JPH06227808A - Method for purifying metallic silicon - Google Patents

Method for purifying metallic silicon

Info

Publication number
JPH06227808A
JPH06227808A JP5017292A JP1729293A JPH06227808A JP H06227808 A JPH06227808 A JP H06227808A JP 5017292 A JP5017292 A JP 5017292A JP 1729293 A JP1729293 A JP 1729293A JP H06227808 A JPH06227808 A JP H06227808A
Authority
JP
Japan
Prior art keywords
silicon
atmosphere
metallic
metallic silicon
nonoxidizing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5017292A
Other languages
Japanese (ja)
Other versions
JP2905353B2 (en
Inventor
Yasuhiko Sakaguchi
泰彦 阪口
Kenkichi Yushimo
憲吉 湯下
Hiroyuki Baba
裕幸 馬場
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP5017292A priority Critical patent/JP2905353B2/en
Publication of JPH06227808A publication Critical patent/JPH06227808A/en
Application granted granted Critical
Publication of JP2905353B2 publication Critical patent/JP2905353B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Silicon Compounds (AREA)
  • Photovoltaic Devices (AREA)

Abstract

PURPOSE:To enable the mass production of high-purity silicon in a short time at a low cost by charging metallic silicon into a crucible nonoxidizing the metallic silicon, melting the metallic silicon in a nonoxidizing atmosphere and then keeping the silicon in this molten state in the atmosphere under a reduced pressure. CONSTITUTION:Metallic silicon is purified. In the process, the silicon is charged into a crucible nonoxidizing the silicon and then melted in a nonoxidizing atmosphere. The resultant silicon in this molten state is kept in the atmosphere under a reduced pressure of <=10Pa to carry out the purification of the metallic silicon. P, As, Ca, O, N, etc., can be removed to <=1ppm content according to this method for purification and the yield of the silicon after purification thereof is high. The high-purity silicon can be mass-produced at a low cost in a short time by using inexpensive metallurgical silicon as a starting raw material. Thereby, the cost of a solar cell heretofore using conventional expensive silicon for semiconductors can be reduced.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は太陽電池等の製造に用い
る高純度金属シリコンの製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing high-purity metallic silicon used for producing solar cells and the like.

【0002】[0002]

【従来の技術】太陽電池の製造に用いるシリコン中の
B、P、C、O、Fe、Al、Ti等の不純物元素は所要の半
導体特性を確保するため、1ppmw以下の低い濃度にする
必要がある。このため、現在の太陽電池製造用原料とし
てのシリコンには、半導体原料として製造された過度に
精製されたシリコンが用いられている。しかし半導体用
のシリコンは高価なために太陽電池の普及の妨げとなっ
ている。
2. Description of the Related Art Impurity elements such as B, P, C, O, Fe, Al, and Ti in silicon used for manufacturing solar cells must have a low concentration of 1 ppmw or less in order to secure required semiconductor characteristics. is there. Therefore, as the current silicon as a raw material for solar cell production, excessively refined silicon produced as a semiconductor raw material is used. However, since silicon for semiconductors is expensive, it has hindered the spread of solar cells.

【0003】そこで、太陽電池用のシリコンを安価に製
造するために冶金用の安価な金属シリコンを原料とし
て、これを精製する方法について種々の提案がなされて
おり、酸抽出法、フラックス溶解法、真空溶解法等が報
告されている。しかし、シリコン中のPの除去法につい
ては、いずれもその効果的で具体的な方策について何ら
提案されていない。
Therefore, in order to inexpensively produce silicon for solar cells, various proposals have been made on a method of refining inexpensive metallic silicon for metallurgy as a raw material, such as acid extraction method, flux melting method, The vacuum melting method and the like have been reported. However, none of the methods for removing P in silicon has been proposed for its effective and concrete measures.

【0004】[0004]

【発明が解決しようとする課題】シリコン中のPの除去
において、酸抽出法はシリコンを溶解、凝固する時にP
を重金属元素といっしょにシリコンの結晶粒界に析出さ
せ、これを酸抽出するもので、酸抽出する前にシリコン
塊をできるだけ細かく粉砕する必要があり、また、酸抽
出後洗浄する必要があるので工程が多くなりコストが大
きくなるという問題がある。
In the removal of P in silicon, the acid extraction method is used when the silicon is dissolved and solidified.
Is precipitated on the crystal grain boundaries of silicon together with heavy metal elements, and this is subjected to acid extraction.Since it is necessary to grind the silicon mass as finely as possible before acid extraction, and it is also necessary to wash it after acid extraction. There is a problem that the number of processes increases and the cost increases.

