JPH0595049A - Semiconductor device and its mounting method - Google Patents

Semiconductor device and its mounting method

Info

Publication number
JPH0595049A
JPH0595049A JP25395191A JP25395191A JPH0595049A JP H0595049 A JPH0595049 A JP H0595049A JP 25395191 A JP25395191 A JP 25395191A JP 25395191 A JP25395191 A JP 25395191A JP H0595049 A JPH0595049 A JP H0595049A
Authority
JP
Japan
Prior art keywords
wiring
semiconductor device
back side
wirings
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP25395191A
Other languages
Japanese (ja)
Inventor
Yukari Arai
ゆかり 新井
Hiroshi Nakamura
浩 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP25395191A priority Critical patent/JPH0595049A/en
Publication of JPH0595049A publication Critical patent/JPH0595049A/en
Withdrawn legal-status Critical Current

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  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To reduce the impedance and the inductance of wiring and the heat resistance of a semiconductor device, and elevate the degree of freedom in pattern layout by connecting the rear wiring corresponding to the kind of the potential applied to the kind of the electrode of a semiconductor element with a corresponding electrode through a via hole. CONSTITUTION:A desired electric circuit is constituted by providing semiconductor elements 261-263 in optional proper layout on the surface side of a board 24. On the other hand, on the rear of the board 24, plural kinds of rear wirings 321-322 corresponding to the kinds of the potential applied to the electrodes of the semiconductor elements 261-263 are provided. Moreover, via holes 301, 302, and 303 piercing the board 24 are provided, and through these, the corresponding electrodes of the semiconductor elements 261-263 and rear wirings 321-322 are connected directly through these. Hereby, the impedance and the inductance of the wiring can be reduced, and the heat resistance of the semiconductor device can be reduced, and the degree of freedom in the pattern layout on the surface side of a board can be elevated.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は半導体装置及びその実
装方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device and its mounting method.

【0002】[0002]

【従来の技術】従来より、半導体集積回路をパッケージ
に実装するための最も一般的な技術として、ワイヤボン
ディング技術が広く知られている。ここでFET(Fi
eldEffect Transistor)を用いた
半導体集積回路例えばDCFL(Direct Cou
pled FET Logic)回路の実装でワイヤボ
ンディング技術を用いる場合を考えると、この場合、基
板の表側にFET、配線及びボンディングパッドを設け
配線をFETから基板周辺部のボンディングパッドまで
配設し、さらに基板周辺部のボンディングパッドとパッ
ケージのボンディングパッドとをボンディングワイヤを
介し接続することとなる。従って配線をFETから基板
周辺部のボンディングパッドまで配設するので、基板表
側のパターンレイアウトに制約が生じたり多層配線が必
要となったり配線が冗長になったりするといった問題点
を生じる。特にFETを用いたパワーデバイスやマイク
ロ波帯デバイスでは接地インダクタンスを低減すること
が望まれるが、配線が冗長となって配線のインダクタン
スが増大したりボンディングワイヤのインダクタンスが
大きくなったりするため、実用上必ずしも充分に接地イ
ンダクタンスを低減できないという問題点があった。そ
こでこれらの問題点を解消する従来技術として、例えば
文献1:IEEE TRNSACTIONS ON E
LECTRONDEVICES(アイイ−イ−イ− ト
ランザクションズ オン エレクトロンデバイセズ),
VOL.ED−25,NO.10,pp.1218〜1
221,1978に開示されているように基板表裏の回
路要素を基板を貫通するバイアホールを介し接続するも
のや、フリップチップ法によるものが提案されている。
2. Description of the Related Art Conventionally, a wire bonding technique has been widely known as the most general technique for mounting a semiconductor integrated circuit in a package. Here, FET (Fi
A semiconductor integrated circuit using an eldEffect Transistor, such as DCFL (Direct Cou)
Considering the case where the wire bonding technology is used for mounting the pled FET logic circuit, in this case, the FET, the wiring, and the bonding pad are provided on the front side of the substrate, and the wiring is arranged from the FET to the bonding pad in the peripheral portion of the substrate. The bonding pads on the periphery and the bonding pads of the package are connected via bonding wires. Therefore, since the wiring is arranged from the FET to the bonding pad in the peripheral portion of the substrate, there arise problems that the pattern layout on the front side of the substrate is restricted, multilayer wiring is required, and the wiring becomes redundant. Especially in power devices and microwave band devices using FETs, it is desired to reduce the grounding inductance, but the wiring becomes redundant and the inductance of the wiring increases or the inductance of the bonding wire increases. There is a problem that the ground inductance cannot always be reduced sufficiently. Therefore, as a conventional technique for solving these problems, for example, Document 1: IEEE TRNSACTIONS ONE
LECTRON DEVICES (AY-A-Transactions on Electron Devices),
VOL. ED-25, NO. 10, pp. 1218-1
221 and 1978, a method in which circuit elements on the front and back of the substrate are connected via a via hole penetrating the substrate and a method by a flip chip method have been proposed.

【0003】図8は前者の従来実装技術で用いる半導体
装置の構造を概略的に示す断面図である。同図に示す半
導体装置は、基板10と、基板10の表側に設けたFE
T121〜124と、基板10を貫通するバイアホール
141〜143と、基板10の裏側に設けた裏側配線1
6とを備える。
FIG. 8 is a sectional view schematically showing the structure of a semiconductor device used in the former conventional mounting technique. The semiconductor device shown in the figure includes a substrate 10 and an FE provided on the front side of the substrate 10.
T121 to 124, via holes 141 to 143 penetrating the substrate 10, and backside wiring 1 provided on the backside of the substrate 10.
6 and 6.

【0004】FET121〜124は図示せずもそれぞ
れ基板10に形成した能動層を備える。FET121は
ソース、ゲート及びドレイン電極181、182及び1
83を備える。FET122はソース、ゲート及びドレ
イン電極185、184及び183を備える。FET1
23はソース、ゲート及びドレイン電極185、186
及び187を備える。FET124はソース、ゲート及
びドレイン電極189、188及び187を備える。こ
れらFET121〜124はDCFL回路を構成し、こ
こではこれらFETのソース電極181、185及び1
89は共通の接地電位に接続するものとする。このため
ソース電極181、185及び189に対応する基板部
分にそれぞれバイアホール141、142及び143を
基板10を貫通するように設ける。そして基板10の裏
面全面及びバイアホール141〜143内に裏側配線1
6を設け、裏側配線16とソース電極181、185及
び189とをバイアホール141、142及び143を
介して接続する。
Each of the FETs 121 to 124 has an active layer formed on the substrate 10 (not shown). FET 121 has source, gate and drain electrodes 181, 182 and 1
83 is provided. The FET 122 comprises source, gate and drain electrodes 185, 184 and 183. FET1
Reference numeral 23 designates source, gate and drain electrodes 185, 186.
And 187. FET 124 includes source, gate and drain electrodes 189, 188 and 187. These FETs 121 to 124 form a DCFL circuit, and here, the source electrodes 181, 185 and 1 of these FETs are used.
89 is connected to a common ground potential. Therefore, via holes 141, 142 and 143 are provided in the substrate portions corresponding to the source electrodes 181, 185 and 189 so as to penetrate the substrate 10. Then, the backside wiring 1 is formed on the entire back surface of the substrate 10 and in the via holes 141 to 143.
6 is provided, and the back side wiring 16 and the source electrodes 181, 185 and 189 are connected to each other through the via holes 141, 142 and 143.

