JPH06241793A - Inclination sensor - Google Patents

Inclination sensor

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Publication number
JPH06241793A
JPH06241793A JP4741793A JP4741793A JPH06241793A JP H06241793 A JPH06241793 A JP H06241793A JP 4741793 A JP4741793 A JP 4741793A JP 4741793 A JP4741793 A JP 4741793A JP H06241793 A JPH06241793 A JP H06241793A
Authority
JP
Japan
Prior art keywords
electrode
base
inclination
movable electrode
movable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4741793A
Other languages
Japanese (ja)
Inventor
Katsushi Tamura
勝志 田村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP4741793A priority Critical patent/JPH06241793A/en
Publication of JPH06241793A publication Critical patent/JPH06241793A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To provide an inclination sensor capable of precisely detecting the inclination in all directions without being affected by the temperature change and little affected by noises. CONSTITUTION:Multiple fixed electrodes 7 arranged in different directions are formed on a base 1. A recess 11 is formed on one face of a base 2 by etching processing, a soft film 21 is formed on the recess 11, a mobile electrode forming section 22 is formed at the center section of the soft film 21, and multiple soft support films 9 are formed around the electrode forming section 22. A mobile electrode 8 is formed at the electrode forming section 22. A space section 13 is formed between the bottom face 15 of the recess 11 and the mobile electrode 8, and the base 2 is integrally mounted on the base 1 with the mobile electrode 8 side facing downward. The mobile electrode 8 is suspended by the soft support films 9. When an inclination sensor is inclined, the capacity between the fixed electrode 7 and the mobile electrode 8 is changed by the inclination change of the electrode due to the inclination, and the inclination of the sensor can be precisely detected in all the directions.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はFA(Factory Automati
on)機器や自動車および各種作業車などの姿勢検知に用
いられる傾斜センサに関するものである。
This invention relates to FA (Factory Automati).
on) a tilt sensor used for posture detection of equipment, automobiles, and various work vehicles.

【0002】[0002]

【従来の技術】図5には従来のピエゾ抵抗素子を用いた
傾斜センサが示されている。この傾斜センサ5は、例え
ば基台1を加工して中央側に重り3を形成し、この基台
1の上側に、例えばシリコン基台2を載置固定し、この
シリコン基台2の上面に複数のピエゾ抵抗素子6を形成
したもので、センサが傾くと重り3の重力の方向が変わ
り、シリコン基台2に曲げ応力を生ずる。この応力変化
がピエゾ抵抗素子6に伝わって抵抗素子の抵抗が変化す
る。この抵抗変化を利用してセンサの傾きを検出するも
のである。
2. Description of the Related Art FIG. 5 shows a tilt sensor using a conventional piezoresistive element. The tilt sensor 5 is formed by processing, for example, the base 1 to form a weight 3 on the center side, and mounting and fixing, for example, a silicon base 2 on the upper side of the base 1, and by mounting the silicon base 2 on the upper surface of the silicon base 2. A plurality of piezoresistive elements 6 are formed. When the sensor is tilted, the direction of gravity of the weight 3 changes, and bending stress is generated in the silicon base 2. This change in stress is transmitted to the piezoresistive element 6, and the resistance of the resistive element changes. The inclination of the sensor is detected by utilizing this resistance change.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、ピエゾ
抵抗素子6を用いた傾斜センサ5は温度変化によって抵
抗素子6の抵抗が変化するので、センサの特性が温度に
よって変化するという問題があり、この温度による特性
変化をキャンセルするため複雑な温度保障回路を設けな
ければならないという厄介な問題がある。また、素子が
抵抗のため、消費電力が大きいという問題もある。
However, the inclination sensor 5 using the piezoresistive element 6 has a problem that the characteristic of the sensor changes with temperature because the resistance of the resistive element 6 changes with temperature. There is a troublesome problem that a complicated temperature guarantee circuit must be provided to cancel the characteristic change due to. Further, since the element is a resistor, there is a problem that power consumption is large.

