JPH06236040A - Image forming method - Google Patents

Abstract

PURPOSE:To provide an image method by which the development reaction and the polymn. of silver halide by heating can be uniformly and smoothly carried out in a photosensitive material and heat development can be done without melt sticking of the photosensitive polymerizable layer side of the photosensitive material to a heater body of a sheet. CONSTITUTION:A photosensitive material having a photosensitive polymerizable layer 12 containing silver halide, a reducing agent and a polymerizable compd. formed on a supporting body 11 is exposed for an image and heated at >=70 deg.C for the heat development to form a hardened image. At least 70% of the photosensitive polymerizable layer 12 of the photosensitive material is covered with a sheet 14 or a heating body separated with 0.5-500mum distance. In this state, the photosensitive material is heated for the heat development.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION The present invention relates to a photosensitive material comprising a support and a photosensitive polymerizable layer containing a silver halide, a reducing agent and a polymerizable compound, which is exposed to light at 70 ° C. or higher. The present invention relates to an image forming method for forming a cured image by heating and performing heat development.

[0002]

2. Description of the Related Art A method of forming an image by polymerizing a polymerizable compound by the action of a reducing agent in a portion where a latent image of silver halide is formed is disclosed in JP-B-45-11149 and JP-A-45-1149.
7-20741, 49-10697, JP-A-57.
No. 138632 and No. 58-169143. These were by a liquid development method of silver halide with a highly alkaline developer.

As an improvement of the above method, a method of developing a photosensitive material by dry processing has been proposed. The method of this dry process is described in JP-A Nos. 61-69062 and 61-6902.
73145, JP-A-3-18854, and 3-204.
No. 650, No. 4-191956, No. 4-338955.
Nos. 4,3,389,56, 4,340,548 and 5,6003. In these methods, a photosensitive material in which a photosensitive polymerizable layer containing a silver halide, a reducing agent and a polymerizable compound is provided on a support is subjected to imagewise exposure and then heated to be thermally developed to form a cured image. Form. According to these methods, a cured image of the polymerizable compound can be easily obtained by utilizing the photosensitivity of silver halide having high sensitivity.

As described above, the thermal development is simple in operation because it does not use a highly alkaline developing solution, but it is not easy to control heating conditions (heating temperature, heating time, heating means, etc.). For example, if the surface of the photopolymerizable layer of a photothermographic material is heated to the air, the development of silver halide proceeds depending on the type of the photosensitive material, but the polymerization reaction does not proceed sufficiently and the curing It was often found that only infrequent and insufficiently strong images were obtained. This is considered to be a problem caused by the polymerization inhibiting action of oxygen in the air.

Therefore, a method of carrying out heat development in a state where the photosensitive polymerizable layer of the photothermographic material is not opened to the air has been tried. This method is described in JP-A-61-2550
It is described in JP-A-6. The simplest aspect of this method is
The photosensitive material is heated and developed in a state where the photothermographic material is in close contact with a heat source such as a heating plate. However, in this case, the surface of the photosensitive material and the heat plate cannot be adhered to each other uniformly, resulting in uneven development, partial fog, and weak curing. hand,
It was often seen that the image was significantly degraded. Also,
Since the surface of the photosensitive material directly contacts the hot plate (or a heat source such as a heat roller), there is a problem that the surface of the photosensitive material is fused to the hot plate to damage the photosensitive material and stain the hot plate. In particular, in a light-sensitive material containing a thermoplastic resin such as polyvinyl alcohol in the surface layer, the problem of fusion was serious.

Further, it has been proposed to heat the photosensitive material while the surface of the photosensitive polymerizable layer of the photothermographic material is covered with a sheet. The photosensitive material provided with a cover sheet is described in JP-A-61-55507. However, also in this case, it is difficult to uniformly adhere the cover sheet and the photosensitive material over the entire surface, and due to this, uneven development, partial fog, and partial insufficient curing occur to cause image defects. It was inevitable. There is also a problem that the surface of the photosensitive material is fused to the cover sheet. Therefore, the cover sheet could not be used repeatedly.

[0007]

SUMMARY OF THE INVENTION An object of the present invention is to provide an image forming method in which the development reaction and the polymerization reaction of silver halide by heating proceed uniformly and smoothly in the light-sensitive material. It is also an object of the present invention to provide an image forming method capable of performing thermal development without fusing the surface of the photosensitive material on the side of the photosensitive polymerizable layer to the heating element or the sheet.

[0008]

The objects of the present invention have been achieved by the following (1) to (3).

(1) A photosensitive material having a photosensitive polymerizable layer containing a silver halide, a reducing agent and a polymerizable compound provided on a support is imagewise exposed and then heated to 70 ° C. or higher for thermal development. An image forming method for forming a cured image by performing
At least 70 of the surface of the photosensitive material on the side of the photosensitive polymerizable layer.
% With a thickness of 10 μm through a gap of 0.5 to 500 μm.
An image forming method, which comprises covering with a sheet of m or more, and heating in that state from the support side to perform thermal development.

(2) A photosensitive material having a photosensitive polymerizable layer containing a silver halide, a reducing agent and a polymerizable compound provided on a support is imagewise exposed and then heated to 70 ° C. or higher for thermal development. An image forming method for forming a cured image by performing
At least 70 of the surface of the photosensitive material on the side of the photosensitive polymerizable layer.
% With a thickness of 10 μm through a gap of 0.5 to 500 μm.
An image forming method characterized by covering with a sheet of m to 3 mm, and heating in that state from the sheet side to perform thermal development.

(3) A photosensitive material having a photosensitive polymerizable layer containing a silver halide, a reducing agent and a polymerizable compound on a support is imagewise exposed and then heated to 70 ° C. or higher for thermal development. An image forming method for forming a cured image by performing
At least 70 of the surface of the photosensitive material on the side of the photosensitive polymerizable layer.
% Is covered with a surface of a heating element through a gap of 0.5 to 500 μm, and in that state, heating is performed using the heating element to perform thermal development.

[0012]

In the image forming method described in JP-A-61-55506 and the photosensitive material described in JP-A-61-55507, in order to avoid the influence of oxygen in the air, a photosensitive polymerization of the photosensitive material is carried out. The surface of the conductive layer is directly covered with the surface of a sheet or a heating element to perform thermal development. However, according to the research conducted by the present inventor, surprisingly, even when the surface of the photosensitive material on the side of the photosensitive polymerizable layer is covered with the surface of the sheet or the heating element with a gap of 0.5 to 500 μm, It turned out that the influence of oxygen can be avoided. Therefore, the image forming method of the present invention can avoid both the problem caused by the influence of oxygen in the air and the problem caused by the fusion between the surface of the photosensitive material on the side of the photosensitive polymerizable layer and the sheet or the heating element.

It is not clear why the partial fogging and the partial defectiveness of the effect were improved by providing the gap and performing the thermal development. However, the uneven adhesion caused by the difficulty of uniform adhesion between the surface of the photosensitive polymerizable layer and the sheet or the surface of the heating element is eliminated, and gas generated from the photosensitive material during heating causes bubbles to be generated on the adhesion surface. It is considered that this is because the occurrence of the phenomenon was eliminated by the gap. As a result of the above, according to the image forming method of the present invention, it is possible to form a uniform image having a high degree of curing by a simple process using silver halide having high photosensitivity. Further, the fusion of the surface of the light-sensitive material with the sheet or the heating element is eliminated by the present invention, the maintainability of the heating element is improved, and the resource saving is achieved by the repeated use of the cover sheet.

The embodiment (1) of the present invention has an advantage that the heat efficiency is the best because the heating is performed directly from the support side without a gap. The aspect of (2) has an advantage that there is no limitation on the shape or type of the heat generating element serving as a heat source, since the heating is indirectly performed via the gap and the sheet. The mode (3) has an advantage that the heat developing mechanism can be designed to have the simplest structure because no sheet is used.

[0015]

DETAILED DESCRIPTION OF THE INVENTION In the image forming method of the present invention, the surface of the photosensitive material on the side of the photosensitive polymerizable layer (the surface opposite to the support) is used.
Is covered with a surface of a sheet or a heating element through a gap of 0.5 to 500 μm, and heating is performed in that state to perform thermal development.

In the above embodiments (1) and (2), the sheet is used to cover the surface of the photosensitive material on the side of the photosensitive polymerizable layer.
The thickness of the sheet is 50 μm or more, preferably 70 μm or more. In the aspect of (1), since heating is performed from the support side, there is no particular upper limit on the thickness of the sheet. In the aspect of (2), since heating is performed from the sheet side,
In consideration of heat conduction, the thickness of the sheet is 3 mm or less, preferably 1 mm or less.

As the sheet, a plastic film,
Various conventionally known film-shaped or plate-shaped solid substances such as a metal plate, a rubber plate, a ceramic plate, and a metal-deposited plastic film can be used. Examples of the material of the plastic film include polyester, polyimide, polyethylene, polypropylene, polystyrene, polyacrylic acid ester, polyvinyl acetal, styrene-butadiene copolymer, styrene-butadiene-acrylonitrile copolymer and silicone resin. it can. Examples of the material for the metal plate include iron, aluminum and copper.

In the mode (3), instead of the sheet, the surface of the heating element covers the photosensitive polymerizable side surface of the photosensitive material. The heating element that serves as a heat source will be described later.

In the present invention, the surface of the photosensitive material on the side of the photosensitive polymerizable layer is covered with the surface of the sheet or the heating element with a gap of 0.5 to 500 μm. The lower limit of this gap is 1 μm
It is preferably not less than 10 μm, more preferably not less than 10 μm, most preferably not less than 20 μm. The upper limit of the gap is preferably 400 μm or less, more preferably 300 μm or less. It is not necessary for the entire surface of the photosensitive polymerizable layer to be covered with a gap, and a part (less than 30% per area) is directly covered with the surface of the sheet or the heating element without a gap. May be. In the present invention, 70% or more, preferably 80% or more, more preferably 9% based on the area of the surface of the photosensitive polymerizable layer.
0% or more is covered with the surface of the sheet or the heating element through the gap.

