JPH06228099A - Production of thiol-protecting derivative - Google Patents

Production of thiol-protecting derivative

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Publication number
JPH06228099A
JPH06228099A JP5040675A JP4067593A JPH06228099A JP H06228099 A JPH06228099 A JP H06228099A JP 5040675 A JP5040675 A JP 5040675A JP 4067593 A JP4067593 A JP 4067593A JP H06228099 A JPH06228099 A JP H06228099A
Authority
JP
Japan
Prior art keywords
nitro
group
protected
thiol
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5040675A
Other languages
Japanese (ja)
Inventor
Masaaki Ueki
正彬 植木
Toshio Watanabe
敏夫 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SANKYO KAGAKU KK
Original Assignee
SANKYO KAGAKU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SANKYO KAGAKU KK filed Critical SANKYO KAGAKU KK
Priority to JP5040675A priority Critical patent/JPH06228099A/en
Publication of JPH06228099A publication Critical patent/JPH06228099A/en
Pending legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Landscapes

  • Pyridine Compounds (AREA)
  • Peptides Or Proteins (AREA)

Abstract

PURPOSE:To obtain the subject derivative protected with 3-nitro-2-pyridyl sulfide in high yield by reacting a benzyl 3-nitro-2-pyridyl sulfide with sulfuryl chloride and reacting the reaction product with a SH protecting thiol compound. CONSTITUTION:2-Chloro-3-nitropyridine and 4-methoxyphenylmethanethiol are heated under reflux in the presence of triethylamine in methanol for 4 hours to give a benzyl 3-nitro-2-pyridyl sulfide of formula I (R is H, alkyl or alkoxy), which is dissolved in dichloromethane and reacted with sulfuryl chloride at 0 deg.C at room temperature for 20 minutes to give 3-nitro-2-pyridinesulfenyl chloride of formula II. 3-Nitro-2-pyridinesulfenyl chloride is not isolated and reacted with a thiol compound containing a SH-protecting group of the formula A-S(X) (A is protected amino residue or protected peptide; X is thiol-protecting group) to give a thiol-protecting derivative protected with 3-nitro-2-pyridinesulfenyl group of formula III.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、システイン又はチオー
ル基の保護基として知られ、ペプチド合成等において選
択的に脱離しS−S結合を形成する特性を有する3−ニ
トロ−2−ピリジンスルフェニル(Npys)基で保護
された化合物を、3−ニトロ−2−ピリジンスルフェニ
ル クロライド(Npys−Cl)を単離することなし
に、SH基を保護したチオール化合物と反応させること
により、高純度、高収率でかつ簡便に合成する方法を提
供するものである。
FIELD OF THE INVENTION The present invention is known as a protecting group for cysteine or thiol group, and is a 3-nitro-2-pyridinesulfenyl group having a property of selectively leaving to form an S-S bond in peptide synthesis and the like. By reacting a compound protected with an (Npys) group with a thiol compound protected with an SH group without isolating 3-nitro-2-pyridinesulfenyl chloride (Npys-Cl), high purity, It is intended to provide a method of synthesizing in high yield and easily.

【0002】[0002]

【従来の技術】Npys基は松枝らによって開発された
新しいチオール保護基であり、遊離のSH基との反応で
S−S結合形成能を有しており〔Chem.Let
t.,737(1981)、Int.J.Peptid
e Protein Res.,28,107(198
6)記載〕、Npys−Clを用いて導入される。従
来、Npys−Clは松枝らにより、ビス(3−ニトロ
−2−ピリジル)ジスルフィドと塩素との反応により合
成された〔Chem.Lett.,951(1978)
記載〕。Npys基で保護された化合物は、このNpy
s−Clを用いて合成されるが、Npys−Cl自体が
不安定であること、また高価であることから、その使用
に際しては制約がある。また、Npys基で保護された
SH基を有するアミノ酸は市販されているが、高価であ
る。
2. Description of the Related Art The Npys group is a new thiol protecting group developed by Matsueda et al. And has the ability to form an S--S bond by reacting with a free SH group [Chem. Let
t. , 737 (1981), Int. J. Peptid
e Protein Res. , 28 , 107 (198
6) Description], and introduced using Npys-Cl. Conventionally, Npys-Cl was synthesized by Matsueda et al. By the reaction of bis (3-nitro-2-pyridyl) disulfide with chlorine [Chem. Lett. , 951 (1978)
Description]. The compound protected by the Npys group is
Although it is synthesized using s-Cl, its use is limited because Npys-Cl itself is unstable and expensive. Further, an amino acid having an SH group protected by an Npys group is commercially available, but it is expensive.

