JPH0584626A - Fine moving device for stage - Google Patents

Fine moving device for stage

Info

Publication number
JPH0584626A
JPH0584626A JP3245561A JP24556191A JPH0584626A JP H0584626 A JPH0584626 A JP H0584626A JP 3245561 A JP3245561 A JP 3245561A JP 24556191 A JP24556191 A JP 24556191A JP H0584626 A JPH0584626 A JP H0584626A
Authority
JP
Japan
Prior art keywords
stage
base
piezoelectric element
spherical
fine movement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3245561A
Other languages
Japanese (ja)
Inventor
Yoshiji Fujita
佳児 藤田
Hiroyuki Nagano
寛之 長野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP3245561A priority Critical patent/JPH0584626A/en
Publication of JPH0584626A publication Critical patent/JPH0584626A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Machine Tool Units (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)

Abstract

PURPOSE:To make a fine adjustment without applying shearing force to a piezoelectric element by providing the stacked piezoelectric element having spherical surfaces at both ends of which spherical diameter is the same as the interval between a base and a stage, and an elastic body which works in the direction of contracting the interval between the base and the stage. CONSTITUTION:Members 4 and 5, which have spherical surface ends on the sides of a base 1 and a stage 2, are joined to both ends of a stacked piezoelectric element 3. The spherical diameter of the spherical surface is the same as the interval betweent the base 1 and the stage 2, and compressive force is given as pre-load to the base 1 and the stage 2 with springs 6 and 7. The piezoelectric element 3 is expanded or compressed in axial direction, and the stage 2 is deformed in the direction of separating form the base 1. When the stage 2 is slid to the base 1 by external force, it can finely move without causing shearing force in the piezoelectric element 3 since the contact points between the stage 2 and the base 1 and the piezoelectric element 3 are spherical, and a fine movement error by the reaction of the shearing force can be removed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、例えば半導体露光用の
ステージのように精密な位置決めが必要とされるステー
ジの微動装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a fine movement device for a stage, such as a stage for semiconductor exposure, which requires precise positioning.

【0002】[0002]

【従来の技術】近年、空間の位置決めステージに要求さ
れる精度は、従来よりさらに微細になってきた。例えば
半導体のパターンではサブミクロンこらクォーターミク
ロンの加工が必要であり、この加工に用いるステージに
は分解能が数ナノメートル程度の極めて精密な位置決め
が要求される。
2. Description of the Related Art In recent years, the precision required for a spatial positioning stage has become finer than ever before. For example, a semiconductor pattern requires sub-micron or quarter-micron processing, and the stage used for this processing requires extremely precise positioning with a resolution of about several nanometers.

【0003】このような超精密の位置決めをおこなうに
は超微細な位置決めができるガイドとアクチュエータが
必要となる。
In order to perform such ultra-precision positioning, a guide and an actuator capable of performing ultra-fine positioning are required.

【0004】このような超精密の位置決めをおこなうの
にアクチュエータとして積層形の圧電素子を用いられる
ことが多いが、積層形の圧電素子は引っ張り方向と、積
層に対して平行な方向つまりせん断方向の力に非常に弱
い特性がある。したがって、ステージがベースに対して
どのような方向に変位しても積層形の圧電素子には引張
力とせん断力ができるだけかからない構造をとることが
必要となる。このため特開昭62−88008号公報を
みると、図2に示すように、積層形圧電素子21の両
側、つまりベース22と圧電素子の間とステージ23と
圧電素子の間に非常に低剛性の球対偶部分24および2
5を設けている。図2のように構成された支持機構にお
いて、ここで例えばベース22とステージ23とが平行
に変位するとき、図3に示すようにこの球対偶24およ
び25の最も剛性の低いところで変位は吸収されるた
め、圧電素子21にせん断力として伝わる力は非常に小
さくなる。
A laminated piezoelectric element is often used as an actuator for performing such ultra-precision positioning. The laminated piezoelectric element has a tensile direction and a direction parallel to the laminated direction, that is, a shear direction. It has a very weak property. Therefore, it is necessary to have a structure in which the tensile force and the shearing force are not applied to the laminated piezoelectric element as much as possible regardless of the direction in which the stage is displaced with respect to the base. For this reason, as shown in FIG. 2 of JP-A-62-88008, as shown in FIG. 2, the rigidity is very low on both sides of the laminated piezoelectric element 21, that is, between the base 22 and the piezoelectric element, and between the stage 23 and the piezoelectric element. Sphere pair parts 24 and 2 of
5 are provided. In the support mechanism configured as shown in FIG. 2, when the base 22 and the stage 23 are displaced in parallel, for example, as shown in FIG. 3, the displacement is absorbed at the lowest rigidity of the ball pairs 24 and 25. Therefore, the force transmitted as a shearing force to the piezoelectric element 21 is extremely small.

