JPH06135883A - Production of aromatic acyl compound - Google Patents
Production of aromatic acyl compoundInfo
- Publication number
- JPH06135883A JPH06135883A JP3130345A JP13034591A JPH06135883A JP H06135883 A JPH06135883 A JP H06135883A JP 3130345 A JP3130345 A JP 3130345A JP 13034591 A JP13034591 A JP 13034591A JP H06135883 A JPH06135883 A JP H06135883A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- reaction
- group
- silver
- aromatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 aromatic acyl compound Chemical class 0.000 title claims description 12
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000005727 Friedel-Crafts reaction Methods 0.000 claims abstract description 8
- 238000005917 acylation reaction Methods 0.000 claims description 11
- RBWNDBNSJFCLBZ-UHFFFAOYSA-N 7-methyl-5,6,7,8-tetrahydro-3h-[1]benzothiolo[2,3-d]pyrimidine-4-thione Chemical compound N1=CNC(=S)C2=C1SC1=C2CCC(C)C1 RBWNDBNSJFCLBZ-UHFFFAOYSA-N 0.000 claims description 9
- LGFYIAWZICUNLK-UHFFFAOYSA-N antimony silver Chemical compound [Ag].[Sb] LGFYIAWZICUNLK-UHFFFAOYSA-N 0.000 claims description 4
- CZKMPDNXOGQMFW-UHFFFAOYSA-N chloro(triethyl)germane Chemical compound CC[Ge](Cl)(CC)CC CZKMPDNXOGQMFW-UHFFFAOYSA-N 0.000 claims description 2
- 150000007524 organic acids Chemical class 0.000 claims description 2
- 238000005863 Friedel-Crafts acylation reaction Methods 0.000 claims 1
- 239000002841 Lewis acid Substances 0.000 abstract description 20
- 150000007517 lewis acids Chemical class 0.000 abstract description 20
- 150000001491 aromatic compounds Chemical class 0.000 abstract description 19
- 150000008065 acid anhydrides Chemical class 0.000 abstract description 16
- 239000002253 acid Substances 0.000 abstract description 15
- 230000003197 catalytic effect Effects 0.000 abstract description 12
- 150000004820 halides Chemical class 0.000 abstract description 11
- 238000000034 method Methods 0.000 abstract description 4
- 230000002378 acidificating effect Effects 0.000 abstract 1
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 20
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 18
- FCEHBMOGCRZNNI-UHFFFAOYSA-N 1-benzothiophene Chemical compound C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 description 12
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 12
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 12
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 12
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 12
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 12
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 12
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 7
- UPWPDUACHOATKO-UHFFFAOYSA-K gallium trichloride Chemical compound Cl[Ga](Cl)Cl UPWPDUACHOATKO-UHFFFAOYSA-K 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 6
- 125000004414 alkyl thio group Chemical group 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 125000004663 dialkyl amino group Chemical group 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 125000005843 halogen group Chemical group 0.000 description 6
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 6
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 6
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 6
- 229930192474 thiophene Natural products 0.000 description 6
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 6
- 125000003282 alkyl amino group Chemical group 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 125000006165 cyclic alkyl group Chemical group 0.000 description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- GDNTZLJAPCYKJR-UHFFFAOYSA-N 1-(4-methoxyphenyl)hexan-1-one Chemical compound CCCCCC(=O)C1=CC=C(OC)C=C1 GDNTZLJAPCYKJR-UHFFFAOYSA-N 0.000 description 4
- KGBXHAVIEYXXRU-UHFFFAOYSA-N 2h-thiopyran 1-oxide Chemical compound O=S1CC=CC=C1 KGBXHAVIEYXXRU-UHFFFAOYSA-N 0.000 description 4
- NTPLXRHDUXRPNE-UHFFFAOYSA-N 4-methoxyacetophenone Chemical compound COC1=CC=C(C(C)=O)C=C1 NTPLXRHDUXRPNE-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- 239000008346 aqueous phase Substances 0.000 description 4
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 239000012074 organic phase Substances 0.000 description 4
- 238000010898 silica gel chromatography Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 3
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- KXADPELPQCWDHL-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1.COC1=CC=CC=C1 KXADPELPQCWDHL-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 3
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 3
- DQWHNHMUDKNDSE-UHFFFAOYSA-N 1-(3,4-dimethoxyphenyl)pentan-1-one Chemical compound CCCCC(=O)C1=CC=C(OC)C(OC)=C1 DQWHNHMUDKNDSE-UHFFFAOYSA-N 0.000 description 2
- XHLHPRDBBAGVEG-UHFFFAOYSA-N 1-tetralone Chemical compound C1=CC=C2C(=O)CCCC2=C1 XHLHPRDBBAGVEG-UHFFFAOYSA-N 0.000 description 2
- OBKXEAXTFZPCHS-UHFFFAOYSA-N 4-phenylbutyric acid Chemical compound OC(=O)CCCC1=CC=CC=C1 OBKXEAXTFZPCHS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 2
