JPH06218158A - Wappen embroidery data generating device - Google Patents

Abstract

PURPOSE:To generate a wappen embroidery rough sketch without being aware so much of a wappen picture pattern outer frame. CONSTITUTION:An image read-in device 2 reads in a wappen embroidery rough sketch as a two-dimensional image. In the wappen embroidery rough sketch, a wappen embroidery picture pattern outer frame is not always required. A wappen picture pattern memory 4 stores the read-in two-dimensional image. A wappen outer frame memory 5 stores data related to the wappen picture pattern outer frame. A display confirming device 7 displays the two-dimensional image together with the wappen picture pattern outer frame in order to predict a wappen completion state. The wappen outer frame is separate from the wappen embroidery rough sketch, therefore, it is unnecessary to be aware so much of the wappen picture pattern outer frame.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a patch embroidery data generation apparatus for creating the embroidery data used when embroidering a patch with a sewing machine that performs embroidery according to the embroidery data.

[0002]

2. Description of the Related Art LSI (large scale integrated circu
There are remarkable advances in various digital technologies such as design technology and manufacturing technology. For example, in recent years, a very high performance CPU (central processing unit)
) Is one chip. The integrated circuit of an electronic device has many advantages such as downsizing of the whole, improvement of reliability, and reduction of power consumption. In addition, in order to more easily integrate electronic devices into circuits, in recent years, CPUs and CPUs have been developed.
RAM (random access memory)
And memory such as ROM (read only memory) and I / O
An integrated circuit in which peripheral circuits such as (input output) are mounted on one chip is also widely used. In addition, in this way CP
A device equipped with a U or a device accessed by the CPU is hereinafter referred to as a one-chip microcomputer.

In an industrial sewing machine, various forms of sewing and
Various automation related to sewing, such as thread trimming, has been achieved, making it more versatile. For example, some embroidery is performed according to prestored embroidery data. Also, with respect to the domestic sewing machine, by mounting the one-chip microcomputer as described above, various functions are realized while being relatively compact.

For example, some household sewing machines can also perform relatively complicated embroidery. For example,
There is also provided a household sewing machine that can read an embroidery rough sketch drawn on a paper with a felt-tip pen or the like as a two-dimensional image with a handy scanner or the like and embroider a desired cloth based on the two-dimensional image. With such a sewing machine, the pattern to be embroidered can be easily designed by writing on paper.

For example, a patch that is sewn to the chest of clothes and generally has a relatively complicated design can be relatively easily embroidered by a beginner. The embroidery of such a patch is conventionally performed by reading the embroidery rough sketch in which the outer frame of the patch such as a circle or a rectangle is also drawn by the handy scanner as described above.
Such embroidery sketches for patches are performed by drawing a desired sketch on the inside of a preprinted emblem pattern outer frame.

[0006]

However, when embroidering a patch as described above with a sewing machine having an embroidery function, the sketch must be drawn as a patch embroidery sketch.

For example, as described above, it was necessary to draw an embroidery sketch for a patch on a predetermined paper on which the patch frame outer frame was printed in advance. Therefore, even with regard to the rough sketch that has already been drawn, it is necessary to be aware of the outer frame of the patch pattern, and it is necessary to redraw it for embroidery of the patch, which is troublesome. For example, when an illustration such as a magazine or a book is used as an emblem pattern, it is necessary to consider an outer frame of a predetermined emblem pattern, and perform enlargement or reduction copy, or a troublesome cutting and pasting work. It was

If the outer frame of the emblem and the sketch inside the outer emblem of the emblem are integrated and read by scanning and then enlarged or reduced, the entire emblem including the outer frame of the emblem is enlarged or reduced. For this reason, it was difficult to enlarge or reduce only the inner rough sketch. In addition, regarding the outer shape of the patch, the sewing direction suitable for this was not obtained, and the seams became unsightly.