【0005】この半導体装置では、ソース電極181、
185及び189を、バイアホール141〜143及び
裏側配線16を用いて接地し従ってこれらソース電極を
接地するための配線を基板10表側に設けずに済むの
で、基板表側のパターンレイアウトの設計の自由度を増
やせるという利点がある。さらにバイアホールを用いず
表側配線のみを用いて接地した場合と比べ裏側配線16
の配線長を短くすることができ、またワイヤボンディン
グの必要がないので裏側配線16のインダクタンスやイ
ンピーダンスを低減できる。
In this semiconductor device, the source electrode 181,
185 and 189 are grounded by using the via holes 141 to 143 and the back side wiring 16, and therefore wirings for grounding these source electrodes need not be provided on the front side of the substrate 10, so that the degree of freedom in designing the pattern layout on the front side of the substrate is reduced. There is an advantage that it can increase. Further, as compared with the case of grounding only the front side wiring without using the via hole, the back side wiring 16
The wiring length can be shortened, and since wire bonding is not required, the inductance and impedance of the back wiring 16 can be reduced.

【0006】図9は後者のフリップチップ法による従来
実装技術で用いる半導体装置の構造を概略的に示す断面
図である。尚、上述した従来の構成成分に対応する構成
成分については同一の符号を付して示し、上述した従来
の構成成分と同様の点についてはその詳細な説明を省略
する。
FIG. 9 is a sectional view schematically showing the structure of a semiconductor device used in the latter conventional mounting technique by the flip chip method. The components corresponding to the above-mentioned conventional components are denoted by the same reference numerals, and detailed description of the same points as the above-described conventional components will be omitted.

【0007】同図に示す半導体装置は基板10、FET
121〜124及びバンプ201〜203を備え、これ
らバンプ201、202及び203をそれぞれソース電
極181、185及び189上に設ける。この半導体装
置をパッケージに実装する場合には、この半導体装置を
フェースダウンにしながらバンプ201〜203をパッ
ケージの接地用配線に接続する。この半導体装置では、
FETの電極181、185及び189を、バンプ20
1、202及び203を介し直接パッケージと接続させ
ることにより接地するので、基板表側のパターンレイア
ウトの設計の自由度を増やせるという利点がある。また
接地のための配線長を短くできるので接地用配線のイン
ダクタンスやインピーダンスを低減できる。
The semiconductor device shown in FIG.
121 to 124 and bumps 201 to 203, and these bumps 201, 202 and 203 are provided on the source electrodes 181, 185 and 189, respectively. When mounting this semiconductor device in a package, the bumps 201 to 203 are connected to the grounding wiring of the package while the semiconductor device is face down. In this semiconductor device,
The electrodes 181, 185 and 189 of the FET are connected to the bump 20.
Since it is grounded by directly connecting to the package via 1, 202 and 203, there is an advantage that the degree of freedom in designing the pattern layout on the front side of the substrate can be increased. Further, since the wiring length for grounding can be shortened, the inductance and impedance of the grounding wiring can be reduced.

【0008】[0008]

【発明が解決しようとする課題】しかしながら前者の半
導体装置の場合では、基板裏面全体に、裏側配線を設け
この裏側配線を接地用配線としてのみ用いるので、減ら
せる基板表側の配線はたかだか1種類のみであり従って
基板表側のパターンレイアウトの設計の自由度を必ずし
も充分に高めることができないという問題点があった。
また半導体装置特にパワーデバイスやマイクロ波帯デバ
イス等例えばDCFL回路の電気的特性を向上するに
は、接地用配線のインダクタンス及びインピーダンスを
低減するのみならず、他の種類例えば電源電圧用配線の
インダクタンス及びインピーダンスをも低減することが
望まれる。しかしながら前者の半導体装置では、裏側配
線は基板裏面全面に設けた1種類のみであるので、複数
種類の配線のインダクタンス及びインピーダンスを低減
したくともそれができないという問題点があった。
However, in the case of the former semiconductor device, since the back side wiring is provided on the entire back surface of the substrate and the back side wiring is used only as the ground wiring, only one kind of wiring can be reduced on the front side of the substrate. Therefore, there is a problem in that the degree of freedom in designing the pattern layout on the front side of the substrate cannot always be sufficiently increased.
Further, in order to improve the electrical characteristics of a semiconductor device, particularly a power device or a microwave band device such as a DCFL circuit, not only the inductance and impedance of the ground wiring are reduced but also other types such as the inductance of the power voltage wiring and It is desired to reduce the impedance as well. However, in the former semiconductor device, since only one type of backside wiring is provided on the entire back surface of the substrate, there is a problem in that it is not possible to reduce the inductance and impedance of a plurality of types of wiring.

【0009】また後者の半導体装置では、フェースダウ
ン方式で表側半導体素子の電極を直接パッケージと電気
接続することによって配線長を短くし複数種類の配線の
インダクタンス及びインピーダンスを低減することはで
きるが、半導体素子の電極とパッケージとの電気的接続
のために用いるバンプの形成が技術的に必ずしも容易で
はなく、またパッケージに実装後バンプは基板とパッケ
ージとの間に位置するため半導体素子の電極とパッケー
ジとの間の接続不良箇所を確認することが難しいといっ
た問題点があった。さらに後者の半導体装置では、フェ
ースダウンで半導体装置を実装するので半導体装置の放
熱を充分に行えないという問題点があった。
In the latter semiconductor device, the electrodes of the front side semiconductor element are directly electrically connected to the package by a face-down method, whereby the wiring length can be shortened and the inductance and impedance of a plurality of types of wiring can be reduced. It is technically not always easy to form bumps used for electrical connection between the element electrodes and the package, and since the bumps are located between the substrate and the package after mounting on the package, the bumps between the semiconductor element electrodes and the package are not formed. There was a problem that it was difficult to check the connection failure between the two. Further, in the latter semiconductor device, the semiconductor device is mounted face down, so that there is a problem that the heat dissipation of the semiconductor device cannot be performed sufficiently.

【0010】この出願の目的は、上述した従来の問題点
を解決し、所望の複数種類の配線の長さを短縮できる半
導体装置及びその実装方法を提供することにある。
An object of the present application is to solve the above-mentioned conventional problems and to provide a semiconductor device and a mounting method thereof in which desired lengths of plural kinds of wirings can be shortened.

【0011】[0011]

【課題を解決するための手段】この目的の達成を図るた
め、この出願の第一発明の半導体装置は、半導体基板
と、半導体基板の表側に設けられた半導体素子と、半導
体基板を貫通するバイアホールと、半導体基板の裏側に
設けられバイアホールを介し半導体素子の電極と接続す
る裏側配線とを備え、半導体素子の電極に印加される電
位の種類に対応する複数種類の裏側配線を設け、裏側配
線を、当該裏側配線に対応する種類の電位が印加される
半導体素子の電極と接続して成ることを特徴とする。
To achieve this object, a semiconductor device according to the first invention of the present application is a semiconductor substrate, a semiconductor element provided on the front side of the semiconductor substrate, and a via penetrating the semiconductor substrate. A hole and a back side wiring provided on the back side of the semiconductor substrate and connected to the electrode of the semiconductor element through a via hole, and a plurality of types of back side wiring corresponding to the type of potential applied to the electrode of the semiconductor element are provided. It is characterized in that the wiring is connected to an electrode of a semiconductor element to which a potential of a type corresponding to the back wiring is applied.