【0003】[0003]

【発明が解決しようとする課題】従来の合成方法では、
原料であるNpys−Clが不安定であり、また高価で
あることから、安価なNpys基で保護されたSH基を
有するアミノ酸を入手するのは困難であるという問題が
あった。
In the conventional synthesis method,
Since the raw material Npys-Cl is unstable and expensive, there is a problem in that it is difficult to obtain an inexpensive amino acid having an SH group protected by an Npys group.

【0004】[0004]

【課題を解決するための手段】本発明者らは、原料とし
て溶解性のよいベンジル 3−ニトロ−2−ピリジルス
ルフィドを用い、塩化スルフリルとの反応により、Np
ys−Clを高純度、高収率で合成し、これを単離する
ことなしに、SH基を保護したチオール化合物と反応す
ることにより、高収率で安価に目的とするNpys基で
保護された化合物を合成できることを見出し、さらに詳
細な検討を加えた結果、本発明を完成させるに到った。
[Means for Solving the Problems] The inventors of the present invention used benzyl 3-nitro-2-pyridyl sulfide, which has good solubility, as a raw material, and reacted with sulfuryl chloride to produce Np
By synthesizing ys-Cl with high purity and high yield, and reacting it with a thiol compound having a protected SH group without isolation, ys-Cl is protected with the target Npys group at high yield and at low cost. As a result of discovering that the above compound can be synthesized and conducting further detailed studies, the present invention has been completed.

【0005】すなわち、本発明をさらに詳細に説明する
と、下記一般式(II)で示されるベンジル 3−ニトロ
−2−ピリジル スルフィド類と塩化スルフリルを不活
性化ガス(例えば、ヘリウム、アルゴン等)雰囲気下、
0°C以下で数十分反応させ下記式(III) で示されるN
pys−Clを合成し、さらにこれを単離することなし
に系内を不活性化ガスで充分置換し、下記一般式(IV)
で示されるチオール化合物の溶液を加えて数十分反応す
ることにより、目的とする下記一般式(I)で示される
Npys基で保護された化合物を高純度、且つ高収率で
合成する方法である。
More specifically, the present invention will be described in more detail. Benzyl 3-nitro-2-pyridyl sulfides represented by the following general formula (II) and sulfuryl chloride are treated with an inert gas (eg, helium, argon, etc.) atmosphere. under,
After reacting for several tens of minutes at 0 ° C or lower, N represented by the following formula (III)
Pys-Cl was synthesized, and the system was sufficiently replaced with an inert gas without isolation, and the following general formula (IV)
A method of synthesizing a target compound protected by an Npys group represented by the following general formula (I) with high purity and high yield by adding a solution of a thiol compound represented by is there.

【0006】[0006]

【化2】 [Chemical 2]

【0007】式中、Rは水素原子、アルキル基又はアル
コキシ基を表す。Aは保護アミノ酸残基あるいは保護ア
ミノ酸残基を含むペプチドを表し、Xはペプチド合成等
に用いられるチオール保護基を表す。
In the formula, R represents a hydrogen atom, an alkyl group or an alkoxy group. A represents a protected amino acid residue or a peptide containing a protected amino acid residue, and X represents a thiol protecting group used for peptide synthesis and the like.

