JPH0587990A - X-ray mirror and its production - Google Patents

Abstract

PURPOSE:To prevent deterioration in fabrication accuracy and surface roughness and enable spreading the selection of material for base plate by depositing an intermediate layer on the base plate and a multilayer film on it. CONSTITUTION:The surface of a flat base plate 11 is machined, the plate 11 is placed in a vessel 24, the inside of the vessel 24 is highly evacuated and a base plate 25 is heated to a specified temperature. A laser beam 22 from a laser source is them reflected from a mirror 23 to irradiate the base plate 25. A material gas is introduced from a guide inlet 26 and is optically decomposed by the laser beam 22 and a film is formed. If the laser beam is vibrated, an intermediate layer 12 is formed in accordance with the vibration wave shape. The introduced gas is exhausted out of an exhaust outlet 27. Consequently, a material gas for forming the first layer of multiple film layer 13 is introduced from the guide inlet 26. By vibrating the laser beam, a layer having a desired film thickness distribution is formed. In this process, by changing the film thickness in the multiple film layer 13 in the base plate surface direction, X-ray utilization efficiency can be improved. Then, the material gas is exhausted and another gas to form the second layer is introduced from the guideinlet 26. And by repeating this, the multifilm layer 13 is formed.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an X-ray mirror used for an X-ray microscope, an X-ray telescope, an X-ray lithography and the like, and a method for manufacturing the same.

[0002]

2. Description of the Related Art Conventionally, an X-ray mirror has been manufactured by directly depositing a thin film or a multilayer film on a substrate by using a technique such as ion beam sputtering, electron beam evaporation, laser CVD and the like. This thin film is, for example, gold, platinum, or the like, and the multilayer film is usually formed by alternately stacking about 10 to 100 layers of light element layers such as carbon and silicon and heavy element layers such as tungsten and molybdenum. It is a thing. Since these X-ray mirrors use a wavelength of several tens of nm or less, it is necessary to make the surface roughness of the mirror extremely smooth (for example, several nm or less). Therefore, in the production of the plane mirror, it is necessary to finish the surface of the substrate smoothly by using an ultra-precision processing method such as float polishing, and the substrate material is limited to silicon wafer, float glass and the like. As a means for solving this problem, for example, there is a method described in Japanese Patent Application Laid-Open No. 1-220700.

A conventional method for manufacturing an X-ray mirror will be described below with reference to FIG. 4A to 4C are cross-sectional views in order of steps of a conventional X-ray mirror. In FIG. 4, 41 is a substrate,
42 is an intermediate layer made of a polymer material, and 43 is a multilayer film. In the structure as described above, first, the substrate 41 is surface-processed by using a generally used lathe, polishing machine, or the like (FIG. 4A). Next, an intermediate layer 42 made of a polymer material is formed on this (FIG. 4B). By using a spin coating method as a method of manufacturing this intermediate layer, an extremely smooth surface can be realized without being affected by the unevenness of the substrate. On top of that, the multilayer film 43 is formed by using various vapor deposition methods used in the conventional method (FIG. 4).
(C)).

On the other hand, when the X-ray mirror is used for focusing X-rays and the like, the substrate is ultra-precision processed into a non-planar shape such as a parabolic surface, and a multilayer film is formed thereon. For example, as an X-ray mirror for converting divergent X-rays into parallel X-rays, there is a structure disclosed in JP-A-62-242901.

A conventional X-ray mirror will be described below with reference to FIG. FIG. 5 is a block diagram of a conventional X-ray mirror. In FIG. 5, reference numeral 51 denotes a substrate whose surface is ultraprecision processed into a parabolic shape, 52 denotes a multilayer film formed on the substrate 51 by a conventional vapor deposition method, 53 denotes an X-ray source, 54 denotes divergent X-rays, and 5
5 is a parallel X-ray. The operation method of the above configuration will be described. The divergent X-rays 54 emitted from the X-ray source 53 are reflected by the multilayer film 52. At this time, if the X-ray source 53 is installed so as to be the focal point of the paraboloid of the substrate 51, the X-rays reflected by the multilayer film 52 are parallel X-rays 55.
Becomes Conversely, parallel X-rays can also be focused at the focal point of the paraboloid.