【0005】また、フラックス処理法の場合、Pを1pp
mw以下まで除去するにはフラックス量がシリコン同量か
あるいはそれ以上必要となり、フラックスを取り除く工
程やシリコン中に溶解したフラックス成分を取り除く工
程が必要となり、工程的にもコスト的にもメリットが少
ない。一方、真空溶解法は鈴木等が“日本金属学会誌
第54巻 第2号(1990)161 〜167 ”で報告しているよう
に蒸気圧の高いPを真空雰囲気にして蒸発除去する方法
である。この方法は10-3Paという高真空でPを除去する
方法である。この方法では、ルツボや雰囲気については
述べていないが、減圧雰囲気でシリコンを処理している
特開昭62−292613号公報では、石英製のルツボを用いて
いる。しかし、このような方法では、石英とシリコンが
反応し、シリコンの歩留りが低下するという問題があっ
た。
In the case of the flux processing method, P is 1 pp
In order to remove up to mw or less, the amount of flux is the same as or more than that of silicon, and the process of removing flux and the process of removing flux components dissolved in silicon are required, and there is little merit in process and cost. . On the other hand, Suzuki et al.
As reported in Vol. 54, No. 2 (1990) 161-167 ", it is a method of evaporating and removing P with high vapor pressure in a vacuum atmosphere. This method removes P in a high vacuum of 10 -3 Pa. In this method, a crucible made of quartz is used in JP-A-62-292613, which treats silicon in a reduced pressure atmosphere, although the crucible and the atmosphere are not described in this method. In such a method, there is a problem that quartz and silicon react with each other and the yield of silicon decreases.

【0006】本発明は、前記問題点を解決し、さらに今
まで精製法が提案されていないシリコン中のAs、Oなど
の不純物元素を除去する金属シリコンの精製方法を提供
することを目的とするものである。
An object of the present invention is to solve the above problems and to provide a method for refining metallic silicon by removing impurity elements such as As and O in silicon for which no refining method has been proposed so far. It is a thing.

【0007】[0007]

【課題を解決するための手段】本発明は前記問題点を解
決するために、黒鉛や銅等の非酸化性ルツボ内でシリコ
ンを溶解し、Ar、N2 、H2 等の非酸化性ガス雰囲気で
10Pa以下の減圧雰囲気に保持することにより効果的に金
属シリコンより、Pを除去できることを見出した。
In order to solve the above problems, the present invention solves the above problems by dissolving silicon in a non-oxidizing crucible such as graphite or copper to obtain a non-oxidizing gas such as Ar, N 2 or H 2. In the atmosphere
It has been found that P can be effectively removed from metallic silicon by maintaining a reduced pressure atmosphere of 10 Pa or less.

【0008】すなわち、本発明は、金属シリコンを精製
するに際して、シリコンをシリコンに対して非酸化性の
ルツボに装入し、非酸化性雰囲気下で溶融し、溶融して
いる状態下で10Pa以下の減圧雰囲気に保つことを特徴と
する金属シリコンの精製方法である。
That is, according to the present invention, when refining metallic silicon, silicon is charged into a crucible that is non-oxidizing with respect to silicon, melted in a non-oxidizing atmosphere, and 10 Pa or less in a molten state. The method for refining metallic silicon is characterized in that it is maintained in a reduced pressure atmosphere.

【0009】[0009]

【作用】シリコン中に含まれているP、As、Ca等の蒸気
圧の高い成分やO、N等のガス成分を除去するには溶解
したシリコンを真空状態に保持することが有効である。
前述した鈴木等は0.027Pa という高真空に保つことでP
の濃度を32ppmwから6〜7ppmwに低減している。しかし
ここでは、黒鉛ルツボを用いているが、他のルツボやガ
ス雰囲気の影響については述べていない。
In order to remove components having a high vapor pressure such as P, As and Ca and gas components such as O and N contained in silicon, it is effective to hold the melted silicon in a vacuum state.
By maintaining a high vacuum of 0.027Pa, Suzuki et al.
The concentration of is reduced from 32 ppmw to 6 to 7 ppmw. However, although the graphite crucible is used here, the influence of other crucibles and gas atmosphere is not described.