【0008】前記化2で示される反応式中、Rは水素原
子;メチル基、エチル基、プロピル基等のアルキル基;
メトキシ基、エトキシ基等のアルコキシ基が挙げられ
る。Aはシステイン、ペニシルアミン等で代表される保
護アミノ酸残基;システイン、ペニシルアミン等で代表
される保護アミノ酸残基を含むペプチドが挙げられる。
Xはメトキシベンジル(MBzl)基等のチオール保護
基を表す。なおS(X)基が複数の場合も、同様の方法
によりNpys基で保護した化合物を合成することがで
きる。本発明のNpys基で保護した化合物の製造方法
の一例を以下に述べる。
In the reaction formula shown in Chemical Formula 2, R is a hydrogen atom; an alkyl group such as a methyl group, an ethyl group, a propyl group;
Examples thereof include alkoxy groups such as methoxy group and ethoxy group. A includes protected amino acid residues represented by cysteine, penicylamine and the like; peptides containing protected amino acid residues represented by cysteine, penicylamine and the like.
X represents a thiol protecting group such as a methoxybenzyl (MBzl) group. Even when there are a plurality of S (X) groups, a compound protected with an Npys group can be synthesized by the same method. An example of the method for producing the compound protected by the Npys group of the present invention will be described below.

【0009】4−メトキシベンジル 3−ニトロ−2−
ピリジル スルフィドをジクロロメタンに溶解し、アル
ゴンガス雰囲気下、0°Cで塩化スルフリルを加え反応
してNpys−Clを合成し、系内を充分アルゴンガス
で置換したのち、4−メトキシベンジル基で保護したチ
オール化合物の溶液を加えて反応することにより、目的
物であるNpys基で保護された化合物を合成できる。
反応はジクロロメタン中不活性化ガス雰囲気下、室温で
数十分攪拌を行い、溶媒除去後、残渣をカラムクロマト
グラフィーで精製することにより、目的物を高収率、高
純度で得ることができる。
4-methoxybenzyl 3-nitro-2-
Pyridyl sulfide was dissolved in dichloromethane, and sulfuryl chloride was added at 0 ° C. under an argon gas atmosphere to react to synthesize Npys-Cl. After the system was sufficiently replaced with argon gas, it was protected with 4-methoxybenzyl group. By adding a solution of a thiol compound and reacting it, a target compound protected by an Npys group can be synthesized.
The reaction is carried out in dichloromethane under an inert gas atmosphere at room temperature for several tens of minutes, the solvent is removed, and the residue is purified by column chromatography to obtain the desired product in high yield and high purity.

【0010】[0010]

【発明の効果】本発明はベンジル 3−ニトロ−2−ピ
リジル スルフィド類と塩化スルフリルを作用させ、単
離することなしに、この系にSH基を保護したチオール
化合物を添加し反応することにより、目的とするNpy
s基で保護された化合物を高収率、且つ高純度で合成で
きる新規にして効率的な製造方法である。
INDUSTRIAL APPLICABILITY According to the present invention, benzyl 3-nitro-2-pyridyl sulfides and sulfuryl chloride are allowed to act, and without isolation, a thiol compound having a protected SH group is added to this system to react with each other. The target Npy
It is a novel and efficient production method capable of synthesizing a compound protected with an s group in high yield and high purity.

【0011】[0011]

【実施例】以下、本発明をさらに詳しく説明するために
実施例を示すが、これは本発明を限定するものではな
い。
EXAMPLES Examples will be shown below for illustrating the present invention in more detail, but they do not limit the present invention.

【0012】〔実施例1〕 (1)4─メトキシベンジル 3−ニトロ−2−ピリジ
ル スルフィドの合成 2−クロロ−3−ニトロピリジン2.18g(13.8
ミリモル)と4−メトキシフェニルメタンチオール2.
5ml(21.3ミリモル)、トリエチルアミン2.5
ml(21.3ミリモル)をメタノール10mlに溶解
して4時間加熱還流した後、溶媒を減圧留去し、残渣を
クロロホルムを溶出液とするシリカゲルカラムクロマト
グラフィーによって精製し、目的物3.54g(収率9
3%)を得た。 融点89.2〜90.0°C 元素分析 C H N S 計算値 56.51 4.38 10.14 11.60 実測値 56.80 4.31 10.15 11.44
Example 1 (1) Synthesis of 4-methoxybenzyl 3-nitro-2-pyridyl sulfide 2-chloro-3-nitropyridine 2.18 g (13.8)
Mmol) and 4-methoxyphenylmethanethiol 2.
5 ml (21.3 mmol), triethylamine 2.5
After dissolving ml (21.3 mmol) in 10 ml of methanol and heating under reflux for 4 hours, the solvent was distilled off under reduced pressure, and the residue was purified by silica gel column chromatography using chloroform as an eluent to obtain 3.54 g of the desired product ( Yield 9
3%) was obtained. Melting point 89.2 to 90.0 ° C Elemental analysis CHNS Calculated value 56.51 4.38 10.14 11.60 Measured value 56.80 4.31 10.15 11.44