In manufacturing such a non-planar mirror such as a paraboloid, the processing accuracy of the substrate influences the performance of the X-ray mirror. Conventionally, as a method of processing a non-planar substrate, a procedure of pre-processing a shape by grinding and finishing the surface by polishing has been used.

[0007]

However, in the above conventional structure, when the substrate is to be processed into a non-planar shape such as a parabolic surface, the technique used for ultra-precision processing of a flat substrate such as float polishing is used. However, there is a problem that processing accuracy, surface roughness, etc. are deteriorated and performance as an X-ray mirror is deteriorated as compared with processing of a flat substrate.
Further, a brittle material such as ceramics or a material having high toughness such as Al cannot be used as the substrate, and the material is very limited.

Further, when the intermediate layer made of a polymer material is formed by using the spin coating method, the method is different from the multilayer film forming method, so that there is a problem that the manufacturing method of the X-ray mirror becomes complicated. Was there. Furthermore, in the case of a non-planar substrate, it is difficult to form a uniform intermediate layer using the conventional spin coating method.

The present invention solves the above-mentioned problems of the prior art, does not require ultra-precision machining of a non-planar shape, and further,
It becomes possible to widen the selection range of materials for the substrate X
An object of the present invention is to provide a line mirror and a manufacturing method thereof.

[0010]

In order to achieve this object, the X-ray mirror of the present invention has a structure in which an intermediate layer having a desired shape is used. Then, as a method of manufacturing this X-ray mirror, an intermediate layer is deposited on the substrate,
There is a method of depositing a multilayer film on this intermediate layer.
Furthermore, this intermediate layer changes the film thickness in the in-plane direction of the substrate,
The desired shape was created.

[0011]

According to the present invention, by providing the intermediate layer having a desired shape creation in the X-ray mirror having the above-mentioned structure, a non-planar X-ray used for X-ray focusing or the like can be obtained by using a conventional flat substrate. You can get a mirror. Also, this X
As a method of manufacturing a line mirror, by providing a step of depositing an intermediate layer on a substrate to create a desired shape and then depositing a multilayer film on it, the processing accuracy associated with the processing of the non-planar shape of the substrate is improved. Also, the surface roughness does not deteriorate. Furthermore, the selection range of the material for the substrate can be expanded.

[0012]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 is a block diagram of an X-ray mirror in one embodiment of the present invention. In FIG. 1, 11 is a flat substrate, 1
Reference numeral 2 is an intermediate layer (parabolic shape in this figure) formed by changing the film thickness distribution in the in-plane direction of the flat substrate 11, and 13 is a multilayer film formed thereon.

As a method of manufacturing the X-ray mirror having the above structure, for example, a laser CVD method may be used. Hereinafter, a method for manufacturing an X-ray mirror using the laser CVD method will be described with reference to the drawings.

FIG. 2 is a block diagram of an X-ray mirror manufacturing apparatus using the laser CVD method. In FIG. 2, 21 is a laser light source, 22 is laser light emitted from the laser light source 21, 23 is a mirror that reflects the laser light 22, 24 is a reaction container, 25 is a substrate similar to the planar substrate 11 of FIG. Is a material gas inlet, and 27 is a material gas outlet. As the material gas, for example, tungsten-carbon (W /
C) When forming a multilayer film, tungsten hexafluoride and benzene are used. 3A to 3D are cross-sectional views in order of the steps of the X-ray mirror using the laser CVD method. In FIG. 3, 31 is a laser beam, and 11 to 13 are the same as in FIG.