- RFRXIWQYSOIBDI-UHFFFAOYSA-N benzarone Chemical compound CCC=1OC2=CC=CC=C2C=1C(=O)C1=CC=C(O)C=C1 RFRXIWQYSOIBDI-UHFFFAOYSA-N 0.000 description 2
- ILAHWRKJUDSMFH-UHFFFAOYSA-N boron tribromide Chemical compound BrB(Br)Br ILAHWRKJUDSMFH-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 239000000460 chlorine Chemical group 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- PKHMTIRCAFTBDS-UHFFFAOYSA-N hexanoyl hexanoate Chemical compound CCCCCC(=O)OC(=O)CCCCC PKHMTIRCAFTBDS-UHFFFAOYSA-N 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- DUCKXCGALKOSJF-UHFFFAOYSA-N pentanoyl pentanoate Chemical compound CCCCC(=O)OC(=O)CCCC DUCKXCGALKOSJF-UHFFFAOYSA-N 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- ABDKAPXRBAPSQN-UHFFFAOYSA-N veratrole Chemical compound COC1=CC=CC=C1OC ABDKAPXRBAPSQN-UHFFFAOYSA-N 0.000 description 2
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical group [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 238000006898 Intramolecular Friedel-Crafts reaction Methods 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 1
- 230000021736 acetylation Effects 0.000 description 1
- 238000006640 acetylation reaction Methods 0.000 description 1
- 230000010933 acylation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- VMPVEPPRYRXYNP-UHFFFAOYSA-I antimony(5+);pentachloride Chemical compound Cl[Sb](Cl)(Cl)(Cl)Cl VMPVEPPRYRXYNP-UHFFFAOYSA-I 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 1
- WLBHJIHRLZNSIV-UHFFFAOYSA-J dizinc tetrachloride Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Zn+2].[Zn+2] WLBHJIHRLZNSIV-UHFFFAOYSA-J 0.000 description 1
- OAYLNYINCPYISS-UHFFFAOYSA-N ethyl acetate;hexane Chemical compound CCCCCC.CCOC(C)=O OAYLNYINCPYISS-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011630 iodine Chemical group 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- RDOXTESZEPMUJZ-UHFFFAOYSA-N methyl phenyl ether Natural products COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 1
- DUWWHGPELOTTOE-UHFFFAOYSA-N n-(5-chloro-2,4-dimethoxyphenyl)-3-oxobutanamide Chemical compound COC1=CC(OC)=C(NC(=O)CC(C)=O)C=C1Cl DUWWHGPELOTTOE-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- MCSAJNNLRCFZED-UHFFFAOYSA-N nitroethane Chemical compound CC[N+]([O-])=O MCSAJNNLRCFZED-UHFFFAOYSA-N 0.000 description 1
- 229950009215 phenylbutanoic acid Drugs 0.000 description 1
- RZWZRACFZGVKFM-UHFFFAOYSA-N propanoyl chloride Chemical compound CCC(Cl)=O RZWZRACFZGVKFM-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- XHFLOLLMZOTPSM-UHFFFAOYSA-M sodium;hydrogen carbonate;hydrate Chemical compound [OH-].[Na+].OC(O)=O XHFLOLLMZOTPSM-UHFFFAOYSA-M 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- IEXRMSFAVATTJX-UHFFFAOYSA-N tetrachlorogermane Chemical compound Cl[Ge](Cl)(Cl)Cl IEXRMSFAVATTJX-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、芳香族アシル化合物の
製造方法に関し、更に詳しくは、芳香族化合物を酸ハロ
ゲン化物、酸無水物、混合酸無水物もしくは活性エステ
ルにてアシル化する際に、触媒量のルイス酸と共に触媒
量の銀塩を用いることを特徴とする芳香族アシル化合物
の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an aromatic acyl compound, and more particularly to a method for acylating an aromatic compound with an acid halide, an acid anhydride, a mixed acid anhydride or an active ester. The present invention relates to a method for producing an aromatic acyl compound, which comprises using a catalytic amount of a silver salt together with a catalytic amount of a Lewis acid.
【0002】[0002]
【従来の技術】芳香族アシル化合物の製造方法として
は、芳香族化合物をルイス酸の存在下酸無水物もしくは
酸ハロゲン化物と反応させるいわゆるフリ−デル−クラ
フツ反応(Friedel−Crafts反応)が良く
知られ、工業的にも広く利用されている。(新実験化学
講座,14巻,799ぺ−ジ及び806ペ−ジ,197
7年,丸善)。しかしながら一般的に、アシル化試薬と
して酸無水物を用いた時には少なくとも2等量の、又酸
ハロゲン化物を用いた時には少なくとも1等量のルイス
酸を必要としている(新実験化学講座,14巻,801
ぺ−ジ及び806ペ−ジ,1977年,丸善)。BACKGROUND ART As a method for producing an aromatic acyl compound, a so-called Friedel-Crafts reaction in which an aromatic compound is reacted with an acid anhydride or an acid halide in the presence of a Lewis acid is well known. Is widely used industrially. (New Experimental Chemistry Course, 14 volumes, 799 pages and 806 pages, 197
(7 years, Maruzen). However, generally, at least 2 equivalents of Lewis acid are required when an acid anhydride is used as an acylating reagent, and at least 1 equivalent when an acid halide is used (New Experimental Chemistry Course, Volume 14, 801
Page and page 806, 1977, Maruzen).
【0003】[0003]
【発明の解決しようとする課題】工業的に大量のルイス
酸を使用する際には、反応を行う際のルイス酸の添加時
又、反応終了後の後処理に於て、腐食性酸性ガスが発生
し、このことが大きな問題となってくる。このため、ル
イス酸の使用量を少なくする方法の開発が望まれている
が、その報告例は少ない。例えば、日野らは、硫酸鉄
(II)を高温加熱して触媒として用いトルエンのアセ
チル化を行っている(ケミストリ− レタ−ズ,325
ペ−ジ,1978年)。又、山口らは、やはり高温加熱
したヘテロポリ酸等をアシル化の触媒として用いること
を検討している(ケミストリ−レタ−ズ,1229ペ−
ジ,1982年)。しかしながら、これらの報告ではア
シル化反応に先立って数百度の高温で触媒を活性化させ
る必要があり、実用的でない。When a large amount of Lewis acid is industrially used, a corrosive acid gas is not added when the Lewis acid is added during the reaction or after the reaction. Occurs and this becomes a big problem. Therefore, development of a method for reducing the amount of Lewis acid used has been desired, but few reports have been made. For example, Hino et al. Used acetylation of toluene by heating iron (II) sulfate at high temperature as a catalyst (Chemistry Letters, 325).