【0013】(2)Npys基で保護した化合物の合成 Fmoc−Cys(Npys)−OHの合成 (1)で得られた4−メトキシベンジル 3−ニトロ−
2−ピリジル スルフィド103mg(0.37ミリモ
ル)をジクロロメタン0.5mlに溶解し、アルゴンガ
ス雰囲気下、0°Cで塩化スルフリル0.03ml
(0.48ミリモル)を加え、室温で20分間攪拌し
た。系内をアルゴンガスで充分置換した後、この溶液に
Fmoc−Cys(MBzl)−OH(Fmocは9−
フルオレニルメチルオキシカルボニル基を表し、Cys
はシステイン残基を表す)116mg(0.25ミリモ
ル)をジクロロメタン12.5mlに溶解させた溶液を
加え、30分間攪拌した後、溶媒留去した。得られた残
渣に酢酸エチル溶液を加えて溶解し、5%クエン酸水溶
液、水、飽和食塩水の順に洗浄し、乾燥剤を用いて乾燥
後、溶媒を留去し、クロロホルム:メタノール=22:
5を展開溶媒とするカラムクロマトグラフィーで精製
し、目的物107mg(収率86%)を得た。 融点1
70.0〜171.0°C 〔α〕D 27−74.1°
(cl,DMF)1 H−NMR(CDCl3 ) δ=3.1−3.3(2H,d,β−CH2 )、4.2
(1H,t,CH)、4.3−4.5(3H,m,α−
CH,CH2 )、6.2−6.4(1H,br,N
H)、7.1−7.9(10H,m,Ar−H)、8.
5(1H,d)、9.9−10.2(1H,br,CO
OH)
(2) Synthesis of compound protected with Npys group Synthesis of Fmoc-Cys (Npys) -OH 4-methoxybenzyl 3-nitro-obtained in (1)
103 mg (0.37 mmol) of 2-pyridyl sulfide was dissolved in 0.5 ml of dichloromethane, and sulfuryl chloride 0.03 ml was added at 0 ° C under an argon gas atmosphere.
(0.48 mmol) was added, and the mixture was stirred at room temperature for 20 minutes. After the system was sufficiently replaced with argon gas, Fmoc-Cys (MBzl) -OH (Fmoc was 9-
Represents a fluorenylmethyloxycarbonyl group, Cys
Represents a cysteine residue) was added to a solution of 116 mg (0.25 mmol) in 12.5 ml of dichloromethane, the mixture was stirred for 30 minutes, and the solvent was distilled off. An ethyl acetate solution was added to the obtained residue to dissolve it, which was washed with 5% citric acid aqueous solution, water, and saturated saline solution in this order, dried with a desiccant, and then the solvent was distilled off. Chloroform: methanol = 22:
Purification by column chromatography using 5 as a developing solvent gave 107 mg (yield 86%) of the desired product. Melting point 1
70.0 to 171.0 ° C [α] D 27 -74.1 °
(Cl, DMF) 1 H-NMR (CDCl 3 ) δ = 3.1-3.3 (2H, d, β-CH 2 ), 4.2
(1H, t, CH), 4.3-4.5 (3H, m, α-
CH, CH 2), 6.2-6.4 ( 1H, br, N
H), 7.1-7.9 (10H, m, Ar-H), 8.
5 (1H, d), 9.9-10.2 (1H, br, CO
OH)