In the structure as described above, first, the flat substrate 11 is surface-processed (FIG. 3A), and the reaction container 2 shown in FIG.
4, the inside of the reaction vessel 24 is evacuated to a high vacuum and the substrate 25 is heated to a predetermined temperature. Next, the intermediate layer is formed. As the intermediate layer, for example, when forming a W / C multilayer film, a carbon film may be used. The laser light 22 emitted from the laser light source 21 is reflected by the mirror 23, and irradiates the substrate 25 installed in the reaction container 24. On the other hand, the material gas is introduced into the reaction container 24 through the introduction port 26, and is photolyzed by the laser light 22 to form a film on the portion of the substrate 25 irradiated with the laser light 22. At this time,
For example, by vibrating the mirror 23, the laser light 22 can be scanned on the substrate 25, and a thin film having a film thickness varied in the in-plane direction of the substrate is formed. That is, in FIG. 3B, the laser beam 31 is v ₁ = f (t)
When vibrating for (t: time), an intermediate layer having a film thickness distribution of d ₁ = F (x) (x: position on the substrate) is formed corresponding to the vibration waveform. After that, the introduced material gas is exhausted from the exhaust port 27. Then, a multilayer film is formed. By introducing the material gas for forming the first layer of the multilayer film and oscillating the laser beam with v ₂ = g (t), a layer having a film thickness distribution of d ₂ = G (x) is obtained. It is formed. At this time, Bragg (Br
agg) By changing the film thickness of the multilayer film 13 in the in-plane direction of the substrate so as to cause reflection, the utilization efficiency of X-rays can be improved. After that, the material gas is exhausted and 2
A material gas for forming a layer is introduced. By repeating the above procedure, the multilayer film 13 is formed (FIG. 3).
(C)).

As described above, according to the present embodiment, it is necessary to process the non-planar shape of the substrate by depositing the intermediate layer whose thickness is changed in the in-plane direction of the substrate on the flat substrate. Without, it is possible to obtain an X-ray mirror having a desired shape. Further, in forming the intermediate layer, one of the constituent materials of the multilayer film is used as the material and the same method as the multilayer film forming method is used, so that the manufacturing process of the X-ray mirror is not complicated. Further, when the CVD method is used, an X-ray mirror having a surface smoother than that of the substrate can be obtained by controlling the CVD conditions.

In the first embodiment, the substrate is a flat substrate and the intermediate layer is formed in a parabolic shape, but it can be formed in any shape. Further, although the carbon film is used as the intermediate layer and the W / C multilayer film is used as the multilayer film, other materials may be used. Further, as a method for manufacturing an X-ray mirror, laser CVD
Although the method was used, it goes without saying that other manufacturing methods may be used.

[0019]

INDUSTRIAL APPLICABILITY As described above, the present invention can be used for X-ray focusing and the like using a conventional flat substrate by providing an intermediate layer having a desired shape creation in the X-ray mirror. An X-ray mirror with excellent performance can be obtained.
Further, as a method of manufacturing this X-ray mirror, by providing a step of depositing an intermediate layer on a substrate to create a desired shape and then depositing a multilayer film thereon,
This is extremely advantageous in practical use because the processing accuracy, surface roughness, etc. do not deteriorate due to the processing of the non-planar shape of the substrate, and the selection range of the material for the substrate can be expanded.

[Brief description of drawings]

FIG. 1 is a configuration diagram of an X-ray mirror according to a first embodiment of the present invention.

FIG. 2 is a configuration diagram of an X-ray mirror manufacturing apparatus using the laser CVD method according to the first embodiment of the present invention.

3A to 3C are cross-sectional views in order of steps of an X-ray mirror using a laser CVD method according to the first embodiment of the present invention.

4A to 4C are cross-sectional views in order of steps of a conventional X-ray mirror.

FIG. 5 is a configuration diagram of a conventional X-ray mirror.

[Explanation of symbols]

 11 Planar substrate 12 Intermediate layer 13 Multilayer film 21 Laser light source 22 Laser light 23 Mirror 24 Reaction vessel 25 Substrate 26 Material gas inlet 27 Material gas exhaust 31 Laser light

Claims (4)

[Claims] 1. An X-ray mirror comprising: an intermediate layer formed on a substrate; and a multilayer film in which at least two kinds of thin films formed on the intermediate layer are alternately laminated. 2. The substrate is a flat substrate, and the intermediate layer formed thereon has a thickness changed in the in-plane direction of the substrate.
The described X-ray mirror. 3. The method of manufacturing an X-ray mirror according to claim 1, wherein an intermediate layer is deposited on the substrate, and a multilayer film in which at least two kinds of thin films are alternately laminated is deposited on the intermediate layer. 4. A laser CVD method for decomposing a material gas supplied into a reaction vessel by a laser beam emitted from a laser light source to form a film on a substrate in the reaction vessel,
The method of manufacturing an X-ray mirror according to claim 1 or 2, wherein an intermediate layer having a film thickness changed in the in-plane direction of the substrate is formed.