JPH0597548A - Method for producing high-density material and apparatus therefor - Google Patents

Method for producing high-density material and apparatus therefor

Info

Publication number
JPH0597548A
JPH0597548A JP3262252A JP26225291A JPH0597548A JP H0597548 A JPH0597548 A JP H0597548A JP 3262252 A JP3262252 A JP 3262252A JP 26225291 A JP26225291 A JP 26225291A JP H0597548 A JPH0597548 A JP H0597548A
Authority
JP
Japan
Prior art keywords
gas
pressure
chamber
density
phase chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3262252A
Other languages
Japanese (ja)
Inventor
Noboru Nakao
昇 中尾
Yoshihiko Sakashita
由彦 坂下
Kazuo Kitagawa
一男 北川
Takeshi Kanda
神田  剛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP3262252A priority Critical patent/JPH0597548A/en
Publication of JPH0597548A publication Critical patent/JPH0597548A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To obtain a carbon material, etc., having high density in an extremely short time by carrying out a vapor-phase chemical reactional deposition under pressure. CONSTITUTION:A heat-insulation layer, having the shape of an inverted cup is placed in a high-pressure vessel 1 and a heater 8 is formed in the heat- insulation layer 7 to form a high-pressure high-temperature furnace chamber 10. A partition wall 11 is placed in the furnace chamber 10 to form a reactional chamber 13 in the furnace. The reactional chamber 13 has an inlet port 15 and an outlet port 16 to introduce and discharge a raw material gas for the vapor-phase chemical reaction.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、気相化学浸透法でもっ
て、高密度の例えば炭素/炭素複合材料を製造するため
の方法および装置に関する。
FIELD OF THE INVENTION This invention relates to a method and apparatus for producing high density, eg, carbon / carbon composites, by vapor phase chemical infiltration.

【0002】[0002]

【従来の技術】高密度材料の製造方法としては、加圧力
による方法が一般的なものとして知られている。ホット
プレスによる一軸加圧焼結、熱間等方圧加圧装置による
等方圧加圧焼結などがそれであり、金属あるいはセラミ
ックスの高密度化に幅広く用いられている。その他、炭
素/炭素複合材料の製造においては、ピッチを液相で加
圧下に含浸かつ炭素化する高圧含浸炭素化の方法などが
知られている。
2. Description of the Related Art As a method for producing a high-density material, a method using pressure is generally known. Uniaxial pressure sintering by hot pressing, isotropic pressure sintering by hot isostatic pressing, and the like are widely used for densification of metals or ceramics. In addition, in the production of carbon / carbon composite materials, a method of high pressure impregnation carbonization in which pitch is impregnated and carbonized in a liquid phase under pressure is known.

【0003】一方このような高圧力を使わずとも、上記
の含浸を減圧もしくは常圧気相下に行わしめて高密度化
する気相化学浸透法が知られている。
On the other hand, there is known a vapor-phase chemical permeation method in which the above-mentioned impregnation is carried out under reduced pressure or atmospheric pressure in a vapor phase without using such a high pressure to increase the density.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、従来の
気相化学浸透法による高密度化技術は、材料(被処理
物)の高密度化に極めて長時間を要するという課題があ
った。本発明は、叙述の課題に鑑み、加圧下に気相化学
浸透処理を行なうことにより、効率的に高密度材料の製
造が可能な方法と装置とを提供するのが目的である。
However, the conventional densification technique by the vapor phase chemical permeation method has a problem that it takes a very long time to densify the material (object to be treated). In view of the above-mentioned problems, it is an object of the present invention to provide a method and an apparatus capable of efficiently producing a high density material by performing a vapor phase chemical infiltration treatment under pressure.

