JPH06186733A - Photosensitive resin plate and its production - Google Patents

Abstract

PURPOSE:To provide a form plate such as a letterpress capable of high precision fine printing. CONSTITUTION:A protective film 5 is coated with a photosensitive resin compsn. made liq. with a solvent, a solid photosensitive resin layer 4 is formed by drying and an insolubilized layer 6 is formed by irradiation with a chemical lamp from the layer 4 side. A substrate 2 is coated with an adhesive and an adhesive layer 3 is formed by drying. The photosensitive resin layer 4 is superposed on the adhesive layer 3 and bonded by means of a roller 9, etc.

Description

Detailed Description of the Invention

[0001]

FIELD OF THE INVENTION The present invention relates to a photosensitive resin plate,
More specifically, the present invention relates to a printing plate such as a letterpress capable of high-definition printing and a method for manufacturing the same.

[0002]

2. Description of the Related Art A photosensitive resin plate for printing such as letterpress is provided with an adhesive layer on a support made of metal, plastic or the like, and a photosensitive resin having a thickness of about 0.25 mm to 3 mm is formed on the adhesive layer. It is manufactured by providing layers. With this photosensitive resin plate, an independent line of about 40 μm or 300 μm
It is possible to reproduce m independent points.

[0003]

However, due to the development of printing technology in recent years, a finer independent line of about 10 μm,
It is required to reproduce an independent point of about 50 μm. However, using a conventional photosensitive resin plate,
When attempting to form an independent line of about 0 μm and an independent point of about 50 μm, there is a problem in that a significant amount of a pattern obtained by development is liable to be scratched or peeled off.

The present invention has been made in view of the above problems of the prior art, and an object of the present invention is to provide a photosensitive resin plate capable of high-definition printing without the above-mentioned distortion and peeling. And a method for manufacturing the same.

[0005]

In order to solve the above-mentioned problems, the present invention provides a photosensitive resin plate comprising a support, and an adhesive layer, a solid photosensitive resin layer and a protective film layer, which are laminated in this order. The photosensitive resin layer is provided with an insolubilizing layer by an active energy ray or heat in advance on the side in contact with the adhesive layer before laminating the photosensitive resin plate, and a method for producing the same.

As a result of intensive studies to solve the above-mentioned problems of the prior art, the inventors of the present invention have found that the problem of dents and peelings of this pattern is caused in the vicinity of the portion of the photosensitive resin layer which is in contact with the adhesive layer. The present invention was found to be capable of reproducing a high-definition pattern by discovering a microscopic curing failure that occurs and, when laminating a photosensitive resin layer to prevent this, by providing an insolubilized layer by active energy rays or heat. It came to completion.

[0007]

Since the photosensitive resin plate of the present invention is provided with the insolubilizing layer, it is possible to prevent a microscopic curing failure which occurs in the vicinity of the portion of the photosensitive resin layer which is in contact with the adhesive layer.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments based on the present invention will be described below with reference to FIGS.
It will be described based on. Here, FIG. 1 is a partial sectional view showing an example of the photosensitive resin plate according to the present invention. This photosensitive resin plate 1 comprises a support 2, an adhesive layer 3, a solid photosensitive resin layer 4 and a protective film layer 5, and an insolubilizing layer is contained in the photosensitive resin layer 4 on the adhesive layer 3 side. 6 is formed.

As the support 2, a conventionally known material such as metal or plastic can be used. Specifically, metal plates such as iron, aluminum, zinc, copper, brass and stainless steel, polyethylene terephthalate (PET),
A plate-shaped or film-shaped molded product of nylon, polyethylene, polypropylene, acrylic resin, or the like, or one laminated with an adhesive or the like on this is used.

The support 2 according to the present invention may be in the form of a film or a plate depending on the specifications of the printing machine, but it is preferably not easily deformed by an external force parallel to the plate surface. A material such as a rubber material having elasticity is not preferable because the pattern is distorted during printing.