Page, 1978). Yamaguchi et al. Are also studying the use of heteropolyacids and the like heated at high temperatures as a catalyst for acylation (Chemistry Letters, 1229 pages).
J., 1982). However, in these reports, it is necessary to activate the catalyst at a high temperature of several hundred degrees prior to the acylation reaction, which is not practical.
【0004】[0004]
【課題を解決するための手段】本発明者らは、芳香族化
合物を酸ハロゲン化物ないしは酸無水物によりアシル化
する際に、触媒量のルイス酸と触媒量の銀塩の共存によ
り、温和な条件で収率良く芳香族アシル化合物が得られ
ることを見い出し、更に詳細な検討を加えた結果、本発
明を完成したものである。The present inventors have found that when an aromatic compound is acylated with an acid halide or an acid anhydride, the presence of a catalytic amount of a Lewis acid and a catalytic amount of a silver salt causes a mild reaction. It was found that an aromatic acyl compound can be obtained in good yield under the conditions, and as a result of further detailed studies, the present invention has been completed.
【0005】すなわち、本発明は、芳香族化合物と酸ハ
ロゲン化物、酸無水物、混合酸無水物もしくは活性エス
テルとでフリ−デル−クラフツ反応によるアシル化を行
う際に、触媒量のルイス酸と共に触媒量の銀塩を用いる
ことを特徴とする芳香族アシル化合物の製造方法であ
る。That is, according to the present invention, when an aromatic compound and an acid halide, an acid anhydride, a mixed acid anhydride or an active ester are acylated by a Friedel-Crafts reaction, a catalytic amount of a Lewis acid is used. A method for producing an aromatic acyl compound, which comprises using a catalytic amount of a silver salt.
【0006】本発明の銀塩は、無機銀塩、有機酸銀塩が
使用できるわけであるが、過塩素酸銀、六フッ化アンチ
モン銀もしくはトリフロロメタンスルホン酸銀等が好ま
しい。 反応に用いる量は触媒量であり、アシル化され
る芳香族化合物に対して、1モル%から50モル%の間
で最適量を選択でき、5モル%から30モル%程度の使
用が好ましい。As the silver salt of the present invention, an inorganic silver salt or an organic acid silver salt can be used, and silver perchlorate, silver antimony hexafluoride, silver trifluoromethanesulfonate and the like are preferable. The amount used for the reaction is a catalytic amount, and the optimum amount can be selected from 1 mol% to 50 mol% with respect to the aromatic compound to be acylated, and the use of about 5 mol% to 30 mol% is preferable.
【0007】その他の反応の条件、すなわち反応溶媒、
反応温度、反応時間等の条件は、フリ−デル−クラフツ
型アシル化反応に於て一般的に用いられている条件を適
用できる。すなわち、反応溶媒として、四塩化炭素、ク
ロロホルム、ジクロロメタン、ジクロロエタン等のハロ
ゲン系溶媒、ニトロベンゼン、ニトロエタン等のニトロ
系溶媒、あるいは二硫化炭素等の溶媒の中から適宜選択
できる。反応温度は−80度〜溶媒の沸点までの温度範
囲から反応時間や収率を考慮して選択することが可能で
ある。Other reaction conditions, that is, a reaction solvent,
As the conditions such as reaction temperature and reaction time, the conditions generally used in the Friedel-Crafts type acylation reaction can be applied. That is, the reaction solvent can be appropriately selected from halogen solvents such as carbon tetrachloride, chloroform, dichloromethane and dichloroethane, nitro solvents such as nitrobenzene and nitroethane, and solvents such as carbon disulfide. The reaction temperature can be selected from the temperature range from −80 ° C. to the boiling point of the solvent in consideration of the reaction time and the yield.
【0008】本発明に於て使用するルイス酸は、フリ−
デル−クラフツ型アシル化反応に於て一般的に用いられ
ているものを使用できるわけであるが、例えばチタン、
ジルコニウム、鉄、銅、ホウ素、アルミニウム、ガリウ
ム、インジウム、ケイ素、ゲルマニウム、スズもしくは
アンチモン等のハロゲン化物の中から選択することがで
きる。それらは例えば、三塩化ガリウム、四塩化スズ、
三塩化ホウ素、四塩化ゲルマニウム、五塩化アンチモ
ン、三塩化鉄、三塩化アルミニウム、四塩化スズ、三塩
化インジウム、三臭化ホウ素、四塩化亜鉛、二塩化ス
ズ、二塩化銅もしくは四塩化チタン等である。反応に用
いる量は触媒量であり、アシル化される芳香族化合物に
対して、1モル%から50モル%の間で最適量を選択で
き、5モル%から30モル%程度の使用が好ましい。The Lewis acid used in the present invention is a free acid.