【0005】[0005]

【課題を解決するための手段】方法に係る本発明は、前
述目的を達成するために、高圧容器1 内に倒立コップ形
状の断熱層7 を設け、該断熱層7内に加熱体8 を設けて
高圧高温炉室10を形成してなり、該炉室10に隔壁11を設
けて内部に反応室13を画成した装置を用いて被処理物25
を高密度にする方法であって、前記反応室13内に原料ガ
スを導入、排出して被処理物25に対して加圧流通下に気
相化学反応蒸着を行わしめることを特徴とするものであ
る。
[Means for Solving the Problems] In order to achieve the above-mentioned object, the present invention provides an inverted cup-shaped heat insulating layer 7 in a high-pressure vessel 1, and a heating body 8 in the heat insulating layer 7. A high-pressure high-temperature furnace chamber 10 is formed, and a partition wall 11 is provided in the furnace chamber 10 to define a reaction chamber 13 therein.
Is a method for increasing the density, characterized in that the source gas is introduced into and discharged from the reaction chamber 13 and vapor-phase chemical reaction vapor deposition is performed on the object to be processed 25 under pressure flow. Is.

【0006】装置に係る本発明は、前述目的を達成する
ために、高圧容器1 内に倒立コップ形状の断熱層7 を設
け、該断熱層7 内に加熱体8 を設けて高圧高温炉室10を
形成してなり、該炉室10に隔壁11を設けて内部に反応室
13を画成し、該反応室13内で気相化学反応を行わしめる
ための原料ガスの導入口15および排出口16が設けられて
いることを特徴とするものである。
In order to achieve the above-mentioned object, the present invention relating to the apparatus is provided with an inverted cup-shaped heat-insulating layer 7 in the high-pressure container 1, and a heating body 8 is provided in the heat-insulating layer 7 to provide a high-pressure high-temperature furnace chamber 10. And a partition wall 11 is provided in the furnace chamber 10 to form a reaction chamber inside.
It is characterized in that an inlet port 15 and an outlet port 16 for a source gas for defining 13 and for causing a gas phase chemical reaction in the reaction chamber 13 are provided.

【0007】[0007]

【作用】本発明によれば、反応室13の被処理物25は、圧
力を有する原料ガスによる気相化学反応蒸着、すなわ
ち、加圧下の気相化学反応と、さらには被処理物25内部
への押込力としての圧力の利用によって、高密度化が効
率よくなされる。
According to the present invention, the object to be processed 25 in the reaction chamber 13 is vapor-phase chemical reaction vapor deposition by a source gas having a pressure, that is, the gas-phase chemical reaction under pressure and further to the inside of the object to be processed 25. By utilizing the pressure as the pushing force of, the densification is efficiently performed.

【0008】[0008]

【実施例】以下、図を参照して装置に係る本発明の実施
例を説明し、方法に係る本発明の実施例を説明する。装
置に係る本発明の第1実施例を示す図1において、円筒
状に形成された高圧容器1 の上下開口部には上蓋2 およ
び下蓋3 が嵌合され、シール部材4,5 によって気密を保
持することにより高圧室6 が形成してある。なお、上下
蓋2,3 に作用する軸力は、図示していないが上下蓋2,3
に係脱自在に係合する旋回形もしくは走行台車形のプレ
スフレームで担持するようになっている。
Embodiments of the present invention relating to an apparatus and embodiments of the present invention relating to a method will be described below with reference to the drawings. In FIG. 1 showing the first embodiment of the present invention relating to the apparatus, an upper lid 2 and a lower lid 3 are fitted into the upper and lower openings of a cylindrical high-pressure vessel 1, and airtightness is provided by seal members 4 and 5. The high pressure chamber 6 is formed by holding it. The axial force acting on the upper and lower lids 2 and 3 is not shown, but the upper and lower lids 2 and 3 are not shown.
It is carried by a swivel type or traveling dolly type press frame which is detachably engaged with the.