【0010】シリコンを酸化性雰囲気で溶解した場合、
シリコン浴面にシリカの皮膜ができる。このような状態
で減圧すると、シリコン浴面で、Si+SiO2→2SiO の反
応が進み、シリコンがSiO ガスの形で蒸発する。一方、
Pはシリコン浴面から気相への蒸発によって除去が進む
が、シリコン浴面にシリカ皮膜があるとPのシリコンか
らシリカへの移動、シリカから気相への移動がある。こ
のため、酸化雰囲気でシリコンを減圧した場合、シリコ
ンの歩留りが低下し、Pの除去速度が低下する。
When silicon is dissolved in an oxidizing atmosphere,
A silica film is formed on the silicon bath surface. When the pressure is reduced in such a state, the reaction of Si + SiO 2 → 2SiO 2 proceeds on the silicon bath surface, and silicon is evaporated in the form of SiO 2 gas. on the other hand,
P is removed by evaporation from the silicon bath surface to the gas phase, but if there is a silica coating on the silicon bath surface, there is transfer of P from silicon to silica and from silica to the gas phase. Therefore, when the pressure of silicon is reduced in an oxidizing atmosphere, the yield of silicon is reduced and the removal rate of P is reduced.

【0011】従って、以上のことから、Pを除去する場
合、非酸化性雰囲気に保つ必要がある。更に、このよう
な条件で減圧した場合の真空度とPの低減量との関係を
図1に示す。該図は黒鉛ルツボ、Ar雰囲気でPが30ppmw
含まれるシリコンを 100g、所定の圧力、1500℃で溶解
し、1時間保持した後のPの低減量を示したものであ
る。図より10Paを超える圧力ではPはほとんど除去でき
ないが、10Pa以下に減圧するとPが除去できることがわ
かる。同様の傾向がAs、Ca等の蒸気圧の高い元素やO、
N等のガス成分についてみられた。
Therefore, from the above, when removing P, it is necessary to maintain a non-oxidizing atmosphere. Furthermore, FIG. 1 shows the relationship between the degree of vacuum and the reduction amount of P when the pressure is reduced under such conditions. This figure shows a graphite crucible with P of 30ppmw in Ar atmosphere.
This is a graph showing the amount of reduction of P after 100 g of silicon contained was melted at 1500 ° C. under a predetermined pressure and kept for 1 hour. It can be seen from the figure that P can hardly be removed at a pressure exceeding 10 Pa, but P can be removed by reducing the pressure to 10 Pa or less. The same tendency applies to elements with high vapor pressure such as As and Ca and O,
It was observed for gas components such as N.

【0012】以上のことから歩留りよくシリコンから
P、As、Ca、O、N等の元素を除去するには黒鉛や銅等
の非酸化性ルツボを用いて、Ar、N2 、H2 等の非酸化
性ガス雰囲気で10Pa以下に減圧することがよいことが分
かる。
From the above, in order to remove elements such as P, As, Ca, O and N from silicon with a good yield, non-oxidizing crucibles such as graphite and copper are used to remove Ar, N 2 , H 2 and the like. It is understood that it is preferable to reduce the pressure to 10 Pa or less in a non-oxidizing gas atmosphere.

【0013】[0013]

【実施例】表2に示す組成の原料金属シリコンを夫々 1
00g表1に示すルツボにとり真空溶解炉(50kw)にて表
1に示す雰囲気で溶解した後、1500℃で表1に示す所定
圧力で1時間保持した。その時の金属シリコン組成も併
せて表2に示す。
[Embodiment] Each of the raw material metal silicon having the composition shown in Table 1
00 g The crucible shown in Table 1 was melted in a vacuum melting furnace (50 kw) in the atmosphere shown in Table 1, and then held at 1500 ° C. at the predetermined pressure shown in Table 1 for 1 hour. The metallic silicon composition at that time is also shown in Table 2.

【0014】[0014]

【表1】 [Table 1]

【0015】[0015]

【表2】 [Table 2]

【0016】本発明によれば、P、As、Ca、O、Nなど
を1ppmw以下まで除去することが可能であることを示し
ている。またシリコンの精製後の歩留りも高いことが分
かる。
According to the present invention, it has been shown that P, As, Ca, O, N and the like can be removed up to 1 ppmw or less. Further, it is understood that the yield after refining silicon is high.

【0017】[0017]

【発明の効果】本発明は安価な冶金用シリコンを出発原
料としてP、As、Ca、O、N等の含有量の低い高純度シ
リコンを短時間で安価に量産することができ、従来の高
価な半導体用シリコンを用いていた太陽電池の低コスト
化が可能となる。これによって太陽電池の利用を大きく
進展させることができ、社会的にも多大の貢献をもたら
す。
INDUSTRIAL APPLICABILITY According to the present invention, high-purity silicon having a low content of P, As, Ca, O, N, etc. can be mass-produced at low cost in a short time using inexpensive metallurgical silicon as a starting material. It is possible to reduce the cost of a solar cell that uses silicon for semiconductors. As a result, the use of solar cells can be greatly advanced, and a great social contribution will be brought about.