【0004】また、静電容量を利用した容量型の傾斜セ
ンサ(図示せず)がいろいろ提案されている。これら容
量型傾斜センサを用いることによって温度変化の影響を
なくし、消費電力も小さくすることが可能となるが、し
かし、これら容量型傾斜センサには構造が簡単で、全方
向の傾斜を精度よく検知するものがなく、また、検出用
電極が基台に直接固定されているので、例えばトラック
等の走行中の振動によって生ずるノズルの影響を受け易
く、精度よく検知できないという問題があった。
Further, various types of capacitance type tilt sensors (not shown) utilizing electrostatic capacitance have been proposed. By using these capacitive tilt sensors, it is possible to eliminate the influence of temperature changes and reduce power consumption. However, these capacitive tilt sensors have a simple structure and can detect tilts in all directions with high accuracy. Since there is nothing to do and the detection electrode is directly fixed to the base, there is a problem in that it is easily affected by the nozzle caused by vibration during traveling of a truck or the like and cannot be accurately detected.

【0005】本発明は上記従来の課題を解決するために
なされたものであり、その目的は、温度変化の影響を受
けることなく、全方向の傾斜を精度よく検知でき、か
つ、ノイズの影響の小さい傾斜センサを提供することに
ある。
The present invention has been made in order to solve the above-mentioned conventional problems, and an object thereof is to detect an inclination in all directions with high accuracy without being affected by temperature change, and to reduce the influence of noise. The object is to provide a small tilt sensor.

【0006】[0006]

【課題を解決するための手段】本発明は上記目的を達成
するために、次のように構成されている。すなわち、本
発明の傾斜センサは互いに間隙を介して対向配置された
一対の基台を有し、一方側の基台の面には固定電極が形
成され、この固定電極の対向側には間隙を介して可動電
極が設けられ、この可動電極はその周囲を複数の柔軟性
支持膜で吊られて他方側の基台に固定されており、前記
固定電極と可動電極の一方側電極は異なる方向に配分さ
れた複数の電極パターンによって形成され、他方側電極
は前記複数の電極パターンの全体に対向する単一の電極
パターンによって形成されていることを特徴として構成
されている。
In order to achieve the above object, the present invention is constructed as follows. That is, the tilt sensor of the present invention has a pair of bases that are arranged to face each other with a gap therebetween, and a fixed electrode is formed on the surface of the base on one side, and a gap is formed on the opposite side of this fixed electrode. A movable electrode is provided through the movable electrode, and the movable electrode is fixed to the base on the other side by suspending the periphery of the movable electrode with a plurality of flexible supporting films. It is characterized in that it is formed by a plurality of distributed electrode patterns, and the other side electrode is formed by a single electrode pattern that faces the whole of the plurality of electrode patterns.

【0007】また、前記柔軟性支持膜およびこの柔軟性
支持膜で可動電極を吊っている基台はシリコン系の材料
によって形成されていることも本発明の特徴的な構成と
されている。
It is also a characteristic feature of the present invention that the flexible support film and the base on which the movable electrode is suspended by the flexible support film are made of a silicon-based material.

【0008】[0008]

【作用】傾斜センサが傾くと、複数の柔軟性支持膜で吊
られている可動電極が基台の傾き以上に変化して傾き、
固定電極と前記可動電極間に隙間を介して容量変化を生
ずる。このとき、異なる方向に配分された複数の電極パ
ターンの一方側の電極と他方側の電極間の容量が可動電
極の傾きの方向や大きさに対応して変化し、この容量変
化に基づき、傾斜センサの全方向への傾きや大きさを精
度よく検知する。
When the tilt sensor tilts, the movable electrodes suspended by the plurality of flexible supporting films change and tilt more than the tilt of the base,
A capacitance change occurs between the fixed electrode and the movable electrode through a gap. At this time, the capacitance between the electrodes on the one side and the electrodes on the other side of the plurality of electrode patterns distributed in different directions changes according to the direction and size of the inclination of the movable electrode, and based on this capacitance change, the inclination changes. Accurately detects the inclination and size of the sensor in all directions.

【0009】[0009]

【実施例】以下、本発明の実施例を図面に基づいて説明
する。図1には本実施例の傾斜センサが示されている。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 shows the tilt sensor of this embodiment.

【0010】同図において、ガラス等(シリコン系材料
でもよい)の基台1の上面中央側には固定電極7が形成
されている。この固定電極7は、図3の(b)に示すよ
うに複数(実施例では8個)の円形電極7からなり、こ
の8個の電極7は同一円周上で互いに対角線状に配設さ
れ、異なる方向に配分された電極パターンによってそれ
ぞれ形成されている。また、基台1の周端縁側には接続
用電極14と信号取り出し電極19が導通状態で設けられて
おり、固定電極7には同電極7の信号取り出し電極18が
それぞれ導体パターン23によって接続されている。
In the figure, a fixed electrode 7 is formed on the center of the upper surface of a base 1 made of glass or the like (may be a silicon material). As shown in FIG. 3B, the fixed electrode 7 is composed of a plurality of (eight in the embodiment) circular electrodes 7, and the eight electrodes 7 are diagonally arranged on the same circumference. , Are formed by electrode patterns distributed in different directions. Further, a connection electrode 14 and a signal extracting electrode 19 are provided in a conductive state on the peripheral edge side of the base 1, and the fixed electrode 7 is connected to the signal extracting electrode 18 of the same electrode 7 by a conductor pattern 23. ing.