The adhesive forming the adhesive layer 3 is required to have strong adhesiveness to the support 2 and the photosensitive resin layer 4, and as such a material, it is disclosed in Japanese Patent Laid-Open No. No. 61-17148, which contains polyester resin, polyurethane resin, epoxy resin, acrylic resin, ethylene-vinyl acetate resin, etc. as main components, polyvinyl alcohol resin, and cellulose resin as main components The following are preferably used.

The adhesive according to the present invention is appropriately selected in consideration of the adhesiveness of the photosensitive resin layer 4. The adhesive layer 3 is usually formed on the support 2 with a thickness of 1 to 50 μm. Various conventionally known dyes, pigments, and ultraviolet absorbers can be added to this adhesive as antihalation agents.

The solid photosensitive resin layer 4 comprises a binder, a photopolymerizable monomer and a photopolymerization initiator. Specifically, examples of the binder include JP-A-4-240644, JP-B-53-2082, JP-A-61-17148, JP-A-62-187848, and JP-A-63-
No. 8735, No. 63-10150, No. 1-274132, No. 1-287671, No. 2-39048, No. 2-738.
No. 10, JP-A-4-240855, partially saponified polyvinyl acetate resin and derivatives thereof,
Copolymer of acrylic acid ester and maleic acid, alkyd resin, polyethylene oxide, water-soluble or alcohol-soluble polyamide resin, ethylene-vinyl acetate copolymer, polystyrene resin, phenol resin, polyester resin, epoxy resin, polyvinyl butyral resin, etc. In particular, partially or fully saponified vinyl alcohol and (meth) acrylic acid, (meth) acrylamide, N-methylol (meth) acrylamide, styrene, propylene, maleic anhydride, (meth) acrylonitrile, ( Copolymers using (meth) acrylic acid ester as a monomer, or ethers obtained by reacting this copolymer with lower alkylol (meth) acrylamides such as methylol (meth) acrylamide and ethylol (meth) acrylamide , N, N'-bis (aminomethyl)
-Piperazine, N, N'-bis (β-aminoethyl)-
Diamines such as piperazine, dicarboxylic acids such as N, N′-bis (carboxymethyl) -piperazine and N, N′-bis (carboxymethyl) -methylpiperazine, their lower alkyl esters or acid halides,
N- (aminoethyl) -N '-(carboxymethyl)-
A water-soluble polyamide obtained by polymerizing ω-amino acid such as piperazine as a monomer, a polyamide resin having a sulfonate group or a base component, and the like are preferably used.

As the photopolymerizable monomer, (meth) acrylic acid having at least one photopolymerizable alkenyl group, (meth) acrylic acid ester, (meth) acrylamide, (meth) acrylonitrile, styreneglycidyl ( (Meth) acrylate, allyl (meth) acrylate, trimethylolpropane tri (meth) acrylate, allyl compound, vinyl ether compound, vinyl ester compound and the like can be used, and preferably urea, thiourea or lower alkylated or lower alkylolated thereof. Or a condensate of a lower alkyl lower alkylolated derivative and a lower alkylol (meth) acrylamide, or a polyethylene glycol whose hydroxyl group is diesterified with (meth) acrylic acid.

As the photopolymerizable initiator, all known ones can be used. Specifically, anthraquinone, 2
-Anthraquinone derivatives such as methylanthraquinone and 2-ethylanthraquinone, benzoin derivatives such as benzoin, benzoin methyl ether and benzoin ethyl ether, thioxanthone derivatives such as chlorothioxanthone and diisopropylthioxanthone, benzophenone, 4,4'-bis (dimethylamino) benzophenone Benzophenone derivatives such as, acetophenone, acetophenone derivatives such as dimethoxyphenylacetophenone, Michler's ketone, benzyl, and the like,
It is not limited to these. If necessary, a thermal polymerization inhibitor, a coloring agent such as a dye or a pigment, a plasticizer and the like can be added to these photosensitive resin compositions.

