vacuum pump 5 communicates with a reservoir tank 6. The reverse passage pipe 20 connects the reservoir tank 6 and the suction passage pipe 19 via the opening / closing valve 14. Reference numeral 16 is an extraction pipe that extends from the outlet of the adsorption tower 4A, is provided with opening / closing valves 9 and 9A, and is connected to the main pipe 18 via the opening / closing valve 10.
The on-off valve 11 is provided in the exhaust passage 17, and is in communication with the main pipe 18 and the reservoir tank 6.

【００１０】開閉弁８、８Ａは均圧用開閉弁にもなる。
吸引路パイプ１９には、開閉弁１２を介した予備排気路
２１を備えている。リザーバータンク６には、圧力セン
サー２２を備えており、圧力表示器２３、圧力設定器２
４およびＰＳＡ装置電源２５に接続されている。The open / close valves 8 and 8A also serve as pressure equalizing open / close valves.
The suction passage pipe 19 is provided with a preliminary exhaust passage 21 via the opening / closing valve 12. The reservoir tank 6 is equipped with a pressure sensor 22, a pressure indicator 23, and a pressure setting device 2
4 and PSA device power supply 25.

【００１１】[0011]

【作用】図１において原料の混合ガスは、ブロア２によ
り加圧されエアードライヤ３、流入路パイプ１５、開閉
弁７（または７Ａ）を流通し吸着塔４（または４Ａ）に
供給される。ここでは、吸着塔４で吸着がおこなわれる
場合について説明する。空気あるいは混合ガスが吸着塔
４に供給された後、吸着塔４内の吸着材によって混合ガ
ス中の特定の成分は吸着され、他のガスは開閉弁９、排
気路パイプ１７、開閉弁１１を通過し系外に排出され
る。吸着工程に要する時間は、９０〜５００秒間、好ま
しくは１２０〜４００秒間、最も好ましくは、１５０〜
３００秒間である。該吸着材が飽和する前に吸着工程を
終了し、開閉弁７、９、１１は、閉止される。この際、
吸着工程に引続き均圧工程を挿入することが望ましい。In FIG. 1, the mixed gas of the raw materials is pressurized by the blower 2 and flows through the air dryer 3, the inflow passage pipe 15, the on-off valve 7 (or 7A) and is supplied to the adsorption tower 4 (or 4A). Here, the case where adsorption is performed in the adsorption tower 4 will be described. After the air or the mixed gas is supplied to the adsorption tower 4, a specific component in the mixed gas is adsorbed by the adsorbent in the adsorption tower 4, and the other gas is supplied to the open / close valve 9, the exhaust pipe 17, and the open / close valve 11. Passes through and is discharged outside the system. The time required for the adsorption step is 90 to 500 seconds, preferably 120 to 400 seconds, and most preferably 150 to
It is 300 seconds. The adsorption process is terminated before the adsorbent is saturated, and the on-off valves 7, 9, 11 are closed. On this occasion,
It is desirable to insert a pressure equalization step after the adsorption step.

【００１２】均圧工程には塔頂均圧、塔底均圧、クロス
均圧、上下同時均圧等の方法があり、例えば塔底均圧の
場合には、開閉弁８、８Ａが開放され、一方の吸着塔４
より他方の吸着塔４Ａに加圧ガスが送り込まれる。この
均圧工程は、省略することもできる。均圧工程が終了す
ると回収工程が行われる。この回数工程に要する時間
は、吸着工程に要する時間と同様、９０〜５００秒間、
好ましくは１２０〜４００秒間、最も好ましくは１５０
〜４００秒間である。この回収工程は開閉弁８、１３を
開放し真空ポンプ５により吸着塔４を減圧することによ
り吸着塔４内の吸着材に吸着されていた二酸化炭素を脱
着回収しリザーバータンク６に供給する。In the pressure equalizing step, there are methods such as pressure equalization at the top, pressure equalization at the bottom, cross pressure equalization and simultaneous pressure equalization at the top and bottom. For example, in the case of pressure equalization at the bottom, the on-off valves 8 and 8A are opened. , One adsorption tower 4
The pressurized gas is sent to the other adsorption tower 4A. This pressure equalizing step can be omitted. When the pressure equalization process is completed, a recovery process is performed. The time required for this number of steps is 90 to 500 seconds, similar to the time required for the adsorption step,
Preferably 120 to 400 seconds, most preferably 150.
~ 400 seconds. In this recovery step, the opening / closing valves 8 and 13 are opened, and the pressure of the adsorption tower 4 is reduced by the vacuum pump 5, so that the carbon dioxide adsorbed by the adsorbent in the adsorption tower 4 is desorbed and recovered and supplied to the reservoir tank 6.