【0005】[0005]

【発明が解決しようとする課題】しかしながら上記のよ
うな構成では、図3に示すように剛性の低い部分におけ
る復元力が依然として存在するために、圧電素子にかか
るせん断力を全くなくすことはできない。このせん断力
を小さくするには低剛性の部分24,25をさらに低剛
性にすること、つまり球対偶の最小直径部分をさらに小
さくすることが必要になるが、この場合ステージそのも
のの剛性が低下してしまう可能性がある。
However, in the above structure, the shearing force applied to the piezoelectric element cannot be completely eliminated because the restoring force still exists in the portion having low rigidity as shown in FIG. In order to reduce this shearing force, it is necessary to further reduce the rigidity of the low-rigidity portions 24 and 25, that is, to further reduce the minimum diameter portion of the sphere pair, but in this case, the rigidity of the stage itself decreases. There is a possibility that it will end up.

【0006】また、組立誤差が発生すると、静的な状態
でも圧電素子21にせん断力がかかり得ること、同じく
組立誤差が発生すると図3に見るようにX軸方向の組立
誤差がZ軸へ及ぶ変位、つまりΔLが問題となるなど他
軸成分への干渉が無視できなくなる問題があった。
Further, if an assembly error occurs, shearing force may be applied to the piezoelectric element 21 even in a static state. Similarly, if an assembly error occurs, the assembly error in the X-axis direction extends to the Z-axis as shown in FIG. There is a problem that the displacement, that is, ΔL becomes a problem, and the interference with other axis components cannot be ignored.

【0007】上記課題を解決するために、本発明は圧電
素子にせん断力をかけずに、また同時に組立上の誤差が
発生しても他軸成分への干渉量を増やすことのない微動
装置を提供するものである。
In order to solve the above problems, the present invention provides a fine movement device which does not apply a shearing force to a piezoelectric element and at the same time does not increase the amount of interference with other axis components even if an assembly error occurs. Is provided.

【0008】[0008]

【課題を解決するための手段】上記課題を解決するため
に、本発明のステージ微動装置は、圧電素子の両側に、
ベースとステージ間の距離を直径にもつ球の端面を設
け、さらにベースとステージとの間隔を縮める方向に弾
性体を設けることを特徴とするものである。
In order to solve the above-mentioned problems, the stage fine movement device of the present invention comprises:
It is characterized in that an end face of a sphere having a diameter between the base and the stage is provided, and an elastic body is further provided in a direction of reducing the distance between the base and the stage.

【0009】[0009]

【作用】以下、図4を用いてこの作用を説明する。図4
は本発明のステージ微動装置の要点を示したものであ
り、41がベース、42がステージ、43が積層型圧電
素子である。また44,45が43の積層型圧電素子の
両側に位置した、球面の端をもった部材である。ここで
球面はベースとステージとの間の距離と等しいようにと
ると、ベースの上に球が乗り、さらにその上にステージ
が乗る形になり、球がベアリングの玉のような役目をし
てステージはベースに対して距離を一定に保ったまま平
行移動することが可能となる。つまりX方向に組立誤差
が発生したとしても、球面で接触している限りZ方向に
は何等の影響も与えない。さらに球面端を有する部材と
ベース,ステージは点接触しているだけであり、いくら
X方向に変位があったとしても、圧電素子に対して力を
発生させるようなことはない。
The operation will be described below with reference to FIG. Figure 4
Shows essential points of the stage fine movement device of the present invention, in which 41 is a base, 42 is a stage, and 43 is a laminated piezoelectric element. Further, 44 and 45 are members having spherical surface ends, which are located on both sides of the laminated piezoelectric element 43. Here, if the spherical surface is made equal to the distance between the base and the stage, the ball will sit on the base, and then the stage will sit on it, and the ball acts as a ball of a bearing. The stage can move in parallel with the base while keeping a constant distance. That is, even if an assembly error occurs in the X direction, it does not have any effect in the Z direction as long as the spherical surface is in contact. Further, the member having the spherical end, the base, and the stage are only in point contact with each other, and no matter how much the displacement occurs in the X direction, no force is generated on the piezoelectric element.