The solid photosensitive resin layer 4 uses the above-mentioned components in a solvent such as water, alcohols, ketones, esters, aromatic hydrocarbons, alkylene glycol mono (or di) alkyl ethers, etc. If necessary, add a defoaming agent, etc., and knead well to apply a liquid, apply warm air,
It is formed by drying with infrared rays or the like. The photosensitive resin layer 4 is required to be solid for easy handling and high stability over time.

The solid photosensitive resin layer 4 is usually 0.25 mm-
It is formed with a thickness of about 3 mm, but this thickness is 0.25
If the thickness is less than mm, most of the photosensitive resin layer 4 becomes the insolubilized layer 6 when pre-exposure for forming the insolubilized layer is performed, so that the printing plate having a pattern with a sufficient depth in the main exposure. May not be obtained. Further, the photosensitive resin layer 4 having a thickness exceeding 3 mm is uneconomical.

The protective film layer 5 is used to prevent the photosensitive resin layer 4 from being damaged during use and storage of the photosensitive resin plate 1 and to prevent the performance from being deteriorated due to the oxygen desensitizing action. Remove 5 and use. As such a protective film layer 5, for example, polyamides, polyesters, polyolefins, polyvinyl chlorides and the like are used, but PET is particularly preferable.

The protective film layer 5 has a thickness of 10 to 500 μm.
It is provided with a certain thickness. If the surface of the protective film layer 5 in contact with the photosensitive resin layer 4 is subjected to alkali treatment, sandblasting treatment, coating treatment or the like to be matted, the surface of the photosensitive resin layer 4 is exposed to a fine matte surface during exposure. Since the unevenness is formed, it is possible to uniformly adhere to the pattern mask, which is advantageous.

FIG. 2 is a partial sectional view showing another example of the photosensitive resin plate according to the present invention. In this photosensitive resin plate 1, an adhesion preventive layer 7 is provided between the photosensitive resin layer 4 and the protective film layer 5 in order to improve the releasability and improve the adhesion to the pattern mask. . The anti-adhesion layer 7 is made of polyvinyl alcohol, polyvinyl butyral, polyamide, polymethyl methacrylate, polystyrene, a copolymer of styrene and an acrylic monomer, ethyl cellulose, cellulose acetate butyrate, etc. and has a thickness of 0.1 to 30 μm. Can be provided. By providing the anti-adhesion layer 7 in this manner, it is possible to directly adhere to the pattern mask even when the photosensitive resin layer 4 has a strong adhesive property, because the later peeling is easy.

FIG. 3 is a process drawing showing an example of a method for producing a photosensitive resin plate according to the present invention. This photosensitive resin plate 1 is one in which a support 2, an adhesive layer 3, a photosensitive resin layer 4 and a protective film layer 5 are laminated in this order. When the adhesive layer 3 and the photosensitive resin layer 4 are bonded together, It is necessary to insolubilize a part of the photosensitive resin layer 4 side of the adhesive layer 3 with active energy rays or heat.

The active energy rays are ultraviolet rays,
Conventionally known energy rays such as visible light rays, ion beams, electron rays, X rays and γ rays can all be used. In the case of using heat, the surface of the photosensitive resin layer 4 is insolubilized by heating the surface of the photosensitive resin layer 4 with a roller or the like heated to about 200 to 400 ° C. In the photosensitive resin layer 4 of the present invention, 1 to 40% of the photosensitive resin layer 4 is insolubilized by active energy rays or heat. When the insolubilized layer 6 is less than 1%, the pattern is not liable to be peeled or peeled off during development, which is not preferable. Further, if the insolubilized layer 6 exceeds 40%, a sufficient pattern depth cannot be obtained, and stains are generated in the non-image area during printing, which is uneconomical.