【0012】また第二発明の半導体装置の実装方法によ
れば、第一発明の半導体装置を引出配線を備えるパッケ
ージに実装し、半導体装置の裏側配線とこの裏側配線に
対応するパッケージの引出配線とを接続するに当たり、
所定方向に延在する第一端子部を裏側配線に設け、第一
端子部の延在方向に沿って延在する第二端子部を引出配
線に設け、これら第一端子部及び第二端子部をこれらの
延在する方向に沿って動かして擦り合わせ、共晶法によ
り第一端子部及び第二端子部を接続することを特徴とす
る。
According to the semiconductor device mounting method of the second invention, the semiconductor device of the first invention is mounted in a package having a lead wiring, and the back wiring of the semiconductor device and the lead wiring of the package corresponding to the back wiring are provided. When connecting
A first terminal portion extending in a predetermined direction is provided on the back wiring, a second terminal portion extending along the extending direction of the first terminal portion is provided on the lead wiring, and the first terminal portion and the second terminal portion are provided. Is moved along these extending directions and rubbed against each other, and the first terminal portion and the second terminal portion are connected by a eutectic method.

【0013】[0013]

【作用】第一発明によれば、半導体素子の電極に印加す
る電位の種類に対応する2種類以上の裏側配線を設け、
複数種の裏側配線をそれぞれバイアホールを介し対応す
る半導体素子の電極と接続するので、例えば、複数種の
配線に関しインピーダンス及びインダクタンスを低減
し、或は半導体装置の熱抵抗を一層効果的に低減し、或
は基板表側のパターンレイアウトの自由度を一層効果的
に高めることができる。
According to the first invention, two or more kinds of back side wirings corresponding to the kinds of potentials applied to the electrodes of the semiconductor element are provided,
Since the plural kinds of back side wirings are connected to the electrodes of the corresponding semiconductor element through the via holes, for example, the impedance and the inductance of the plural kinds of wirings are reduced, or the thermal resistance of the semiconductor device is further effectively reduced. Alternatively, the degree of freedom in pattern layout on the front side of the substrate can be more effectively increased.

【0014】また第二発明によれば、第一端子部及び第
二端子部はそれぞれ同じ方向に延在する。従って、第一
発明の半導体装置に複数個の裏側配線を設け同様にパッ
ケージに複数個の引出配線を設けても、接続すべき相対
応する第一端子部及び第二端子部を接触させた状態で、
これら端子部をこれらの延在する方向に沿って動かして
擦り合わせることにより、複数個の裏側配線及び複数個
の引出配線のそれぞれ対応するもの同志を同一工程で一
括して接続することができる。
According to the second invention, the first terminal portion and the second terminal portion respectively extend in the same direction. Therefore, even if the semiconductor device of the first invention is provided with a plurality of back side wirings and the package is also provided with a plurality of lead wirings, the corresponding first terminal portion and second terminal portion to be connected are in contact with each other. so,
By moving these terminal portions along these extending directions and rubbing them together, it is possible to collectively connect a plurality of back side wirings and a plurality of lead wirings corresponding to each other in the same step.

【0015】[0015]

【実施例】以下、図面を参照し、第一及び第二発明の実
施例につき説明する。図面はこれら発明が理解できる程
度に概略的に示してあるにすぎず、従って発明を図示例
に限定するものではない。
Embodiments of the first and second inventions will be described below with reference to the drawings. The drawings are only schematic representations so that the invention can be understood, and are therefore not intended to limit the invention to the illustrated examples.

【0016】図1及び図2は第一発明の実施例の要部構
成を概略的に示す切欠斜視図及び断面図であり、図2は
図1のII−II線に沿って取った断面を示す。
FIG. 1 and FIG. 2 are a cutaway perspective view and a cross-sectional view schematically showing the construction of the essential part of the first embodiment of the invention, and FIG. 2 is a cross-section taken along the line II--II of FIG. Show.

【0017】これら図にも示すように、この実施例の半
導体装置22は、半導体基板24、半導体素子261〜
263、バイアホール301〜303及び裏側配線32
1、322を備える。
As shown in these figures, the semiconductor device 22 of this embodiment includes a semiconductor substrate 24 and semiconductor elements 261 to 261.
263, via holes 301 to 303, and back side wiring 32
1, 322.

【0018】半導体基板24は例えば半絶縁性GaAs
基板であり、この基板24の表側に半導体素子261〜
263を設ける。半導体素子261〜263は例えばF
ETであり、これら半導体素子261〜263を26
1、262及び263の順に一列に配列して設ける。半
導体素子261はソース電極341、ゲート電極342
及びドレイン電極343を備え、半導体素子262はソ
ース電極345、ゲート電極344及びドレイン電極3
43を備え、また半導体素子263はソース電極34
5、ゲート電極346及びドレイン電極347を備え
る。ドレイン電極343は半導体素子261、262の
共通の電極、及びソース電極345は半導体素子26
2、263の共通の電極である。各半導体素子は図示し
ない能動層を備え、ソース及びドレイン電極は能動層と
オーミック接合を形成しまたゲート電極は能動層とショ
ットキー接合を形成する。
The semiconductor substrate 24 is, for example, semi-insulating GaAs.
It is a substrate, and the semiconductor elements 261 to
263 is provided. The semiconductor elements 261-263 are, for example, F
ET, and these semiconductor elements 261-263 are 26
1, 262 and 263 are arranged in a line in this order. The semiconductor element 261 has a source electrode 341 and a gate electrode 342.
And the drain electrode 343, the semiconductor element 262 includes a source electrode 345, a gate electrode 344, and a drain electrode 3.
43, and the semiconductor element 263 has a source electrode 34.
5, a gate electrode 346 and a drain electrode 347. The drain electrode 343 is a common electrode for the semiconductor elements 261 and 262, and the source electrode 345 is the semiconductor element 26.
2, 263 is a common electrode. Each semiconductor device includes an active layer (not shown), the source and drain electrodes form an ohmic junction with the active layer, and the gate electrode forms a Schottky junction with the active layer.

【0019】基板24の表側には、任意好適なパターン
レイアウトで表側配線や、半導体素子を設けて(場合に
よっては上述の半導体素子261〜263以外の半導体
素子或は電気回路素子を設けてあってもよい)所望の電
気回路を構成しており、この実施例では基板24の表側
に例えば表側配線28、当該配線28とは別の表側配線
(図示せず)及び半導体素子261〜263を設け、こ
れら表側配線をそれぞれ対応する半導体素子261〜2
63の電極と接続し、これら配線及び素子により電気回
路例えばDCFL回路を構成する。そしてソース電極3
41、345に接地電位を及びドレイン電極343、3
47に電源電圧を印加する。
On the front side of the substrate 24, front side wirings and semiconductor elements are provided in any suitable pattern layout (semiconductor elements or electric circuit elements other than the semiconductor elements 261 to 263 described above are provided in some cases. A desired electric circuit is configured, and in this embodiment, for example, a front side wiring 28 on the front side of the substrate 24, a front side wiring (not shown) different from the wiring 28, and semiconductor elements 261 to 263 are provided, The semiconductor elements 261 to 2 corresponding to these front side wirings, respectively.
The electrodes and the electrodes 63 are connected to each other to form an electric circuit, for example, a DCFL circuit. And the source electrode 3
41 and 345, ground potential and drain electrodes 343 and 3
A power supply voltage is applied to 47.