【0011】また、図1に示すように、基台1の上側に
は凹部11を有するシリコン系基台2が凹部11を下側にし
て載置されており、この基台2には図3の(a)に示す
ように、両端縁側に前記固定電極7の接続用電極14と接
続するための導体パターン17が形成されている。この導
体パターン17および接続用電極14は、例えば低融点金属
等で構成されており、この金属を加熱溶融して接続用電
極14と導体パターン17を融着接続することにより、基台
1と基台2が一体化される。
Further, as shown in FIG. 1, a silicon base 2 having a recess 11 is placed on the upper side of the base 1 with the recess 11 on the lower side. (A), conductor patterns 17 for connecting to the connection electrodes 14 of the fixed electrode 7 are formed on both edge sides. The conductor pattern 17 and the connecting electrode 14 are made of, for example, a low-melting point metal. By heating and melting this metal to fuse and connect the connecting electrode 14 and the conductor pattern 17, the base 1 and the base 1 The base 2 is integrated.

【0012】また、図1および図3の(a)に示すよう
に、基台2の凹部11には柔軟性膜21が形成されており、
この柔軟性膜21の中央部には円形状の電極形成部22が設
けられ、この電極形成部22上、即ち、固定電極7との対
向面側に前記固定電極7の複数の電極パターン全体に対
向して円形状をした単一の可動電極8が隙間16を介して
形成されている。また、図3に示すように、可動電極8
の周囲にはこの可動電極8を吊るす複数(実施例では8
個)の細紐状の柔軟性支持膜9が形成され、この複数の
細紐状柔軟性支持膜9の表面には導体パターン24が形成
されている。
Further, as shown in FIGS. 1 and 3 (a), a flexible film 21 is formed in the recess 11 of the base 2.
A circular electrode forming portion 22 is provided in the central portion of the flexible film 21, and a plurality of electrode patterns of the fixed electrode 7 are provided on the electrode forming portion 22, that is, on the surface facing the fixed electrode 7. A single movable electrode 8 having a circular shape facing each other is formed via a gap 16. In addition, as shown in FIG.
A plurality of the movable electrodes 8 are hung around the
Individual) thin string-like flexible supporting films 9 are formed, and conductor patterns 24 are formed on the surfaces of the plurality of thin string-like flexible supporting films 9.

【0013】次に、本実施例の傾斜センサの製造方法を
図面に基づいて説明する。この傾斜センサの製造方法に
は半導体製造技術の接合技術やエッチング技術を利用
し、まず、図4の(a)に示すシリコン基台2の片側面
に、図4の(b)のようにシリコンの異方性エッチング
等により凹部11を形成する。この凹部11の底面15上に、
図4の(c)のように犠牲層膜12を形成する。次いで、
図4の(d)に示すように、この犠牲層膜12を覆う状態
で凹部11の底面15上に窒化膜あるいはポリシリコン膜の
柔軟性膜21を形成する。この柔軟性膜21の中央部には可
動電極形成部22を形成し、その周りには、図3の(a)
に示すような可動電極8を吊るすための複数(実施例で
は8個)の細紐状の柔軟性支持膜9を形成する。次い
で、図4の(e)に示すように可動電極形成部22上に可
動電極8を形成し、基台2の周端縁側に導体パターン17
を形成する。次いで、前記犠牲層膜12をエッチングして
空間部13を形成する。この基台2を、図4の(f)のよ
うに可動電極8を下側にすると、可動電極8は複数(実
施例では8個)の柔軟性支持膜9によって吊られた状態
となる。
Next, a method of manufacturing the tilt sensor of this embodiment will be described with reference to the drawings. In the method of manufacturing this inclination sensor, the bonding technology and etching technology of the semiconductor manufacturing technology are used. First, on one side surface of the silicon base 2 shown in FIG. 4A, silicon as shown in FIG. The concave portion 11 is formed by anisotropic etching or the like. On the bottom surface 15 of this recess 11,
The sacrifice layer film 12 is formed as shown in FIG. Then
As shown in FIG. 4D, a flexible film 21 of a nitride film or a polysilicon film is formed on the bottom surface 15 of the recess 11 so as to cover the sacrifice layer film 12. A movable electrode forming portion 22 is formed in the central portion of the flexible film 21, and around the movable electrode forming portion 22, (a) of FIG.
A plurality (eight in the embodiment) of thin string-shaped flexible support films 9 for suspending the movable electrode 8 as shown in FIG. Next, as shown in FIG. 4E, the movable electrode 8 is formed on the movable electrode forming portion 22, and the conductor pattern 17 is formed on the peripheral edge side of the base 2.
To form. Then, the sacrificial layer film 12 is etched to form a space 13. When the movable electrode 8 is placed on the lower side of the base 2 as shown in FIG. 4F, the movable electrode 8 is suspended by a plurality of flexible supporting films 9 (eight in the embodiment).