The present invention has been made in order to solve the above-mentioned conventional problems, and does not necessarily require an emblem pattern outer frame on an embroidery sketch for emblem, and also pays close attention to the emblem pattern outer frame. It is an object of the present invention to provide a patch embroidery data creation device that can create an embroidery sketch for a badge without using it, and can relatively easily use, for example, a magazine illustration or the like as a patch pattern.

[0010]

SUMMARY OF THE INVENTION The present invention is an image reading device for reading an embroidery sketch for a patch as a two-dimensional image,
A patch pattern memory that stores the read two-dimensional image, a patch outer frame memory that stores the patch pattern outer frame data, and a display that displays the two-dimensional image together with the patch pattern outer frame in order to predict the completion status of the patch. By providing the confirmation device, the above-mentioned problems are achieved.

Further, in the patch embroidery data creating apparatus, the patch outer frame memory stores a plurality of types of the emblem pattern outer frames together with respective center positioning information. A mode switch for selecting one from the outer frame of the picture is provided, and the emblem picture memory is provided with the above-mentioned 2
By storing the three-dimensional image together with the center position information, the above-mentioned problems can be achieved, and various types of emblem pattern outer frames can be selected relatively easily. It is an improvement.

[0012]

The present invention has been made in order to more efficiently perform embroidery on embroidery, especially in the sewing machine having the functions increased and its performance improved in recent years, and in particular, the sewing machine having the embroidery function. Therefore, the present invention has a configuration that enables the user to more efficiently create the embroidery data that is required when the user embroiders the patch.

FIG. 1 is a block diagram showing the gist of the present invention.

As shown in FIG. 1, the emblem embroidery data creation apparatus of the present invention comprises an image reading apparatus 2, a patch picture memory 4, a patch outer frame memory 5, and a display confirmation apparatus 7. Also, if necessary, the mode switch 8
Equipped with.

The image reading device 2 reads the embroidery sketch for a patch as a two-dimensional image. The embroidery sketch for the patch is, for example, drawn on paper. The image reading device 2 is, for example, a handy scanner or a stationary scanner. The image reading device 2 may read the image as a monochrome image, or may read it as a color image.

The emblem pattern memory 4 stores the two-dimensional image read by the image reading device 2. The present invention does not specifically limit the storage form of the two-dimensional image in the patch pattern memory 4. For example, the emblem pattern memory 4 may be configured by a pattern data memory 4a and a center position information data memory 4b as shown in FIG.

For example, the data stored in the picture data memory 4a is the data read by the image reading device 2.
In contrast to the two-dimensional image body, the data in the center position information data memory 4b is one piece of information for indicating the positional relationship between the two-dimensional image and the patch outer frame. The data stored in the center position information data memory 4b is
For example, the two stored in the picture data memory 4a
It is data indicating the center position in a three-dimensional image. In this case, the positional relationship with the patch outer frame may be determined by the relative positional relationship between the center position of the two-dimensional image and the center position of the patch outer frame.

The patch outer frame memory 5 stores a patch pattern outer frame. The emblem outer frame is
As described above, and as will be described later in detail with reference to FIGS. 4 to 7, the shape is, for example, a circle or a rectangle. In the present invention, the specific configuration of the patch outer frame memory 5, the storage form of the data, the data configuration, etc. are not specifically limited.

For example, as shown in FIG. 1, it may be constituted by an outer frame shape data memory 5a and a center positioning information data memory 5b. For example, while the data in the outer frame shape data 5a is the data showing the shape of the emblem pattern outer frame, the data in the center positioning information data memory 5b shows the center position of the emblem pattern outer frame. It is shown. Alternatively, it is some data used for center positioning. Although the present invention is not specifically limited to this, for example, by determining the positional relationship between the center position of the two-dimensional image and the center position of the emblem pattern outer frame, the two-dimensional image, that is, the actual The positional relationship between the pattern to be embroidered on and the outer frame of the patch pattern can be determined.