Various means can be adopted to provide the above-mentioned gap. Examples thereof are shown in FIGS. 1 and 2. FIG. 1 is a schematic diagram showing a case where a gap is provided by using a spacer. A spacer (13) is arranged around the surface of the photosensitive material having the photosensitive polymerizable layer (12) provided on the support (11) on the side of the photosensitive polymerizable layer. By covering it with the sheet (14), a gap corresponding to the thickness of the spacer (13) is formed. This spacer can be easily made from the materials mentioned above as the materials for the sheet such as cork board, rubber plate, metal plate, wood board and the like. The material of the spacer is preferably selected from those that do not significantly deform at the heat development temperature.

FIG. 2 is a schematic diagram showing a case where a gap is provided by using a net. The net (23) is overlaid on the surface of the photosensitive material having the photosensitive polymerizable layer (22) provided on the support (21) on the side of the photosensitive polymerizable layer. By covering it with a sheet (24), a gap corresponding to the thickness of the net (23) is formed. The net may have a lattice shape or a mesh shape. The net can be easily made from nylon mesh, Teflon mesh, or the like. The material for the net is also preferably selected from those that do not significantly deform at the heat development temperature.

The sheet and the means for forming a gap (spacer or net) used in the embodiments (1) and (2) are generally used in combination with a light-sensitive material after completion of image exposure (described later). . However, if these sheets and spacers do not hinder the exposure, they may be provided on the photosensitive material before image exposure, that is, before using the photosensitive material (including during manufacturing of the photosensitive material).

Next, each aspect of the present invention will be described with reference to the drawings. FIG. 3 is a schematic sectional view showing the aspect (1) of the present invention. The photosensitive material having the photosensitive polymerizable layer (32) provided on the support (31) is imagewise exposed to the photosensitive polymerizable layer (3).
The surface of 2) is covered with a sheet (34) through a gap (33). In this state, heating is performed from the support (31) side using the heating element (35).

FIG. 4 is a schematic sectional view showing the embodiment (2) of the present invention. A photosensitive polymerizable layer (4
After the photosensitive material provided with 2) is imagewise exposed, the surface of the photosensitive polymerizable layer (42) is covered with the sheet (4) through the gap (43).
Cover with 4). In that state, heating is performed from the sheet (44) side using the heating element (45).

FIG. 5 is a schematic sectional view showing the embodiment (3) of the present invention. The photosensitive polymerizable layer (5
After imagewise exposing the photosensitive material provided with 2), the surface of the photosensitive polymerizable layer (52) is heated through the gap (53) through the heating element (5).
Cover with the surface of 4). In that state, the heating element (54) is used for heating.

For the thermal development, conventionally known heating means can be used. In the cases of (1) and (2) of the present invention, the heating means is not particularly limited. In the case of the aspect (3), it is necessary to use a heating element having a surface capable of covering the surface of the photosensitive material on the side of the photosensitive polymerizable layer. Heating is generally carried out by bringing a light-sensitive material into contact with a heating element (eg, roller, plate). Alternatively, the photosensitive material may be indirectly heated by irradiation with infrared rays.

The photosensitive materials may be heated from both sides (support side and photosensitive polymerizable layer side) by using the embodiments (1) and (2) or (1) and (3) of the present invention in combination. . As described above, the method of heating from both sides also includes a method of leaving the photosensitive material in a heated zone (in a high-temperature gas or liquid) or allowing it to pass through the zone. Heating temperature is 70 ℃
That is all. It is more preferably 70 to 200 ° C. The heating time is preferably 1 to 180 seconds.

When the imagewise exposed light-sensitive material is heated as described above, the silver halide on which a latent image is formed by exposure is thermally developed, and at the same time, the part (or the part where the latent image is not formed) is polymerizable. The compound is polymerized and cured (or the crosslinkable binder is crosslinked). As a result, the exposed or unexposed portion of the polymerizable compound is selectively polymerized and cured (or crosslinked and cured).

Next, the image exposure process performed before heat development will be described. The imagewise exposure may be performed from the side of the photosensitive polymerizable layer of the light-sensitive material or may be performed from the side of the support through the support. Examples of the exposure method include reflection image exposure using a xenon lamp, tungsten lamp, fluorescent lamp, or the like as a light source, contact exposure through a transparent positive film, and scanning exposure using laser light, a light emitting diode, or the like. The light source and the exposure wavelength that can be used for imagewise exposure depend on the photosensitive wavelength of the silver halide emulsion used in the photosensitive material. The wavelength range of near-ultraviolet light, visible light and near-infrared light can be used. The exposure amount is mainly determined by the sensitivity of the silver halide emulsion. Generally 0.01 to 10,000 erg
It can be exposed with light energy of / cm ² . By performing the above image exposure, a latent image of silver halide is formed in the exposed portion.

A cured image is formed on the photosensitive material by the above image exposure and the above-mentioned heat development. This cured image can be used in various methods by further processing. Examples of treatments after heat development include elution, removal, transfer and toner development. The elution treatment is a treatment for selectively removing the uncured portion of the photosensitive polymerizable layer using an eluate (etching liquid). The removal treatment is a treatment of selectively removing the uncured portion or the cured portion of the photosensitive polymerizable layer using a sheet.
The transfer process is a process of selectively transferring an uncured portion or a cured portion of the photosensitive polymerizable layer onto the image receiving material to transfer an image from the photosensitive material to the image receiving material. The toner developing process is a process of selectively attaching the toner to the uncured portion or the cured portion of the photosensitive polymerizable layer. In image formation, the above processes are arbitrarily combined and carried out depending on the application. Each processing is already known and is described in each of the publications mentioned in the section of the related art.

The components and constituent elements of the light-sensitive material used in the present invention will be described. The photosensitive polymerizable layer of the photosensitive material is
You may separate into the photosensitive layer containing a silver halide, and the polymeric layer containing a polymeric compound. The method of the present invention is particularly effective when using a photosensitive material in which a polymerizable compound is uniformly dispersed in a photosensitive polymerizable layer (or a polymerizable layer), that is, a mode in which microcapsules are not used.

[Silver Halide] The silver halide used in the present invention is any one of silver chloride, silver bromide, silver iodide, silver chlorobromide, silver chloroiodide, silver iodobromide and silver chloroiodobromide. Particles can also be used. Silver halide grains have regular crystal shapes such as cubes, octahedra and tetradecahedrons, irregular crystal shapes such as spheres and plates, and crystal defects such as twin planes. It may have one or a combination thereof. The grain size of the silver halide may be fine grains of about 0.01 micron or less, or large grains having a projected area diameter of up to about 10 microns. It may be a polydisperse emulsion or a monodisperse emulsion. The monodisperse emulsion is described in U.S. Pat. Nos. 3,574,628 and 3,655,394 and British Patent No. 14,137,48. Also, tabular grains having an aspect ratio of about 5 or more can be used. Tabular grains are described by Gatov, Photographic Science and Engineering (Gutoff, Photog
raphic Science and Engineering), Volume 14, 248
~ 257 (1970); and U.S. Pat. No. 4,434.
No. 226, No. 4414310, No. 4433048,
It can be easily prepared by the method described in each of US Pat. No. 4,439,520 and British Patent No. 2121157.

The crystal structure may be uniform, may have different halogen compositions inside and outside, or may have a layered structure. Further, silver halides having different compositions may be joined by epitaxial joining, or may be joined with a compound other than silver halide such as rhodan silver and lead oxide. For silver halide grains,
Copper, thallium, lead, bismuth, cadmium, zinc, chalcogen (eg, sulfur, selenium, tellurium), gold or a Group VIII noble metal (eg, rhodium, iridium, iron, platinum, palladium) according to a conventional method. It can be added in the form of a salt at the time of particle formation or after the particle formation. A specific method is described in US Pat. No. 119543.
No. 2, No. 1951933, No. 2448060,
No. 2628167, No. 2950972, No. 3
No. 488709, No. 3737313, and No. 3772
031, 4269927 and Research Disclosure (RD), Vol. 134, N.
o. 13452 (June 1975).

In the present invention, when an image is formed by high-intensity short-time exposure, iridium ions are preferably used in an amount of 10 ^-8 to 10 ^-3 mol, and more preferably 10 ^-7 to 10 ^-10 mol per mol of silver halide. ^-5 mol. Further, two or more kinds of silver halide grains having different halogen compositions, crystal habits, grain sizes and the like can be used in combination. The silver halide is preferably used in the form of emulsion. The silver halide emulsion used in the present invention is described in Research Disclosure (RD), No. 17643 (December 1978),
22-23, "I. Emulsion preparation
and types) ”, and No. 18716 (November 1979), p.648.

The silver halide emulsion is usually one which has been physically ripened, chemically ripened and spectrally sensitized. Additives used in such processes are described in Research Disclosure, No. 17643 and No. 17643. 18716. No. for chemical sensitizers. 1764
3 (page 23) and No. 18716 (page 648, right column)
Regarding the spectral sensitizer, No. 17643 (23-2
Page 4) and No. No. 18716 (page 648, right column) about the supersensitizer. 18716 (page 649, right column-). In addition to the above, known additives that can be used in the present invention are also described in the above two Research Disclosure magazines. For example, regarding the sensitivity enhancer, No. 18716 (page 648, right column)
No. 1 for antifoggants and stabilizers. 176
43 (pages 24 to 25) and No. 18716 (Page 649, right column). As the silver halide grains, it is preferable to use silver halide grains having a relatively low fog value. A light-sensitive material using such silver halide grains is disclosed in JP-A-63-68.
It is described in Japanese Patent No. 830. Negative type silver halide is usually used for the silver halide emulsion. However, inversion type silver halide which can directly obtain a positive image may be used.