【0010】以上のように本発明は上記した構成によっ
て、圧電素子にせん断力がかからず、かつ組立による誤
差によって、他の軸への干渉が防止できる。
As described above, according to the present invention, due to the above-mentioned structure, the piezoelectric element is not subjected to shearing force, and it is possible to prevent interference with other axes due to an error due to assembly.

【0011】[0011]

【実施例】以下本発明の一実施例のステージ微動装置に
ついて、図面を参照しながら説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A stage fine movement apparatus according to an embodiment of the present invention will be described below with reference to the drawings.

【0012】図1は本発明の第1の実施例におけるステ
ージの微動装置を示すものである。図1において、1は
ベース、2はステージ、3は圧電素子、4,5は圧電素
子の両端に接合された、ステージとベースの接触点間の
距離に相当する直径をもつ球の端面をもつ部材である。
また6,7はコイルばねであり、ベースに対してステー
ジを引っ張り、圧電素子に予圧として圧縮力を与えてい
るものである。
FIG. 1 shows a stage fine movement device according to a first embodiment of the present invention. In FIG. 1, 1 is a base, 2 is a stage, 3 is a piezoelectric element, and 4 and 5 are end surfaces of a sphere having a diameter corresponding to the distance between the contact points of the stage and the base, which are joined to both ends of the piezoelectric element. It is a member.
Further, 6 and 7 are coil springs that pull the stage with respect to the base and apply a compressive force as a preload to the piezoelectric element.

【0013】以上のように構成されたステージの微動装
置において以下にその動作を説明する。
The operation of the stage fine movement apparatus configured as described above will be described below.

【0014】まず、圧電素子3はその軸方向に伸び縮み
する。これにより、ステージがベースに対して離れる方
向に変位する。ばね6,7は圧電素子が常にベース,ス
テージと接触し、かつ安定的に動作するために用いられ
ている。この圧電素子の駆動によって、ステージは変位
を与えられる。
First, the piezoelectric element 3 expands and contracts in its axial direction. As a result, the stage is displaced in the direction away from the base. The springs 6 and 7 are used so that the piezoelectric element is always in contact with the base and the stage and operates stably. The stage is displaced by driving the piezoelectric element.

【0015】ここでX方向に外力が加わったとき、また
はX方向に組立誤差が生じてステージとリンクの接点が
ずれた時を考える。従来までであれば図3(a)に示す
ようにベースおよびステージに固定された球対偶を有す
る部材が最も剛性が低いと考えられる部分で変形し、
「く」の字状になることによって、その外力による変位
を吸収していた。しかしながらこれによりZ方向にも変
位伴う。外力および組立誤差によるX方向の変位量をδ
とすると、これに伴うZ方向の変位量は、aを球対偶の
部材のくびれ部から固定点までの距離、bを圧電素子を
含めたステージ側くびれ部からベース側くびれ部までの
距離として、ΔL=b−(b2−δ21/2となる。
Here, consider the case where an external force is applied in the X direction or the contact between the stage and the link is displaced due to an assembly error in the X direction. Until now, as shown in FIG. 3 (a), a member having a ball pair fixed to a base and a stage is deformed at a portion considered to have the lowest rigidity,
Due to the "U" shape, the displacement due to the external force was absorbed. However, this also causes displacement in the Z direction. Δ is the amount of displacement in the X direction due to external force and assembly error
Then, the displacement amount in the Z direction accompanying this is as follows: a is the distance from the constricted portion of the spherical pair member to the fixed point, b is the distance from the stage side constricted portion including the piezoelectric element to the base constricted portion, ΔL = b− (b 2 −δ 2 ) 1/2 .

【0016】一方本発明における実施例ではX方向に外
力が加わったときであっても図6(a)に示すようにス
テージはベースに対して平行に移動し、圧電素子と球端
面を含めたリンクにおけるベースとステージの接触点が
ずれるだけであり、Z方向の変位量は存在しない。つま
り ΔL=0 となる。ここで従来までの場合について、実際に有り得
る値としてb=50mm、さらに組立誤差によって、δ=
0.1mmの誤差が発生したとすると、 ΔL=0.1μm となり、またδ=0.2mmの場合、 ΔL=0.4μm となる。すなわち本発明においてはこの分だけ干渉量が
なくなることになる。
On the other hand, in the embodiment of the present invention, even when an external force is applied in the X direction, the stage moves parallel to the base as shown in FIG. 6A, and the piezoelectric element and the spherical end surface are included. The contact point between the base and the stage in the link only shifts, and there is no displacement in the Z direction. That is, ΔL = 0. Here, in the conventional case, b = 50 mm as an actually possible value, and δ =
If an error of 0.1 mm occurs, ΔL = 0.1 μm, and if δ = 0.2 mm, ΔL = 0.4 μm. That is, in the present invention, the amount of interference is eliminated by this amount.