【0014】Boc−Cys(Npys)−OHの合
成 と同様の方法でBoc−Cys(MBzl)−OH
(Bocはt−ブトキシカルボニル基を表す)341m
g(1.0ミリモル)を反応させ、目的物324mg
(収率86%)を得た。 融点153.0〜158.0
°C 〔α〕D 26−85.6°(cl,CH3 OH)、1 H−NMR(CDCl3 ) δ=1.4(9H,s,t Bu)、3.2−3.4(2
H,d,β−CH2)、4.2−4.3(1H,br,
α−CH)、6.2−6.3(1H,br,NH)、
7.5(1H,dd)、8.5(1H,dd)、8.9
(1H,dd)、9.0−9.2(1H,br,COO
H)
Boc-Cys (MBzl) -OH was prepared in the same manner as in the synthesis of Boc-Cys (Npys) -OH.
(Boc represents a t-butoxycarbonyl group) 341 m
324 mg of the target product was reacted with g (1.0 mmol).
(Yield 86%) was obtained. Melting point 153.0-158.0
° C [α] D 26 -85.6 ° (cl, CH 3 OH), 1 H-NMR (CDCl 3 ) δ = 1.4 (9H, s, t Bu), 3.2-3.4 ( Two
H, d, β-CH 2 ), 4.2-4.3 (1H, br,
α-CH), 6.2-6.3 (1H, br, NH),
7.5 (1H, dd), 8.5 (1H, dd), 8.9
(1H, dd), 9.0-9.2 (1H, br, COO
H)

【0015】Boc−D−Pen(Npys)−OH
の合成 (1)で得られた4─メトキシベンジル 3−ニトロ−
2−ピリジル スルフィド899mg(3.28ミリモ
ル)をジクロロメタン4.3mlに溶解し、アルゴンガ
ス雰囲気下、0°Cで塩化スルフリル0.26ml
(4.20ミリモル)を加え、室温で20分間攪拌し
た。系内をアルゴンガスで充分置換した後、この溶液に
Boc−D−Pen(MBzl)−OH(D−Penは
D−ペニシルアミン残基を表す)807mg(2.19
ミリモル)をジクロロメタン110mlに溶解させた溶
液を加え、30分間攪拌した後、溶媒留去した。得られ
た残渣に酢酸エチル溶液を加えて溶解し、5%クエン酸
水溶液、飽和食塩水の順に洗浄し、乾燥剤を用いて乾燥
後、溶媒を留去し、クロロホルム:メタノール=22:
5を展開溶媒とするカラムクロマトグラフィーで精製
し、目的物621mg(収率70%)を得た。 融点1
55.5〜158.5°C 〔α〕D 25−29.0°
(cl,C2 5 OH)1 H−NMR(CDCl3 ) δ=1.2−1.6(15H,m,t Bu,CH3 )、
4.1−4.2(1H,br,α−CH)、6.2−
6.3(1H,br,NH)、7.45(1H,d
d)、8.6(1H,dd)、8.9(1H,dd)、
9.9−10.2(1H,br,COOH) 元素分析 C H N 計算値 44.65 5.25 10.41 実測値 44.51 5.19 10.41
Boc-D-Pen (Npys) -OH
Synthesis of 4-methoxybenzyl 3-nitro-obtained in (1)
899 mg (3.28 mmol) of 2-pyridyl sulfide was dissolved in 4.3 ml of dichloromethane, and 0.26 ml of sulfuryl chloride was added at 0 ° C under an argon gas atmosphere.
(4.20 mmol) was added, and the mixture was stirred at room temperature for 20 minutes. After thoroughly replacing the system with argon gas, Boc-D-Pen (MBzl) -OH (D-Pen represents a D-penicylamine residue) 807 mg (2.19) was added to this solution.
Was added to 110 ml of dichloromethane, the mixture was stirred for 30 minutes, and then the solvent was distilled off. An ethyl acetate solution was added to the obtained residue to dissolve it, which was washed with a 5% citric acid aqueous solution and a saturated saline solution in this order, dried with a desiccant, and then the solvent was distilled off. Chloroform: methanol = 22:
Purification by column chromatography using 5 as a developing solvent gave 621 mg of the desired product (yield 70%). Melting point 1
55.5 to 158.5 ° C [α] D 25 −29.0 °
(Cl, C 2 H 5 OH ) 1 H-NMR (CDCl 3) δ = 1.2-1.6 (15H, m, t Bu, CH 3),
4.1-4.2 (1H, br, α-CH), 6.2-
6.3 (1H, br, NH), 7.45 (1H, d
d), 8.6 (1H, dd), 8.9 (1H, dd),
9.9-10.2 (1H, br, COOH) Elemental analysis CHN Calculated value 44.65 5.25 10.41 Measured value 44.51 5.19 10.41