[Reducing Agent] The reducing agent used in the present invention has a function of reducing silver halide or a function of accelerating (or suppressing) the polymerization of the polymerizable compound. There are various kinds of substances as the reducing agent having the above function. Examples of the reducing agent include hydroquinones, catechols, p-aminophenols, p-phenylenediamines, 3-pyrazolidones, 3-aminopyrazoles, 4-amino-5-pyrazolones, 5-aminouracils, 4,5-dihydroxy-6-aminopyrimidines, reductones, aminoreductones, o- or p-sulfonamidophenols, o- or p-sulfonamidonaphthols,
2,4-disulfonamidophenols, 2,4-disulfonamidonaphthols, o- or p-acylaminophenols, 2-sulfonamidoindanones, 4
-Sulfonamido-5-pyrazolones, 3-sulfonamidoindoles, sulfonamide pyrazolobenzimidazoles, sulfonamide pyrazolotriazoles,
Examples include α-sulfonamidoketones and hydrazines.

By adjusting the type and amount of the reducing agent, the polymerizable compound in the portion where the latent image of silver halide is formed or the portion where the latent image is not formed is selectively polymerized. be able to. For example, the following system (A), (B) or (C) can be adopted.

The reducing agent (A) develops silver halide and is itself oxidized to an oxidant. When the oxidant decomposes in the layer to generate radicals, polymerization occurs in the portion where the latent image of silver halide is formed. Examples of such a system include a system in which hydrazines are used alone as a reducing agent, or a system in which hydrazines and other reducing agents are used in combination.

(B) When the oxidant of the reducing agent has a polymerization inhibiting function, a polymerization initiator is allowed to coexist in the system so that the latent image of silver halide is formed in the portion. Polymerization is suppressed, and polymerization occurs in a portion where a latent image of silver halide is not formed. Examples of the reducing agent having such a function include 1-phenyl-
3-pyrazolidones can be mentioned.

(C) The reducing agent itself has a polymerization inhibiting function, but its oxidant does not have a polymerization inhibiting function (or
When the polymerization inhibitor is weak), coexisting a polymerization initiator in the system suppresses the polymerization in the area where the latent image of silver halide is not formed, and the latent silver halide Polymerization occurs in the imaged areas. Examples of the reducing agent having such a function include hydroquinones.

In the above system (B) or (C),
It is necessary to add a polymerization initiator that decomposes to generate radicals by heating or light irradiation to any layer of the light-sensitive material. Regarding these systems, Japanese Patent Laid-Open Nos. 61-75342, 61-243449 and 62-62
-70836 and 62-81635, and U.S. Pat. No. 4,649,098 and EP Patent 0202.
No. 490 is described in each specification.

Regarding various reducing agents having the above functions,
JP-A-61-183640 and 61-188535.
No. 61-228441, JP-A-62-70836.
No. 62, No. 62-86354, No. 62-86355, No. 62-206540, No. 62-264041, No. 6
2-109437, 63-254442, JP-A-1-267536, 2-141756, 2-1.
No. 41757, No. 2-207254, No. 2-2626.
No. 62 and No. 2-269352 (including those described as a developer or a hydrazine derivative). For the reducing agent, see “The Theory” by T. James.
of the Photographic Process "4th Edition, 291-33
4 pages (1977), Research Disclosure, Vol. 170, No. 17029, pp. 9-15, (19
June 1978), and the same magazine, Vol.176, No.17643.
No. 22-31, (December 1978). Further, as in the light-sensitive material described in JP-A-62-210446, instead of the reducing agent, a reducing agent precursor capable of releasing the reducing agent under heating conditions or in a contact state with a base may be used. . The reducing agent and reducing agent precursor described in the above-mentioned publications and documents can be effectively used for the light-sensitive material in the present specification. Therefore, the "reducing agent" in the present specification includes the reducing agents and reducing agent precursors described in the above-mentioned publications, specifications and literatures.

Of these reducing agents, those having a basicity to form a salt with an acid can also be used in the form of a salt with an appropriate acid. These reducing agents may be used alone, or as described in each of the above publications, two or more reducing agents may be mixed and used. When two or more reducing agents are used in combination, the reducing agents interact as follows: first, to promote reduction of silver halide (and / or organic silver salt) by so-called superadditivity; Inducing polymerization of a polymerizable compound via a redox reaction with an oxidizing agent of a first reducing agent produced by reduction of silver halide (and / or organic silver salt) with another reducing agent coexisting with the reducing agent. (Or suppressing the polymerization) is considered. However, in actual use, it is difficult to specify which of the above actions because the above reactions can occur simultaneously.

The reducing agent is 0.10 per mol of silver halide.
It is used in the range of 1 to 10 mol, more preferably 0.
It is in the range of 5 to 5 mol.

[Polymerizable Compound] As the polymerizable compound in the present invention, a polymerizable monomer or a crosslinkable polymer can be used. The polymerizable monomer and the crosslinkable polymer may be used in combination.

Examples of the polymerizable monomer include compounds having addition polymerization or ring-opening polymerization. The compound having an addition polymerizable property includes a compound having an ethylenically unsaturated group, and the compound having a ring-opening polymerizable property includes a compound having an epoxy group. A compound having an ethylenically unsaturated group is particularly preferable.

Examples of the compound having an ethylenically unsaturated group include acrylic acid and its salts, acrylic acid esters, acrylamides, methacrylic acid and its salts, methacrylic acid esters, methacrylamides, maleic anhydride, maleic acid. Mention may be made of acid esters, itaconic acid esters, styrenes, vinyl ethers, vinyl esters, N-vinyl heterocycles, allyl ethers, allyl esters and derivatives thereof. Acrylic acid esters or methacrylic acid esters are preferred.

Specific examples of acrylic acid esters include:
n-butyl acrylate, cyclohexyl acrylate, 2-ethylhexyl acrylate, benzyl acrylate, furfuryl acrylate, ethoxyethoxyethyl acrylate, tricyclodecanyloxy acrylate, nonylphenyloxyethyl acrylate, 1,
3-dioxolane acrylate, hexanediol diacrylate, butanediol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, tricyclodecane dimethylol diacrylate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexa Acrylate, polyoxyethylenated bisphenol A diacrylate, 2- (2
-Hydroxy-1,1-dimethylethyl) -5-hydroxymethyl-5-ethyl-1,3-dioxane diacrylate, 2- (2-hydroxy-1,1-dimethylethyl) -5,5-dihydroxymethyl- Mention may be made of 1,3-dioxane triacrylate, triacrylate of propylene oxide adduct of trimethylolpropane, polyacrylate of hydroxypolyether, polyester acrylate and polyurethane acrylate.

Specific examples of methacrylic acid esters include methyl methacrylate, butyl methacrylate,
Ethylene glycol dimethacrylate, butanediol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate,
Mention may be made of pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate and dimethacrylate of polyoxyalkylenated bisphenol A.

The polymerizable monomer can also be used by selecting it from commercial products. As commercially available polymerizable monomers,
For example, Aronix M manufactured by Toagosei Kagaku Kogyo Co., Ltd.
-309, M-310, M-315, M-400, M-
6100, M-8030 and M-8100, manufactured by Nippon Kayaku Co., Ltd., Kayarad HX-220, HX-620,
R-551, TMPTA, D-330, DPHA, DP
CA-60, R604 and R684 are mentioned.

As the crosslinkable polymer, any known polymer having a radical-reactive group can be used. These polymers may be homopolymers or copolymers with monomers that do not have groups reactive with radical species. As such a polymer, a polymer having an ethylenically unsaturated double bond in the molecule, a polymer having a non-ethylenically unsaturated double bond in the molecule, a polymer having a polyoxyalkylene unit in the molecule, Examples thereof include polymers having a halogen atom. In addition to those having a polymerizable functional group in the polymer molecule, crosslinkable polymers generate radicals in the polymer by deelementalizing reactions such as dehalogenation or dehydrogenation, and these radicals are polymerizable compounds. It also includes the one that initiates the polymerization reaction of (2) and that the two generated polymer radicals are coupled to each other to crosslink the polymers.

The above functional group may be contained in the main chain of the polymer or may be contained in the side chain of the polymer. When these groups are contained in the side chain of the polymer, these groups may be introduced into the polymer by a polymer reaction,
After introducing these groups into the monomer in advance, the monomer may be polymerized or copolymerized to synthesize the polymer.

Further, a polymer having an ethylenically unsaturated double bond in its side chain, which is exemplified in JP-A 64-17047, can also be used. As the polymer having a functional group in the main chain or side chain, synthetic rubber (eg, polybutadiene, polyisoprene, styrene-butadiene copolymer, styrene-butadiene-acrylonitrile copolymer), natural rubber, polyethylene oxide, polypropylene oxide, Mention may be made of polyvinyl chloride (including copolymers), polyvinylidene chloride (including copolymers), polyvinyl acetate (including copolymers), chlorinated polyethylene, polyvinyl butyral, methyl cellulose, ethyl cellulose and butyl cellulose. These cross-linkable polymers are described in "Polymer Reaction" (Polymer Society of Japan, bias / Kyoritsu Shuppan, 1978), pages 147-19.
There is also a description on page 2.

When an alkaline solvent is used as the eluent, the crosslinkable polymer preferably has an acidic functional group in its molecule. Examples of acidic functional groups include carboxyl groups, acid anhydride groups, phenolic hydroxyl groups, sulfonic acid groups, sulfonamide groups and sulfonimide groups. When the binder is an addition polymer, a copolymer containing a monomer having a crosslinkable functional group and a monomer having an acidic functional group can be used. Specific examples of such a monomer include:
Acrylic acid, methacrylic acid, crotonic acid, maleic acid,
Mention may be made of phthalic acid, maleic anhydride, p-carboxystyrene, p-hydroxystyrene, p-hydroxylphenylacrylamide, hydroxylethylmethacrylate, hydroxylethylmethacrylamide and p-vinylbenzenesulfonic acid.

The above-mentioned polymerizable compounds may be used alone or in combination of two or more kinds. Regarding a light-sensitive material in which two or more kinds of polymerizable compounds are used in combination, JP-A-62-
It is described in Japanese Patent Publication No. 210445. The polymerizable compound is added to the photosensitive polymerizable layer (or the polymerizable layer) in an amount of 3 based on the total amount of the layer.
The content is preferably in the range of 90 to 90% by weight, more preferably in the range of 15 to 60% by weight.