In order to predict the completion status of the emblem, the display confirmation device 7 together with the emblem pattern outer frame,
A three-dimensional image is displayed. With the display confirmation device 7, for example, the quality of the two-dimensional image read by the image reading device 2 can be confirmed. For example, the density or the like of the read two-dimensional image can be confirmed. Further, the relative positional relationship between the two-dimensional image and the emblem pattern outer frame can be confirmed.

Although the present invention does not specifically limit the display confirmation device 7, for example, a liquid crystal display device which has been widely used in recent years and can freely display a figure or the like in a bitmap format. May be Or CR
It may be displayed on T (cathode ray tube) by a bitmap method. For example, the video signal may be converted into a video signal by a predetermined composite signal in order to display the patch picture outer frame and the two-dimensional image on a CRT of a home color television receiver.

As described above, according to the configuration of the present invention, the embroidery data for the patch can be more efficiently created based on the rough sketch in which the outer frame of the patch pattern is not drawn. You can For example, a magazine illustration or the like can be relatively easily used as a patch design. This is because the embroidery sketch for emblem read by the image reading device 2 can be the one stored in the emblem outer frame memory 5 even if the emblem pattern outer frame is not drawn.

Although the present invention is not limited to this, the patch outer frame memory 5 stores a plurality of types of the emblem pattern outer frames together with the center position information of each of the emblem pattern outer frames. It may be one.
For example, for a plurality of types of the emblem pattern outer frames, data stored in the outer frame shape data memory 5a,
The data stored in the center positioning information data memory 5b may be stored in combination.

At this time, as shown in FIG. 1, a mode switch 8 used for selecting one of a plurality of types of the emblem pattern outer frame may be provided. For example, the patch outer frame memory 5 may be stored in the patch outer frame memory 5, and the rectangular patch outer frame may be selected by the mode switch 8. Thereby, a plurality of types of the emblem pattern outer frames can be easily and immediately selected and switched by the mode switch 8.

Although the present invention is not limited to this, when the two-dimensional image read by the image reading device 2 is combined with the outer frame stored in the patch outer frame memory 5, the The two-dimensional image may be enlarged or reduced. When expanding or contracting like this,
You may make it expand or contract on the basis of the center position of the said two-dimensional image matched with the center position of the said emblem picture frame. Thereby, even after the enlargement or reduction, the repositioning operation of the two-dimensional image with respect to the emblem pattern outer frame can be omitted or reduced.

[0026]

Embodiments of the present invention will be described in detail below with reference to the drawings.

FIG. 2 is a block diagram showing the configuration of a patch embroidery data creation device to which the present invention is applied.

In FIG. 2, the patch embroidery data creation device 10 creates embroidery data used by the sewing machine 36 in accordance with the patch embroidery sketch 40. The data created by the patch embroidery data creation device 10 is
It is written in the memory card 34. The data written in the memory card 34 is stored in the sewing machine 36.
It is read by a memory card I / F (interface) not shown.

The patch embroidery data creation device 10 is
Mainly, the handy scanner 12, the scanner control circuit 14, the CPU 16, the ROM 18, the RAM 22,
The display confirmation device 24, a memory card I / F 26, a mode switch 32, a joystick 37, and a system bus 38 are included.

The system bus 38 includes the scanner control circuit 14, the CPU 16, the ROM 18, and the RA.
M22, the display confirmation device 24, the memory card I /
It is used when data and the like are transferred between the F26, the mode switch 32 and the joystick 37.

The handy scanner 12 is controlled by the scanner control circuit 14 and manually scans the embroidery sketch 40 for the emblem in a constant direction and at a constant speed, so that the embroidery sketch 40 for the emblem can be scanned. The design 42 is read. The two-dimensional image read by the handy scanner 12 and the scanner control circuit 14 is
It is temporarily stored in the RAM 22. On the other hand, what has been subjected to a predetermined process described later is stored in the memory card 34 via the memory card I / F 26 and the like. The operation of the scanner control circuit 14, the transfer of the read two-dimensional image to the RAM 22, the predetermined processing, and the transfer to the memory card 34 after the predetermined processing are performed by the CPU 16 and the ROM.
It is performed by executing a program written in advance in 18.

