JPH06236015A - Treatment of photographic processing waste and treating device - Google Patents

Abstract

PURPOSE:To provide a treating technique (1) free from the discharge of harmful condensate or vapor, (2) saved in energy necessary for treating a waste and (3) simplified in mechanism. CONSTITUTION:(1) A vaporized material generated by condensation and solidification is heated at >=250 deg.C and after that, is cooled, condensed and is post treated. (2) The vaporized material generated by condensation and solidification is heated at >=250 deg.C and after that, is heat exchanged for the waste before supplied to a rotary disk 16. (3) The shape of the upper face of the rotary disk 16 is formed so that the end part of the disk 16 is swollen compared with the vicinity of the inside and the difference of the height between the end part and the most recessed part is >=1mm or the surface material of the disk 16 is >=45 deg. in the contact angle with the photographic processing waste.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photographic processing waste liquid, that is, a method of processing a waste liquid generated in the processing of a photographic light-sensitive material, and a processing apparatus used in the processing method. The present invention relates to a method and an apparatus for supplying and drying and evaporating to dryness to concentrate or solidify.

[0002]

2. Description of the Related Art A photographic light-sensitive material, for example, a light-sensitive lithographic printing plate having a photosensitive layer containing a photosensitive component such as an o-quinonediazide compound and a diazo compound, a binder resin and the like on a support is usually treated. While conveying the image-wise exposed photosensitive lithographic printing plate using an automatic developing machine, a developing solution is applied to the surface of the photosensitive lithographic printing plate to elute the photosensitive layer imagewise and then washed with water, followed by desensitizing solution (gum solution). A post-treatment of applying a rinse liquid to the printing plate is performed. As the developer, an aqueous solution or an aqueous solution containing a compound selected from alkali silicate, alkali hydroxide, sulfite, organic solvent, surfactant, etc. is used depending on the properties of the photosensitive layer. As the liquidification agent, gum arabic, dextrin, water-soluble fibrin ether, phosphoric acid, etc. are used, and as the rinse liquid, an aqueous solution containing a surfactant, phosphoric acid, etc. is used. In such processing, the developing fatigue solution used for elution development and the processing solution whose function has deteriorated due to carry-in from the pre-processing step are discharged as a waste solution.

By the way, as a method of treating waste liquid discharged in the photographic processing of a photosensitive material such as photographic film or photographic paper,
Japanese Patent Application Laid-Open No. 63-128345 proposes an apparatus for treating a waste liquid that drops a waste liquid on a heated rotating disk and heats it to condense or solidify and scrape off the condensate or solid matter.

[0004]

However, for example, there are many hardly decomposable organic substances in the processing waste liquid of the non-silver salt light-sensitive material, and when such waste liquid is processed by the above technique, condensation after solidification processing is performed. The problem that the above organic matter is mixed in the liquid and the disposal is difficult or the odor is large, the problem that a separate device for detoxifying and deodorizing the coagulated liquid by further post-treatment is required, waste liquid There is room for improvement in energy consumption required for processing, and since the top surface of the disk is flat, the waste liquid dropped on the disk easily flows out of the disk, and a mechanism such as returning the drained waste liquid to the disk is required. There is.

Therefore, an object of the present invention is to provide a technique for supplying a photographic processing waste liquid onto a heated rotating disk to concentrate or solidify it, and firstly, it is difficult to dispose of the photographic processing liquid or aggregate with a large odor. Providing a technology that improves the discharge of liquid and exhaust gas; second, providing a technology that can reduce the energy consumption required for waste liquid treatment; third;
It is an object of the present invention to provide a technique which is suitable for treating a relatively small amount of waste liquid, consumes a small amount of energy, and is capable of simplifying the mechanism (eliminating the treatment mechanism for the waste liquid flowing out of the disk).