【0016】Fmoc−D−Pen(Npys)−O
Hの合成 Fmoc−D−Pen(MBzl)−OHを前記と同
様の方法で反応させ、目的物413mg(収率78%)
を得た。 融点113.0〜116.0°C 〔α〕D 27−13.6°(cl,DMF)1 H−NMR(CDCl3 ) δ=1.4(6H,d,CH3 )、4.2(1H,t,
CH)、4.3−4.5(3H,m,α−H,C
2 )、6.2−6.4(1H,br,NH)、7.1
−7.9(10H,m,Ar−H)、8.5(1H,
d)、8.9(1H,dd)、9.8−10.0(1
H,br,COOH)
Fmoc-D-Pen (Npys) -O
Synthesis of H Fmoc-D-Pen (MBzl) -OH was reacted in the same manner as above to obtain 413 mg of the desired product (yield 78%).
Got Melting point 113.0-116.0 ° C [α] D 27 -13.6 ° (cl, DMF) 1 H-NMR (CDCl 3 ) δ = 1.4 (6H, d, CH 3 ), 4.2 (1H, t,
CH), 4.3-4.5 (3H, m, α-H, C
H 2), 6.2-6.4 (1H, br, NH), 7.1
-7.9 (10H, m, Ar-H), 8.5 (1H,
d), 8.9 (1H, dd), 9.8-10.0 (1
H, br, COOH)

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成5年2月26日[Submission date] February 26, 1993

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0013[Correction target item name] 0013

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0013】(2)Npys基で保護した化合物の合成 Fmoc−Cys(Npys)−OHの合成 (1)で得られた4−メトキシベンジル 3−ニトロ−
2−ピリジル スルフィド103mg(0.37ミリモ
ル)をジクロロメタン0.5mlに溶解し、アルゴンガ
ス雰囲気下、0°Cで塩化スルフリル0.03ml
(0.48ミリモル)を加え、室温で20分間攪拌し
た。系内をアルゴンガスで充分置換した後、この溶液に
Fmoc−Cys(MBzl)−OH(Fmocは9−
フルオレニルメチルオキシカルボニル基を表し、Cys
はシステイン残基を表す)116mg(0.25ミリモ
ル)をジクロロメタン12.5mlに溶解させた溶液を
加え、30分間攪拌した後、溶媒留去した。得られた残
渣に酢酸エチル溶液を加えて溶解し、5%クエン酸水溶
液、水飽和食塩水(1:1)の順に洗浄し、乾燥剤を
用いて乾燥後、溶媒を留去し、クロロホルム:メタノー
ル=22:5を展開溶媒とするカラムクロマトグラフィ
ーで精製し、目的物107mg(収率86%)を得た。
融点170.0〜171.0°C 〔α〕D 27−7
4.1°(cl,DMF)1 H−NMR(CDCl3 ) δ=3.1−3.3(2H,d,β−CH2 )、4.2
(1H,t,CH)、4.3−4.5(3H,m,α−
CH,CH2 )、6.2−6.4(1H,br,N
H)、7.1−7.9(10H,m,Ar−H)、8.
5(1H,d)、8.9(1H,d)、9.9−10.
2(1H,br,COOH)
(2) Synthesis of compound protected with Npys group Synthesis of Fmoc-Cys (Npys) -OH 4-methoxybenzyl 3-nitro-obtained in (1)
103 mg (0.37 mmol) of 2-pyridyl sulfide was dissolved in 0.5 ml of dichloromethane, and sulfuryl chloride 0.03 ml was added at 0 ° C under an argon gas atmosphere.
(0.48 mmol) was added, and the mixture was stirred at room temperature for 20 minutes. After the system was sufficiently replaced with argon gas, Fmoc-Cys (MBzl) -OH (Fmoc was 9-
Represents a fluorenylmethyloxycarbonyl group, Cys
Represents a cysteine residue) was added to a solution of 116 mg (0.25 mmol) in 12.5 ml of dichloromethane, the mixture was stirred for 30 minutes, and the solvent was distilled off. An ethyl acetate solution was added to the obtained residue to dissolve it, and the solution was washed with 5% citric acid aqueous solution and water / saturated saline solution (1: 1) in this order, dried with a desiccant, and then the solvent was distilled off, followed by chloroform. : Methanol = 22: 5 was used as a developing solvent for purification to obtain 107 mg (yield 86%) of the desired product.
Mp from 170.0 to 171.0 ° C [α] D 27 -7
4.1 ° (cl, DMF) 1 H-NMR (CDCl 3 ) δ = 3.1-3.3 (2H, d, β-CH 2 ), 4.2
(1H, t, CH), 4.3-4.5 (3H, m, α-
CH, CH 2), 6.2-6.4 ( 1H, br, N
H), 7.1-7.9 (10H, m, Ar-H), 8.
5 (1H, d), 8.9 (1H, d), 9.9-10.
2 (1H, br, COOH)