【００１３】リザーバータンク６内の製品ガスは、ガス
供給パイプ２６を通してガス流量調節弁３３により取り
出され、使用される。また、回収工程の初期において回
収ガスの純度が低い場合、開閉弁８、１２を開放し系外
に排出してもよい。本発明では、吸着工程終了後、均圧
工程の前または後でパージ工程を行ってもよい。このパ
ージ工程では、リザーバータンク６の製品ガスを吸着塔
４の塔底より塔頂に流し吸着塔４内に流し吸着塔４外へ
排出するか、塔頂より塔底に流し吸着塔４外へ排出す
る。例えば、開閉弁８、９、１１、１４を開放しリザー
バータンク６内の回収ガスを吸着塔４に流通させ、開閉
弁１１を開放し系外に排出しても良いし、開閉弁８、１
４、９、９Ａを開放し吸着塔４Ａに供給してもよい。こ
のことにより、回収するガスの純度を向上することがで
きる。The product gas in the reservoir tank 6 is taken out by the gas flow rate control valve 33 through the gas supply pipe 26 and used. If the purity of the recovered gas is low at the beginning of the recovery process, the on-off valves 8 and 12 may be opened and discharged outside the system. In the present invention, the purging step may be performed after the adsorption step and before or after the pressure equalizing step. In this purging step, the product gas in the reservoir tank 6 flows from the bottom of the adsorption tower 4 to the top of the adsorption tower 4 and into the adsorption tower 4 and is discharged to the outside of the adsorption tower 4, or from the top of the adsorption tower 4 to the bottom of the adsorption tower 4 to the outside of the adsorption tower 4. Discharge. For example, the opening / closing valves 8, 9, 11, 14 may be opened to allow the recovered gas in the reservoir tank 6 to flow through the adsorption tower 4, and the opening / closing valve 11 may be opened to discharge the gas to the outside of the system.
4, 9, 9A may be opened and supplied to the adsorption tower 4A. As a result, the purity of the recovered gas can be improved.

【００１４】また、パージ工程の代わりに、あるいはパ
ージ工程に引続き還流工程を入れてもよい。還流工程で
は、リザーバータンク６内の回収ガスを吸着塔４の塔頂
より塔底に流し吸着したガスを脱着しつつ製品ガスも再
びリザーバータンク６に回収する。上記のようにＰＳＡ
装置により製造したガスはリザ−バ−タンク６に所定圧
力（通常：０．２〜９．９ｋｇｆ／ｃｍ2Ｇ）のガスが
貯蔵され、ガス流量調節弁３３が開くことにより、ガス
供給パイプ２６を介して培養室２７に貯蔵されたガスが
供給される。このため培養室２７の気体圧力を一定とす
るために、三方開閉弁３８から逃がされ過圧状態となる
のを防ぐ。Further, instead of the purging step, or the purging step may be followed by a reflux step. In the reflux step, the recovered gas in the reservoir tank 6 flows from the top to the bottom of the adsorption tower 4 to desorb the adsorbed gas and recover the product gas in the reservoir tank 6 again. PSA as above
The gas produced by the apparatus is stored in the reservoir tank 6 at a predetermined pressure (usually 0.2 to 9.9 kgf / cm 2 G), and the gas flow control valve 33 is opened to open the gas supply pipe 26. The gas stored in the culture chamber 27 is supplied via the. Therefore, in order to keep the gas pressure in the culture chamber 27 constant, it is prevented that the gas is released from the three-way on-off valve 38 and becomes an overpressure state.