[0006]

Means for Solving the Problems The first object of the present invention is the following (1), the second object is the following (2) or (3), and the third object is the following (4) or (5). Achieved by

(1) After supplying the waste liquid for photographic processing to the surface of a heated rotating disk for concentration or solidification, and heating the evaporate generated during the concentration or solidification without condensing to 250 ° C. or higher A method for treating photographic waste liquid, which comprises cooling, condensing, and then performing post-treatment.

(2) In the processing method of a photographic processing waste liquid in which the photographic processing waste liquid is supplied to the surface of a heated rotating disk to concentrate or solidify the photographic processing waste liquid, the evaporate generated by the concentration or solidification is heated to 250 ° C. or higher. A method for treating a photographic processing liquid, comprising heating and then cooling the disc by exchanging heat with the photographic processing liquid before being supplied.

(3) A disk which is heated and rotated, a means for supplying the photographic processing waste liquid to the surface of the disk, a heating section for passing the evaporation product generated from the photographic processing waste liquid which is supplied to the surface of the disk and heated, The heat exchange section has a heat exchange section between the evaporate heated by passing through the heating section and the photographic processing waste solution before being supplied to the disk, and the heat exchange section is heated inside the pipe through which the photographic processing waste solution flows. An apparatus for treating photographic processing waste liquid, characterized in that it has a structure having a pipe through which evaporated material flows.

(4) In a processing apparatus for photographic processing waste liquid, which comprises means for scraping off the concentrate or solids by supplying the photographic processing waste liquid onto a horizontally rotating heated disk to concentrate or solidify it. Have the same shape in any longitudinal section passing through the axis of rotation of the disk, the end of the disk is raised as compared to the vicinity of the end, and the difference in height between the end and the most recessed part is The photographic processing waste liquid treatment device is characterized by the presence of 1 mm or more.

(5) In a processing apparatus for a photographic processing waste liquid having means for scraping off the concentrate or solid matter by supplying the photographic processing waste liquid onto a rotating heated disk to concentrate or solidify it, A processing device for photographic waste liquid, characterized in that the material has a contact angle of 45 ° or more with the photographic waste liquid.

The present invention will be described in detail below.

First, an outline of a configuration common to each of the inventions according to claims 1 to 5 will be described. The processing method and the processing apparatus according to any one of claims 1 to 5 supply a photographic processing waste liquid to the surface of a heated rotating disk, and concentrate or solidify the waste liquid on the surface of the disk to blade from the surface of the disk. It has a common mechanism for scraping off and collecting. Electric heating, steam or the like is used as a heating means for the disk, and the temperature and rotation speed of the disk are appropriately adjusted to a level sufficient for concentrating or solidifying the waste liquid. The above disc is
The surface for supplying the waste liquid may be provided horizontally or vertically.

Next, regarding the processing method according to claim 1,
A description will be given with reference to the drawings. FIG. 1 is a diagram showing a schematic configuration of a processing apparatus used in the processing method according to claim 1.
In FIG. 1, 1 is a waste liquid tank, and 2 is a waste liquid stored in the waste liquid tank 1. The amount of the waste liquid 2 in the waste liquid tank 1 is managed by the liquid level sensor 3 so as to always be an appropriate amount. The waste liquid 2 is introduced into the processing apparatus 10 by the pump 4 and supplied from the liquid supply nozzle 14 onto the heated disk 16. The surface of the disk 16 is kept at a constant temperature by a heating member 17, and the rotational power of the motor 19 is rotated at an appropriate number of rotations according to the gear tooth ratio in the gearbox 20. Reference numeral 21 is a rotating shaft of the disk 16.

A scraping blade 23 is provided on the surface of the disk 16.
The waste liquid (solid content) supplied from the liquid supply nozzle 14 and heated on the disk 16 and condensed or solidified is scraped from the surface of the disk 16 and passed through the hopper 24 to collect the waste liquid.
To collect. 26 is a solid content stored in the recovery device 25.