What is generally used in the Del-Crafts type acylation reaction can be used, for example, titanium,
It can be selected from halides such as zirconium, iron, copper, boron, aluminum, gallium, indium, silicon, germanium, tin or antimony. They are, for example, gallium trichloride, tin tetrachloride,
Boron trichloride, germanium tetrachloride, antimony pentachloride, iron trichloride, aluminum trichloride, tin tetrachloride, indium trichloride, boron tribromide, zinc tetrachloride, tin dichloride, copper dichloride or titanium tetrachloride etc. is there. The amount used for the reaction is a catalytic amount, and the optimum amount can be selected from 1 mol% to 50 mol% with respect to the aromatic compound to be acylated, and the use of about 5 mol% to 30 mol% is preferable.
【0009】本発明の適用しうる芳香族化合物は、フリ
−デル−クラフツ型アシル化反応に於て一般的に用いら
れている芳香族化合物を使用できるわけであるが、例え
ばピロール、フラン、チオフェン、ピリジン、インドー
ル、ベンゾフラン、ベンゾチオフェンなどの複素環芳香
族化合物あるいはベンゼン、ナフタレン、アントラセン
などの芳香族化合物である。As the aromatic compound to which the present invention is applicable, aromatic compounds generally used in the Friedel-Crafts type acylation reaction can be used. For example, pyrrole, furan and thiophene. , Heterocyclic aromatic compounds such as pyridine, indole, benzofuran, and benzothiophene, or aromatic compounds such as benzene, naphthalene, and anthracene.
【0010】さらに、本発明の適用しうる芳香族化合物
は各種の置換基を有していてもよく例えば、 一般式
(I)Further, the aromatic compound applicable to the present invention may have various substituents, for example, the compound represented by the general formula (I)
【0011】[0011]
【化1】 [Chemical 1]
【0012】(式中、R1、R2、R3は、同一又は異な
って、水素原子、ハロゲン原子、アルキル基、アルコキ
シ基、アルキルチオ基、アルカンカルボキサミド基、ア
ルキルアミノ基、ジアルキルアミノ基もしくはヒドロキ
シ基を示し、Hetはピロール、フラン、チオフェン、
ピリジン、インドール、ベンゾフラン、ベンゾチオフェ
ンなどの芳香族複素環あるいはベンゼン、ナフタレン、
アントラセンなどの芳香族環を示す。)で表わされる芳
香族化合物および一般式(II)(Wherein R 1, R 2 and R 3 are the same or different and represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkylthio group, an alkanecarboxamide group, an alkylamino group, a dialkylamino group or a hydroxy group. , Het is pyrrole, furan, thiophene,
Aromatic heterocycles such as pyridine, indole, benzofuran, benzothiophene or benzene, naphthalene,
An aromatic ring such as anthracene is shown. ) And the general formula (II)
【0013】[0013]
【化2】 [Chemical 2]
【0014】(式中、R1及びR2は、同一又は異なっ
て、水素原子、ハロゲン原子、アルキル基、アルコキシ
基、アルキルチオ基、アルカンカルボキサミド基、アル
キルアミノ基、ジアルキルアミノ基もしくはヒドロキシ
基を示し、Hetはピロール、フラン、チオフェン、ピ
リジン、インドール、ベンゾフラン、ベンゾチオフェン
などの複素環芳香族化合物あるいはベンゼン、ナフタレ
ン、アントラセンなどの芳香族化合物を示し、Yは、C
H2、O、もしくはSを示し、nは、1〜4の整数を示
し、COXは、酸ハロゲン化物、酸無水物、混合酸無水
物もしくは活性エステルを示す。)で表わされる芳香族
アルカン酸化合物である。(Wherein R 1 and R 2 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkylthio group, an alkanecarboxamide group, an alkylamino group, a dialkylamino group or a hydroxy group, and Het Represents a heterocyclic aromatic compound such as pyrrole, furan, thiophene, pyridine, indole, benzofuran and benzothiophene, or an aromatic compound such as benzene, naphthalene and anthracene, and Y represents C
H2, O, or S is shown, n is an integer of 1 to 4, and COX is an acid halide, an acid anhydride, a mixed acid anhydride, or an active ester. ) Is an aromatic alkanoic acid compound.
【0015】以下、本発明の一般的な製造方法を例示す
る。上記の一般式(I)で表わされる芳香族化合物およ
び一般式(III) RCOX (III) (式中、Rは、炭素数1〜10個からなる直鎖状、分枝
状または環状のアルキル基、もしくは置換されていても
よい芳香族環を示し、COXは、酸ハロゲン化物、酸無
水物、混合酸無水物もしくは活性エステルを示す。)で
表わされるアシル化剤との反応に於て、触媒量のルイス
酸と共に触媒量の銀塩を用い、一般式(IV)The general manufacturing method of the present invention will be illustrated below. The aromatic compound represented by the above general formula (I) and the general formula (III) RCOX (III) (In the formula, R is a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms. , Or an optionally substituted aromatic ring, and COX represents an acid halide, an acid anhydride, a mixed acid anhydride, or an active ester). Using a catalytic amount of a silver salt with an amount of Lewis acid, the general formula (IV)
【0016】[0016]
【化3】 (式中、Rは、炭素数1〜10個からなる直鎖状、分枝
状または環状のアルキル基、もしくは置換されていても
よい芳香族環を示し、R1、R2及びR3は、同一又は異
なって、水素原子、ハロゲン原子、アルキル基、アルコ
キシ基、アルキルチオ基、アルカンカルボキサミド基、
アルキルアミノ基、ジアルキルアミノ基もしくはヒドロ
キシ基を示し、Hetはピロール、フラン、チオフェ
ン、ピリジン、インドール、ベンゾフラン、ベンゾチオ
フェンなどの複素環芳香族化合物あるいはベンゼン、ナ
フタレン、アントラセンなどの芳香族化合物を示す。)
で表わされる芳香族アシル化合物が製造できる。[Chemical 3] (In the formula, R represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, or an aromatic ring which may be substituted, and R 1, R 2 and R 3 are the same or Differently, a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkylthio group, an alkanecarboxamide group,
Het represents an alkylamino group, a dialkylamino group or a hydroxy group, and Het represents a heterocyclic aromatic compound such as pyrrole, furan, thiophene, pyridine, indole, benzofuran or benzothiophene, or an aromatic compound such as benzene, naphthalene or anthracene. )
An aromatic acyl compound represented by can be produced.