【００１５】一方、リザーバータンク６は、貯蔵された
ガスの圧力が減少し所定圧力より低くなった場合には、
ＰＳＡ装置が駆動し、空気あるいは混合ガスより分離し
た所定濃度のガスを製造し、リザーバータンク６に貯蔵
する。ガス流量調節弁３３は、自動弁であって、その開
閉はガス濃度設定器３９によって制御される。ガス濃縮
設定器３９には、ガスセンサー４１から培養室２７内の
ガス濃度に対応した信号が入力される。ガス濃度設定器
３９は、ガス濃度が所定値より高い場合に閉状態とする
ための信号を出力し、ガス流量調節弁３３は閉まる。従
って、ガス濃度設定器３９を適宜調節することで、培養
室２７内のガス濃度を所望する値に保持することができ
る。On the other hand, in the reservoir tank 6, when the pressure of the stored gas decreases and becomes lower than a predetermined pressure,
The PSA device is driven to produce a gas having a predetermined concentration separated from air or a mixed gas, and stored in the reservoir tank 6. The gas flow rate control valve 33 is an automatic valve, and its opening / closing is controlled by the gas concentration setting device 39. A signal corresponding to the gas concentration in the culture chamber 27 is input to the gas concentration setting device 39 from the gas sensor 41. The gas concentration setting device 39 outputs a signal for closing the gas when the gas concentration is higher than a predetermined value, and the gas flow rate control valve 33 is closed. Therefore, the gas concentration in the culture chamber 27 can be maintained at a desired value by appropriately adjusting the gas concentration setting device 39.

【００１６】本発明においては分子ふるい炭素，ゼオラ
イト，活性炭等より適宜吸着材を選定使用し、ＰＳＡ装
置の操作サイクルとして上述の吸着、均圧、還流、再生
工程等を採用することにより、所定の組成のガスを効率
よく取り出すことができる。特に、分子ふるい炭素を充
填材とした場合により優れた効果が認められる。なお、
本発明における吸着工程での吸着圧力は通常０．５〜
９．９ｋｇｆ／ｃｍ2Ｇ、好ましくは２〜９ｋｇｆ／ｃ
ｍ2Ｇ、最も好ましくは３〜８ｋｇｆ／ｃｍ2Ｇである。
また、回収工程での再生圧力は通常１〜３００ｔｏｒ
ｒ、このましくは１０〜２００ｔｏｒｒ、最も好ましく
は２０〜１００ｔｏｒｒである。In the present invention, a suitable adsorbent is selected and used from molecular sieving carbon, zeolite, activated carbon, etc., and the above-mentioned adsorption, pressure equalization, reflux, regeneration steps, etc. are adopted as the operation cycle of the PSA apparatus, whereby a predetermined amount is obtained. The composition gas can be efficiently taken out. In particular, a more excellent effect is recognized when the molecular sieving carbon is used as the filler. In addition,
The adsorption pressure in the adsorption step in the present invention is usually 0.5 to
9.9 kgf / cm 2 G, preferably 2-9 kgf / c
m 2 G, most preferably 3 to 8 kgf / cm 2 G.
The regeneration pressure in the recovery process is usually 1 to 300 torr.
r, preferably 10 to 200 torr, most preferably 20 to 100 torr.

【００１７】[0017]

【発明の効果】本発明の培養装置によれば、培養室内の
雰囲気ガス組成を適宜調整できるので、安定に培養がで
き極めて好適である。本発明の培養装置は空気を原料ガ
スとすると、培養室内に供給するガスは動植物細胞等に
有害なガスを含まない利点があり、装置から排気するガ
スも、直接大気に放出することができ、排気するガスの
後処理を必要としない利点がある。又、原料ガスとする
混合ガスは、例えば向上の付設ボイラーあるいは暖房用
のボイラー等の燃焼排気ガス等を用いることができる利
点がある。本発明の培養装置は、間欠運転も可能であり
装置の消費電力を最低限に抑えることができる。この様
に本発明の培養装置はマウス等の組織培養や細菌の増殖
等に効力を発揮する。According to the culturing apparatus of the present invention, the composition of the atmospheric gas in the culturing chamber can be adjusted appropriately, so that stable culturing can be performed, which is extremely suitable. When the culture apparatus of the present invention uses air as a raw material gas, the gas supplied into the culture chamber has an advantage that it does not contain harmful gas for plant and animal cells, and the gas exhausted from the apparatus can also be directly released to the atmosphere. It has the advantage that no post-treatment of the exhaust gas is required. Further, as the mixed gas used as the raw material gas, there is an advantage that, for example, combustion exhaust gas of an improved attached boiler or a heating boiler can be used. The culture device of the present invention can be operated intermittently, and the power consumption of the device can be minimized. As described above, the culture device of the present invention is effective for tissue culture of mice and the like, growth of bacteria and the like.