The steam generated from the disk 16 is introduced into the introduction part 27.
It is led to the heating units 29 and 30 through. The introducing unit 27 has a heating mechanism 28 embedded in the inner wall thereof, and prevents the vapor evaporated in the disk 16 from lowering the temperature in the introducing unit 27 and condensing the vapor. The temperature of the inner wall of the introduction portion 27 is preferably 85 ° C. or higher, more preferably 100 ° C. or higher. A heat insulating material 31 is attached to the vicinity of the disk 16 and the outer wall surface of the introduction part 27 and the hopper 24 to prevent the temperature of the steam from decreasing, and at the same time, the temperature of the outer wall of the processing device 10 rises and the indoor environment is deteriorated. To prevent.

The heating portions 29, 30 are formed of heat-generating members 33, 34 that generate high temperature, specifically 400 to 1000 ° C., on the surface that comes into contact with steam, and a heat insulating material 35 is wrapped around them to keep them warm. Has been done. The steam is heated to 250 ° C. or higher, preferably 400 ° C. or higher in the heating sections 29 and 30, and burned by oxygen in the air sucked from the opening at the bottom of the hopper 24.

In the apparatus shown in FIG. 1, the heating parts are 2 of 29 and 30.
Although a base is provided, one may be provided as long as the temperature of the steam can be 250 ° C. or higher. Further, although the steam passage of the heating portion is a straight line in FIG. 1, it may have a curved portion or a bent portion as appropriate. The shape may be. The vapor that has passed through the heating unit 30 is guided to a condenser 37 through a conduit 36, where liquid components such as water at room temperature are condensed and separated. Cooling water enters the condenser 37 through the inlet 38 and is discharged through the outlet 39. The condensate condensed in the condenser 37 is then guided to the electrolytic oxidizer 40 for post-treatment (oxidation). The post-treated condensate is discharged to the outside of the processing apparatus 10 through the drain port 41. On the other hand, the gas that does not condense in the condenser 37 is
The material is post-treated (desulfurized) by the desulfurization device 50 and discharged from the exhaust port 41 into the outside air. The pump 49 causes a vaporized vapor flow on the disk 16 to promote condensation within the condenser 37. Regulating valve
Reference numeral 48 is for keeping the suction amount of the pump 49 appropriate.

In the invention according to claim 1, as the post-treatment, 1) ultraviolet irradiation treatment, 2) reverse osmosis treatment, 3) oxidant treatment, 4) electrolytic oxidation treatment, 5) electrodialysis treatment, 6) aeration treatment , 7) redistillation treatment, and 8) one or more treatments selected from ion-exchange resin treatments are optionally used in combination.

1) Ultraviolet Irradiation Treatment The ultraviolet rays used in the ultraviolet irradiation treatment can be obtained by a commercially available ultraviolet lamp, an ultraviolet irradiation device, a halogen lamp or the like, but it is not particularly limited. The output of this ultraviolet lamp or the like is known to have an output of 5 W to 1 kW, but the output is not limited to this. Further, in the present invention, 190 to 400 from the ultraviolet lamp
Electromagnetic waves and light having wavelengths outside the range of nm may be generated and irradiated onto the condensate obtained from the photographic processing waste liquid. In addition, infrared rays or the like may be used in combination. UV lamps are 2
It can also be a heavy pipe.

The ultraviolet irradiation treatment means that the condensate obtained from the photographic waste liquid is irradiated with ultraviolet rays using an ultraviolet lamp or the like, and the ultraviolet irradiation may be continuously performed on the condensate. However, it may be performed intermittently as needed.

2) Reverse osmosis treatment In the reverse osmosis treatment, various reverse osmosis membranes and desalination / concentration methods and devices using the reverse osmosis membranes can be used without limitation. As the reverse osmosis membrane, cellulose acetate, aromatic polyamide,
Polyvinyl alcohol and polysulfone are preferable, and cellulose acetate is particularly preferable. The reverse osmosis device is preferably operated at a pressure of 40 to 55 kg / cm ² from the viewpoint of separation performance and processing capacity.