【図面の簡単な説明】[Brief description of drawings]

【図1】真空度とPの除去量との関係を示すグラフ。FIG. 1 is a graph showing the relationship between the degree of vacuum and the amount of P removed.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 金属シリコンを精製するに際して、シリ
コンをシリコンに対して非酸化性のルツボに装入し、非
酸化性雰囲気下で溶融し、溶融している状態下で10Pa以
下の減圧雰囲気に保つことを特徴とする金属シリコンの
精製方法。
1. When refining metallic silicon, silicon is charged into a crucible that is non-oxidizing with respect to silicon, melted in a non-oxidizing atmosphere, and a reduced pressure atmosphere of 10 Pa or less is maintained in the molten state. A method for refining metallic silicon, characterized in that it is kept.
JP5017292A 1993-02-04 1993-02-04 Purification method of metallic silicon Expired - Fee Related JP2905353B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5017292A JP2905353B2 (en) 1993-02-04 1993-02-04 Purification method of metallic silicon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5017292A JP2905353B2 (en) 1993-02-04 1993-02-04 Purification method of metallic silicon

Publications (2)

Publication Number Publication Date
JPH06227808A true JPH06227808A (en) 1994-08-16
JP2905353B2 JP2905353B2 (en) 1999-06-14

Family

ID=11939922

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5017292A Expired - Fee Related JP2905353B2 (en) 1993-02-04 1993-02-04 Purification method of metallic silicon

Country Status (1)

Country Link
JP (1) JP2905353B2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0867405A1 (en) * 1997-03-24 1998-09-30 Kawasaki Steel Corporation Method for producing silicon for use in solar cells
US5961944A (en) * 1996-10-14 1999-10-05 Kawasaki Steel Corporation Process and apparatus for manufacturing polycrystalline silicon, and process for manufacturing silicon wafer for solar cell
JP2005206442A (en) * 2004-01-26 2005-08-04 Nippon Steel Corp Silicon purification method
JP2005206440A (en) * 2004-01-26 2005-08-04 Nippon Steel Corp Production method for high-purity silicon
US7625541B2 (en) 2004-12-09 2009-12-01 Sharp Kabushiki Kaisha Method for purifying silicon and silicon
US7811356B2 (en) 2004-07-14 2010-10-12 Sharp Kabushiki Kaisha Method of purifying metal
JP2010235322A (en) * 2009-03-30 2010-10-21 Cosmo Oil Co Ltd Production method of polycrystalline silicon ingot
US8668895B2 (en) 2007-06-26 2014-03-11 Panasonic Corporation Purifying method for metallic silicon and manufacturing method of silicon ingot

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101948113B (en) * 2010-09-19 2014-01-01 江西盛丰新能源科技有限公司 Method and equipment for preparing polycrystalline silicon through physical phosphorous removal

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5961944A (en) * 1996-10-14 1999-10-05 Kawasaki Steel Corporation Process and apparatus for manufacturing polycrystalline silicon, and process for manufacturing silicon wafer for solar cell
EP0867405A1 (en) * 1997-03-24 1998-09-30 Kawasaki Steel Corporation Method for producing silicon for use in solar cells
US6090361A (en) * 1997-03-24 2000-07-18 Kawasaki Steel Corporation Method for producing silicon for use in solar cells
JP2005206442A (en) * 2004-01-26 2005-08-04 Nippon Steel Corp Silicon purification method
JP2005206440A (en) * 2004-01-26 2005-08-04 Nippon Steel Corp Production method for high-purity silicon
US7811356B2 (en) 2004-07-14 2010-10-12 Sharp Kabushiki Kaisha Method of purifying metal
US7625541B2 (en) 2004-12-09 2009-12-01 Sharp Kabushiki Kaisha Method for purifying silicon and silicon
US8668895B2 (en) 2007-06-26 2014-03-11 Panasonic Corporation Purifying method for metallic silicon and manufacturing method of silicon ingot
JP2010235322A (en) * 2009-03-30 2010-10-21 Cosmo Oil Co Ltd Production method of polycrystalline silicon ingot

Also Published As

Publication number Publication date
JP2905353B2 (en) 1999-06-14

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