Regarding the formation of the insolubilized layer 6 by the active energy rays or heat, for example, when ultraviolet rays are used,
Although the exposure dose varies depending on the composition of the photosensitive resin layer 4, it is 1
It is preferably about 40 mJ / cm ² . When the exposure amount is less than 1 mJ / cm ² , the photosensitive resin layer 4 contains 1% or more of the insolubilized layer 6
Is not obtained, and when it exceeds 40 mJ / cm ² , 40% or more of the photosensitive resin layer 4 becomes insoluble.

The photosensitive resin layer 4 according to the present invention must be provided with an insolubilizing layer 6 of at least 10 μm or more from the surface on the adhesive side due to active energy rays or heat. When the thickness of the insolubilized layer 6 is less than 10 μm, when pattern exposure is performed and development is performed, a portion where the insolubilized layer 6 is not partially formed appears, and the pattern at that portion is liable or peeled. It is not preferable.

When ultraviolet rays are used to form the insolubilized layer 6,
The irradiation amount varies depending on the selection of the components of the photosensitive resin composition, but is up to 1 to 10 mJ / cm ² up to a film thickness of 0.5 mm.
When the film thickness is 0.5 to 3 mm, about ² to 40 mJ / cm ² is preferable.

By performing the above-mentioned treatment with active energy rays or heat, the photopolymerization initiator in the insolubilized portion is activated, and the resolution upon pattern exposure is further improved. The activated photopolymerization initiator does not change with time and shows improved sensitivity even when stored for a long period of time. In addition, since the adhesive layer 3 side of the photosensitive resin composition layer 4 is planarly and integrally cured, it is possible to prevent peeling due to an external force of each independent pattern after pattern formation, which leads to improvement of printing durability. There is also an advantage.

The detailed method for producing the photosensitive resin plate according to the present invention will be described below. 1) Formation of Photosensitive Resin Layer 4 on Protective Film Layer 5 As shown in FIG. 3A, the photosensitive resin composition described above is applied on the protective film layer 5 with water, alcohols, ketones, and esters. , A solvent such as aromatic hydrocarbons, alkylene glycol mono (or di) alkyl ethers, etc., and optionally a defoaming agent, etc., and well kneaded to form a liquid having a film thickness of 0.25 after drying. Apply to be ~ 3mm,
Dry with warm air or infrared rays.

2) Irradiation or heating of the photosensitive resin layer 4 with active energy rays. As shown in FIG. 3B, from the photosensitive resin layer 4 side obtained as described above, a chemical lamp, visible light laser, electron beam, etc. Or add energy 8 of about 1 to 40 mJ / cm ² to the extent that about 1 to 40% of it becomes insoluble.
The insolubilized layer 6 is provided using a roller heated to about 200 to 400 ° C.

3) Formation of Adhesive Layer 3 on Support 2 As shown in FIG. 3 (c), an adhesive is applied on support 2 with water, alcohols, ketones, esters, aromatic hydrocarbons. ,
A film after being dried with a roll coater, curtain coater, whaler, etc. using a solvent such as alkylene glycol mono (or di) alkyl ethers and optionally adding an antifoaming agent, an antihalation agent, etc. It is applied to have a thickness of 1 to 50 μm, and dried or semi-dried by using hot air, infrared rays, or the like.

4) Adhesion of Photosensitive Resin Layer 4 and Adhesive Layer 3 As shown in FIG. 3D, the photosensitive resin layer 4 was superposed on the adhesive layer 3 obtained as described above, and the roller 9 And the like. At that time, the support 2, the photosensitive resin layer 4, or the roller 9 may be preheated to about 50 to 100 ° C. Further, the adhesive layer 3 may be adhered without being dried.

FIG. 4 is a process drawing showing another method for producing a photosensitive resin plate according to the present invention. In the present invention, the photosensitive resin layer 4 is provided on the protective film layer 5 as shown in FIG. 4A, and after insolubilizing treatment with active energy rays or heat in FIG. The adhesive layer 3 may be provided as shown in c), the support 2 may be laminated as shown in FIG.