The ROM 18 stores the program executed by the CPU 16 as described above.
Further, the ROM 18 stores in advance shape information for determining the sizes and contours of a total of three types of emblem pattern outer frames. As described above, the respective emblem pattern outer frames stored in the ROM 18 are stored together with the respective center positioning information.

These three types of outer frames of the emblem pattern are designated by reference numerals 44a-4 in FIGS. 4-7, as will be described later in detail.
It is shown by 4c. Further, any one of these three types of the emblem pattern outer frames is selected by operating the mode switch 32.

The display confirmation device 24, together with the emblem pattern outer frame selected by the mode switch 32, predicts the completion status of the emblem, and the two-dimensional image written from the handy scanner 12 to the RAM 22. Alternatively, after the predetermined processing, the two-dimensional image written in the memory card 34 is displayed. Further, at the time of such a display, the center position of the selected emblem pattern outer frame is also displayed together with the display of the selected emblem pattern outer frame.

At this time, by operating the joystick 37, while confirming the display of the two-dimensional image,
Relative positioning of the two-dimensional image with respect to the emblem pattern outer frame and enlargement or reduction of the two-dimensional image can be performed.

Such a series of display and scanning is mainly performed by the CPU 16 executing a program previously written in the ROM 18. or,
When the positioning of the two-dimensional image is performed in this manner, the center position information of the two-dimensional image is generated based on this, and the RA is associated with the center position information of the two-dimensional image.
It is stored in M22. The center position information of the two-dimensional image becomes coordinate data indicating the position in the two-dimensional image that matches the center position of the emblem pattern outer frame after such positioning.

FIG. 3 is a block diagram showing the configuration of the display confirmation apparatus used in this embodiment.

The display confirmation device 24 shown in FIG.
This is shown in FIG. The display confirmation device 24
Operates as a so-called bitmap display device.

The display confirmation device 24, as shown,
The RAM 52, the display controller 54, and the liquid crystal display 56 are included.

The RAM 52 stores data indicating the density of each displayed bit. The RAM 52
The writing of data to the ROM 18 is performed by the ROM 18 as necessary.
The two-dimensional image stored in the memory card 34 based on the two-dimensional image stored in the RAM 22 or subjected to a predetermined process while using the data relating to the external design of the patch pattern stored in On the basis of,
The program stored in the ROM 18 is stored in the CPU 1
6 is executed.

The display controller 54 controls the display by the liquid crystal display 56 according to the data stored in the RAM 52. As a result, the outer frame of the patch pattern and the two-dimensional image stored in the RAM 22 or the memory card 34 can be displayed.

FIG. 4 is a diagram showing the relationship between the embroidery sketch for emblems and the emblem of the emblem pattern when mode A is selected in this embodiment. FIG. 5 is a diagram showing the relationship between the embroidery sketch for the patch and the patch picture outer frame when mode B is selected in this embodiment. FIG. 6 is a diagram showing the relationship between the embroidery sketch for the emblem and the emblem of the emblem pattern when mode C is selected in this embodiment.

Further, FIG. 7 shows the mode A in this embodiment.
It is a diagram which shows the relationship between the embroidery sketch for emblems and the emblem pattern outer frame when the selected and read two-dimensional image is enlarged 1.5 times.

4 to 7, reference numeral 40a
Shows an entire embroidery sketch for a patch. Also, reference numeral 40b
Shows the entire embroidery sketch for the patch when the magnification of 1.5 times is designated by the scanning of the joystick 37. Reference numeral 42a indicates a pattern in the embroidery rough sketch 40a. Reference numeral 42b is a pattern in the embroidery sketch 40b for the patch, which is magnified 1.5 times.