3) Oxidizing Agent The oxidizing agents used in the oxidizing agent treatment include metals, non-metal oxides, oxide-oxygen acid and its salts, peroxides, compounds containing organic oxygen, and the like. Nitric oxide NO as oxide
x, chromic acid anhydride CrO _3, selenium dioxide SeO _2, manganese dioxide MnO _2, lead dioxide PbO _2, osmium tetroxide O _S O _4, silver Ag ₂ O oxide, copper oxide CuO, include mercury oxide HgO like. Examples of the oxygen acid include hot concentrated sulfuric acid H ₂ SO ₄ , nitrite HNO ₂ , nitric acid HNO _{3 and the} like. As salt, sodium hypochlorite NaOCl,
Exposed powder CaOCl ₂ , potassium dichromate K ₂ Cr ₂ O ₇ , potassium chromate K ₂ CrO ₄ , potassium permanganate KMnO ₄ , potassium chlorate KClO ₃ , potassium perchlorate KClO _{4, and the} like. Typical peroxides are hydrogen peroxide H ₂ O ₂ , sodium peroxide Na ₂ O ₂ and benzoyl peroxide (C ₆ H ₅ COO) ₂ . A substance that can have two or more valences, such as 3
Valent iron ion Fe ³⁺ , divalent copper ion Cu ²⁺ , lead tetraacetate Pb (C
H ₃ CO ₂ ) _{4 and the} like are also included. Other Fenton's reagent (Fe ²⁺ ＋
H ₂ O ₂ ), a dehydrogenation catalyst (Pt, Se, Zn) and the like can also be used as the oxidizing agent.

4) Electrolytic Oxidation Treatment The electrolytic oxidation treatment used in the present invention is a method in which a substance is oxidized at an anode by an electric field, which increases the positive charge of cations,
Any method of reducing the negative charge of the anion, polymerizing the anion, increasing the number of oxygen atoms in the atomic group and decreasing the number of hydrogen atoms may be used, and the electrolytic oxidation is superior to the oxidation by the oxidant. Means that a very strong oxidation can be carried out and there are few by-products.

5) Electrodialysis treatment In the electrodialysis treatment used in the present invention, the cathode and the anode of the electrodialysis electrode are partitioned by a diaphragm, and a condensate of the photographic processing waste liquid is put in the partitioned chamber and a direct current is applied to the electrodes. It is to communicate.

6) Aeration treatment The aeration treatment used in the present invention is to promote the oxidation by blowing air into the condensate of the photographic processing waste liquid, and to make the air bubbles finer by using a distributor or the like. Is preferable, whereby the bubbling effect can be improved and the removal efficiency of the organic solvent and the like can be increased.

7) Redistillation treatment The redistillation treatment used in the present invention means a distillation treatment on a condensate obtained from a photographic processing waste liquid, which is one of so-called rectification operations. It may be batch distillation (including simple distillation and batch rectification) or continuous distillation, and a continuous equilibrium distillation method for continuous rectification can also be adopted. Obtaining pure water (remarkably small fraction other than water) by redistillation can effectively supply water to the photographic processing liquid. It is also advantageous to use suitable separating agents in azeotropic distillation and extractive distillation. In the present invention, the secondary treatment effect can also be obtained by so-called steam distillation. The operating pressure may be any of high pressure, distillation, atmospheric distillation, vacuum distillation and molecular distillation.

8) Ion exchange resin treatment The ion exchange resin treatment used in the present invention can be carried out by bringing various ion exchange resins and a condensate into contact with each other, and the ion exchange resin is three-dimensionally polycondensed. A polymer base having a functional group bonded thereto, such as a cation exchange resin, an anion exchange resin, a chelate resin, and an adsorption resin.

For the chemical structure examples and usages of the ion exchange resins preferably used in the present invention, the description in Japanese Patent Application No. 59-124639 (especially pages 54 to 57) can be referred to.