【0017】一方これらの外力または誤差が存在すると
きの圧電素子の変位量の他成分へ与える影響は、従来か
らの球対偶を用いた場合、X方向の変位に関して Δb×δ/b、 さらにZ方向の変位は Δb×(b2−δ21/2/b となる。
On the other hand, when these external forces or errors exist on the other components of the displacement amount of the piezoelectric element, when the conventional ball pair is used, the displacement in the X direction is Δb × δ / b, and Z The displacement in the direction is Δb × (b 2 −δ 2 ) 1/2 / b.

【0018】一方本発明における実施例では、圧電素子
の伸びに対するX方向およびZ方向変位は、まずX方向
に対して、 Δb×sin(2δ/L) Z方向に対しては Δb×cos(2δ/L) となる。
On the other hand, in the embodiment of the present invention, the displacement in the X and Z directions with respect to the elongation of the piezoelectric element is first Δb × sin (2δ / L) in the X direction and Δb × cos (2δ in the Z direction. / L).

【0019】これらはL=2bであるとき、ほぼ同じ値
になり、本発明によって劣化を招くものではない。
When L = 2b, these values are almost the same, and the present invention does not cause deterioration.

【0020】また、図1の場合はリンクとベース、リン
クとステージとの位置を一定の場所に固定できない可能
性があるが、図5のように球面端を持った部材に凸型の
突起を、ベースとステージ側に凹型のくぼみを設け、嵌
合させると、嵌合の深さcと、クリアランス(D−d)
にしたがってX方向の許容される誤差量は制限されるも
のの、ほぼ一定の位置で動作させることができる。
In addition, in the case of FIG. 1, there is a possibility that the positions of the link and the base and the link and the stage cannot be fixed at a fixed position, but as shown in FIG. 5, a convex projection is formed on a member having a spherical end. , A concave recess is provided on the base side and the stage side, and when they are fitted, the fitting depth c and the clearance (D-d)
Therefore, although the allowable error amount in the X direction is limited, the operation can be performed at a substantially constant position.

【0021】なお図1,図5において、弾性体としてコ
イルばねを考えたが、これは他に板ばねであってもよ
い。
Although a coil spring is considered as the elastic body in FIGS. 1 and 5, a leaf spring may be used instead.

【0022】図1,図5で示した1軸の機構を3軸のス
テージに拡張したものを図7に載せる。図7において、
61がベース、62がステージ、63a〜cが圧電素
子、64a〜c,65a〜cが圧電素子の両端にある球
面端をもつ部材、66から69までは板ばねである。こ
こで、ステージ62は板ばね66から69までによりさ
さえられ、X方向,Y方向ともにガイドの役目を果たす
と共に、圧電素子64に予圧として圧縮力を与えてい
る。
FIG. 7 shows an extension of the uniaxial mechanism shown in FIGS. 1 and 5 to a triaxial stage. In FIG.
61 is a base, 62 is a stage, 63a-c are piezoelectric elements, 64a-c and 65a-c are members having spherical ends at both ends of the piezoelectric elements, and 66 to 69 are leaf springs. Here, the stage 62 is supported by the leaf springs 66 to 69, plays the role of a guide in both the X and Y directions, and gives a compressive force as a preload to the piezoelectric element 64.

【0023】以上のように本実施例によれば、ステージ
の微動装置において、圧電素子の両側に、ベースとステ
ージ間の距離を直径にもつ球の端面を設け、さらにベー
スとステージとの間隔を縮める方向に弾性体を設けるこ
とにより、圧電素子にかかるせん断力をなくしかつ組立
誤差から生じる他の軸への干渉をなくすることができ
る。
As described above, according to the present embodiment, in the fine movement apparatus of the stage, the end faces of the sphere having the diameter of the distance between the base and the stage are provided on both sides of the piezoelectric element, and the distance between the base and the stage is further increased. By providing the elastic body in the contracting direction, it is possible to eliminate the shearing force applied to the piezoelectric element and to eliminate the interference with other axes caused by the assembly error.