【0020】基板24の裏側には、半導体素子261〜
263の電極に印加される電位の種類に対応する複数種
類の裏側配線321、322を設ける。この実施例で
は、裏側配線321、322の種類は電源電圧及び接地
電位の2種であり、裏側配線321を接地電位用の電極
及び裏側配線322を電源電圧用の電極とする。そして
裏側配線321には、当該配線に対応する種類の電位が
印加される半導体素子の電極、この実施例では接地電位
が印加されるソース電極341、345を接続し、さら
に裏側配線322には、当該配線に対応する種類の電位
が印加される半導体素子の電極、この実施例では電源電
圧が印加されるドレイン電極343、347を接続す
る。
On the back side of the substrate 24, semiconductor elements 261 to
A plurality of types of back side wirings 321 and 322 corresponding to the type of potential applied to the electrode of H.263 are provided. In this embodiment, the back wirings 321 and 322 are of two types, that is, a power supply voltage and a ground potential, and the back wiring 321 is an electrode for ground potential and the back wiring 322 is an electrode for power supply voltage. The back wiring 321 is connected to electrodes of a semiconductor element to which a potential corresponding to the wiring is applied, that is, source electrodes 341 and 345 to which a ground potential is applied in this embodiment. Further, the back wiring 322 is connected to the back wiring 322. An electrode of a semiconductor element to which a potential of a type corresponding to the wiring is applied, in this embodiment, drain electrodes 343 and 347 to which a power supply voltage is applied are connected.

【0021】このため、ソース電極341、345に対
応する位置にそれぞれ基板24を貫通するバイアホール
301、302を設けさらにこれらホール301、30
2の内側にも裏側配線321を設け、これらバイアホー
ル301及び302を介し直接的に、ソース電極34
1、345と接地電位用の裏側配線321とを接続す
る。またドレイン電極343に対応する位置に基板24
を貫通するバイアホール303を設けさらにこのホール
303の内側にも裏側配線322を設け、このバイアホ
ール303を介し直接的に、ドレイン電極323と電源
電圧用の裏側配線322とを接続する。またドレイン電
極347をバイアホールを介し電源電圧用の裏側配線3
22と直接的に接続することもその配設位置によっては
可能であるが、この例では表側配線28をゲート電極3
46、344と電気的に接触させないように交差させて
ドレイン電極347から343まで設け表側配線28に
よりドレイン電極347、343を接続し、これら表側
配線28、ドレイン電極343及びバイアホール303
を介し間接的に、ドレイン電極347と電源電圧用の裏
側配線322とを接続する。例えば、平面的に見てドレ
イン電極347及び接地電位用の裏側配線321が重な
り合わない場合にはドレイン電極347を、バイアホー
ルを介し直接的に、電源電圧用の裏側配線322と接続
するようにし、また平面的に見てドレイン電極347及
び接地電位用の裏側配線321が重なり合う場合にはド
レイン電極347を、表側配線を利用して間接的に、電
源電圧用の裏側配線322と接続するようにすればよ
い。
Therefore, via holes 301 and 302 penetrating the substrate 24 are provided at positions corresponding to the source electrodes 341 and 345, respectively.
The back side wiring 321 is also provided inside 2 and the source electrode 34 is directly provided through the via holes 301 and 302.
1, 345 and the back side wiring 321 for ground potential are connected. In addition, the substrate 24 is placed at a position corresponding to the drain electrode 343.
A via hole 303 penetrating therethrough is provided, and a backside wiring 322 is also provided inside the hole 303, and the drain electrode 323 and the backside wiring 322 for power supply voltage are directly connected via the via hole 303. Also, the drain electrode 347 is connected to the back side wiring 3 for the power supply voltage through the via hole.
Although it may be directly connected to the gate electrode 22 depending on the arrangement position, in this example, the front side wiring 28 is connected to the gate electrode 3
The drain electrodes 347 to 343 are provided so as not to make electrical contact with the electrodes 46 and 344, and the drain electrodes 347 and 343 are connected by the front side wiring 28, and the front side wiring 28, the drain electrode 343, and the via hole 303.
The drain electrode 347 and the back side wiring 322 for the power supply voltage are indirectly connected via the. For example, when the drain electrode 347 and the backside wiring 321 for ground potential do not overlap with each other in plan view, the drain electrode 347 is directly connected to the backside wiring 322 for power supply voltage through a via hole. When the drain electrode 347 and the backside wiring 321 for ground potential overlap each other in plan view, the drain electrode 347 is indirectly connected to the backside wiring 322 for power supply voltage by using the front side wiring. do it.

【0022】図3は第一発明の実施例の要部構成を概略
的に示す底面図であり、バイアホール301〜303及
び裏側配線321〜322の各配設位置を示す。同図に
も示すように、この実施例では裏側配線321及び32
2の全体形状をそれぞれ所定の方向(図中矢印Pで示す
方向)に延在するストライプ状の形状とし裏側配線32
1全体及び322全体をそれぞれ後述する半導体装置の
実装パッケージの引出配線と接続する第一端子部として
用いる。そして裏側配線321、322を基板24の裏
側全体にベタで設けるのではなくその一部分に設け、こ
れら裏側配線321、322を電気的に分離するに足り
るだけ離間させて並列配置する。そして裏側配線321
の配設領域にバイアホール301、302を設けまた裏
側配線322の配設領域にバイアホール303を設け
る。
FIG. 3 is a bottom view schematically showing the structure of the essential part of the first embodiment of the present invention, showing the respective positions of the via holes 301 to 303 and the back side wirings 321 to 322. As shown in the figure, in this embodiment, the back side wirings 321 and 32 are
The back side wiring 32 has an overall shape of 2 in a stripe shape extending in a predetermined direction (direction indicated by an arrow P in the drawing).
The whole 1 and the whole 322 are used as a first terminal portion connected to a lead wire of a mounting package of a semiconductor device, which will be described later. The back side wirings 321 and 322 are not solidly provided on the entire back side of the substrate 24, but are provided on a part thereof, and the back side wirings 321 and 322 are arranged in parallel so as to be sufficiently separated to be electrically separated. And the back wiring 321
The via holes 301 and 302 are provided in the area where the via wirings are provided, and the via hole 303 is provided in the area where the backside wiring 322 is provided.

【0023】次に、第二発明の実施例につき説明する。
この実施例は、上述した第一発明の実施例を実装する例
である。
Next, an embodiment of the second invention will be described.
This embodiment is an example of implementing the embodiment of the first invention described above.

【0024】図4は第二発明の実施に用いる半導体装置
の実装パッケージの構成の一例を示す図であり、実装パ
ッケージの要部、特に半導体装置の裏側配線と接続する
引出配線の端子部構造を概略的に示す切欠斜視図であ
る。同図に示すパッケージ35はパッケージ本体36
と、引出配線381、382を備える。
FIG. 4 is a diagram showing an example of the structure of a mounting package of a semiconductor device used for implementing the second invention, showing the main part of the mounting package, particularly the terminal part structure of the lead-out wiring connected to the back side wiring of the semiconductor device. It is a notch perspective view which shows schematically. The package 35 shown in FIG.
And lead wires 381 and 382.

【0025】パッケージ35は裏側配線の種類に対応す
る種類の引出配線、この例では接地電位用の引出配線3
81及び電源電圧用の引出配線382を備える。引出配
線381は接地電位用の裏側配線321の第一端子部と
接続する第二端子部381aを、また引出配線382は
電源電圧用の裏側配線322の第一端子部と接続する第
二端子部382aを備える。図示せずも、パッケージ本
体36の周辺部には外部電気回路例えばアースや電源電
圧そのほかの回路と接続されるリード端子が設けられて
おり、引出配線381及び382の第二端子部とは反対
側の部分はそれぞれ第二端子部381a及び382aか
らアース及び電源電圧に接続されるリード端子まで引き
出されている。引出配線381及び382の少なくとも
第二端子部381a及び382aはそれぞれ、第一端子
部と同様に所定方向Pに延在するストライプ状の形状を
有し、これら第二端子部381a及び382aを並列配
置する。
The package 35 is a lead wiring of a type corresponding to the type of the back side wiring, in this example, the lead wiring 3 for ground potential.
81 and a lead wire 382 for the power supply voltage. The lead wiring 381 is a second terminal portion 381a connected to the first terminal portion of the back side wiring 321 for ground potential, and the lead wiring 382 is a second terminal portion connected to the first terminal portion of the back side wiring 322 for power supply voltage. 382a. Although not shown, a lead terminal connected to an external electric circuit such as ground or a power supply voltage or other circuit is provided in the peripheral portion of the package body 36, and the lead wires 381 and 382 are provided on the side opposite to the second terminal portion. The parts are drawn from the second terminal portions 381a and 382a to lead terminals connected to the ground and the power supply voltage, respectively. At least the second terminal portions 381a and 382a of the lead wirings 381 and 382 each have a striped shape extending in the predetermined direction P similarly to the first terminal portion, and the second terminal portions 381a and 382a are arranged in parallel. To do.