[Base or Base Precursor] The light-sensitive material preferably contains a base or a base precursor.
As the base and the base precursor, inorganic bases and organic bases, or base precursors thereof (decarboxylation type, thermal decomposition type, reaction type, complex salt forming type, etc.) can be used.

Examples of inorganic bases are disclosed in JP-A-62-209448.
It is described in the official gazette. Examples of organic bases include tertiary amine compounds (described in JP-A-62-170954),
Bis, tris or tetraamidine compounds (described in JP-A-63-316760) and bis, tris or tetraguanidine compounds (JP-A-64)
No. -68746). In the present invention, a base having a pKa of 7 or higher is preferred.

In the present invention, a base precursor is preferable to a base from the viewpoint of storage stability of the light-sensitive material. Examples of preferred base precursors include salts of organic acids and bases that are decarboxylated by heating (described in JP-A-63-316760, 64-68746, 59-180537 and 61-313431) and A urea compound that releases a base upon heating (described in JP-A-63-96159) can be mentioned. In addition, as a method of releasing a base using a reaction, a transition metal acetylide,
Reaction with a salt containing an anion having an affinity higher than that of the acetylide anion for a transition metal ion (JP-A-63-25)
No. 208), or a basic metal compound that is poorly soluble in water and a compound capable of undergoing a complex formation reaction with water as a medium with respect to the metal ion that constitutes this basic metal compound, and these compounds are added in the presence of water. A method of releasing a base by a reaction between two compounds (described in JP-A-1-3282) can be mentioned.

As a base precursor, 50 ° C. to 20 ° C.
It preferably releases a base at 0 ° C.
It is more preferable that it releases a base at a temperature of from 160 ° C to 160 ° C. The base or base precursor is preferably used in an amount of 0.5 to 50 mol, and more preferably 1 to 20 mol, per mol of silver halide.

[Pigment] A pigment may be added to the light-sensitive material. As the pigment, commercially available pigments and known pigments described in various documents can be used. Regarding literature,
Color Index (CI) Handbook, "Latest Pigment Handbook" (edited by Japan Pigment Technology Association, 1977), "Latest Pigment Application Technology" (CMC Publishing, 1986), "Printing Ink Technology" (CMC Publishing, 1984). Annually) etc.

Examples of pigments include black pigments, yellow pigments, orange pigments, brown pigments, red pigments, purple pigments, blue pigments, green pigments, fluorescent pigments, metal powder pigments, and polymer-bonded dyes. Specifically, insoluble azo pigments, azo lake pigments, condensed azo pigments, chelate azo pigments, phthalocyanine pigments, anthraquinone pigments, perylene and perinone pigments, thioindigo pigments, quinacridone pigments, dioxazine pigments, isoindolinone pigments. , Quinophthalone pigment, dyed lake pigment,
Azine pigment, nitroso pigment, nitro pigment, natural pigment, fluorescent pigment, inorganic pigment and the like can be used.

The pigment used in the present invention may be used without being surface-treated, or may be used after being surface-treated. The surface treatment method includes a method of coating a surface of resin or wax, a method of attaching a surfactant, a method of binding a reactive substance (for example, a silane coupling agent, an epoxy compound, polyisocyanate, etc.) to the pigment surface. Conceivable. The above-mentioned surface treatment methods are described in "Properties and Applications of Metal Soap" (Koshobo), "Printing Ink Technology" (CMC Publishing, 1
984) and "Latest Pigment Application Technology" (CMC Publishing, 1986).

The amount of the pigment used significantly hinders the polymerization reaction in the photosensitive polymerizable layer (or the polymerizable layer), and the sensitivity or development of the silver halide contained in the photosensitive polymerizable layer (or the photosensitive layer). The upper limit is set so as not to significantly interfere with the reaction. The specific content should be the minimum amount necessary to give the required optical density. This depends on the light absorption characteristics and absorbance of each pigment. Generally content is preferably 0.01 to 2 g / m ^2, more preferably from 0.02 to 1 g / m ^2. Further, these pigments may be used in combination of two or more kinds.

[Support] As the material of the support of the light-sensitive material, any substance that is chemically and thermally stable can be arbitrarily used. It may be light-transmissive if necessary. Examples of the material of the support include polyolefins (eg polyethylene, polypropylene), polyvinyl halides (eg,
Polyvinyl chloride, polyvinylidene chloride), cellulose derivatives (eg, cellulose acetate, nitrocellulose,
Cellophane), polyamides, polystyrene, polycarbonate, polyimides, and polyesters.
Of these, preferred are polyethylene terephthalate, polycarbonate and heat-treated products thereof which are excellent in dimensional stability and transparency, and particularly preferred is biaxially stretched polyethylene terephthalate. In addition, these supports may be provided with a surface treatment such as corona treatment or ultraviolet irradiation, or may be provided with an undercoat layer.

[Binder of Photosensitive Polymerizable Layer] In order to improve the film strength of the photosensitive polymerizable layer (in the case where the photosensitive layer and the polymerizable layer are separated), a binder may be added. it can. As the binder, natural and synthetic polymer compounds can be used. As the synthetic polymer, homopolymers and copolymers of various vinyl monomers can be used among addition polymerization type synthetic polymers such as polystyrene, acrylic resin and methacrylic resin. Also, polycondensation type synthetic polymers and copolymers such as polyester, polyamide, polyurethane and polyester-polyamide can be used.

When an alkaline solvent is used as the eluent, the binder preferably has an acidic functional group in its molecule. Examples of acidic functional groups include:
Examples thereof include a carboxyl group, an acid anhydride group, a hydroxyl group, a phenolic hydroxyl group, a sulfonic acid group, a sulfonamide group and a sulfonimide group. When the binder is an addition polymer, a homopolymer or copolymer containing a vinyl-polymerizable monomer having an acidic functional group can be used. Specific examples of such a monomer include:
Acrylic acid, methacrylic acid, crotonic acid, maleic acid,
Mention may be made of phthalic acid, maleic anhydride, p-carboxystyrene, p-hydroxystyrene, p-hydroxylphenylacrylamide, hydroxylethylmethacrylate, hydroxylethylmethacrylamide and p-vinylbenzenesulfonic acid. The amount of the binder added to the polymerizable layer is not particularly limited as long as it does not interfere with the curing reaction of the polymerizable layer, but is 0 to 80% by weight, preferably 0 to 70% by weight based on the entire polymerizable layer.

[Polymerization Inhibitor] In the case of a photosensitive material in which the photosensitive polymerizable layer is separated into a photosensitive layer and a polymerizable layer, a polymerization inhibitor should be added to the polymerizable layer in order to prevent a dark polymerization reaction. You can As the polymerization inhibitor for this purpose, any conventionally known polymerization inhibitor can be used. Examples of the polymerization inhibitor include nitrosamine compounds, thiourea compounds,
Mention may be made of thioamide compounds, urea compounds, phenol derivatives, nitrobenzene derivatives and amine compounds. More specifically, cuperone Al salt, N-nitrosodiphenylamine, allylthiourea, arylphosphite, p-toluidine, φ-tortinone, nitrobenzene, pyridine, phenathiazine, β-naphthol, naphthylamine, t-butylcatechol, phenothiazine, chloranil. , P-methoxyphenol, pyrogallol, hydroquinone, and alkyl- or aryl-substituted hydroquinone.

[Organic Metal Salt] An organic metal salt may be added to the photosensitive polymerizable layer (or photosensitive layer) together with the silver halide. The organic silver salt is considered to participate in the redox reaction catalyzed by the latent image of silver halide when heated,
As a result, effects such as promoting image formation are recognized.
The organic silver salt is described in "Basics of photographic optics, non-silver salt edition" (page 247) such as organic acid silver salts and triazole-based silver salts and JP-A Nos. 59-55429 and 62-3246. Organic silver salts can be used. Specifically, an aliphatic carboxylic acid, an aromatic carboxylic acid, a thiocarbonyl group compound having a mercapto group or α-hydrogen,
A silver salt of an acetylene compound and an imino group-containing compound.

As the aliphatic carboxylic acid, acetic acid, butyric acid,
Mention may be made of succinic acid, sebacic acid, adipic acid, oleic acid, linoleic acid, linolenic acid, tartaric acid, palmitic acid, stearic acid, behenic acid and camphoric acid. Generally, the smaller the number of carbon atoms, the more unstable the silver salt is, and therefore a salt having an appropriate number of carbon atoms is preferable. Examples of aromatic carboxylic acids include benzoic acid derivatives, quinolinic acid derivatives, naphthalenecarboxylic acid derivatives, salicylic acid derivatives, gallic acid, tannic acid, phthalic acid, phenylacetic acid derivatives and pyromellitic acid. Mercapto group or α
-As the thiocarbonyl group compound having hydrogen, 3-
Mercapto-4-phenyl-1,2,4-triazole, 2-mercaptobenzimidazole, 2-mercapto-5-aminothiadiazole, 2-mercaptobenzothiazole, s-alkylthioglycolic acid (alkyl group having 12 to 22 carbon atoms) , Dithiocarboxylic acids (eg, dithioacetic acid), thioamides (eg, thiostearoamide), 5-carboxy-1-methyl-2-phenyl-4
Mention may be made of -thiopyridine, mercaptotriazine, 2-mercaptobenzoxazole, mercaptooxadiazole and 3-amino-5-benzylthio-1,2,4-triazole. US Patent 41232
The mercapto compounds described in No. 74 can also be used.

Examples of the compound containing an imino group include benzotriazole and its derivative, 1,2,4-triazole, 1H-tetrazole, carbazole, saccharin, imidazole and its derivative. For benzotriazole and its derivatives,
It is described in JP-B-44-30270 and JP-B-45-18416. Examples of benzotriazole and its derivatives include benzotriazole, alkyl-substituted benzotriazoles (eg, methylbenzotriazole), halogen-substituted benzotriazoles (eg, 5-chlorobenzotriazole), carboximidobenzotriazoles (eg, butyl). Carboximidobenzotriazole), nitrobenzotriazoles (JP-A-58-11)
8639), sulfobenzotriazole (described in JP-A-58-15638), carboxybenzotriazole and salts thereof, and hydroxybenzotriazole. 1,2,4-triazole and 1H-tetrazole are described in US Pat. No. 4,220,709.