Next, the present invention will be described in more detail based on Examples and Comparative Examples. Example 1 A photosensitive resin composition having the following composition on a PET film having a thickness of 0.1 mm, saponification degree 80% partially saponified PVA resin (polymerization degree 500) 100 parts by weight dimethylol urea dimethyl ether and N-methylol acrylamide Condensate with 60 〃 polyethylene glycol diacrylate 10 〃 ethylene glycol 10 〃 dimethoxyphenylacetophenone 2 〃 methylhydroquinone 0.05 〃 methanol 50 〃 water 150 〃 are mixed and prepared, and applied so that the dry film thickness becomes 0.7 mm. Then, it was dried at 40 ° C. for 15 hours to form a photosensitive resin layer 4. After that, an insolubilized layer 6 was formed by irradiating the surface of the photosensitive resin layer 4 with ultraviolet rays of 3 mJ / cm ² using a chemical lamp.

On the other hand, an iron plate having a thickness of 0.3 mm was prepared by coating a saturated polyester adhesive as the adhesive layer 3 so as to have a film thickness of 5 μm. The adhesive layer 3 and the photosensitive resin were prepared. The layer 4 and the layer 4 were laminated using a rubber roller 9 to produce a photosensitive resin plate 1 according to the present invention.

After leaving the photosensitive resin plate 1 for a day, the PET layer which is the protective film layer 5 is peeled off, and the exposed photosensitive resin layer 4 has independent fine lines of 10, 20, 50 and 100 μm and 50, 100, Ultraviolet rays of 700 mJ / cm ² were irradiated through a test mask that reproduces independent points of 150 and 300 μm. Then, using a spray-type washing machine, 45
Development was carried out for 2 minutes with warm water at ℃, after drying, post-exposure was carried out at 1 J / cm ² . The results of observing the printing plate on which the pattern is formed are shown in Table 1 below.

[0035]

[Table 1]

As shown in the results of Table 1, a printing plate having sharp independent fine lines of 10 μm and independent points of 50 μm at the image edge portion free from dents and peeling, and good image reproducibility was obtained. When this printing plate was placed on a printing machine and a printing test was conducted, 3 million good printed materials were obtained.

Further, the photosensitive resin plate 1 prepared in Example 1 was left for 6 months and then subjected to pattern exposure to complete the printing plate, but the printing plate was completed without any decrease in sensitivity. Do you get it.

Example 2 A photosensitive resin composition having the following composition in place of the photosensitive resin composition of Example 1, a methacryloyl group-introduced polyamide resin (a reaction product 55 of α, ω-diaminopolyoxyethylene and adipic acid 55). Parts by weight / ε-caprolactam 25 parts by weight / reaction product of polyamide consisting of 20 parts by weight of reaction product of hexamethylenediamine and adipic acid and 2 parts by weight of glycidyl methacrylate) 100 parts by weight ethylene glycol diglycidyl ether and 2 mol of methacrylic acid Addition reaction product with 50 〃 xylylenediamine 1 mol and glycidyl methacrylate 4 mol 5 〃 N-butylbenzenesulfonamide 20 〃 benzophenone 5 〃 ethanol 90 〃 water 60 〃 were mixed and prepared, and Example 1 Similarly, complete the photosensitive resin plate 1 and pattern Light, and developed. The results of observing the obtained printing plate are shown in Table 1.

As shown in the results of Table 1, a printing plate having sharp independent fine lines of 10 μm and independent points of 50 μm at the image edge portion free from dents and peelings, and good image reproducibility was obtained. When this printing plate was placed on a printing machine and a printing test was conducted, 2.8 million good printed materials were obtained.