First, in FIG. 4 and FIG. 7, the emblem pattern outer frame 44a has a circular shape. Further, in FIG. 5, reference numeral 44b designates an emblem pattern outer frame formed by an arc and a straight line. In FIG. 6, reference numeral 44c is a rectangular emblem pattern outer frame.

With the mode switch 32, switch A
When is pressed, the mode becomes the mode A as shown in FIG. 4 or FIG. When the switch B of the mode switch 32 is pressed, the mode B is entered, as shown in FIG. Switch C of the mode switch 32
When is pressed, the mode is changed to the mode C as shown in FIG.

As described above, in this embodiment, it is possible to select different types of the emblem pattern outer frame by using the mode switch 32 shown in FIG.

Creation of a patch using the patch embroidery data creation device of this embodiment is performed in the following procedure.

(1) Draw the patch pattern you want to make on paper using a felt-tip pen or the like. At this time, a copy of an illustration of a magazine or a book may be used.

(2) First, the emblem pattern outer frame is selected by the mode switch 32. That is, one of those shown by reference numerals 44a to 44c in FIGS. 4 to 7 is selected.

(3) Any one of the selected emblem pattern outer frames 44a to 44c is displayed on the display confirmation device 24.

(4) The handy scanner 12 reads the embroidery sketch for the patch. The data of the two-dimensional image obtained during this reading is temporarily stored in the RAM 2
Written to 2.

(5) The read two-dimensional image is edited. For example, enlargement or reduction is performed, or alignment in the vertical direction or the horizontal direction is performed. After such editing, only the picture which is inside the emblem picture frame is finally taken in. That is, the data relating to the pattern outside the outer frame of the patch pattern is not finally captured. The data relating to the edited pattern is written in the RAM 22.

(6) After editing, the two-dimensional image written in the RAM 22 is combined with the selected emblem pattern outer frame, and can be further used in the embroidery function of the sewing machine 36. It is converted into embroidery data and written in the memory card 34. Such composition with the emblem pattern outer frame and conversion into the embroidery data are performed by the CPU 16 executing a predetermined program previously written in the ROM 18.

(7) The memory card 34 in which the embroidery data is written is removed from the memory card I / F 26 of the patch embroidery data creating device 10 and set in a memory card I / F (not shown) of the sewing machine 36. . The sewing machine 36 has the memory card I / F.
While reading the embroidery data written in the memory card 34, the embroidery of the emblem according to the embroidery sketch for the emblem read by the handy scanner 12 can be performed.

As described above, according to the present embodiment, the present invention can be applied, and the emblem picture outer frame that is previously stored in the ROM 18 can be used. Therefore, in the embroidery rough sketch for the above-mentioned patch read by the handy scanner 12, it is not necessary to draw the outer frame of the patch pattern, and the pattern can be drawn more freely. That is, an embroidery sketch for a patch can be created without paying much attention to the outer frame of the patch picture. Also, illustrations in magazines can be used more freely.

Although the present invention is not limited to this, in the present embodiment, as described above, the two-dimensional image read by the handy scanner 12 is enlarged or reduced, or left and right directions. Editing such as moving in the vertical direction can be performed, and work can be performed more efficiently.

At the time of this editing, since the patch pattern outer frame is different from the one read by the handy scanner 12, there are various advantages. For example, when the emblem pattern outer frame is drawn on the paper together with the embroidery sketch for the emblem as in the prior art, as in the present embodiment, the emblem pattern outer frame and the pattern inside the emblem pattern outer frame This kind of editing cannot be done, such as changing the relative positional relationship with.

Although the present invention is not limited to this, in the present embodiment, even if the two-dimensional image read by the handy scanner 12 is edited to be enlarged or reduced as described above. Since the center position of the two-dimensional image corresponds to the center position of the emblem pattern outer frame, the time and effort for performing the positional deviation correction after such enlargement or reduction are reduced, and the editing work efficiency is improved. be able to. In comparison, for example, when the left end of the two-dimensional image and the left end of the emblem picture outer frame correspond to each other, the center position of the two-dimensional image and the center position of the emblem picture outer frame are enlarged or reduced. Correspondence with is shifted to the left and right.