【図面の簡単な説明】[Brief description of drawings]

【図１】本発明の実施態様の一例を示す説明図である。FIG. 1 is an explanatory diagram showing an example of an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

１ ＰＳＡ装置 ２９ 内扉 ２ ブロア ３０ 断熱層 ３ エアードライヤ ３１ ウオ−タジャケッ
ト ４，４Ａ 吸着塔 ３２ 加湿バット ５ 真空ポンプ ３３ ガス流量調節計 ６ リザーバータンク ３４ 培養装置内循環パ
イプ入口 ７〜１４ 開閉弁 ３５ 排気パイプ １６ 取出路パイプ ３６ 培養室内循環ポン
プ出口 １７ 排気路パイプ ３７ 加熱ヒータ １８ メインパイプ ３８ ３方開閉弁 １９ 吸引路パイプ ３９ ガス濃度設定器 ２０ 逆流路パイプ ４０ ガス濃度指示計 ２１ 予備排気路パイプ ４１ ガス濃度センサー ２２ 圧力センサー ４２ 循環ポンプ ２３ 圧力表示計 ４３ エアーフィルター ２４ 圧力設定器 ４４ 湿度指示計 ２５ ＰＳＡ装置電源 ４５ 温度指示計 ２６ ガス供給パイプ ４６ 温度設定器 ２７ 培養室 ４７ 湿度測定用センサ
ー ２８ 外扉 ４８ 温度測定用センサ
ー1 PSA device 29 Inner door 2 Blower 30 Thermal insulation layer 3 Air dryer 31 Water jacket 4, 4A Adsorption tower 32 Humidification vat 5 Vacuum pump 33 Gas flow controller 6 Reservoir tank 34 Recirculation pipe inlet 7 to 14 Opening valve 35 exhaust pipe 16 take-out pipe 36 culture chamber circulation pump outlet 17 exhaust pipe 37 heating heater 18 main pipe 38 three-way on-off valve 19 suction pipe 39 gas concentration setter 20 reverse flow pipe 40 gas concentration indicator 21 preliminary exhaust pipe Pipe 41 Gas concentration sensor 22 Pressure sensor 42 Circulation pump 23 Pressure indicator 43 Air filter 24 Pressure setter 44 Humidity indicator 25 PSA device power supply 45 Temperature indicator 26 Gas supply pipe 46 Temperature setter 27 Culture chamber 47 Humidity measurement sensor 28 Outer door 8 for temperature measurement sensor

Claims (1)

【特許請求の範囲】[Claims] 【請求項１】 少なくとも２塔以上の吸着材を充填した
吸着塔に混合ガスを供給し、混合ガス中の特定成分の高
圧吸着工程と、低圧脱着工程とを、それぞれの吸着塔に
おいて交互に繰り返し、混合ガス中のガス組成を変化せ
しめる圧力スイング装置と、培養室とからなり、前記培
養室内のガス成分濃度検知用ガスセンサ−を設けると共
に、該ガスセンサ−と連動して前記圧力スイング装置か
ら供給するガス量を制御する手段を備えてなる培養装
置。1. A mixed gas is supplied to an adsorption tower filled with at least two or more adsorbents, and a high pressure adsorption step of a specific component in the mixed gas and a low pressure desorption step are alternately repeated in each adsorption tower. A pressure swing device for changing the gas composition in the mixed gas and a culture chamber, and a gas sensor for detecting the concentration of gas components in the culture chamber is provided, and the pressure swing device supplies gas from the pressure swing device in conjunction with the gas sensor. A culture device comprising means for controlling the amount of gas.
JP6272393A 1993-02-25 1993-02-25 Apparatus for culture Pending JPH06245755A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6272393A JPH06245755A (en) 1993-02-25 1993-02-25 Apparatus for culture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6272393A JPH06245755A (en) 1993-02-25 1993-02-25 Apparatus for culture

Publications (1)

Publication Number Publication Date
JPH06245755A true JPH06245755A (en) 1994-09-06

Family

ID=13208572

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6272393A Pending JPH06245755A (en) 1993-02-25 1993-02-25 Apparatus for culture

Country Status (1)

Country Link
JP (1) JPH06245755A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6013119A (en) * 1997-05-15 2000-01-11 Genx International, Inc. Filtering system and method for incubators
JP2007124984A (en) * 2005-11-07 2007-05-24 Chugai Ro Co Ltd Device for producing 2 gases for culturing container and sterilizer and system for feeding the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6013119A (en) * 1997-05-15 2000-01-11 Genx International, Inc. Filtering system and method for incubators
JP2007124984A (en) * 2005-11-07 2007-05-24 Chugai Ro Co Ltd Device for producing 2 gases for culturing container and sterilizer and system for feeding the same

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