The diaphragm is preferably an ion exchange membrane, and more preferably, the cathode and the anode are separated by an anion exchange membrane and a cation exchange membrane, and the cathode chamber and the plurality of concentrating chambers (the cathode side is Anion-exchange membrane, chamber with anode side partitioned by cation-exchange membrane), multiple desalting chambers (cathode side with cation-exchange membrane, anode side with anion-exchange membrane)
And the anode chamber. The condensate of the photographic processing waste liquid is preferably placed in the desalting chamber, but it is also preferable to put it in the concentrating chamber. The electrolyte solution placed in the concentrating chamber and the anode chamber is not particularly limited, and for example, a 0.1 to 2N solution of sodium sulfite, sodium sulfate, sodium chloride, potassium sulfate, sodium thiosulfate, etc. can be preferably used. At this time, it is very preferable to use a processing solution having fixing ability (bleach-fixing solution or fixing solution) or a waste solution thereof as an electrolyte solution to be put into the concentrating chamber and the anode chamber, since no electrolyte solution is required.

Next, a processing method according to claim 2 and a processing device according to claim 3 will be described with reference to the drawings. FIG. 2 is a schematic configuration diagram showing an example of a processing apparatus used in a processing method according to claim 2 and an example of a processing apparatus according to claim 3. In these drawings, the same components as those in FIG. 1 are designated by the same reference numerals, and the repeated description will be omitted.

The processing apparatus 11 shown in FIG. 2 evaporates the waste liquid supplied to the disk 16 on the disk 16 and heats the heating units 29 and 30.
The heat exchange section 60 is configured to exchange heat with the high-temperature steam heated in (1). The heat exchange section 60 is provided with a spiral heat transfer tube 62 through which high-temperature steam passes inside a cylindrical body 61 so that the waste liquid supplied to the disk 16 flows in a counter-current to the outside of the heat transfer tube 62 to exchange heat. It has become. As described above, the heat exchange section preferably has a structure in which the waste liquid supply pipe is thick and the steam vent pipe (preferably spiral) is provided therein.
The vapor containing the condensate discharged from the heat transfer tube 62 of the heat exchange section 60 is separated into the condensate and the vapor by the trap 63, and the condensate is discharged through the drain port 64.
From the processing apparatus 11 and the steam is discharged from the exhaust port 51 by the pump 65, 15 is a liquid supply nozzle that supplies the waste liquid onto the disk 16, and 66 is an adjustment for maintaining an appropriate suction amount of the pump 64. It is a valve. The processing device 11 does not have a heating mechanism on the inner wall of the introduction part 27, and has a structure in which a heat insulating material 32 is simply attached.

Next, a processing apparatus according to claim 4 will be described with reference to the drawings. FIG. 3 is a schematic configuration diagram showing an example of a processing apparatus according to claim 4. In the processing device 12 shown in FIG.
The disk 70 has a shape in which the end portion of the upper surface is raised. 71 is a heating member, 72 is a rotating shaft of the disk 70, 73
Is a scraping blade. In addition to the processing device 12,
The vapor leaving the heating unit 30 is not passed through the condenser, and the liquid condensed in the condenser is not post-processed in the electrolytic oxidizer.
It has the same structure as the apparatus shown in FIG. 1 except that the gas not condensed by the condenser is not treated by the desulfurization apparatus.

FIG. 4 shows an enlarged partial sectional view of the main part of FIG. As shown in FIG. 4, the disk 70 has a structure in which the end portion is raised at a maximum height of 2 mm, and the dimensions A and B of this raised portion are, for example, 2 mm. The scraping blade 73 has a shape corresponding to the surface shape of the disk. Another example of the cross-sectional shape of the disc is shown in FIG.
The disc 80 shown in FIG. 5 has a shape in which the central portion and the peripheral portion of the disc are raised and the portion near the peripheral portion is depressed. The waste liquid is supplied from the nozzle 11 to a raised portion near the center of the disc, is dried while flowing toward the recessed portion, and is finally scraped by the scraping blade 81.
The dimensions C and D shown in the figure are 2.5 mm for C and 1.5 for D, for example.
mm. It should be noted that in FIGS. 4 and 5, the shape of the irregularities on the upper portion of the disk is exaggerated from the actual state. In the processing apparatus according to the fourth aspect, it is preferable that the height difference between the end portion of the disc and the most recessed portion is 1 to 3 mm. Further, it is preferable that the shape of the scraping portion of the scraping blade also has unevenness according to the surface shape of the disk.