Example 3 A photosensitive resin composition having the following composition instead of the photosensitive resin composition of Example 1, alcohol-soluble polyamide resin (ULTRAMID 1C manufactured by BASF) 100 parts by weight dimethylol urea dimethyl ether and N-methylol Condensation product with acrylamide 80 〃 pentaerythritol propane tetraacrylate 10 〃 ethylene glycol 10 〃 benzophenone 3 〃 methylhydroquinone 0.05 〃 methanol 200 〃 were mixed and prepared, and the photosensitive resin plate 1 was completed in the same manner as in Example 1. After pattern exposure, spray development was performed at 30 ° C. for 5 minutes using a developing solution consisting of ethanol: water = 95: 5. The results of observing the obtained printing plate are shown in Table 1.

As shown in the results of Table 1, a printing plate having sharp independent fine lines of 10 μm and independent points of 50 μm at the image edge portion free from dents and peeling, and good image reproducibility was obtained. When this printing plate was placed on a printing machine and a printing test was conducted, 2.8 million good printed materials were obtained.

Comparative Example 1 When the photosensitive resin plate 1 of Example 1 was manufactured, the photosensitive resin plate 1 was manufactured without irradiating the entire surface with active energy rays, and as in Example 1, 10, 20, 50 and 750 mJ / cm 2 exposure and development were performed through a test mask reproducing 100 μm independent fine lines and 50, 100, 150 and 300 μm independent points to obtain a printing plate. The results of observing the obtained printing plate are shown in Table 1. As shown in the results of Table 1, 50 μm
At the independent thin lines below and the independent points of 150 μm or less, dents and peelings were observed.

Comparative Example 2 In the production of the photosensitive resin plate 1 of Example 2, the photosensitive resin plate 1 was produced without irradiating the entire surface with active energy rays, and exposed and developed in the same manner as in Comparative Example 1, I got a printing plate. The results of observing the obtained printing plate are shown in Table 1. As shown in the results of Table 1, dents, peelings, etc. were observed at the independent thin lines of 50 μm or less and the independent points of 150 μm or less.

Comparative Example 3 When the photosensitive resin plate 1 of Example 3 was manufactured, the photosensitive resin plate 1 was manufactured without irradiating the entire surface with active energy rays, and exposed and developed in the same manner as in Comparative Example 1, I got a printing plate. The results of observing the obtained printing plate are shown in Table 1. As shown in the results of Table 1, dents, peelings, etc. were observed at the independent thin lines of 50 μm or less and the independent points of 150 μm or less.

Example 4 Upon formation of the photosensitive resin composition of Example 1, it was applied so that the dry film thickness would be 0.3 mm and dried at 40 ° C. for 15 hours to form the photosensitive resin layer 4. did. After that, from the photosensitive resin layer 4 side, using a chemical lamp, 1 mJ / cm
^The entire surface was irradiated with ultraviolet rays of ² . The photosensitive resin plate 1 was manufactured in the same manner as in Example 1 below.

The PET layer 5 of the photosensitive resin plate 1 is peeled off,
The exposed photosensitive resin layer 4 was irradiated with 500 mJ / cm ² of ultraviolet rays through the same test mask as in Example 1.
Then, using a spray-type washing machine, development was performed for 2 minutes with warm water at 45 ° C., drying was performed, and post-exposure was performed at 1 J / cm ² . The result of observing the printing plate on which the pattern is formed is shown in Table 1.
Shown in.

As shown in the results of Table 1, a printing plate having sharp independent fine lines of 10 μm and independent points of 50 μm at the image edge portion free from dents and peelings, and good image reproducibility was obtained. When this printing plate was placed on a printing machine and a printing test was conducted, 3 million good prints with no stain on the non-image area were obtained.

Example 5 In Example 1, the total irradiation of active energy rays was changed to 30.
The photosensitive resin plate 1 obtained in the same manner except that the insolubilized layer 6 was formed using a metal roller heated to 0 ° C. was pattern-exposed through a test mask, and the obtained printing plate was observed. The results are shown in Table 1.