【手続補正2】[Procedure Amendment 2]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0015[Name of item to be corrected] 0015

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0015】Boc−D−Pen(Npys)−OH
の合成 (1)で得られた4─メトキシベンジル 3−ニトロ−
2−ピリジル スルフィド899mg(3.28ミリモ
ル)をジクロロメタン4.3mlに溶解し、アルゴンガ
ス雰囲気下、0°Cで塩化スルフリル0.26ml
(4.20ミリモル)を加え、室温で20分間攪拌し
た。系内をアルゴンガスで充分置換した後、この溶液に
Boc−D−Pen(MBzl)−OH(D−Penは
D−ペニシルアミン残基を表す)807mg(2.19
ミリモル)をジクロロメタン110mlに溶解させた溶
液を加え、30分間攪拌した後、溶媒留去した。得られ
た残渣に酢酸エチル溶液を加えて溶解し、5%クエン酸
水溶液、水/飽和食塩水(1:1)の順に洗浄し、乾燥
剤を用いて乾燥後、溶媒を留去し、クロロホルム:メタ
ノール=22:5を展開溶媒とするカラムクロマトグラ
フィーで精製し、目的物621mg(収率70%)を得
た。 融点155.5〜158.5°C 〔α〕D 25
29.0°(cl,C2 5 OH)1 H−NMR(CDCl3 ) δ=1.2−1.6(15H,m,t Bu,CH3 )、
4.1−4.2(1H,br,α−CH)、6.2−
6.3(1H,br,NH)、7.45(1H,d
d)、8.6(1H,dd)、8.9(1H,dd)、
9.9−10.2(1H,br,COOH) 元素分析 C H N 計算値 44.65 5.25 10.41 実測値 44.51 5.19 10.41
Boc-D-Pen (Npys) -OH
Synthesis of 4-methoxybenzyl 3-nitro-obtained in (1)
899 mg (3.28 mmol) of 2-pyridyl sulfide was dissolved in 4.3 ml of dichloromethane, and 0.26 ml of sulfuryl chloride was added at 0 ° C under an argon gas atmosphere.
(4.20 mmol) was added, and the mixture was stirred at room temperature for 20 minutes. After thoroughly replacing the system with argon gas, Boc-D-Pen (MBzl) -OH (D-Pen represents a D-penicylamine residue) 807 mg (2.19) was added to this solution.
Was added to 110 ml of dichloromethane, the mixture was stirred for 30 minutes, and then the solvent was distilled off. An ethyl acetate solution was added to the obtained residue to dissolve it, and the solution was washed with 5% citric acid aqueous solution and water / saturated saline solution (1: 1) in this order, dried with a desiccant, and then the solvent was distilled off, followed by chloroform. Purification by column chromatography using methanol: 22: 5 as a developing solvent gave 621 mg of the desired product (yield 70%). Melting point 155.5 to 158.5 ° C. [α] D 25
29.0 ° (cl, C 2 H 5 OH) 1 H-NMR (CDCl 3 ) δ = 1.2-1.6 (15H, m, t Bu, CH 3 ),
4.1-4.2 (1H, br, α-CH), 6.2-
6.3 (1H, br, NH), 7.45 (1H, d
d), 8.6 (1H, dd), 8.9 (1H, dd),
9.9-10.2 (1H, br, COOH) Elemental analysis CHN Calculated value 44.65 5.25 10.41 Measured value 44.51 5.19 10.41