【0026】図5は第二発明の実施例の説明に供する図
であり、引出配線の第二端子部上に裏側配線の第一端子
部を載置した状態を示す要部切欠斜視図である。図中の
符号A及びBはそれぞれバイアホール301及び302
内に配設される裏側配線321の部分、また符号Cはバ
イアホール303内に配設される裏側配線322の部分
を示す。
FIG. 5 is a diagram provided for explaining the embodiment of the second invention, and is a perspective cutaway view showing a state in which the first terminal portion of the back side wiring is placed on the second terminal portion of the lead wiring. .. Reference numerals A and B in the figure denote via holes 301 and 302, respectively.
A portion of the back side wiring 321 disposed inside is shown, and a symbol C shows a portion of the back side wiring 322 arranged inside the via hole 303.

【0027】同図にも示すようにこの実施例では、半導
体装置22をパッケージ35に実装するに当たり、ま
ず、裏側配線321、322の第一端子部とこれらに対
応する引出配線381、382の第二端子部381a、
382aとを位置合わせし、これら対応する第一及び第
二端子部を接触させる。
As shown in the figure, in mounting the semiconductor device 22 on the package 35 in this embodiment, first, the first terminal portions of the back side wirings 321 and 322 and the lead wirings 381 and 382 corresponding to these are formed. Two-terminal portion 381a,
382a and the corresponding first and second terminal portions are brought into contact with each other.

【0028】裏側配線321、322の第一端子部と第
二端子部381a、382aとを例えばAu及びSnを
用いた共晶法で接続するため、この実施例では裏側配線
321、322の少なくとも第一端子部を、例えば、基
板24の側から順次に設けたAu薄膜及びSn薄膜から
成る2層構造とし、共晶法に適した材料から形成する。
Au薄膜及びSn薄膜は、例えば選択めっき法により、
所定の位置に選択的に形成する。これと共に引出配線3
81、382の少なくとも第二端子部381a、382
aを、例えばAu薄膜とし、共晶法に適した材料から形
成する。
Since the first terminal portions of the back side wirings 321 and 322 and the second terminal portions 381a and 382a are connected by the eutectic method using, for example, Au and Sn, in this embodiment, at least the back side wirings 321 and 322 are connected. For example, one terminal has a two-layer structure including an Au thin film and a Sn thin film sequentially provided from the substrate 24 side, and is formed of a material suitable for the eutectic method.
The Au thin film and the Sn thin film are formed, for example, by the selective plating method.
It is selectively formed at a predetermined position. Along with this, the lead wire 3
81, 382 at least second terminal portions 381a, 382
a is an Au thin film, for example, and is formed from a material suitable for the eutectic method.

【0029】次いで、裏側配線321、322の第一端
子部と、引出配線381、382の第二端子部381
a、382aとを互いに押し付けて接触させた状態で、
これら第一及び第二端子部をこれらの延在する方向Pに
沿って動かして擦り合わせ、共晶法によりこれら第一及
び第二端子部を接続する。この際、共晶法で通常行われ
る如く、これら第一及び第二端子部を例えば300℃程
度に加熱しながら擦り合わせる。また共晶法で通常行わ
れる如く、第一及び第二端子部を往復動させてこれら端
子部を擦り合わせ、これにより裏側配線と引出配線との
間の密着度及び平行度を実用上充分なものとする。第一
及び第二端子部の擦り合わせにより、Au及びSnの共
晶反応が生じて対応する第一及び第二端子部が接続す
る。接続した第一及び第二端子部を介し、半導体装置2
2はパッケージ35に固着される。
Next, the first terminal portions of the back wirings 321 and 322 and the second terminal portions 381 of the lead wirings 381 and 382.
a and 382a are pressed against each other and brought into contact with each other,
The first and second terminal portions are moved along the extending direction P and rubbed together to connect the first and second terminal portions by the eutectic method. At this time, these first and second terminal portions are rubbed together while being heated to, for example, about 300 ° C., as is usually done by the eutectic method. Further, as is usually done by the eutectic method, the first and second terminal portions are reciprocally moved to rub these terminal portions together, so that the adhesion and parallelism between the back side wiring and the lead-out wiring are practically sufficient. I shall. The rubbing of the first and second terminal portions causes a eutectic reaction of Au and Sn to connect the corresponding first and second terminal portions. Through the connected first and second terminal portions, the semiconductor device 2
2 is fixed to the package 35.

【0030】この実施例では、共晶法で第一及び第二端
子部を接続する際の短絡防止のため、第一及び第二端子
部を所定方向Pに長く延在させ、この方向Pに第一及び
第二端子部を動かしてこれら端子部を接続した。
In this embodiment, in order to prevent a short circuit when connecting the first and second terminal portions by the eutectic method, the first and second terminal portions are extended in a predetermined direction P, and in this direction P The first and second terminal portions were moved to connect these terminal portions.

【0031】また短絡を防止するため、隣接する裏側配
線321及び322間の離間距離と隣接する引出配線3
81及び382間の離間距離とを、第一及び第二端子部
の位置合わせ精度や、擦り合わせによる配線パターンの
広がりを考慮しつつ、短絡を招かないように定める。短
絡防止のためこれらの離間距離を例えば100μm以上
とするのがよい。
In order to prevent a short circuit, the distance between the back wirings 321 and 322 adjacent to each other and the lead wiring 3 adjacent to each other
The separation distance between 81 and 382 is determined so as not to cause a short circuit while taking into account the alignment accuracy of the first and second terminal portions and the spread of the wiring pattern due to rubbing. In order to prevent a short circuit, it is preferable that the distance between them be 100 μm or more.