【0009】高圧室6 内には倒立コップ形状の断熱層7
が設置され、該断熱層7 の内側に加熱体8 が設置されて
おり、上蓋2 に形成した通路9 からの高圧ガスの導入と
前記加熱体8 への電力の投入によって昇温昇圧してHI
P処理用の炉室10が形成してある。なお、導入ガスとし
ては、アルゴンなどの不活性ガスが一般に用いられる。
The high pressure chamber 6 has an inverted cup-shaped heat insulating layer 7
The heating element 8 is installed inside the heat insulation layer 7, and the temperature is raised and raised by introducing high-pressure gas from the passage 9 formed in the upper lid 2 and supplying electric power to the heating element 8 to raise the temperature.
A furnace chamber 10 for P treatment is formed. An inert gas such as argon is generally used as the introduction gas.

【0010】炉室10内には、倒立コップ形状の隔壁11が
図示例では下蓋3 上にシール部材12を介して固設される
ことで、気相化学反応蒸着を行わしめる反応室13を画成
されている。この場合、炉室10と反応室13を厳密に仕切
るという点では気体浸透性のない金属材料で隔壁11を構
成することが望ましく、一方、これに伴ってアルゴン等
の不活性ガスのもとで運転される炉室10と反応性ガスに
より反応蒸着を行なう反応室13との圧力バランスを取る
必要が生じ、例えば炉室10の圧力に対して反応室13の原
料ガス圧力を一定に保持して隔壁11の圧力破損等を防止
するようにする。
In the furnace chamber 10, an inverted cup-shaped partition wall 11 is fixedly installed on the lower lid 3 via a seal member 12 in the illustrated example, so that a reaction chamber 13 for carrying out vapor phase chemical reaction vapor deposition is formed. Well defined. In this case, it is desirable that the partition wall 11 be made of a metal material having no gas permeability in that the furnace chamber 10 and the reaction chamber 13 are strictly separated from each other. It is necessary to balance the pressure between the furnace chamber 10 that is operated and the reaction chamber 13 that performs reactive vapor deposition with a reactive gas.For example, by keeping the source gas pressure of the reaction chamber 13 constant with respect to the pressure of the furnace chamber 10. The partition wall 11 is prevented from being damaged by pressure.

【0011】隔壁11はこれを気体浸透性のある例えば、
多孔質のセラミックス等で構成することもでき、この場
合には、反応室13内の反応ガス (原料ガス) が加熱体8
に接触して電気的絶縁を破壊するのを防止すべく反応室
13内のガス圧力を炉室10内の圧力に対して僅かに低くな
るように制御して、隔壁11を通して不活性ガスのもれこ
みを起させつつ反応ガスを流すようにする。
The partition wall 11 has a gas-permeable material, for example,
It can also be made of porous ceramics or the like. In this case, the reaction gas (raw material gas) in the reaction chamber 13 is the heating element 8
Reaction chamber to prevent electrical contact from breaking electrical insulation.
The gas pressure inside 13 is controlled so as to be slightly lower than the pressure inside the furnace chamber 10, and the reaction gas is caused to flow while causing leakage of the inert gas through the partition wall 11.

【0012】下蓋3 上の反応室13には円筒状の断熱層14
が設けてあり、更に、下蓋3 には反応室13に対する反応
(原料) ガスの導入口15および排出口16が設けられてい
る。導入口15には下蓋3 にシール部材17を介してねじ込
まれた導入導管18が気密に接続されていて、該導管18の
先端には多数の孔19を有する分配器20が設けられてい
る。
A cylindrical heat insulating layer 14 is provided in the reaction chamber 13 on the lower lid 3.
Is provided, and in addition, the reaction to the reaction chamber 13 is
(Raw material) A gas inlet 15 and a gas outlet 16 are provided. An introduction conduit 18 screwed into the lower lid 3 via a seal member 17 is airtightly connected to the introduction port 15, and a distributor 20 having a large number of holes 19 is provided at the tip of the conduit 18. ..