【手続補正3】[Procedure 3]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0016[Correction target item name] 0016

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0016】Fmoc−D−Pen(Npys)−O
Hの合成 Fmoc−D−Pen(MBzl)−OHを前記と同
様の方法で反応させ、目的物413mg(収率78%)
を得た。 融点113.0〜116.0°C 〔α〕D 27 13.6°(cl,DMF)1 H−NMR(CDCl3 ) δ=1.4(6H,d,CH3 )、4.2(1H,t,
CH)、4.3−4.5(3H,m,α−H,C
2 )、6.2−6.4(1H,br,NH)、7.1
−7.9(10H,m,Ar−H)、8.5(1H,
d)、8.9(1H,d)、9.8−10.0(1H,
br,COOH)
Fmoc-D-Pen (Npys) -O
Synthesis of H Fmoc-D-Pen (MBzl) -OH was reacted in the same manner as above to obtain 413 mg of the desired product (yield 78%).
Got Melting point 113.0-116.0 ° C. [α] D 27 13.6 ° (cl, DMF) 1 H-NMR (CDCl 3 ) δ = 1.4 (6H, d, CH 3 ), 4.2 ( 1H, t,
CH), 4.3-4.5 (3H, m, α-H, C
H 2), 6.2-6.4 (1H, br, NH), 7.1
-7.9 (10H, m, Ar-H), 8.5 (1H,
d), 8.9 (1H, d) , 9.8-10.0 (1H,
br, COOH)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 下記一般式(II)で示されるベンジル
3−ニトロ−2−ピリジル スルフィド類と塩化スルフ
リルを反応させて得られる下記式(III) で示される3−
ニトロ−2−ピリジンスルフェニル クロライドを単離
することなく、下記一般式(IV)で示されるSH基を保
護したチオール化合物と反応させることを特徴とする下
記一般式(I)で示される3−ニトロ−2−ピリジンス
ルフェニル基で保護されたチオール保護誘導体の製造方
法。 【化1】 式中、Rは水素原子、アルキル基又はアルコキシ基を表
す。Aは保護アミノ酸残基あるいは保護アミノ酸残基を
含むペプチドを表す。Xはペプチド合成等に用いられる
チオール保護基を表す。
1. A benzyl compound represented by the following general formula (II):
3-nitro-2-pyridyl sulfides represented by the following formula (III) obtained by reacting sulfuryl chloride
Nitro-2-pyridinesulfenyl chloride is reacted with a thiol compound having a protected SH group represented by the following general formula (IV) without isolation, and a compound represented by the following general formula (I) is represented by 3- A method for producing a thiol-protected derivative protected with a nitro-2-pyridinesulfenyl group. [Chemical 1] In the formula, R represents a hydrogen atom, an alkyl group or an alkoxy group. A represents a protected amino acid residue or a peptide containing a protected amino acid residue. X represents a thiol protecting group used for peptide synthesis and the like.
JP5040675A 1993-02-05 1993-02-05 Production of thiol-protecting derivative Pending JPH06228099A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5040675A JPH06228099A (en) 1993-02-05 1993-02-05 Production of thiol-protecting derivative

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5040675A JPH06228099A (en) 1993-02-05 1993-02-05 Production of thiol-protecting derivative

Publications (1)

Publication Number Publication Date
JPH06228099A true JPH06228099A (en) 1994-08-16

Family

ID=12587108

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5040675A Pending JPH06228099A (en) 1993-02-05 1993-02-05 Production of thiol-protecting derivative

Country Status (1)

Country Link
JP (1) JPH06228099A (en)

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