【0017】また、本発明は分子内のフリ−デル−クラ
フツ型アシル化反応にも適用され得る。例えば、一般式
(II)The present invention can also be applied to an intramolecular Friedel-Crafts type acylation reaction. For example, the general formula (II)
【0018】[0018]
【化4】 [Chemical 4]
【0019】(式中、R1及びR2は、同一又は異なっ
て、水素原子、ハロゲン原子、アルキル基、アルコキシ
基、アルキルチオ基、アルカンカルボキサミド基、アル
キルアミノ基、ジアルキルアミノ基もしくはヒドロキシ
基を示し、Hetはピロール、フラン、チオフェン、ピ
リジン、インドール、ベンゾフラン、ベンゾチオフェン
などの芳香族複素環あるいはベンゼン、ナフタレン、ア
ントラセンなどの芳香族環を示し、Yは、CH2、O、
もしくはSを示し、nは、1〜4の整数を示し、COX
は、酸ハロゲン化物、酸無水物、混合酸無水物もしくは
活性エステルを示す。)で表わされる芳香族アルカン酸
の酸ハロゲン化物、酸無水物、混合酸無水物もしくは活
性エステル誘導体を触媒量のルイス酸と共に触媒量の銀
塩を用いて分子内アシル化反応を行い、一般式(V)(Wherein R 1 and R 2 are the same or different and represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkylthio group, an alkanecarboxamide group, an alkylamino group, a dialkylamino group or a hydroxy group, and Het Represents an aromatic heterocycle such as pyrrole, furan, thiophene, pyridine, indole, benzofuran and benzothiophene, or an aromatic ring such as benzene, naphthalene and anthracene, and Y represents CH2, O,
Alternatively, it represents S, n represents an integer of 1 to 4, and COX
Represents an acid halide, an acid anhydride, a mixed acid anhydride or an active ester. ), An acid halide, an acid anhydride, a mixed acid anhydride or an active ester derivative of an aromatic alkanoic acid represented by the formula (1) is subjected to an intramolecular acylation reaction using a catalytic amount of a silver salt together with a catalytic amount of a Lewis acid, (V)
【0020】[0020]
【化5】 [Chemical 5]
【0021】(式中、R1及びR2は、同一又は異なっ
て、水素原子、ハロゲン原子、アルキル基、アルコキシ
基、アルキルチオ基、アルカンカルボキサミド基、アル
キルアミノ基、ジアルキルアミノ基もしくはヒドロキシ
基を示し、Hetはピロール、フラン、チオフェン、ピ
リジン、インドール、ベンゾフラン、ベンゾチオフェン
などの複素環芳香族化合物あるいはベンゼン、ナフタレ
ン、アントラセンなどの芳香族化合物を示し、Yは、C
H2、O、もしくはSを示し、nは、1〜4の整数を示
す。)で表わされる芳香族アシル化合物を製造できる。(Wherein R 1 and R 2 are the same or different and represent a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkylthio group, an alkanecarboxamide group, an alkylamino group, a dialkylamino group or a hydroxy group, and Het Represents a heterocyclic aromatic compound such as pyrrole, furan, thiophene, pyridine, indole, benzofuran and benzothiophene, or an aromatic compound such as benzene, naphthalene and anthracene, and Y represents C
H2, O, or S is shown, and n is an integer of 1 to 4. An aromatic acyl compound represented by
【0022】前述のR1、R2、R3にて表わされるハロ
ゲン原子とはフッ素、塩素、臭素、ヨウ素等である。
又、R1、R2、R3にて表わされるアルキル基、アルコ
キシ基、アルキルチオ基、アルカンカルボキサミド基、
モノアルキルアミノ基、ジアルキルアミノ基に含まれる
アルキルとしては、メチル、エチル、プロピル、イソプ
ロピル、ブチル、イソブチル、t−ブチル、ペンチル、
イソペンチル、ヘキシル、シクロヘキシル、ヘプチル、
シクロヘプチル等の1〜10個の炭素原子からなる直鎖
状、分枝状、環状のアルキルを意味する。The halogen atom represented by R1, R2 and R3 is fluorine, chlorine, bromine, iodine or the like.
In addition, an alkyl group represented by R1, R2, and R3, an alkoxy group, an alkylthio group, an alkanecarboxamide group,
Examples of the alkyl contained in the monoalkylamino group and the dialkylamino group include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, t-butyl, pentyl,
Isopentyl, hexyl, cyclohexyl, heptyl,
It means a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms such as cycloheptyl.