【0013】一方、排出口16には下蓋3 にシール部材21
を介してねじ込まれた排出導管22が気密に接続されてい
て、該導管22の上部には多数の孔23を有する分配器24が
設けられている。そして、上下で相対した分配器20,24
間に被処理物25を設置し得るようになっており、原料ガ
スの圧力を炉室10内の圧力に対して定圧を維持しつつ、
導入口15から反応室13に導入し、排出口16から排出する
過程で被処理物25は後述する実施例に示すように加圧下
の気相化学反応蒸着を(滲透)によって高密度化され
る。
On the other hand, the discharge port 16 has a lower cover 3 and a seal member 21.
A discharge conduit 22 screwed through is connected in an airtight manner, and a distributor 24 having a large number of holes 23 is provided at the upper part of the conduit 22. And the distributors 20, 24 facing each other up and down
The object to be treated 25 can be installed in between, while maintaining the pressure of the raw material gas constant with respect to the pressure in the furnace chamber 10,
In the process of introducing from the inlet 15 into the reaction chamber 13 and discharging from the outlet 16, the object to be treated 25 is densified by vapor-phase chemical reaction vapor deposition under pressure (permeation) as shown in Examples described later. ..

【0014】図2は装置に係る本発明の第2実施例を示
し、排出導管22の上部に平板状フランジ22A を形成し、
該フランジ22A 上に、シール部材26を介して被処理物25
を載置し、該被処理物25を押え板27とボルト28等で取付
けたものであり、斯る取付部材29を採用することによ
り、加圧力を雰囲気としてのみならず被処理物25への浸
透力としても積極的に利用して高密度化が可能となり、
これは特に、多孔性を有する被処理材に有効となる。な
お、原料ガスの導入、排出を初めその他の構成は、実施
例1と共通し、共通部分は共通符号で示している。但
し、原料ガスの導入、排出は図示とは逆であっても構わ
ない。
FIG. 2 shows a second embodiment of the present invention relating to the apparatus, in which a flat plate-shaped flange 22A is formed on the upper portion of the discharge conduit 22,
An object to be processed 25 is placed on the flange 22A via a seal member 26.
Is mounted, and the object to be processed 25 is attached by a holding plate 27 and bolts 28, etc. By adopting such an attachment member 29, not only the pressure is applied to the atmosphere but also the object to be processed 25 It is possible to increase the density by actively using it as penetration power,
This is particularly effective for the material to be treated having porosity. It should be noted that other components such as the introduction and discharge of the raw material gas are the same as those in the first embodiment, and the common parts are denoted by common reference numerals. However, the introduction and discharge of the raw material gas may be opposite to that shown in the figure.

【0015】図3は装置に係る本発明の第2実施例にお
いて、被処理物25として管材を対象とした第3実施例を
示すものであり、この場合は、管の外面から内面に向か
っての、もしくは内面から外面に向かっての気相化学反
応蒸着(滲透)を行わしめることが可能となる。なお、
原料ガスとしては、メタンガス、プロパンガス等の炭化
水素系のガスを成分ガスとするガスであり、気相化学反
応が炭素材料の合成であるものを実体例としてあげるこ
とができる (実施例1)図1の装置構成において、密度1.398 の炭
素材料 (押し出し材、φ60×t6) を被処理物として、メ
タンガス 200cc/min、300 Torr、1200℃のも
とで30分気相化学反応蒸着を行わしめ、その後表面蒸着
層を除去して密度測定したところ密度は1.403 とごくわ
ずかの変化がみられたのみであった。
FIG. 3 shows a third embodiment of the present invention relating to the apparatus, in which a pipe material is used as the object to be treated 25. In this case, from the outer surface to the inner surface of the pipe. , Or vapor-phase chemical reaction vapor deposition (penetration) from the inner surface to the outer surface. In addition,
The raw material gas is a gas containing a hydrocarbon-based gas such as methane gas or propane gas as a component gas, and a substance whose gas-phase chemical reaction is the synthesis of a carbon material can be given as an actual example (Example 1) In the equipment configuration shown in Fig. 1, a carbon material with a density of 1.398 (extruded material, φ60 x t6) was used as the object to be processed, and vapor phase chemical reaction vapor deposition was performed for 30 minutes under methane gas at 200 cc / min, 300 Torr and 1200 ° C. After that, when the surface vapor deposition layer was removed and the density was measured, the density was 1.403, which was a slight change.

