JPH06145180A - Purification of organophosphorus compound - Google Patents

Purification of organophosphorus compound

Info

Publication number
JPH06145180A
JPH06145180A JP29862992A JP29862992A JPH06145180A JP H06145180 A JPH06145180 A JP H06145180A JP 29862992 A JP29862992 A JP 29862992A JP 29862992 A JP29862992 A JP 29862992A JP H06145180 A JPH06145180 A JP H06145180A
Authority
JP
Japan
Prior art keywords
compound
organophosphorus compound
active carbon
activated carbon
pts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP29862992A
Other languages
Japanese (ja)
Other versions
JP3051272B2 (en
Inventor
Kazuyuki Asakura
和之 朝倉
Hiromi Osaki
浩美 大崎
Tadashi Sugiya
杉矢  正
Tomio Yanai
富雄 柳井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Nippon Chemical Industrial Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Nippon Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd, Nippon Chemical Industrial Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP4298629A priority Critical patent/JP3051272B2/en
Priority to US08/091,363 priority patent/US5354918A/en
Priority to DE69317820T priority patent/DE69317820T2/en
Priority to EP93111451A priority patent/EP0579248B1/en
Publication of JPH06145180A publication Critical patent/JPH06145180A/en
Application granted granted Critical
Publication of JP3051272B2 publication Critical patent/JP3051272B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To provide an industrially advantageous purification method capable of effectively and safely purifying an organophosphorus compound as a raw material for epitaxial growth to a high purity grade generally required for a raw material of a compound semiconductor. CONSTITUTION:An organophosphorus compound represented by formula RaH3-aP [R is a 1 to 4C alkyl; a is 1 to 3] is brought into contact with active carbon to remove impurities. As the active carbon, e.g. even an active carbon produced from coconut husk, coal pitch, petroleum pitch, sawdust, etc., can recommendably be used and there is no special limitation about its shape. The amount of the active carbon to be used is preferably 0.1 to 100 pts.wt., practically 10 to 50 pts.wt. per 100 pts.wt. organophosphorus compound in general and varied according to the kind or the amount of impurities to be removed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、化合物半導体を製造す
るためのエピタキシャル成長用材料として有用な有機燐
化合物の精製方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for purifying an organophosphorus compound useful as a material for epitaxial growth for producing a compound semiconductor.

【0002】[0002]

【従来の技術】近年、発光ダイオード、半導体レーザ
ー、高速動作トランジスタ(HEMT)などで化合物半
導体が広く用いられるようになった。化合物半導体の製
造にあたっては、有機金属化学蒸着法(MOCV Meta
lorganic Chemical Vaper Deposition) などで結晶をエ
ピタキシャル成長させる方法が最近活発に行なわれてき
た。こうした方法で製造される化合物半導体としては、
例えばIII −V族化合物半導体などがある。V族側の原
料としては燐を含有するホスフィンがしばしば使用され
ている。
2. Description of the Related Art In recent years, compound semiconductors have been widely used in light emitting diodes, semiconductor lasers, high speed operation transistors (HEMTs) and the like. In manufacturing compound semiconductors, metal organic chemical vapor deposition (MOCV Meta
Recently, a method of epitaxially growing a crystal by means of lorganic chemical vapor deposition has been actively performed. As a compound semiconductor manufactured by such a method,
For example, there is a III-V group compound semiconductor. Phosphine containing phosphorus is often used as a raw material for the group V side.

【0003】V族側の原料としてホスフィンを用いる方
法は安全性が問題になる。ホスフィンは毒性がある。し
かも常温では気体であり、化合物半導体の製造にあたっ
ては高圧で使用しなければならない。毒性のある気体を
高圧にして用いれば危険を伴う。ホスフィンのそうした
問題点を打開する意味で、近年、モノアルキルホスフィ
ンの使用が提案されている。エピタキシャル成長膜は炭
素の含入を嫌う。モノアルキルホスフィンはエピタキシ
ャル成長膜への炭素の混入が少なく、ホスフィンより毒
性が低いことからその代替材料として注目されている。
In the method of using phosphine as a raw material for the group V side, safety is a problem. Phosphine is toxic. Moreover, since it is a gas at room temperature, it must be used at high pressure in the production of compound semiconductors. Use of toxic gas at high pressure is dangerous. In order to overcome such problems of phosphine, use of monoalkylphosphine has recently been proposed. Epitaxially grown films dislike carbon inclusion. Monoalkylphosphine is attracting attention as an alternative material because it has less carbon contamination in the epitaxial growth film and has lower toxicity than phosphine.