【0032】この例では、第一及び第二端子部はストラ
イプ状なのでフリップチップ法におけるバンプよりも大
面積であり、従って第一及び第二端子部の形成及び接続
が容易であり、また第一及び第二端子部の接続時におけ
る位置合わせ精度をフリップチップ法の場合よりも緩和
できる。また半導体装置の裏側配線はバイアホールに対
応する位置に凹部を有することになるが、この凹部は第
一及び第二端子部の接触面積に比較して充分に小さいの
でこの凹部が存在しても第一及び第二端子部の平行度を
確保するのに支障はない。また半導体装置をフェースア
ップでパッケージに実装するので半導体装置の放熱性も
よい。また複数種の裏側配線をそれぞれバイアホールを
介し或は場合によってはバイアホール及び表側配線を介
し対応する半導体素子の電極と接続するので、複数種の
配線この例では接地電位用及び電源電圧用の配線に関し
インピーダンス及びインダクタンスを低減し、或は半導
体装置の熱抵抗をより一層効果的に低減し、或は基板表
側のパターンレイアウトの自由度をより一層効果的に高
めることができる。電気回路例えばDCFL回路では、
電源電圧用配線のインピーダンスを低下させることによ
って電気回路を構成する各半導体素子に印加される電源
電圧の大きさのばらつきを低減できる。
In this example, since the first and second terminal portions are stripe-shaped, they have a larger area than the bumps in the flip chip method, and therefore the first and second terminal portions can be easily formed and connected. Also, the alignment accuracy at the time of connecting the second terminal portion can be relaxed as compared with the flip chip method. Further, the back side wiring of the semiconductor device has a concave portion at a position corresponding to the via hole, but since this concave portion is sufficiently small compared to the contact area of the first and second terminal portions, even if this concave portion is present. There is no problem in ensuring the parallelism of the first and second terminal portions. Further, since the semiconductor device is mounted face up on the package, the heat dissipation of the semiconductor device is also good. Also, since plural kinds of back side wirings are respectively connected to the electrodes of the corresponding semiconductor element through via holes or, in some cases, via holes and front side wirings, plural kinds of wirings are used for ground potential and power supply voltage. Impedance and inductance of wiring can be reduced, or thermal resistance of the semiconductor device can be reduced more effectively, or the degree of freedom of pattern layout on the front side of the substrate can be increased more effectively. In an electric circuit such as a DCFL circuit,
By reducing the impedance of the power supply voltage wiring, it is possible to reduce variations in the magnitude of the power supply voltage applied to each semiconductor element forming the electric circuit.

【0033】図6は第二発明の実施に用いる実装パッケ
ージの他の構成例を示す図であり、実装パッケージの要
部、特に半導体装置の裏側配線と接続する引出配線の構
造を概略的に示す切欠斜視図である。
FIG. 6 is a diagram showing another example of the structure of the mounting package used for implementing the second invention, and schematically shows the structure of the main part of the mounting package, particularly the lead-out wiring connected to the back side wiring of the semiconductor device. It is a notch perspective view.

【0034】図4の実装パッケージは半導体装置の装置
規模が比較的小さいものに適したパッケージであるが、
図6の実装パッケージは半導体装置の装置規模及び集積
度が比較的大きく半導体装置のバイアホールを広い範囲
にわたり分散させて設ける必要がある場合に適したパッ
ケージである。
The mounting package shown in FIG. 4 is suitable for a semiconductor device having a relatively small device scale.
The mounting package shown in FIG. 6 is suitable for a case where the semiconductor device has a relatively large device scale and a high degree of integration and it is necessary to disperse the via holes of the semiconductor device over a wide range.

【0035】図6に示すパッケージ40はパッケージ本
体36と、引出配線421、422を備える。パッケー
ジ40は裏側配線の種類に対応する種類の引出配線、こ
の実施例では接地電位用の引出配線421及び電源電圧
用の裏側配線422を備える。引出配線421はストラ
イプ状或は矩形状の第二端子部421a〜421cとこ
れら端子部を共通接続する共通接続部421dとから成
り、同様に引出配線422はストライプ状或は矩形状の
第二端子部422a〜422cとこれら端子部を共通接
続する共通接続部422dとから成る。接地電位用の第
二端子部421a〜421cと、電源電圧用の第二端子
部422a〜422cとをそれぞれ一定方向Pに沿って
延在させて設け、かつこれら第二端子部の一方の側を互
いに指合させて設けこれら第二端子部を並列配置する。
そして接地電位用の第二端子部421a〜421cの他
方の側の端部を共通接続部421dに接続し、これら第
二端子部を共通接続部421dを介し図示しない接地電
位用のリード端子と接続する。また電源電圧用の第二端
子部422a〜422cの他方の側の端部を共通接続部
422dに接続し、これら第二端子部を共通接続部42
2dを介し図示しない電源電圧用のリード端子と接続す
る。
The package 40 shown in FIG. 6 includes a package body 36 and lead wires 421 and 422. The package 40 is provided with a lead wiring of a type corresponding to the type of the back wiring, in this embodiment, a lead wiring 421 for ground potential and a back wiring 422 for power supply voltage. The lead wire 421 is composed of striped or rectangular second terminal portions 421a to 421c and a common connection portion 421d for commonly connecting these terminal portions. Similarly, the lead wiring 422 is a striped or rectangular second terminal. The parts 422a to 422c and a common connection part 422d that connects these terminal parts in common. The second terminal portions 421a to 421c for ground potential and the second terminal portions 422a to 422c for power supply voltage are provided so as to extend along the constant direction P, and one side of these second terminal portions is provided. These second terminal portions are arranged in parallel so as to be pointed to each other.
Then, the other end portions of the ground potential second terminal portions 421a to 421c are connected to the common connection portion 421d, and these second terminal portions are connected to the ground potential lead terminal (not shown) through the common connection portion 421d. To do. Also, the other end of the second terminal portions 422a to 422c for power supply voltage is connected to the common connection portion 422d, and these second terminal portions are connected to the common connection portion 42.
It is connected to a lead terminal (not shown) for a power supply voltage via 2d.

【0036】上述のように複数種の引出配線及び複数種
の裏側配線をそれぞれ任意好適な位置に分散させて設け
ることによって、半導体装置のバイアホールを設ける位
置の自由度を高めることができる。
As described above, by providing a plurality of types of lead wirings and a plurality of types of back side wirings respectively dispersed at arbitrary and suitable positions, it is possible to increase the degree of freedom of the positions where the via holes of the semiconductor device are provided.

【0037】この例において、各第二端子部を対応する
第一端子部と共晶法により接続する際に短絡の発生を防
止するには例えば、隣接する第二端子部間の離間距離L
1を100μm以上とし、第一及び第二端子部を300
μmの移動範囲で互いに動かして擦り合わせ接続するよ
うにし接地電位用の共通接続部及び電源電圧用の第二端
子部間の離間距離L2と電源電圧用の共通接続部及び接
地電位用の第二端子部間の離間距離L3とをそれぞれ第
一及び第二端子部の移動範囲よりも大きな距離400μ
mとすればよい。また第二端子部の幅Wは半導体装置の
半導体素子のレイアウトやバイアホールの大きさ、形状
にもよるが例えば300μm以上とし、インピーダンス
を所望の小さな値にできる程度に第二端子部の電流の流
れる方向と直交する方向における断面積を大きく取る。
また各第二端子部の長さL4は半導体装置の各裏側配線
の長さL5(図2参照)よりも長くし第一及び第二端子
部の接続の信頼性を確保するのがよく、例えばL5=2
000μmとすればL4をL5よりも数100μm程度
長い長さL4=2500μm程度とすればよい。
In this example, in order to prevent the occurrence of a short circuit when each second terminal portion is connected to the corresponding first terminal portion by the eutectic method, for example, the separation distance L between the adjacent second terminal portions is set.
1 is 100 μm or more, and the first and second terminal portions are 300
The distance L2 between the common connection part for ground potential and the second terminal part for power supply voltage, the common connection part for power supply voltage, and the second connection part for ground potential are set so that they are moved and rubbed to each other in the moving range of μm. The distance L3 between the terminal portions is 400 μm which is larger than the moving range of the first and second terminal portions, respectively.
It should be m. The width W of the second terminal portion depends on the layout of the semiconductor element of the semiconductor device and the size and shape of the via hole, but is set to, for example, 300 μm or more so that the current of the second terminal portion can be set to a desired small value. Take a large cross-sectional area in the direction orthogonal to the flowing direction.
The length L4 of each second terminal portion is preferably longer than the length L5 (see FIG. 2) of each backside wiring of the semiconductor device to ensure the reliability of the connection between the first and second terminal portions. L5 = 2
If it is 000 μm, L4 may be set to a length L4 = 2500 μm, which is longer than L5 by several hundred μm.