【0016】それに対して、圧力を 9.5kgf/cm2
として同様の実験を行ったところ、密度は1.443 となっ
て明らかな密度上昇 (加圧の効果) が認められた。ま
た、メタンガス 200cc/min、アルゴンガス1800c
c/minとした場合、圧力 9.5kgf/cm2 のもと
密度は1.441 となってアルゴンガスによる加圧であって
も同等の効果を発揮せしめうることが認められた。
On the other hand, the pressure is 9.5 kgf / cm 2
When the same experiment was conducted as above, the density became 1.443, and a clear density increase (effect of pressurization) was confirmed. In addition, methane gas 200cc / min, argon gas 1800c
When the pressure was set to c / min, the density was 1.441 under the pressure of 9.5 kgf / cm 2, and it was confirmed that the same effect can be exhibited even by pressurizing with argon gas.

【0017】(実施例2)実施例1と同じ素材を、可撓
性グラファイトをシール部材として、図2の装置構成に
てメタンガス 200cc/min、9.5kgf/cm2 、1
200℃の条件下にて30分処理した (排出側は大気圧とし
た) ところ、表面蒸着層除去後の密度は1.487 となっ
て、加圧浸透の付加的効果が認められた。
(Embodiment 2) The same material as in Embodiment 1 is used, with flexible graphite as a sealing member, and methane gas of 200 cc / min, 9.5 kgf / cm 2 , 1 in the apparatus configuration of FIG.
After treatment for 30 minutes at 200 ° C (atmospheric pressure on the discharge side), the density after removal of the surface vapor deposition layer was 1.487, and the additional effect of pressure permeation was confirmed.

【0018】[0018]

【発明の効果】本発明は以上の通りであり、本発明に係
る方法及び装置によれば、加圧により一段と効率的、高
品質のあるいは減圧、常圧下では困難な材料の創製を可
能ならしめて、もって高機能材あるいは新素材の創製に
多大の寄与を果しうるものである。
The present invention is as described above. According to the method and apparatus of the present invention, it is possible to more efficiently pressurize, and to create a high-quality material or a material that is difficult under reduced pressure or atmospheric pressure. Therefore, it can greatly contribute to the creation of high-performance materials or new materials.

【図面の簡単な説明】[Brief description of drawings]

【図1】装置に係る本発明第1実施例の立断面図であ
る。
FIG. 1 is a vertical sectional view of a first embodiment of the present invention relating to an apparatus.

【図2】装置に係る本発明第2実施例の立断面図であ
る。
FIG. 2 is a vertical sectional view of a second embodiment of the present invention relating to the apparatus.

【図3】装置に係る本発明第3実施例の立断面図であ
る。
FIG. 3 is a vertical sectional view of a third embodiment of the present invention relating to the apparatus.

【符号の説明】[Explanation of symbols]

1 高圧容器 7 断熱層 8 加熱体 10 炉室 11 隔壁 13 反応室 15 導入口 16 排出口 29 取付部材 1 High-pressure vessel 7 Heat-insulating layer 8 Heating element 10 Furnace chamber 11 Partition wall 13 Reaction chamber 15 Inlet port 16 Outlet port 29 Mounting member