【0004】モノアルキルホスフィンは塩化亜ホスホニ
ルや亜ホスホン酸を還元することによっても合成される
が、ホスフィンとオレフィンとを反応させることによっ
ても合成される。量産化は後者の方が容易である。ホス
フィンとオレフィンとを反応させてモノアルキルホスフ
ィンを合成するには、触媒にスルホン酸系化合物が用い
られる。そのため、合成して得られたモノアルキルホス
フィンは、精製後も通常、微量の硫黄化合物を含んでい
る。その他、カドミウム、マグネシウム、カルシウム、
鉄、砒素、ケイ素等の化合物、さらに反応溶媒として用
いた炭化水素類も微量不純物として含まれている。これ
らの微量不純物は、エピタキシャル成長した結晶の電気
的光学的特性にトラブルをもたらす。半導体を造る場
合、有機金属化合物は、一般に高精密蒸留によって精製
される。ところがこれまで、精密蒸留精製法だけでは、
化合物半導体の製造で要求される高い純度のモノアルキ
ルホスフィンを十分得ることはできなかった。
Monoalkylphosphine is synthesized by reducing phosphonyl chloride or phosphonous acid, but it is also synthesized by reacting phosphine with an olefin. The latter is easier for mass production. To synthesize a monoalkylphosphine by reacting a phosphine with an olefin, a sulfonic acid compound is used as a catalyst. Therefore, the monoalkylphosphine obtained by synthesis usually contains a trace amount of a sulfur compound even after purification. Others, cadmium, magnesium, calcium,
Compounds such as iron, arsenic and silicon, and hydrocarbons used as a reaction solvent are also contained as trace impurities. These trace impurities cause troubles in the electrical and optical characteristics of the epitaxially grown crystal. When making semiconductors, organometallic compounds are generally purified by high precision distillation. However, until now, the precision distillation purification method alone has
It was not possible to sufficiently obtain the high-purity monoalkylphosphine required for the production of compound semiconductors.

【0005】[0005]

【発明が解決しようとする課題】本発明は前記の課題を
解決するためなされたもので、エピタキシャル成長用材
料となる有機燐化合物を、化合物半導体の原料として一
般に要求される高い純度にまで、効果的にしかも安全に
精製できる工業的に有利な精製方法を提供することを目
的とする。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and it is effective to use an organophosphorus compound as a material for epitaxial growth up to the high purity generally required as a raw material for a compound semiconductor. Moreover, it is an object of the present invention to provide an industrially advantageous purification method that can be purified safely.

【0006】[0006]

【課題を解決するための手段】前記の課題を達成するた
めになされた本発明の有機燐化合物の精製方法は、下記
一般式1で示される有機燐化合物を活性炭と接触させ、
不純物を除去する。
The method for purifying an organophosphorus compound of the present invention, which has been made to achieve the above object, comprises contacting an organophosphorus compound represented by the following general formula 1 with activated carbon,
Remove impurities.

【0007】 Ra3-a P ・・・・(1) 式中、Rは炭素数1〜4のアルキル基である。aは1〜
3の整数である。この方法は特に、モノアルキルホスフ
ィン中の不純物を除去しようとする場合に好ましく応用
される。その場合のモノアルキルホスフィンとしては、
例えばモノ−1,1−ジメチルエチルホスフィン、モノ
−1−メチルプロピルホスフィン、モノエチルホスフィ
ンなどが挙げられる。これらは化合物半導体の製造で、
エピタキシャル成長用材料として使用される。
R a H 3-a P (1) In the formula, R is an alkyl group having 1 to 4 carbon atoms. a is 1
It is an integer of 3. This method is particularly preferably applied when the impurities in the monoalkylphosphine are to be removed. In that case, as the monoalkylphosphine,
Examples thereof include mono-1,1-dimethylethylphosphine, mono-1-methylpropylphosphine and monoethylphosphine. These are the manufacture of compound semiconductors,
Used as a material for epitaxial growth.