【0023】Rにて表わされる炭素数1〜10個からな
る直鎖状、分枝状または環状のアルキル基とは、メチ
ル、エチル、プロピル、イソプロピル、ブチル、イソブ
チル、t−ブチル、ペンチル、イソペンチル、ヘキシ
ル、シクロヘキシル、ヘプチル、シクロヘプチル等の1
〜10個の炭素原子からなる直鎖状、分枝状、環状のア
ルキル基を意味する。The linear, branched or cyclic alkyl group having 1 to 10 carbon atoms represented by R means methyl, ethyl, propyl, isopropyl, butyl, isobutyl, t-butyl, pentyl and isopentyl. , Hexyl, cyclohexyl, heptyl, cycloheptyl, etc. 1
It means a linear, branched, or cyclic alkyl group consisting of 10 carbon atoms.
【0024】[0024]
【発明の効果】従来の芳香族化合物のフリ−デル−クラ
フツ型アシル化反応においては、原料の芳香族化合物に
対し1当量以上のルイス酸を必要としたが、本発明によ
り1/10から1/5等量で反応が可能となり、工業的
に大量のルイス酸を使用する際のルイス酸による腐食性
酸性ガスの発生等の諸問題が解決され、安全な、芳香族
化合物のフリ−デル−クラフツ型アシル化反応が可能と
なった。In the conventional Friedel-Crafts type acylation reaction of an aromatic compound, 1 equivalent or more of Lewis acid is required with respect to the starting aromatic compound, but according to the present invention, 1/10 to 1 The reaction is possible in / 5 equivalents, and various problems such as generation of corrosive acid gas due to Lewis acid when industrially using a large amount of Lewis acid are solved, and it is a safe, aromatic compound freeder- Crafts-type acylation reaction became possible.
【0025】[0025]
【実施例】以下、実施例により本発明を更に具体的に説
明する。The present invention will be described in more detail with reference to the following examples.
【0026】実施例1 1−(4−メトキシフェニル)−1−ヘキサノンの製造 無水四塩化スズ261mg、過塩素酸銀207mgを乾
燥ジクロロメタン10mlに懸濁し、室温にて10分間
攪拌した。次に、氷冷下攪拌しながらメトキシベンゼン
(アニソ−ル)1.08gを加えた。さらに無水ヘキサ
ン酸(無水カプロン酸)4.28gを乾燥ジクロロメタ
ン10mlに溶解して滴下した。その後、室温にて20
時間攪拌した。反応終了後、反応混合物を希塩酸−氷中
へ注ぎ水相をクロロホルムにて抽出した。有機相を希塩
酸、水、重曹水、水、飽和食塩水にて洗浄後無水硫酸マ
グネシウムにて乾燥した。溶媒を減圧留去、残渣をシリ
カゲルカラムクロマトにて精製し、1.75gの1−
(4−メトキシフェニル)−1−ヘキサノン(油状物)
を得た。Example 1 Preparation of 1- (4-methoxyphenyl) -1-hexanone 261 mg of anhydrous tin tetrachloride and 207 mg of silver perchlorate were suspended in 10 ml of dry dichloromethane and stirred at room temperature for 10 minutes. Next, 1.08 g of methoxybenzene (anisole) was added with stirring under ice cooling. Further, 4.28 g of hexanoic anhydride (caproic anhydride) was dissolved in 10 ml of dry dichloromethane and added dropwise. Then, at room temperature, 20
Stir for hours. After completion of the reaction, the reaction mixture was poured into diluted hydrochloric acid-ice and the aqueous phase was extracted with chloroform. The organic phase was washed with dilute hydrochloric acid, water, aqueous sodium hydrogen carbonate, water and saturated brine, and dried over anhydrous magnesium sulfate. The solvent was distilled off under reduced pressure, the residue was purified by silica gel column chromatography, and 1.75 g of 1-
(4-Methoxyphenyl) -1-hexanone (oil)
Got
【0027】実施例2〜12 種々のルイス酸(10モル%)と過塩素酸銀(10〜2
0モル%)を用い実施例1と同様な反応を行い1−(4
−メトキシフェニル)−1−ヘキサノンを得た。結果を
表1に示す。Examples 2 to 12 Various Lewis acids (10 mol%) and silver perchlorate (10 to 2)
0 mol%) and the same reaction as in Example 1 was performed 1- (4
-Methoxyphenyl) -1-hexanone was obtained. The results are shown in Table 1.
【0028】[0028]
【表1】 [Table 1]
【0029】実施例13〜14 ルイス酸として三塩化ガリウム(GaCl3)10モル
%と銀塩として種々の銀塩10モル%を用いて実施例1
と同様の反応を行い。1−(4−メトキシフェニル)−
1−ヘキサノンを得た。結果を表2に示す。Examples 13 to 14 Example 1 using 10 mol% of gallium trichloride (GaCl3) as the Lewis acid and 10 mol% of various silver salts as the silver salt.
Perform the same reaction as. 1- (4-methoxyphenyl)-
1-hexanone was obtained. The results are shown in Table 2.
【0030】[0030]
【表2】 [Table 2]
【0031】実施例15 1−(3,4−ジメトキシフェニル)−1−ペンタノン
の製造 三塩化ガリウム176mg、過塩素酸銀414mgを乾
燥ジクロロメタン10mlに懸濁し、室温にて10分間
攪拌した。次に、氷冷下攪拌しながらo−ジメトキシベ
ンゼン1.38gを加えた。さらに無水ペンタン酸(無
水吉草酸)3.72gを乾燥ジクロロメタン10mlに
溶解して滴下した。その後、室温にて6時間攪拌した。
反応終了後、反応混合物を希塩酸−氷中へ注ぎ水相をク
ロロホルムにて抽出した。有機相を希塩酸、水、重曹
水、水、飽和食塩水にて洗浄後無水硫酸マグネシウムに
て乾燥した。溶媒を減圧留去、残渣をシリカゲルカラム
クロマトにて精製し、2.06gの1−(3,4−ジメ
トキシフェニル)−1−ペンタノン(油状物)を得た。Example 15 Preparation of 1- (3,4-dimethoxyphenyl) -1-pentanone 176 mg of gallium trichloride and 414 mg of silver perchlorate were suspended in 10 ml of dry dichloromethane and stirred at room temperature for 10 minutes. Next, 1.38 g of o-dimethoxybenzene was added with stirring under ice cooling. Furthermore, 3.72 g of pentanoic anhydride (valeric anhydride) was dissolved in 10 ml of dry dichloromethane and added dropwise. Then, it stirred at room temperature for 6 hours.