Next, a processing apparatus according to claim 5 will be described. In the processing apparatus according to the fifth aspect, as the material of the surface of the disc, a material having a contact angle with the waste liquid of 45 ° or more is used. As such a material, for example, a commonly used material such as a fluororesin (eg, Teflon) or a water repellent can be used, but the contact angle with the waste liquid is 4
Any material may be used as long as the material has an angle of 5 ° or more. However, since the temperature of the disk becomes high, the material needs to have sufficient heat resistance at this high temperature. The most preferred material is fluororesin. As a means for making the surface material of the disk as described above, a resin plate made of a fluororesin or the like which has been molded in advance is attached to the surface of the disk, the surface of the disk is coated with the fluororesin, or the surface of the disk is surface-treated. And the like can be applied. The most preferable method is to fix a plate made of fluororesin on the disk. The structure of such a disc is shown in FIG. As shown in FIG. 6, the upper surface of the disk 83 is a flat surface,
The structure is such that a fluororesin plate 84 is attached. 85 is a scraping blade. The heating member is not shown in FIGS. 3 to 6.

[0036]

EXAMPLES Next, examples of the processing method of the present invention will be described.

Example 1 Waste liquid was treated using the apparatus shown in FIG. The composition of the used waste liquid is shown below.

As a photographic light-sensitive material, a positive-type light-sensitive lithographic printing plate KH (trade name, manufactured by Konica Corporation) 1003 mm × 800 mm
The size and the same size of the negative photosensitive lithographic printing plate KW (the same) are processed with a developer having the following composition using an automatic developing machine,
Then, it was washed with water that was recycled.

<Developer Composition> N-Phenylethanolamine 6 g Propylene glycol 50 g pt-Butylbenzoic acid 150 g Emulgen 1475 g (trade name, nonionic surfactant, manufactured by Kao Corporation) Potassium sulfite 300 g Gluconic acid solution (50%) Aqueous solution) 100g Triethanolamine 25g A Potassium silicate (manufactured by Nippon Kagaku Kogyo Co., Ltd.) 400g Potassium hydroxide 200g Water 11.5l Treatment of 500 liters of the above photosensitive lithographic printing plate, 12 liters of developer waste solution, 15 liters of washing waste solution I went.

The operating condition in the steady state is that the waste liquid supply amount is 40 ml /
The temperature of the disk 16 was 125 ° C., the temperature of the introducing portion 27 was 103 ° C., and the temperature of the heat generating members 33 and 34 of the heating portions 29 and 30 was 550 ° C.
As a result, a completely dried solid content was obtained in the collector 25, and wastewater with an organic carbon content (TOC) of 42 ppm was discharged from the drainage port 41. The concentration of sulfur dioxide in the exhaust gas from the exhaust port 51 was measured and found to be 3 ppm.

Comparative Example 1 In the apparatus shown in FIG. 1, the heating units 29 and 30 were stopped, and other operations were performed in exactly the same manner as in Example 1.
Although a dry solid was obtained in 25, the drainage from the drainage port 41 was a drainage with a TOC amount of 240 ppm. Analysis of this confirmed the presence of propylene glycol and pt-butylbenzoic acid.

Comparative Example 2 In the apparatus of FIG. 1, the electrolytic oxidation apparatus 40 and the desulfurization apparatus 50 were stopped, and the operation was carried out under the same conditions as in the other examples. As a result, the TOC amount of the drainage water from the drainage port 41 was 90 ppm. In addition, the concentration of sulfur dioxide in the exhaust from the drainage port 51 is
It was 28 ppm, and a strong odor was confirmed.