【0008】モノアルキルホスフィンは、合成にあたっ
て触媒として使用されたスルホン酸化合物、金属化合
物、さらに反応物として導入され精密蒸留精製の際に分
離できなかった未反応のオレフィンや溶媒として用いた
炭化水素化合物などを微量不純物として含有している。
言い換えれば、硫黄、珪素、酸素のうちの少なくとも一
種の元素を含む非金属系化合物、カドミウム、マグネシ
ウム、カルシウム、鉄、マンガンなどの金属または砒素
を含む金属系化合物、溶媒としての炭化水素化合物など
を不純物として含有している。
Monoalkylphosphine is a sulfonic acid compound used as a catalyst in the synthesis, a metal compound, an unreacted olefin which was introduced as a reaction product and could not be separated during precision distillation purification, and a hydrocarbon compound used as a solvent. Etc. are contained as trace impurities.
In other words, a non-metal compound containing at least one element of sulfur, silicon and oxygen, a metal compound containing a metal such as cadmium, magnesium, calcium, iron, manganese or arsenic, a hydrocarbon compound as a solvent, etc. Contains as an impurity.

【0009】上記の有機燐化合物を接触通過させる活性
炭としては、例えばやし殻、石炭ピッチ、石油ピッチ、
おが屑等から製造されたものでもよく、その形状・形態
には特に制限はない。ただし、粒状物または繊維状物が
特に好ましい。取扱性あるいは精製処理の操作性を考慮
すれば、10〜80メッシュの粒状物が好ましい。繊維
状の活性炭(活性炭素繊維)でも吸着スピードの向上が
期待でき、高い実用性を有する。
Examples of the activated carbon through which the above-mentioned organophosphorus compound is passed in contact are, for example, palm shell, coal pitch, petroleum pitch,
It may be manufactured from sawdust or the like, and its shape and form are not particularly limited. However, granules or fibrous substances are particularly preferable. Considering the handling property or the operability of the purification treatment, the granular material of 10 to 80 mesh is preferable. Even fibrous activated carbon (activated carbon fiber) can be expected to improve the adsorption speed and has high practicality.

【0010】活性炭の使用量は、吸着除去しようとする
不純物の種類や量によって変わるが、一般に有機燐化合
物100重量部当たり、0.1〜100重量部、実用的
には10〜50重量部が好ましい。
The amount of activated carbon used varies depending on the kind and amount of impurities to be adsorbed and removed, but is generally 0.1 to 100 parts by weight, and practically 10 to 50 parts by weight, per 100 parts by weight of the organic phosphorus compound. preferable.

【0011】精製にあたっては、あらかじめ活性炭を十
分乾燥し、乾燥させた活性炭と有機燐化合物とを接触さ
せる。活性炭の乾燥は、250〜300℃程度の温度で
加熱すればよい。加熱すると活性炭の付着水は除去さ
れ、吸着機能の低下、精製すべき有機燐化合物の酸化あ
るいは劣化、収率の低下などが防止される。活性炭と有
機燐化合物との接触は、有機燐化合物を精密蒸留後、有
機燐化合物を気体または液体の状態で活性炭に接触させ
るとよい。接触は活性炭と有機燐化合物とを混合する
か、活性炭を充填したカラム中を通過させればよい。精
製しようとする有機燐化合物が、常温常圧では液状でも
ガス化が容易な場合、むしろガス化して接触させるとよ
い。
In the purification, the activated carbon is sufficiently dried in advance, and the dried activated carbon is brought into contact with the organic phosphorus compound. The activated carbon may be dried by heating at a temperature of about 250 to 300 ° C. When heated, the water adhering to the activated carbon is removed, and the deterioration of the adsorption function, the oxidation or deterioration of the organic phosphorus compound to be purified, and the decrease of the yield are prevented. The activated carbon may be brought into contact with the organic phosphorus compound by precision distillation of the organic phosphorus compound, and then the organic phosphorus compound is brought into contact with the activated carbon in a gas or liquid state. The contact may be performed by mixing activated carbon and an organic phosphorus compound or by passing through a column packed with activated carbon. If the organic phosphorus compound to be purified is liquid at room temperature and pressure and is easily gasified, it is rather gasified and contacted.

【0012】このような方法によると、例えばモノ−
1,1−ジメチルエチルホスフィンなどの中から微量不
純物を効率よく除去できる。さらにモノアルキルホスフ
ィン以外に、ジメチルホスフィン、ジエチルホスフィ
ン、トリメチルホスフィン、トリエチルホスフィン中か
らも効率よく除去できる。
According to such a method, for example, a mono-
Trace impurities can be efficiently removed from 1,1-dimethylethylphosphine and the like. In addition to monoalkylphosphine, it can also be efficiently removed from dimethylphosphine, diethylphosphine, trimethylphosphine, and triethylphosphine.