In some cases, the same effect may be obtained by adding an organic compound constituting the organic silver salt to the photosensitive layer instead of the organic silver salt. Two or more kinds of organic silver salts may be used in combination. The above organic silver salt is 0 to 10 per mol of silver halide.
Molar, preferably 0 to 1 mol is used. The total coating amount of silver halide and organic silver salt is 1 mg in terms of silver in the photosensitive layer.
The range of ˜5 g / m ² , preferably 10 mg to 0.5 g / m ² is suitable.

[Binder of photosensitive layer] In the case of a photosensitive material in which a photosensitive polymerizable layer is separated into a photosensitive layer and a polymerizable layer, the binder used in the photosensitive layer remarkably impairs the characteristics of the photosensitive layer. Any binder can be used as long as it does not exist. However, since the photosensitive layer contains silver halide, it is preferable to use a hydrophilic binder.
The hydrophilic binder is a binder having a hydrophilic group or / and a bond in the molecular structure. Examples of hydrophilic groups include carboxyl groups, alcoholic hydroxyl groups, phenolic hydroxyl groups, sulfonic acid groups, sulfonamide groups,
Mention may be made of sulfonimide groups and amide groups. Examples of hydrophilic bonds include urethane bonds, ether bonds and amide bonds. It is preferable to use a water-soluble polymer and / or a water-swellable polymer as the hydrophilic binder polymer. The water-swellable polymer is a polymer that has an affinity for water but is not completely soluble in water because the binder itself has a crosslinked structure and the like.

As the water-soluble or water-swellable binder, a natural or synthetic polymer compound can be used.
Examples of natural polymers include water-soluble polysaccharides (eg, starch derivatives, cellulose derivatives, alginic acid, pectic acid, gum arabic, pullulan, dextran) and proteins (eg, casein, gelatin).
These may be artificially modified if necessary. It can also be used after being modified or crosslinked during coating and drying. As the synthetic polymer, a polymer of a water-soluble monomer or a copolymer of this and another monomer can be used. Examples of the water-soluble monomer in this case include a monomer having a chemical structure such as a carboxyl group, an acid anhydride group, a hydroxyl group, a sulfonic acid (salt) group, an amide group, an amino group, and an ether group. Regarding such monomers, "Applications and Markets of Water-soluble Polymers" (CMC 16-1
See page 8). Copolymers obtained by polymerizing these monomers or crosslinking polymers obtained by copolymerizing these monomers with other monomers can also be used (for example,
Copolymers described in U.S. Pat. No. 4,913,998).

As other synthetic polymers, polyvinyl alcohol, polyvinyl ether, polyvinylpyrrolidone, polyethylene oxide and derivatives or modified products thereof can be used. For example, in the case of polyvinyl alcohol, those having various degrees of saponification can be used. Further, copolymer modified polyvinyl alcohol can also be used. The copolymerization modification is a method in which a copolymer of vinyl acetate and another monomer is saponified to obtain modified polyvinyl alcohol. As the monomer to be copolymerized, any monomer can be used as long as it is copolymerized with vinyl acetate. Examples of copolymerizable monomers include ethylene, higher vinyl carboxylates, higher alkyl vinyl ethers, methyl methacrylate and acrylamide.

Post-modified polyvinyl alcohol can also be used. The post-modification is a method in which a compound having reactivity with a hydroxyl group of polyvinyl alcohol is modified by a polymer reaction. Specifically, the hydroxyl group is etherified,
Modifications such as esterification and acetalization. Furthermore, it is also possible to use crosslinked polyvinyl alcohol. In this case, an aldehyde as a cross-linking agent, a methylol compound, an epoxy compound, a diisocyanate, a divinyl compound, a dicarboxylic acid or an inorganic cross-linking agent (eg, boric acid,
Polyvinyl alcohol is crosslinked using titanium, copper). Regarding these modified polyvinyl alcohol and cross-linked polyvinyl alcohol, "Poval", 3rd edition,
It is exemplified in the Society of Polymer Publishing (pp. 281-285 and 256-260). The molecular weight of these hydrophilic polymers is 300
The range of 0 to 500,000 is preferable. The coating amount is 0.05-2
0 g / m ^2, more preferably in the range of 0.1 to 10 g / m ^2.

Oxygen that has penetrated into the polymerizable layer during heat development inhibits radical polymerization or crosslinking. Therefore, the photosensitive layer preferably has a function of preventing the influence of oxygen in the air on the polymerizable layer. For this function, the hydrophilic binder needs to be a substance having a low oxygen permeability, and the oxygen permeability coefficient thereof is 1.0 ×.
It is preferably 10 ⁻¹¹ cc · cm / cm ² · sec · cm · Hg or less. As the polymer having low oxygen permeability, a polyvinyl alcohol polymer, a copolymer of gelatin and vinylidene chloride is preferable. Here, the polyvinyl alcohol polymer means polyvinyl alcohol and modified polyvinyl alcohol (for example, saponified block copolymer of polyvinyl acetate and another monomer). The molecular weight is not particularly limited, but is preferably in the range of about 3000 to 500,000. As a polymer with low oxygen permeability, saponification degree is 5
0% or more, more preferably 80% or more, even more preferably 95% or more polyvinyl alcohol is particularly preferable.

[Heat Development Accelerator] The light-sensitive material may contain a heat development accelerator in any layer in order to accelerate heat development and to carry out heat development processing in a shorter time. It is not clear why the heat development accelerator has the above-mentioned action, but whether the heat development accelerator gives a plasticizing effect to the binder of the light-sensitive material or gives a plasticizing effect to the binder at the time of heating, By fusing in the layer, it promotes the movement or diffusion of substances that contribute to the reaction in each layer within the layer, and as a result, various reactions (decomposition of base precursor, reduction of silver halide) occurring during thermal development in the light-sensitive material. ,
It is considered that either the polymerization or the curing reaction) is promoted.

As the above-mentioned thermal development accelerator, a compound having a plasticizing action at room temperature or at the time of heating with respect to the binder used in any layer of the light-sensitive material, or a compound having no plasticizing action but being melted in the layer by heating. Any compound that can be used can be used. As the compound having a plasticizing effect on the binder used in any layer of the light-sensitive material at room temperature or at the time of heating, all known compounds known as plasticizers for polymer compounds can be used. Examples of such plasticizers include "Plastics Additives, 2nd Edition", "Plastic Additives", Taiseisha, P21-63; "Plastics Additives, 2nd Edition".
er Publishers, Chap.5 P251-296; "Thermoplastics Additives" Ma
rcel Dekker Inc. Chap. 9 P345-379; “Plastik
Additives Ann Industrial Guide "
(Plastics Additives An Industrial Guide) Noyes Pu
blications, Section-14 P333-485; "The Technology of Solvents and Plasticizers"
) John Wiley & Sons Inc. Chap. 15 P903-1027);
"Industrial Plasticizers" (Indust
rial Plasticizers, Pergamon Press); "Plasticizer Technology Volume 1" (Plasticizer Techno)
logy Vol.1, Reinhold Publishing Corp.); "Plasticization and Plusticizer Process,"
The plasticizers described in American Chemistry) can be used.

As the compound which can be melted in the layer by heating, polar substances described in US Pat. No. 3,347,675; Research Disclosure, 1976.
1,10-decanediol, methyl anisate, and biphenyl suberate described in December 26, pp. 26-28;
Sulfonamide derivatives, polyethylene glycol derivatives, cyclic amide compounds described in JP-A-62-151841, JP-A-62-151843 and JP-A-62-183450; JP-A-63-143835 and 63-63.
Compounds having an aromatic ring described in JP-B-59-25674, JP-A-59-101392, JP-A-59-82382 and JP-A-62-25085; Sho 61-28359
No. 2, No. 63-15784, No. 64-1583, No. 57-146688, No. 58-104793, No. 5
8-205795, 62-142686, 62
Compounds having an ester or amide group described in JP-A-144990 and JP-A-62-132675; JP-A-58-57989, JP-A-58-72499, and JP-A-58-57499;
-87094, 60-29587, 60-56.
No. 588, No. 60-123581, No. 60-1688.
No. 8, No. 61-242884, No. 61-31287
Nos. 61-27285 and 61-31287, each having a compound having an ether or thioether structure; JP-A-60-34892 and 61-112.
No. 689, No. 61-116584, No. 61-1514
Nos. 78 and 62-267186, ketones, carbonates, sulfoxides, and phosphate compounds; and JP-A-59-159393 and 63-15.
The compounds having a phenolic hydroxyl group described in Japanese Patent Nos. 783 and 63-249686 can also be used.

Preferred thermal development accelerators are glycols (eg, diethylene glycol, dipolypropylene glycol), polyhydric alcohols (eg, glycerin, butanediol, hexanediol), sugars, formate esters, ureas (eg, urea). , Diethylurea, ethyleneurea,
Propylene urea), urea resin, phenol resin, amide compound (eg, acetamide, propionamide), sulfamides and sulfonamides. Further, two or more of the above thermal development accelerators can be used in combination. It is also possible to add it by dividing it into two or more layers. The addition amount of the thermal development accelerator is optional as long as the characteristics of the light-sensitive material are not significantly impaired, but preferably 0 to ² g / m ^{2 and} more preferably 0 to 1 g.
/ M ² .

[Other Additives] Other additives include an antifoggant for preventing fogging, a silver development accelerator for promoting silver development, a development stopper for stopping development at an appropriate timing, and good coating. Examples thereof include a surfactant for obtaining a surface and a dispersibility stabilizer for improving the dispersion stability of the dispersion.