From the above experiment, it was found that the waste liquid can be solidified well and at the same time, harmful substances can be removed from the discharge by the treatment method of Example 1.

Example 2 Waste liquid having the same composition as in Example 1 was treated using the apparatus shown in FIG. The steady-state operating condition of the equipment is 50
ml / min, the temperature of the disk 16 was 120 ° C., and the temperatures of the heating members 33 and 34 of the heating parts 29 and 30 were 550 ° C. As a result, collector 2
In 5, a completely dried solid content was obtained.

Comparative Example 3 Waste liquid was treated using the apparatus shown in FIG. The apparatus of FIG. 7 is exactly the same as the apparatus of FIG. 2 except that the waste liquid supplied in the apparatus of FIG. 2 is supplied onto the disk without being heated. When the treatment was carried out under exactly the same operating conditions as in Example 2, the waste liquid overflowing from the disk 16 flowed into the collector 25 and a completely dried solid component was not obtained. Therefore, when only the amount of waste liquid supplied was reduced to 15 ml / min, a completely dried solid component was obtained. In FIG. 7, 11a is a processing device, 60a is a heat exchange part, and 61a is a barrel of the heat exchange part 60a.

Example 3 Waste liquid having the following composition was treated using the apparatus shown in FIG.

As a photographic light-sensitive material, a positive photosensitive lithographic printing plate KM (trade name, manufactured by Konica Corporation) 1003 mm × 800 mm
The size was treated with a developer having the following composition using an automatic developing machine, and then washed with water that was circulated.

<Developer composition> A Potassium silicate (manufactured by Nippon Kagaku Kogyo Co., Ltd.) 2000 g Potassium hydroxide 300 g Water 10 l Waste solution of a developer obtained by processing 1000 sheets of the above photosensitive lithographic printing plate 12
1 and 15 liters of washing waste liquid were placed in the waste liquid tank 1 shown in FIG. 2 and treated.

The steady-state operating conditions of the apparatus are as follows.
ml / min, the temperature of the disk 16 was 125 ° C., and the temperature of the heating members 33, 34 of the heating parts 29, 30 was 550 ° C. As a result, collector 2
In 5, a completely dried solid content was obtained.

Comparative Example 4 Using the apparatus shown in FIG. 7, the same waste liquid treatment as in Example 3 was performed. When the treatment is performed under exactly the same operating conditions as in Example 3, the waste liquid overflowing from the disk 16 is collected in the collector 25.
And no completely dried solids were obtained.
Therefore, when the amount of waste liquid supplied was reduced while the other conditions were kept the same, a completely dried solid component was obtained when the amount was reduced to 16 ml / min.

Example 4 A waste liquid having the same composition as in Example 1 was treated using the apparatus shown in FIG. The constant operating condition is a waste liquid supply of 40 ml /
Min, the temperature of the disk 70 was 130 ° C., and the temperature of the heating members 33, 34 of the heating parts 29, 30 was 550 ° C. As a result, a completely dried solid component was obtained in the collector 25.

Comparative Example 5 The same operation as in Example 4 was carried out using a flat disk. The surface material of the disk was SUS316, and the contact angle with the waste liquid was 32 °. As a result, when the waste liquid supply rate was 40 ml / min, the waste liquid flowed down from the disc, and a good solid content was not obtained. Therefore, when the conditions for obtaining a good solid content while reducing the supply amount were examined, a completely dried solid content was obtained under the condition of reducing to 18 ml / min.

Example 5 The same operation as in Example 4 was performed using a disk shown in FIG. At this time, the contact angle of the waste liquid with the plate 84 forming the upper surface of the disk 83 was 50 °. Waste liquid supply for obtaining a good solid content is 28 ml / min, and the treatment amount is increased as compared with the case of using the disc of Comparative Example 5 in which the contact angle with the waste liquid on the surface of the disc is less than 45 °. Was possible.