【0013】[0013]

【作用】 活性炭は、硫黄、珪素、酸素のうちの少なく
とも一種の元素を含む非金属系化合物、カドミウム、マ
グネシウム、カルシウム、鉄、マンガンのうちの少なく
とも一種の金属または砒素を含む金属系化合物、溶媒と
しての炭化水素化合物などを選択的に吸着する。有機燐
化合物の吸着は少ない。
[Activity] Activated carbon is a non-metallic compound containing at least one element selected from sulfur, silicon and oxygen, a metallic compound containing at least one metal selected from cadmium, magnesium, calcium, iron and manganese, and a solvent. And selectively adsorbs hydrocarbon compounds and the like. Little adsorption of organophosphorus compounds.

【0014】[0014]

【発明の効果】以上、詳細に説明したように本発明によ
れば、精密蒸留では除去しきれない微量不純物を有機燐
化合物の中から収率よくしかも効率的に除去し、化合物
半導体の製造原料として一般に要求される高純度の有機
燐化合物を得ることができる。しかもその方法は、活性
炭と接触させるという簡易な方法であり、収率も高い。
産業上、極めて有利である。
As described above in detail, according to the present invention, trace impurities that cannot be completely removed by precision distillation can be efficiently and efficiently removed from an organic phosphorus compound, and a raw material for producing a compound semiconductor can be obtained. It is possible to obtain a high-purity organophosphorus compound generally required as. Moreover, the method is a simple method of contacting with activated carbon, and the yield is high.
It is extremely advantageous in industry.

【0015】[0015]

【実施例】以下、本発明の実施例を説明する。 実施例1 容量1リットルのチッ素ガスまたはヘリウムガスで置換
したオートクレーブ反応容器中にイソブテン120g、
n−デカン100g、ホスフィン120gを充填した。
これに触媒としてメタンスルホン酸140gを圧入添加
し、容器内温度を60℃に維持しながら2時間撹拌し、
イソブテンとホスフィンとを反応させた。反応時、オー
トクレーブ内の圧力は約30kg/cm2 まで上昇し
た。反応が終了した後30℃まで温度が下がった時点
で、未反応のホスフィンをオートクレーブから排気し
た。反応液をガスクロマトグラフィーで分析したとこ
ろ、モノ−1,1−ジメチルエチルホスフィンが合成さ
れていることが分かった。反応収率は、イソブテン基準
で44.4%だった。
EXAMPLES Examples of the present invention will be described below. Example 1 120 g of isobutene was placed in an autoclave reaction vessel having a volume of 1 liter and replaced with nitrogen gas or helium gas.
100 g of n-decane and 120 g of phosphine were charged.
To this, 140 g of methanesulfonic acid was added as a catalyst under pressure, and the mixture was stirred for 2 hours while maintaining the temperature inside the container at 60 ° C.
Isobutene was reacted with phosphine. During the reaction, the pressure inside the autoclave increased to about 30 kg / cm 2 . When the temperature had dropped to 30 ° C. after the reaction was completed, unreacted phosphine was exhausted from the autoclave. When the reaction liquid was analyzed by gas chromatography, it was found that mono-1,1-dimethylethylphosphine was synthesized. The reaction yield was 44.4% based on isobutene.

【0016】得られた反応液を静置分液し、次いで精密
蒸留を行ない69.0gの粗モノ−1,1−ジメチルエ
チルホスフィンを得た。得られたその粗モノ−1,1−
ジメチルエチルホスフィンの一部を、高温発光分光分析
計(ICP)およびガスクロマトグラフィーを用いて分
析し、不純物として含まれる硫黄および金属成分(F
e、Mg、Mn、Si、As)、そのほか炭化水素の含
有量を測定した。結果を表1に処理前として示す。
The resulting reaction solution was allowed to stand still for liquid separation, and then precision distillation was carried out to obtain 69.0 g of crude mono-1,1-dimethylethylphosphine. The obtained crude mono-1,1-
A part of dimethylethylphosphine was analyzed using a high temperature emission spectrophotometer (ICP) and gas chromatography, and sulfur and metal components (F
e, Mg, Mn, Si, As) and other hydrocarbon contents were measured. The results are shown in Table 1 as before treatment.