Further, in the present embodiment, as described above, since the data regarding the emblem pattern outer frame is prepared in advance, it is possible to perform more sophisticated embroidery on the emblem pattern outer frame. The present invention is not limited to this, but for a circular object such as the emblem pattern outer frame 44a of FIGS. 4 and 7, the embroidery sewing direction can be made radial. Is. In some recent sewing machines, the radial sewing direction can be specified when embroidering a circular arc, which can be used. In comparison, as in the conventional case, when the circular patch outer frame is read by the handy scanner 12 together with the inner pattern, the designation as an arc is made as described above. Difficult, and therefore
The radial sewing direction cannot be specified, and in some cases, the quality of the patch will deteriorate.

[0061]

As described above, according to the present invention, the embroidery sketch for emblems is not necessarily required on the embroidery sketch for emblems, and the embroidery emblem for emblems for emblems is not so much conscious of the emblem emblem for emblems. It is possible to obtain an excellent effect that it can be used relatively easily as a pattern for a patch such as a magazine illustration.

Furthermore, since only the rough sketch is scanned and the patch outer frame created as data in advance is synthesized, it is possible to synthesize only the rough sketch by enlarging / reducing the rough sketch. Further, it is possible to use a seam that matches the shape of the patch outer frame.

[Brief description of drawings]

FIG. 1 is a block diagram showing the gist of the present invention.

FIG. 2 is a block diagram showing a configuration of an embodiment of a patch embroidery data creation device to which the present invention is applied.

FIG. 3 is a block diagram showing a configuration of a display confirmation device used in the embodiment.

FIG. 4 is a diagram showing the relationship between the embroidery sketch for emblem and the outer frame of the emblem pattern when mode A is selected in the embodiment.

FIG. 5 is a diagram showing the relationship between the embroidery sketch for emblem and the emblem of the emblem design when mode B is selected in the embodiment.

FIG. 6 is a diagram showing the relationship between the embroidery sketch for emblem and the emblem of the emblem pattern when mode C is selected in the embodiment.

FIG. 7 is a diagram showing a relationship between an embroidery sketch for a patch and an outer frame of the patch pattern when mode A is selected and a magnification of 1.5 is performed in the embodiment.

[Explanation of symbols]

 2 ... Image reading device 4 ... Patch pattern memory 4a ... Pattern data memory 4b ... Center position information data memory 5 ... Patch outer frame memory 5a ... Outer frame shape data memory 5b ... Center positioning information data memory 7 ... Display confirmation device 8 ... Mode Switch 12 ... Handy scanner 14 ... Scanner control circuit 16 ... CPU 18 ... ROM 22 ... RAM 24 ... Display confirmation device 26 ... Memory card I / F 32 ... Mode switch 34 ... Memory card 36 ... Sewing machine 37 ... Joystick 38 ... System bus 40 , 40a, 40b ... Embroidery sketches for patches 42, 42a, 42b ... Designs 44a to 44c ... Patch design outer frame 52 ... RAM 54 ... Display control unit 56 ... Liquid crystal display

Claims (2)

[Claims] 1. An image reading device for reading an embroidery sketch for a patch as a two-dimensional image, a patch pattern memory for storing the read two-dimensional image, a patch outer frame memory for storing the patch pattern outer frame data, and completion of the patch. A patch embroidery data creation device, comprising: a display confirmation device that displays the two-dimensional image together with the patch outer frame for predicting the situation. 2. The emblem outer frame memory according to claim 1, wherein the emblem outer frame memory stores a plurality of types of the emblem pattern outer frames together with respective center positioning information, and further, a plurality of types of the emblem pattern outer frames. A patch embroidery data creation device, characterized in that it is provided with a mode switch for selecting one of the above, and the patch pattern memory stores the two-dimensional image together with its center position information.