At least one layer may contain an antifoggant for preventing fogging, a silver development accelerator for promoting silver development, and a stabilizer. These examples will be described below, but it is difficult to make a clear distinction because these additives may simultaneously exhibit the above-mentioned two or more functions by the action of one compound. Examples thereof include compounds having a cyclic amide structure described in JP-A-61-151841, thioether compounds described in JP-A-62-151842, and JP-A-62-151843.
Polyethylene glycol derivatives described in Japanese Patent Laid-Open Publication No. Sho 6
No. 2-151844, acetylene compounds described in JP-A No. 62-178232, sulfonamide derivatives described in JP-A No. 62-183450, and Research Disclosure No. 1
7643, pages 24 to 25 (1978), JP-A-5
9-168442, 59-116636, 62
Examples thereof include compounds described in JP-A-87957 and JP-A-62-151838. The amount of these compounds used is in the range of 10 ^-7 to 1 mol per mol of silver halide.

Various development stoppers can be used for the purpose of always obtaining a constant image with respect to the processing temperature and the processing time during heat development. The term "development terminating agent" as used herein refers to a compound that immediately neutralizes or reacts with a base to reduce the concentration of the base in the layer to stop development after proper development, or inhibits development by interacting with silver and a silver salt. It is a compound that causes. Specific examples thereof include an acid precursor that releases an acid when heated, an electrophilic compound that causes a substitution reaction with a coexisting base when heated, or a nitrogen-containing heterocyclic compound, a mercapto compound and a precursor thereof. Regarding the heat development stopper, see JP-A-62-253159, pages 31 to 32,
And JP-A-2-42447 and JP-A-2-26266.
There is a description in each publication of No. 1.

[Polymerization Initiator] A reducing agent used in a light-sensitive material or an oxidant of the reducing agent produced when the reducing agent reduces silver halide is a compound having a function of suppressing polymerization of a curable compound. In this case, it is necessary to add a polymerization initiator that generates radicals by heating or light irradiation to at least one layer of the light-sensitive material. As these thermal polymerization initiators or photopolymerization initiators, conventionally known ones can be used. When a photopolymerization initiator is used, it is necessary to irradiate the entire surface with light after thermal development.

The thermal polymerization initiator is, for example, “Addition Polymerization / Ring-Opening Polymerization” (19)
1983, Kyoritsu Shuppan), pages 6-18.
Specific examples of the thermal polymerization initiator include azobisisobutyronitrile, 1,1′-azobis (1-cyclohexanecarbonitrile), dimethyl-2,2′-azobisisobutyrate and 2,2′-azobis. Organic compounds such as azo compounds such as (2-methylbutyronitrile) and azobisdimethylvaleronitrile, benzoyl peroxide, di-t-butyl peroxide, dicumyl peroxide, t-butyl hydroperoxide, cumene hydroperoxide, etc. Inorganic peroxides such as peroxides, hydrogen peroxide, potassium persulfate and ammonium persulfate, sodium p-toluenesulfinate and the like can be mentioned.

The photopolymerization initiator is described, for example, in Oster et al., “Ch
Emical Review "Vol. 68 (1968) 125-1
Page 51 and "Light-Sensitive System" by Kosar (Jo
hn Wiley & Sons, 1965, pp. 158-193, carbonyl compounds (eg, α-alkoxyphenyl ketones, polycyclic quinones, benzophenone derivatives, xanthones, thioxanthones, benzoins). ), Halogen-containing compounds (eg, chlorosulfonyl and chloromethyl polynuclear aromatic compounds, chlorosulfonyl and chloromethyl heterocyclic compounds, chlorosulfonyl and chloromethylbenzophenones, fluorenones), haloalkanes, α-halo-α-phenylacetophenone , Redox couples of photoreducible dyes and reducing agents, organic sulfur compounds, peroxides, optical semiconductors (eg titanium dioxide, zinc oxide), metal compounds (eg iron (I))
Salts, metal carbonyls, metal complexes, uranyl salts), silver halides, azo and diazo compounds, etc. are used.
Specific examples of the photopolymerization initiator include 2-dimethoxy-2-
Phenylacetophenone, 2-methyl- {4- (methylthio) phenyl} -2-morpholino-1-propanone,
Benzoin butyl ether, benzoin isopropyl ether, benzophenone, Michler's ketone, 4,4 '
-Diethylaminobenzophenone, chloromethylbenzophenone, chlorosulfonylbenzophenone, 9,10
-Anthraquinone, 2-methyl-9,10-anthraquinone, chlorosulfonylanthraquinone, chloromethylanthraquinone, 9,10-phenanthrenequinone, xanthone, chloroxanthone, thioxanthone, chlorothioxanthone, 2,4-diethylthioxanthone , Chlorosulfonylthioxanthone, chloromethylbenzothiazole, chlorosulfonylbenzoxazole, chloromethylquinoline, fluorene and carbon tetrabromide.

Examples of photoreducible dyes include methylene blue, thionine, rose bengal, erythrosine-
β, eosin, rhodamine, phloxine-β, safranine, acriflavine, riboflavin, fluorescein, uranine, benzoflavin, acridine orange,
Acridine yellow and benzanthrone can be mentioned. Examples of the reducing agent (hydrogen-donating compound) used with the photoreducible dye include β-diketones such as dimedone and acetylacetone, triethanolamine, diethanolamine, monoethanolamine, diethylamine, amines such as triethylamine, p-toluene. Examples thereof include sulfinic acid such as sulfinic acid and benzenesulfinic acid and salts thereof, N-phenylglycine, L-ascorbic acid and salts thereof, thiourea and allylthiourea. The molar ratio of the photoreducible dye and the reducing agent is
The range of 1: 0.1 to 1:10 is preferable. As the photopolymerization initiator, commercially available photopolymerization initiators such as “Irgacure-651 and Irgacure-907” manufactured by Ciba-Geigy are also preferably used. The polymerization initiator is 0.00 per 1 g of the curable compound.
It is preferably used in the range of 1 to 0.5 g, and more preferably 0.01 to 0.2 g.

[Image formation promoting layer] In addition to the photosensitive polymerizable layer, an image forming promoting layer may be provided on the photosensitive material. The image formation promoting layer is a layer containing components involved in image formation, such as a reducing agent, a thermal development accelerator, a base or a base precursor. The image formation promoting layer is similar to the photosensitive polymerizable layer,
It can be provided by coating and drying a coating liquid containing each component. The layer thickness of the image formation promoting layer is 0.3 to 20 μm.
The thickness is preferably m, and more preferably 1 to 10 μm.

[Optionally provided layer] An additional layer can be provided at any part of the light-sensitive material. For example, an overcoat layer (or a cover film layer) for protecting the surface or preventing polymerization due to oxygen in the air, a back layer for preventing halation, and preventing adhesion when the photosensitive materials are stacked and stored. If necessary, an intermediate layer or the like for improving the adhesion or peeling property between layers or preventing halation can be provided. Further, when performing transfer to the image receiving material or laminating with the image receiving material, in order to prevent bubbles from being unable to adhere uniformly due to inclusion of a matting agent in the layer in contact with these image receiving materials, A new layer containing a matting agent may be provided. As the matting agent in this case, a conventionally known matting agent can be used. The matting agent may be incorporated in the image receiving material.

When the light-sensitive material has an overcoat layer, the overcoat layer can be previously formed as a layer containing an arbitrary polymer by coating. Further, it may be formed by laminating any polymer film. Further, it may be formed by laminating an arbitrary polymer film immediately before image formation. There is no particular limitation on the material of the polymer used for these overcoat layers. For example, a hydrophilic binder polymer that can be added to the photosensitive layer can be used. Of these, various polyvinyl alcohols are particularly preferably used. When it is desired to impart a function of reducing oxygen permeation to the overcoat layer, polyvinyl alcohol having a saponification degree of 85% or more is selected from polyvinyl alcohols.
When it is desired to impart higher oxygen impermeability, it is preferable to use polyvinyl alcohol having a saponification degree of 95% or more. When these overcoat layers are used as a protective layer, it is also possible to peel off the overcoat layer immediately before using the photosensitive material and laminate the photosensitive material on the image receiving material. The overcoat layer is 1
The number of layers is not limited to two, and two or more layers may be laminated and installed.

An adhesive layer may be provided on the light-sensitive material. As an example of the adhesive layer, a conventionally known arbitrary polymer, a mixed layer of a compound exemplified as a substance having a plasticizing effect among heat development accelerators, or a conventionally known arbitrary polymer, Mixing layer with an oligomer of any conventionally known polymer,
Alternatively, a layer containing an elastomeric polymer having a second-order transition temperature of −10 ° C. or lower can be mentioned. In the last example, the polymer alone can provide the necessary properties, which is advantageous, but the polymer may be used as a mixed layer in which a plasticizer, an oligomer and the like are further added. Specific examples of the polymer used in the adhesive layer include natural rubber and synthetic rubber. Examples of synthetic rubber include isobutylene, nitrile rubber, butyl rubber, chlorinated rubber, polyvinyl isobutyl ether, silicone elastomer, neoprene and copolymer rubber (eg, styrene-butadiene copolymer, styrene-isobutylene copolymer). You can When the polymer is a copolymer, it may be a random, block or graft copolymer. The film thickness of the adhesive layer is 0.0
1 μm to 10 μm is preferable, and 0.05 μm to 5 μm is more preferable.

A peeling layer may be provided on the light-sensitive material in order to facilitate the transfer of an image. The peeling layer is easy to peel from the support and is non-tacky at room temperature, but exhibits tackiness or fusion property when heated. The release layer contains an organic polymer such as polyvinyl acetal resin as a matrix. The flow softening point of the polymer used as the matrix is preferably equal to or higher than the heating temperature required for the reduction reaction of the reducing agent. The release layer preferably further contains 1% by weight or more of a fluorine-containing compound. As the fluorine-containing compound, a fluorine-containing surfactant can be preferably used. The thickness of the release layer is preferably 1.0 μm or more.
It is more preferably 4 μm or more.

[0093]

【Example】

[Example 1] Each layer was provided on a polyethylene terephthalate film (support) in the following manner to prepare a photothermographic material.

"Release layer" A coating solution for forming a release layer having the following composition was prepared on a biaxially stretched polyethylene terephthalate film having a thickness of 100 µm to give a dry film thickness of 1.5 µm.
Was applied and dried to form a release layer.