【0017】 表 1 不純物 n-テ゛カン Fe Mg Mn As Si S 処理前(ppm) 0.5 痕跡 痕跡 痕跡 痕跡 15 259 処理後(ppm) × × × × × 2 76 なお、表1中の×は測定器がその存在を検知しなかった
ことを表わす。
Table 1 Impurity n-decane Fe Mg Mg Mn As Si S Before treatment (ppm) 0.5 Trace trace Trace trace 15 259 After treatment (ppm) × × × × × 276 In Table 1, x is measured Indicates that the vessel did not detect its presence.

【0018】20cmx1.5cmΦの大きさのガラス
管に30〜60メッシュの粒状活性炭(西尾工業社製)
10gを充填した。次いでそのガラス管に上記粗モノ−
1,1−ジメチルエチルホスフィンを5リットル/時間
の流速で室温下で流下し、45.0g(0.50モル)
の高純物を得た。
Granular activated carbon of 30-60 mesh (manufactured by Nishio Industry Co., Ltd.) in a glass tube of 20 cm × 1.5 cmΦ.
10 g was charged. Then, the above-mentioned crude mono-
1,1-Dimethylethylphosphine was flowed down at room temperature at a flow rate of 5 liters / hour to obtain 45.0 g (0.50 mol).
I got a high purity product.

【0019】精製されたモノ−1,1ジメチルエチルホ
スフィンの一部を、上記と同様にして高温発光分光分析
計およびガスクロマトグラフィーを用いて分析した。結
果を表1に処理後として示す。
A portion of the purified mono-1,1 dimethylethylphosphine was analyzed using a high temperature emission spectrophotometer and gas chromatography in the same manner as above. The results are shown in Table 1 as after treatment.

【0020】上記の結果から、活性炭は、通常の吸着の
概念を超えて、微量の不純物である含硫黄炭化水素類お
よび各種金属化合物類も実質的にその大分部分を吸着除
去し、さらに精密蒸留により除去しきれなかった炭化水
素類も除去していることが分かった。
From the above results, the activated carbon goes beyond the usual concept of adsorption and substantially removes a large amount of a small amount of sulfur-containing hydrocarbons and various metal compounds as impurities, and further performs fine distillation. It was found that the hydrocarbons that could not be completely removed were also removed.

【0021】比較例1 実施例1と同様にしたが、活性炭の代わりに合成ゼオラ
イト5Aを用いた。結果を表2に示す。
Comparative Example 1 Same as Example 1, but synthetic zeolite 5A was used instead of activated carbon. The results are shown in Table 2.