After completion of the reaction, the reaction mixture was poured into diluted hydrochloric acid-ice and the aqueous phase was extracted with chloroform. The organic phase was washed with dilute hydrochloric acid, water, aqueous sodium hydrogen carbonate, water and saturated brine, and dried over anhydrous magnesium sulfate. The solvent was distilled off under reduced pressure, and the residue was purified by silica gel column chromatography to obtain 2.06 g of 1- (3,4-dimethoxyphenyl) -1-pentanone (oil).
【0032】実施例16〜36 三塩化ガリウム10モル%及び過塩素酸銀10〜20モ
ル%を用いて、種々の芳香族化合物に、種々のアシル化
試薬を作用させ、実施例15と同様な反応を行ない種々
の芳香族アシル化合物を得た。結果を表3と表4に示
す。Examples 16 to 36 Various aromatic compounds were reacted with various acylating reagents using 10 mol% of gallium trichloride and 10 to 20 mol% of silver perchlorate, and the same procedure as in Example 15 was performed. The reaction was carried out to obtain various aromatic acyl compounds. The results are shown in Tables 3 and 4.
【0033】[0033]
【表3】 [Table 3]
【表4】 [Table 4]
【0034】実施例37 4’−メトキシアセトフェノンの製造 無水四塩化スズ261mg、過塩素酸銀414mgを乾
燥ジクロロメタン10mlに懸濁し、室温にて10分間
攪拌した。次に、氷冷下攪拌しながらメトキシベンゼン
(アニソ−ル)1.08gを加えた。更に酢酸クロライ
ド1.58gをジクロロメタン10mlに溶解して滴下
した。その後、室温にて40時間攪拌した。反応終了
後、反応液を希塩酸と氷の混合物中に注ぎ、水相をクロ
ロホルムにて抽出した。有機相を希塩酸、水、重曹水、
水、飽和食塩水にて洗浄後、無水硫酸マグネシウムにて
乾燥した。溶媒を減圧留去し、残渣をシリカゲルカラム
クロマトにて精製した。0.98gの4’−メトキシア
セトフェノン(油状物)を得た。Example 37 Production of 4'-methoxyacetophenone 261 mg of anhydrous tin tetrachloride and 414 mg of silver perchlorate were suspended in 10 ml of dry dichloromethane and stirred at room temperature for 10 minutes. Next, 1.08 g of methoxybenzene (anisole) was added with stirring under ice cooling. Further, 1.58 g of acetic acid chloride was dissolved in 10 ml of dichloromethane and added dropwise. Then, it stirred at room temperature for 40 hours. After completion of the reaction, the reaction solution was poured into a mixture of dilute hydrochloric acid and ice, and the aqueous phase was extracted with chloroform. The organic phase is diluted hydrochloric acid, water, sodium bicarbonate water,
The extract was washed with water and saturated saline and then dried over anhydrous magnesium sulfate. The solvent was distilled off under reduced pressure, and the residue was purified by silica gel column chromatography. Obtained 0.98 g of 4'-methoxyacetophenone (oil).
【0035】実施例38〜47 無水四塩化スズ10モル%及び過塩素酸銀10〜20モ
ル%を用いて、実施例37と同様に、アニソ−ルを種々
のアシル化試薬にてアシル化しアニソ−ルのアシル体を
得た。結果を表5に示す。Examples 38 to 47 Anisole was acylated with various acylating reagents in the same manner as in Example 37 using 10 mol% of anhydrous tin tetrachloride and 10 to 20 mol% of silver perchlorate. -Acyl acyl compound was obtained. The results are shown in Table 5.
【0036】[0036]
【表5】 [Table 5]
【0037】実施例48 1H−2,3−ジヒドロナフト[2,1−b]チオピラ
ン−1−オンの製造 無水四塩化スズ261mgと六フッ化アンチモン銀(A
gSbF6)688mgを乾燥ジクロロエタン20ml
に懸濁し、室温にて10分間攪拌した。次に、3−
((2−ナフチル)チオ)プロパン酸2.32gとチオ
ニルクロライド1.8gより常法により得た3−((2
−ナフチル)チオ)プロパン酸クロライドを乾燥ジクロ
ロエタン10mlに溶解して加え、3時間還流した。反
応終了後、反応液を冷却し氷と希塩酸の混合物中へ注
ぎ、水相をクロロホルムにて抽出した。有機相を希塩
酸、水、重曹水、水、飽和食塩水にて洗浄後、無水硫酸
マグネシウムにて乾燥した。溶媒を減圧留去し、残渣を
シリカゲルカラムクロマトにて精製し、さらに酢酸エチ
ル−n−ヘキサンより再結晶し1.83gの1H−2,
3−ジヒドロナフト[2,1−b]チオピラン−1−オ
ンを結晶として得た。mp66−68℃。Example 48 Preparation of 1 H -2,3-dihydronaphtho [2,1-b] thiopyran-1-one 261 mg of anhydrous tin tetrachloride and silver antimony hexafluoride (A)
gSbF6) 688 mg with dried dichloroethane 20 ml
And was stirred at room temperature for 10 minutes. Next, 3-
3-((2 obtained by a conventional method from 2.32 g of ((2-naphthyl) thio) propanoic acid and 1.8 g of thionyl chloride.