【0038】図7は第二発明の実施に用いる実装パッケ
ージの他の構成例を示す図であり、実装パッケージの要
部、特に半導体装置の裏側配線と接続する引出配線の構
造を概略的に示す切欠斜視図である。
FIG. 7 is a diagram showing another example of the structure of the mounting package used for carrying out the second invention, and schematically shows the main part of the mounting package, particularly the structure of the lead-out wiring connected to the back side wiring of the semiconductor device. It is a notch perspective view.

【0039】図7に示すパッケージ46は半導体装置の
装置規模が比較的大きい場合に適したパッケージ46で
あり、パッケージ本体36と引出配線461、462、
463を備える。この例では、半導体装置の裏側配線の
種類を3種とし、パッケージ44は3種類の引出配線4
61〜463を備える。引出配線461はストライプ状
の第二端子部461a〜461eとこれら第二端子部を
共通接続する共通接続部461fを備え、引出配線46
2はストライプ状の第二端子部462a〜462bとこ
れら第二端子部を共通接続する共通接続部462cを備
え、引出配線463はストライプ状の第二端子部463
a〜463bとこれら第二端子部を共通接続する共通接
続部463cを備える。これら3種の引出配線461〜
463の各第二端子部をそれぞれ一定方向Pに沿って延
在させて設け、かつこれら第二端子部の一方の側を互い
に指合させて設けこれら第二端子部を並列配置する。そ
して引出配線461の各第二端子部の他方の側の端部を
共通接続部461fに接続し、これら各第二端子部を共
通接続部461fを介し当該引出配線461の種類に対
応する電位が印加されるリード端子(図示せず)と接続
する。同様にして引出配線462及び463の各第二端
子部を共通接続部462c及び463cを介し当該引出
配線462及び463の種類に対応する電位が印加され
るリード端子(図示せず)と接続する。
The package 46 shown in FIG. 7 is a package 46 suitable for a semiconductor device having a relatively large scale, and includes a package body 36 and lead wires 461 and 462.
463. In this example, there are three types of backside wiring of the semiconductor device, and the package 44 has three types of lead wiring 4
61 to 463. The lead wiring 461 includes stripe-shaped second terminal portions 461a to 461e and a common connection portion 461f that commonly connects these second terminal portions.
2 includes stripe-shaped second terminal portions 462a to 462b and a common connection portion 462c that commonly connects these second terminal portions, and the lead wire 463 has a striped second terminal portion 463.
a to 463b and a common connection portion 463c that commonly connects these second terminal portions. These three types of lead wires 461 to
Each second terminal portion of 463 is provided so as to extend along the constant direction P, and one side of each of these second terminal portions is provided so as to point to each other, and these second terminal portions are arranged in parallel. Then, the other end of each of the second terminal portions of the lead wiring 461 is connected to the common connection portion 461f, and the potential corresponding to the type of the lead wiring 461 is connected to each of the second terminal portions via the common connection portion 461f. It is connected to an applied lead terminal (not shown). Similarly, the second terminal portions of the lead wires 462 and 463 are connected to the lead terminals (not shown) to which a potential corresponding to the type of the lead wires 462 and 463 is applied, via the common connection portions 462c and 463c.

【0040】この例でも、複数種の引出配線461〜4
63及び複数種の裏側配線をそれぞれ任意好適な位置に
分散させて設けることによって、半導体装置のバイアホ
ールを設ける位置の自由度を高めることができる。
Also in this example, a plurality of types of lead wires 461 to 4 are provided.
By providing the 63 and a plurality of types of back side wirings in a dispersed manner at arbitrary and suitable positions, it is possible to increase the degree of freedom of the position where the via hole of the semiconductor device is provided.

【0041】これら発明は上述した実施例にのみ限定さ
れるものではなく、従って各構成成分の構造、形状、配
設位置、配設個数、数値的条件、形成材料及びそのほか
を任意好適に変更できる。
These inventions are not limited to the above-mentioned embodiments, and therefore, the structure, shape, arrangement position, arrangement number, numerical condition, forming material and the like of each component can be changed arbitrarily and suitably. ..

【0042】例えば半導体基板の表側に多層に表側配線
及び又は半導体素子の電極を設け、基板の裏側から各層
の表側配線及び又は半導体素子の電極までバイアホール
を貫通させて設け、各層の表側配線及び又は半導体素子
の電極をバイアホールを介して裏側配線と接続するよう
にしてもよい。また裏側配線の種類は接地電位及び電源
電圧以外の種類を含んでもよい。また半導体素子をFE
T以外の任意好適な構造の素子とすることができる。
For example, front side wirings and / or electrodes of semiconductor elements are provided in multiple layers on the front side of the semiconductor substrate, and via holes are provided from the back side of the substrate to the front side wirings of each layer and / or the electrodes of semiconductor elements. Alternatively, the electrode of the semiconductor element may be connected to the back wiring via the via hole. The type of backside wiring may include types other than ground potential and power supply voltage. In addition, the semiconductor element is FE
An element having any suitable structure other than T can be used.

【0043】[0043]

【発明の効果】上述した説明からも明らかなように、第
一発明によれば、半導体素子の電極に印加する電位の種
類に対応する2種類以上の裏側配線を設け、複数種の裏
側配線をそれぞれバイアホールを介し対応する半導体素
子の電極と接続するので、例えば、複数種の配線に関し
インピーダンス及びインダクタンスを低減し、或は半導
体装置の熱抵抗を一層効果的に低減し、或は基板表側の
パターンレイアウトの自由度を一層効果的に高めること
ができる。。
As is apparent from the above description, according to the first invention, two or more kinds of back side wirings corresponding to the types of potentials applied to the electrodes of the semiconductor element are provided, and a plurality of kinds of back side wirings are provided. Since each is connected to the corresponding electrode of the semiconductor element through a via hole, for example, impedance and inductance of a plurality of types of wiring can be reduced, or the thermal resistance of the semiconductor device can be further effectively reduced, or the front surface of the substrate can be reduced. The degree of freedom of the pattern layout can be increased more effectively. ..

【0044】第一発明の実施に当たっては、インピーダ
ンス及び又はインダクタンスの低減が望まれる複数種類
の配線を主として裏側配線として配設し、これら複数種
の裏側配線をバイアホールを介し対応する半導体素子の
電極と接続するのが好適である。このようにすることに
よって、複数種類の配線に関して、インピーダンス及び
又はインダクタンスの低減を実現でき、その結果電気回
路特に高周波電気回路の回路特性をより一層向上するこ
とができるようになる。
In the practice of the first invention, a plurality of types of wirings for which impedance and / or inductance are desired to be reduced are mainly arranged as back side wirings, and these plurality of types of back side wirings are connected to electrodes of corresponding semiconductor elements through via holes. Is preferably connected to. By doing so, it is possible to reduce the impedance and / or the inductance with respect to a plurality of types of wiring, and as a result, it is possible to further improve the circuit characteristics of the electric circuit, particularly the high frequency electric circuit.

【0045】また第二発明によれば、第一端子部及び第
二端子部はそれぞれ同じ方向に延在する。従って、第一
発明の半導体装置に複数個の裏側配線を設けこの装置の
実装パッケージに複数個の引出配線を設けても、接続す
べき相対応する第一端子部及び第二端子部を接触させた
状態でこれら端子部をこれらの延在する方向に沿って動
かして擦り合わせるという簡便な方法により、これら複
数個の配線を同一工程で一括して接続することができ
る。従って半導体装置の実装を簡便かつ迅速に行える。
According to the second invention, the first terminal portion and the second terminal portion respectively extend in the same direction. Therefore, even if the semiconductor device of the first invention is provided with a plurality of back side wirings and the plurality of lead wirings is provided in the mounting package of this device, the corresponding first terminal portion and second terminal portion to be connected are brought into contact with each other. With a simple method of moving these terminal portions along these extending directions and rubbing them in the above state, it is possible to collectively connect the plurality of wirings in the same step. Therefore, the semiconductor device can be mounted easily and quickly.