【0022】 表 2 不純物 n-テ゛カン Fe Mg Mn As Si S 処理前(ppm) 0.7 痕跡 痕跡 痕跡 痕跡 14 260 処理後(ppm) 0.6 痕跡 痕跡 痕跡 痕跡 13 255 実施例1、比較例1などの実験から、活性アルミナや合
成ゼオライト5Aなどの吸着剤では、含硫黄炭化水素化
合物類、金属化合物類および炭化水素類を実質的に吸着
除去することはできないことが分かった。活性炭を用い
れば、金属間化合物半導体を製造する上で一般に要求さ
れる純度まで、モノ−1,1−ジメチルエチルホスフィ
ンを効率よく精製できることが分かった。
Table 2 Impurities n-decane Fe Mg Mg Mn As Si S Before treatment (ppm) 0.7 Traces Traces Traces 14 260 After treatment (ppm) 0.6 Traces Traces Traces 13 255 Example 1, Comparative Example 1 From such experiments, it was found that the adsorbents such as activated alumina and synthetic zeolite 5A cannot substantially adsorb and remove the sulfur-containing hydrocarbon compounds, the metal compounds and the hydrocarbons. It has been found that the use of activated carbon makes it possible to efficiently purify mono-1,1-dimethylethylphosphine to a purity generally required for producing an intermetallic compound semiconductor.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 大崎 浩美 新潟県中頸城郡頸城村大字西福島28番地の 1 信越化学工業株式会社合成技術研究所 内 (72)発明者 杉矢 正 福島県田村郡三春町字天王前3番地 日本 化学工業株式会社三春工場内 (72)発明者 柳井 富雄 東京都江東区亀戸9丁目15番1号 日本化 学工業株式会社研究開発本部内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiromi Osaki, 28, Nishi-Fukushima, Chugiki-mura, Nakakubiki-gun, Niigata Prefecture 1 Shinetsu Chemical Industry Co., Ltd. Synthetic Technology Laboratory (72) Inventor Tadashi Sugiya Tamura-gun, Fukushima Prefecture Miharu-cho, 3 Tenno-mae, Nihon Chemical Industry Co., Ltd. Miharu Plant (72) Inventor Tomio Yanai, 9-15-1, Kameido, Koto-ku, Tokyo Nihon Kagaku Kogyo Co., Ltd.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 下記一般式1 Ra3-a P ・・・・(1) (上記式中、Rは炭素数1〜4のアルキル基、aは1〜
3)で示される有機燐化合物を活性炭と接触させ、不純
物を除去することを特徴とする有機燐化合物の精製方
法。
1. The following general formula 1 R a H 3-a P (1) (wherein R is an alkyl group having 1 to 4 carbon atoms, and a is 1 to 1).
A method for purifying an organic phosphorus compound, which comprises contacting the organic phosphorus compound represented by 3) with activated carbon to remove impurities.
【請求項2】 該有機燐化合物が、モノアルキルホスフ
ィンである請求項1に記載の有機燐化合物の精製方法。
2. The method for purifying an organophosphorus compound according to claim 1, wherein the organophosphorus compound is a monoalkylphosphine.
【請求項3】 該モノアルキルホスフィンが、モノ−
1,1−ジメチルエチルホスフィンである請求項1また
は2に記載の有機燐化合物の精製方法。
3. The monoalkylphosphine is mono-
The method for purifying an organophosphorus compound according to claim 1 or 2, which is 1,1-dimethylethylphosphine.
JP4298629A 1992-07-17 1992-11-09 Method for purifying organic phosphorus compounds Expired - Lifetime JP3051272B2 (en)

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JP4298629A JP3051272B2 (en) 1992-11-09 1992-11-09 Method for purifying organic phosphorus compounds
US08/091,363 US5354918A (en) 1992-07-17 1993-07-15 Highly pure monoalkylphosphine
DE69317820T DE69317820T2 (en) 1992-07-17 1993-07-16 Process for the production of high purity monoalkylphosphines
EP93111451A EP0579248B1 (en) 1992-07-17 1993-07-16 Method for preparing highly pure monoalkylphosphine

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JP4298629A JP3051272B2 (en) 1992-11-09 1992-11-09 Method for purifying organic phosphorus compounds

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JPH06145180A true JPH06145180A (en) 1994-05-24
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01211547A (en) * 1988-02-18 1989-08-24 Nippon Oil & Fats Co Ltd Purification of acyl halide
JPH01254640A (en) * 1988-04-04 1989-10-11 Res Assoc Util Of Light Oil Purification of pyruvate
JPH0372437A (en) * 1989-08-10 1991-03-27 Showa Denko Kk Purification of 1,1,1,2-tetrafluoroethane
JPH0454147A (en) * 1990-06-21 1992-02-21 Mitsubishi Electric Corp Method for purifying fluorine-based inert liquid
JPH0477442A (en) * 1990-07-17 1992-03-11 Kimura Chem Plants Co Ltd Purificati0n of glycerol
JPH04120056A (en) * 1990-09-07 1992-04-21 Mitsui Petrochem Ind Ltd Purification of amine having halophenyl group

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01211547A (en) * 1988-02-18 1989-08-24 Nippon Oil & Fats Co Ltd Purification of acyl halide
JPH01254640A (en) * 1988-04-04 1989-10-11 Res Assoc Util Of Light Oil Purification of pyruvate
JPH0372437A (en) * 1989-08-10 1991-03-27 Showa Denko Kk Purification of 1,1,1,2-tetrafluoroethane
JPH0454147A (en) * 1990-06-21 1992-02-21 Mitsubishi Electric Corp Method for purifying fluorine-based inert liquid
JPH0477442A (en) * 1990-07-17 1992-03-11 Kimura Chem Plants Co Ltd Purificati0n of glycerol
JPH04120056A (en) * 1990-09-07 1992-04-21 Mitsui Petrochem Ind Ltd Purification of amine having halophenyl group

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