As shown in the results in Table 1, a printing plate having sharp independent fine lines of 10 μm and independent points of 50 μm in the image edge portion free from dents, peeling and the like was obtained, and good image reproducibility was obtained. When this printing plate was placed on a printing machine and a printing test was carried out, 2.5 million good prints with no stain on the non-image area were obtained.

Example 6 The active energy ray irradiation of Example 1 was conducted at 0.5 mJ / cm ^2.
Table 1 shows the result of observing the printing plate obtained by subjecting the photosensitive resin plate 1 obtained in the same manner as above to pattern exposure through a test mask. As shown in the results of Table 1, 2
A slight dent, peeling and the like were observed at the independent fine line of 0 μm and the independent point of 50 μm.

Example 7 In Example 1, the photosensitive resin layer 1 was obtained by irradiating the photosensitive resin layer 4 with a film thickness of 0.2 mm and activating an active energy ray with 1 mJ / cm ² of ultraviolet rays. The photosensitive resin plate 1 thus obtained was subjected to pattern exposure through a test mask to obtain a printing plate. The printing plate did not show any pattern stains or peeling, but when printed on a printing machine, the pattern depth was not sufficient, and therefore some stains were found on the non-image area.

[0052]

As described above, since the photosensitive resin plate of the present invention is provided with the insolubilizing layer by performing active energy ray or heat treatment in advance, it occurs in the vicinity of the portion of the photosensitive resin layer which is in contact with the adhesive layer. It is possible to prevent the occurrence of microscopic hardening defects, and a high-definition independent line of about 10 μm, 50 μm
It became possible to reproduce about m independent points.
Further, by performing this active energy ray or heat treatment, the photopolymerization initiator in the uncured portion is activated and the resolution at the time of pattern exposure is further improved. The activated photopolymerization initiator did not change with time and showed no deterioration in resolution even after long-term storage. In addition, since the adhesive layer side of the photosensitive resin layer is planarly and integrally cured, after pattern formation, peeling due to external force of each independent pattern can be prevented in advance, and printing durability is improved. In particular, since the photosensitive resin layer is a photosensitive resin plate that has been integrated with the support by subjecting the photosensitive resin layer to active energy rays or heat treatment in advance, the plate can be made simply by peeling off the protective film layer, and the work is easy, and the quality and reliability are high. A stable photosensitive resin plate can be supplied.

[Brief description of drawings]

FIG. 1 is a partial sectional view showing an example of a photosensitive resin plate according to the present invention.

FIG. 2 is a partial cross-sectional view showing another example of the same photosensitive resin plate.

FIG. 3 is a process diagram showing an example of a method for manufacturing a photosensitive resin plate.

FIG. 4 is a process diagram showing another method of manufacturing the photosensitive resin plate.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Photosensitive resin plate, 2 ... Support body, 3 ... Adhesive layer, 4 ... Photosensitive resin layer, 5 ... Protective film layer, 6 ... Insolubilization layer, 7 ...
Anti-adhesion layer.

Claims (3)

[Claims] 1. A photosensitive resin plate formed by sequentially laminating an adhesive layer, a solid photosensitive resin layer and a protective film layer on a support, wherein the solid photosensitive resin layer is previously laminated with the adhesive layer. A photosensitive resin plate, characterized in that an insolubilizing layer is provided on the side in contact with the active energy ray or heat. 2. A solid photosensitive resin layer is provided on a protective film, and then an insolubilizing layer is provided from the photosensitive resin layer side by active energy rays or heat, and the photosensitive resin layer and an adhesive layer are formed in advance. A method for producing a photosensitive resin plate, which comprises adhering a support to the photosensitive resin plate. 3. A solid photosensitive resin layer is provided on a protective film, then an insolubilizing layer is provided from the side of the photosensitive resin layer by an active energy ray or heat, and an adhesive layer is formed on the insolubilizing layer. A method for producing a photosensitive resin plate, comprising adhering a support to the adhesive layer side.