【0046】また複数個の裏側配線及び複数個の引出配
線を設けた場合でも、これら配線の第一端子部及び第二
端子部をそれぞれ同じ方向に延在させて設け、これらの
延在方向に第一端子部及び第二端子部を動かして擦り合
わせることによって、隣接する端子部間の短絡を無くせ
る。
Further, even when a plurality of back side wirings and a plurality of lead-out wirings are provided, the first terminal portion and the second terminal portion of these wirings are provided so as to extend in the same direction, and these wirings are provided in the extending direction. By moving and rubbing the first terminal portion and the second terminal portion together, a short circuit between adjacent terminal portions can be eliminated.

【図面の簡単な説明】[Brief description of drawings]

【図1】第一発明の実施例の要部構成を概略的に示す切
欠斜視図である。
FIG. 1 is a cutaway perspective view schematically showing a main part configuration of an embodiment of a first invention.

【図2】第一発明の実施例の要部構成を概略的に示す断
面図である。
FIG. 2 is a cross-sectional view schematically showing a main part configuration of an embodiment of the first invention.

【図3】第一発明の実施例の要部構成を概略的に示す底
面図である。
FIG. 3 is a bottom view schematically showing a main part configuration of an embodiment of the first invention.

【図4】第二発明の実施に用いるパッケージの構成の一
例を概略的に示す要部切欠斜視図である。
FIG. 4 is a cutaway perspective view of a main part schematically showing an example of the configuration of a package used for implementing the second invention.

【図5】第二発明の実施例の説明に供する要部切欠斜視
図である。
FIG. 5 is a cutaway perspective view of an essential part for explaining an embodiment of the second invention.

【図6】第二発明の実施に用いるパッケージの構成の一
例を概略的に示す要部平面図である。
FIG. 6 is a main part plan view schematically showing an example of the configuration of a package used for implementing the second invention.

【図7】第二発明の実施に用いるパッケージの構成の一
例を概略的に示す要部平面図である。
FIG. 7 is a main part plan view schematically showing an example of the configuration of a package used for implementing the second invention.

【図8】従来の実装技術で用いる半導体装置の構成の一
例を概略的に示す断面図である。
FIG. 8 is a sectional view schematically showing an example of a configuration of a semiconductor device used in a conventional mounting technique.

【図9】従来の実装技術で用いる半導体装置の構成の他
の例を概略的に示す断面図である。
FIG. 9 is a sectional view schematically showing another example of the configuration of the semiconductor device used in the conventional mounting technique.

【符号の説明】[Explanation of symbols]

22:半導体装置 24:半導体基板 261〜263:半導体素子 28:表側配線 301〜303:バイアホール 321〜322:裏側配線 341〜347:電極 35、40、46:実装パッケージ 421〜422、461〜463:引出配線 421a〜421c、422a〜422c、461a〜
461e、462a〜462b、463a〜463b:
第二端子部
22: Semiconductor device 24: Semiconductor substrate 261 to 263: Semiconductor element 28: Front side wiring 301 to 303: Via hole 321 to 322: Back side wiring 341 to 347: Electrode 35, 40, 46: Mounting package 421 to 422, 461 to 463 : Lead wiring 421a to 421c, 422a to 422c, 461a to
461e, 462a to 462b, 463a to 463b:
Second terminal part

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 半導体基板と、半導体基板の表側に設け
られた半導体素子と、半導体基板を貫通するバイアホー
ルと、半導体基板の裏側に設けられバイアホールを介し
半導体素子の電極と接続する裏側配線とを備えて成る半
導体装置において、 半導体素子の電極に印加される電位の種類に対応する複
数種類の裏側配線を設け、 裏側配線を、当該裏側配線に対応する種類の電位が印加
される半導体素子の電極と接続して成ることを特徴とす
る半導体装置。
1. A semiconductor substrate, a semiconductor element provided on the front side of the semiconductor substrate, a via hole penetrating the semiconductor substrate, and a back side wiring provided on the back side of the semiconductor substrate and connected to an electrode of the semiconductor element through the via hole. In a semiconductor device comprising: a semiconductor element to which a plurality of types of back side wirings corresponding to the types of potentials applied to the electrodes of the semiconductor element are provided, and the back side wirings are applied with a potential of the type corresponding to the back side wirings. A semiconductor device, characterized in that it is connected to the electrode of.
【請求項2】 請求項1記載の半導体装置において、裏
側配線は電源電圧用及び接地電位用の少なくとも2種の
裏側配線を含むことを特徴とする半導体装置。
2. The semiconductor device according to claim 1, wherein the back side wiring includes at least two kinds of back side wirings for a power supply voltage and a ground potential.
【請求項3】 請求項1記載の半導体装置を引出配線を
備えるパッケージに実装し、該半導体装置の裏側配線と
該裏側配線に対応するパッケージの引出配線とを接続す
るに当たり、 所定方向に延在する第一端子部を裏側配線に設け、 第一端子部の延在方向に沿って延在する第二端子部を引
出配線に設け、 これら第一端子部及び第二端子部をこれらの延在する方
向に沿って動かして擦り合わせ、共晶法により第一端子
部及び第二端子部を接続することを特徴とする半導体装
置の実装方法。
3. The semiconductor device according to claim 1 is mounted in a package having a lead wiring, and when connecting the back side wiring of the semiconductor device and the lead wiring of the package corresponding to the back side wiring, it extends in a predetermined direction. The first terminal portion is provided on the back side wiring, the second terminal portion extending along the extending direction of the first terminal portion is provided on the lead wiring, and the first terminal portion and the second terminal portion are extended from these. A method for mounting a semiconductor device, comprising: moving the semiconductor device along a direction in which the first terminal portion and the second terminal portion are connected by a eutectic method.
JP25395191A 1991-10-01 1991-10-01 Semiconductor device and its mounting method Withdrawn JPH0595049A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25395191A JPH0595049A (en) 1991-10-01 1991-10-01 Semiconductor device and its mounting method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25395191A JPH0595049A (en) 1991-10-01 1991-10-01 Semiconductor device and its mounting method

Publications (1)

Publication Number Publication Date
JPH0595049A true JPH0595049A (en) 1993-04-16

Family

ID=17258246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25395191A Withdrawn JPH0595049A (en) 1991-10-01 1991-10-01 Semiconductor device and its mounting method

Country Status (1)

Country Link
JP (1) JPH0595049A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1126464A (en) * 1997-06-30 1999-01-29 Oki Electric Ind Co Ltd Interconnection structure of semiconductor element and its manufacture
JP2011108813A (en) * 2009-11-17 2011-06-02 Fujitsu Ltd Semiconductor device and method of manufacturing the same
JP2016012737A (en) * 2015-10-06 2016-01-21 三菱電機株式会社 Semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1126464A (en) * 1997-06-30 1999-01-29 Oki Electric Ind Co Ltd Interconnection structure of semiconductor element and its manufacture
JP2011108813A (en) * 2009-11-17 2011-06-02 Fujitsu Ltd Semiconductor device and method of manufacturing the same
JP2016012737A (en) * 2015-10-06 2016-01-21 三菱電機株式会社 Semiconductor device

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