【0014】また、図4の(g)に示す基台1の上面
に、図4の(h)および図3の(b)に示す複数(実施
例では8個)の固定電極7と接続用電極14および信号取
り出し電極19を形成し、この基台1上に図4の(f)の
基台2を載置し、接続用電極14と導体パターン17を加熱
処理して溶融し、図4の(i)に示すように基台1と基
台2を融着一体化する。
On the upper surface of the base 1 shown in FIG. 4G, a plurality of (8 in the embodiment) fixed electrodes 7 shown in FIG. 4H and FIG. 3B are connected. The electrode 14 and the signal extraction electrode 19 are formed, the base 2 of FIG. 4 (f) is placed on the base 1, and the connection electrode 14 and the conductor pattern 17 are heat-treated and melted. As shown in (i), the base 1 and the base 2 are fused and integrated.

【0015】本実施例の傾斜センサが傾くと、図2に示
すように、柔軟性支持膜9に吊られている可動電極8は
その重みによって柔軟性支持膜9の弛みの方向および大
きさが変わり、傾斜センサの基台の傾きよりも可動電極
8の傾きの方が大きくなる。これにより、固定電極7と
各可動電極8間に大きな容量変化が発生し、この容量変
化を、例えばコンピュータ等で演算処理して傾斜センサ
の傾きの方向や傾きの大きさを精度よく検出する。
When the tilt sensor of this embodiment is tilted, as shown in FIG. 2, the movable electrode 8 hung on the flexible supporting film 9 has a slacking direction and size depending on its weight. Instead, the tilt of the movable electrode 8 becomes larger than the tilt of the base of the tilt sensor. As a result, a large capacitance change occurs between the fixed electrode 7 and each movable electrode 8, and the capacitance change is accurately processed by, for example, a computer or the like to accurately detect the tilt direction and tilt size of the tilt sensor.

【0016】本実施例によれば、静電容量の変化を利用
して傾きを検出する構成としたので、従来のピエゾ抵抗
素子の場合のような温度の影響を受けることがなく、複
雑な温度保障回路が不要となり、抵抗素子を使用しない
ので消費電力も小さくすることができる。
According to the present embodiment, since the inclination is detected by utilizing the change of the electrostatic capacitance, it is not affected by the temperature as in the case of the conventional piezoresistive element, and the complicated temperature is prevented. Since the security circuit is unnecessary and the resistance element is not used, the power consumption can be reduced.

【0017】また、可動電極8を細紐状の柔軟性支持膜
9で吊らせ、複数の固定電極7を異方向に配分した電極
パターンを形成し、可動電極8の重さによる柔軟性支持
膜9の弛み具合によってその傾きを大きくする構成とし
たので、静電容量の変化が大となり、センサの傾きの方
向および大きさを精度よく検出することができる。
Further, the movable electrode 8 is suspended by a thin string-shaped flexible supporting film 9 to form an electrode pattern in which a plurality of fixed electrodes 7 are distributed in different directions, and the flexible supporting film depending on the weight of the movable electrode 8 is formed. Since the inclination is increased according to the degree of slack in 9, the change in capacitance becomes large, and the direction and magnitude of the inclination of the sensor can be accurately detected.