【0024】[0024]

【発明の効果】以上のように本発明は、ベースに対して
相対的に変位を与えることのできるステージの微動装置
において、ベースと、ステージと、直径が前記ベースと
前記ステージの間の距離を同じ球面の端を両側にもつ積
層型圧電素子と、前記ベースと前記ステージとの間隔を
縮める方向に作用する弾性体とを有することによって、
圧電素子にせん断力をかけずに、また同時に組立上の誤
差が発生しても他軸成分への干渉量を増やすことのない
微動装置が実現できる。また省スペース化の可能性もあ
る。
As described above, according to the present invention, in a fine movement apparatus of a stage capable of relatively displacing with respect to the base, the base, the stage, and the diameter of the distance between the base and the stage. By having a laminated piezoelectric element having ends of the same spherical surface on both sides, and an elastic body that acts in a direction of reducing the distance between the base and the stage,
A fine movement device can be realized without applying a shearing force to the piezoelectric element and at the same time, even if an assembly error occurs, the amount of interference with other axis components is not increased. There is also the possibility of space saving.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例におけるステージ微動装置の
構成図
FIG. 1 is a configuration diagram of a stage fine movement device according to an embodiment of the present invention.

【図2】従来のステージ微動装置の例を表す図FIG. 2 is a diagram showing an example of a conventional stage fine movement device.

【図3】図2の要部詳細図FIG. 3 is a detailed view of a main part of FIG.

【図4】本発明の作用の説明図FIG. 4 is an explanatory diagram of the operation of the present invention.

【図5】本発明の他の実施例におけるステージ微動装置
の構成図
FIG. 5 is a configuration diagram of a stage fine movement device according to another embodiment of the present invention.

【図6】本発明の動作を説明するための図FIG. 6 is a diagram for explaining the operation of the present invention.

【図7】図1に示すステージ微動装置を3軸に拡張した
ステージの構成図
7 is a configuration diagram of a stage in which the stage fine movement device shown in FIG. 1 is extended to three axes.

【符号の説明】[Explanation of symbols]

1 ベース 2 ステージ 3 圧電素子 4,5 球面端をもつ部材 6,7 弾性体 21 圧電素子 22 ベース 23 ステージ 24,25 球対偶を有する部材 DESCRIPTION OF SYMBOLS 1 base 2 stage 3 piezoelectric element 4,5 member having spherical end 6,7 elastic body 21 piezoelectric element 22 base 23 stage 24,25 member having spherical pair

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ベースに対して相対的に変位を与えるこ
とのできるステージの微動装置において、ベースと、ス
テージと、直径が前記ベースと前記ステージの間の距離
と同じ球面の端を両側にもつ積層型圧電素子と、前記ベ
ースと前記ステージとの間隔を縮める方向に作用する弾
性体とを有したことを特徴とするステージの微動装置。
1. A fine movement device for a stage, which is capable of being displaced relative to a base, having a base, a stage, and a spherical end whose diameter is the same as the distance between the base and the stage on both sides. A fine movement device for a stage, comprising: a laminated piezoelectric element; and an elastic body that acts in a direction to reduce a distance between the base and the stage.
【請求項2】 請求項1記載のステージの微動装置にお
いて、リンクの球面端の一部に突起を設け、ベースある
いはステージのリンクとの接点に、前記突起と嵌合する
凹部を設けたことを特徴とするステージの微動装置。
2. The stage fine movement device according to claim 1, wherein a protrusion is provided at a part of a spherical end of the link, and a recess for fitting with the protrusion is provided at a contact point with the link of the base or the stage. Characteristic stage fine movement device.
JP3245561A 1991-09-25 1991-09-25 Fine moving device for stage Pending JPH0584626A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3245561A JPH0584626A (en) 1991-09-25 1991-09-25 Fine moving device for stage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3245561A JPH0584626A (en) 1991-09-25 1991-09-25 Fine moving device for stage

Publications (1)

Publication Number Publication Date
JPH0584626A true JPH0584626A (en) 1993-04-06

Family

ID=17135542

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3245561A Pending JPH0584626A (en) 1991-09-25 1991-09-25 Fine moving device for stage

Country Status (1)

Country Link
JP (1) JPH0584626A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113193780A (en) * 2021-05-31 2021-07-30 吉林大学 Microminiature two-degree-of-freedom ultrasonic motor and driving method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113193780A (en) * 2021-05-31 2021-07-30 吉林大学 Microminiature two-degree-of-freedom ultrasonic motor and driving method thereof

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