──────────────────────────────────── Release Layer Coating Solution ────── ────────────────────────────── Polyvinyl butyral (Denka Butyral 5000-A, manufactured by Denki Kagaku Kogyo Co., Ltd.) 3.75 g Surfactant (MegaFac F177P, manufactured by Dainippon Ink and Chemicals, Inc.) 0.07 g Methanol 37.50 g n-Propanol 37.50 g ────────────────────── ───────────────

[Preparation of Pigment Dispersion] A liquid having the following composition was dispersed in a Dynomill disperser at 2000 rpm for 30 minutes to prepare a pigment dispersion having an average particle size of 0.2 μm.

──────────────────────────────────── Pigment dispersion ──────── ──────────────────────────── Pigment: Chromophthal red A2B 30g Binder: Allyl methacrylate / methacrylic acid copolymer (copolymerization ratio = 83/17) 50g Solvent: Cyclohexanone 30g Propylene glycol monomethyl ether 300g ─────────────────────────────────────

[Formation of Polymerizable Layer] The following coating liquid was applied onto the release layer and dried to form a polymerizable layer having a thickness of 1.3 μm.

──────────────────────────────────── Polymerizable layer coating liquid ────── ────────────────────────────── Dipentaerythritol hexaacrylate 5.0g Allyl methacrylate / methacrylic acid copolymer (copolymerization ratio = 80/20) 20% by weight 10.0 g The above pigment dispersion 40.0 g The following reducing agent 1.0 g Methyl ethyl ketone 30.0 g ──────────────────── ─────────────────

[0100]

[Chemical 1]

[Preparation of Silver Halide Emulsion] After adding an appropriate amount of ammonium to a container which was heated to 55 ° C. and containing gelatin, potassium bromide and water, the pAg value in the reaction container was maintained at 7.60. On the other hand, an aqueous solution of silver nitrate and an aqueous solution of potassium bromide to which hexachloroiridium (III) acid salt was added so that the molar ratio of iridium to silver was 10 ^-7 mol were added by the double jet method to obtain an average particle size of 0.
A 3 μm monodisperse silver bromide emulsion was prepared. These emulsion grains have a total grain size of 98% within ± 40% of the average grain size.
% Was present. Then, this emulsion was desalted and then p
After adjusting H to 6.2 and pAg to 8.7, gold sulfur sensitization was performed with sodium thiosulfate and chloroauric acid, and then the following spectral sensitizing dye field methanol solution (concentration: 2.0
200 cc was added to 1 kg of the emulsion, and the mixture was stirred at 60 ° C. for 15 minutes to prepare a silver halide emulsion.

[0102]

[Chemical 2]

[Formation of Photosensitive Layer] The following coating solution was prepared, coated on the above-mentioned polymerizable layer and dried to form a photosensitive layer having a dry film thickness of about 4.0 μm.

──────────────────────────────────── Photosensitive layer coating liquid ────── ────────────────────────────── Polyvinyl alcohol with a saponification degree of 88% (trade name: PVA-205, Kuraray Co., Ltd.) 10% by weight aqueous solution 13.2 g of the following additive (1) in 0.13% by weight methanol solution 0.54 g of the following additive (2) in 0.22% by weight methanol solution 0.54 g Silver emulsion 0.37 g Light absorber below 60 mg 5% by weight aqueous solution of the following surfactant 1.8 g Water 1.9 g ─────────────────────── ──────────────

[0105]

[Chemical 3]

[0106]

[Chemical 4]

[0107]

[Chemical 5]

[0108]

[Chemical 6]

[Preparation of Base Precursor Dispersion] 250 g of a powder of the following base precursor was dissolved in a 3% by weight polyvinyl alcohol aqueous solution using a Dynomill disperser.
Dispersed in 0 g. The particle size of the base precursor was about 0.5 μm or less.

[0110]

[Chemical 7]

[Formation of Overcoat Layer] The following coating solution was prepared, coated on the photosensitive layer and dried to form an overcoat layer having a dry film thickness of about 3.3 μm.

──────────────────────────────────── Overcoat layer coating liquid ────── ────────────────────────────── Polyvinyl alcohol with a saponification degree of 98.5% (trade name: PVA-205, Kuraray ( 10% by weight aqueous solution 200.0 g of the above base precursor dispersion 1.25 g 5% by weight aqueous solution of the above surfactant 4.0 g ───────────────── ────────────────────

(Image formation) Using the photothermographic material prepared as described above, an image was formed as follows.
Using an air-cooled argon ion laser as a light source, 488n
Scanning exposure with exposure wavelength of m (exposure on film surface: 3 μJ
/ Cm ² ) and imagewise exposed. Next, a nylon mesh (NXX25 manufactured by NBC Kogyo Co., Ltd.) having a thickness of 70 μm is sandwiched between the surface of the photosensitive material (overcoat layer side), and a back surface of the photosensitive material is applied while applying a polyethylene terephthalate film having a thickness of 75 μm as a sheet. A hot plate heated to 140 ° C. was pressed against (support side) to heat. This reduced the silver halide and simultaneously cured the polymerizable layer. After removing the photosensitive layer and the overcoat layer by washing with water, the polymerizable layer was immersed in an alkaline aqueous solution (DN-3C manufactured by Fuji Photo Film Co., Ltd. diluted with 1/3 with water) for 30 seconds and washed with water. , Dried at room temperature,
A sample having a cured image formed on the release layer was prepared.

[Comparative Example 1] Using the same photothermographic material as in Example 1, imagewise exposure was carried out by an argon ion laser in the same manner as in Example 1, and then heat development was carried out in the same manner except that the nylon mesh was not sandwiched. Further, the same treatment as in Example 1 was carried out to prepare a sample in which a cured image was formed on the release layer.

[Comparative Example 2] Using the same photothermographic material as in Example 1, imagewise exposure was carried out by an argon ion laser in the same manner as in Example 1, then nylon mesh was not sandwiched and polyethylene terephthalate film was also used as a sheet. Without heat-development, the surface of the light-sensitive material was heat-developed and further processed in the same manner as in Example 1 to prepare a sample having a cured image formed on the release layer.

(Evaluation of Image) Fogging and image strength of the cured image prepared as described above were visually evaluated. Fog was not observed in the image prepared in Example 1, and the image strength was sufficient. Moreover, the polyethylene terephthalate film used as the sheet was not contaminated and could be used repeatedly. Further, since the nylon mesh is in point contact with the surface of the photosensitive material, stains are unlikely to occur and it can be used 100 times or more. In the image created in Comparative Example 1, fog was partially generated in the non-image area (uncured area), and a good image was not obtained. Also, the polyethylene terephthalate film used as a sheet comes into contact with the photosensitive material at the surface,
The overcoat layer of the light-sensitive material adhered after only a few uses, and it could not be used any more. The image created in Comparative Example 2 had poor strength and was difficult to use as an image.

[Example 2] Using the same photothermographic material as in Example 1, imagewise exposure was carried out with an argon ion laser in the same manner as in Example 1, sandwiched with nylon mesh, and a sheet of polyethylene terephthalate having a thickness of 75 µm. The film was applied, and a hot plate heated to 140 ° C. was pressed against the sheet to heat it. Further, the same processing as in Example 1 is performed,
A sample having a cured image formed on the release layer was prepared. Similar to the sample of Example 1, the obtained sample had no fog and the image strength was sufficient. Moreover, the polyethylene terephthalate film used as the sheet was not contaminated and could be used repeatedly. In addition, nylon mesh is less likely to get dirty, and 1
It could be used more than 00 times.

[Example 3] Using the same photothermographic material as in Example 1, imagewise exposure was carried out with an argon ion laser in the same manner as in Example 1, then a nylon mesh was sandwiched and the heating surface of a ceramic heater was pressed. It was heated with a heater. Further, the same treatment as in Example 1 was carried out to prepare a sample in which a cured image was formed on the release layer. Similar to the sample of Example 1, the obtained sample had no fog and the image strength was sufficient. Moreover, the ceramic heater was not soiled and could be used repeatedly.

Example 4 Each layer was provided on an aluminum support to prepare a photothermographic material in the following manner.

"Preparation of Aluminum Support" Thickness 0.3
The surface of a 0 mm aluminum plate was grained with a nylon brush and an aqueous suspension of pumicetone (400 mesh), and then thoroughly washed with water. Next, it was immersed in a 10% aqueous sodium hydroxide solution at 70 ° C. for 60 seconds for etching, and then washed with running water. It was neutralized and washed with a 20% nitric acid aqueous solution, and then washed with water. The obtained aluminum plate,
Alternating sine wave current (condition: voltage at anode 12.7v,
Electrolytic surface roughening treatment was performed in a 1% nitric acid aqueous solution using a ratio of the amount of electricity at the cathode to the amount of electricity at the anode of 0.8 and the amount of electricity at the anode of 160 coulomb / dm ² . The surface roughness of the obtained plate was 0.6 μm (Ra indication). Following this treatment, it was desmutted in a 30% aqueous sulfuric acid solution at 55 ° C. for 2 minutes. Next, anodic oxidation treatment was performed in a 20% sulfuric acid aqueous solution so that the thickness was 2.7 g / dm ² (current density 2 A / dm ² ). The obtained aluminum plate was immersed in a 3 wt% sodium silicate aqueous solution at 70 ° C. for 20 seconds, washed with water, and dried.

[Formation of Polymerizable Layer] The following coating solution was applied onto the above support and dried to form a polymerizable layer having a thickness of 1.3 μm.