【0018】さらに、基台2の凹部11の底面15と可動電
極8間に空間部13を形成したので、例えば、走行中のト
ラックが振動によって発するノイズ等を前記空間部13の
空気がダンパーとなって吸収し、そのダンパー効果によ
ってノイズの影響を小さくすることができる。
Further, since the space portion 13 is formed between the bottom surface 15 of the recess 11 of the base 2 and the movable electrode 8, for example, the air in the space portion 13 serves as a damper for noise generated by vibration of a running truck. The effect of noise can be reduced by the damper effect.

【0019】さらにまた、本実施例では、半導体製造技
術の接合技術やエッチング技術を利用したので製造が容
易となり、安価で、かつ、容易に大量生産することが可
能となる。
Furthermore, in this embodiment, since the joining technique and the etching technique of the semiconductor manufacturing technique are used, the manufacturing is facilitated, the cost can be reduced, and the mass production can be easily performed.

【0020】なお、本発明は上記実施例に限定されるこ
とはなく、様々な実施の態様を採り得る。例えば、上記
実施例では、固定電極7を下側に可動電極8を上側にし
て使用する構成としたが、逆に、固定電極7を上側に可
動電極8を下側として使用してもよい。この場合、下側
の可動電極8側の基台に可動電極8の傾斜変形を妨げな
い逃げ凹部を設ける必要がある。
The present invention is not limited to the above-mentioned embodiment, and various embodiments can be adopted. For example, in the above embodiment, the fixed electrode 7 is used on the lower side and the movable electrode 8 is used on the upper side. However, conversely, the fixed electrode 7 may be used on the upper side and the movable electrode 8 may be used on the lower side. In this case, it is necessary to provide a relief recess on the base on the side of the lower movable electrode 8 so as not to prevent the inclined deformation of the movable electrode 8.

【0021】また、上記実施例では、固定電極7を8個
の円形電極で構成したが、円形電極の数は1個以上でよ
く、その数は問わない。また、形状も問わない。さら
に、配置位置も同一円周上でなくともよい。
Further, in the above embodiment, the fixed electrode 7 is composed of eight circular electrodes, but the number of circular electrodes may be one or more, and the number is not limited. Moreover, the shape does not matter. Further, the arrangement positions do not have to be on the same circumference.

【0022】さらに、上記実施例では可動電極8を吊る
す柔軟性支持膜9を8個としたが、その数は問わない。
Further, in the above embodiment, the number of flexible support films 9 for suspending the movable electrode 8 is eight, but the number is not limited.

【0023】さらにまた、基台1,2および柔軟性支持
膜9をシリコン系の材料で形成したが、半導体技術で容
易に加工でき、所定の性能(例えば柔軟性)を満足する
ものであればその材質は問わない。
Furthermore, although the bases 1 and 2 and the flexible support film 9 are formed of a silicon-based material, if they can be easily processed by semiconductor technology and satisfy a predetermined performance (for example, flexibility). The material does not matter.

【0024】さらにまた、上記実施例では可動電極8を
単一電極パターンで形成し、固定電極7を複数の電極パ
ターンで構成したが、その逆に、可動電極8を複数の電
極パターンで固定電極7を単一電極パターンで構成して
もよい。
Furthermore, in the above-mentioned embodiment, the movable electrode 8 is formed with a single electrode pattern and the fixed electrode 7 is formed with a plurality of electrode patterns. On the contrary, the movable electrode 8 is formed with a plurality of electrode patterns. 7 may be configured with a single electrode pattern.

【0025】[0025]

【発明の効果】本発明は複数の柔軟性支持膜で可動電極
を吊るし、可動電極の重さによる支持膜の弛み具合によ
ってその傾きを大きくする構成としたので、傾斜センサ
の傾きの大きさを精度よく検出することができる。ま
た、固定電極と可動電極の一方側を異なる方向に配分し
た複数の電極パターンによって形成したので、センサの
傾きの全方向を精度よく検出することができる。
According to the present invention, the movable electrode is hung by a plurality of flexible supporting films, and the inclination is increased depending on the degree of slack in the supporting film due to the weight of the movable electrodes. It can be detected accurately. Further, since one side of the fixed electrode and the movable electrode is formed by a plurality of electrode patterns distributed in different directions, it is possible to accurately detect all the directions of inclination of the sensor.

【0026】また、固定電極と可動電極間の容量変化を
利用して傾きを検出するので、従来のピエゾ抵抗素子の
ような温度の影響を受けることがなく、したがって、複
雑な温度保障回路が不要となり、抵抗素子を使用しない
ため消費電力を小さくすることができる。
Further, since the inclination is detected by utilizing the capacitance change between the fixed electrode and the movable electrode, there is no influence of temperature unlike the conventional piezoresistive element, and therefore, a complicated temperature guarantee circuit is unnecessary. Since the resistance element is not used, the power consumption can be reduced.