[0054]

According to the first aspect of the present invention, in the technique of supplying photographic processing waste liquid onto a heated rotating disk to solidify it, exhaust gas and waste water that are difficult to dispose of or have a large odor are discharged. Can be eliminated,
When post-treatment of waste gas and waste water is required, the waste liquid treatment device can be downsized and integrated.

According to the second or third aspect of the invention, in the technique of supplying the photoprocessing waste liquid onto the heated rotating disk to solidify it, the energy consumption required for the same processing amount can be reduced. .

According to the fourth or fifth aspect of the invention, in the technique of supplying the photoprocessing waste liquid onto the heated rotating disk to solidify it, it is suitable for a relatively small amount of processing, and the energy consumption can be reduced. Possible waste liquid treatment equipment is provided,
Further, the mechanism of the waste liquid treatment device can be simplified.

[Brief description of drawings]

FIG. 1 is a schematic cross-sectional view showing an example of a processing apparatus used in the processing method according to claim 1.

FIG. 2 is a schematic sectional view showing an example of a processing apparatus according to claims 2 and 3.

FIG. 3 is a schematic sectional view showing an example of a processing apparatus according to claim 4.

FIG. 4 is an enlarged partial sectional view of a main part of FIG.

FIG. 5 is an enlarged partial sectional view of a main part of an example of the processing apparatus according to claim 4;

FIG. 6 is an enlarged partial cross-sectional view of a main part of an example of a processing apparatus according to claim 5.

FIG. 7 is a schematic sectional view of a processing apparatus used in Comparative Example 3.

[Explanation of symbols]

 1 Waste liquid tank 10, 11, 12 Treatment device 14, 15 Liquid supply nozzle 16, 70, 80, 83 Disc 17 Heating member 29, 30 Heating part 31, 35 Insulation material 33, 34 Heating member 37 Condenser 40 Electrolytic oxidizer 50 Desulfurization equipment 60 heat exchanger

Claims (5)

[Claims] 1. A photographic processing waste liquid is supplied to the surface of a heated rotating disk for concentration or solidification, and after evaporation or evaporation generated during the concentration or solidification is heated to 250 ° C. or higher without being condensed, A method for treating photographic waste liquid, which comprises cooling and condensing, and then performing post-treatment. 2. A method of treating a photographic processing waste liquid, comprising supplying the photographic processing waste liquid to the surface of a heated rotating disk to concentrate or solidify the photographic processing waste liquid, wherein the evaporation product generated by the concentration or solidification is heated to 250 ° C. or higher. A method for treating a photographic processing waste liquid, characterized in that after that, the photographic processing waste liquid is cooled by heat exchange with the photographic processing waste liquid before being supplied to the disc. 3. A heated and rotating disc, a means for supplying a photographic processing waste liquid to the surface of the disc, a heating section for passing an evaporate generated from the photographic processing waste liquid supplied to the surface of the disc and heated, and The heat exchange section has a heat exchange section between the evaporate heated by passing through the heating section and the photographic processing waste solution before being supplied to the disc, and the heat exchange section is heated inside the pipe through which the photographic processing waste solution flows. A processing apparatus for photographic processing waste liquid, which has a structure having a tube through which evaporate flows. 4. A processing apparatus for a photographic waste liquid, comprising means for supplying the photographic waste liquid onto a horizontally rotating heated disk to concentrate or solidify it, and scraping off the concentrate or solid matter. The shapes of arbitrary longitudinal sections passing through the rotation axis are all the same, the end of the disk is raised as compared to the vicinity of the end, and the height difference between the end and the most recessed portion is A processing device for photographic processing waste liquid, which is characterized by being present at 1 mm or more. 5. A material for the surface of a photographic processing liquid in a processing apparatus for photographic processing liquid, which comprises means for supplying and condensing or solidifying the photographic processing liquid onto a rotating heated disk to scrape off the concentrate or solid. However, the contact angle with the photoprocessing waste liquid is 45 ° or more, the processing apparatus for the photoprocessing waste liquid.