-Naphthyl) thio) propanoic acid chloride was dissolved in 10 ml of dry dichloroethane and added and refluxed for 3 hours. After completion of the reaction, the reaction solution was cooled, poured into a mixture of ice and dilute hydrochloric acid, and the aqueous phase was extracted with chloroform. The organic phase was washed with dilute hydrochloric acid, water, aqueous sodium hydrogen carbonate, water and saturated brine, and dried over anhydrous magnesium sulfate. The solvent was distilled off under reduced pressure, the residue was purified by silica gel column chromatography, and recrystallized from ethyl acetate-n-hexane to give 1.83 g of 1 H- 2.
3-Dihydronaphtho [2,1-b] thiopyran-1-one was obtained as crystals. mp 66-68 ° C.
【0038】実施例49 三塩化ガリウム176mgと六フッ化アンチモン銀68
8mgを用いて、実施例48と同様な反応を行い91%
の収率で1.95gの1H−2,3−ジヒドロナフト
[2,1−b]チオピラン−1−オンを結晶として得
た。mp65−68℃。Example 49 176 mg of gallium trichloride and silver antimony hexafluoride 68
A reaction similar to that in Example 48 was carried out using 8 mg to obtain 91%.
With a yield of 1.95 g of 1 H -2,3-dihydronaphtho [2,1-b] thiopyran-1-one was obtained as crystals. mp 65-68 ° C.
【0039】実施例50 実施例48と同様な反応を、三塩化ガリウム176mg
と過塩素酸銀414mgを用い、室温下20時間反応さ
せた。89%の収率で1.90gの1H−2,3−ジヒ
ドロナフト[2,1−b]チオピラン−1−オンを結晶
として得た。mp66−68℃。Example 50 The same reaction as in Example 48 was repeated except that 176 mg of gallium trichloride was used.
And 414 mg of silver perchlorate were used and reacted at room temperature for 20 hours. 1.90 g of 1 H -2,3-dihydronaphtho [2,1-b] thiopyran-1-one was obtained as crystals with a yield of 89%. mp 66-68 ° C.
【0040】実施例51 4−フェニルブタン酸1.64gより得られる酸クロラ
イドを用いて実施例48と同様に分子内アシル化反応を
還流下5時間行い、80%の収率で1.17gのα−テ
トラロンを油状物として得た。Example 51 Intramolecular acylation reaction was carried out under reflux for 5 hours in the same manner as in Example 48 using an acid chloride obtained from 1.64 g of 4-phenylbutanoic acid, and 1.17 g of 80% yield was obtained. α-Tetralone was obtained as an oil.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 C07D 335/08 // C07B 61/00 300 ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Internal reference number FI technical display location C07D 335/08 // C07B 61/00 300
Claims (2)
おいて、無機銀塩および有機酸銀塩からなる群より選ば
れる1種又は2種の銀塩を加えることを特徴とする芳香
族アシル化合物の製造方法。1. A Friedel-Crafts type acylation reaction, wherein one or two silver salts selected from the group consisting of an inorganic silver salt and an organic acid silver salt are added to an aromatic acyl compound. Production method.
おいて、過塩素酸銀、六フッ化アンチモン銀及びトリフ
ロロメタンスルホン酸銀からなる群より選ばれる1種又
は2種の銀塩を加えることを特徴とする芳香族アシル化
合物の製造方法。2. Addition of one or two silver salts selected from the group consisting of silver perchlorate, silver antimony hexafluoride and silver trifluoromethanesulfonate in the Friedel-Crafts acylation reaction. A method for producing an aromatic acyl compound, comprising:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3130345A JPH06135883A (en) | 1991-05-02 | 1991-05-02 | Production of aromatic acyl compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3130345A JPH06135883A (en) | 1991-05-02 | 1991-05-02 | Production of aromatic acyl compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH06135883A true JPH06135883A (en) | 1994-05-17 |
Family
ID=15032173
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3130345A Pending JPH06135883A (en) | 1991-05-02 | 1991-05-02 | Production of aromatic acyl compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH06135883A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4824700A (en) * | 1986-09-02 | 1989-04-25 | Sherex Chemical Company, Inc. | Paintable adhesion promoter system for polyvinyl chloride plastisols |
WO2002055483A1 (en) * | 2001-01-09 | 2002-07-18 | Japan Science And Technology Corporation | Method of friedel-crafts acylation of anilides |
US6761205B1 (en) * | 1999-08-17 | 2004-07-13 | Eric John Atherton | Barrier |
-
1991
- 1991-05-02 JP JP3130345A patent/JPH06135883A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4824700A (en) * | 1986-09-02 | 1989-04-25 | Sherex Chemical Company, Inc. | Paintable adhesion promoter system for polyvinyl chloride plastisols |
US6761205B1 (en) * | 1999-08-17 | 2004-07-13 | Eric John Atherton | Barrier |
WO2002055483A1 (en) * | 2001-01-09 | 2002-07-18 | Japan Science And Technology Corporation | Method of friedel-crafts acylation of anilides |
US7214827B2 (en) | 2001-01-09 | 2007-05-08 | Japan Science And Technology Corporation | Method for Friedel-Crafts acylation of anilides |
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