【0027】さらに、可動電極は柔軟性支持膜で吊られ
ているので、例えば、走行中のトラックが振動によって
発するノイズ等を可動電極と基台との間の空気がダンパ
ーとなって吸収し、そのダンパー効果によってノイズの
影響の小さい高精度の傾斜検出が可能となる。
Further, since the movable electrode is suspended by the flexible support film, for example, the noise between the moving electrode and the base is absorbed by the air as a damper to absorb the noise generated by the vibration of the running truck. The damper effect enables highly accurate inclination detection with less influence of noise.

【図面の簡単な説明】[Brief description of drawings]

【図1】本実施例の傾斜センサの説明図である。FIG. 1 is an explanatory diagram of a tilt sensor of this embodiment.

【図2】同傾斜センサの可動電極の傾き状態の説明図で
ある。
FIG. 2 is an explanatory diagram of a tilted state of a movable electrode of the tilt sensor.

【図3】同傾斜センサの要部構造説明図である。FIG. 3 is an explanatory view of a main structure of the tilt sensor.

【図4】同傾斜センサの製造工程の説明図である。FIG. 4 is an explanatory diagram of a manufacturing process of the tilt sensor.

【図5】従来のピエゾ抵抗素子を用いた傾斜センサの説
明図である。
FIG. 5 is an explanatory diagram of a tilt sensor using a conventional piezoresistive element.

【符号の説明】[Explanation of symbols]

1 基台 2 シリコン基台 7 固定電極 8 可動電極 9 柔軟性支持膜 11 凹部 13 空間部 1 base 2 silicon base 7 fixed electrode 8 movable electrode 9 flexible support film 11 recess 13 space

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 互いに間隙を介して対向配置された一対
の基台を有し、一方側の基台の面には固定電極が形成さ
れ、この固定電極の対向側には間隙を介して可動電極が
設けられ、この可動電極はその周囲を複数の柔軟性支持
膜で吊られて他方側の基台に固定されており、前記固定
電極と可動電極の一方側電極は異なる方向に配分された
複数の電極パターンによって形成され、他方側電極は前
記複数の電極パターンの全体に対向する単一の電極パタ
ーンによって形成されている傾斜センサ。
1. A pair of bases arranged to face each other with a gap therebetween, a fixed electrode is formed on the surface of the base on one side, and a fixed electrode is movable on the opposite side with a gap. An electrode is provided, and the movable electrode is fixed to the base on the other side by suspending the periphery of the movable electrode with a plurality of flexible supporting films, and the fixed electrode and the one side electrode of the movable electrode are distributed in different directions. A tilt sensor formed by a plurality of electrode patterns, the other side electrode being formed by a single electrode pattern facing the whole of the plurality of electrode patterns.
【請求項2】 柔軟性支持膜およびこの柔軟性支持膜で
可動電極を吊っている基台はシリコン系の材料によって
形成されている請求項1記載の傾斜センサ。
2. The tilt sensor according to claim 1, wherein the flexible support film and the base on which the movable electrode is suspended by the flexible support film are made of a silicon-based material.
JP4741793A 1993-02-12 1993-02-12 Inclination sensor Pending JPH06241793A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4741793A JPH06241793A (en) 1993-02-12 1993-02-12 Inclination sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4741793A JPH06241793A (en) 1993-02-12 1993-02-12 Inclination sensor

Publications (1)

Publication Number Publication Date
JPH06241793A true JPH06241793A (en) 1994-09-02

Family

ID=12774583

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4741793A Pending JPH06241793A (en) 1993-02-12 1993-02-12 Inclination sensor

Country Status (1)

Country Link
JP (1) JPH06241793A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008119238A (en) * 2006-11-13 2008-05-29 Teijin Pharma Ltd Ultrasonic fracture treatment apparatus with transducer angle adjusting mechanism

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008119238A (en) * 2006-11-13 2008-05-29 Teijin Pharma Ltd Ultrasonic fracture treatment apparatus with transducer angle adjusting mechanism
JP4567649B2 (en) * 2006-11-13 2010-10-20 帝人ファーマ株式会社 Ultrasonic fracture treatment device with transducer angle adjustment mechanism

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