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 高圧容器(1) 内に倒立コップ形状の断熱
層(7) を設け、該断熱層(7) 内に加熱体(8) を設けて高
圧高温炉室(10)を形成してなり、該炉室(10)に隔壁(11)
を設けて内部に反応室(13)を画成した装置を用いて被処
理物(25)を高密度にする方法であって、前記反応室(13)
内に原料ガスを導入、排出して被処理物(25)に対して加
圧流通下に気相化学反応蒸着を行わしめることを特徴と
する高密度材料の製造方法。
1. A high-pressure vessel (1) is provided with an inverted cup-shaped heat-insulating layer (7), and a heating body (8) is provided in the heat-insulating layer (7) to form a high-pressure high-temperature furnace chamber (10). And the partition wall (11) in the furnace chamber (10)
A method for increasing the density of the object to be treated (25) using an apparatus in which the reaction chamber (13) is defined inside the reaction chamber (13)
A method for producing a high-density material, characterized in that a raw material gas is introduced into and discharged from the inside of the material, and vapor phase chemical reaction vapor deposition is performed on the object (25) under pressure and flow.
【請求項2】 請求項1の被処理物(25)が多孔性を有す
ることを特徴とする高密度材料の製造方法。
2. A method for producing a high-density material, wherein the object to be treated (25) according to claim 1 has porosity.
【請求項3】 請求項1の原料ガスが、メタン、プロパ
ン等の炭化水素系のガスを成分ガスとするガスであり、
気相化学反応が炭素材料の合成であることを特徴とする
請求項1又は2記載の高密度材料の製造方法。
3. The raw material gas according to claim 1 is a gas whose component gas is a hydrocarbon-based gas such as methane or propane,
The method for producing a high-density material according to claim 1 or 2, wherein the gas-phase chemical reaction is a synthesis of a carbon material.
【請求項4】 高圧容器(1) 内に倒立コップ形状の断熱
層(7) を設け、該断熱層(7) 内に加熱体(8) を設けて高
圧高温炉室(10)を形成してなり、該炉室(10)に隔壁(11)
を設けて内部に反応室(13)を画成し、該反応室(13)内で
気相化学反応を行わしめるための原料ガスの導入口(15)
および排出口(16)が設けられていることを特徴とする高
密度材料の製造装置。
4. A high-pressure vessel (1) is provided with an inverted cup-shaped heat insulation layer (7), and a heating body (8) is provided in the heat insulation layer (7) to form a high-pressure high-temperature furnace chamber (10). And the partition wall (11) in the furnace chamber (10)
Is provided to define a reaction chamber (13) inside, and an inlet port (15) for introducing a raw material gas for performing a gas phase chemical reaction in the reaction chamber (13)
And a discharge port (16) are provided.
【請求項5】 請求項4の導入口(15)および排出口(16)
の一方に、シール部材(26)を介して多孔性を有する被処
理物(25)をほゞ気密状態で取付ける取付部材(29)を備え
ていることを特徴とする請求項4記載の高密度材料の製
造装置。
5. Inlet (15) and outlet (16) according to claim 4.
5. The high density according to claim 4, further comprising a mounting member (29) for mounting a porous object (25) in a substantially airtight state via a seal member (26) on one side. Material manufacturing equipment.
JP3262252A 1991-10-09 1991-10-09 Method for producing high-density material and apparatus therefor Pending JPH0597548A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3262252A JPH0597548A (en) 1991-10-09 1991-10-09 Method for producing high-density material and apparatus therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3262252A JPH0597548A (en) 1991-10-09 1991-10-09 Method for producing high-density material and apparatus therefor

Publications (1)

Publication Number Publication Date
JPH0597548A true JPH0597548A (en) 1993-04-20

Family

ID=17373197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3262252A Pending JPH0597548A (en) 1991-10-09 1991-10-09 Method for producing high-density material and apparatus therefor

Country Status (1)

Country Link
JP (1) JPH0597548A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113293356A (en) * 2021-04-09 2021-08-24 郭李梁 Device for preparing carbon-carbon composite material

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113293356A (en) * 2021-04-09 2021-08-24 郭李梁 Device for preparing carbon-carbon composite material

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