──────────────────────────────────── Polymeric Layer Coating Liquid ────── ────────────────────────────── Dipentaerythritol hexaacrylate 2.5g Allyl methacrylate / methacrylic acid copolymer (copolymerization ratio = 83/17) 20% by weight propylene glycol monomethyl ether solution 37.5 g Reducing agent used in Example 1 2.0 g Pigment dispersion used in Example 1 13.0 g Methyl ethyl ketone 74.0 g ─────── ──────────────────────────────

[Preparation of Silver Halide Emulsion] After adding an appropriate amount of ammonium to a container which was heated to 55 ° C. and containing gelatin, potassium bromide and water, the pAg value in the reaction container was maintained at 7.60. On the other hand, an aqueous solution of silver nitrate and an aqueous solution of potassium bromide to which hexachloroiridium (III) salt was added so that the molar ratio of iridium to silver was 10 ^-7 mol were added by the double jet method to give an average particle size of 0.
A 3 μm monodisperse silver bromide emulsion was prepared. Next, the pH of this emulsion was adjusted to 6.2 and the pAg was adjusted to 8.7, and then gold sulfur sensitization was carried out with sodium thiosulfate and chloroauric acid. Then, the spectral sensitizing dye used in Example 1 was added. Then 5
Keep at 5 ℃ for 20 minutes, and further average particle size 0.08μ
m post-ripening silver iodide emulsion was added and stirred for 15 minutes, then desalted and cooled. The silver iodide content is 2 mol%, 98% of the total number of grains is within ± 40% of the average grain size,
Moreover, the (100) plane / (111) plane ratio was about 10. Thus, a silver halide emulsion Em-1 was prepared.

[Formation of Photosensitive Layer] The following coating liquid was prepared, coated on the polymerizable layer and dried to form a photosensitive layer having a dry film thickness of about 1.2 μm.

──────────────────────────────────── Photosensitive layer coating liquid ────── ────────────────────────────── Polyvinyl alcohol with a saponification degree of 79.5% (trade name: PVA-420, Kuraray ( Co., Ltd.) 10 wt% aqueous solution 10.5 g 0.11 wt% methanol solution of the following additive (3) 0.83 g The above silver halide emulsion (Em-1) 0.5 g Used in Example 1. 5% by weight aqueous solution of surfactant 0.4 g water 7.8 g ──────────────────────────────────── ─

[0126]

[Chemical 8]

[Preparation of Base Precursor Dispersion] 250 g of the powder of the base precursor used in Example 1 was dissolved in a Dynomill disperser to obtain 750 g of a 3% by weight aqueous solution of polyvinyl alcohol (PVA-205 manufactured by Kuraray Co., Ltd.).
Dispersed in. The particle size of the base precursor is about 0.
It was 5 μm or less.

[Formation of Overcoat Layer] The following coating liquid was prepared, coated on the photosensitive layer and dried to form an overcoat layer having a dry film thickness of about 3.3 μm.

──────────────────────────────────── Overcoat layer coating liquid ───── ─────────────────────────────── Polyvinyl alcohol with a saponification degree of 98.5% (trade name: PVA-205, Kuraray 200.0 g of 10% by weight aqueous solution of the above-mentioned base precursor dispersion liquid 1.25 g 5% by weight aqueous solution of the surfactant used in Example 1 4.0 g ──────────── ─────────────────────────

(Image formation) Using the photothermographic material prepared as described above, an image was formed as follows.
Using an air-cooled argon ion laser as a light source, 488n
Scanning exposure with exposure wavelength of m (exposure on film surface: 3 μJ
/ Cm ² ) and imagewise exposed. Next, five silicone rubber plates having a thickness of 250 μm are arranged linearly on the surface of the photosensitive material (overcoat layer side) as spacers, and further, while an aluminum plate having a thickness of 100 μm is applied as a sheet, the back surface of the photosensitive material (support side) ) Was pressed against a hot plate heated to 145 ° C. and heated for 40 seconds. This reduced the silver halide and simultaneously cured the polymerizable layer. A silver image was seen in the exposed areas. After removing the photosensitive layer and the overcoat layer by washing with water, an alkaline developer (Fuji PS Developer DP- manufactured by Fuji Photo Film Co., Ltd.) is used.
4), after brush development with an automatic etching machine,
After thorough washing with water, the unexposed portion of the polymerizable layer was eluted and removed to form a cured image.

[Comparative Example 3] Using the same photothermographic material as in Example 4, imagewise exposure was carried out with an argon ion laser in the same manner as in Example 1, and then heat development was carried out in the same manner except that the spacer was not sandwiched. A cured image was formed by processing in the same manner as in Example 4.

(Evaluation of Image) Fogging and image strength of the cured image prepared as described above were visually evaluated. Fog was not recognized in the image prepared in Example 4, and the image intensity was sufficient. In the image created in Comparative Example 3,
Fog was partially generated in the non-image area (uncured area), and a good image could not be obtained. Further, there were some areas where the curing was insufficient and the concentration was low.

[Brief description of drawings]

FIG. 1 is a schematic diagram showing a case where a gap is provided by using a spacer.

FIG. 2 is a schematic diagram showing a case where a gap is provided by using a net.

FIG. 3 is a schematic sectional view showing an aspect (1) of the present invention.

FIG. 4 is a schematic sectional view showing an aspect (2) of the present invention.

FIG. 5 is a schematic sectional view showing an aspect (3) of the present invention.

[Explanation of symbols]

 11, 21, 31, 41, 51 Support 12, 22, 32, 42, 52 Photosensitive polymerizable layer 13 Spacer 14, 24, 34, 44 Sheet 23 Net 33, 43, 53 Gap 35, 45, 54 Heating element

─────────────────────────────────────────────────── ───

[Procedure amendment]

[Submission date] March 26, 1993

[Procedure Amendment 1]

[Document name to be amended] Statement

[Correction target item name] 0013

[Correction method] Change

[Correction content]

The reason why partial fogging and partial curing failure are improved by providing a gap and performing heat development is not clear. However, the uneven adhesion caused by the difficulty of uniform adhesion between the surface of the photosensitive polymerizable layer and the sheet or the surface of the heating element is eliminated, and gas generated from the photosensitive material during heating causes bubbles to be generated on the adhesion surface. It is considered that this is because the occurrence of the phenomenon was eliminated by the gap. As a result of the above, according to the image forming method of the present invention, it is possible to form a uniform image having a high degree of curing by a simple process using silver halide having high photosensitivity. Further, the fusion of the surface of the light-sensitive material with the sheet or the heating element is eliminated by the present invention, the maintainability of the heating element is improved, and the resource saving is achieved by the repeated use of the cover sheet.

[Procedure Amendment 2]

[Document name to be amended] Statement

[Correction target item name] 0028

[Correction method] Change

[Correction content]

When the imagewise exposed light-sensitive material is heated as described above, the silver halide on which a latent image is formed by exposure is thermally developed, and at the same time, the part (or the part where the latent image is not formed) is polymerizable. The compound is polymerized and cured (or the crosslinkable binder is crosslinked and cured ). As a result, the exposed or unexposed portion of the polymerizable compound is selectively polymerized and cured (or crosslinked and cured).

[Procedure 3]

[Document name to be amended] Statement

[Correction target item name] 0076

[Correction method] Change

[Correction content]

Oxygen that has penetrated into the polymerizable layer during heat development inhibits radical polymerization or crosslinking. Therefore, the photosensitive layer preferably has a function of preventing the influence of oxygen in the air on the polymerizable layer. For this function, the hydrophilic binder needs to be a substance having a low oxygen permeability, and the oxygen permeability coefficient thereof is 1.0 ×.
It is preferably 10 ⁻¹¹ cc · cm / cm ² · sec · cm · Hg or less. As the polymer having low oxygen permeability, a polyvinyl alcohol polymer, a copolymer of gelatin and vinylidene chloride is preferable. Here, the polyvinyl alcohol polymer means polyvinyl alcohol and modified polyvinyl alcohol (for example, saponified block copolymer of polyvinyl acetate and another monomer). The molecular weight is not particularly limited, but is about 300
The range of 0 to 500,000 is preferable. The polymer having a low oxygen permeability has a saponification degree of 50% or more, more preferably 8
Particularly preferred is 0% or more of polyvinyl alcohol.

[Procedure amendment 4]

[Document name to be amended] Statement

[Correction target item name] 0105

[Correction method] Change

[Correction content]

[0105]

[Chemical 3]

[Procedure Amendment 5]

[Document name to be amended] Statement

[Correction target item name] 0106

[Correction method] Change

[Correction content]

[0106]

[Chemical 4]

[Procedure correction 6]

[Document name to be amended] Statement

[Correction target item name] 0107

[Correction method] Change

[Correction content]

[0107]

[Chemical 5]

[Procedure Amendment 7]

[Document name to be amended] Statement

[Correction target item name] 0108

[Correction method] Change

[Correction content]

[0108]

[Chemical 6]

[Procedure Amendment 8]

[Document name to be amended] Statement

[Correction target item name] 0109

[Correction method] Change

[Correction content]

[0109]

[Chemical 7]

Claims (3)

[Claims] 1. A photosensitive material comprising a support and a photosensitive polymerizable layer containing a silver halide, a reducing agent and a polymerizable compound, which is subjected to imagewise exposure and then heated to 70 ° C. or higher for heat development. An image forming method for forming a cured image by performing at least 70 of the surface of the photosensitive material on the side of the photosensitive polymerizable layer.
% With a thickness of 10 μm through a gap of 0.5 to 500 μm.
An image forming method, which comprises covering with a sheet of m or more, and heating in that state from the support side to perform thermal development. 2. A photosensitive material having a photosensitive polymerizable layer containing a silver halide, a reducing agent and a polymerizable compound provided on a support is imagewise exposed and then heated to 70 ° C. or higher for heat development. An image forming method for forming a cured image by performing at least 70 of the surface of the photosensitive material on the side of the photosensitive polymerizable layer.
% With a thickness of 10 μm through a gap of 0.5 to 500 μm.
An image forming method characterized by covering with a sheet of m to 3 mm, and heating in that state from the sheet side to perform thermal development. 3. A photosensitive material comprising a support and a photosensitive polymerizable layer containing a silver halide, a reducing agent and a polymerizable compound provided thereon is subjected to imagewise exposure and then heated to 70 ° C. or higher for thermal development. An image forming method for forming a cured image by performing at least 70 of the surface of the photosensitive material on the side of the photosensitive polymerizable layer.
% Is covered with a surface of a heating element through a gap of 0.5 to 500 μm, and in that state, heating is performed using the heating element to perform thermal development.